JP2002028662A - Method for recovering cerium oxide from waste liquid of cerium oxide polishing agent for optical polishing and non-polluting treatment method for waste liquid of cerium oxide polishing agent for optical polishing - Google Patents
Method for recovering cerium oxide from waste liquid of cerium oxide polishing agent for optical polishing and non-polluting treatment method for waste liquid of cerium oxide polishing agent for optical polishingInfo
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- JP2002028662A JP2002028662A JP2000217057A JP2000217057A JP2002028662A JP 2002028662 A JP2002028662 A JP 2002028662A JP 2000217057 A JP2000217057 A JP 2000217057A JP 2000217057 A JP2000217057 A JP 2000217057A JP 2002028662 A JP2002028662 A JP 2002028662A
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- Prior art keywords
- cerium oxide
- waste liquid
- polishing
- optical
- polishing agent
- Prior art date
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光学研磨用酸化セ
リウム研磨剤廃液からの酸化セリウム回収方法及び光学
研磨用酸化セリウム研磨剤廃液の無公害化処理方法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for recovering cerium oxide from a cerium oxide abrasive waste liquid for optical polishing and a method for eliminating pollution from a cerium oxide abrasive waste liquid for optical polishing.
【０００２】[0002]
【従来の技術】酸化セリウムは、日本国内では産出しな
い鉱物から得られるため、輸入に頼っている資源であ
る。この酸化セリウムは硬度が高い微粒子であるため、
光学レンズや半導体シリコン基板及び液晶画面のガラス
板など、電子部品関係の光学研磨剤として大量に使用さ
れている重要な資源であり、その再利用を強く望まれて
いる資源である。また、光学研磨用の研磨剤としては、
上述の酸化セリウムを主成分としてナトリウム塩やクロ
ム塩などの遷移金属元素、そのイットリウムやデシプロ
シウムなど希土類元素の微粒子を含んでいるため、単純
な廃棄は環境上強く禁止されている。そのため、研磨に
使用した後の廃液の無公害化処理が強く望まれている。
このように酸化セリウムを含有する光学研磨剤廃液につ
いては、資源の再利用化の目的においても無公害化の目
的においても重要である。2. Description of the Related Art Cerium oxide is a resource that depends on imports because it is obtained from minerals that are not produced in Japan. Since this cerium oxide is a fine particle with high hardness,
It is an important resource that is used in large quantities as an optical abrasive for electronic components, such as optical lenses, semiconductor silicon substrates, and glass plates for liquid crystal screens, and is a resource that is strongly desired to be reused. Also, as an abrasive for optical polishing,
Since it contains the above-mentioned cerium oxide as a main component and a transition metal element such as a sodium salt and a chromium salt, and fine particles of a rare earth element such as yttrium and decyprosium, simple disposal is strongly prohibited in the environment. Therefore, there is a strong demand for pollution-free treatment of the waste liquid after use for polishing.
The optical abrasive waste liquid containing cerium oxide is important for the purpose of reusing resources and eliminating pollution.
【０００３】一般的に各種の工業において発生する懸濁
粒子を含む廃水の処理としては、中和剤や無機凝集剤、
高分子凝集剤等を用いて懸濁粒子を凝集分離し、処理水
は放流し、凝集分離した汚泥は廃棄処理されている。Generally, wastewater containing suspended particles generated in various industries is treated with a neutralizing agent, an inorganic coagulant,
The suspended particles are coagulated and separated using a polymer coagulant, the treated water is discharged, and the coagulated and separated sludge is disposed of.
【０００４】[0004]
【発明が解決しようとする課題】しかしながら、一般的
に研磨剤は、無機微粒子を表面活性剤を用いて沈降防止
を図った安定なスラリーであり、使用後の研磨屑を含む
廃液は沈殿槽に２乃至３週間放置してある程度の沈殿物
（ケーキ）として産業廃棄物処理を行い、残った大量の
廃液は化学処理を行って廃棄しているのが現状である
が、沈殿物ケーキの処理費用は極めてコストがかかり、
大量の廃液は廃棄処理の能力以上にストックされ、困っ
た状態になっていた。また、研磨剤廃液から酸化セリウ
ムを回収する方法としては、沈殿物の化学精製処理法が
知られているが、研磨剤の性質上、沈殿させるために長
時間を必要とすること、並びに規模の大きい沈殿槽の設
備投資の困難さから実用化に至っていなかった。However, in general, an abrasive is a stable slurry in which inorganic fine particles are prevented from settling by using a surface active agent, and a waste liquid containing polishing waste after use is transferred to a sedimentation tank. The industrial waste is treated as a certain amount of sediment (cake) by leaving it for two to three weeks, and the remaining large amount of waste liquid is currently subjected to chemical treatment and discarded. Is extremely costly,
A large amount of waste liquid was stockpiled beyond the capacity of waste disposal, and was in trouble. Further, as a method of recovering cerium oxide from the polishing slurry waste liquid, a chemical purification treatment method of the precipitate is known, but due to the properties of the polishing slurry, it takes a long time to precipitate, and Due to the difficulty of capital investment for a large sedimentation tank, it had not been put to practical use.
【０００５】さらに、例えば特開平９−３２７６０３号
公報には、凝集が困難視されていた酸化セリウム含有研
磨剤廃液に対して、水中に懸濁する微粒子を捕集してフ
ロックを形成させる凝集剤として、アルミナ、カルシ
ア、シリカ、及び酸化ナトリウムからなる凝集剤が提案
され、特開平１１−９０８２５号公報には、水酸化ナト
リウム又は水酸化カリウムの水溶液に、酸化セリウム含
有研磨廃棄物を混合して固液分離し、固形物を篩分けし
て微細な研磨剤を回収する方法などが提案されている。
しかし、前者の凝集剤を用いる方法では、凝集効果は考
えられるが、回収すべき酸化セリウムもその他の成分と
共に凝集させてしまうものであるため、回収方法として
は有効ではなかった。また、後者の方法は、極めて多量
のアルカリを使用する（２〜６ＮのＮａＯＨａｑ又はＫ
ＯＨａｑを乾物ベースの研磨廃棄物に対して５〜７倍以
上添加する）上、酸化セリウム含有廃液を凝縮して固形
化する必要があった。したがって、酸化セリウム含有研
磨剤廃液から酸化セリウムを回収したり、或いは無公害
化するに当たり、効率良く、処理コストが低廉で、手間
もかからない方法が希求されていた。Further, for example, Japanese Patent Application Laid-Open No. 9-327603 discloses a flocculant that forms fine particles suspended in water by collecting fine particles suspended in water with respect to a cerium oxide-containing abrasive waste liquid which has been considered difficult to flocculate. As a coagulant composed of alumina, calcia, silica, and sodium oxide, JP-A-11-90825 discloses that a cerium oxide-containing polishing waste is mixed with an aqueous solution of sodium hydroxide or potassium hydroxide. A method has been proposed in which solid-liquid separation is performed, and a solid material is sieved to recover a fine abrasive.
However, in the former method using a flocculant, although a flocculant effect is conceivable, cerium oxide to be recovered is also coagulated together with other components, and thus is not effective as a recovery method. Also, the latter method uses a very large amount of alkali (2-6N NaOHaq or K
OHaq is added 5 to 7 times or more with respect to the dry matter-based polishing waste), and it is necessary to condense and solidify the cerium oxide-containing waste liquid. Therefore, there is a need for a method for efficiently recovering cerium oxide from cerium oxide-containing abrasive waste liquid or detoxifying the cerium oxide, which has a low processing cost and requires no labor.
【０００６】[0006]
【課題を解決するための手段】本発明は、上記に鑑み提
案されたもので、酸化セリウム研磨剤廃液中に水酸化ナ
トリウム等のアルカリ成分を添加してｐＨ７〜１１のア
ルカリ溶液に調整して研磨剤廃液のゼータ電位を負の２
５ｍＶ（−２５ｍＶ）から負の７０ｍＶ（−７０ｍＶ）
に変化させた後、酸化セリウム成分を分離処理すること
を特徴とする光学研磨用酸化セリウム研磨剤廃液からの
酸化セリウム回収方法に関するものである。また、本発
明は、酸化セリウム研磨剤廃液中にアルカリ成分を添加
してｐＨ７〜１１のアルカリ溶液に調整して廃液のゼー
タ電位を−２５〜−７０ｍＶに変化させた後、酸化セリ
ウム成分及びその他の固形分を分離処理することを特徴
とする光学研磨用酸化セリウム研磨剤廃液の無公害化処
理方法をも提案するものである。DISCLOSURE OF THE INVENTION The present invention has been proposed in view of the above, and an alkaline solution such as sodium hydroxide is added to a cerium oxide abrasive waste liquid to adjust the pH to an alkaline solution of 7 to 11. The zeta potential of the abrasive waste liquid is negative 2
5 mV (-25 mV) to negative 70 mV (-70 mV)
The present invention relates to a method for recovering cerium oxide from cerium oxide abrasive waste liquid for optical polishing, characterized in that a cerium oxide component is separated after the change. In addition, the present invention provides an alkaline solution having a pH of 7 to 11 by adding an alkali component to a cerium oxide abrasive waste solution to change the zeta potential of the waste solution to −25 to −70 mV, and then remove the cerium oxide component and other components. The present invention also proposes a method for detoxifying a cerium oxide abrasive waste liquid for optical polishing, which is characterized by separating the solid content of the above.
【０００７】[0007]
【発明の実施の形態】酸化セリウム研磨剤廃液のｐＨ値
は７より小さい値である。図１は研磨剤廃液のｐＨ値と
ゼータ電位との関係を示すものであり、縦軸は負のゼー
タ電位ｍＶ、横軸はｐＨ値を示している。ゼータ電位の
測定は顕微鏡電気泳動装置による測定値である。尚、図
中には研磨剤廃液中に存在する固形分として、研磨剤の
主成分である酸化セリウム（ＣｅＯ2）、研磨屑である
光学レンズの主成分であるシリカ（ＳｉＯ2)、凝集剤で
ある水酸化アルミニウムＡｌ(ＯＨ) 3について示した。
この図１より明らかなように酸化セリウム研磨剤廃液中
にアルカリ成分を微量添加してｐＨ７〜１１までの範囲
のアルカリ溶液に調整すると、研磨剤廃液のゼータ電位
が−２５〜−７０ｍＶになる。ｐＨ値を４から１１に上
昇させると、ゼータ電位は−１７ｍＶから−６０ｍＶに
変化する。尚、ゼータ電位は、通常、同符号で２０ｍＶ
以上の場合、粒子間のポテンシャルが１５ｋＴ（ｋ：ボ
ルツマン定数、Ｔ：絶対温度）以上となり、粒子は相互
に分散することができる。しかし、絶対値が２０ｍＶ以
下では相互に凝集し、分散しにくくなる。過剰にアルカ
リ成分を添加してｐＨ１２より大きなアルカリ溶液にし
た場合には、電位が極めて低下し、負の同符号で２０ｍ
Ｖ以下となり、相互に凝集してしまい、研磨屑（研削ガ
ラス屑）と酸化セリウムの分離ができなくなる。DESCRIPTION OF THE PREFERRED EMBODIMENTS pH value of cerium oxide abrasive waste liquid
Is a value smaller than 7. Figure 1 shows the pH value of the abrasive waste liquid and
The vertical axis indicates the relationship with the zeta potential, and the vertical axis indicates the negative zeta potential.
The data potential mV and the horizontal axis indicate the pH value. Of zeta potential
The measurement is a value measured by a microscope electrophoresis apparatus. The figure
Some of the solids present in the abrasive waste liquid
Cerium oxide (CeO)Two), Which is abrasive waste
Silica (SiO) which is a main component of the optical lensTwo), With flocculant
Some aluminum hydroxide Al (OH) ThreeWas shown.
As is clear from FIG. 1, the cerium oxide abrasive waste liquid
PH range from 7 to 11 by adding a small amount of alkali component to
When adjusted to an alkaline solution, the zeta potential
Becomes −25 to −70 mV. pH value increased from 4 to 11
When raised, the zeta potential goes from -17 mV to -60 mV
Change. The zeta potential is usually 20 mV with the same sign.
In the above case, the potential between particles is 15 kT (k:
(Rutzman constant, T: Absolute temperature)
Can be dispersed. However, the absolute value is less than 20mV
Below, they are mutually aggregated and difficult to disperse. Excessive Arca
Add the ingredients to make an alkaline solution greater than pH 12.
In this case, the potential drops extremely,
V or less and agglomerate with each other to remove polishing waste (grinding gas).
(Waste chips) and cerium oxide cannot be separated.
【０００８】例えばｐＨ１０のアルカリ廃液の状態で
は、ゼータ電位が−５０ｍＶの領域に達し、研磨剤廃液
中の酸化セリウムや研磨時に生じた研磨屑などの分散状
態は極めて良好になることが見出された。即ち、研磨剤
廃液のゼータ電位を高めることによって研磨剤廃液中に
酸化セリウム成分の分散状態の良い状態を作ることがで
きる。分散状態が良い状態に達すると酸化セリウムは長
い時間をかけても沈降せずに研磨剤廃液中に浮遊して沈
殿物として堆積することはない。For example, in the state of an alkaline waste liquid having a pH of 10, the zeta potential reaches a region of -50 mV, and it is found that the dispersion state of cerium oxide in the abrasive waste liquid and polishing debris generated during polishing becomes extremely good. Was. That is, by increasing the zeta potential of the polishing slurry waste liquid, a good dispersion state of the cerium oxide component in the polishing slurry waste liquid can be produced. When the dispersed state reaches a good state, the cerium oxide does not settle over a long period of time and does not float in the abrasive waste liquid and does not deposit as a precipitate.
【０００９】しかし、思考を変えて考えると、このよう
に分散状態が良い状況下では原子番号の大きい酸化セリ
ウムは遠心分離させる好条件を与えることになる。即ち
この状況下の研磨剤廃液中の酸化セリウム（ＣｅＯ2)
と、研磨屑である光学レンズの主成分であるシリカ（Ｓ
ｉＯ2)とを例にとると、酸化セリウムの比重は７．２２
と重く、粒子径も数μｍ程度であるのに対し、シリカの
比重は２．７と軽く、粒子径もその十分の一程度であ
る。そのため、この研磨剤廃液を遠心分離機を用いて分
離処理すると、遠心分離機の底に酸化セリウム成分のみ
が選択的に分離されて堆積する。尚、分離処理は、上述
の遠心分離に限定するものではなく、例えばシックナー
装置（濃縮機）による自然沈降を利用した方法により、
酸化セリウムを回収してもよい。However, when the thinking is changed, cerium oxide having a large atomic number gives favorable conditions for centrifugal separation under such a good dispersion state. That is, cerium oxide (CeO 2 ) in the polishing slurry waste liquid under this situation
And silica (S
Taking iO 2 ) as an example, the specific gravity of cerium oxide is 7.22
The specific gravity of silica is as light as 2.7 while the particle diameter is only about one tenth of that of silica. Therefore, when this abrasive waste liquid is subjected to separation treatment using a centrifuge, only the cerium oxide component is selectively separated and deposited on the bottom of the centrifuge. The separation treatment is not limited to the above-described centrifugation. For example, by a method using natural sedimentation by a thickener (concentrator),
Cerium oxide may be recovered.
【００１０】このように研磨剤廃液にアルカリ成分を微
量添加することにより、−２５〜−７０ｍＶの範囲に高
ゼータ電位を持つ研磨剤廃液の状態を作ることができ、
この状態で安定な浮遊状態を維持する酸化セリウム成分
を、遠心分離機やシックナー装置により容易に分離、回
収することができる。As described above, by adding a small amount of an alkali component to the polishing slurry waste liquid, a state of the polishing slurry waste liquid having a high zeta potential in the range of -25 to -70 mV can be produced.
A cerium oxide component that maintains a stable floating state in this state can be easily separated and recovered by a centrifuge or a thickener.
【００１１】研磨剤廃液の高ゼータ電位液から酸化セリ
ウムを回収した後の研磨剤廃液には、酸化セリウムより
も軽い固形分である鉛成分など第３の元素成分の微細粒
子や研磨屑などが分離されずに含まれており、これらは
依然として研磨剤廃液中に安定に浮遊し、それらの物質
の自然沈降には長時間を必要とする。そのため、そのま
ま放流することができないし、より短時間に処理するた
めには、以下に示す方法を行うことが望ましい。After the cerium oxide is recovered from the high zeta potential solution of the abrasive waste liquid, the abrasive waste liquid contains fine particles of the third element component such as a lead component which is a lighter solid content than cerium oxide and polishing debris. They are contained without being separated, they are still stably suspended in the abrasive waste liquid, and the natural settling of these substances requires a long time. Therefore, it cannot be discharged as it is, and in order to perform processing in a shorter time, it is desirable to perform the following method.
【００１２】第１段階として、研磨剤廃液に、ベントナ
イト或いはモンゴリオナイトなどを主成分とする粘土鉱
物微粒子及びゼオライトを懸濁させた溶液を撹拌添加す
る。第２段階として、研磨剤廃液に、硫酸バンド溶液を
撹拌添加する。第３段階として、高分子凝集剤溶液を撹
拌添加する。第１、第２そして第３段階の撹拌添加を行
うことによって、廃液中に浮遊している微粒子の物質は
急速に凝集沈降し、沈殿物として堆積させることが可能
である。As a first step, a solution in which fine particles of a clay mineral mainly composed of bentonite or mongolionite and zeolite are suspended and added to the waste slurry is added. As a second stage, a sulfuric acid band solution is added to the waste slurry by stirring. As a third step, a polymer flocculant solution is added by stirring. By carrying out the first, second and third stages of stirring and addition, the particulate matter floating in the waste liquid rapidly agglomerates and sediments and can be deposited as a precipitate.
【００１３】尚、シックナー装置（濃縮機）による自然
沈降を利用した酸化セリウムの回収並びに研磨剤廃液の
無公害化について説明すると、この場合、廃液を例えば
ｐＨ１０の高ゼータ電位状態にした後、シックナー装置
にて重い酸化セリウムなどを沈降回収させた後、濁った
上澄み液を別のシックナー装置に移し、硫酸アルミニウ
ム及びベントナイトなどの粘土鉱物の上澄みを添加し、
緩く撹拌することで、濁った上澄み中のシリカや水酸化
物を自然沈降させ、清澄水を放流することができる。或
いは始めからシックナー装置に硫酸アルミニウム及びベ
ントナイトを入れ、水酸化物、シリカ及び酸化セリウム
を全て沈殿させた後、沈殿物にＳＤＳ（ドデシルスルホ
ン酸ナトリウム）等の表面活性剤などを添加し浮選にて
酸化セリウムを回収することもできる。The recovery of cerium oxide utilizing the natural sedimentation by a thickener device (concentrator) and the elimination of pollution of the polishing slurry waste liquid will be described. After sedimentation and recovery of heavy cerium oxide etc. in the device, the turbid supernatant liquid is transferred to another thickener device, and the supernatant of clay mineral such as aluminum sulfate and bentonite is added,
By gently stirring, the silica and hydroxide in the turbid supernatant can be spontaneously settled and clear water can be discharged. Alternatively, aluminum sulfate and bentonite are put into a thickener apparatus from the beginning, and hydroxide, silica and cerium oxide are all precipitated. Then, a surfactant such as SDS (sodium dodecylsulfonate) is added to the precipitate, and flotation is performed. To recover cerium oxide.
【００１４】[0014]
【実施例】〔研磨剤廃液からの酸化セリウムの回収〕光
学レンズの研磨剤廃液に１Ｎ−水酸化ナトリウム水溶液
を微量添加してｐＨ１０に調整し、−５０ｍＶの高ゼー
タ電位状態になったことを確認した後、遠心分離機を用
いて１０００r.p.m.の回転を１０分間程度行ったとこ
ろ、遠心分離機の底に酸化セリウム成分が堆積すること
が確認された。その後、上澄み液を流し出した遠心分離
機にｐＨ１０の蒸留水を入れて、さらに数回の繰り返し
遠心分離を行い、堆積した酸化セリウムに付着した研磨
剤廃液を洗浄することができた。尚、上述の研磨剤廃液
は、光学レンズの研磨屑であるシリカ（ＳｉＯ2）、並
びに研磨剤の主成分として酸化セリウムを含んでいる
が、研磨するガラスレンズによっては鉛イオン、リチウ
ムイオン、レアメタルイオンなどが含まれるものもあっ
たが、同様に酸化セリウムを選択的に回収することがで
きた。Example [Recovery of cerium oxide from polishing slurry wastewater] A small amount of a 1N aqueous solution of sodium hydroxide was added to the polishing slurry wastewater of the optical lens to adjust the pH to 10, and it was confirmed that a high zeta potential of -50 mV was reached. After the confirmation, rotation was performed at 1000 rpm for about 10 minutes using a centrifuge, and it was confirmed that a cerium oxide component was deposited on the bottom of the centrifuge. Thereafter, distilled water having a pH of 10 was added to the centrifugal separator from which the supernatant was poured, and centrifugal separation was further repeated several times, so that the abrasive waste liquid adhering to the deposited cerium oxide could be washed. Note that the above-mentioned abrasive waste liquid contains silica (SiO 2 ), which is polishing debris of an optical lens, and cerium oxide as a main component of the abrasive. However, depending on the glass lens to be polished, lead ions, lithium ions, rare metal, etc. Although some contained ions and the like, cerium oxide was similarly selectively recovered.
【００１５】〔研磨剤廃液の無公害化処理〕廃液中に酸
を点滴してｐＨ７の廃液とした。第１段階として、ベン
トナイト或いはモンゴリオナイトなどを主成分とする粘
土鉱物微粒子及びゼオライトを０．１％／４０ｍｌの濃
度に懸濁させた溶液を撹拌添加した。第２段階として、
硫酸バンドの１００ｐｐｍ／ｌ濃度溶液を撹拌添加し
た。第３段階として、アコフロックＡ９５など高分子凝
集剤溶液２ｐｐｍ／ｌから４ｐｐｍ／ｌを点滴しながら
撹拌添加した。第１、第２そして第３段階の撹拌添加を
行うことによって、廃液中に浮遊している微粒子の物質
は急速に凝集沈降し、沈殿物として堆積させることが可
能であった。第３の段階の高分子凝集剤溶液を投入する
と同時に浮遊物が沈殿し、上澄み液は瞬間的に透明な液
に変わった。即ち、残債の微粒子及び第１、第２段階で
投入した添加物質は、凝集剤によって１００％凝固して
沈殿した。[Pollution-free treatment of abrasive waste liquid] Acid was dripped into the waste liquid to obtain a pH 7 waste liquid. In the first stage, a solution in which fine particles of clay mineral mainly composed of bentonite or mongolionite and zeolite were suspended at a concentration of 0.1% / 40 ml was added by stirring. As the second stage,
A 100 ppm / l concentration solution of the sulfuric acid band was added by stirring. As a third step, a polymer coagulant solution such as Acofloc A95 was added dropwise from 2 ppm / l to 4 ppm / l with stirring. By performing the first, second and third stages of stirring and addition, the particulate matter floating in the waste liquid rapidly aggregated and settled, and could be deposited as a precipitate. At the same time as charging the polymer flocculant solution of the third stage, the suspended matter precipitated, and the supernatant liquid was instantaneously changed to a transparent liquid. That is, the fine particles of the remaining bonds and the added substances added in the first and second stages were coagulated and settled by 100% by the coagulant.
【００１６】[0016]
【発明の効果】以上説明したように、本発明の光学研磨
用酸化セリウム研磨剤廃液からの酸化セリウム回収方法
及び光学研磨用酸化セリウム研磨剤廃液の無公害化処理
方法は、使用するアルカリ成分も微量であり、その後の
分離処理も遠心分離やシックナー装置による自然沈降を
利用して容易に且つ短時間に実施できるので、効率良
く、処理コストが低廉で、手間もかからない方法であっ
て、極めて実用的価値が高いものである。As described above, the method for recovering cerium oxide from the cerium oxide abrasive waste liquid for optical polishing and the method for detoxifying the cerium oxide abrasive waste liquid for optical polishing according to the present invention have the following advantages. It is a very small amount, and the subsequent separation process can be easily and quickly performed using centrifugation or natural sedimentation by a thickener device, so it is an efficient, low-cost, low-cost method and extremely practical. High value.
【図１】酸化セリウム含有研磨剤廃液のｐＨ値とゼータ
電位との関係を示すグラフである。FIG. 1 is a graph showing the relationship between the pH value of a cerium oxide-containing abrasive waste liquid and zeta potential.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｃ０９Ｋ 3/14 ５５０ Ｃ０９Ｋ 3/14 ５５０Ｄ Ｆターム(参考） 3C047 GG17 3C058 AC01 AC04 CA01 CB05 CB06 CB10 DA02 DA17 4D015 BA04 BA05 BB12 CA17 DA02 DA06 DA32 DB01 EA15 EA16 EA32 FA12 FA28 4D062 BA04 BA05 BB12 CA17 DA02 DA06 DA32 DB01 EA15 EA16 EA32 FA12 FA28 4D071 AA52 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C09K 3/14 550 C09K 3/14 550D F-term (Reference) 3C047 GG17 3C058 AC01 AC04 CA01 CB05 CB06 CB10 DA02 DA17 4D015 BA04 BA05 BB12 CA17 DA02 DA06 DA32 DB01 EA15 EA16 EA32 FA12 FA28 4D062 BA04 BA05 BB12 CA17 DA02 DA06 DA32 DB01 EA15 EA16 EA32 FA12 FA28 4D071 AA52
Claims (2)
分を添加してｐＨ７〜１１のアルカリ溶液に調整して研
磨剤廃液のゼータ電位を−２５〜−７０ｍＶに変化させ
た後、酸化セリウム成分を分離処理することを特徴とす
る光学研磨用酸化セリウム研磨剤廃液からの酸化セリウ
ム回収方法。An alkali solution is added to the cerium oxide abrasive waste liquid to adjust the pH to an alkaline solution having a pH of 7 to 11, and the zeta potential of the abrasive waste liquid is changed to −25 to −70 mV. A method for recovering cerium oxide from waste liquid of cerium oxide abrasive for optical polishing, characterized by performing a separation treatment.
分を添加してｐＨ７〜１１のアルカリ溶液に調整して研
磨剤廃液のゼータ電位を−２５〜−７０ｍＶに変化させ
た後、酸化セリウム成分及びその他の固形分を分離処理
することを特徴とする光学研磨用酸化セリウム研磨剤廃
液の無公害化処理方法。2. An alkaline solution is added to the cerium oxide abrasive waste liquid to adjust the pH to 7 to 11 alkaline solution to change the zeta potential of the abrasive waste liquid to -25 to -70 mV. A method for detoxifying cerium oxide abrasive waste liquid for optical polishing, which comprises separating other solid components.
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|---|---|---|---|
| JP2000217057A JP3413394B2 (en) | 2000-07-18 | 2000-07-18 | Method for recovering cerium oxide from cerium oxide abrasive waste liquid for optical polishing and method for eliminating pollution from cerium oxide abrasive waste liquid for optical polishing |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000217057A JP3413394B2 (en) | 2000-07-18 | 2000-07-18 | Method for recovering cerium oxide from cerium oxide abrasive waste liquid for optical polishing and method for eliminating pollution from cerium oxide abrasive waste liquid for optical polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002028662A true JP2002028662A (en) | 2002-01-29 |
| JP3413394B2 JP3413394B2 (en) | 2003-06-03 |
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ID=18712226
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009297600A (en) * | 2008-06-10 | 2009-12-24 | Japan Organo Co Ltd | Method for treating dispersant-containing water |
| WO2012053432A1 (en) * | 2010-10-18 | 2012-04-26 | Ｄｏｗａエコシステム株式会社 | Method for recovering cerium oxide polishing agent and recovered product containing cerium oxide polishing agent |
| JP2012087172A (en) * | 2010-10-15 | 2012-05-10 | Nippon Electric Glass Co Ltd | Method of manufacturing cerium based oxide abrasive |
| US20130152483A1 (en) * | 2011-12-19 | 2013-06-20 | Shin-Etsu Chemical Co., Ltd. | Method for recovery of cerium oxide |
| WO2014042494A1 (en) * | 2012-09-17 | 2014-03-20 | 주식회사 엘지화학 | Method for recycling waste abrasive material containing ceria |
| CN104619806A (en) * | 2012-09-17 | 2015-05-13 | 株式会社Lg化学 | Method for recycling waste abrasive material containing ceria |
| CN104619433A (en) * | 2012-09-13 | 2015-05-13 | 株式会社Lg化学 | Method for regenerating spent ceria-containing polishing agent |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3072151U (en) | 2000-03-30 | 2000-10-06 | 三倉物産株式会社 | Inorganic abrasive waste liquid regeneration processing equipment |
-
2000
- 2000-07-18 JP JP2000217057A patent/JP3413394B2/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009297600A (en) * | 2008-06-10 | 2009-12-24 | Japan Organo Co Ltd | Method for treating dispersant-containing water |
| JP2012087172A (en) * | 2010-10-15 | 2012-05-10 | Nippon Electric Glass Co Ltd | Method of manufacturing cerium based oxide abrasive |
| WO2012053432A1 (en) * | 2010-10-18 | 2012-04-26 | Ｄｏｗａエコシステム株式会社 | Method for recovering cerium oxide polishing agent and recovered product containing cerium oxide polishing agent |
| US20130152483A1 (en) * | 2011-12-19 | 2013-06-20 | Shin-Etsu Chemical Co., Ltd. | Method for recovery of cerium oxide |
| EP2607445A2 (en) | 2011-12-19 | 2013-06-26 | Shin-Etsu Chemical Co., Ltd. | Method for recovery of cerium oxide |
| KR20130070541A (en) | 2011-12-19 | 2013-06-27 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Method for recovery of cerium oxide |
| US9309447B2 (en) | 2011-12-19 | 2016-04-12 | Shin-Etsu Chemical Co., Ltd. | Method for recovery of cerium oxide |
| CN104619433A (en) * | 2012-09-13 | 2015-05-13 | 株式会社Lg化学 | Method for regenerating spent ceria-containing polishing agent |
| WO2014042494A1 (en) * | 2012-09-17 | 2014-03-20 | 주식회사 엘지화학 | Method for recycling waste abrasive material containing ceria |
| CN104619806A (en) * | 2012-09-17 | 2015-05-13 | 株式会社Lg化学 | Method for recycling waste abrasive material containing ceria |
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| Publication number | Publication date |
|---|---|
| JP3413394B2 (en) | 2003-06-03 |
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