JP2002134455A - Substrate treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate treatment device which can supply a treatment liquid with a sufficient ozone concentration to a substrate. SOLUTION: This substrate treatment device, which supplies ozone water to a substrate 11 for treating the substrate 11, has a spin chuck 10 which supports the substrate 11, a nozzle from which the ozone water (a treatment liquid) is spouted out against the substrate 11 supported by the spin chuck 10, a ozone water supply piping 14, through which the ozone water is supplied to the nozzle, and an ozone supply piping 16 through which ozone is supplied into the ozone water 17 supplied to the nozzle.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a treatment liquid containing ozone on a substrate such as a semiconductor wafer used in a process of manufacturing a semiconductor device or a glass substrate used in a process of manufacturing a flat panel display such as a liquid crystal display device. And a substrate processing apparatus for processing the substrate by supplying the substrate.

[0002]

2. Description of the Related Art As shown in FIG. 5, while a spin chuck 90 supporting a substrate 91 is rotationally driven, ozone water is supplied from a nozzle 92 to the substrate 91 so that a resist film or the like adhering to the surface of the substrate 91 is removed. There is known a substrate processing apparatus that cleans a substrate 91 by removing organic substances by oxidizing power of ozone. Ozone water is supplied to the nozzle 92 from a supply source 93 of ozone water via a supply pipe 94. The supply source 93 includes a generation unit that generates ozone water and a storage unit that stores the generated ozone water, and is disposed in the substrate processing apparatus, or disposed as factory equipment outside the substrate processing apparatus. I have. Generally, the supply source 93 is disposed outside a processing chamber (not shown) that covers the spin chuck 90, and the length of the pipe 94 is relatively short when the supply source 93 is disposed in the substrate processing apparatus. But it is only a few meters.

[0003]

As described above, the piping 9
Since the length of the length 4 is large, the amount of ozone dissolved in the ozone water is increased while the ozone water is sent through the pipe 94, and as a result, the ozone water is discharged from the nozzle 92 toward the substrate 91. The ozone concentration in the ozone water to be reduced decreases, and a problem occurs that organic substances attached to the surface of the substrate 91 cannot be sufficiently removed.

In recent years, it has been desired to reduce the space of the substrate processing apparatus, and accordingly, it has been desired to reduce the size of the configuration for supplying ozone water to the substrate.

[0005] A first object of the present invention is to provide a substrate processing apparatus capable of supplying a processing liquid having a sufficient ozone concentration to a substrate in view of the above points.

A second object of the present invention is to provide a substrate processing apparatus capable of reducing the size of a structure for supplying a processing liquid containing ozone to a substrate and realizing space saving of the apparatus in view of the above points. Is to do.

[0007]

According to a first aspect of the present invention, there is provided a substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate. A nozzle for discharging the processing liquid toward the substrate supported by the support means, a processing liquid supply means for supplying the processing liquid to the nozzle, and supplying ozone to the processing liquid supplied to the nozzle by the processing liquid supply means And ozone supply means.

According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect, the ozone supply means includes an ozonizer provided in parallel with the nozzle and ozone generated by the ozonizer in a processing liquid in the nozzle. And an introduction means for leading to

According to a third aspect of the present invention, there is provided a substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, wherein the supporting means supports the substrate, and the processing is performed toward the substrate supported by the supporting means. A nozzle that discharges the liquid, a processing liquid supply unit that supplies the processing liquid to the nozzle, a processing liquid storage unit that is disposed near the nozzle and temporarily stores the processing liquid before being supplied to the nozzle by the processing liquid supply unit, Ozone supply means for supplying ozone into the processing liquid stored in the processing liquid storage means.

According to a fourth aspect of the present invention, in the substrate processing apparatus according to the third aspect, the ozone supply means includes an ozonizer arranged in parallel with the processing liquid storage means and ozone generated by the ozonizer. And an introducing means for introducing into the processing liquid in the means.

According to a fifth aspect of the present invention, there is provided a substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, wherein the supporting means supports the substrate, and the processing is performed toward the substrate supported by the supporting means. A nozzle that discharges the liquid, a raw liquid supply unit that supplies the raw liquid of the processing liquid before the ozone is dissolved to the nozzle, and ozone is supplied to the raw liquid supplied to the nozzle by the raw liquid supply unit, and the processing is performed in the nozzle. And ozone supply means for generating a liquid.

According to a sixth aspect of the present invention, in the substrate processing apparatus according to the fifth aspect, the ozone supply means includes an ozonizer arranged in parallel with the nozzle and ozone generated by the ozonizer in a stock solution in the nozzle. And introducing means for guiding.

According to a seventh aspect of the present invention, in a substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, a supporting means for supporting the substrate, and a processing apparatus for processing the substrate toward the substrate supported by the supporting means. A nozzle that discharges the liquid, a raw liquid storage unit that is disposed near the nozzle and temporarily stores the raw liquid of the processing liquid before the ozone is dissolved, a raw liquid supply unit that supplies the raw liquid to the raw liquid storage unit, and a raw liquid storage unit. An ozone supply unit that supplies ozone to the stored stock solution to generate a processing solution in the stock solution storage unit, and a processing solution supply unit that supplies the processing solution from the stock solution storage unit to the nozzle. .

According to an eighth aspect of the present invention, in the substrate processing apparatus according to the seventh aspect, the ozone supply means includes an ozonizer provided in parallel with the undiluted solution storage means, and ozone generated by the ozonizer in the storage means. And introducing means for introducing into the undiluted solution.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an example of a preferred embodiment of the present invention will be described with reference to the drawings. <First Embodiment> FIG. 1 is a side view schematically showing a first embodiment of the present invention and a modified example thereof. The substrate processing apparatus shown in FIG. 1 cleans the substrate by supplying ozone water, which is a processing liquid containing ozone, to the substrate to remove organic substances such as a resist film attached to the substrate by the oxidizing power of ozone in the ozone water. Is what you do.

In FIG. 1, a spin chuck 10 horizontally supports a substrate 11 and is driven to rotate in a horizontal plane by a drive motor (not shown). The nozzle 12 is disposed above the substrate 11 supported by the spin chuck 10, and discharges ozone water toward the upper surface of the substrate 11. Further, a space capable of storing ozone water is secured inside the nozzle 12, and the ozone water 17 is stored inside the nozzle 12 when the ozone water is being discharged toward the substrate 11. .

An ozone water supply pipe 14 connected to an ozone water supply source 13 is connected to the nozzle 12 through a flow path. The ozone water supply source 13 includes a generation unit (not shown) that generates ozone water and a storage unit that stores the generated ozone water. The ozone water supply pipe 14 is provided with an on-off valve (not shown) for opening and closing the flow path.

The nozzle 12 has an ozone supply source 15.
An ozone supply pipe 16 connected to the flow path is connected to the flow path. The ozone supply pipe 16 is provided with an opening / closing valve (not shown) for opening / closing the flow path, and has an end on the nozzle 12 side with ozone water 17 stored in the nozzle 12.
It is arranged to be located inside. Ozone supply source 15
Has an ozonizer that generates ozone, and this ozonizer is, for example, a silent discharge type ozonizer that generates ozone by adding a silent discharge to oxygen, or an ultraviolet irradiation type ozonizer that generates ozone by irradiating ultraviolet rays to oxygen. And so on.

Next, the operation of the first embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 10 is driven to rotate. The on-off valve interposed in the ozone water supply pipe 14 is opened, and the ozone water is discharged toward the upper surface of the substrate 11 that rotates together with the spin chuck 10 that is driven to rotate. At this time, ozone water 17 is stored in the nozzle 12.

Then, an opening / closing valve interposed in the ozone supply pipe 16 is opened, and ozone 18 is supplied from the ozone supply pipe 16 into the ozone water 17 stored in the nozzle 12. The supplied ozone 18 is dissolved in the ozone water 17 after being bubbled in the ozone water 17. As a result, ozone can be additionally supplied to the ozone water 17 immediately before being discharged from the nozzle 12, and the ozone water supply pipe 14 can be supplied.
Ozone decomposed while being fed through can be replenished, and ozone water having a sufficient ozone concentration can be supplied to the substrate 11.

<Modification of First Embodiment> The first embodiment described above has a configuration in which ozone water is supplied to the nozzle 12 from an ozone water supply source 13 via an ozone water supply pipe 14. Instead of this configuration, a configuration in which pure water as a stock solution of ozone water is supplied to the nozzle 12 may be adopted. Specifically, as shown in FIG. 1, pure water is supplied from a pure water supply source 50 to a nozzle 12 via a pure water supply pipe 51 provided with an on-off valve.

Next, the operation of the modification of the first embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 1
0 is rotationally driven. The on-off valve interposed in the pure water supply pipe 51 is opened, and the pure water 52 is stored in the nozzle 12.

Then, the opening / closing valve interposed in the ozone supply pipe 16 is opened, and the ozone 18 is supplied from the ozone supply pipe 16 into the pure water 52 stored in the nozzle 12. The supplied ozone 18 is dissolved in the pure water 52 after being bubbled in the pure water 52, and ozone water is generated in the nozzle 12. The generated ozone water is discharged from the nozzle 12 toward the substrate 11 which is driven to rotate together with the spin chuck 10. As a result, ozone water can be generated immediately before the ozone water is discharged from the nozzle 12, and ozone water having a sufficient ozone concentration can be supplied to the substrate 11. Further, since the nozzle 12 also serves as the ozone water generation unit and the storage unit, there is no need to provide a special ozone water supply source in the apparatus as in the related art. Therefore, the configuration for supplying the ozone water can be reduced in size as compared with the conventional configuration, and the space of the apparatus can be saved.

<Second Embodiment> FIG. 2 shows a second embodiment of the present invention.
It is a side view which shows embodiment and its modification. The substrate processing apparatus shown in FIG. 2 cleans the substrate by supplying ozone water, which is a processing liquid containing ozone, to the substrate to remove organic substances such as a resist film attached to the substrate by the oxidizing power of ozone in the ozone water. Is what you do.

In FIG. 2, the spin chuck 10 horizontally supports the substrate 11 and is driven to rotate in a horizontal plane by a drive motor (not shown). The nozzle 12 is disposed above the substrate 11 supported by the spin chuck 10, and discharges ozone water, which is a processing liquid containing ozone, toward the upper surface of the substrate 11. Further, a space capable of storing ozone water is secured inside the nozzle 12, and
When the ozone water is being discharged toward, the ozone water 17 is stored therein.

An ozone water supply pipe 14 connected to an ozone water supply source 13 is connected to the nozzle 12 by a flow path. The ozone water supply source 13 includes a generator (not shown) that generates ozone water (not shown), and a storage unit that stores the generated ozone water. The ozone water supply pipe 14 is provided with an on-off valve (not shown) for opening and closing the flow path.

The nozzle 12 is provided with a surface discharge type ozonizer 20 for generating ozone from oxygen. The ozonizer 20 includes a flow path 25 therein, and a plurality of electrodes 21 are provided along the flow path 25.
A high voltage is applied to each of these electrodes 21 by a high voltage power supply 22. An oxygen supply pipe 24 connected to the oxygen supply source 23 is connected to one end of the flow path 25, and an ozone introduction pipe 26 is connected to the other end of the flow path 25. I have. The end of the ozone introduction pipe 26 on the nozzle 12 side is disposed so as to be located in the ozone water 17 stored in the nozzle 12. The oxygen supply pipe 24 is provided with an on-off valve (not shown) for opening and closing the flow path.

As described above, the ozonizer 20 is connected to the nozzle 12
The length dimension of the ozone introduction pipe 26 can be reduced. As a result, the amount of the ozone generated by the ozonizer 20 to be decomposed before reaching the ozone water 17 in the nozzle 12 via the ozone introduction pipe 26 is reduced, and high-concentration ozone can be supplied into the ozone water 17. .

Next, the operation of the second embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 10 is driven to rotate. The on-off valve interposed in the ozone water supply pipe 14 is opened, and the ozone water is discharged toward the upper surface of the substrate 11 that rotates together with the spin chuck 10 that is driven to rotate. At this time, ozone water 17 is stored in the nozzle 12.

Then, the on-off valve interposed in the oxygen supply pipe 24 is opened, and oxygen is supplied from the oxygen supply source 23 to the flow path 25 in the ozonizer 20 via the oxygen supply pipe 24.
At this time, a high voltage is applied to the plurality of electrodes 21 of the ozonizer 20 by the high voltage
A creeping discharge occurs during the interval, that is, in the flow path 25. Ozone is generated from the oxygen supplied into the flow channel 25 by the creeping discharge.

Ozone generated in the flow path 25 in the ozonizer 20 is supplied from an ozone introduction pipe 16 into ozone water 17 stored in the nozzle 12. The supplied ozone 18 is dissolved in the ozone water 17 after being bubbled in the ozone water 17. As a result, ozone can be additionally supplied to the ozone water 17 immediately before being discharged from the nozzle 12, and ozone decomposed while being sent through the ozone water supply pipe 14 can be replenished. 11 can be supplied with ozone water having a sufficient ozone concentration.

<Modification of Second Embodiment> In the second embodiment, the ozone water is supplied to the nozzle 12 from the ozone water supply source 13 via the ozone water supply pipe 14. Instead of this configuration, a configuration in which pure water as a stock solution of ozone water is supplied to the nozzle 12 may be adopted. Specifically, as shown in FIG. 2, pure water is supplied to the nozzle 12 from a pure water supply source 50 via a pure water supply pipe 51 provided with an on-off valve.

Next, the operation of the modification of the second embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 1
0 is rotationally driven. The on-off valve interposed in the pure water supply pipe 51 is opened, and the pure water 52 is stored in the nozzle 12.

Then, the on-off valve provided in the oxygen supply pipe 24 is opened, and oxygen is supplied from the oxygen supply source 23 to the flow path 25 in the ozonizer 20 via the oxygen supply pipe 24.
At this time, a high voltage is applied to the plurality of electrodes 21 of the ozonizer 20 by the high voltage
A creeping discharge occurs during the interval, that is, in the flow path 25. Ozone is generated from the oxygen supplied into the flow channel 25 by the creeping discharge.

The ozone generated in the flow path 25 in the ozonizer 20 is supplied from the ozone introduction pipe 16 into pure water 52 stored in the nozzle 12. This supplied ozone 1
8 is dissolved in the pure water 52 after bubbling in the pure water 52, and ozone water is generated. The generated ozone water is discharged from the nozzle 12 toward the substrate 11 that is driven to rotate together with the spin chuck 10. As a result,
Ozone water can be generated immediately before the ozone water is discharged from the nozzle 12, and ozone water having a sufficient ozone concentration can be supplied to the substrate 11. Also, nozzle 1
Since the unit 2 also serves as the ozone water generation unit and the storage unit, it is not necessary to provide a special ozone water supply source in the apparatus as in the related art. Therefore, the configuration for supplying the ozone water can be reduced in size as compared with the conventional configuration, and the space of the apparatus can be saved.

<Third Embodiment> FIG. 3 shows a third embodiment of the present invention.
It is a side view which shows embodiment and its modification. The substrate processing apparatus shown in FIG. 3 cleans the substrate by supplying ozone water, which is a processing liquid containing ozone, to the substrate to remove organic substances such as a resist film attached to the substrate by the oxidizing power of ozone in the ozone water. Is what you do.

In FIG. 3, the spin chuck 10 horizontally supports the substrate 11 and is driven to rotate in a horizontal plane by a drive motor (not shown). The nozzle 12 is disposed above the substrate 11 supported by the spin chuck 10, and discharges ozone water, which is a processing liquid containing ozone, toward the upper surface of the substrate 11. In the vicinity of the nozzle 12, a storage unit 30 for temporarily storing ozone water before being supplied to the nozzle 12 is provided. In addition, the nozzle 12 and the storage unit 3
0 is connected to the flow path by a communication pipe 32.

An ozone water supply pipe 14 connected to the ozone water supply source 13 is connected to the storage section 30 by flow path. The ozone water supply source 13 includes a generation unit (not shown) that generates ozone water and a storage unit that stores the generated ozone water. The ozone water supply pipe 14 is provided with an on-off valve (not shown) for opening and closing the flow path.

The storage section 30 has an ozone supply source 15.
An ozone supply pipe 31 connected to the flow path is connected to the flow path. The ozone supply pipe 31 is provided with an opening / closing valve (not shown) for opening and closing the flow path, and the end of the ozone supply pipe 31 on the storage section 30 side is stored in the storage section 30.
It is arranged to be located inside. Ozone supply source 15
Has an ozonizer that generates ozone, and this ozonizer is, for example, a silent discharge type ozonizer that generates ozone by adding a silent discharge to oxygen, or an ultraviolet irradiation type ozonizer that generates ozone by irradiating ultraviolet rays to oxygen. And so on.

Next, the operation of the third embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 10 is driven to rotate. The on-off valve interposed in the ozone water supply pipe 14 is opened, and the ozone water flows from the nozzle 12 through the storage part 30 and the communication pipe 32 toward the upper surface of the substrate 11 that rotates together with the spin chuck 10 that is driven to rotate. Discharged. At this time, the ozone water 17 is stored in the storage unit 30.

Then, an opening / closing valve interposed in the ozone supply pipe 31 is opened, and ozone 18 is supplied from the ozone supply pipe 31 into the ozone water 17 stored in the storage section 30. The supplied ozone 18 is dissolved in the ozone water 17 after being bubbled in the ozone water 17. As a result, ozone can be additionally supplied to the ozone water 17 in the storage unit 30 disposed near the nozzle 12,
Ozone decomposed while being fed through the ozone water supply pipe 14 can be replenished. As described above, the ozone water having a sufficient ozone concentration after the ozone is replenished in the storage unit 30 is sent to the nozzle 12 through the communication pipe 32,
The liquid is discharged from the nozzle 12 toward the substrate 11 that is driven to rotate together with the spin chuck 10.

<Modification of Third Embodiment> The third embodiment has a configuration in which ozone water is supplied to the storage unit 30 from the ozone water supply source 13 via the ozone water supply pipe 14. Instead of this configuration, a configuration in which pure water as a stock solution of ozone water is supplied to the storage unit 30 may be adopted. Specifically, as shown in FIG. 3, pure water is supplied from a pure water supply source 50 to a storage unit 30 via a pure water supply pipe 51 provided with an on-off valve.

Next, the operation of the modification of the third embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 1
0 is rotationally driven. The on-off valve interposed in the pure water supply pipe 51 is opened, and the pure water 52 is stored in the storage unit 30.

Then, the opening / closing valve interposed in the ozone supply pipe 31 is opened, and the ozone 18 is supplied from the ozone supply pipe 31 into the pure water 52 stored in the storage section 30. The supplied ozone 18 is dissolved in the pure water 52 after bubbling in the pure water 52 to generate ozone water. The generated ozone water is passed through the communication pipe 32 to the nozzle 1
After the liquid is sent to the spin chuck 2,
Is discharged toward the upper surface of the substrate 11 which is driven to rotate. As a result, ozone water can be generated in the storage unit 30 disposed near the nozzle 12, and the substrate 1
1 can supply ozone water having a sufficient ozone concentration. In addition, since the storage unit 30 also serves as the ozone water generation unit and the storage unit, it is not necessary to provide a special ozone water supply source in the apparatus as in the related art. Therefore, the configuration for supplying the ozone water can be reduced in size as compared with the conventional configuration, and the space of the apparatus can be saved.

<Fourth Embodiment> FIG. 4 shows a fourth embodiment of the present invention.
It is a side view which shows embodiment and its modification. The substrate processing apparatus shown in FIG. 4 cleans the substrate by supplying ozone water, which is a processing liquid containing ozone, to the substrate to remove organic substances such as a resist film attached to the substrate by the oxidizing power of ozone in the ozone water. Is what you do.

In FIG. 4, the spin chuck 10 horizontally supports the substrate 11 and is driven to rotate in a horizontal plane by a drive motor (not shown). The nozzle 12 is disposed above the substrate 11 supported by the spin chuck 10, and discharges ozone water, which is a processing liquid containing ozone, toward the upper surface of the substrate 11. In the vicinity of the nozzle 12, a storage unit 30 for temporarily storing ozone water before being supplied to the nozzle 12 is provided. The nozzle 12 and the storage unit 30 are connected in a flow path by a communication pipe 32.

An ozone water supply pipe 14 connected to the ozone water supply source 13 by flow is connected to the storage section 30 by flow. The ozone water supply source 13 includes a generation unit (not shown) that generates ozone water and a storage unit that stores the generated ozone water. The ozone water supply pipe 14 is provided with an on-off valve (not shown) for opening and closing the flow path.

A creeping discharge type ozonizer 40 is juxtaposed in the storage section 30. The ozonizer 40 has a flow path 45 therein, and a plurality of electrodes 41 are provided along the flow path 45. A high voltage is applied to each of these electrodes 41 by a high-voltage power supply 42. An oxygen supply pipe 44 connected to the oxygen supply source 43 is connected to one end of the flow path 45, and an ozone introduction pipe 46 is connected to the other end of the flow path 45. I have. The end of the ozone introduction pipe 46 on the storage section 30 side is disposed so as to be located in the ozone water 17 stored in the storage section 30. The oxygen supply pipe 24 is provided with an on-off valve (not shown) for opening and closing the flow path.

As described above, the ozonizer 40 is
The length dimension of the ozone introduction pipe 46 can be reduced. As a result, the amount of the ozone generated by the ozonizer 40 to decompose before reaching the ozone water 17 in the storage unit 30 via the ozone introduction pipe 46 decreases, and high-concentration ozone is supplied into the ozone water 17. it can.

Next, the operation of the fourth embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 10 is driven to rotate. The opening / closing valve interposed in the ozone water supply pipe 14 is opened, and the ozone water 17 is stored in the storage unit 30.

Then, the on-off valve provided in the oxygen supply pipe 44 is opened, and oxygen is supplied from the oxygen supply source 43 to the flow path 45 in the ozonizer 40 via the oxygen supply pipe 44.
At this time, a high voltage is applied to the plurality of electrodes 41 of the ozonizer 40 by the high voltage power
A creeping discharge occurs during the interval, that is, in the flow path 45. Ozone is generated from the oxygen supplied into the flow channel 45 by the creeping discharge.

The ozone generated in the flow path 45 in the ozonizer 40 is supplied from the ozone introduction pipe 46 into the ozone water 17 stored in the storage unit 30. The supplied ozone 18 is dissolved in the ozone water 17 after being bubbled in the ozone water 17. As a result, ozone can be additionally supplied to the ozone water 17 in the storage section 30 disposed in the vicinity of the nozzle 12, and ozone decomposed while being sent through the ozone water supply pipe 14 is supplemented. Can be.
The ozone water having a sufficient ozone concentration after the replenishment of ozone in the storage unit 30 is sent to the nozzle 12 through the communication pipe 32, and then the substrate 11 is rotated from the nozzle 12 together with the spin chuck 10. It is discharged toward.

<Modification of Fourth Embodiment> The fourth embodiment has a configuration in which ozone water is supplied to the storage unit 30 from the ozone water supply source 13 via the ozone water supply pipe 14. Instead of this configuration, a configuration in which pure water as a stock solution of ozone water is supplied to the storage unit 30 may be adopted. Specifically, as shown in FIG. 4, pure water is supplied from a pure water supply source 50 to the storage unit 30 via a pure water supply pipe 51 provided with an on-off valve.

The operation of the modification of the fourth embodiment will be described. When the substrate 11 is placed on the spin chuck 10 by a transfer robot (not shown), the spin chuck 10 is driven to rotate. The on-off valve interposed in the pure water supply pipe 51 is opened, and the pure water 52 is stored in the storage unit 30.

Then, the on-off valve provided in the oxygen supply pipe 44 is opened, and oxygen is supplied from the oxygen supply source 43 to the flow path 45 in the ozonizer 40 via the oxygen supply pipe 44.
At this time, a high voltage is applied to the plurality of electrodes 41 of the ozonizer 40 by the high voltage power
A creeping discharge occurs during the interval, that is, in the flow path 45. Ozone is generated from the oxygen supplied into the flow channel 45 by the creeping discharge.

The ozone generated in the flow path 45 in the ozonizer 40 is supplied from the ozone introduction pipe 46 into the pure water 52 stored in the storage section 30. This supplied ozone 18
Is dissolved in the pure water 52 after bubbling in the pure water 52, and ozone water is generated in the storage unit 30. After the generated ozone water is sent to the nozzle 12 through the communication pipe 32, the ozone water is discharged from the nozzle 12 toward the upper surface of the substrate 11 which is driven to rotate together with the spin chuck 10.
As a result, ozone water can be generated in the storage section 30 disposed near the nozzle 12, and ozone water having a sufficient ozone concentration can be supplied to the substrate 11. In addition, since the storage unit 30 also serves as the ozone water generation unit and the storage unit, it is not necessary to provide a special ozone water supply source in the apparatus as in the related art. Therefore, the configuration for supplying the ozone water can be reduced in size as compared with the conventional configuration, and the space of the apparatus can be saved.

[0057]

As described above in detail, according to the first aspect of the invention, ozone is supplied to the processing liquid stored in the nozzle, and the processing liquid supplied with ozone is supplied from the nozzle to the substrate. By discharging toward the substrate, a processing liquid having a sufficient ozone concentration can be supplied to the substrate.

According to the second aspect of the invention, in addition to the effect of the first aspect, an ozonizer for supplying ozone to the processing liquid stored in the nozzle is provided in parallel with the nozzle, so A concentration of ozone can be supplied into the processing liquid.

According to the third aspect of the present invention, ozone is supplied to the processing liquid stored in the processing liquid storage means disposed near the nozzle, and the processing liquid supplied with ozone is supplied from the nozzle to the substrate. By discharging toward the substrate, a processing liquid having a sufficient ozone concentration can be supplied to the substrate.

According to the fourth aspect of the invention, in addition to the effect of the third aspect, an ozonizer for supplying ozone to the processing liquid stored in the processing liquid storing means is provided in parallel with the storing means. Therefore, a high concentration of ozone can be supplied to the processing liquid.

According to the fifth aspect of the present invention, ozone is supplied to the stock solution of the processing liquid stored in the nozzle to generate the processing liquid, and the generated processing liquid is discharged from the nozzle toward the substrate. By doing so, a processing liquid having a sufficient ozone concentration can be supplied to the substrate. Further, by generating the processing liquid in the nozzle, the configuration for supplying the processing liquid to the substrate can be reduced in size, and the space of the apparatus can be saved.

According to the sixth aspect of the invention, in addition to the effect of the fifth aspect, an ozonizer for supplying ozone to the stock solution stored in the nozzle is provided in parallel with the nozzle. Ozone can be supplied into the stock solution.

According to the seventh aspect of the present invention, ozone is supplied into the stock solution of the processing solution stored in the stock solution storing means disposed near the nozzle to generate a processing solution, and the generated processing solution is generated. Is discharged from the nozzle toward the substrate, whereby a processing liquid having a sufficient ozone concentration can be supplied to the substrate. Further, by generating the processing liquid in the stock solution storage means, the configuration for supplying the processing liquid to the substrate can be downsized, and the space of the apparatus can be saved.

According to the invention of claim 8, in addition to the effect of claim 7, the ozonizer for supplying ozone to the stock solution stored in the stock solution storage means is provided in parallel with the storage means. In addition, high concentration ozone can be supplied into the stock solution.

[Brief description of the drawings]

FIG. 1 is a side view schematically showing a first embodiment of the present invention and a modified example thereof.

FIG. 2 is a side view schematically showing a second embodiment of the present invention and a modified example thereof.

FIG. 3 is a side view schematically showing a third embodiment of the present invention and a modified example thereof.

FIG. 4 is a side view schematically showing a fourth embodiment of the present invention and a modified example thereof.

FIG. 5 is a side view schematically showing a conventional substrate processing apparatus.

[Explanation of symbols]

 Reference Signs List 10 spin chuck 11 substrate 12 nozzle 13 ozone water supply source 14 ozone water supply pipe 15 ozone supply source 16, 31 ozone supply pipe 17 ozone water 18 ozone 20, 40 ozonizer 23, 43 oxygen supply source 24, 44 oxygen supply pipe 30 storage Part 50 Pure water supply source 51 Pure water supply pipe 52 Pure water

Claims (8)

[Claims] 1. A substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, comprising: support means for supporting the substrate; and a nozzle for discharging the processing liquid toward the substrate supported by the support means. A substrate processing apparatus, comprising: processing liquid supply means for supplying a processing liquid to a nozzle; and ozone supply means for supplying ozone to the processing liquid supplied to the nozzle by the processing liquid supply means. 2. The substrate processing apparatus according to claim 1, wherein the ozone supply means includes an ozonizer provided in parallel with the nozzle, and an introduction means for introducing ozone generated by the ozonizer into a processing liquid in the nozzle. A substrate processing apparatus, comprising: 3. A substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, comprising: support means for supporting the substrate; and a nozzle for discharging the processing liquid toward the substrate supported by the support means. A processing liquid supply means for supplying the processing liquid to the nozzle; a processing liquid storage means disposed near the nozzle, for temporarily storing the processing liquid before being supplied to the nozzle by the processing liquid supply means; A substrate processing apparatus, comprising: an ozone supply unit configured to supply ozone into the processed processing liquid. 4. The substrate processing apparatus according to claim 3, wherein the ozone supply means includes an ozonizer arranged in parallel with the processing liquid storage means and ozone generated by the ozonizer in the processing liquid in the processing liquid storage means. A substrate processing apparatus, comprising: an introduction unit that guides the substrate. 5. A substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, comprising: support means for supporting the substrate; and a nozzle for discharging the processing liquid toward the substrate supported by the support means. An undiluted solution supply means for supplying the undiluted solution of the processing liquid before the ozone is dissolved to the nozzle, and an ozone supply for supplying ozone to the undiluted solution supplied to the nozzle by the undiluted solution supply means to generate a processing liquid in the nozzle Means for treating a substrate. 6. The substrate processing apparatus according to claim 5, wherein the ozone supply unit includes an ozonizer arranged in parallel with the nozzle, and an introduction unit that guides ozone generated by the ozonizer into a stock solution in the nozzle. A substrate processing apparatus. 7. A substrate processing apparatus for processing a substrate by supplying a processing liquid containing ozone to the substrate, comprising: support means for supporting the substrate; and a nozzle for discharging the processing liquid toward the substrate supported by the support means. A stock solution storing means for temporarily storing the stock solution of the processing solution before the ozone is dissolved, a stock solution supply means for supplying the stock solution to the stock solution storage means, and a stock solution stored in the stock solution storage means. Supply ozone,
A substrate processing apparatus, comprising: ozone supply means for generating a processing liquid in a stock solution storage means; and processing solution supply means for supplying a processing liquid from the stock solution storage means to a nozzle. 8. The substrate processing apparatus according to claim 7, wherein the ozone supply means is an ozonizer arranged in parallel with the stock solution storage means, and an introduction means for guiding ozone generated by the ozonizer into the stock solution in the storage means. And a substrate processing apparatus.