JP2002033273A5 - - Google Patents
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- JP2002033273A5 JP2002033273A5 JP2001144021A JP2001144021A JP2002033273A5 JP 2002033273 A5 JP2002033273 A5 JP 2002033273A5 JP 2001144021 A JP2001144021 A JP 2001144021A JP 2001144021 A JP2001144021 A JP 2001144021A JP 2002033273 A5 JP2002033273 A5 JP 2002033273A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001144021A JP4651851B2 (ja) | 2000-05-12 | 2001-05-14 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-140319 | 2000-05-12 | ||
| JP2000140319 | 2000-05-12 | ||
| JP2001144021A JP4651851B2 (ja) | 2000-05-12 | 2001-05-14 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002033273A JP2002033273A (ja) | 2002-01-31 |
| JP2002033273A5 true JP2002033273A5 (enrdf_load_stackoverflow) | 2008-05-29 |
| JP4651851B2 JP4651851B2 (ja) | 2011-03-16 |
Family
ID=26591784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001144021A Expired - Fee Related JP4651851B2 (ja) | 2000-05-12 | 2001-05-14 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4651851B2 (enrdf_load_stackoverflow) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7344825B2 (en) | 2002-04-04 | 2008-03-18 | Semiconductor Energy Laboratory Co., Ltd. | Method of fabricating semiconductor device, and developing apparatus using the method |
| US7875419B2 (en) | 2002-10-29 | 2011-01-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for removing resist pattern and method for manufacturing semiconductor device |
| US7115488B2 (en) | 2003-08-29 | 2006-10-03 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing semiconductor device |
| JP4754792B2 (ja) * | 2003-08-29 | 2011-08-24 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| CN105489499B (zh) * | 2015-12-21 | 2018-12-07 | 武汉华星光电技术有限公司 | Ltps薄膜晶体管制造方法 |
| CN107643624A (zh) * | 2017-09-22 | 2018-01-30 | 深圳市华星光电半导体显示技术有限公司 | 有机薄膜结构及其制备方法 |
| US10677971B2 (en) | 2017-09-22 | 2020-06-09 | Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Organic thin film structure and method for manufacturing same |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02264261A (ja) * | 1989-04-05 | 1990-10-29 | Mitsubishi Electric Corp | レジストパターンの形成方法 |
| JPH04275430A (ja) * | 1991-03-04 | 1992-10-01 | Matsushita Electron Corp | 半導体装置の製造方法 |
| JPH06244155A (ja) * | 1993-02-19 | 1994-09-02 | Sumitomo Metal Ind Ltd | 半導体装置のメタル配線パターン形成方法 |
| JP2829909B2 (ja) * | 1993-11-19 | 1998-12-02 | ソニー株式会社 | レジスト処理方法及びレジスト処理装置 |
| JPH07201722A (ja) * | 1993-12-28 | 1995-08-04 | Mitsubishi Electric Corp | レジストパターン形成方法 |
| JP3592805B2 (ja) * | 1995-08-17 | 2004-11-24 | 株式会社ルネサステクノロジ | フォトレジストパターン形成方法 |
| JP3310202B2 (ja) * | 1997-07-24 | 2002-08-05 | 株式会社東芝 | レジストパターンの形成方法 |
| JP2000031025A (ja) * | 1998-07-15 | 2000-01-28 | Mitsubishi Electric Corp | レジストパターンの形成方法 |
| JP2000089477A (ja) * | 1998-09-11 | 2000-03-31 | Nec Corp | レジストパターンの形成方法 |
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2001
- 2001-05-14 JP JP2001144021A patent/JP4651851B2/ja not_active Expired - Fee Related