JP2002060980A - Surface roughening treating solution for copper and copper alloy - Google Patents

Surface roughening treating solution for copper and copper alloy

Info

Publication number
JP2002060980A
JP2002060980A JP2000251733A JP2000251733A JP2002060980A JP 2002060980 A JP2002060980 A JP 2002060980A JP 2000251733 A JP2000251733 A JP 2000251733A JP 2000251733 A JP2000251733 A JP 2000251733A JP 2002060980 A JP2002060980 A JP 2002060980A
Authority
JP
Japan
Prior art keywords
copper
weight
acid
surface roughening
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000251733A
Other languages
Japanese (ja)
Inventor
Ritsuo Abe
律雄 阿部
Hiroshi Igarashi
浩 五十嵐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Peroxide Co Ltd
Original Assignee
Nippon Peroxide Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Peroxide Co Ltd filed Critical Nippon Peroxide Co Ltd
Priority to JP2000251733A priority Critical patent/JP2002060980A/en
Publication of JP2002060980A publication Critical patent/JP2002060980A/en
Pending legal-status Critical Current

Links

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  • Manufacturing Of Printed Wiring (AREA)
  • ing And Chemical Polishing (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a surface roughening treating solution for copper surfaces for firmly adhering a copper surface and a high polymer material in the production of a printed wiring board or the like. SOLUTION: This surface roughening treating solution for copper and copper alloys contains hydrogen peroxide, inorganic acid, azoles such as benzotriazole and at least one kind of organic acid selected from glycolic acid, malonic acid and glutaric acid.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は銅表面の粗面化処理
液に関し、更に詳細には、プリント配線板、特に多層プ
リント配線板の製造に際して、銅表面とプリプレグ等の
高分子材料との接着性を強固にするための銅表面の粗面
化処理液に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper surface roughening solution, and more particularly, to the bonding of a copper surface to a polymer material such as a prepreg when manufacturing a printed wiring board, particularly a multilayer printed wiring board. The present invention relates to a copper surface roughening treatment liquid for strengthening properties.

【0002】[0002]

【従来の技術】多層プリント配線板は回路形成を行なっ
た内装材に、外装材、プリプレグ等を積層して加熱加圧
させ、一体化したものにスルーホールを形成し、メッ
キ、外装回路形成を行なって製造される。この工程で、
各層の接着性を改善するために内装銅箔表面を粗面化す
ることが行われている。
2. Description of the Related Art A multilayer printed wiring board is formed by laminating an exterior material, a prepreg, etc. on an interior material on which a circuit is formed, heating and pressurizing, forming a through hole in the integrated product, plating, and forming an exterior circuit. Manufactured in line. In this process,
In order to improve the adhesiveness of each layer, the surface of the interior copper foil is roughened.

【0003】粗面化方法としては、通常、黒化処理と呼
ばれる、酸化銅の層を形成するために亜塩素酸ナトリウ
ム等による酸化処理が行われている。しかし、黒化処理
には、スルーホール形成後のメッキ工程で、メッキ液が
しみこみ酸化銅がとけるという現象(ピンクリング)が
発生し易いという欠点があり、ピンクリングが発生しな
い内装銅箔の処理方法が検討されている。
As a roughening method, an oxidation treatment with sodium chlorite or the like is usually performed to form a copper oxide layer, which is called a blackening treatment. However, the blackening treatment has a disadvantage that the plating solution soaks in the plating process after the formation of the through-holes and the phenomenon that the copper oxide melts (pink ring) easily occurs. A method is being considered.

【0004】特開平10−96088号公報には、オキ
ソ酸、過酸化物、アゾール及びハロゲン化物を含むエッ
チング液で銅表面をエッチングする方法が、また、特開
平11−21517号公報には、酸化剤、酸、ハライド
イオン源(特にクロライドイオン)及び任意に水溶性ポ
リマーからなる接着促進組成物を金属表面と接触させ
て、金属表面上に微少な粗さをもつ変換被覆表面を生成
させる方法が示されている。しかしながら、上記のよう
にハロゲン化物を含有する組成のものは、ハロゲンイオ
ン濃度によって銅の溶解速度が急激に変化するため、そ
の溶解速度を一定に維持することが困難であることが指
摘されている。
JP-A-10-96088 discloses a method of etching a copper surface with an etching solution containing oxo acid, peroxide, azole and halide, and JP-A-11-21517 discloses a method of etching a copper surface. A method of contacting an adhesion-promoting composition comprising an agent, an acid, a source of halide ions (especially chloride ions) and optionally a water-soluble polymer with a metal surface to produce a converted coated surface having a minute roughness on the metal surface. It is shown. However, it has been pointed out that in the composition containing a halide as described above, the dissolution rate of copper rapidly changes depending on the halide ion concentration, and it is difficult to maintain the dissolution rate constant. .

【0005】[0005]

【発明が解決しようとする課題】本発明者等は、ハロゲ
ン化物を含有しない処理液で、銅表面への高分子材料と
の接着性を強固にすることができ、かつピンクリングの
発生がない耐酸性に優れた粗面を得ることのできる銅及
び銅合金の表面粗面化処理液を見出すことを目的に、検
討を重ねた結果、本発明を完成した。
DISCLOSURE OF THE INVENTION The inventors of the present invention have found that a processing solution containing no halide can strengthen adhesion to a polymer material on a copper surface and does not generate a pink ring. As a result of repeated studies for the purpose of finding a surface roughening solution for copper and copper alloy capable of obtaining a roughened surface having excellent acid resistance, the present invention was completed.

【0006】[0006]

【課題を解決するための手段】即ち、本発明は、過酸化
水素、無機酸、アゾール類と、グリコール酸、マロン
酸、グルタル酸のうちから選ばれた少なくとも1種の有
機酸を含有する水溶液からなる銅及び銅合金の表面粗面
化処理液に関する。
That is, the present invention provides an aqueous solution containing hydrogen peroxide, an inorganic acid, an azole, and at least one organic acid selected from glycolic acid, malonic acid and glutaric acid. And a surface roughening treatment solution for copper and copper alloys comprising:

【0007】[0007]

【発明の実施の形態】本発明の表面粗面化処理液中の過
酸化水素濃度は、好ましくは、0.2重量%〜10重量
%であり、より好ましくは、1重量%〜5重量%であ
る。無機酸としては、硫酸、リン酸、硝酸を挙げること
ができ、好ましくは、硫酸及びリン酸である。該無機酸
の濃度は、好ましくは、1重量%〜30重量%である
が、硫酸を用いる場合は、2重量%〜10重量%がより
好ましく、リン酸を用いる場合は、5重量%〜15重量
%がより好ましい。アゾール類としては、トリアゾー
ル、テトラゾールあるいはイミダゾール等があげられる
が、ベンゾトリアゾールが好ましい。アゾール類の濃度
は、好ましくは、0.05重量%以上であり、アゾール
類として、ベンゾトリアゾールを用いる場合は、0.0
5重量%〜1重量%が好ましい。本発明の表面粗面化処
理液は、グリコール酸、マロン酸、グルタル酸のうち少
なくとも1種の有機酸を含むが、その含有量は、好まし
くは、1重量%〜15重量%であり、より好ましくは、
2〜12重量%である。
BEST MODE FOR CARRYING OUT THE INVENTION The concentration of hydrogen peroxide in the surface roughening solution of the present invention is preferably from 0.2% by weight to 10% by weight, more preferably from 1% by weight to 5% by weight. It is. Examples of the inorganic acid include sulfuric acid, phosphoric acid, and nitric acid, and are preferably sulfuric acid and phosphoric acid. The concentration of the inorganic acid is preferably 1% by weight to 30% by weight. When sulfuric acid is used, 2% by weight to 10% by weight is more preferable, and when phosphoric acid is used, 5% by weight to 15% by weight. % Is more preferred. Examples of the azoles include triazole, tetrazole and imidazole, and benzotriazole is preferable. The concentration of the azole is preferably 0.05% by weight or more, and when benzotriazole is used as the azole,
5% to 1% by weight is preferred. The surface roughening solution of the present invention contains at least one organic acid among glycolic acid, malonic acid, and glutaric acid, and the content thereof is preferably 1% by weight to 15% by weight. Preferably,
2 to 12% by weight.

【0008】さらに、本発明の表面粗面化処理液には、
必要に応じてたとえばアルコール類、アミン類、スルホ
ン酸類などの過酸化水素の安定剤、その他添加剤を添加
しても良い。
Further, the surface roughening solution of the present invention includes:
If necessary, stabilizers for hydrogen peroxide such as alcohols, amines and sulfonic acids, and other additives may be added.

【0009】銅及び銅合金表面は、浸漬又は噴霧などで
処理することが出来、その処理温度は、10〜60℃の
範囲であり、好ましくは、20〜50℃である。処理時
間は処理温度や処理方法により変わるが、15秒〜10
分の範囲であり、好ましくは、1分〜3分である。尚、
本処理液においては、その溶解厚さ(銅の表面積及び比
重と溶解した銅の重量から計算した平均の厚さ)が、
0.5〜4.0μm、好ましくは、0.8〜2.0μmの
ときに銅表面が効率的に粗面化されるので、溶解厚さが
この範囲になるように、用いる処理液の溶解速度に合わ
せて処理時間を決めることが好ましい。
[0009] The surface of copper and copper alloy can be treated by dipping or spraying, and the treatment temperature is in the range of 10 to 60 ° C, preferably 20 to 50 ° C. The processing time varies depending on the processing temperature and the processing method.
Minutes, preferably 1 minute to 3 minutes. still,
In this treatment liquid, the dissolved thickness (average thickness calculated from the surface area and specific gravity of copper and the weight of dissolved copper) is
The copper surface is efficiently roughened when the thickness is 0.5 to 4.0 μm, preferably 0.8 to 2.0 μm. It is preferable to determine the processing time according to the speed.

【0010】[0010]

【発明の効果】本発明の表面粗面化処理液によれば、銅
表面には微少な粗さの茶褐色の被膜が形成され、プリプ
レグ、ソルダーレジスト、ドライフィルムレジスト、接
着剤などの高分子材料との密着性は良好である。
According to the surface roughening solution of the present invention, a brownish film having a minute roughness is formed on the copper surface, and a polymer material such as a prepreg, a solder resist, a dry film resist, and an adhesive is used. Is good.

【0011】[0011]

【実施例】以下に、実施例をもって本発明を説明する。 実施例1〜7 プリント配線板用銅張積層板を表1に示す組成の粗面化
処理液に漬浸し、銅張積層板の銅表面をエッチングして
粗面化した。処理温度、処理時間、及び溶解厚さ(銅の
表面積及び比重と溶解した銅の重量から計算した平均の
厚さ)を表1に示した。粗面化処理前の銅表面、処理後
の銅表面を30°の角度で撮影した電子顕微鏡写真を図
1〜8に示した。図2〜8の電子顕微鏡写真からわかる
ように本処理液で処理された銅表面には、細かな凸凹が
形成され、粗面化されていることが分かる。
The present invention will be described below with reference to examples. Examples 1 to 7 A copper-clad laminate for a printed wiring board was immersed in a roughening treatment solution having the composition shown in Table 1, and the copper surface of the copper-clad laminate was etched to be roughened. Table 1 shows the treatment temperature, treatment time, and dissolution thickness (average thickness calculated from the surface area and specific gravity of copper and the weight of dissolved copper). Electron micrographs of the copper surface before the surface roughening treatment and the copper surface after the treatment were taken at an angle of 30 ° are shown in FIGS. As can be seen from the electron micrographs of FIGS. 2 to 8, fine irregularities are formed on the copper surface treated with the present treatment solution, and the copper surface is roughened.

【0012】[0012]

【表1】 [Table 1]

【図面の簡単な説明】[Brief description of the drawings]

【図1】 処理前の銅表面の5000倍電子顕微鏡写
真。
FIG. 1 is a 5000 × electron micrograph of a copper surface before treatment.

【図2】 実施例1の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 2 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 1.

【図3】 実施例2の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 3 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 2.

【図4】 実施例3の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 4 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 3.

【図5】 実施例4の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 5 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 4.

【図6】 実施例5の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 6 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 5.

【図7】 実施例6の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 7 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 6.

【図8】 実施例7の粗面化処理液で粗面化した銅表面
の5000倍電子顕微鏡写真。
FIG. 8 is a 5000 × electron micrograph of a copper surface roughened with the roughening solution of Example 7.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4K057 WA05 WB04 WE03 WE11 WE25 WE30 WG03 WN02 5E343 AA02 AA12 BB24 CC21 CC22 CC32 CC52 CC54 EE52 GG02 5E346 AA12 AA15 AA32 CC08 CC32 EE06 EE09 EE18 EE19 EE38 GG27 HH11  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4K057 WA05 WB04 WE03 WE11 WE25 WE30 WG03 WN02 5E343 AA02 AA12 BB24 CC21 CC22 CC32 CC52 CC54 EE52 GG02 5E346 AA12 AA15 AA32 CC08 CC32 EE06 EE09 EE18 EE19 H

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 過酸化水素、無機酸、アゾール類と、グ
リコール酸、マロン酸、グルタル酸のうちから選ばれた
少なくとも1種の有機酸を含有する水溶液からなる銅及
び銅合金の表面粗面化処理液。
1. A rough surface of copper and a copper alloy comprising an aqueous solution containing hydrogen peroxide, an inorganic acid, an azole, and at least one organic acid selected from glycolic acid, malonic acid and glutaric acid. Treatment solution.
【請求項2】 前記過酸化水素の濃度が0.2重量%〜
10重量%である請求項1の表面粗面化処理液。
2. The method according to claim 1, wherein the concentration of the hydrogen peroxide is 0.2% by weight or less.
The surface roughening treatment liquid according to claim 1, which is 10% by weight.
【請求項3】 前記アゾ―ル類がベンゾトリアゾールで
ある請求項1の表面粗面化処理液。
3. The surface roughening solution according to claim 1, wherein the azole is benzotriazole.
【請求項4】 前記ベンゾトリアゾールが0.05重量
%〜1重量%である請求項3の表面粗面化処理液
4. The surface roughening treatment liquid according to claim 3, wherein the benzotriazole is present in an amount of 0.05% by weight to 1% by weight.
【請求項5】 前記有機酸が1重量%〜15重量%であ
る請求項1の表面粗面化処理液。
5. The surface roughening treatment liquid according to claim 1, wherein the organic acid is 1% by weight to 15% by weight.
JP2000251733A 2000-08-23 2000-08-23 Surface roughening treating solution for copper and copper alloy Pending JP2002060980A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000251733A JP2002060980A (en) 2000-08-23 2000-08-23 Surface roughening treating solution for copper and copper alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000251733A JP2002060980A (en) 2000-08-23 2000-08-23 Surface roughening treating solution for copper and copper alloy

Publications (1)

Publication Number Publication Date
JP2002060980A true JP2002060980A (en) 2002-02-28

Family

ID=18741092

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2002060980A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009149971A (en) * 2007-11-27 2009-07-09 Mec Kk Etching agent
WO2011099624A1 (en) * 2010-02-15 2011-08-18 三菱瓦斯化学株式会社 Etching solution for multilayer thin film having copper layer and molybdenum layer contained therein

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009149971A (en) * 2007-11-27 2009-07-09 Mec Kk Etching agent
JP2013167024A (en) * 2007-11-27 2013-08-29 Mec Kk Etching agent
KR101497708B1 (en) * 2007-11-27 2015-03-02 멕크 가부시키가이샤 Etching agent
WO2011099624A1 (en) * 2010-02-15 2011-08-18 三菱瓦斯化学株式会社 Etching solution for multilayer thin film having copper layer and molybdenum layer contained therein
JP5051323B2 (en) * 2010-02-15 2012-10-17 三菱瓦斯化学株式会社 Etching solution for multilayer thin film containing copper layer and molybdenum layer
CN102762770A (en) * 2010-02-15 2012-10-31 三菱瓦斯化学株式会社 Etching solution for multilayer thin film having copper layer and molybdenum layer contained therein
KR101271414B1 (en) 2010-02-15 2013-06-05 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 Etching solution for multilayer thin film having copper layer and molybdenum layer contained therein
JPWO2011099624A1 (en) * 2010-02-15 2013-06-17 三菱瓦斯化学株式会社 Etching solution for multilayer thin film containing copper layer and molybdenum layer
TWI405874B (en) * 2010-02-15 2013-08-21 Mitsubishi Gas Chemical Co Etching liquid for multilayer thin films containing copper and molybdenum layers

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