JP2002055223A - Optical device, method for manufacturing the same and liquid crystal device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an inexpensive method for manufacturing a color filter with good yield by which a light shielding part is formed in a simple process without causing problems of environmental safety or production stability. SOLUTION: After pixels 2 are formed on a supporting substrate 1 and treated to have ink-repelling property, ink 4 is supplied from an ink jet head 3 to the space in the pixels 2 to form the light shielding part 5.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing an optical element such as a color filter which is a constituent member of a color liquid crystal element used for a color television, a personal computer, and a pachinko game console. The present invention relates to a manufactured optical element and a liquid crystal element using a color filter which is one of the optical elements.

[0002]

2. Description of the Related Art In recent years, the development of personal computers,
In particular, with the development of portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, cost reduction is necessary for further popularization, and in particular, there is an increasing demand for cost reduction of color filters having a high specific gravity.

Conventionally, various methods have been tried to satisfy the above requirements while satisfying the required characteristics of the color filter, but no method has yet been established which satisfies all the required characteristics. The respective methods will be described below.

[0004] The first method is a dyeing method. In the dyeing method, first, a water-soluble polymer material layer, which is a material for dyeing, is formed on a transparent substrate, and this is patterned into a desired shape by a photolithography process, and the obtained pattern is immersed in a dye bath. To obtain a colored pattern. By repeating this process three times, R (red), G (green), B
A colored layer composed of three colored portions (blue) is formed.

[0005] The second method is a pigment dispersion method, which has been most frequently used in recent years. In this method, a photosensitive resin layer in which a pigment is dispersed is first formed on a transparent substrate, and this is patterned to obtain a monochromatic pattern. This step is repeated three times to form a colored layer including three colored portions of R, G, and B.

A third method is an electrodeposition method. In this method, a transparent electrode is first patterned on a transparent substrate, and immersed in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution, and the like to electrodeposit a first color. This process is repeated three times, and R, G,
A colored layer composed of colored portions of three colors B is formed and finally baked.

As a fourth method, a pigment is dispersed in a thermosetting resin and printing is repeated three times to obtain R, G,
After separately applying B, the resin is thermally cured to form a colored layer. In either method,
Generally, a protective layer is formed on the coloring layer.

[0008] The colored portions of the color filter are regularly arranged, and a light-shielding portion is usually provided between the colored portions to enhance display contrast. Hereinafter, a method for forming the light shielding portion will be described.

The first method uses a metal thin film called a metal black matrix (metal BM).
This method is currently mainstream, and the metal is Cr
Is used. Specifically, first, a metal Cr thin film is formed on a transparent substrate by an evaporation method, this is etched using a resist formed in a desired pattern by a photolithography process as a mask, and finally the resist is peeled off. . This method has an advantage that a sufficient optical density can be obtained even if it is thin, and that the resolution is excellent.

The second method is a method using the above-described pigment dispersion method, and is referred to as a resin BM. In this method, a photosensitive resin layer in which a light shielding material is dispersed is formed on a transparent substrate,
A light-shielding pattern is obtained by patterning through a mask. It is also used when a colored portion is formed by an ink-jet method using the three-dimensional shape. Japanese Patent Application Laid-Open No. Hei 9-127327 discloses a method of manufacturing a color filter by filling a color ink into an opening of a light-shielding portion having ink repellency by an ink jet recording apparatus.

The third method is a method called back exposure, which uses a photosensitive resin in which a light-shielding material is dispersed. In the above two methods, a light-shielding portion is formed before a colored portion.
In this method, a light-shielding portion is formed after forming a colored portion.
That is, a photosensitive resin in which a light-shielding material is dispersed is applied to the entire surface of the colored portion patterned with a material containing an ultraviolet absorber, and the entire surface is exposed from the back surface of the transparent substrate, so that only the colored portion gap is exposed to light. After curing, the light-shielding material on the colored portion is removed by development to form a light-shielding portion. This method
This is a simple method since no mask is required for patterning and no alignment is required. For example, it is introduced in JP-A-7-49415.

[0012]

The above-mentioned conventional method for manufacturing a light-shielding portion has the following problems.

As for the metal BM, a Cr compound contained in a waste liquid generated at the time of etching of metal Cr is regarded as an environmentally safe problem. This problem is the same at the time of disposal or recycling.

The resin BM has problems that the film thickness becomes large in order to obtain a required optical density, and that it is difficult to obtain a resolution due to optical patterning of a material having a high light-shielding property.

The back exposure method uses a transparent substrate (generally, UV
There is a problem that a large amount of exposure is required because the light-shielding material is exposed through a glass that does not allow light to pass through, and that the light-shielding material remains on the colored portion and deteriorates the optical characteristics. I have.

In addition to the above, the printing method described in the above-described method for forming the colored portion of the color filter and the ink jet method, which has been studied recently, can be theoretically applied. At present, mass production cannot be supported due to the need for advanced special technology in terms of resolution for application to color filters.

As described above, the metal BM should be changed to the resin BM from the viewpoint of environmental safety. One of the reasons why the metal BM is still mainstream is that the production safety and cost of the resin BM are low. There are many issues on the surface.

An object of the present invention is to solve the above-mentioned problems of environmental safety, manufacturing stability, cost, etc., and to form a light-shielding portion by a simple method so that a highly reliable optical element can be more easily produced with a higher yield. It is to manufacture and provide it cheaply. Further, the present invention provides a liquid crystal element having excellent color display characteristics at a lower cost by using the optical element.

[0019]

A first aspect of the present invention is a method for manufacturing an optical element having at least a plurality of pixels on a supporting substrate and a light-shielding portion made of a black resin composition located between adjacent pixels. Forming a pixel on the support substrate, performing a process of making the at least upper surface of the pixel ink repellent, forming a light-shielding portion by applying ink by an inkjet method to the gap between adjacent pixels, It is a manufacturing method of the optical element characterized by having.

The present invention relates to forming the pixels by a pigment dispersion method, forming the pixels by a printing method using a coloring ink, and particularly, forming a printing plate or surface formed of a silicone oil-containing rubber by a silicone oil. Using an indirect transfer body coated with a rubber-containing material, performing an ink-repellent treatment on the upper surface of the pixel at the same time as pattern transfer, wherein the ink-repellent treatment is a plasma treatment in which a gas containing at least a fluorine atom is introduced and plasma irradiation is performed. That the ink-repellent treatment is performed by protecting a portion other than the pixel upper surface with a resist, that the ink-repellent treatment is a process of bringing a silicone oil-containing rubber into contact with the pixel upper surface, or A process of forming an ink-repellent layer only on the upper surface of a pixel using the ink-repellent material having the photosensitive property Silicone rubber, or a photosensitive resist containing a fluorine-based resin or a silicone-based resin, the contact angle of pure water on the upper surface of the ink-repellent treated pixel to 80 ° to 130 °, after forming the light shielding portion Subjecting the pixel upper surface to a hydrophilic treatment, wherein the hydrophilic treatment is any one of a cleaning treatment with an alkaline aqueous solution, a UV cleaning treatment, an excimer cleaning treatment, a corona discharge treatment, and an oxygen plasma treatment; , Water, and an organic solvent, and manufacturing a color filter in which the pixel is a colored portion, as preferred embodiments.

A second aspect of the present invention is characterized in that the optical element has at least a plurality of pixels on a support substrate and a light-shielding portion located between adjacent pixels, and is manufactured by the above-described method for manufacturing an optical element of the present invention. Optical element.

The second aspect of the present invention is that the support substrate is a transparent substrate and is a color filter having a plurality of colored portions, a protective layer is provided on the colored portions, and a transparent conductive film is provided on the surface. Is included as a preferred embodiment.

A third aspect of the present invention is characterized in that a liquid crystal is sandwiched between a pair of substrates, and one of the substrates is formed using a color filter which is one embodiment of the optical element of the present invention. Liquid crystal element.

[0024]

DESCRIPTION OF THE PREFERRED EMBODIMENTS According to the present invention, a light-shielding portion is formed by first forming a pixel, applying an ink-repellent treatment to the surface of the pixel, and then applying ink to the pixel gap by an ink-jet method. It has features. Therefore, in the present invention, when applying ink, a large amount of ink is sufficiently held in the pixel gap without being on the pixel upper surface due to the ink repellency of the pixel surface, and the ink remains on the pixel to shield the pixel from light. There is no fear, and the light-shielding portion made of the resin composition can be formed with a sufficient thickness.

The optical element of the present invention manufactured by the manufacturing method of the present invention includes a color filter. First,
The optical element of the present invention will be described with reference to embodiments.

FIG. 5 schematically shows a cross section of an example of a color filter which is an embodiment of the optical element of the present invention. In the figure, 71 is a transparent substrate as a support substrate, 72 is a black matrix as a light-shielding portion, 73 is a colored portion as a pixel, 7
4 is a protective layer formed as needed. When a liquid crystal element is formed using the color filter of the present invention, ITO (indium tin) for driving liquid crystal is provided on the colored portion 73 or further on the protective layer 74 formed on the colored portion 73. In some cases, a transparent conductive film made of a transparent conductive material such as (oxide) is formed and provided.

FIG. 6 is a schematic cross-sectional view of one embodiment of the liquid crystal element of the present invention constituted by using the color filter of FIG. In the figure, 77 is a common electrode (transparent conductive film), 78 is an alignment film, 79 is a liquid crystal, 81 is a counter substrate, 82 is a pixel electrode, 83 is an alignment film, and the same members as those in FIG. And the description is omitted.

In general, a color liquid crystal element includes a substrate 71 on the color filter side and a counter substrate 81, and
9 is formed. TFTs (not shown) and pixel electrodes 82 are formed in a matrix inside one substrate 81 of the liquid crystal element. Further, inside the substrate 71 on the color filter side, a colored portion 73 of a color filter is formed at a position facing the pixel electrode 82 so that R, G, and B are arranged, and a transparent common electrode is formed thereon. 77 is formed. Further, alignment films 78 and 83 are provided in the plane of both substrates.
Are formed, and the liquid crystal molecules are arranged in a certain direction. These substrates are arranged to face each other via a spacer (not shown), are adhered by a sealing material (not shown), and a gap is filled with a liquid crystal 79.

In the case of the transmission type liquid crystal element, a substrate 81 and a pixel electrode 82 are formed of a transparent material, a polarizing plate is bonded to the outside of each substrate, and a fluorescent lamp and a scattering plate are generally combined. The display is performed by using the backlight and using the liquid crystal compound as an optical shutter for changing the transmittance of the backlight. In the case of the reflection type, the substrate 81 or the pixel electrode 82 is formed of a material having a reflection function, or a reflection layer is provided on the substrate 81, and a polarizing plate is provided outside the transparent substrate 71, and a color plate is provided. Display is performed by reflecting light incident from the filter side.

Hereinafter, a method for manufacturing an optical element according to the present invention will be described with reference to the drawings.

FIG. 1 is a process diagram schematically showing a method of manufacturing an optical element according to the present invention. Hereinafter, each step will be described. In addition, the following steps (a) to (d) are performed in FIG.
(D). In each step of FIG. 1, (a-1) to (d-1) on the left side of the paper are schematic plan views viewed from above, and (a-2) to (d-2) on the right side of the paper are (a-1). ) ~
It is an AB sectional schematic diagram of (d-1). In the figure, 1 is a support substrate, 2 is a pixel, 3 is an inkjet head, 4 is ink, and 5 is a light-shielding portion.

Step (a) The pixels 2 are formed on the support substrate 1. The supporting substrate 1 is shown in FIG.
In the case of manufacturing the color filter exemplified in (1), the transparent substrate 71 is used, and in general, a glass substrate is used. However, for the purpose of forming a liquid crystal element, a substrate having necessary characteristics such as desired transparency and mechanical strength is used. If so, a plastic substrate or the like can be used.

The pixel 2 is a colored portion 73 in a color filter, and can be formed by the dyeing method, the pigment dispersion method, the electrodeposition method, the printing method, or the like as described above, and is particularly limited. is not. Among these methods, a pigment dispersion method having a good edge shape and a printing method are preferable. In particular, in the printing method, the printing plate is formed of rubber containing silicone oil or an indirect transfer body whose surface is coated with rubber containing silicone oil is subjected to ink repellency simultaneously with patterning. Can be. The rubber containing the silicone oil means both a rubber that emerges from the inside of the silicone rubber as a transition component on the surface and a rubber that supplies the silicone oil from outside to the rubber material.

Step (b) At least the upper surface of the pixel 2 is subjected to an ink-repellent treatment. As the ink-repellent treatment, a fluorination treatment or a method of contacting a silicone oil-containing rubber with the upper surface of the pixel 2 or a method of forming an ink-repellent layer only on the upper surface of the pixel 2 using a photosensitive ink-repellent material, Is mentioned.

In the fluorination treatment, as a method of simplifying the process and satisfactorily fluorinating the surface of the pixel 2 to increase the ink repellency, plasma irradiation by introducing a gas containing at least a fluorine atom is performed. Performed plasma treatment is preferably used.

The gas containing at least a fluorine atom used in this step includes CF ₄ , CHF ₃ ,
It is preferable to use at least one halogen gas selected from C ₂ F ₆ , SF ₆ , C ₃ F ₈ and C ₅ F ₈ . In particular, C ₅ F ₈
(Octafluorocyclopentene) has an ozone depletion potential of 0 and an air life longer than that of a conventional gas by (C).
F _4: 5 million years, C ₄ F _8:. 3200 years) 0 98 years and very short. Therefore, the global warming potential is 90 (100-year integrated value with CO ₂ = 2), which is (C
(F ₄ : 6500, C ₄ F ₈ : 8700) Very small, extremely effective in protecting the ozone layer and the global environment, and is desirable for use in the present invention.

Further, as the introduced gas, a gas such as oxygen, argon, helium or the like may be used in combination, if necessary.
In this step, the above CF ₄ , CHF ₃ , C ₂ F ₆ , SF
₆ , a mixed gas of at least one halogen gas selected from C ₃ F ₈ and C ₅ F ₈ and O ₂ is used to reduce the degree of ink repellency of the surface of the pixel 2 to be fluorinated in this step. It becomes possible to control. However, in the mixed gas,
Mixing ratio oxidation reaction with O ₂ exceeds 30% of O ₂ is dominant, because the ink repellency enhancing effect is prevented,
When the O ₂ mixture ratio exceeds 30%, the damage to the resin becomes remarkable. Therefore, when the mixed gas is used, it is necessary to use the O ₂ mixture ratio within a range of 30% or less.

As a method for generating plasma, methods such as low-frequency discharge, high-frequency discharge, and microwave discharge can be used. Conditions such as pressure, gas flow rate, discharge frequency, and processing time in plasma processing are as follows. It can be set arbitrarily.

In this step, the higher the ink repellency, the greater the amount of ink that can be filled into the gaps between the pixels 2 in the subsequent step, so that it becomes easier to obtain a material design and a process margin in manufacturing. May cause white spots.

That is, white spots may occur at points surrounded by a highly ink-repellent surface, specifically, at corners sandwiched by an angle of about 90 ° or less, depending on the combination of materials used. There is.

For example, in the case of a light-shielding portion of a color filter, the shape thereof is generally a lattice shape or a line shape.
In order to shield the FT, it is necessary to complicate the shape of the light shielding portion. FIG. 2 shows an example. In the figure, 22 is a colored portion (pixel), 25 is a light-shielding portion, and 26 is T of the light-shielding portion 25.
The FT malfunction prevention light-shielding region 27 is a white spot. FIG.
As shown in (2), in the region 26 sandwiched between the side walls of the pixel 22 at 90 °, if the ink repellency of both side walls is high, the ink is repelled and the white spot 27 is easily generated.

Therefore, in order to prevent such white spots, it is desirable that the ink repellency treatment be performed only on the upper surface of the pixel 2. In the case of the above-described fluorination treatment, the side wall of the pixel 2 is required. Is desirably protected by a resist.

FIG. 3 shows a step of protecting the side wall of the pixel 2 with a resist and performing an ink-repellent treatment. In the figure, 31 is a photosensitive resist layer, 32a and 32b are photomasks, and 33 is a resist pattern. The respective steps will be described below.

The support substrate 1 on which the pixels 2 are formed (FIG.
(A)) A photosensitive resist layer 31 is formed on the entire surface (FIG. 3).
(B)). Next, when the resist layer 31 is of a positive type, the photomask 3 having an opening corresponding to the pixel 2 is formed.
2a (FIG. 3C-1), and when the resist layer 31 is of a negative type, is exposed using a photomask 32b having a pattern covering the pixel 2 (FIG. 3C-2). .
When the resist layer 31 is a negative type, the pixel 2
Is exposed from the back surface of the support substrate 1 using
(C-3)). In this case, it is necessary to make the pixel 2 contain an ultraviolet absorber.

By removing the resist layer 31 on the pixel 2 by development, a resist pattern 33 filling the gap between the pixels 2 is obtained (FIG. 3D), and an ink repellent treatment is performed in this state (FIG. 3D). By (e)), only the upper surface of the pixel 2 is subjected to the ink repellency treatment, and the resist pattern 33 is removed after the treatment (FIG. 3 (f)).

In the ink-repelling treatment according to the present invention, a method of contacting a silicone oil-containing rubber with the upper surface of the pixel 2 or forming an ink-repellent layer on the pixel 2, only the upper surface of the pixel 2 is made ink-repellent. Can be done.

As a method of bringing the silicone oil-containing rubber into contact with the surface to be treated, a method of bringing the silicone oil-containing rubber into contact with the upper surface of the pixel 2 while rotating a roller around which the rubber containing the silicone oil is rotated is preferable. The term "silicone oil-containing rubber" as used herein means both a rubber material that emerges from the inside of the silicone rubber as a transition component and a rubber material that contains silicone oil from the outside.

As a method of forming an ink-repellent layer on the pixel 2, a photosensitive silicone rubber containing a photosensitive ink-repellent material or a photosensitive resin containing a fluorine-based resin or a silicone-based resin is used. Resist. FIG. 4 shows the process. In the figure, 41 is a photosensitive ink repellent material layer, 42a and 42b are photomasks, and 43 is an ink repellent layer.

In this step, a photosensitive ink repellent material layer 41 is formed on the entire surface of the support substrate 1 (FIG. 4A) on which the pixels 2 are formed (FIG. 4B). When the negative type 41 is used, a photomask 42a having an opening corresponding to the pixel 2 is used (FIG. 4C-1). When the ink repellent material layer 42 is a positive type, a pattern covering the pixel 2 is used. (FIG. 4 (c-2)) using a photomask 42b having the following.In the case of a positive type, exposure can be performed from the back surface of the support substrate 1 using the pixels 2 as a mask. It is necessary that the pixel 2 contains an ultraviolet absorber.

After the exposure, the ink repellent material layer 41 in the gap between the pixels 2 is removed by development to form the ink repellent layer 43 only on the pixels 2 (FIG. 4D).

If the ink-repellent layer 43 formed here is left as it is, it is required that the ink-repellent layer 43 has transparency and resistance to the subsequent steps depending on its use. However, as described later, depending on the member formed on the ink repellent layer 43, ink repellency may be a problem. In such a case, the ink repellent layer 43 is formed after the light shielding portion 5 is formed. It is desirable to remove it.

Step (c) The ink 4 is applied to the gap between the pixels 2 by the ink jet head 3 using an ink jet recording apparatus. As the ink jet, a bubble jet (registered trademark) type using an electrothermal converter as an energy generating element, a piezo jet type using a piezoelectric element, or the like can be used. The ink 4 preferably contains at least a curing component, water, and a solvent in order to form a black resin composition layer after curing. Hereinafter, the composition of the ink will be described in more detail.

[1] Colorant As the colorant to be contained in the ink in the present invention, both dyes and pigments can be used. However, in order to obtain a sufficient light-shielding property in a small amount, a pigment-based colorant must be used. preferable. Specifically, carbon black usually used for the resin BM is preferably used. Examples of the carbon black include those manufactured by a contact method called channel black, roller black, and disk black; Black, those manufactured by a furnace method called oil furnace black, thermal black, those manufactured by a thermal method called acetylene black, and the like can be used.
Channel black, gas furnace black and oil furnace black are preferred. If necessary, a mixture of R, G, and B pigments may be added. Further, the amount of the coloring agent to be added is preferably equal to or less than the amount of the curing component described later.

[2] Curing component In consideration of the process resistance, reliability, and the like in the post-process, a component that is cured by heat treatment or light irradiation to fix the colorant, ie, a crosslinkable monomer or polymer, etc. It is preferable to contain components. In particular, it is preferable to use a curable resin composition in consideration of heat resistance in a later step. Specifically, for example, as a base resin, an acrylic resin having a functional group such as a hydroxyl group, a carboxyl group, an alkoxy group, or an amide group, a silicone resin; or a cellulose derivative such as hydroxypropylcellulose, hydroxyethylcellulose, methylcellulose, or carboxymethylcellulose; Modified products thereof; and vinyl polymers such as polyvinylpyrrolidone, polyvinyl alcohol, and polyvinyl acetal. Further, a crosslinking agent and a photoinitiator for curing these base resins by light irradiation or heat treatment can be used. Specifically, melamine derivatives such as methylolated melamine are used as crosslinking agents, and dichromates, bisazide compounds, radical initiators, cationic initiators, anionic initiators, etc. are used as photoinitiators. It is possible. Further, these photoinitiators can be used as a mixture of plural kinds thereof or in combination with other sensitizers.

[3] Solvent As the medium of the ink used in the present invention, a mixed solvent of water and an organic solvent is preferably used. As the water, it is preferable to use ion-exchanged water (deionized water) instead of general water containing various ions.

Examples of the organic solvent include those having 1 carbon atom such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, sec-butyl alcohol and tert-butyl alcohol.
To 4 alkyl alcohols; dimethylformamide,
Amides such as dimethylacetamide; ketones or keto alcohols such as acetone and diacetone alcohol;
Ethers such as tetrahydrofuran and dioxane; polyalkylene glycols such as polyethylene glycol and polypropylene glycol; alkylene groups such as ethylene glycol, propylene glycol, butylene glycol, triethylene glycol, thiodiglycol, hexylene glycol and diethylene glycol having 2 to 4 Glycerins; lower alkyl ethers of polyhydric alcohols such as ethylene glycol monomethyl ether, diethylene glycol methyl ether, and triethylene glycol monomethyl ether; N-methyl-2-pyrrolidone, 2-pyrrolidone, etc. It is preferable to select from the following.

In addition to the above components, two or more kinds of organic solvents having different boiling points may be used in combination to form an ink having desired physical properties, if necessary, or a surfactant or an antifoaming agent. Preservatives and the like may be added.

Step (d) The light-shielding portion 5 is formed by performing necessary processing such as heat treatment and light irradiation, and removing and curing the solvent component in the ink 4.

Further, in the case of a color filter, a protective layer and a transparent conductive film are formed as necessary, as described above. As the protective layer in this case, a resin material of a photo-curing type, a thermo-setting type, or a photo- and heat-curable type, or an inorganic film formed by vapor deposition, sputtering, or the like can be used. Any material can be used as long as it has transparency and can withstand the subsequent transparent conductive film formation process, alignment film formation process, and the like. Further, the transparent conductive film may be formed directly on the colored portion without using the protective layer.

In the present invention, the upper surface of the pixel 2 is subjected to an ink-repellent treatment, and depending on a member formed on the pixel 2, the ink-repellent property may become a problem. For example, in the case where the protective layer 74 is formed on the colored portion 73 having high ink repellency in the color filter of FIG.
When a transparent conductive film is formed thereover, wrinkles may occur in the protective layer or cracks may occur in the transparent conductive film due to stress of the transparent conductive film.

Therefore, when the ink-repellent treatment of the pixel 2 is performed by forming an ink-repellent layer, the ink-repellent layer is removed, and when the other process is performed, Preferably, the upper surface of the pixel 2 is subjected to a hydrophilic treatment,
Specifically, washing treatment with an alkaline aqueous solution, UV washing treatment, excimer washing treatment, corona discharge treatment, and oxygen plasma treatment are preferably exemplified.

[0062]

[Example 1] [Formation of colored portion (pixel)] A pigment-dispersed resist ("Color Mosaic Series" manufactured by Fuji Film Ohlin) was applied on a glass substrate ("1737" manufactured by Corning) by spin coating. The predetermined exposure and development processes are repeated for each of the R, G, and B colors, and the film thickness is 1 μm, 75 μm ×
R, G, and B were repeated horizontally at 225 μm rectangular pixels at intervals of 20 μm to obtain a colored portion pattern in which the same color was arranged vertically.

[Ink Repellent Treatment] The colored portion pattern was subjected to plasma treatment using a parallel plate type plasma treatment apparatus under the following conditions.

Gas used: CF ₄ gas flow rate: 80 sccm Pressure: 8 Pa RF power: 150 W Processing time: 60 sec

[Evaluation of Ink Repellency] The contact angle of the substrate after the ink repellency treatment to pure water was measured. As a result, the upper surface of the colored portion was 125 ° and the surface of the glass substrate was 15 °.

[Preparation of Ink] Using an acrylic copolymer having the following composition as a thermosetting component, R, G, and B inks were prepared with the following compositions. The ink is 1
The optical density (OD) was designed to be 4 or more, which was sufficient when an applied amount of about 20 nl per mm ² (film thickness after curing was about 1.5 μm).

Curing component Methyl methacrylate 50 parts by weight Hydroxyethyl methacrylate 30 parts by weight N-methylol acrylamide 20 parts by weight

Ink Carbon black 5 parts by weight Diethylene glycol 30 parts by weight Ethylene glycol 20 parts by weight Deionized water 40 parts by weight 5 parts by weight of the above curing component

[Formation of Light Shielding Section] Using an ink jet recording apparatus equipped with an ink jet head having a discharge amount of 20 pl, the above-mentioned ink was applied to the gap of 1 m in the colored portion of the substrate.
granted by changing the application amount to 10nl every range of m ² per 10～50Nl. Then, at 90 ° C. for 10 minutes,
Subsequently, heat treatment was performed at 230 ° C. for 30 minutes to cure the ink to form a light-shielding portion (black matrix), thereby producing seven types of color filters having different amounts of applied ink.

[Evaluation of Color Filters] When the obtained seven types of color filters were observed with an optical microscope, all the color filters did not protrude into the colored portion of the light-shielding portion and no white spots were observed. In addition, the applied amount is 30 nl.
When a liquid crystal element in which a protective layer and a transparent conductive film were provided on the color filter described above, good display quality was obtained.

Example 2 On the same glass substrate as in Example 1, printing was repeatedly performed for each of R, G, and B colors by intaglio offset printing to obtain a film thickness of 3 μm, 75 μm × 2.
A colored portion having a shape in which a 30 μm square light-shielding region for preventing malfunction of a TFT is cut off at a corner of a 25 μm rectangular shape is formed by 20 μm.
R, G, and B were repeated horizontally at intervals of to obtain a colored portion pattern in which the same color was arranged vertically. In this step, the surface of the indirect transfer member was coated with silicone rubber (“KS779H” manufactured by Shin-Etsu Chemical Co., Ltd.), and at the same time as the pattern was transferred, only the upper surface of the colored portion was subjected to an ink-repellent treatment.

[Evaluation of Ink Repellency] The contact angle of the substrate to pure water was measured, and the result was 102 ° on the colored portion and 28 ° on the glass substrate surface.

Ink was applied to the gap between the colored portions of the substrate in the same manner as in Example 1 to form a light-shielding portion.

[Evaluation of Color Filter] When the obtained seven types of color filters were observed with an optical microscope, no protrusion of the light-shielding portions into the colored portions was observed in the color filters having an ink application amount of up to 40 nl / mm ^2. Was.
In these color filters, white spots were not observed at the corners of the TFT malfunction preventing light-shielding region. In addition, when a liquid crystal element in which a protective layer and a transparent conductive film were provided on a color filter having an applied amount of 30 nl was formed, good display quality was obtained.

Example 3 A positive resist ("Hoechst") was formed on a glass substrate on which pixels were formed in the same manner as in Example 1 except that 1% by weight of a UV absorber (alkoxybenzophenone) was mixed with a pigment-dispersed resist. AZ-4903 ")
Is coated with an ink-repellent resist to which 5% by weight of a fluororesin ("Florald" made by 3M) is added by spin coating, and a predetermined exposure amount is irradiated from the back surface of the glass substrate. An ink-repellent resist pattern was obtained.

[Evaluation of Ink Repellency] The contact angle of the above substrate to pure water was measured, and it was found that the upper surface of the colored portion was 95 ° and the surface of the glass substrate was 20 °.

Ink was applied to the gap between the colored portions of the substrate in the same manner as in Example 1 to form a light-shielding portion.

[Evaluation of Color Filter] When the obtained seven types of color filters were observed with an optical microscope, no protruding portions of the light-shielding portions into the colored portions were observed in the color filters having an ink application amount of up to 30 nl / mm ^2. Was.
No white spots were observed on these color filters. Further, after removing the ink-repellent resist remaining on the color filter having the applied amount of 30 nl with an alkaline aqueous solution,
When a liquid crystal element provided with a protective layer and a transparent conductive film was formed, good display quality was obtained.

(Comparative Example 1) A color filter was produced in the same manner as in Example 1 except that the colored portion was not subjected to the ink repellent treatment.

[Evaluation of Ink Repellency] When the contact angle of the substrate on which the colored portion was formed with pure water was measured, the upper surface of the colored portion was 72 ° and the surface of the glass substrate was 25 °.

[Evaluation of Color Filters] Observation of the obtained seven types of color filters with an optical microscope revealed that all of the color filters protruded from the light-shielding portions to the colored portions. In addition, it was impossible to evaluate white spots.

[0082]

As described above, according to the present invention,
A highly reliable color filter having a light-shielding portion without protruding over pixels can be manufactured with a high yield by a simple process with excellent environmental safety. A liquid crystal element having excellent display characteristics can be provided at lower cost.

[Brief description of the drawings]

FIG. 1 is a process chart of one embodiment of a method for manufacturing an optical element of the present invention.

FIG. 2 is a schematic diagram showing white spots in a light-shielding portion formed by an inkjet method.

FIG. 3 is a schematic diagram showing a step of performing an ink-repellent treatment by protecting a side surface of a pixel with a resist in the present invention.

FIG. 4 is a schematic view showing a step of forming an ink-repellent layer only on a pixel in the present invention.

FIG. 5 is a schematic cross-sectional view of an example of a color filter which is an embodiment of the optical element of the present invention.

FIG. 6 is a schematic sectional view of one embodiment of the liquid crystal element of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Support substrate 2 Pixel 3 Ink-jet head 4 Ink 5 Light-shielding part 22 Colored part 25 Light-shielding part 26 TFT malfunction prevention light-shielding area 27 White spot 31 Photosensitive resist layer 32a, 32b Photomask 33 Resist pattern 41 Photosensitive ink repellent material layer 42a , 42b Photomask 43 Ink-repellent layer 72 Black matrix 73 Colored part 74 Protective layer 77 Common electrode 78 Alignment film 79 Liquid crystal 81 Counter substrate 82 Pixel electrode 83 Alignment film

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Katsuhiko Takano, Inventor 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (72) Inventor Ken Okada 3- 30-2, Shimomaruko, Ota-ku, Tokyo Canon Inside (72) Inventor Taketo Nishida 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (72) Inventor Junichi Sakamoto 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. 72) Inventor Yoshikatsu Okada 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. Reference) 2C056 FB01 FB08 2H048 BA02 BA11 BA28 BA57 BA60 BA64 BB14 BB15 BB22 BB37 BB44 2H091 FA02Y FB04 FC12 FC24 FC25 FC27 FD05 LA12 LA15

Claims (19)

[Claims] 1. A method for manufacturing an optical element having at least a plurality of pixels on a support substrate and a light-shielding portion made of a black resin composition located between adjacent pixels, wherein the pixels are formed on the support substrate. Manufacturing an optical element, comprising: applying an ink-repellent treatment to at least an upper surface of the pixel; and applying ink by an inkjet method to a gap between adjacent pixels to form a light-shielding portion. Method. 2. The method according to claim 1, wherein the pixels are formed by a pigment dispersion method. 3. The method according to claim 1, wherein the pixels are formed by a printing method using a coloring ink. 4. The optical device according to claim 3, wherein a printing plate made of silicone oil-containing rubber or an indirect transfer body whose surface is coated with silicone oil-containing rubber is subjected to an ink repellent treatment on the upper surface of the pixel simultaneously with the pattern transfer. Device manufacturing method. 5. The method for manufacturing an optical element according to claim 1, wherein the ink repellency treatment is a plasma treatment in which a gas containing at least a fluorine atom is introduced to perform plasma irradiation. 6. The method of manufacturing an optical element according to claim 5, wherein the ink repellency treatment is performed by protecting a portion other than the upper surface of the pixel with a resist. 7. The ink repellent treatment is a process in which a silicone oil-containing rubber is brought into contact with the upper surface of a pixel.
4. The method for manufacturing an optical element according to any one of claims 1 to 3. 8. The method of manufacturing an optical element according to claim 1, wherein the ink-repellent treatment is a process of forming an ink-repellent layer only on a pixel upper surface using a photosensitive ink-repellent material. Method. 9. The method according to claim 8, wherein the ink repellent material is a photosensitive silicone rubber or a photosensitive resist containing a fluorine-based resin or a silicone-based resin. 10. The contact angle of the upper surface of the pixel subjected to the ink repellency treatment to pure water is 80 ° to 130 °.
10. The method for manufacturing an optical element according to any one of items 9 to 10. 11. The method for manufacturing an optical element according to claim 1, wherein a hydrophilic treatment is performed on the upper surface of the pixel after forming the light shielding portion. 12. The method for manufacturing an optical element according to claim 11, wherein the hydrophilic treatment is any one of a cleaning treatment with an alkaline aqueous solution, a UV cleaning treatment, an excimer cleaning treatment, a corona discharge treatment, and an oxygen plasma treatment. 13. The ink according to claim 13, wherein the ink comprises at least a curing component,
The method for producing an optical element according to claim 1, comprising water and an organic solvent. 14. The method for manufacturing an optical element according to claim 1, wherein a color filter in which the pixels are colored portions is manufactured. 15. The image display device according to claim 1, further comprising at least a plurality of pixels on a support substrate and a light-shielding portion located between adjacent pixels.
14. An optical element manufactured by the method for manufacturing an optical element according to any one of 13. 16. The optical element according to claim 15, wherein said support substrate is a transparent substrate and is a color filter having a plurality of colored portions. 17. The optical element according to claim 16, having a protective layer on the colored portion. 18. A transparent conductive film on a surface.
Or the optical element according to 17; 19. A liquid crystal sandwiched between a pair of substrates,
A liquid crystal element, wherein one of the substrates is configured using the optical element according to claim 16.