JP2002045760A - Coating apparatus and method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a coating apparatus adapted so that it may diminish that area of a substrate which is defective in its coating film thickness and is formed at the start of coating film formation and that it may therefore apply a coating fluid uniformly and efficiently to a substrate of a sheet type. SOLUTION: While a substrate 8 to be coated is held by a holder 6 mounted on a stage 3, the horizontal position of the stage 3 is adjusted so that it may come over a preliminary coating member 7 mounted on the stage 3. A coating fluid is continuously fed into a coating nozzle 5 from a coating fluid feed mechanism and is then downwardly ejected from the slit 5a of the nozzle 5. At the same time, the stage 3 is allowed to slide by means of an air slide linear motor 2, the coating fluid ejected from the nozzle 5 is applied to the member 7 to adjust the amount of the coating fluid applied and then applied to the substrate 8.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating apparatus and a coating method for coating a coating liquid on a substrate to be coated, and more particularly to a coating method for coating a single-wafer type substrate such as a large glass substrate or a plastic substrate. The present invention relates to a coating apparatus and a coating method for uniformly and efficiently applying a liquid.

[0002]

2. Description of the Related Art Generally, LCDs (liquid crystal displ.
As a method of applying a coating liquid on a large glass substrate used for a color filter for ay), a spin coating method is often used.

[0003] The spin coating method includes an open air type and a closed cup type. In any of these methods, the use efficiency of the coating material is as low as about 10%, and the coating film in the rotation center portion and the peripheral portion of the substrate to be coated is used. There is a disadvantage that the thickness is too large compared to the intermediate portion. For this reason, for example, when a range of about several μm ± 3% is required as the coating film thickness, it is difficult to use the coating film formed by the spin coating method as it is, and the rotation center portion of the substrate to be coated is difficult. It is necessary to use only a portion which is an intermediate portion between the peripheral portion and the peripheral portion and has a relatively uniform coating film thickness. That is, the spin coating method has problems in the amount of the coating liquid used, the effective use of the substrate to be coated, and the like.

As a method for solving such a drawback of the spin coating method, a knife coating method, a roll coating method, and the like have been proposed. In both the knife coating method and the roll coating method, a coating clearance is provided on the substrate to be coated, and the coating film thickness is determined by the set value to obtain the smoothness of the coating surface. This is disadvantageous in that it is difficult to obtain a uniform film thickness when the smoothness (degree of unevenness) of the surface of the coated substrate is lower than the coating accuracy (the degree of unevenness is large).

[0005] In view of the above, the above-mentioned drawbacks of the respective coating methods are solved and a uniform coating film is formed on a single-wafer type substrate to be coated in a stable state without being affected by the physical properties of the coating solution. Die coating, extrusion coating, and bead coating have been proposed as possible methods (see Japanese Patent Application No. 05-146775).

In a coating apparatus based on these coating methods, for example, a coating liquid is discharged from a coating nozzle onto a substrate to be coated with a predetermined coating clearance, and at the same time, the substrate to be coated is slid at a constant speed. Thus, there is known one that forms a coating film on a substrate to be coated. At this time, the application liquid is continuously supplied to the application nozzle from the application liquid supply mechanism, and the discharge amount of the application liquid discharged from the application nozzle is kept constant. When a coating film is formed on a substrate to be coated, a certain amount of beads are formed between the coating nozzle and the substrate to be coated, and a certain amount of the beads is applied to the substrate to be coated.

[0007]

However, in the above-mentioned conventional coating apparatus, the coating liquid (bead) discharged from the coating nozzle is applied onto the substrate to be coated in order to surely contact the substrate. In the state at the start of the formation of the coating film in which the liquid is first applied (see FIG. 7A), the state is changed from the steady state in which the coating liquid is continuously applied onto the substrate to be applied (see FIG. 7B). Also requires a large amount of coating liquid. FIG. 7 (a)
In (b), reference numeral 5 denotes a coating nozzle, reference numeral 5a denotes a slit through which a coating liquid is discharged, reference numeral 8 denotes a substrate to be coated, and reference numeral 20 denotes a coating substrate.
Indicates a coating solution.

For this reason, in the conventional coating apparatus, even when the slide speed of the substrate to be coated is constant and the amount of the coating liquid discharged from the coating nozzle is constant, the coating film formed on the substrate to be coated is fixed. The thickness is not uniform. In other words, there is a problem that the portion of the coating film formed in the transition period from the start of the coating film formation to the transition to the steady state is a defective portion whose film thickness deviates from a normal value.

The present invention has been made in view of the above points, and reduces a portion having a poor film thickness formed at the start of forming a coating film on a substrate to be coated. An object of the present invention is to provide a coating apparatus and a coating method capable of uniformly and efficiently applying a coating liquid on a single-wafer type substrate to be coated.

[0010]

According to a first aspect of the present invention, there is provided a coating apparatus for applying a coating liquid on a substrate to be coated, a coating nozzle for discharging the coating liquid, and a coating nozzle for coating the coating nozzle. A coating moving mechanism configured to relatively move the coating nozzle and the substrate to be coated in a state where the coating nozzle is opposed to the substrate; and a coating mechanism disposed in parallel with the substrate to be coated, and coating a coating liquid on the substrate to be coated. Prior to the application, there is provided a coating apparatus comprising: a pre-coating section to which a coating liquid discharged from the coating nozzle is applied.

It is preferable that the above-mentioned first solution further includes an adjusting mechanism for adjusting a relative position of the preliminary coating section with respect to the substrate to be coated. Further, it is preferable that the pre-coating section is detachably attached to a stage on which the substrate to be coated is mounted. Further, it is preferable that the pre-applying section has a pre-applying block to which the application liquid discharged from the applying nozzle is applied, and a cleaning mechanism for cleaning the pre-applied block. Further, it is preferable that the pre-applying section further includes a cleaning moving mechanism for moving the pre-applied block between a coating liquid application position and a cleaning position. The preliminary application block has a plurality of application surfaces on which an application liquid is applied, and the cleaning moving mechanism controls the preliminary application block such that each application surface is located at an application position or a cleaning position of the application liquid. It is preferable to move. Further, it is preferable that the cleaning mechanism includes means for supplying a cleaning liquid to the preliminary application block, and means for recovering the application liquid removed together with the cleaning liquid from the preliminary application block.

According to a second aspect of the present invention, there is provided a coating method for coating a coating liquid on a substrate by relatively moving a coating nozzle and a substrate to be coated. Applying a liquid to a pre-coating unit disposed in parallel with the substrate to be coated, to adjust the amount of the coating liquid, and applying the coating liquid onto the substrate to be coated by the coating nozzle with the amount of the coating liquid adjusted. And a step of applying.

According to the first and second solutions of the present invention, prior to applying a coating liquid onto a substrate to be coated, a pre-coating portion disposed in parallel with the substrate to be coated is coated. Since the coating liquid discharged from the nozzle is applied, at the beginning of coating film formation, remove excess coating liquid discharged due to contact of the beads with the substrate to be coated, and adjust to the same amount as in the steady state. Can be. For this reason, it is possible to eliminate a change in the amount of the coating liquid from the state at the start of the coating film formation to the steady state (transitional period), and immediately after the start of the coating film formation on the substrate to be coated, a uniform film having a desired thickness is obtained. A uniform coating film with a desired film thickness can be formed on a large substrate such as a glass substrate used as a color filter for LCDs. can do.

According to a first solution of the present invention,
By adjusting the relative position of the preliminary coating section with respect to the substrate to be coated by the adjusting mechanism, the amount of the coating liquid at the start of the coating film formation becomes the same as that in the steady state according to the discharge amount and physical properties of the coating liquid. Can be adjusted easily. Furthermore, by attaching the pre-coating section to the stage on which the substrate to be coated is detachably attached, it is easy to replace the pre-coating section with a pre-coating section having appropriate wettability according to the properties of the coating liquid. It is possible to flexibly cope with coating liquids having various physical properties and to easily perform maintenance and cleaning of the preliminary coating section. Furthermore, the maintenance and cleaning of the preliminary application section can be easily performed by cleaning the preliminary application block in the preliminary application section, to which the application liquid has been applied, with the cleaning liquid by the cleaning mechanism. As the pre-coating block, a pre-coating block having a plurality of coating surfaces to which a coating liquid is applied is used, and the pre-coating block is moved by the cleaning moving mechanism so that each coating surface is located at the coating position or the cleaning position. In addition, the application surface on which the application liquid has been applied can be easily and quickly cleaned and reused.

[0015]

Embodiments of the present invention will be described below with reference to the drawings. 1 and 2 are views for explaining an embodiment of a coating apparatus according to the present invention.

As shown in FIG. 1, the coating apparatus according to the present embodiment applies a coating liquid onto a substrate 8 to be coated, and includes a coating nozzle 5 for discharging the coating liquid.

The coating nozzle 5 has a belt-like shape extending in a direction (a direction perpendicular to the plane of FIG. 1) orthogonal to a sliding (moving) direction (the horizontal direction in FIG. 1) of the stage 3 on which the substrate 8 is placed. It has a slit 5a, so that a coating liquid supplied from a coating liquid supply mechanism (not shown) can be discharged downward through the slit 5a.

The coating nozzle 5 is supported by a die holder 4 capable of adjusting the horizontal state of the coating nozzle 5 with respect to the substrate 8 to be coated. The die holder 4 is attached to a support 16 via a lifting mechanism 15 so that the height of the coating nozzle 5 with respect to the substrate 8 to be coated can be arbitrarily adjusted. The support 16 is the base 1
Fixed on top.

On the other hand, the substrate 8 to be coated is placed on the stage 3 via the substrate holder 6 and is held on the upper surface of the substrate holder 6 by vacuum suction. A pre-coating unit 7 is arranged on the stage 3 in parallel with the substrate holder 6 (substrate 8 to be coated). The pre-coating unit 7 is applied from the coating nozzle 5 before coating the coating liquid on the substrate 8 to be coated. The discharged coating liquid is applied. The pre-coating unit 7 is disposed on the stage 3 via an adjustment table (adjustment mechanism) 9, and the relative position of the pre-coating unit 7 with respect to the substrate 8 (distance from the substrate 8, height And parallelism) can be adjusted.

Here, the stage 3 is slidably (movable) mounted on the base 1 via an air slide linear motor (coating moving mechanism) 2, and the coating nozzle 5
The coating nozzle 5 and the substrate 8 can be relatively moved with the slit 5a facing the substrate 8 to be coated. Further, the air slide linear motor 2 controls the movement of the stage 3 as appropriate so that the application liquid is applied onto the substrate 8 to be applied.
The application nozzle 5 is opposed to the preliminary application section 7 and the application nozzle 5
Can be applied.

Next, the details of the preliminary coating section 7 shown in FIG. 1 will be described with reference to FIG.

As shown in FIG. 2, the pre-coating section 7 has a pre-coating block 10 to which the coating liquid discharged from the coating nozzle 5 is applied, and a cleaning mechanism 17 for cleaning the pre-coating block 10. I have. The preliminary application block 10 has a rectangular column shape having a plurality of application surfaces on which the application liquid is applied. The pre-coating block 10 is disposed in the cleaning tank 11 of the cleaning mechanism 17 via a rotating shaft 10a, and the pre-coating block 10 is rotationally moved in a direction indicated by an arrow in FIG. It can be made to be. Thus, each coating surface of the preliminary coating block 10 is located at a coating position of the coating liquid (a position facing the coating nozzle 5) or a cleaning position (a position facing the cleaning liquid supply nozzle 12). The cleaning mechanism 17 includes a cleaning liquid supply nozzle 12 that supplies a cleaning liquid to the preliminary coating block 10 so as to clean each coating surface of the preliminary coating block 10, and collects the coating liquid removed together with the cleaning liquid from the preliminary coating block 10. And a cleaning tank 11. The cleaning liquid supply nozzle 12 is connected to the cleaning tank 1.
It is attached to 1. The cleaning tank 11 includes a cleaning liquid drain 13 for removing the cleaning liquid and the coating liquid,
An exhaust port 14 for drying each application surface of the preliminary application block 10 after cleaning by circulation of air or the like is attached.

The pre-coating block 10 is controlled according to parameters such as a coating speed, a coating liquid supply rate, and a coating clearance by a coating process according to a target film thickness of the coating film formed on the substrate 8 to be coated. And those having appropriate wettability can be selected. Examples of such a pre-coating block 10 having appropriate wettability include, in addition to the same glass as the substrate 8 to be coated, a polymer such as polyethylene terephthalate, polyethylene naphthalate, polyimide polyether sulfone, polyphenylene sulfide, or polyamide. Metals such as resin, stainless steel, copper, iron, and chromium can be used. In order to improve the wettability, chemical resistance and environmental resistance of these materials, a surface treatment may be appropriately performed.

As the substrate 8 to be coated, an arbitrary substrate such as a glass substrate used for a color filter for an LCD can be used. Further, as the coating liquid discharged from the coating nozzle 5, an arbitrary liquid such as a coloring liquid for a color filter can be used. Specifically, for example, a solvent-based photosensitive resin, a water-based photosensitive resin, or a colored photosensitive resin in which a coloring material such as a pigment is dispersed in these photosensitive resins, various adhesives, for forming a protective film and the like Resins, various inks and the like can be used.

Next, referring to FIGS. 1 and 2, the operation of the present embodiment having such a configuration will be described.

First, as shown in FIG. 1, a substrate 8 to be coated is held on a substrate holder 6 provided on the stage 3 by vacuum suction, and a pre-coating unit 7 provided on the stage 3 is held. The position of the stage 3 in the left-right direction is adjusted so that the slit 5a of the application nozzle 5 is located above. At this time, the parallelism and height of the application nozzle 5 with respect to the substrate 8 are adjusted by the die holder 4 and the elevating mechanism 15, respectively. Further, the relative position (distance, height and parallelism with the substrate 8 to be coated) of the preliminary coating unit 7 (the cleaned coating surface of the preliminary coating block 10) with respect to the substrate 8 to be coated is adjusted by the adjusting table 9.

In this state, a coating liquid supply mechanism (not shown)
, The application liquid is supplied to the application nozzle 5 continuously, and the application liquid is discharged downward from the slit 5 a of the application nozzle 5.

At the same time, the stage 3 is slid rightward from the position shown in FIG. 1 by the air slide linear motor 2 so that the coating liquid discharged from the coating nozzle 5 is
Then, the amount of the coating liquid is adjusted to apply the coating liquid onto the substrate 8 to be coated.

After the application liquid is applied over the entire surface of the substrate 8 to be coated, the stage 3 is slid leftward in FIG. 1 by the air slide linear motor 2 and returned to the position in FIG.

After the application liquid is applied to the predetermined number of substrates 8 as described above, the application surface of the preliminary application block 10 on which the application liquid has been applied is washed. Specifically, as shown in FIG. 2, the preliminary application block 10 is rotated and moved by a driving unit (cleaning moving mechanism) (not shown), and the application surface disposed at a position facing the application nozzle 5 is cleaned by the cleaning liquid supply nozzle. Move to the position facing 12
The application surface is cleaned by the cleaning liquid supplied from the cleaning liquid supply nozzle 12. The coating liquid removed together with the cleaning liquid from the preliminary coating block 10 is removed by the cleaning liquid drain 13 through the cleaning tank 11. The coated surface of the preliminary coating block 10 after the cleaning is dried by circulating air or the like through the exhaust port 14.

As described above, according to the present embodiment, the coating nozzle is applied to the pre-coating unit 7 arranged in parallel with the substrate 8 before applying the coating liquid on the substrate 8. 5
Since the coating liquid discharged from is applied, at the beginning of the coating film formation, excess coating liquid discharged due to the contact of the bead with the substrate 8 to be coated is removed, and the amount is adjusted to the same amount as in the steady state. it can. For this reason, the change of the amount of the coating liquid from the state at the start of the coating film formation to the steady state (transition period)
Immediately after the start of forming a coating film on the substrate 8, a uniform coating film having a desired film thickness can be formed on the substrate 8.
A uniform coating film having a desired film thickness can be formed even on a large-area substrate such as a glass substrate used for a color filter for an LCD.

Further, according to the present embodiment, the preliminary coating section 7 is mounted on the stage 3 via the adjusting table 9 and the relative position of the preliminary coating section 7 with respect to the substrate 8 to be coated (with respect to the substrate 8 to be coated). Distance, height and parallelism) can be adjusted, so that the amount of the coating liquid at the start of coating film formation can be easily adjusted to the same amount as in the steady state according to the discharge amount and physical properties of the coating liquid. Can be adjusted.

Further, according to the present embodiment, the pre-coating block 10 of the pre-coating section 7 is mounted on the stage 3 (the cleaning tank 1).
Since it is detachably attached to 1), it can be easily replaced with a pre-coating block having appropriate wettability according to the physical properties of the coating liquid, and it is flexible to coating liquids of various physical properties. And maintenance and cleaning of the preliminary coating unit 7 can be easily performed.

Further, according to the present embodiment, the pre-coating block 1 of the pre-coating section 7 to which the coating liquid has been applied.
Since the cleaning unit 17 is cleaned with the cleaning liquid by the cleaning mechanism 17, maintenance and cleaning of the preliminary coating unit 7 can be easily performed. The preliminary application block 10 has a plurality of application surfaces on which the application liquid is applied, and a driving unit (a cleaning moving mechanism) (not shown) positions each application surface facing the application nozzle 5 or the cleaning liquid supply nozzle 12. Since the pre-coating block 10 is rotated so as to be positioned at a position facing the coating liquid, the coated surface on which the coating liquid has been coated can be easily and quickly cleaned and reused.

In the above-described embodiment, a preliminary coating block 10 having a plurality of coating surfaces is used as the preliminary coating section 7, and each of these coating surfaces faces the coating nozzle 5 and the cleaning liquid supply nozzle 12 The pre-coating block 10 is rotated so as to be switched between opposing positions, but is not limited to this. As shown in FIG. 3, the pre-coating block 10 having only one coating surface is used.
This coating surface is moved between the coating position of the coating liquid and the cleaning position, or as shown in FIG.
A pre-coating block 10 having two coating surfaces is used, and the pre-coating block 10 is appropriately inverted so that these coating surfaces can be switched between a position facing the coating nozzle 5 and a position facing the cleaning liquid supply nozzle 12. It may be. In FIGS. 3 and 4, members having the same functions as those of the preliminary application unit 7 shown in FIG. 2 are denoted by the same reference numerals.

In the above-described embodiment, the application nozzle 5 is fixed with the slit 5a opened downward, and the stage 3 is slid with respect to the fixed application nozzle 5 to cover the application nozzle. The coating on the coating substrate 8 is performed, but not limited thereto. (1) The coating nozzle 5 is fixed in a state where the slit 5a is opened upward and the coating nozzle 5 is fixed to the fixed coating nozzle 5. The stage 3 is slid to perform coating on the substrate 8 to be coated, or (2) the coating nozzle 5 with the slit 5a opened downward.
Is applied to the substrate to be coated 8 by sliding it with respect to the fixed stage 3, or (3) the coating nozzle 5 with the slit 5a opened upward is fixed to the fixed stage 3. The substrate 3 may be slid with respect to the substrate 3 so that the substrate 8 is coated.

Further, in the above embodiment,
Although the pre-coating block 10 of the pre-coating unit 7 is detachably attached to the cleaning tank 11, the present invention is not limited to this, and the entire pre-coating unit 7 may be detachably attached to the stage 3.

[0038]

Next, a specific embodiment of the coating apparatus shown in FIGS. 1 and 2 will be described.

In this embodiment, as the substrate 8 to be coated, LC
A glass substrate used for a color filter for D was used. Regarding the dimensions of the glass substrate, the length in the width direction (application direction) is 670 mm, and the length in the lateral direction is 550 mm. Also,
As a coating liquid discharged from the coating nozzle 5, a color mosaic CR-7001 manufactured by Fuji Film Ohlin Co., Ltd. was used as a coloring liquid for a color filter.

On the other hand, the moving speed (coating speed) of the air slide linear motor 2 was set to 50 mm / sec, and the coating liquid supply rate from the coating nozzle 5 was set to 0.2 ml / sec. The coating clearance between the coating nozzle 5 and the substrate 8 was set to 75 μm.

Further, the substrate 8 to be coated and the preliminary coating section 7 (preliminary coating block 10) were installed in the following relationship.
That is, the end of the substrate 8 to be coated and the preliminary coating block 10
The distance between the substrate and the end of the application surface for application was set to 2 mm, and the application surface of the substrate 8 to be applied was set 50 μm higher than the application surface for application of the preliminary application block 10. The application surface of the substrate 8 to be applied and the application surface for application of the preliminary application block 10 were set to be parallel to each other.

As the pre-coating block 10, a stainless steel block is used, and the pre-coating block 10 is moved at the same speed as the coating speed before the coating liquid is coated on the substrate 8 to be coated. The application nozzle 5 was brought into contact with the pre-application block 10 over a distance of 50 mm.

As a result of applying the coating liquid on the substrate 8 under the above conditions, the film thickness of the coating film formed on the substrate 8 is reduced as shown in FIG. Was substantially uniform (film thickness: 1.5 μm) over the entire surface of the substrate. That is,
Even with a large-area substrate used as a color filter for LCD, a uniform coating film could be formed immediately after the start of forming the coating film on the substrate 8 to be coated. FIG. 6 shows the results of a comparative example in which the application liquid was applied under the same conditions as in the above-described example without using the preliminary application unit 7.

[0044]

As described above, according to the present invention, the defective film thickness portion formed at the start of forming a coating film on a substrate to be coated is reduced, and a single-wafer type such as a large glass substrate or a plastic substrate is reduced. The coating liquid can be uniformly and efficiently applied onto the substrate to be coated.

[Brief description of the drawings]

FIG. 1 is an overall configuration diagram showing an embodiment of a coating apparatus according to the present invention.

FIG. 2 is an enlarged view showing details of a part II of the coating apparatus shown in FIG.

FIG. 3 is a view showing a modification of the preliminary application section shown in FIG. 2;

FIG. 4 is a view showing another modified example of the preliminary application section shown in FIG. 2;

5 is a view showing a film thickness distribution of a substrate to be coated when a coating liquid is applied by the coating apparatus shown in FIG. 1;

FIG. 6 is a view showing a result of a comparative example corresponding to the example shown in FIG. 5;

FIG. 7 is a view for explaining a state of a coating liquid (bead) between a coating nozzle and a substrate to be coated.

[Explanation of symbols]

 Reference Signs List 1 base 2 air slide linear motor (coating moving mechanism) 3 stage 4 die holder 5 coating nozzle 5a slit 6 substrate holder 7 pre-coating section 8 substrate 9 adjustment table (adjustment mechanism) 10 pre-coating block 10a rotating shaft 11 cleaning tank 12 Cleaning liquid supply nozzle 13 Cleaning liquid drain 14 Exhaust port 15 Elevating mechanism 16 Support 17 Cleaning mechanism

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Yohichi Suzuki 1-1-1, Ichigaya-Kaga-cho, Shinjuku-ku, Tokyo Inside Dai Nippon Printing Co., Ltd. (72) Inventor Takeo Koito Ichigaya Kaga, Shinjuku-ku, Tokyo 1-1-1 cho-cho F-term in Dai Nippon Printing Co., Ltd. (reference) 2H048 BA43 BB14 BB42 4D075 AC02 AC53 AC73 AC84 AC92 BB65Y CA48 CB07 DA06 DB13 DB31 DC24 EA07 4F041 AA02 AA05 AB01 BA05 BA56 CA02 CA22 CA28 4F042 AA02AA10A CC15

Claims (10)

[Claims] An application apparatus for applying an application liquid onto a substrate to be applied includes: an application nozzle for discharging the application liquid; and an application nozzle and the substrate to be applied in a state where the application nozzle faces the substrate to be applied. And a coating moving mechanism for relatively moving the coating liquid, disposed in parallel with the substrate to be coated, and before applying the coating liquid on the substrate to be coated, the coating liquid discharged from the coating nozzle is A coating device, comprising: a pre-coating unit for coating. 2. The coating apparatus according to claim 1, further comprising an adjustment mechanism for adjusting a relative position of the preliminary coating section with respect to the substrate to be coated. 3. The coating apparatus according to claim 1, wherein the preliminary coating section is detachably attached to a stage on which the substrate to be coated is mounted. 4. The pre-coating section includes a pre-coating block to which a coating liquid discharged from the coating nozzle is applied, and a cleaning mechanism for cleaning the pre-coating block. 4. The coating device according to any one of 3. 5. The coating apparatus according to claim 4, wherein said preliminary coating section further includes a cleaning moving mechanism for moving said preliminary coating block between a coating liquid application position and a cleaning position. 6. The pre-coating block has a plurality of coating surfaces on which a coating liquid is coated, and the cleaning moving mechanism is configured to control the pre-coating so that each of the coating surfaces is positioned at a coating liquid application position or a cleaning position. The coating apparatus according to claim 5, wherein the coating block is moved. 7. The cleaning mechanism according to claim 1, further comprising means for supplying a cleaning liquid to the preliminary coating block, and means for collecting the coating liquid removed together with the cleaning liquid from the preliminary coating block. 7. The coating device according to any one of items 4 to 6. 8. The coating apparatus according to claim 1, wherein a substrate for a color filter is used as the substrate to be coated, and a coloring liquid for a color filter is used as the coating liquid. 9. A coating method for coating a coating liquid on a substrate by relatively moving a coating nozzle and a substrate to be coated, wherein the coating liquid discharged from the coating nozzle is arranged in parallel with the substrate to be coated. Adjusting the amount of the coating liquid by applying the coating liquid to the pre-coating unit provided; and applying the coating liquid to the substrate to be coated by the coating nozzle having the adjusted amount of the coating liquid. Coating method. 10. The coating method according to claim 9, wherein a substrate for a color filter is used as the substrate to be coated, and a coloring liquid for a color filter is used as the coating liquid.