JP2002121694A - Method and apparatus for plating through-hole of printed wiring board - Google Patents

Method and apparatus for plating through-hole of printed wiring board

Info

Publication number
JP2002121694A
JP2002121694A JP2000315450A JP2000315450A JP2002121694A JP 2002121694 A JP2002121694 A JP 2002121694A JP 2000315450 A JP2000315450 A JP 2000315450A JP 2000315450 A JP2000315450 A JP 2000315450A JP 2002121694 A JP2002121694 A JP 2002121694A
Authority
JP
Japan
Prior art keywords
plating
circuit board
printed circuit
hole
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000315450A
Other languages
Japanese (ja)
Inventor
Jun Tateno
野 純 舘
Kunihiko Azeyanagi
柳 邦 彦 畔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mektron KK
Original Assignee
Nippon Mektron KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mektron KK filed Critical Nippon Mektron KK
Priority to JP2000315450A priority Critical patent/JP2002121694A/en
Publication of JP2002121694A publication Critical patent/JP2002121694A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method and an apparatus for plating a through-hole of a printed wiring board capable of arbitrarily controlling the thickness of front/rear copper plating layers in a double-sided printed wiring board. SOLUTION: In a through-hole plating wiring method, for plating the through- hole, etc., in the printed board in a plating bath filled with a plating liquid, in which the printed wiring board (b) as another electrode is arranged between a pair of electrodes (a), (a), by interposing an object, the ion flowability between one of the pair of electrodes and the printed wiring board is set lower than the ion flowability between the other one of the pair of electrodes and the printed wiring board. A plating treatment is conducted so that the plating thickness of front/rear sides of the printed wiring board are different.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プリント基板にス
ルーホール・メッキを行なう装置に係り、とくに両面プ
リント基板における各面のメッキ層の厚みを適宜選択し
て処理する装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for performing through-hole plating on a printed circuit board, and more particularly to an apparatus for appropriately selecting and processing the thickness of a plating layer on each surface of a double-sided printed circuit board.

【0002】[0002]

【従来の技術】両面銅張型のプリント基板にパターンを
形成するには、一般に (a)穴加工した両面銅張積層板にスルーホール・メッ
キ(パネルメッキ)を施す。 (b)両面にマスクフィルム(ドライフィルム)による
パターンを形成する。 (c)エッチングによりパターンを形成する。 という工程処理を経る。
2. Description of the Related Art In order to form a pattern on a double-sided copper-clad printed circuit board, generally, (a) through-hole plating (panel plating) is performed on a hole-formed double-sided copper-clad laminate. (B) Form a pattern with a mask film (dry film) on both sides. (C) A pattern is formed by etching. Process.

【0003】このようにして形成されるパターンは、基
板に予め設けられていた銅箔の厚みにパネルメッキによ
る銅の厚みが加わったものとなる。通常は、基板の表裏
の厚みは同じである。
[0003] The pattern formed in this manner is obtained by adding the thickness of copper by panel plating to the thickness of copper foil previously provided on the substrate. Usually, the thickness of the front and back of the substrate is the same.

【0004】しかし、電子機器の用途によっては、基板
の表裏での銅の厚みを変える必要がある場合もある。例
えば、片面に大電流を流すグラウンド層があり、もう片
面に微細パターンがある場合などである。
[0004] However, depending on the use of electronic equipment, it may be necessary to change the thickness of copper on the front and back of the substrate. For example, there is a case where there is a ground layer through which a large current flows on one side and a fine pattern exists on the other side.

【0005】[0005]

【発明が解決しようとする課題】このような場合には、
材料銅箔の厚みを表裏で変えることによる対応を採るの
が通例である。
In such a case,
It is customary to change the thickness of the material copper foil on the front and back.

【0006】しかしながら、電極に近い側の面にメッキ
焼け、つまりざらつきなどの異常析出を起こし易く、コ
ントロールは困難である。これに対しては、片面側の電
流を切るとか、片面側の電流を弱くするなどの電流供給
量を加減する方法もあるが、やはりメッキ槽内での電流
密度の偏在が生じてメッキ焼けが起き易く、問題があ
る。
[0006] However, abnormal deposition such as burnt plating, ie, roughness, is likely to occur on the surface near the electrode, and control is difficult. To solve this, there is a method of turning off the current on one side or reducing the current on the one side, etc., to adjust the current supply amount.However, uneven distribution of the current density in the plating tank also causes plating burning. It's easy to get up and has problems.

【0007】本発明は上述の点を考慮してなされたもの
で、両面型プリント基板における表裏の銅メッキ層の厚
みを任意にコントロールできるプリント基板のスルーホ
ール・メッキ方法および装置を提供することを目的とす
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and an object of the present invention is to provide a method and an apparatus for through-hole plating a printed circuit board which can arbitrarily control the thickness of a copper plating layer on both sides of a double-sided printed circuit board. Aim.

【0008】[0008]

【課題を解決するための手段】上記目的達成のため、本
発明では、メッキ液が満たされたメッキ槽中で、該メッ
キ槽中に設けられた一対の電極の間に他方の電極として
のプリント基板を配し、このプリント基板におけるスル
ーホールなどにメッキ処理するプリント基板のスルーホ
ール・メッキ方法において、物体を介挿することにより
前記一対の電極の一方と前記プリント基板との間のイオ
ン流動性を、前記一対の電極の他方と前記プリント基板
との間のイオン流動性よりも低くすることにより前記プ
リント基板の表裏におけるメッキ厚が異なるようにメッ
キ処理を行なうようにしたことを特徴とするプリント基
板のスルーホール・メッキ方法、およびメッキ液が満た
されたメッキ槽中で、該メッキ槽中に設けられた一対の
電極の間に他方の電極としてのプリント基板を配し、こ
のプリント基板におけるスルーホールなどにメッキ処理
するプリント基板のスルーホール・メッキ装置におい
て、前記一対の電極の一方と前記プリント基板との間
に、貫通孔を有する調節板を介挿してメッキ処理を行な
うようにしたことを特徴とするプリント基板のスルーホ
ール・メッキ装置、を提供するものである。
In order to achieve the above object, according to the present invention, in a plating tank filled with a plating solution, a print as the other electrode is provided between a pair of electrodes provided in the plating tank. In a through-hole plating method for a printed circuit board in which a substrate is arranged and a plating process is performed on a through-hole or the like in the printed circuit board, an ion fluidity between one of the pair of electrodes and the printed circuit board is inserted by interposing an object. Wherein the plating process is performed such that the plating thickness on the front and back surfaces of the printed board is different by lowering the ion mobility between the other of the pair of electrodes and the printed board. Through-hole plating method of the substrate, and in a plating tank filled with a plating solution, the other between a pair of electrodes provided in the plating tank A printed circuit board as a pole is arranged, and in a through-hole plating apparatus for a printed circuit board for plating a through hole or the like in the printed circuit board, an adjustment having a through hole between one of the pair of electrodes and the printed circuit board. The present invention provides a through-hole plating apparatus for a printed circuit board, wherein a plating process is performed by interposing a plate.

【0009】[0009]

【発明の実施の形態】図1は、本発明の一実施例の構成
を示したものである。図1は、メッキ槽の側断面形状を
示しており、メッキ槽にはメッキ液が満たされている。
そして、メッキ槽の両側にそれぞれ電極(陽極)a,a
が設けられ、両電極の中間に他方の電極(陰極)として
のプリント基板bが設けられており、電極aの一方とプ
リント基板bとの間に調節板cが配されている。
FIG. 1 shows the configuration of an embodiment of the present invention. FIG. 1 shows a side cross-sectional shape of the plating tank, and the plating tank is filled with a plating solution.
Then, electrodes (anodes) a, a
Is provided, and a printed board b as the other electrode (cathode) is provided between the two electrodes, and an adjustment plate c is provided between one of the electrodes a and the printed board b.

【0010】これにより、2つの陽極をなす電極a,a
と陰極をなすプリント基板bとの間の2つのイオン流動
路を見ると、一方の流動路にはイオン流動性を低くする
ための物体、すなわち調節板が設けられている。このた
め、一方の流動路は、他方のイオン流動路に比べてイオ
ン流動性が低くなっている。
Thus, the electrodes a, a forming two anodes
Looking at the two ion flow paths between the substrate and the printed circuit board b serving as a cathode, one of the flow paths is provided with an object for reducing ion flow, that is, an adjustment plate. For this reason, one flow path has lower ion flowability than the other ion flow path.

【0011】このメッキ装置は、陽極、陰極間で銅イオ
ンを流動させて移動した銅イオンをプリント基板上に堆
積する。この場合、電極a,b間に調節板cが挿入され
ていると、銅イオンの流動量が減じてプリント基板上に
堆積する銅イオン量が減る。
This plating apparatus deposits copper ions, which are moved by flowing copper ions between an anode and a cathode, on a printed circuit board. In this case, when the adjusting plate c is inserted between the electrodes a and b, the amount of copper ions flowing decreases, and the amount of copper ions deposited on the printed circuit board decreases.

【0012】図2は、図1のメッキ装置に用いる調節板
の構造例を示している。この構成例では、2枚の調節板
c1,c2を重ねて用いており、両調節板c1,c2は
相対的に移動可能であり、移動により各調節板c1,c
2に開けられた貫通孔Xの重なり具合が変化する。
FIG. 2 shows an example of the structure of an adjusting plate used in the plating apparatus of FIG. In this configuration example, two adjustment plates c1 and c2 are used in an overlapping manner, and both adjustment plates c1 and c2 are relatively movable, and each of the adjustment plates c1 and c2 is moved by the movement.
The degree of overlap of the through-holes X opened in FIG.

【0013】すなわち、両調節板c1,c2は、同一構
成であるから、両者を完全に重ね合わせれば両者に開け
られた貫通孔X同士が重なり合うから、電極a,b間で
見た場合、貫通孔Xの開口度が最大になる。そして、図
示水平方向に一方の調節板を他方の調節板に対して移動
していくと、貫通孔Xの開口度合いが減じていく。いわ
ば銅イオンの流動量を加減する調整板の役割を果たす。
That is, since the two adjusting plates c1 and c2 have the same structure, if the two are completely overlapped, the through-holes X formed in the two overlap with each other. The opening degree of the hole X is maximized. Then, as one adjustment plate is moved relative to the other adjustment plate in the horizontal direction in the drawing, the degree of opening of the through-hole X decreases. In other words, it acts as an adjusting plate for adjusting the flow rate of copper ions.

【0014】(実測例)陽極として、直径20cm、長
さ130cmのチタン製の円筒状の2つの籠を用意し、
これらの籠中にそれぞれ直径8cmの銅球を適当数充填
する。そして、これら陽極をメッキ槽内の対角位置に設
ける。メッキ槽の中央には、陰極としてのプリント基板
を配する。
(Actual Measurement Example) Two titanium cylindrical baskets each having a diameter of 20 cm and a length of 130 cm were prepared as anodes.
These baskets are each filled with an appropriate number of copper balls having a diameter of 8 cm. Then, these anodes are provided at diagonal positions in the plating tank. At the center of the plating tank, a printed circuit board as a cathode is arranged.

【0015】このときの陽電極とプリント基板との距離
は、約30cmとなるように設定される。そして、図2
に示された2枚の調節板c1,c2を、陽電極aとプリ
ント基板bとの間に挿入する。調節板c1,c2は、図
2に示すように幅20mmの矩形状の貫通孔を20mm
間隔で配列された構成となっている。メッキ液は、濃度
75g/リットルの硝酸銅液を満たして電極、プリント
基板を完全に没する状態とする。そして、直流電流を通
電してプリント基板に銅メッキを施す。
At this time, the distance between the positive electrode and the printed circuit board is set to be about 30 cm. And FIG.
Are inserted between the positive electrode a and the printed circuit board b. The adjusting plates c1 and c2 each have a rectangular through hole having a width of 20 mm as shown in FIG.
It is configured to be arranged at intervals. The plating solution is filled with a copper nitrate solution having a concentration of 75 g / liter so that the electrodes and the printed board are completely immersed. Then, a direct current is applied to apply copper plating to the printed circuit board.

【0016】図3は、図1のメッキ装置によりメッキ処
理されたプリント基板bの断面構造を示している。この
図3において、最外層A,Bは調節板側銅メッキ層、反
対側銅メッキ層であり、その内側に基板材料銅箔C,C
があり、中心部に絶縁ベース材Dがある。
FIG. 3 shows a sectional structure of a printed circuit board b plated by the plating apparatus of FIG. In FIG. 3, outermost layers A and B are a copper plating layer on the control plate side and a copper plating layer on the opposite side, and the substrate material copper foils C and C
There is an insulating base material D at the center.

【0017】そして、調節板の貫通孔開口率を調節しな
がら直流電流20A/mを35分間流したメッキ処理を
行い、これによって形成された銅メッキ槽A,Bの厚み
を下表に示す。
Then, while adjusting the opening ratio of the through-hole of the adjusting plate, a plating process was performed in which a direct current of 20 A / m 2 was passed for 35 minutes, and the thickness of the copper plating tanks A and B thus formed is shown in the following table. .

【0018】 開口率(%) 調節板側メッキ厚A 反対側メッキ厚B 50(max) 22 27 40 18 26 30 15 28 20 11 26 10 8 28 この実測結果から明らかなように、開口率を加減するこ
とにより調節板側とその反対側とでメッキ厚A,Bを大
幅に異ならせることもできる。
Table opening ratio (%) Adjusting plate side plating thickness A Opposite side plating thickness B 50 (max) 22 27 40 18 26 30 15 28 20 11 26 10 8 28 By adjusting the thickness, the plating thicknesses A and B can be greatly different between the adjustment plate side and the opposite side.

【0019】[0019]

【発明の効果】本発明は上述のように、メッキ液が満た
されたメッキ槽中で、該メッキ槽中に設けられた一対の
電極の間に他方の電極としてのプリント基板を配し、こ
のプリント基板におけるスルーホールなどにメッキ処理
するにつき、一対の電極の一方とプリント基板との間の
イオン流動量と他方の電極とプリント基板との間のイオ
ン流動量とを異ならせるようにしたため、プリント基板
の表裏のメッキ厚みを変えたプリント基板を提供するこ
とができる。
According to the present invention, as described above, a printed circuit board as the other electrode is arranged between a pair of electrodes provided in the plating tank in a plating tank filled with a plating solution. When plating a through hole in a printed circuit board, the amount of ion flow between one of the pair of electrodes and the printed circuit board is made different from the amount of ion flow between the other electrode and the printed circuit board. It is possible to provide a printed board in which the plating thickness on the front and back of the board is changed.

【0020】そして、一対の電極の一方とプリント基板
との間に貫通孔を有する調節板を介挿してメッキ処理を
行なうようにしたため、簡単な構成によってイオン流動
量を変えることができる。
Since the plating process is performed by interposing an adjusting plate having a through hole between one of the pair of electrodes and the printed board, the amount of ion flow can be changed with a simple configuration.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の構成を示す説明図。FIG. 1 is an explanatory diagram showing a configuration of an embodiment of the present invention.

【図2】図1に示す実施例に用いる調節板の構成例を示
す説明図。
FIG. 2 is an explanatory view showing a configuration example of an adjustment plate used in the embodiment shown in FIG.

【図3】図1のメッキ装置によりメッキ処理されたプリ
ント基板bの断面構造を示す断面図。
FIG. 3 is a sectional view showing a sectional structure of a printed circuit board b plated by the plating apparatus of FIG. 1;

【符号の説明】[Explanation of symbols]

a 電極 b プリント基板 c 調節板 X 貫通孔 A 調節板側銅メッキ B 反対側銅メッキ C 基板材料銅メッキ D 絶縁ベース材 a Electrode b Printed circuit board c Adjustment plate X Through hole A Copper plating on adjustment plate side B Copper plating on opposite side C Board material copper plating D Insulation base material

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】メッキ液が満たされたメッキ槽中で、該メ
ッキ槽中に設けられた一対の電極の間に他方の電極とし
てのプリント基板を配し、このプリント基板におけるス
ルーホールなどにメッキ処理するプリント基板のスルー
ホール・メッキ方法において、 物体を介挿することにより前記一対の電極の一方と前記
プリント基板との間のイオン流動性を、前記一対の電極
の他方と前記プリント基板との間のイオン流動性よりも
低くすることにより前記プリント基板の表裏におけるメ
ッキ厚が異なるようにメッキ処理を行なうようにしたこ
とを特徴とするプリント基板のスルーホール・メッキ方
法。
In a plating bath filled with a plating solution, a printed circuit board as the other electrode is disposed between a pair of electrodes provided in the plating bath, and plating is performed on through holes in the printed circuit board. In the through-hole plating method for a printed circuit board to be processed, the ion fluidity between one of the pair of electrodes and the printed circuit board by interposing an object between the other of the pair of electrodes and the printed circuit board. A through-hole plating method for a printed circuit board, wherein the plating treatment is performed so that the plating thickness on the front and back surfaces of the printed circuit board is different by lowering the ion fluidity between the two.
【請求項2】メッキ液が満たされたメッキ槽中で、該メ
ッキ槽中に設けられた一対の電極の間に他方の電極とし
てのプリント基板を配し、このプリント基板におけるス
ルーホールなどにメッキ処理するプリント基板のスルー
ホール・メッキ装置において、 前記一対の電極の一方と前記プリント基板との間に、貫
通孔を有する調節板を介挿してメッキ処理を行なうよう
にしたことを特徴とするプリント基板のスルーホール・
メッキ装置。
2. A printed circuit board as the other electrode is disposed between a pair of electrodes provided in the plating tank in a plating tank filled with a plating solution, and plated through holes and the like in the printed circuit board. In a through-hole plating apparatus for a printed circuit board to be processed, wherein a plating process is performed by interposing an adjustment plate having a through hole between one of the pair of electrodes and the printed circuit board. PCB through-hole
Plating equipment.
【請求項3】請求項1記載のプリント基板のスルーホー
ル・メッキ装置において、 前記調節板は、銅イオン流動量を制限する機能を有する
プリント基板のスルーホール・メッキ装置。
3. The through-hole plating apparatus for a printed circuit board according to claim 1, wherein said adjusting plate has a function of restricting a flow amount of copper ions.
【請求項4】請求項1記載のプリント基板のスルーホー
ル・メッキ装置において、 前記調節板は、相互間が互いに移動可能な複数枚を重ね
て配置してなるプリント基板のスルーホール・メッキ装
置。
4. The through-hole plating apparatus for a printed circuit board according to claim 1, wherein a plurality of said adjusting plates are arranged so as to be mutually movable.
JP2000315450A 2000-10-16 2000-10-16 Method and apparatus for plating through-hole of printed wiring board Pending JP2002121694A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000315450A JP2002121694A (en) 2000-10-16 2000-10-16 Method and apparatus for plating through-hole of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000315450A JP2002121694A (en) 2000-10-16 2000-10-16 Method and apparatus for plating through-hole of printed wiring board

Publications (1)

Publication Number Publication Date
JP2002121694A true JP2002121694A (en) 2002-04-26

Family

ID=18794556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000315450A Pending JP2002121694A (en) 2000-10-16 2000-10-16 Method and apparatus for plating through-hole of printed wiring board

Country Status (1)

Country Link
JP (1) JP2002121694A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006214006A (en) * 2005-02-04 2006-08-17 Hoellmueller Maschinenbau Gmbh Process and apparatus for electrochemical treatment of piece in passing equipment
JP2019056164A (en) * 2017-09-22 2019-04-11 株式会社荏原製作所 Plating apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006214006A (en) * 2005-02-04 2006-08-17 Hoellmueller Maschinenbau Gmbh Process and apparatus for electrochemical treatment of piece in passing equipment
JP2019056164A (en) * 2017-09-22 2019-04-11 株式会社荏原製作所 Plating apparatus
JP7014553B2 (en) 2017-09-22 2022-02-01 株式会社荏原製作所 Plating equipment

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