JP2002118098A5 - - Google Patents

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Publication number
JP2002118098A5
JP2002118098A5 JP2000308749A JP2000308749A JP2002118098A5 JP 2002118098 A5 JP2002118098 A5 JP 2002118098A5 JP 2000308749 A JP2000308749 A JP 2000308749A JP 2000308749 A JP2000308749 A JP 2000308749A JP 2002118098 A5 JP2002118098 A5 JP 2002118098A5
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JP
Japan
Prior art keywords
reaction chamber
plasma generation
recess
processing apparatus
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000308749A
Other languages
English (en)
Japanese (ja)
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JP2002118098A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000308749A priority Critical patent/JP2002118098A/ja
Priority claimed from JP2000308749A external-priority patent/JP2002118098A/ja
Publication of JP2002118098A publication Critical patent/JP2002118098A/ja
Publication of JP2002118098A5 publication Critical patent/JP2002118098A5/ja
Pending legal-status Critical Current

Links

JP2000308749A 2000-10-10 2000-10-10 プラズマ処理装置 Pending JP2002118098A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000308749A JP2002118098A (ja) 2000-10-10 2000-10-10 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000308749A JP2002118098A (ja) 2000-10-10 2000-10-10 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2002118098A JP2002118098A (ja) 2002-04-19
JP2002118098A5 true JP2002118098A5 (enrdf_load_stackoverflow) 2005-04-14

Family

ID=18789007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000308749A Pending JP2002118098A (ja) 2000-10-10 2000-10-10 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP2002118098A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4060684B2 (ja) 2002-10-29 2008-03-12 日本発条株式会社 ステージ
JP2006194303A (ja) * 2005-01-12 2006-07-27 Nok Corp 耐プラズマ用シール
JP5233082B2 (ja) * 2006-05-17 2013-07-10 東洋製罐グループホールディングス株式会社 プラズマ処理装置
CN101680090B (zh) * 2007-06-19 2012-11-07 东京毅力科创株式会社 真空处理装置
TWI494030B (zh) * 2008-07-07 2015-07-21 Lam Res Corp 供使用於電漿處理腔室中之含真空間隙的面向電漿之探針裝置
JP5534154B2 (ja) * 2008-12-03 2014-06-25 Ｎｏｋ株式会社 配水管継手の密封構造
CN103874316B (zh) * 2014-03-24 2016-05-11 青岛科技大学 一种实验室用感应等离子处理设备的设计
TWM503056U (zh) * 2014-07-24 2015-06-11 Wen-Hsin Chiang 用於電漿反應裝置之襯套單元
JP6812237B2 (ja) * 2016-03-29 2021-01-13 Ｓｐｐテクノロジーズ株式会社 プラズマ処理装置
WO2025074557A1 (ja) * 2023-10-05 2025-04-10 株式会社Kokusai Electric 基板処理装置、基板処理方法、半導体装置の製造方法及びプログラム

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