JP2002076083A5 - - Google Patents
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- JP2002076083A5 JP2002076083A5 JP2001180492A JP2001180492A JP2002076083A5 JP 2002076083 A5 JP2002076083 A5 JP 2002076083A5 JP 2001180492 A JP2001180492 A JP 2001180492A JP 2001180492 A JP2001180492 A JP 2001180492A JP 2002076083 A5 JP2002076083 A5 JP 2002076083A5
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001180492A JP4642276B2 (ja) | 2000-06-16 | 2001-06-14 | 半導体装置の製造方法及び記録媒体 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000181097 | 2000-06-16 | ||
JP2000-181097 | 2000-06-16 | ||
JP2001180492A JP4642276B2 (ja) | 2000-06-16 | 2001-06-14 | 半導体装置の製造方法及び記録媒体 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002076083A JP2002076083A (ja) | 2002-03-15 |
JP2002076083A5 true JP2002076083A5 (enrdf_load_stackoverflow) | 2008-01-31 |
JP4642276B2 JP4642276B2 (ja) | 2011-03-02 |
Family
ID=26594072
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001180492A Expired - Fee Related JP4642276B2 (ja) | 2000-06-16 | 2001-06-14 | 半導体装置の製造方法及び記録媒体 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4642276B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7099005B1 (en) * | 2000-09-27 | 2006-08-29 | Kla-Tencor Technologies Corporation | System for scatterometric measurements and applications |
US7271901B2 (en) | 2001-05-22 | 2007-09-18 | Horiba, Ltd. | Thin-film characteristic measuring method using spectroellipsometer |
JP2003347229A (ja) | 2002-05-31 | 2003-12-05 | Renesas Technology Corp | 半導体装置の製造方法および半導体装置 |
US7224471B2 (en) | 2003-10-28 | 2007-05-29 | Timbre Technologies, Inc. | Azimuthal scanning of a structure formed on a semiconductor wafer |
US20090078309A1 (en) * | 2007-09-24 | 2009-03-26 | Emcore Corporation | Barrier Layers In Inverted Metamorphic Multijunction Solar Cells |
JP4696037B2 (ja) * | 2006-09-01 | 2011-06-08 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体装置 |
US9410890B2 (en) * | 2012-03-19 | 2016-08-09 | Kla-Tencor Corporation | Methods and apparatus for spectral luminescence measurement |
JP6591377B2 (ja) * | 2015-10-08 | 2019-10-16 | 株式会社ニューフレアテクノロジー | 気相成長速度測定装置、気相成長装置および成長速度検出方法 |
CN115791634A (zh) * | 2015-11-05 | 2023-03-14 | 米朋克斯株式会社 | 基板评价方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0540087A (ja) * | 1991-08-08 | 1993-02-19 | Fujitsu Ltd | 半導体中の元素濃度の測定および制御方法 |
JP2000009553A (ja) * | 1998-06-26 | 2000-01-14 | Toshiba Corp | 薄膜評価装置、薄膜評価方法、半導体シミュレーション装置、半導体シミュレーション方法、薄膜評価プログラムを格納したコンピュータ読み取り可能な記録媒体、及びシミュレーションプログラムを格納したコンピュータ読み取り可能な記録媒体 |
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2001
- 2001-06-14 JP JP2001180492A patent/JP4642276B2/ja not_active Expired - Fee Related