JP2002050634A5 - - Google Patents
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- Publication number
- JP2002050634A5 JP2002050634A5 JP2001125785A JP2001125785A JP2002050634A5 JP 2002050634 A5 JP2002050634 A5 JP 2002050634A5 JP 2001125785 A JP2001125785 A JP 2001125785A JP 2001125785 A JP2001125785 A JP 2001125785A JP 2002050634 A5 JP2002050634 A5 JP 2002050634A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001125785A JP2002050634A (ja) | 2000-04-28 | 2001-04-24 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000131353 | 2000-04-28 | ||
| JP2000-131353 | 2000-04-28 | ||
| JP2001125785A JP2002050634A (ja) | 2000-04-28 | 2001-04-24 | 半導体装置の作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002050634A JP2002050634A (ja) | 2002-02-15 |
| JP2002050634A5 true JP2002050634A5 (ko) | 2008-05-08 |
Family
ID=26591284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001125785A Withdrawn JP2002050634A (ja) | 2000-04-28 | 2001-04-24 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002050634A (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI288443B (en) | 2002-05-17 | 2007-10-11 | Semiconductor Energy Lab | SiN film, semiconductor device, and the manufacturing method thereof |
| JP4627971B2 (ja) * | 2002-05-17 | 2011-02-09 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6249627A (ja) * | 1985-08-28 | 1987-03-04 | Nec Corp | 半導体装置の製造方法 |
| JP4162727B2 (ja) * | 1994-07-01 | 2008-10-08 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JPH09270412A (ja) | 1996-04-01 | 1997-10-14 | Canon Inc | 洗浄装置及び洗浄方法 |
| JPH09321009A (ja) * | 1996-05-29 | 1997-12-12 | Toshiba Corp | 半導体装置の製造方法 |
| JPH1064861A (ja) * | 1996-08-22 | 1998-03-06 | Sony Corp | ウエハの洗浄方法および装置 |
| JP3122061B2 (ja) * | 1997-07-22 | 2001-01-09 | 株式会社カイジョー | 超音波式浮揚搬送機構を備えたクラスターツール型枚葉処理装置 |
| JP3580104B2 (ja) | 1997-12-03 | 2004-10-20 | セイコーエプソン株式会社 | アクティブマトリクス基板およびその製造方法、並びに液晶表示装置 |
| AU5233199A (en) | 1998-07-29 | 2000-02-21 | Cfmt, Inc. | Wet processing methods for the manufacture of electronic components using ozonated process fluids |
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2001
- 2001-04-24 JP JP2001125785A patent/JP2002050634A/ja not_active Withdrawn