JP2002097193A - Method for purifying organophosphonic acid - Google Patents

Method for purifying organophosphonic acid

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Publication number
JP2002097193A
JP2002097193A JP2000285427A JP2000285427A JP2002097193A JP 2002097193 A JP2002097193 A JP 2002097193A JP 2000285427 A JP2000285427 A JP 2000285427A JP 2000285427 A JP2000285427 A JP 2000285427A JP 2002097193 A JP2002097193 A JP 2002097193A
Authority
JP
Japan
Prior art keywords
acid
ppm
aqueous solution
phosphonic acid
organic phosphonic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000285427A
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Japanese (ja)
Other versions
JP4508394B2 (en
Inventor
Hiroya Watanabe
広也 渡邊
Hideko Kuwabara
英子 桑原
Kazunari Tanaka
一成 田中
Shoichi Nito
祥一 仁藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
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Filing date
Publication date
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Priority to JP2000285427A priority Critical patent/JP4508394B2/en
Publication of JP2002097193A publication Critical patent/JP2002097193A/en
Application granted granted Critical
Publication of JP4508394B2 publication Critical patent/JP4508394B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an organophosphonic acid of low metallic impurity contents. SOLUTION: The objective method for purifying an organophosphonic acid is characterized by comprising contacting the organophosphonic acid having in the molecule at least one phosphonic acid group or salt thereof with a strongly acidic cation exchange resin.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、有機ホスホン酸の
精製方法に関するものである。
TECHNICAL FIELD The present invention relates to a method for purifying an organic phosphonic acid.

【0002】[0002]

【従来の技術】有機ホスホン酸類は、金属イオンのキレ
ート化剤として周知であり、スケール除去剤や微量の金
属の存在により分解する過酸化物の安定化剤として広く
用いられているほか、そのキレート化能を利用して多様
な分野に応用されている。
2. Description of the Related Art Organic phosphonic acids are well known as chelating agents for metal ions, and are widely used as descaling agents and stabilizers for peroxides decomposed by the presence of trace amounts of metals. It has been applied to various fields using chemical abilities.

【0003】有機ホスホン酸の製造方法としては、塩酸
酸性下、アンモニアまたはアミン、アルデヒドまたはケ
トンおよびホスホン酸からアミノアルキレンホスホン酸
を得る方法(米国特許3,288,846号、Journal of
Organic Chemistry 第31巻1603頁)などが知ら
れている。
As a method for producing an organic phosphonic acid, a method for obtaining an aminoalkylenephosphonic acid from ammonia or an amine, an aldehyde or a ketone and a phosphonic acid under hydrochloric acid acidity (US Pat. No. 3,288,846, Journal of Japan)
Organic Chemistry, Vol. 31, p. 1603) and the like are known.

【0004】しかしながら、一般的な方法により製造し
た場合や市販品として入手した有機ホスホン酸は、原料
や反応装置から持ちこまれる金属として、Feなどの重
金属、Naなどのアルカリ金属、Caなどのアルカリ土
類金属などの不純物を少ない場合でも1ppm以上、多
い場合には100ppm以上含んでいることがほとんど
である。このような微量の金属不純物を含む有機ホスホ
ン酸は、電子工業や医療関連分野などのある特定の用途
に使用する上で、金属不純物により悪影響を受ける場合
がある。
[0004] However, organic phosphonic acids produced by a general method or obtained as a commercial product include heavy metals such as Fe, alkali metals such as Na, and alkaline earths such as Ca as metals brought in from raw materials and reactors. In most cases, impurities such as metals are contained at least 1 ppm, and at most 100 ppm or more. Organic phosphonic acids containing such trace amounts of metal impurities may be adversely affected by metal impurities when used in certain applications such as the electronics industry and medical-related fields.

【0005】有機ホスホン酸から金属を除去する手段と
して、有機ホスホン酸水溶液に酸を加え、有機ホスホン
酸を固体の酸として晶出分離する方法が可能である。し
かし、多くの有機ホスホン酸は種々の金属との親和性が
非常に高く、すでに述べたような微量の金属不純物を除
去することは困難であり、有効な方法は提案されていな
い。
As a means for removing the metal from the organic phosphonic acid, there is a method in which an acid is added to an aqueous solution of the organic phosphonic acid, and the organic phosphonic acid is crystallized and separated as a solid acid. However, many organic phosphonic acids have very high affinity for various metals, and it is difficult to remove a trace amount of metal impurities as described above, and no effective method has been proposed.

【0006】[0006]

【発明が解決しようとする課題】本発明は、従来技術に
おける上記のような問題を解決し、金属不純物含量が極
めて少ない有機ホスホン酸を提供することにある。
An object of the present invention is to solve the above-mentioned problems in the prior art and to provide an organic phosphonic acid having a very low content of metal impurities.

【0007】[0007]

【課題を解決するための手段】本発明者らは、有機ホス
ホン酸を強酸性陽イオン交換樹脂に接触させることによ
り、微量の金属不純物を除去できることを見出し、本発
明に到達した。すなわち、本発明は、分子内に1つ以上
のホスホン酸基またはその塩を有する有機ホスホン酸を
強酸性陽イオン交換樹脂に接触させることを特徴とする
有機ホスホン酸の精製方法に関するものである。また、
さらに精製度を上げるために、有機ホスホン酸水溶液を
電気透析させる工程と組み合わせてもよい。
Means for Solving the Problems The present inventors have found that trace amounts of metal impurities can be removed by bringing an organic phosphonic acid into contact with a strongly acidic cation exchange resin, and have reached the present invention. That is, the present invention relates to a method for purifying an organic phosphonic acid, which comprises contacting an organic phosphonic acid having at least one phosphonic acid group or a salt thereof in a molecule with a strongly acidic cation exchange resin. Also,
In order to further increase the degree of purification, the organic phosphonic acid aqueous solution may be combined with a step of electrodialysis.

【0008】[0008]

【発明の実施の形態】本発明の有機ホスホン酸は、分子
内に少なくとも1つ以上のホスホン酸基またはその塩を
含む化合物であり、具体的には、メチルジホスホン酸、
エチリデンジホスホン酸、1−ヒドロキシエチリデン−
1,1−ジホスホン酸、1−ヒドロキシプロピリデン−
1,1−ジホスホン酸、1−ヒドロキシブチリデン−
1,1−ジホスホン酸、エチルアミノビス(メチレンホ
スホン酸)、ドデシルアミノビス(メチレンホスホン
酸)、エチレンジアミンビス(メチレンホスホン酸)、
アミノトリ(メチレンホスホン酸)、エチレンジアミン
テトラ(メチレンホスホン酸)、1,2−プロピレンジ
アミンテトラ(メチレンホスホン酸)、ヘキサメチレン
ジアミンテトラ(メチレンホスホン酸)、シクロヘキサ
ンジアミンテトラ(メチレンホスホン酸)、グリコール
エーテルジアミンテトラ(メチレンホスホン酸)、ジエ
チレントリアミンペンタ(メチレンホスホン酸)、トリ
エチレンテトラミンヘキサ(メチレンホスホン酸)、ト
リ(2−アミノエチル)アミンヘキサ(メチレンホスホ
ン酸)、テトラエチレンペンタミンヘプタ(メチレンホ
スホン酸)、ペンタエチレンヘキサミンオクタ(メチレ
ンホスホン酸)、および、これらの塩、並びに、これら
の酸化体が挙げられる。
BEST MODE FOR CARRYING OUT THE INVENTION The organic phosphonic acid of the present invention is a compound containing at least one phosphonic acid group or a salt thereof in a molecule, and specifically includes methyldiphosphonic acid,
Ethylidene diphosphonic acid, 1-hydroxyethylidene-
1,1-diphosphonic acid, 1-hydroxypropylidene-
1,1-diphosphonic acid, 1-hydroxybutylidene-
1,1-diphosphonic acid, ethylaminobis (methylenephosphonic acid), dodecylaminobis (methylenephosphonic acid), ethylenediaminebis (methylenephosphonic acid),
Amino tri (methylene phosphonic acid), ethylene diamine tetra (methylene phosphonic acid), 1,2-propylene diamine tetra (methylene phosphonic acid), hexamethylene diamine tetra (methylene phosphonic acid), cyclohexane diamine tetra (methylene phosphonic acid), glycol ether diamine Tetra (methylenephosphonic acid), diethylenetriaminepenta (methylenephosphonic acid), triethylenetetraminehexa (methylenephosphonic acid), tri (2-aminoethyl) aminehexa (methylenephosphonic acid), tetraethylenepentaminehepta (methylenephosphonic acid), Pentaethylenehexamine octa (methylene phosphonic acid), and salts thereof, and oxidized forms thereof are included.

【0009】有機ホスホン酸は、一般に水溶液として強
酸性陽イオン交換樹脂に接触させる。有機ホスホン酸の
水への溶解度はそれぞれの化合物で異なり、広範囲にわ
たるが、有機ホスホン酸が沈殿しない均一な溶液である
ことが好ましい。
[0009] The organic phosphonic acid is generally brought into contact with a strongly acidic cation exchange resin as an aqueous solution. The solubility of the organic phosphonic acid in water is different for each compound and is wide, but a homogeneous solution in which the organic phosphonic acid does not precipitate is preferable.

【0010】強酸性陽イオン交換樹脂は、機械的、化学
的に安定な母体により構成されていることが好ましく、
たとえば、スチレン−ジビニルベンゼン共重合体を母体
としたものを好適に用いることができる。そして、強酸
性陽イオン交換樹脂は、スルホン酸基またはその塩に代
表される強酸性基を有するものであり、市販品として、
オルガノ株式会社製のアンバーライトIR120B、2
01Bや三菱化学株式会社製のダイヤイオンSK1B、
PK212がある。
The strongly acidic cation exchange resin is preferably composed of a mechanically and chemically stable matrix.
For example, a material based on a styrene-divinylbenzene copolymer can be suitably used. And a strongly acidic cation exchange resin has a strongly acidic group represented by a sulfonic acid group or a salt thereof, and as a commercially available product,
Organo Corporation Amberlite IR120B, 2
01B and Diaion SK1B manufactured by Mitsubishi Chemical Corporation,
There is a PK212.

【0011】これらの強酸性陽イオン交換樹脂は、一般
に、酸性基がナトリウム塩の形態で市販されているた
め、酸の水溶液と接触させて酸性基を水素型に変換し、
水洗した後に有機ホスホン酸と接触させる。用いる酸の
種類および濃度、水洗方法に特に制限はなく、塩酸や硫
酸などの酸の水溶液と強酸性陽イオン交換樹脂をバッチ
式または流通式で接触させた後、同様の方法で水と強酸
性陽イオン交換樹脂を接触させればよい。このとき、水
洗に用いる水が金属を含んでいると、金属はイオン交換
樹脂に吸着され、水素型の酸性基が金属塩型に変化する
ため、イオン交換水や超純水のように金属含量が極めて
低いものを用いることが好ましい。
Since these strongly acidic cation exchange resins are generally available in the form of a sodium salt in the form of an acidic group, they are brought into contact with an aqueous solution of an acid to convert the acidic group into a hydrogen form.
After washing with water, it is brought into contact with an organic phosphonic acid. There are no particular restrictions on the type and concentration of the acid to be used, and the method of washing with water is not particularly limited. What is necessary is just to contact a cation exchange resin. At this time, if the water used for washing contains a metal, the metal is adsorbed by the ion exchange resin, and the acidic group of the hydrogen type is changed to the metal salt type. Is preferably used.

【0012】有機ホスホン酸と強酸性陽イオン交換樹脂
を接触させる方法としては、(1)有機ホスホン酸水溶
液に強酸性陽イオン交換樹脂を浸漬する方法、(2)強
酸性陽イオン交換樹脂を充填した充填塔に有機ホスホン
酸水溶液を通液する方法等がある。
The method for bringing the organic phosphonic acid into contact with the strongly acidic cation exchange resin includes (1) a method of dipping the strongly acidic cation exchange resin in an aqueous solution of the organic phosphonic acid, and (2) a filling of the strongly acidic cation exchange resin. And a method of passing an organic phosphonic acid aqueous solution through a packed column.

【0013】(1)の方法では有機ホスホン酸水溶液や
強酸性陽イオン交換樹脂を撹拌等の方法で流動させ、両
者の接触効率を高くすることができる。(2)の方法で
は通液速度に特に制限はないが、空間速度0.5から5
0/時間で通液することが好ましい。
In the method (1), an organic phosphonic acid aqueous solution or a strongly acidic cation exchange resin is caused to flow by a method such as stirring, so that the contact efficiency between the two can be increased. In the method (2), the liquid passing speed is not particularly limited, but the space velocity is 0.5 to 5
It is preferable to pass the solution at 0 / hour.

【0014】いずれの方法においても、接触させる場合
の温度に制限はないが、有機ホスホン酸は一般に水溶液
として強酸性陽イオン交換樹脂と接触させるため、10
〜90℃で接触させることが好ましい。
In any of the methods, the temperature for contacting is not limited. However, since organic phosphonic acid is generally brought into contact with a strongly acidic cation exchange resin as an aqueous solution, it is difficult to use an organic phosphonic acid.
It is preferred that the contact be made at a temperature of up to 90 ° C.

【0015】強酸性陽イオン交換樹脂は、使用に伴い金
属吸着能が低下する。その場合、酸の水溶液と接触さ
せ、金属塩となった酸性基を水素型に変換した後、水洗
して、繰り返し使用できる。酸の水溶液を接触させる方
法、用いる酸の種類および濃度、水洗方法に特に制限は
なく、市販の強酸性陽イオン交換樹脂を水素型に変換す
る場合と同様の方法で行うことができる。
[0015] The use of a strongly acidic cation exchange resin decreases the metal adsorption capacity with use. In that case, after contacting with an aqueous solution of an acid to convert the acidic group that has become a metal salt into a hydrogen form, it can be washed with water and used repeatedly. There is no particular limitation on the method of contacting the aqueous acid solution, the type and concentration of the acid used, and the washing method, and the method can be carried out in the same manner as in the case of converting a commercially available strongly acidic cation exchange resin into a hydrogen form.

【0016】[0016]

【実施例】以下に本発明を実施例によって詳細に説明す
るが、本発明は実施例によって制限されるものでない。
なお、有機ホスホン酸水溶液中の金属濃度はICP発光
分析により求めた。
EXAMPLES The present invention will be described below in detail with reference to examples, but the present invention is not limited to the examples.
The metal concentration in the organic phosphonic acid aqueous solution was determined by ICP emission analysis.

【0017】実施例1 強酸性陽イオン交換樹脂アンバーライトIR120Bを
50mL充填したカラムに1N硫酸水溶液を空間速度5
/時間で3時間通液して水素型に変換した後、イオン交
換水を通液し水洗した。その後、樹脂を取り出し、5.
0重量%のアミノトリ(メチレンホスホン酸)水溶液3
00mL中に浸漬、静置した。樹脂と接触させる前の水
溶液は、ナトリウム0.40ppm、カルシウム1.3
3ppm、マグネシウム0.18ppmを含んでいた。
24時間経過した後の水溶液は、ナトリウム0.08p
pm、カルシウム0.07ppmを含み、マグネシウム
濃度は0.05ppm以下であった。
Example 1 A 1N aqueous sulfuric acid solution was charged at a space velocity of 5 into a column packed with 50 mL of strongly acidic cation exchange resin Amberlite IR120B.
/ Hour for 3 hours to convert to the hydrogen form, and then ion-exchanged water was passed through and washed. Thereafter, the resin is taken out.
0% by weight aqueous aminotri (methylenephosphonic acid) solution 3
It was immersed in 00 mL and allowed to stand. The aqueous solution before contact with the resin was 0.40 ppm sodium, 1.3% calcium.
It contained 3 ppm and 0.18 ppm of magnesium.
After 24 hours, the aqueous solution contains sodium 0.08p
pm, containing 0.07 ppm of calcium and a magnesium concentration of 0.05 ppm or less.

【0018】実施例2 強酸性陽イオン交換樹脂アンバーライトIR120Bを
50mL充填したカラムに1N硫酸水溶液を空間速度5
/時間で3時間通液して水素型に変換した後、イオン交
換水を通液し水洗した。その後、5.0重量%のアミノ
トリ(メチレンホスホン酸)水溶液300mLを空間速
度10/時間で通液した。通液前の水溶液は、ナトリウ
ム0.40ppm、カルシウム1.33ppm、マグネ
シウム0.18ppmを含んでいた。通液後の水溶液の
ナトリウム、カルシウム、マグネシウム濃度は、いずれ
も0.05ppm以下であった。
Example 2 A column filled with 50 mL of strongly acidic cation exchange resin Amberlite IR120B was charged with a 1N aqueous sulfuric acid solution at a space velocity of 5%.
/ Hour for 3 hours to convert to the hydrogen form, and then ion-exchanged water was passed through and washed. Thereafter, 300 mL of a 5.0% by weight aqueous solution of aminotri (methylenephosphonic acid) was passed at a space velocity of 10 / hour. The aqueous solution before the passage contained 0.40 ppm of sodium, 1.33 ppm of calcium, and 0.18 ppm of magnesium. The sodium, calcium, and magnesium concentrations of the aqueous solution after the passage were all 0.05 ppm or less.

【0019】実施例3 強酸性陽イオン交換樹脂ダイヤイオンPK212を50
mL充填したカラムに1N硫酸水溶液を空間速度5/時
間で3時間通液して水素型に変換した後、イオン交換水
を通液し水洗した。その後、5.0重量%のアミノトリ
(メチレンホスホン酸)水溶液300mLを空間速度1
0/時間で通液した。通液前の水溶液は、ナトリウム
0.40ppm、カルシウム1.33ppm、マグネシ
ウム0.18ppmを含んでいた。通液後の水溶液のナ
トリウム、カルシウム、マグネシウム濃度は、いずれも
0.05ppm以下であった。
EXAMPLE 3 50 strongly acidic cation exchange resin DIAION PK212
After a 1N aqueous sulfuric acid solution was passed through the column packed with mL at a space velocity of 5 / hour for 3 hours to convert to a hydrogen form, ion-exchanged water was passed through and washed with water. Thereafter, 300 mL of a 5.0 wt% aqueous solution of aminotri (methylenephosphonic acid) was added at a space velocity of 1%.
The solution was passed at 0 / hour. The aqueous solution before the passage contained 0.40 ppm of sodium, 1.33 ppm of calcium, and 0.18 ppm of magnesium. The sodium, calcium, and magnesium concentrations of the aqueous solution after the passage were all 0.05 ppm or less.

【0020】比較例1 三菱化学株式会社製の弱酸性陽イオン交換樹脂ダイヤイ
オンWK40を50mL充填したカラムにイオン交換水
を通液し水洗した。その後、5.0重量%のアミノトリ
(メチレンホスホン酸)水溶液300mLを空間速度1
0/時間で通液した。通液前の水溶液は、ナトリウム
0.40ppm、カルシウム1.33ppm、マグネシ
ウム0.18ppmを含んでいた。通液後の水溶液は、
ナトリウム0.31ppm、カルシウム1.35pp
m、マグネシウム0.18ppmを含んでいた。
Comparative Example 1 Ion-exchanged water was passed through a column packed with 50 mL of weakly acidic cation exchange resin Diaion WK40 manufactured by Mitsubishi Chemical Corporation to wash it. Thereafter, 300 mL of a 5.0 wt% aqueous solution of aminotri (methylenephosphonic acid) was added at a space velocity of 1%.
The solution was passed at 0 / hour. The aqueous solution before the passage contained 0.40 ppm of sodium, 1.33 ppm of calcium, and 0.18 ppm of magnesium. After passing the aqueous solution,
0.31 ppm of sodium, 1.35 pp of calcium
m, 0.18 ppm of magnesium.

【0021】比較例2 三菱化学株式会社製のキレート樹脂ダイヤイオンCR1
1を50mL充填したカラムに1N硫酸水溶液を空間速
度5/時間で3時間通液して水素型に変換した後、イオ
ン交換水を通液し水洗した。その後、5.0重量%のア
ミノトリ(メチレンホスホン酸)水溶液300mLを空
間速度10/時間で通液した。通液前の水溶液は、ナト
リウム0.40ppm、カルシウム1.33ppm、マ
グネシウム0.18ppmを含んでいた。通液後の水溶
液は、ナトリウム0.25ppm、カルシウム1.15
ppm、マグネシウム0.14ppmを含んでいた。
Comparative Example 2 Chelate resin Diaion CR1 manufactured by Mitsubishi Chemical Corporation
1N sulfuric acid aqueous solution was passed through a column packed with 50 mL of 1 at a space velocity of 5 / hour for 3 hours to convert into a hydrogen form, and then ion-exchanged water was passed through and washed with water. Thereafter, 300 mL of a 5.0% by weight aqueous solution of aminotri (methylenephosphonic acid) was passed at a space velocity of 10 / hour. The aqueous solution before the passage contained 0.40 ppm of sodium, 1.33 ppm of calcium, and 0.18 ppm of magnesium. The aqueous solution after the passage was 0.25 ppm of sodium and 1.15 ppm of calcium.
ppm and 0.14 ppm of magnesium.

【0022】実施例4 強酸性陽イオン交換樹脂アンバーライトIR120Bを
50mL充填したカラムに1N硫酸水溶液を空間速度5
/時間で3時間通液して水素型に変換した後、イオン交
換水を通液し水洗した。その後、2.0重量%のエチレ
ンジアミンテトラ(メチレンホスホン酸)水溶液300
mLを空間速度10/時間で通液した。通液前の水溶液
は、ナトリウム0.27ppm、カルシウム0.59p
pmを含んでいた。通液後の水溶液のナトリウム、カル
シウム濃度は、いずれも0.05ppm以下であった。
Example 4 A 1N aqueous sulfuric acid solution was charged at a space velocity of 5 into a column packed with 50 mL of strongly acidic cation exchange resin Amberlite IR120B.
/ Hour for 3 hours to convert to the hydrogen form, and then ion-exchanged water was passed through and washed. Thereafter, a 2.0% by weight aqueous solution of ethylenediaminetetra (methylenephosphonic acid) 300
mL was passed at a space velocity of 10 / hour. The aqueous solution before passing was 0.27 ppm of sodium and 0.59 p of calcium.
pm. The sodium and calcium concentrations of the aqueous solution after the passage were both 0.05 ppm or less.

【0023】実施例5 強酸性陽イオン交換樹脂アンバーライトIR120Bを
50mL充填したカラムに1N硫酸水溶液を空間速度5
/時間で3時間通液して水素型に変換した後、イオン交
換水を通液し水洗した。その後、5.0重量%のジエチ
レントリアミンペンタ(メチレンホスホン酸)水溶液3
00mLを空間速度10/時間で通液した。通液前の水
溶液は、ナトリウム3.23ppm、カルシウム4.4
7ppm、マグネシウム0.21ppm、亜鉛0.09
ppmを含んでいた。通液後の水溶液のナトリウム、カ
ルシウム、マグネシウム、および亜鉛濃度は、いずれも
0.05ppm以下であった。
Example 5 A column filled with 50 mL of strongly acidic cation exchange resin Amberlite IR120B was charged with a 1N aqueous solution of sulfuric acid at a space velocity of 5 mL.
/ Hour for 3 hours to convert to the hydrogen form, and then ion-exchanged water was passed through and washed. Thereafter, a 5.0% by weight aqueous solution of diethylenetriaminepenta (methylenephosphonic acid) 3
00 mL was passed at a space velocity of 10 / hour. The aqueous solution before passing was 3.23 ppm sodium and 4.4 calcium.
7 ppm, magnesium 0.21 ppm, zinc 0.09
ppm. The sodium, calcium, magnesium, and zinc concentrations of the aqueous solution after the passage were all 0.05 ppm or less.

【0024】[0024]

【発明の効果】本発明の方法により、金属不純物含量が
極めて少ない有機ホスホン酸を得ることができる。
According to the method of the present invention, an organic phosphonic acid having a very low content of metal impurities can be obtained.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 仁藤 祥一 東京都葛飾区新宿6丁目1番1号 三菱瓦 斯化学株式 会社 東京研究所内 Fターム(参考) 4H050 AA02 AD17  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Shoichi Nito 6-1-1 Shinjuku, Katsushika-ku, Tokyo Mitsubishi Gas Chemical Co., Ltd. Tokyo Research Laboratory F-term (reference) 4H050 AA02 AD17

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 分子内に1つ以上のホスホン酸基または
その塩を有する有機ホスホン酸を強酸性陽イオン交換樹
脂に接触させることを特徴とする有機ホスホン酸の精製
方法。
1. A method for purifying an organic phosphonic acid, comprising contacting an organic phosphonic acid having at least one phosphonic acid group or a salt thereof in a molecule with a strongly acidic cation exchange resin.
【請求項2】 有機ホスホン酸がアミノトリ(メチレン
ホスホン酸)、エチレンジアミンテトラ(メチレンホス
ホン酸)、1,2−プロピレンジアミンテトラ(メチレ
ンホスホン酸)、またはジエチレントリアミンペンタ
(メチレンホスホン酸)である請求項1記載の精製方
法。
2. The organic phosphonic acid is aminotri (methylenephosphonic acid), ethylenediaminetetra (methylenephosphonic acid), 1,2-propylenediaminetetra (methylenephosphonic acid) or diethylenetriaminepenta (methylenephosphonic acid). Purification method as described.
JP2000285427A 2000-09-20 2000-09-20 Purification method of organic phosphonic acid Expired - Lifetime JP4508394B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006055441A1 (en) * 2004-11-12 2006-05-26 Monsanto Technology Llc Recovery of noble metals from aqueous process streams in the synthesis of glyphosate using adsorption media such as ion exchange resins
JP2007022956A (en) * 2005-07-15 2007-02-01 Mitsubishi Gas Chem Co Inc Method for producing high purity aminomethylene phosphonic acid
JP2007291002A (en) * 2006-04-24 2007-11-08 Mitsubishi Gas Chem Co Inc Method for producing high-purity aminomethylenephosphonic acid
JP2012206950A (en) * 2011-03-29 2012-10-25 Kemikurea:Kk Method for purifying horner-wadsworth-emmons reagent

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197254A (en) * 1976-05-03 1980-04-08 Monsanto Company Derivatives of N-phosphonomethylglycine

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006055441A1 (en) * 2004-11-12 2006-05-26 Monsanto Technology Llc Recovery of noble metals from aqueous process streams in the synthesis of glyphosate using adsorption media such as ion exchange resins
US7687663B2 (en) 2004-11-12 2010-03-30 Monsanto Technology Llc Recovery of noble metals from aqueous process streams
JP2007022956A (en) * 2005-07-15 2007-02-01 Mitsubishi Gas Chem Co Inc Method for producing high purity aminomethylene phosphonic acid
JP2007291002A (en) * 2006-04-24 2007-11-08 Mitsubishi Gas Chem Co Inc Method for producing high-purity aminomethylenephosphonic acid
JP2012206950A (en) * 2011-03-29 2012-10-25 Kemikurea:Kk Method for purifying horner-wadsworth-emmons reagent

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