JP2002028869A - Floor surface grinding/polishing/cleaning method and crossed floor surface grinding/polishing/cleaning method - Google Patents

Floor surface grinding/polishing/cleaning method and crossed floor surface grinding/polishing/cleaning method

Info

Publication number
JP2002028869A
JP2002028869A JP2000215759A JP2000215759A JP2002028869A JP 2002028869 A JP2002028869 A JP 2002028869A JP 2000215759 A JP2000215759 A JP 2000215759A JP 2000215759 A JP2000215759 A JP 2000215759A JP 2002028869 A JP2002028869 A JP 2002028869A
Authority
JP
Japan
Prior art keywords
cleaning
floor
polishing
film thickness
floor surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000215759A
Other languages
Japanese (ja)
Inventor
Katsukiyo Shimomura
勝清 下村
Tomoaki Tokuda
智昭 徳田
Osamu Nakamura
修 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KASHIWABARA PAINTING WORKS CO
KASHIWABARA PAINTING WORKS CO Ltd
Original Assignee
KASHIWABARA PAINTING WORKS CO
KASHIWABARA PAINTING WORKS CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KASHIWABARA PAINTING WORKS CO, KASHIWABARA PAINTING WORKS CO Ltd filed Critical KASHIWABARA PAINTING WORKS CO
Priority to JP2000215759A priority Critical patent/JP2002028869A/en
Publication of JP2002028869A publication Critical patent/JP2002028869A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To perform successive adjustments for grinding/polishing/cleaning capability based on a numerical control for a floor surface or a crossed floor surface, to optimize a grinding/polishing/cleaning condition for a work and improve workability (grinding/ polishing/cleaning result). SOLUTION: A film thickness detection means S and a control means 80 (8) are mounted on a self-traveling type floor surface grinding/polishing/cleaning device, grinding/polishing/cleaning film thickness or residual film thickness for a coating film floor surface F is evaluated, a control output on projection amount of a grinding/ polishing/cleaning material or traveling speed is performed and a feedback control is performed. As for the grinding/polishing/cleaning method for the crossed floor surface, grinding/polishing/cleaning film thickness or residual film thickness for coating film of a line width on a two-plane crossed line is evaluated by using the self-traveling type crossed floor surface grinding/polishing/cleaning device. Two self-traveling type crossed floor surface grinding/polishing/cleaning devices are used, are formed in tandem in an advancing direction and separately arranged, and secondary grinding/polishing/ cleaning is performed for the line width including the two-plane crossed line of a floor surface and a wall surface succeeding to a primary grinding/polishing/cleaning.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、遠心投射式の研掃
手段を搭載し、前部中央に1輪構成の空転可能な前部車
輪と後部左右に2輪構成の駆動車輪を有して直進走行し
ながら床面を研掃する自走式床面研掃装置を用いた床面
研掃方法、及び前記自走式床面研掃装置の投射室を傾設
し、床面と壁面との2面交差線上に開口するように配向
した自走式交差床面研掃装置を用いて、床面と壁面との
2面交差線上を含む線幅を研掃する交差床面研掃方法に
関する。ここで、本発明方法に使用する研掃装置は、ブ
ラストヘッド(機体)と研掃塗膜(粉塵)を回収する集
塵機とに分離構成された遠心投射式のブラストマシンで
あって、研掃材を循環使用するクローズドシステムのも
のを言っている。なお、研掃材にはスチールグリッドを
使用する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is equipped with a centrifugal projection type blasting means, and has a front wheel having a single wheel configuration at the center of the front portion and two drive wheels at the rear left and right. Floor cleaning method using a self-propelled floor cleaning device that cleans the floor while traveling straight, and the projection chamber of the self-propelled floor cleaning device is tilted, The present invention relates to a cross-floor surface cleaning method for cleaning a line width including a two-surface crossing line between a floor surface and a wall surface by using a self-propelled cross-floor cleaning device oriented so as to open on a two-surface crossing line. . Here, the blasting device used in the method of the present invention is a centrifugal projection type blasting machine separated into a blast head (body) and a dust collector for collecting the blasting film (dust). A closed system that recycles is used. Note that a steel grid is used as the abrasive material.

【0002】[0002]

【従来の技術】石油タンクの床板は、長方形の鋼板を規
則正しく敷き詰めて溶接され、溶接目(以下、溶接
線。)は縦横の直線状(格子状)であり、全面に塗膜が
施されている。以下、「床板」と「床面」、「側板」と
「壁面」はそれぞれ互換的に使用する。
2. Description of the Related Art A floor plate of an oil tank is welded by regularly laying rectangular steel plates and welding, and a welding line (hereinafter referred to as a welding line) is a vertical and horizontal straight line (lattice shape). I have. Hereinafter, "floor board" and "floor surface" and "side plate" and "wall surface" are used interchangeably.

【0003】ところで、定期的な開放検査時には、溶接
線上の塗膜床面を剥いで溶接箇所を露出する必要があ
り、本発明が属する研掃装置が用いられてきた。もちろ
ん、開放検査時だけでなく、劣変又は寿命によるライニ
ングの塗り替え時やコーティング復旧時の素地調整(ス
ケール除去や塗膜剥離等)のためにも用いられる。
[0003] By the way, at the time of periodic open inspection, it is necessary to peel off the floor of the coating film on the welding line to expose the welded portion, and a polishing apparatus to which the present invention belongs has been used. Of course, it is used not only at the time of the open inspection, but also at the time of recoating of the lining due to deterioration or life or at the time of substrate adjustment (scale removal, coating film peeling, etc.) at the time of coating restoration.

【0004】自走式床面研掃装置は、被研掃体(以下、
ワーク。)の溶接線に沿って直線的に走行移動するので
あるが、塗膜の完全剥離をおこなうのか、所望膜厚のみ
を剥離するのか(塗膜層、例えばプライマー層を残留さ
せるのか)によって装置出力(研掃能力)を調整する必
要がある。この場合、ワークの塗膜(膜厚)が不均一で
あると調整が難しい。
[0004] The self-propelled floor polisher is a polished body (hereinafter, referred to as a polished body).
work. ) Linearly moves along the welding line of (1), but the output of the apparatus depends on whether the coating film is completely removed or only the desired film thickness is removed (whether the coating film layer, for example, the primer layer is left). It is necessary to adjust (cleaning ability). In this case, adjustment is difficult if the coating film (film thickness) of the work is not uniform.

【0005】こうしたなかで、研掃能力の調整に関して
は、従来の自走式床面研掃装置においてもいくつかの提
案があった。
[0005] Under these circumstances, there have been some proposals regarding the adjustment of the cleaning ability in a conventional self-propelled floor cleaning apparatus.

【0006】例えば、ワークの寸法に応じ研掃材の投射
範囲を自動的に制御するもの(特開平9−29642
号)、研掃材の投射角度を変動させることにより研掃効
率を向上しようとするもの(特開平6−254766
号)、及び装置2台の各投射部を同じ研掃範囲に集中し
て研掃能力を増補しようとするもの(特開平6−254
766号)があった。
For example, an apparatus for automatically controlling the projection range of the abrasive material according to the size of the work (Japanese Patent Laid-Open No. 9-29642)
), An attempt to improve the blasting efficiency by changing the projection angle of the blasting material (JP-A-6-254766).
No. 6) and an attempt to augment the blasting capability by concentrating the respective projection units of the two devices in the same blasting range (Japanese Patent Laid-Open No. 6-254).
No. 766).

【0007】[0007]

【発明が解決しようとする課題】しかしながら、上記い
ずれの従来例においても、膜厚検知による制御出力はお
こなわず、ワークがどれほどの膜厚を有しているのか、
研掃作業後にどれほどの塗膜(膜厚)を残したかについ
ての評価を装置出力(研掃能力)に反映するものではな
かった。
However, in any of the above-mentioned conventional examples, no control output based on the film thickness detection is performed, and the film thickness of the work is determined.
The evaluation of how much the coating film (film thickness) was left after the polishing operation was not reflected in the output of the device (the cleaning capability).

【0008】したがって、研掃能力の制御(調整)や研
掃作業の効果判定は経験ある作業者(操作者)に依存し
てきた。
Therefore, control (adjustment) of the cleaning performance and determination of the effect of the cleaning operation depend on an experienced operator (operator).

【0009】また、2面交差線上(コーナー部又は角
部)、すなわち隅肉溶接された溶接線上の塗膜は斜面に
のることになり膜厚が均一とならず、一掃しただけでは
残留塗膜が生じるという問題があり、限局的な二次研掃
を効率的におこないたいという要請があった。
Further, the coating film on the two-plane intersection line (corner or corner), that is, on the weld line where the fillet welding is performed, is placed on a slope, and the film thickness is not uniform. There is a problem that a film is formed, and there has been a demand to efficiently perform a localized secondary cleaning.

【0010】本発明はこのような事情に鑑みなされたも
のであって、上記課題を解消し、自走しながら研掃直前
及び研掃直後のワークの膜厚を検知(評価)して制御出
力に反映させ、かつ、フィードバック制御することによ
り、数値制御に基づく研掃能力の逐次調整をおこない、
ワークに対する研掃条件の最適化と作業性(研掃成果)
の向上を図ることができる床面研掃方法及び交差床面研
掃方法を提供するものである。
The present invention has been made in view of the above circumstances, and solves the above-mentioned problems. The present invention detects (evaluates) the film thickness of a workpiece immediately before and immediately after polishing while self-propelled, and outputs a control output. And by performing feedback control, perform sequential adjustment of the cleaning capability based on numerical control,
Optimization of cleaning conditions for work and workability (results of cleaning)
It is intended to provide a floor cleaning method and a cross-floor cleaning method capable of improving the floor surface.

【0011】[0011]

【課題を解決するための手段】課題を解決するためのに
本発明は、遠心投射式の研掃手段を搭載し、前部中央に
1輪構成の空転可能な前部車輪と後部左右に2輪構成の
駆動車輪を有して直進走行しながら床面を研掃する自走
式床面研掃装置を用いてする床面研掃方法の改善であっ
て、前記自走式床面研掃装置に膜厚検知手段と制御手段
を搭載し、塗膜床面に対する研掃膜厚又は残留膜厚を評
価して、研掃材の投射量又は走行速度に係る制御出力を
おこない、かつ、フィードバック制御することを特徴と
するものである。
SUMMARY OF THE INVENTION In order to solve the problem, the present invention is equipped with a centrifugal projection type blasting means, and has a one-wheel idling front wheel at the front center and two right and left rear wheels. An improvement of a floor cleaning method using a self-propelled floor cleaning device that cleans a floor while traveling straight with driving wheels having a wheel configuration, wherein the self-propelled floor cleaning is performed. Equipped with a film thickness detecting means and a control means in the apparatus, evaluate the polished film thickness or residual film thickness on the coating film floor surface, perform a control output relating to the projection amount or running speed of the polished material, and feedback It is characterized by controlling.

【0012】また、上記自走式床面研掃装置の投射室を
傾設し、床面と壁面との2面交差線上に開口するように
配向した自走式交差床面研掃装置を用いて、床面と壁面
との2面交差線上を含む線幅を研掃する交差床面研掃方
法であって、前記自走式交差床面研掃装置に膜厚検知手
段と制御手段を搭載し、2面交差線上の線幅の塗膜に対
する研掃膜厚又は残留膜厚を評価して、研掃材の投射量
又は走行速度に係る制御出力をおこない、かつ、フィー
ドバック制御することを特徴とするものである。
Further, the projection chamber of the self-propelled floor polisher is tilted, and a self-propelled crossed floor polisher which is oriented so as to open on the intersection line between the floor and the wall is used. A cross-floor cleaning method for cleaning a line width including on a two-plane intersection line between a floor surface and a wall surface, wherein the self-propelled cross-floor cleaning apparatus includes a film thickness detecting means and a control means. And evaluates the polished film thickness or residual film thickness of the coating film having a line width on the two-plane intersection line, performs control output relating to the projection amount or running speed of the polished material, and performs feedback control. It is assumed that.

【0013】さらに、上記交差床面研掃方法において、
自走式交差床面研掃装置を2台用いて進行方向に縦列し
て離隔配置し、床面と壁面との2面交差線上を含む線幅
を一次研掃につづいて二次研掃する場合がある。ここで
は、二次研掃幅を一次研掃幅より狭めることにより、2
面交差線上の残留塗膜に対する限局的な研掃をおこな
う。
Further, in the above method for cleaning a crossed floor,
Using two self-propelled cross-floor cleaning devices, they are arranged in tandem in the direction of travel and separated from each other, and the line width including the crossing line between the floor surface and the wall surface is subjected to the secondary cleaning after the primary cleaning. There are cases. Here, by making the secondary sweep width narrower than the primary sweep width, 2
Performs localized cleaning of residual coating on the intersection line.

【0014】[0014]

【発明の実施の形態】本発明の実施の形態は、上記構成
の床面研掃方法において用いる自走式床面研掃装置の研
掃手段が、インペラーの回転により遠心力を付与された
研掃材の投射路と、投射後の研掃材及び研掃剥離された
塗膜の粉塵を研掃材貯留ホッパーに導く回収路を有し、
投射路と回収路を概略V字状に開角接合して機体の主骨
格を形成するとともに、該主骨格をハウジングとする投
射室を構設したものとなっており、装置機能において、
骨格周りに機体の重心が投射路側の駆動車輪の上方に位
置するように配置して前部車輪への負荷を減じた荷重バ
ランスにより、機体を方向転換可能なピボット機構を有
している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS In the embodiment of the present invention, the lapping means of the self-propelled floor lapping apparatus used in the method of lapping the floor having the above-described structure is provided with a centrifugal force applied by rotation of an impeller. A projection path for the sweep material, and a recovery path for guiding the dust of the abrasive material after the projection and the abrasive film removed to the abrasive material storage hopper,
The projection path and the recovery path are joined at an open angle in a substantially V-shape to form the main skeleton of the body, and a projection chamber having the main skeleton as a housing is provided.
A pivot mechanism is provided around the skeleton so that the center of gravity of the fuselage is located above the drive wheels on the projection path side, and the load can be turned by a load balance that reduces the load on the front wheels.

【0015】そして、膜厚検知手段は機体の前部と後部
に固定設置され、研掃前後の床面高さをそれぞれ検知又
は計測するものであり、制御手段はそれぞれの床面高さ
の差をもって研掃膜厚又は残留膜厚を評価し、かつ、研
掃材の投射量又は走行速度に係る制御量を決定して制御
出力に反映させるようにしている。
The film thickness detecting means is fixedly installed at the front part and the rear part of the airframe, and detects or measures the floor height before and after the polishing, respectively, and the control means controls the difference between the respective floor heights. The thickness of the polished material or the residual film thickness is evaluated in accordance with the above formula, and the control amount relating to the projection amount or the traveling speed of the blast material is determined and reflected on the control output.

【0016】また、上記構成の交差床面研掃方法におい
て、膜厚検知手段は機体の前部と後部に固定設置され、
研掃前後の2面交差線上の線幅に含まれる床面距離、壁
面距離、及び2面交差線上までの距離をそれぞれ検知又
は計測するものであり、制御手段はそれぞれの距離の差
をもって研掃膜厚又は残留膜厚を評価し、かつ、研掃材
の投射量又は走行速度に係る制御量を決定して制御出力
に反映させるようにしている。
Further, in the cross-floor surface cleaning method having the above-mentioned structure, the film thickness detecting means is fixedly installed at the front part and the rear part of the body.
The floor distance, the wall distance, and the distance to the two-plane intersection line included in the line width on the two-plane intersection line before and after the cleaning are detected or measured, respectively, and the control means performs the cleaning with a difference between the respective distances. The film thickness or the residual film thickness is evaluated, and the control amount relating to the projection amount or the traveling speed of the abrasive is determined and reflected on the control output.

【0017】[0017]

【実施例】(実施例1)本発明の床面研掃方法の一実施
例(以下、第1実施例。)について図面を参照して以下
説明する。各実施例において共通部分は同一符号を付し
ている。
(Embodiment 1) An embodiment (hereinafter, referred to as a first embodiment) of a floor cleaning method of the present invention will be described below with reference to the drawings. In each embodiment, the same reference numerals are given to common parts.

【0018】図1は第1実施例方法に用いる床面研掃装
置の側面視構成説明図であり、図2は同じく進行方向か
ら見た正面視構成説明図である。
FIG. 1 is an explanatory view of the configuration of a floor polisher used in the method of the first embodiment, as viewed from a side, and FIG.

【0019】図3は投射室の構設を示す断面視説明図で
ある。
FIG. 3 is a sectional view showing the construction of the projection chamber.

【0020】図4は図3中AA線断面視説明図である。FIG. 4 is an explanatory view in cross section taken along line AA in FIG.

【0021】図5は膜厚検知手段及び研掃方法を示すブ
ロック説明図である。
FIG. 5 is an explanatory block diagram showing the film thickness detecting means and the polishing method.

【0022】図示するように、第1実施例使用装置A
は、遠心投射式の研掃手段を搭載し、前部中央に1輪構
成の空転可能な前部車輪11と、後部左右に2輪構成の駆
動車輪10を有して直進走行しながら床面Fを研掃する自
走式床面研掃装置である。
As shown in FIG.
Is equipped with a centrifugal projection type cleaning means, and has a front wheel 11 having a single wheel configuration at the center of the front part and a driving wheel 10 having a two-wheel configuration at the rear left and right while traveling straight on the floor surface. This is a self-propelled floor surface cleaning device for cleaning F.

【0023】この研掃装置Aは、後部に横設され走行用
モーター6により駆動される駆動車輪軸101 の左右端近
くに固定した左右一対の駆動車輪10と、前部中央に一輪
の空転する前部車輪11を持ち、直進自走する構造として
いる。
This cleaning apparatus A has a pair of left and right driving wheels 10 fixed near the left and right ends of a driving wheel shaft 101 which is laterally provided at the rear and driven by a traveling motor 6, and one wheel idles at the center of the front part. It has a front wheel 11 and runs straight ahead.

【0024】研掃手段は、インペラー21の回転により遠
心力を付与された研掃材の投射路31と、投射後の研掃材
及び研掃剥離された塗膜の粉塵を研掃材貯留ホッパー5
に導く回収路4を有し、投射路31と回収路4を概略V字
状に開角接合して機体の主骨格を形成するとともに、該
骨格をハウジングとする投射室3を構設している。
The blasting means includes a blasting path 31 for the blasting material to which centrifugal force is applied by the rotation of the impeller 21 and a hopper for storing the blasting material after the projection and the dust of the coating film removed by blasting. 5
And the projection path 31 and the recovery path 4 are opened and joined in a substantially V-shape to form the main frame of the fuselage, and the projection chamber 3 having the frame as a housing is constructed. I have.

【0025】投射室3の構設は、投射路31と回収路4と
の接合部下面を開放し、かつ4周囲を制限ライナー32及
びスカート部材22で囲繞して床面Fとの間で閉鎖的な室
空間を形成するものである。
The construction of the projection chamber 3 is such that the lower surface of the joint between the projection path 31 and the recovery path 4 is opened, and the periphery of the projection path 3 is surrounded by the limiting liner 32 and the skirt member 22 and closed between the floor and the floor F. It forms a typical room space.

【0026】骨格形状は、設置基面に対する投射路31が
55°〜65°範囲に、及び回収路4が40°〜50°
範囲に傾斜した配向を有するように投射路31と回収路4
とを開角接合している。
The skeleton shape is such that the projection path 31 with respect to the installation base surface is in the range of 55 ° to 65 °, and the recovery path 4 is 40 ° to 50 °.
Projection path 31 and recovery path 4 to have a tilted orientation in the range
And open angle joining.

【0027】ここでは、投射路31と回収路4とがなす接
合開度を65°〜85°範囲とし、この開角スペースに
研掃材貯留ホッパー5を跨設している。
Here, the joint opening formed between the projection path 31 and the recovery path 4 is set in the range of 65 ° to 85 °, and the abrasive material storage hopper 5 is provided across this open angle space.

【0028】骨格周りには、付設機器であるインペラー
ユニット2、研掃材貯留ホッパー5、インペラーモータ
ー1、走行用モーター6、走行クラッチ7、制御盤8、
及び膜厚検知手段Sを、機体の重心が投射路21側の駆動
車輪10の上方に位置するように配置して前部車輪11への
負荷を減じている。この荷重バランスにより機体を方向
転換可能なピボット機構を有するものとなる。
Around the skeleton, an impeller unit 2 as an attached device, an abrasive storage hopper 5, an impeller motor 1, a traveling motor 6, a traveling clutch 7, a control panel 8,
Further, the film thickness detecting means S is arranged so that the center of gravity of the fuselage is located above the driving wheels 10 on the side of the projection path 21 to reduce the load on the front wheels 11. With this load balance, a pivot mechanism that can change the direction of the body is provided.

【0029】そして研掃方法は、上記研掃装置Aを用
い、研掃中にワークに対する研掃膜厚又は残留膜厚を評
価して、研掃材の投射量又は走行速度に係る制御出力を
おこない、かつ、フィードバック制御することにより、
ワークに対して最適条件下での研掃をおこなう。
In the polishing method, the above-mentioned polishing apparatus A is used to evaluate the film thickness or the residual film thickness of the workpiece during the polishing, and the control output relating to the projection amount or running speed of the cleaning material is obtained. And by performing feedback control,
The workpiece is cleaned under optimal conditions.

【0030】ここで、膜厚検知手段Sは機体の前部と後
部に固定設置され、研掃前後の床面F高さをそれぞれ検
知又は計測するものであり、制御手段80はそれぞれの床
面高さの差をもって研掃膜厚又は残留膜厚を評価し、か
つ、研掃材の投射量又は走行速度に係る制御量を決定し
て制御出力に反映させるようにしている。
Here, the film thickness detecting means S is fixedly installed at the front part and the rear part of the machine body, and detects or measures the height of the floor F before and after the polishing, respectively. The thickness of the polished film or the remaining film thickness is evaluated based on the difference in height, and the control amount relating to the projection amount or the traveling speed of the polished material is determined and reflected on the control output.

【0031】(実施例2)本発明の自走式交差床面研掃
方法の一実施例(以下、第2実施例。)について図面を
参照して以下説明する。
(Embodiment 2) An embodiment of the self-propelled cross-floor surface cleaning method of the present invention (hereinafter referred to as a second embodiment) will be described below with reference to the drawings.

【0032】図6は第2実施例方法に用いる床面研掃装
置Cの断面視構成説明図であり、(a)及び(b)では
可変制限ライナー取付構造と研掃幅が相違する。(a)
の図示装置C(a) の研掃幅が壁面150(100)×床面150mm
、(b)の図示装置C(b) の研掃幅が50×50mmであ
る。
FIG. 6 is an explanatory view of a sectional view of a floor surface cleaning apparatus C used in the method of the second embodiment. In FIGS. 6A and 6B, the variable width liner mounting structure and the polishing width are different. (A)
The cleaning width of the illustrated device C (a) is 150 (100) wall × 150 mm floor
, (B) has a polishing width of 50 × 50 mm.

【0033】図示するように、第2実施例使用装置C
〔C(a),C(b) 〕は、上記実施例使用装置A(自走式床
面研掃装置)と主要構成は同じであるが、床面Fと壁面
Wとの2面交差線上を含む線幅(コーナー又は角部)を
研掃するように構成変更したものである。
As shown, as shown in FIG.
[C (a), C (b)] has the same main configuration as the apparatus A (self-propelled floor polisher) used in the above embodiment, but is on a two-plane intersection line between the floor F and the wall W. The configuration has been changed so that line widths (corners or corners) that include.

【0034】この構成変更は、第1実施例使用装置Aに
おける投射路21又はインペラユニットのアウトプット開
口201 を傾設して床面Fと壁面Wとの2面交差線上に開
口するように配向するとともに、該開口部の床面F側及
び壁面W側からそれぞれ研掃幅(又は投射幅)を拡縮可
能な可変制限ライナー32を臨設して投射室3を構設して
いる。
This configuration change is achieved by inclining the projection path 21 or the output opening 201 of the impeller unit in the apparatus A used in the first embodiment and orienting it so as to open on the line of intersection between the floor F and the wall W. At the same time, the projection chamber 3 is constructed with variable limit liners 32 capable of expanding and contracting the polishing width (or projection width) from the floor surface F side and the wall surface W side of the opening.

【0035】また、壁面に倣って走行を補助する摺接ロ
ーラー30(又はアニュラー)を付設し、壁面Wの曲率に
無関係に、かつ、追従して2面交差線上を含む線幅を研
掃するようにしている。具体的には、石油タンク等の隅
肉溶接線上の塗膜の研掃に適用される。
Further, a sliding roller 30 (or an annular) for assisting running along the wall surface is provided, and the line width including the intersection of two planes is cleaned regardless of the curvature of the wall surface W. Like that. Specifically, the present invention is applied to the cleaning of a coating film on a fillet welding line of an oil tank or the like.

【0036】そして研掃方法は、上記研掃装置Cのいず
れかを用い、2面交差線上の線幅の塗膜に対する研掃膜
厚又は残留膜厚を評価して、研掃材の投射量又は走行速
度に係る制御出力をおこない、かつ、フィードバック制
御することにより、ワークに対して最適条件下での研掃
をおこなう。
In the blasting method, the blasting amount of the blasting material is evaluated by evaluating the lapping film thickness or the residual film thickness of a coating film having a line width on the two-plane crossing line by using any one of the blasting apparatuses C described above. Alternatively, by performing a control output relating to the traveling speed and performing feedback control, the workpiece is cleaned under optimal conditions.

【0037】ここで、膜厚検知手段Sは機体の前部と後
部に固定設置され、研掃前後の2面交差線上の線幅に含
まれる床面距離、壁面距離、及び2面交差線上までの距
離をそれぞれ検知又は計測するものであり、制御手段80
はそれぞれの距離の差をもって研掃膜厚又は残留膜厚を
評価し、かつ、研掃材の投射量又は走行速度に係る制御
量を決定して制御出力に反映させるようにしている。こ
のブロック説明図は第1実施例方法における場合と同様
の構成であるため図示を省略した。
Here, the film thickness detecting means S is fixedly installed at the front part and the rear part of the airframe, and extends to the floor distance, wall distance, and the two plane intersection line included in the line width on the two plane intersection line before and after the polishing. Are respectively detected or measured.
Evaluates the polished film thickness or the residual film thickness based on the difference between the respective distances, and determines a control amount relating to the projection amount or the traveling speed of the polished material and reflects the control amount on the control output. This block explanatory diagram has the same configuration as that in the method of the first embodiment, so that the illustration is omitted.

【0038】(実施例3)本発明の自走式交差床面研掃
方法の他の実施例(以下、第3実施例。)について図面
を参照して以下説明する。
(Embodiment 3) Another embodiment (hereinafter, referred to as a third embodiment) of the self-propelled cross-floor surface cleaning method of the present invention will be described below with reference to the drawings.

【0039】第3実施例方法は、研掃幅が相違する2台
の自走式交差床面研掃装置C(a) 、C(b) を用いて進行
方向に縦列して離隔配置し、床面と壁面との2面交差線
上を含む線幅を一次研掃につづいて二次研掃する場合が
ある。ここでは、二次研掃幅を一次研掃幅より狭めるこ
とにより、2面交差線上の残留塗膜に対する限局的な研
掃をおこなう。
In the method of the third embodiment, two self-propelled cross-floor polishers C (a) and C (b) having different lap widths are arranged in tandem in the traveling direction and are separated from each other. In some cases, the line width including the crossing line between the floor and the wall surface is subjected to the secondary cleaning after the primary cleaning. Here, the secondary cleaning width is narrower than the primary cleaning width, so that localized cleaning of the residual coating film on the two-plane intersection line is performed.

【0040】具体的には、図6(a)の図示装置C(a)
を親機として先行走行させて、2面交差線上の線幅〔研
掃幅〕150(100)×150mm を一次研掃してゆき、図6
(b)の図示装置C(b) を子機として追跡走行させて、
2面交差線上の線幅〔研掃幅〕を狭めた50×50mmを二次
研掃する。石油タンクの隅肉溶接線上の塗膜は、一次研
掃によっても残留を生じ易く、限局的な二次研掃が必要
となるからである。このブロック説明図はそれぞれの装
置C(a) 、C(b) について第1実施例方法における場合
と同様の構成であるため図示を省略した。
More specifically, the device C (a) shown in FIG.
As a master machine, the vehicle is driven ahead, and the line width [sharpening width] on the two-plane intersection line is 150 (100) × 150mm, and the primary cleaning is performed.
The illustrated device C (b) shown in FIG.
Secondary cleaning is performed on a 50 x 50 mm line with a reduced line width (polishing width) on the two-plane intersection line. This is because the coating film on the fillet weld line of the oil tank is likely to remain even after the primary polishing, and a limited secondary cleaning is required. This block diagram is not shown because each of the devices C (a) and C (b) has the same configuration as that in the method of the first embodiment.

【0041】[0041]

【発明の効果】本発明は以上の構成よりなるものであ
り、これによれば以下に記載されるような効果を奏す
る。
The present invention has the above-described configuration, and has the following effects.

【0042】研掃膜厚を設定及び制御できるので、塗膜
が不均一なワークに対し、最適条件で研掃作業を実行
し、所望の効果を達成できる。しかも、作業者の経験に
頼らなくてよい。
Since the thickness of the polished film can be set and controlled, the polished work can be performed under optimum conditions for a work having a non-uniform coating film, and a desired effect can be achieved. Moreover, it is not necessary to rely on the experience of the worker.

【0043】研掃膜厚を設定値と計測値により数値制御
する点できめワークや作業目的に応じた細かい制御が可
能である。
The polishing film thickness is numerically controlled by the set value and the measured value, so that fine control can be performed according to the work and the purpose of the work.

【0044】研掃(塗膜剥離量)に係る作業量をデータ
として収録できるので、作業面積のみを基準にすること
なく、定量的な積算見積が可能である。
Since the amount of work related to the cleaning (the amount of peeling of the coating film) can be recorded as data, it is possible to perform a quantitative integrated estimation without using only the work area as a reference.

【0045】コーナーマシンとして専用される交差床面
研掃装置は、隅肉溶接を施された溶接線上を難なく研掃
し、かつ、2台を縦列させて一次研掃と二次研掃をおこ
なうことにより、作業効率が飛躍的に向上する。
A cross-floor polisher dedicated to use as a corner machine polishes a weld line on which a fillet weld has been applied without difficulty, and performs two primary tandem and two primary polishes. As a result, work efficiency is dramatically improved.

【0046】全体として、作業性が向上し、かつ作業量
(実績)の把握、データ蓄積により見積作成及び納期を
含む作業管理が改善されるので、産業上極めて有益な効
果を奏するものである。
As a whole, the workability is improved, and the work management including the estimation and the delivery date is improved by grasping the work amount (actual result) and accumulating the data, so that it is extremely useful in industry.

【図面の簡単な説明】[Brief description of the drawings]

【図1】第1実施例使用装置の側面視構成説明図であ
る。
FIG. 1 is a side view configuration explanatory view of a device used in a first embodiment.

【図2】同じく進行方向から見た正面視構成説明図であ
る。
FIG. 2 is an explanatory diagram of the configuration as viewed from the front, similarly viewed from the traveling direction.

【図3】投射室の構設を示す断面視説明図である。FIG. 3 is an explanatory cross-sectional view showing a configuration of a projection chamber.

【図4】図3中AA線断面視説明図である。FIG. 4 is an explanatory view in cross section taken along line AA in FIG. 3;

【図5】膜厚検知手段及び研掃方法(第1実施例方法)
を示すブロック説明図である。
FIG. 5 shows a film thickness detecting means and a cleaning method (first embodiment method).
FIG.

【図6】第2実施例使用装置の断面視構成説明図であ
る。
FIG. 6 is a cross-sectional configuration explanatory view of an apparatus using the second embodiment.

【符号の説明】[Explanation of symbols]

A 第1実施例使用装置(自走式床面研掃装置) C 第2実施例使用装置(自走式交差床面研掃装置) C(a),C(b) 第3実施例使用装置(自走式交差床面研
掃装置) F 床面(床板) W 壁面(側板) 1 インペラーモーター 2 インペラーユニット 21 インペラー 3 投射室 31 投射路 32 制限ライナー 33 スカート部材 4 回収路 5 研掃材貯留ホッパー 6 走行用モーター 7 走行クラッチ 8 制御盤 80 制御手段 9 グリップハンドル 10 駆動車輪 101 駆動車輪軸 11 前部車輪 20 投射機モジュール 201 アウトプット開口 30 摺接ローラー(又はアニュラー) S 膜厚検知手段
A Device used in the first embodiment (self-propelled floor cleaning device) C Device used in the second embodiment (self-propelled cross floor cleaning device) C (a), C (b) Device used in the third embodiment (Self-propelled cross-floor cleaning device) F Floor surface (floor plate) W Wall surface (side plate) 1 Impeller motor 2 Impeller unit 21 Impeller 3 Projection room 31 Projection path 32 Restricted liner 33 Skirt member 4 Collection path 5 Abrasive material storage Hopper 6 Running motor 7 Running clutch 8 Control panel 80 Control means 9 Grip handle 10 Drive wheel 101 Drive wheel shaft 11 Front wheel 20 Projector module 201 Output opening 30 Sliding roller (or annular) S Film thickness detecting means

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 遠心投射式の研掃手段を搭載し、前部中
央に1輪構成の空転可能な前部車輪と後部左右に2輪構
成の駆動車輪を有して直進走行しながら床面を研掃する
自走式床面研掃装置を用いた床面研掃方法において、前
記自走式床面研掃装置に膜厚検知手段と制御手段を搭載
し、塗膜床面に対する研掃膜厚又は残留膜厚を評価し
て、研掃材の投射量又は走行速度に係る制御出力をおこ
ない、かつ、フィードバック制御することを特徴とする
床面研掃方法。
A centrifugal projection type blasting means is mounted, a front wheel having a one-wheel configuration in the center of a front part and a two-wheel drive wheel on the left and right sides of a rear part are provided. In a floor cleaning method using a self-propelled floor cleaning device for cleaning a floor, the self-propelled floor cleaning device is equipped with a film thickness detecting means and a control means, and the coating floor is cleaned. A floor surface cleaning method comprising: evaluating a film thickness or a residual film thickness; performing a control output relating to a projection amount or a traveling speed of a cleaning material; and performing feedback control.
【請求項2】 遠心投射式の研掃手段を搭載し、前部中
央に1輪構成の空転可能な前部車輪と後部左右に2輪構
成の駆動車輪を有して直進走行しながら床面を研掃する
自走式床面研掃装置を用いた床面研掃方法において、前
記研掃手段が、インペラーの回転により遠心力を付与さ
れた研掃材の投射路と、投射後の研掃材及び研掃剥離さ
れた塗膜の粉塵を研掃材貯留ホッパーに導く回収路を有
し、投射路と回収路を概略V字状に開角接合して機体の
主骨格を形成するとともに、該主骨格をハウジングとす
る投射室を構設してなり、前記骨格周りに機体の重心が
投射路側の駆動車輪の上方に位置するように配置して前
部車輪への負荷を減じた荷重バランスにより、機体を方
向転換可能なピボット機構を有するものとした自走式床
面研掃装置を用いてする床面研掃方法であって、前記自
走式床面研掃装置に膜厚検知手段と制御手段を搭載し、
塗膜床面に対する研掃膜厚又は残留膜厚を評価して、研
掃材の投射量又は走行速度に係る制御出力をおこない、
かつ、フィードバック制御するようにした床面研掃方
法。
2. A centrifugal projection type blasting means is mounted, a front wheel having a one-wheel configuration in the center of the front part and a driving wheel having a two-wheel configuration on the left and right sides of the rear portion. A self-propelled floor-cleaning apparatus for cleaning a floor, wherein the cleaning means comprises: a projection path of a cleaning material imparted with centrifugal force by rotation of an impeller; It has a recovery path that guides the dust of the cleaning material and the peeled coating film to the cleaning material storage hopper, and forms a main skeleton of the fuselage by opening and joining the projection path and the recovery path in a substantially V-shape. And a projection chamber having the main skeleton as a housing, wherein the load is reduced around the skeleton such that the center of gravity of the body is positioned above the driving wheels on the projection path side to reduce the load on the front wheels. Using a self-propelled floor polisher with a pivot mechanism that can turn the aircraft by balancing A floor surface cleaning method, wherein the self-propelled floor surface cleaning device includes a film thickness detection unit and a control unit,
Evaluate the abrasive film thickness or residual film thickness on the coating film floor, perform control output related to the projection amount or running speed of the abrasive material,
In addition, a floor cleaning method in which feedback control is performed.
【請求項3】 膜厚検知手段が機体の前部と後部に固定
設置され、研掃前後の床面高さをそれぞれ検知又は計測
するものであり、制御手段が前記床面高さの差をもって
研掃膜厚又は残留膜厚を評価し、かつ、研掃材の投射量
又は走行速度に係る制御量を決定して制御出力に反映さ
せるものである請求項1又は2記載の床面研掃方法。
3. A film thickness detecting means is fixedly installed at a front part and a rear part of an airframe, and detects or measures a floor height before and after the polishing, respectively, and a control means detects a difference between the floor heights. The floor surface cleaning according to claim 1 or 2, wherein the polishing film thickness or the residual film thickness is evaluated, and a control amount relating to a projection amount or a traveling speed of the polishing material is determined and reflected on a control output. Method.
【請求項4】 遠心投射式の研掃手段を搭載し、前部中
央に1輪構成の空転可能な前部車輪と後部左右に2輪構
成の駆動車輪を有して直進走行しながら床面を研掃する
自走式床面研掃装置を用いた床面研掃方法において、前
記自走式床面研掃装置の投射室を傾設し、床面と壁面と
の2面交差線上に開口するように配向した自走式交差床
面研掃装置を用いて、床面と壁面との2面交差線上を含
む線幅を研掃する交差床面研掃方法であって、前記自走
式交差床面研掃装置に膜厚検知手段と制御手段を搭載
し、2面交差線上の線幅の塗膜に対する研掃膜厚又は残
留膜厚を評価して、研掃材の投射量又は走行速度に係る
制御出力をおこない、かつ、フィードバック制御するこ
とを特徴とする交差床面研掃方法。
4. A floor surface mounted with a centrifugal projection type blasting means, having one front wheel that can rotate freely in the center of the front part, and two driving wheels on the left and right sides of the rear part while traveling straight. In a floor cleaning method using a self-propelled floor cleaning device for cleaning a floor, the projection chamber of the self-propelled floor cleaning device is tilted so as to be on a two-plane intersection line between a floor surface and a wall surface. A cross-floor cleaning method for cleaning a line width including a crossing line between a floor surface and a wall surface by using a self-propelled cross-floor cleaning device oriented so as to open, wherein the self-propelled Equipped with a film thickness detection means and a control means in the cross-type floor cleaning device, evaluate the polishing film thickness or the residual film thickness for the coating film having a line width on the two-plane crossing line, the projection amount of the cleaning material or A cross-floor cleaning method, wherein a control output relating to a traveling speed is output and feedback control is performed.
【請求項5】 膜厚検知手段が機体の前部と後部に固定
設置され、研掃前後の2面交差線上の線幅に含まれる床
面距離、壁面距離、及び2面交差線上までの距離をそれ
ぞれ検知又は計測するものであり、制御手段が前記それ
ぞれの距離の差をもって研掃膜厚又は残留膜厚を評価
し、かつ、研掃材の投射量又は走行速度に係る制御量を
決定して制御出力に反映させるものである請求項4記載
の交差床面研掃方法。
5. A film thickness detecting means is fixedly installed at a front part and a rear part of an airframe, and a floor distance, a wall distance, and a distance to a two-plane intersection line included in a line width on a two-plane intersection line before and after the polishing. The control means evaluates the polishing film thickness or the residual film thickness based on the difference between the respective distances, and determines the control amount relating to the projection amount or the traveling speed of the polishing material. 5. The method according to claim 4, wherein the control output is reflected on the control output.
【請求項6】 請求項4又は5記載の交差床面研掃方法
において、自走式交差床面研掃装置を2台用いて進行方
向に縦列して離隔配置し、床面と壁面との2面交差線上
を含む線幅を一次研掃につづいて二次研掃するようにし
たことを特徴とする交差床面研掃方法。
6. The cross-floor cleaning method according to claim 4 or 5, wherein two self-propelled cross-floor cleaning apparatuses are arranged in tandem in the traveling direction and are separated from each other. A cross-floor surface cleaning method, wherein a line width including a line on a two-plane intersection line is subjected to a secondary cleaning after a primary cleaning.
【請求項7】 二次研掃幅を一次研掃幅より狭めること
により、2面交差線上の残留塗膜に対する限局的な研掃
をおこなうようにした請求項6記載の交差床面研掃方
法。
7. The cross-floor surface cleaning method according to claim 6, wherein the secondary cleaning width is made narrower than the primary polishing width, so that a localized cleaning of the residual coating film on the two-plane intersection line is performed. .
JP2000215759A 2000-07-17 2000-07-17 Floor surface grinding/polishing/cleaning method and crossed floor surface grinding/polishing/cleaning method Pending JP2002028869A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112296880A (en) * 2020-10-29 2021-02-02 胡继定 A controlling means that is used for throwing at uniform velocity walking and throws ball of ball cleaning cart

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112296880A (en) * 2020-10-29 2021-02-02 胡继定 A controlling means that is used for throwing at uniform velocity walking and throws ball of ball cleaning cart

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