JP2002139612A - Optical element, method for manufacturing the same, transfer film used for the manufacturing method, and liquid crystal device using the optical element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent color mixing and void in the method for manufacturing a color filter using an ink jet method. SOLUTION: A transfer film 2 which has a transfer layer consisting of a photosensitive resin composition and including a first layer 4 having ink-repelling property and a second layer 5 having ink affinity formed on a base film 3 is tightly adhered to a support substrate 1 with the second layer 5 facing the substrate. Then the transfer film is exposed according to the pattern to form a barrier wall 6 having the lower layer having ink affinity and the upper layer with ink-repelling property. Then ink is supplied to the openings 7 by an ink jet method, to form pixels.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter which is a component of a color liquid crystal element used in a color television, a personal computer, a pachinko game console, and an optical element such as an electroluminescence element having a plurality of light emitting layers. The present invention relates to a manufacturing method for manufacturing an element using an inkjet method and a transfer film used in the manufacturing method, and further includes an optical element manufactured by the manufacturing method, and a color filter which is one of the optical elements. The present invention relates to a liquid crystal element comprising:

[0002]

2. Description of the Related Art In recent years, the development of personal computers,
In particular, with the development of portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, cost reduction is necessary for further popularization, and in particular, there is an increasing demand for cost reduction of color filters having a high specific gravity.

Conventionally, various methods have been tried to satisfy the above requirements while satisfying the required characteristics of the color filter, but no method has yet been established which satisfies all the required characteristics. The respective methods will be described below.

[0004] The first method is a dyeing method. In the dyeing method, first, a water-soluble polymer material layer, which is a material for dyeing, is formed on a transparent substrate, and this is patterned into a desired shape by a photolithography process, and the obtained pattern is immersed in a dye bath. To obtain a colored pattern. By repeating this process three times, R (red), G (green), B
A colored layer composed of three colored portions (blue) is formed.

[0005] The second method is a pigment dispersion method, which has been most frequently used in recent years. In this method, a photosensitive resin layer in which a pigment is dispersed is first formed on a transparent substrate, and this is patterned to obtain a monochromatic pattern. This step is repeated three times to form a colored layer including three colored portions of R, G, and B.

A third method is an electrodeposition method. In this method, a transparent electrode is first patterned on a transparent substrate, and immersed in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution, and the like to electrodeposit a first color. This process is repeated three times, and R, G,
A colored layer composed of colored portions of three colors B is formed and finally baked.

As a fourth method, a pigment is dispersed in a thermosetting resin and printing is repeated three times to obtain R, G,
After separately applying B, the resin is thermally cured to form a colored layer. In either method,
Generally, a protective layer is formed on the coloring layer.

[0008] These methods have in common that R,
In order to color the three colors G and B, the same process needs to be repeated three times, which increases the cost. There is also a problem that the yield decreases as the number of steps increases. Further, in the electrodeposition method, the pattern shape that can be formed is limited.
T, that is, an active matrix driving method using a thin film transistor as a switching element) is difficult to be applied to the configuration of a liquid crystal element.

On the other hand, the ink jet method is not limited to the production of a color filter, but can be applied to the production of an electroluminescence element (hereinafter, referred to as an “EL element”).

An EL element has a structure in which a thin film containing a fluorescent inorganic or organic compound is sandwiched between a cathode and an anode. Electrons and holes are injected into the thin film and recombined. This is an element that generates excitons and emits light using emission of fluorescence when the excitons are deactivated. A fluorescent material used for such an EL element is, for example, a TFT.
An element can be formed by applying an ink-jet method to a substrate on which the elements have been formed to form a light-emitting layer.

[0011]

As described above, the ink-jet method can be applied to the production of optical elements such as color filters and EL elements because the production process can be simplified and the cost can be reduced. However, in the manufacture of such an optical element, there are problems such as "color mixture" and "white spots" as problems specific to the ink jet system. Hereinafter, a case where a color filter is manufactured will be described as an example.

"Mixed color" is an obstacle that occurs when ink is mixed between adjacent pixels of different colors (colored portions). In a method of manufacturing a color filter in which a black matrix is used as a partition and a colored portion is formed by applying ink to the openings of the black matrix, the volume of the black matrix is several times to several tens times the volume of the openings of the black matrix. Need to be applied. When the solid content concentration of the colorant and curing component contained in the ink is high,
That is, when the volume of the ink to be applied is relatively small, the black matrix sufficiently functions as a partition and can hold the ink in the opening of the black matrix, so that the applied ink passes over the black matrix. Does not reach adjacent colored portions of different colors. However, when the solid concentration in the ink is low, that is, when a large amount of ink needs to be applied, the ink overflows beyond the black matrix serving as the partition wall, and color mixing occurs between adjacent colored portions. Resulting in. In particular, there is a limit to the viscosity of ink that can be stably ejected from the nozzles of an ink jet head, and there is also a limit to the concentration of solids contained in the ink. Therefore, a technique for avoiding color mixing is required. .

Therefore, a method for preventing color mixing by utilizing the difference in wettability of the ink between the colored portion and the partition has been proposed. For example, in JP-A-59-75205, in order to prevent the ink from spreading outside the target area,
A method of forming a diffusion prevention pattern with a substance having poor wettability has been proposed, but no specific technique has been disclosed.
On the other hand, Japanese Patent Application Laid-Open No. 4-123005 proposes, as a specific method, a method of patterning a silicone rubber layer having a large water-repellent and oil-repellent action to form a partition wall for preventing color mixing. Further, in Japanese Patent Application Laid-Open Nos. 5-241111 and 5-241012, a silicone rubber layer is formed on a black matrix serving as a light-shielding layer.
A technique used as a partition for preventing color mixing is disclosed.

According to these methods, even when an amount of ink far exceeding the height of the partition is applied, the ink is repelled because the surface layer of the partition exhibits ink repellency,
Color mixing can be effectively prevented without reaching the adjacent colored portion beyond the partition wall.

FIG. 3 shows a conceptual diagram thereof. In the figure, 31 is a transparent substrate, 33 is a black matrix also serving as a partition, 36
Is ink. When the upper surface of the black matrix 33 has ink repellency, as shown in FIG. 3B, the applied ink 36 is held in the opening of the black matrix 33 and reaches the adjacent colored portion. There is no. However, when the ink repellency of the upper surface of the black matrix 33 is low, as shown in FIG. 3A, the applied ink 36 spreads over the black matrix 33 and is applied to the adjacent opening. It mixes with ink.

A method for obtaining ink repellency using a fluorine compound has also been proposed. For example, JP-A-2000-3
No. 5511 discloses a method of forming a positive resist pattern on a light-shielding portion and further applying an ink-repellent treatment agent on the pattern. A fluorine compound is used as the ink-repellent treatment agent. Is disclosed.
However, in the case of this method, it is necessary to remove the positive resist pattern provided on the light-shielding portion after forming the colored portion. However, when the resist pattern is removed, problems such as dissolution, peeling, and swelling of pixels may occur. is there.

Furthermore, all of the above-mentioned methods require a plurality of photolithography steps of coating-exposure-development, so that the process becomes complicated, cost increases, and
As a result, there is a problem that the yield is reduced.

On the other hand, “white spots” are obstacles that occur mainly because the applied ink cannot be sufficiently and uniformly diffused in the area surrounded by the partition walls, and the color unevenness and the contrast are poor. This causes display defects such as a decrease in image quality.

FIG. 4 shows a conceptual diagram of a white spot. In the figure,
(B) is an AB cross-sectional view of (a), and the same members as those in FIG. 3 are denoted by the same reference numerals. Reference numeral 38 denotes a blank portion.

In recent years, in a color filter for a TFT type liquid crystal element, the opening shape of the black matrix 33 is complicated in order to protect the TFT from external light or to obtain a bright display by increasing the aperture ratio. It has become
Since one having a plurality of corners is generally used, there arises a problem that the ink 36 does not sufficiently diffuse into the corners as shown in FIG. When forming the black matrix 33,
Generally, a photolithography process using a resist is used, and contaminants adhere to the surface of the transparent substrate 31 due to various components contained in the resist, which may hinder the diffusion of the ink 36. Further, when the ink repellency of the side surface of the black matrix 33 is extremely high compared to the surface of the transparent substrate 31, the ink 36 is repelled on the side surface of the black matrix 33 as shown in FIG. In some cases, a problem may occur that the color becomes light at the portion where the ink 36 and the black matrix 33 are in contact with each other.

As a method for solving such a problem of color mixture and white spots, Japanese Patent Application Laid-Open No. 9-203803 discloses a method in which a region (concave portion) surrounded by a black matrix (convex portion) is formed.
It has been proposed to use a substrate which has been subjected to an ink-philic treatment so as to have a contact angle of 20 ° or less with water. Examples of a method for imparting ink affinity include a water-soluble leveling agent and a water-soluble surfactant. Further, in order to simultaneously solve the above-described problem of color mixing, a method of treating the surface of the convex portion with an ink repellent treatment agent in advance to impart ink repellency is disclosed. A method of coating with a fluorine-based solvent using a silane coupling agent is exemplified. In this case, as a method for selectively making the surface layer of the convex portion ink-repellent and not repelling the side surface of the convex portion, a portion other than the convex portion is covered with a resist, and only the upper surface of the convex portion is covered. Examples include a method of forming a resist layer on a transparent substrate, performing an ink repellency process, patterning the resist layer by a photolithography process to form a convex portion, and the like.

Similarly, Japanese Patent Application Laid-Open No. 9-230129 discloses a method of irradiating energy rays as a method of making a concave portion ink-philic. Also in this case, as a method of performing ink-repellent treatment only on the surface layer of the convex portion, a photosensitive material for forming the convex portion is applied on a glass substrate,
A method of patterning a photosensitive material by a photolithography process after treating the entire surface with an ink repellent treatment agent is exemplified. After that, the projections and the depressions are simultaneously subjected to the irradiation of energy rays, or the ink-affinity-selective treatment is selectively performed on either of them.

However, in each of these methods, the surface of the convex portion is subjected to the ink-repellent treatment, and then the concave portion is subjected to the ink-repellent treatment. There is a problem that the ink repellency of the surface of the portion is reduced. Therefore, it is difficult to obtain sufficient ink affinity on the surface of the transparent substrate and the side surface of the black matrix, and to obtain sufficient ink repellency on the upper surface of the black matrix. Moreover,
Since the photolithography process is performed a plurality of times, there is a problem that the process becomes complicated and the yield decreases.

The above problem is caused by the E
This also occurs when an L element is manufactured. That is, in the EL element, for example, the organic E which emits each color of R, G, B
When a material (light emitting layer) is formed by applying the ink to a region surrounded by the partition wall using the L material as the ink and mixing the ink between the adjacent light emitting layers, the light emitting layer has a desired color. However, there is a problem that light emission of luminance cannot be obtained. Further, even in the case of a single color light emitting layer, since the amount of ink filled in the partition walls is made uniform, when ink flows into adjacent pixels, the amount of ink becomes non-uniform and is recognized as uneven brightness. Becomes In addition, when the ink is not sufficiently diffused in the region surrounded by the partition, there is a problem that sufficient light emission luminance cannot be obtained at the boundary between the light emitting layer and the partition. In the following description, for convenience, EL
Also in the case of manufacturing an element, mixing of ink between adjacent light emitting layers is referred to as “color mixing”, and occurrence of unevenness in light emission luminance due to repulsion of ink at the boundary between the light emitting layer and the partition is referred to as “white spots”.

An object of the present invention is to solve the above-mentioned problems when manufacturing optical elements such as color filters and EL elements at a low cost by a simple process using an ink-jet method, and to obtain a highly reliable optical element with a high yield. To provide. Specifically, when applying ink to the area surrounded by the partition, to prevent color mixture between adjacent pixels,
Another object of the present invention is to form a pixel without white spots by sufficiently diffusing ink in the area. Another object of the present invention is to provide a liquid crystal element having excellent color display characteristics at a lower cost by using the optical element obtained by the manufacturing method.

[0026]

A first aspect of the present invention is a method of manufacturing an optical element having at least a plurality of pixels on a supporting substrate and a partition wall located between adjacent pixels, the method comprising the steps of: A transfer layer comprising a photosensitive resin composition, wherein the transfer layer comprises a transfer film comprising a first layer having ink repellency and a second layer having ink affinity from the base film side, A step of bringing the second layer into close contact with the support substrate side, a step of pattern-exposing the transfer layer, a step of peeling only the base film from the transfer layer, and a step of forming the partition by developing the transfer layer When,
Applying an ink to a region surrounded by partition walls by an ink jet method to form pixels.

The first aspect of the present invention includes the following configurations as preferred embodiments. The first layer contains at least one of a silicon compound and a fluorine compound. The transfer layer has a negative photosensitivity that is cured by light irradiation. The second layer contains a light-blocking agent. The ink contains at least a curing component, water and an organic solvent.
A color filter is manufactured in which the support substrate is a transparent substrate, the ink contains a colorant, and the pixels are colored portions. The above-mentioned ink contains a fluorescent material, a pixel is a light emitting layer, and an electroluminescent element having electrodes above and below the light emitting layer is manufactured.

The second aspect of the present invention is to form an optical element having at least a plurality of pixels on a support substrate and a partition located between adjacent pixels by forming the partition on the support substrate, and then forming the partition by an ink jet method. In a manufacturing method for forming pixels by applying ink to an enclosed region, the transfer film used in the step of forming the partition walls, further comprising a transfer layer made of a photosensitive resin composition on a base film, The transfer film is characterized in that the layer comprises a first layer having ink repellency and a second layer having ink affinity from the base film side.

The second aspect of the present invention includes the following configuration as a preferred embodiment. The first layer contains a silicon compound or a fluorine compound. The transfer layer has a negative photosensitivity that is cured by light irradiation. The second layer contains a light-blocking agent.

A third aspect of the present invention is characterized in that the optical element has at least a plurality of pixels on a support substrate and a partition wall located between adjacent pixels, and is manufactured by the above-described method for manufacturing an optical element of the present invention. Optical element.

The third aspect of the present invention includes the following configuration as a preferred embodiment. The partition is a light shielding layer. The support substrate is a transparent substrate, the pixels are colored portions formed of ink containing a colorant, and the color filter includes a plurality of colored portions. A protective layer is provided on the colored portion. A transparent conductive film is provided on the surface. The pixel is a light emitting layer made of a fluorescent material, and is an electroluminescent element having electrodes above and below the light emitting layer.

A fourth aspect of the present invention is a liquid crystal element characterized in that liquid crystal is sandwiched between a pair of substrates, and one of the substrates is formed using the optical element of the present invention.

[0033]

BEST MODE FOR CARRYING OUT THE INVENTION
After using a transfer film having a transfer layer composed of two different layers having ink repellency and ink affinity to the ink, the layer having the ink affinity is brought into close contact with the supporting substrate, and then exposed. By peeling and developing, a partition having an upper layer having ink repellency and a lower layer having ink affinity is formed. Next, ink is applied to a region surrounded by the partition by an ink-jet method to form pixels. Therefore, in the present invention, it is possible to form a partition excellent in inkjet suitability by a simple method,
When applying the ink, the ink repellency of the partition wall surface, even if a large amount of ink is held well to prevent color mixing,
Since the lower layer of the side wall of the partition wall is ink-philic, the ink quickly spreads into the partition wall to prevent white spots.

In the present invention, the above-mentioned “ink” is
After drying and curing, for example, liquids having optical and electrical functionality are collectively referred to, and are not limited to conventionally used coloring materials.

The optical element of the present invention manufactured by the manufacturing method of the present invention includes a color filter and an electroluminescence (EL element). First, the optical element of the present invention will be described with reference to embodiments.

FIG. 5 schematically shows a cross section of an example of a color filter which is an embodiment of the optical element of the present invention. In the figure, 51 is a transparent substrate as a support substrate, 52 is a black matrix also serving as a partition, 53 is a colored portion which is a pixel, 5
4 is a protective layer formed as needed. When a liquid crystal element is formed using the color filter of the present invention, ITO (indium tin oxide) for driving liquid crystal is formed on the colored portion 53 or on the protective layer 54 formed on the colored portion 53. In some cases, a transparent conductive film made of a transparent conductive material such as (oxide) is formed and provided. In the present invention, the black matrix 52 also serving as a partition is
It is composed of a second layer 52a having ink affinity and a first layer 52b having ink repellency.

FIG. 6 is a schematic cross-sectional view of one embodiment of the liquid crystal element of the present invention constituted by using the color filter of FIG. In the figure, 57 is a common electrode (transparent conductive film), 58 is an alignment film, 59 is a liquid crystal, 61 is a counter substrate, 62 is a pixel electrode, 63 is an alignment film, and the same members as those in FIG. And the description is omitted.

The color liquid crystal element is generally formed by combining a substrate 51 on the color filter side and a counter substrate 61 and forming a liquid crystal 5.
9 is formed. TFTs (not shown) and pixel electrodes 62 are formed in a matrix inside one substrate 61 of the liquid crystal element. A colored portion 53 of a color filter is formed inside the substrate 51 on the color filter side at a position facing the pixel electrode 62 so that R, G, and B are arranged, and a transparent common electrode is formed thereon. 57 are formed. Further, alignment films 58 and 63 are provided in the plane of both substrates.
Are formed, and the liquid crystal molecules are arranged in a certain direction. These substrates are arranged to face each other via a spacer (not shown), are bonded to each other with a sealing material (not shown), and a gap therebetween is filled with a liquid crystal 59.

In the case of the transmission type liquid crystal element, the substrate 61 and the pixel electrode 62 are formed of a transparent material, a polarizing plate is adhered to the outside of each substrate, and a fluorescent lamp and a scattering plate are generally combined. The display is performed by using a liquid crystal compound that functions as an optical shutter that changes the light transmittance of the backlight. In the case of the reflective type, the substrate 61 or the pixel electrode 62 is formed of a material having a reflective function, or a reflective layer is provided on the substrate 61, a polarizing plate is provided outside the transparent substrate 51, and a color plate is provided. Display is performed by reflecting light incident from the filter side.

FIG. 7 is a schematic cross-sectional view of an example of an organic EL device which is another embodiment of the optical device of the present invention. In the drawing, reference numeral 71 denotes a driving substrate serving as a supporting substrate, and 72 denotes a second layer 72a having ink affinity and a first layer 72 having ink repellency.
A partition wall composed of the layer 72b; 73, a light emitting layer which is a pixel;
Is a transparent electrode, and 76 is a metal layer. In this figure, only one pixel region is shown for simplification.

On the drive substrate 71, a TFT (not shown), a wiring film, an insulating film and the like are laminated in multiple layers.
In addition, a voltage can be applied between the transparent electrodes 74 arranged for each light emitting layer 73 for each light emitting layer. The drive substrate 71 is manufactured by a known thin film process.

When an organic EL device is constructed in the present invention, at least one of the transparent or translucent electrodes is composed of a pair of anodes and cathodes, and at least one of the transparent and translucent electrodes is provided in a partition made of a resin composition. There is no particular limitation as long as the pixel is formed by filling the ink composed of the material, and the structure may be a known structure, and various modifications may be made without departing from the gist of the present invention. be able to.

The laminated structure includes, for example, (1) electrode (cathode) / light-emitting layer / hole injection layer / electrode (anode) (2) electrode (anode) / light-emitting layer / electron injection layer / electrode (cathode) ( 3) Electrode (anode) / hole injection layer / light-emitting layer / electron injection layer / electrode (cathode) (4) Electrode (anode or cathode) / light-emitting layer / electrode (cathode or anode) The present invention can be applied to an EL element having a laminated structure provided with an organic compound layer having any of the above structures.

The above (1) and (2) have a two-layer structure, (3)
Is a three-layer structure, and (4) is a single-layer structure.
Although the organic EL element in the present invention is based on these laminated structures, it may have a combined structure of (1) to (4) and a plurality of layers other than these. Also,
A full color display may be realized by combining with a color filter. The shape, size, and material of the organic EL element having such a laminated structure, the step of forming members other than the partition walls and the pixels, and the like are appropriately selected according to the use of the organic EL element, and are not particularly limited.

In the present invention, the light emitting material used for the light emitting layer of the organic EL element is not particularly limited as long as it is a fluorescent material, and various materials can be applied. In particular,
It is an organic compound having a fluorescence property, and both a low molecular weight fluorescent substance and a high molecular weight fluorescent substance are preferably used, and a high molecular weight fluorescent substance is more preferable because application to an ink jet method is simple.

For example, the low-molecular fluorescent substance is not particularly limited, but naphthalene and its derivatives, anthracene and its derivatives, perylene and its derivatives, polymethine, xanthene, coumarin, and cyanine dyes; -Metal complexes of hydroxyquinoline and its derivatives, aromatic amines, tetraphenylcyclopentadiene and its derivatives, tetraphenylbutadiene and its derivatives, and the like can be used. Specifically, for example, known materials such as those described in JP-A-57-41781 and JP-A-59-184383 can be used.

The polymer fluorescent substance usable as the light emitting material is not particularly limited, and examples thereof include polyphenylene vinylene, polyarylene, polyalkylthiophene, and polyalkylfluorene.

The polymer fluorescent substance used in the organic EL device in the present invention may be a random, block or graft copolymer, or a polymer having an intermediate structure between them, such as a block-like polymer. Or a random copolymer. From the viewpoint of obtaining a polymeric fluorescent substance having a high quantum yield of fluorescence, a random copolymer having block properties or a block or graft copolymer is preferable to a complete random copolymer. In addition, since the organic EL device of the present invention utilizes light emission from a thin film, a polymer fluorescent material having fluorescence in a solid state is used.

As a good solvent for the polymeric fluorescent substance,
Examples include chloroform, methylene chloride, dichloroethane, tetrahydrofuran, toluene, xylene and the like.
Although it depends on the structure and molecular weight of the polymeric fluorescent substance, it can be usually dissolved in these solvents in an amount of 0.1% by weight or more.

In the organic EL device of the present invention, the electron transport used in the electron transport layer when an electron transport layer is further provided between the light emitting layer and the cathode, or used in combination with the hole transport material and the light emitting material The conductive material has a function of transmitting electrons injected from the cathode to the light emitting material. There is no particular limitation on such an electron transporting material, and any one of conventionally known compounds can be selected and used.

Preferred examples of the electron transporting material include:
Examples include nitro-substituted fluorenone derivatives, anthraquinodimethane derivatives, diphenylquinone derivatives, thiopyran dioxide derivatives, heterocyclic tetracarboxylic anhydrides, and carbodiimides.

Further, a fluorenylidenemethane derivative,
Anthraquinodimethane derivatives, anthrone derivatives, oxadiazole derivatives and the like can be mentioned. Also,
Although disclosed as a material for forming a light emitting layer, a metal complex of 8-hydroxyquinoline and a derivative thereof and the like can also be used as the electron transporting material.

In the EL device of the present invention, the light emitting layer is generally formed into a thin film in combination with an appropriate binder resin. The binder resin can be selected from a wide range of resin materials, for example, polyvinyl carbazole resin, polycarbonate resin, polyester resin, polyarylate resin, butyral resin, polystyrene resin, polyvinyl acetal resin, diallyl phthalate resin, acrylic resin, methacrylic resin, Phenolic resin, epoxy resin,
Examples include, but are not limited to, silicone resins, polysulfone resins, urea resins, and the like. These may be used alone or as a copolymer in one kind or as a mixture of two or more kinds.

The anode material preferably has a work function as large as possible. For example, nickel, gold, platinum, palladium, selenium, rhenium, iridium and alloys thereof, or tin oxide, indium tin oxide (ITO), iodine Copper oxide is preferred. Poly (3-methylthiophene),
Conductive polymers such as polyphenylene sulfide or polypyrrole can also be used. On the other hand, as a cathode material, silver, lead, tin, magnesium, aluminum, calcium, manganese, indium, chromium, or an alloy thereof having a small work function is used.

The EL element needs to be transparent or translucent on the side of the light emitting layer where light emission is observed.
In the configuration described above, the driving substrate 7 on which the transparent electrode 74 is formed
1 is configured to be transparent or translucent. Also,
The transparent electrode 74 may be either a cathode or an anode,
Usually, since ITO is used, it is generally used as an anode.

Hereinafter, a method for manufacturing an optical element of the present invention will be described with reference to the drawings.

FIGS. 1 and 2 are process diagrams schematically showing a method for manufacturing an optical element according to the present invention. Hereinafter, each step will be described. 1 and 2 are schematic diagrams corresponding to the following steps (a) to (g). Also, FIG.
In each step of FIG. 2, (a-1) to (g-
1) is a schematic plan view seen from above, and (a-2) on the right side of the drawing.
(G-2) is an AB cross-sectional schematic view of (a-1) to (g-1). In the figure, 1 is a support substrate, 2 is a transfer film,
3 is a base film, 4 is a first layer, 5 is a second layer, 6 is a photomask, 7 is a partition, 8 is an opening of the partition 7, 9 is ink, and 10 is a pixel.

Step (a) A support substrate 1 and a transfer film 2 are prepared. Support substrate 1
Is a transparent substrate 51 in the case of manufacturing the color filter illustrated in FIG. 5, and a glass substrate is generally used. However, for the purpose of forming a liquid crystal element, necessary transparency, mechanical strength, and the like are required. A plastic substrate or the like can be used as long as it has characteristics.

In the case of manufacturing the EL device shown in FIG. 7, the support substrate 1 is a drive substrate 71 on which a transparent electrode 74 is formed, and when light emission is observed from the substrate side as shown in FIG. A transparent substrate such as a glass substrate is used as the driving substrate 71.

The surface of the support substrate 1 may be subjected to a surface treatment such as a plasma treatment, a UV treatment, and a coupling treatment.

The transfer film used in the present invention has a transfer layer made of a photosensitive resin composition on a base film 3, and the transfer layer has a first layer 4 having ink repellency and a first layer 4 having ink repellency. It consists of two layers 5. The transfer layer preferably has a negative type photosensitivity which is cured by light irradiation. Also,
The transfer layer is a member serving as a partition of the optical element of the present invention. In particular, when forming a color filter, it is preferable that the transfer layer be a light-shielding layer that shields between adjacent pixels. It can be a stripe. Further, it can be used as a light shielding layer also in the case of manufacturing an EL element. When the partition also serves as a light-shielding layer, it is necessary that the second layer 5 of the transfer film contains at least a light-shielding agent.

Transfer film 5 used in the present invention
An example of each component will be described below.

[Base Film] As the base film 3, it is preferable to use a film having resistance to heat, solvent, light and the like. Furthermore, when performing light irradiation from the base film 3 side at the time of pattern exposure, it is necessary to transmit light having a wavelength used for light irradiation. Specifically, polyethylene terephthalate, polypropylene, triacetate, cellulose acetate, polystyrene, Films such as polyvinyl chloride, polycarbonate, polyimide, polysulfone, polytetrafluoroethylene-perfluoroalkylvinylether, and tetrafluoroethylene-ethylene, or films obtained by adding a filler to these resin materials are used. Also, base film 3
The film thickness is generally about 5 to 500 μm, and particularly preferably about 20 to 200 μm.

[First Layer] It is essential that the first layer 4 has a high ink repellency to ink. Specifically, a photosensitive material having a contact angle to ink of 80 ° or more is used. Is preferable, and by containing at least one of a silicon compound and a fluorine compound, preferable ink repellency can be obtained. As a constituent material capable of satisfying these characteristics, it is preferable to contain, as a component, at least one of a base resin, a photopolymerizable monomer, a photopolymerization initiator, a solvent, a silicon compound or a fluorine compound.

[Second Layer] The second layer 5 is made of a photosensitive material mainly composed of a base resin, a photopolymerizable monomer, a photopolymerization initiator, a solvent and the like. As the second layer 5, a commercially available negative resist that can be developed with alkali is particularly preferably used.
Even when the second layer 5 is made to have a light-shielding property, a commercially available black resist material can be used.

The second layer 5 must have an ink affinity for the ink 9 described later, and specifically contains a polar substituent such as a hydroxyl group, an alkoxy group or a carboxyl group. Base resin and photopolymerizable monomer,
It is preferable to use a solvent prepared by selecting a polar solvent or the like having high solubility in water and having a contact angle with ink 9 described below of 20 ° or less.

Hereinafter, the base resin, the photopolymerizable monomer, the photopolymerization initiator, the silicon compound, and the fluorine compound used for the first layer 4 and the second layer 5 will be described.

[Base Resin] As the base resin, an acrylic resin is preferably used. Alkyl acrylates such as acrylic acid and methacrylic acid, alkyl methacrylates such as methyl acrylate and methyl methacrylate, and cyclic acrylates such as cyclohexyl acrylate and the like can be used. Methacrylate, hydroxyalkyl acrylate or methacrylate such as hydroxyethyl methacrylate, N-
It is possible to use a monomer such as alkylol acrylamide alone or a plurality of copolymerized monomers.

[Photopolymerizable Monomer] As the photopolymerizable monomer, a monomer having a plurality of functional groups is preferably used, and 1,6-hexanediol diacrylate, ethylene glycol diacrylate, neopentyl glycol diacrylate, Monomers selected from ethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, tris (2-hydroxyethyl) isocyanate, ditrimethylolpropane tetraacrylate, dipentaerythritol hexaacrylate and the like are used singly or in combination. be able to. The mixing ratio of the photopolymerizable monomer is not particularly limited, but is generally used in a range of 1/5 to 5 times the weight of the above-described base resin.

[Photopolymerization initiator] As the photopolymerization initiator,
A cationic, anionic, or radical initiator may be used alone or in combination of two or more, and may be used in combination with another sensitizer as needed. The compounding ratio of the photopolymerization initiator is generally used in the range of 0.1 to 20% by weight based on the above-mentioned photopolymerizable monomer.

[Silicon Compound, Fluorine Compound] The silicon compound and the fluorine compound are added for the purpose of imparting ink repellency to the first layer 4 and are siloxane compounds having an alkyl group in a side chain. And a monomer or polymer having a perfluoroalkyl group can be used alone or in combination. The amount of addition can be arbitrarily set so as to obtain the desired ink repellency within a range that does not adversely affect the photosensitivity, film properties, and the like. Furthermore, a silicon-based compound or a fluorine-based compound may be used as the above-mentioned photopolymerizable monomer or binder resin, and the first layer 4 may have a function of imparting ink repellency.

Further, in addition to the above-mentioned constituent materials, plasticizers such as dimethyl phthalate, dibutyl phthalate, dicyclohexyl phthalate, di-2-ethylhexyl phthalate, polymerization inhibitors, surfactants, solvents and the like may be added as necessary. The first layer 4 may be formed on the base film 3 by a direct gravure coating method, a gravure reverse coating method,
It can be formed by a known method such as a reverse roll coating method, a slide die coating method, a slit coating method, a bar coating method, a knife coating method, a spin coating method, and a silk screen method. Also, the second
The layer 5 can be formed on the first layer 4 by a similar method. The thickness of the first layer 4 and the second layer 5 can be set arbitrarily, but preferably the thickness of the first layer 4 is 0.1 to 1.0 μm, and the thickness of the second layer is The thickness is 0.5 to 5.0 μm. In order to improve the releasability of the first layer 4 from the base film 3, a release layer made of a silicone resin or the like may be separately formed between the base film 3 and the first layer 4.

Step (b) The second layer 5 of the transfer film 2 is brought into close contact with the support substrate 1.
At this time, the transfer film 2 can be brought into close contact with the support substrate 1 using a heat-pressing roll.

Step (c) Pattern exposure of the transfer layer is performed via the photomask 6.
This example shows an example in which the photosensitivity of the transfer layer is negative. In the present invention, the exposure may be performed from the base film 3 side or the support substrate 1 side. In any case, the exposure is performed by focusing on the second layer 5 for the purpose of improving the resolution. Is preferably performed.

Step (d) After the exposure, the base film 3 is peeled from the transfer layer. This example shows an example in which the base film 3 is peeled off after exposure. still,
The base film 3 may be peeled before the pattern exposure, but in order to prevent the surface of the first layer 4 from being contaminated during the exposure, it is preferable to perform the exposure before the base film 3 is peeled.

Step (e) The second layer 5 ′ and the first layer 4 ′ cured by wet development.
Is obtained.

Step (f) Ink 9 is applied to the opening 8 of the partition 7 from an ink jet head (not shown) using an ink jet recording apparatus. As an ink jet, a bubble jet (registered trademark) using an electrothermal converter as an energy generating element
A type or a piezo type using a piezoelectric element can be used. In the case of a color filter, the ink 9 contains a colorant of each color so as to form R, G, and B colored portions after curing. In the case of an EL element, the ink 9 emits light by voltage application after curing. A material including a fluorescent material is used. In any case, the ink 9 preferably contains at least a curing component and a solvent. Hereinafter, the composition of the ink used when a color filter is manufactured by the manufacturing method of the present invention will be described in more detail.

[1] Colorant As the colorant to be contained in the ink in the present invention, both dyes and pigments can be used. However, when a pigment is used, it is necessary to disperse it uniformly in the ink. A dye-based coloring agent is preferably used because it is necessary to separately add a dispersing agent and the ratio of the coloring agent in the total solid content becomes low. Further, the amount of the coloring agent to be added is preferably equal to or less than the amount of the curing component described later.

[2] Curing component In consideration of process resistance, reliability, and the like in the post-process, a component that is cured by heat treatment or light irradiation to fix the colorant, ie, a crosslinkable monomer or polymer, etc. It is preferable to contain components. In particular, in consideration of heat resistance, water resistance, and the like in a later step, it is preferable to use a curable resin composition. Specifically, for example, as a base resin, an acrylic resin or a silicone resin having a substituent such as a hydroxyl group, a carboxyl group, an alkoxy group, or an amide group; or a cellulose derivative such as hydroxypropyl cellulose, hydroxyethyl cellulose, methyl cellulose, carboxymethyl cellulose or Modified products thereof; and vinyl polymers such as polyvinylpyrrolidone, polyvinyl alcohol, and polyvinyl acetal. Further, a crosslinking agent and a photoinitiator for curing these base resins by light irradiation or heat treatment can be used. Specifically, melamine derivatives such as methylolated melamine are used as crosslinking agents, and dichromates, bisazide compounds, radical initiators, cationic initiators, anionic initiators, etc. are used as photoinitiators. It is possible. Further, these photoinitiators can be used as a mixture of plural kinds thereof or in combination with other sensitizers.

[3] Solvent As the ink medium used in the present invention, a mixed solvent of water and an organic solvent is preferably used. As the water, it is preferable to use ion-exchanged water (deionized water) instead of general water containing various ions.

Examples of the organic solvent include those having 1 carbon atom such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, sec-butyl alcohol and tert-butyl alcohol.
To 4 alkyl alcohols; dimethylformamide,
Amides such as dimethylacetamide; ketones or keto alcohols such as acetone and diacetone alcohol;
Ethers such as tetrahydrofuran and dioxane; polyalkylene glycols such as polyethylene glycol and polypropylene glycol; alkylene groups such as ethylene glycol, propylene glycol, butylene glycol, triethylene glycol, thiodiglycol, hexylene glycol and diethylene glycol having 2 to 4 Glycerins; lower alkyl ethers of polyhydric alcohols such as ethylene glycol monomethyl ether, diethylene glycol methyl ether, and triethylene glycol monomethyl ether; N-methyl-2-pyrrolidone, 2-pyrrolidone, etc. It is preferable to select from the following.

In addition to the above components, two or more kinds of organic solvents having different boiling points may be used in combination to form an ink having desired physical properties, if necessary. Preservatives and the like may be added.

Step (g) The pixel 10 is formed by performing necessary processing such as heat treatment and light irradiation, and removing and curing the solvent component in the ink 9.

Further, in the case of a color filter, as described above, a protective layer and a transparent conductive film are formed as necessary. As the protective layer in this case, a resin material of a photo-curing type, a thermo-setting type, or a photo- and heat-curable type, or an inorganic film formed by vapor deposition, sputtering, or the like can be used. Any material can be used as long as it has transparency and can withstand the subsequent transparent conductive film formation process, alignment film formation process, and the like. Further, the transparent conductive film may be formed directly on the colored portion without using the protective layer.

In the case of an EL element, necessary members such as electrodes (metal layer 76 in FIG. 7) are formed on the pixels.

[0086]

EXAMPLES (Example 1) [Formation of partition walls] A transfer film having the following structure was formed on a glass substrate (Corning's “1737”) that had been washed with a surfactant aqueous solution and UV-cleaned by using a hot roll. And brought it into close contact. A transfer film having a first layer thickness of 0.5 μm and a second layer thickness of 2.0 μm was used.

Base film 25 μm-thick polyethylene terephthalate film First layer Base resin: 30 parts by weight of methyl methacrylate / hydroxyethyl methacrylate copolymer Photopolymerizable monomer: 25 parts by weight of trimethylolpropane triacrylate Photopolymerization initiator: Ciba-Geigy "IRGACURE 907" 10 parts by weight Fluorinated compound: "FLORARD FC-430" manufactured by Sumitomo 3M 5 parts by weight 2nd layer Nippon Steel Chemical "V-259BK Resist"

Next, after pattern exposure was performed from the base film side using a photomask for forming a black matrix, the base film was peeled off and then removed using an alkali developing solution (“V-2401ID” manufactured by Nippon Steel Chemical Co., Ltd.). By developing the first layer and the second layer, 80 μm ×
A partition having an opening of 220 μm was formed.

[Adjustment of Ink] R, G, and B inks were prepared with the following compositions using an acrylic copolymer having the following composition as a thermosetting component.

Curing component Methyl methacrylate 50 parts by weight Hydroxyethyl methacrylate 30 parts by weight N-methylol acrylamide 20 parts by weight

R ink C.I. I. Acid Orange 148 3.5 parts by weight C.I. I. Acid Red 289 0.5 parts by weight Diethylene glycol 30 parts by weight Ethylene glycol 20 parts by weight Deionized water 40 parts by weight 6 parts by weight of the above curing component

G ink C.I. I. Acid Yellow 23 2 parts by weight Zinc phthalocyanine sulfonamide 2 parts by weight Diethylene glycol 30 parts by weight Ethylene glycol 20 parts by weight Deionized water 40 parts by weight 6 parts by weight of the above curing component

B ink C.I. I. Direct Blue 199 4 parts by weight Diethylene glycol 30 parts by weight Ethylene glycol 20 parts by weight Deionized water 40 parts by weight 6 parts by weight of the above curing component

The contact angle of each ink with the first layer was in the range of 95 ° to 100 °, and the contact angle with the second layer was in the range of 15 ° to 20 °.

[Preparation of Colored Portion] Using an ink jet recording apparatus equipped with an ink jet head adjusted so that the ejection amount becomes 25 pl, R, G, and B inks were applied to each of the openings of the partition walls. 100-400p
The amount was changed every 50 pl in the range of l. Next, heat treatment was performed at 90 ° C. for 10 minutes and then at 230 ° C. for 30 minutes to cure the ink to form colored portions (pixels), thereby producing seven types of color filters having different amounts of applied ink.

[Evaluation of color mixing and white spots] When the obtained color filters were observed with an optical microscope, no color mixing or white spots were observed in all the color filters.

(Example 2) A color filter was produced in the same manner as in Example 1 except that the pattern exposure was performed from the glass substrate side. Observation of the obtained color filters with an optical microscope showed that all of the color filters
No white spots were observed.

Example 3 A color filter was prepared in the same manner as in Example 1 except that the first layer had the following composition. The contact angle of the first layer with respect to the ink is from 80 ° to 8 °.
It was in the range of 4 °.

First layer Base resin: 40 parts by weight of polymethyl methacrylate Photopolymerizable monomer: 40 parts by weight of pentaerythrit trimethacrylate Photoinitiator: 10 parts by weight of “Irgacure 907” manufactured by Ciba-Geigy Silicon-based compound: dimethylsiloxane 10 parts by weight

[Evaluation of color mixture and white spots] When the obtained color filters were observed with an optical microscope, no color mixture or white spots were observed in all the color filters.

(Example 4) A color filter was produced in the same manner as in Example 3 except that the pattern exposure was performed from the glass substrate side. Observation of the obtained color filters with an optical microscope showed that all of the color filters
No white spots were observed.

(Example 5) [Production of EL element substrate] A TF formed by laminating a plurality of wiring films, insulating films, and the like formed by a thin film process.
ITO was formed as a transparent electrode by sputtering to a thickness of 40 nm on the T drive substrate in pixel (light emitting layer) units, and patterning was performed according to the pixel shape by a photolithography method.

[Formation of Partition] Next, the second layer has a thickness of 1.
"CT-2000L" made by Fuji Film Olin at 0 μm
A transparent matrix pattern (partition wall) was formed in the same manner as in Example 1 except that the same transfer film was used as in Example 1. The contact angle of the first layer with the following ink was 98 °, and the contact angle of the second layer was 21 °.

[Formation of Light Emitting Layer] Next, a light emitting layer was filled in the partition wall of the substrate. As the ink, electron transportability 2,5
-Bis (5-tert-butyl-2-benzoxazolyl) -thiophene [fluorescence peak 450, hereinafter referred to as "BB
OT "), poly-N-vinylcarbazole [molecular weight 150,000, manufactured by Kanto Chemical Co., Ltd .; hereinafter," PVK "
Are dissolved in a dichloroethane solution so that the molecule can be dispersed in the hole transporting host compound of 30% by weight. Nile Red, another luminescent center-forming compound, was converted to the PVK-
The ink was prepared by dissolving it in a BBOT dichloroethane solution to a concentration of 0.015 mol%. Filling the ink into the opening of the partition by an inkjet method, dried,
A light emitting layer having a thickness of 200 nm was formed. At this time, each pixel (light-emitting layer) was independent, and the solution containing the light-emitting material was not mixed in the adjacent pixels between the partition walls. Further on this,
Mg: Ag (10: 1) is vacuum deposited to a thickness of 200n
An m: Mg: Ag cathode was made. E made in this way
When a voltage of 18 V was applied to each pixel of the L element, 48
A uniform white light emission of 0 cd / m ² was obtained.

Comparative Example A color filter was produced in the same manner as in Example 1 except that a transfer film containing no fluorine compound was used as the first layer. The contact angle of each ink of the first layer was 60 ° to 65 °. When the obtained color filter was observed with an optical microscope, color mixing was observed in the color filter having an applied amount of 250 pl or more.

[0106]

As described above, according to the present invention,
A highly reliable optical element having pixels without color mixing or white spots can be manufactured with a high yield by a simple process using an ink-jet method. Not E
L elements can be provided with high yield.

In particular, in the present invention, since the partition is formed using the transfer film, the partition having a two-layer structure can be easily formed in the color filter manufacturing process.
It is possible to provide an optical element with high manufacturing efficiency, no variation between the elements of the partition wall, and high reliability.

Therefore, a liquid crystal element having excellent color display characteristics can be provided at a lower cost by using a color filter which is one of the optical elements.

[Brief description of the drawings]

FIG. 1 is a process chart of one embodiment of a method for manufacturing an optical element of the present invention.

FIG. 2 is a process chart of one embodiment of a method for manufacturing an optical element of the present invention.

FIG. 3 is a conceptual diagram of color mixing that occurs in a method of manufacturing an optical element by an inkjet method.

FIG. 4 is a conceptual diagram of white spots generated in a method of manufacturing an optical element by an inkjet method.

FIG. 5 is a schematic cross-sectional view of an example of a color filter which is an embodiment of the optical element of the present invention.

FIG. 6 is a schematic sectional view of one embodiment of the liquid crystal element of the present invention.

FIG. 7 is a schematic cross-sectional view of an example of an EL element which is another embodiment of the optical element of the present invention.

[Explanation of symbols]

 Reference Signs List 1 support substrate 2 transfer film 3 base film 4, 4 'first layer 5, 5' second layer 6 photomask 7 partition 8 opening 9 ink 10 pixel 31 transparent substrate 33 black matrix 36 ink 38 white spot 51 transparent substrate 52 Black matrix 52a Second layer 52b First layer 53 Colored portion 54 Protective layer 57 Common electrode 58 Alignment film 59 Liquid crystal 61 Opposite substrate 62 Pixel electrode 63 Alignment film 71 Driving substrate 72 Partition 72a Second layer 72b First layer 73 Light emitting layer 74 Transparent electrode 76 Metal layer

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Kenichi Iwata 3-30-2 Shimomaruko, Ota-ku, Tokyo F-term in Canon Inc. (reference) 2H048 BA57 BA64 BB02 BB44 2H091 FA02Y FA35Y FB02 FC10 FC12 LA12 LA20 LA30 5C094 AA31 AA42 AA44 BA27 BA43 CA19 CA24 DA13 EA04 EA05 EA07 EB02 EC04 ED03

Claims (18)

[Claims] 1. A method for manufacturing an optical element having at least a plurality of pixels on a supporting substrate and a partition wall located between adjacent pixels, comprising a transfer layer made of a photosensitive resin composition on a base film. Then, the transfer layer is formed by transferring a transfer film including a first layer having ink repellency and a second layer having ink affinity from the base film side to the support substrate and the second layer toward the support substrate side. A step of adhering, a step of pattern-exposing the transfer layer, a step of peeling only the base film from the transfer layer, a step of developing the transfer layer to form a partition, and an area surrounded by the partition by an inkjet method At least a step of applying ink to the substrate to form pixels. 2. The method according to claim 1, wherein the first layer contains at least one of a silicon compound and a fluorine compound. 3. The method for manufacturing an optical element according to claim 1, wherein the transfer layer has a negative type photosensitivity that is cured by light irradiation. 4. The method according to claim 1, wherein the second layer contains a light-shielding agent.
4. The method for manufacturing an optical element according to any one of claims 1 to 3. 5. The method according to claim 1, wherein the ink comprises at least a curing component, water,
The method for producing an optical element according to claim 1, further comprising an organic solvent. 6. The method for manufacturing an optical element according to claim 1, wherein the support substrate is a transparent substrate, the ink contains a colorant, and the pixel is a color filter. 7. The method for manufacturing an optical element according to claim 1, wherein the ink contains a fluorescent material, the pixel is a light emitting layer, and an electroluminescent element having electrodes above and below the light emitting layer is manufactured. . 8. An optical element having at least a plurality of pixels on a support substrate and a partition located between adjacent pixels,
After forming the partition on the support substrate, in a manufacturing method of applying pixels to the region surrounded by the partition by an inkjet method to form a pixel, the transfer film used in the step of forming the partition, a base film A transfer film, comprising a transfer layer comprising a photosensitive resin composition, wherein the transfer layer comprises a first layer having ink repellency and a second layer having ink affinity from the base film side. 9. The transfer film according to claim 8, wherein the first layer contains a silicon compound or a fluorine compound. 10. The transfer film according to claim 8, wherein the transfer layer has a negative photosensitivity that is cured by light irradiation. 11. The transfer film according to claim 8, wherein the second layer contains a light-shielding agent. 12. The display device according to claim 1, further comprising a plurality of pixels on a supporting substrate and a partition wall located between adjacent pixels.
5. An optical element manufactured by the method for manufacturing an optical element according to any one of 5. 13. The optical element according to claim 12, wherein the partition is a light shielding layer. 14. The color filter according to claim 12, wherein the support substrate is a transparent substrate, the pixels are colored portions formed of ink containing a colorant, and the color filters are provided with colored portions of a plurality of colors. The optical element as described in the above. 15. The optical element according to claim 14, further comprising a protective layer on the colored portion. 16. A transparent conductive film on a surface.
Or the optical element according to 15. 17. The optical element according to claim 12, wherein the pixel is a light emitting layer made of a fluorescent material, and the pixel is an electroluminescent element having electrodes above and below the light emitting layer. 18. A liquid crystal sandwiched between a pair of substrates,
A liquid crystal element, wherein one of the substrates is formed using the optical element according to claim 14.