JP2002022931A - Color filter, method for producing the same, and liquid crystal device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent color mixture between adjacent colored parts in a method for producing a color filter by an ink jet system. SOLUTION: A first composition layer 3 whose ink absorbing property is lowered by irradiation with light is formed on a transparent substrate 1 and patternwise exposed, a second composition layer 7 whose contact angle to ink is increased by irradiation with light is further formed and parts above the unexposed parts 6 of the first composition layer 3 are exposed. Ink 12 is imparted from an ink jet head 11 to the exposed parts 10 of the second composition layer 7 to color the exposed parts 10 and the unexposed parts 6 of the first composition layer 3 and to form colored parts 13.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter which is a component of a color liquid crystal display used in a color television, a personal computer, a pachinko game machine, and the like, and a method of manufacturing the same, and particularly, an ink jet recording technique. The present invention relates to a color filter in which each colored portion is formed and a method of manufacturing the same, and further relates to a liquid crystal device including the color filter.

[0002]

2. Description of the Related Art In recent years, the development of personal computers,
In particular, with the development of portable personal computers, the demand for liquid crystal displays, especially color liquid crystal displays, tends to increase. However, cost reduction is necessary for further popularization, and in particular, there is an increasing demand for cost reduction of color filters having a high specific gravity.

Conventionally, various methods have been tried to satisfy the above requirements while satisfying the required characteristics of the color filter, but no method has yet been established which satisfies all the required characteristics. The respective methods will be described below.

[0004] The first method is a dyeing method. In the dyeing method, first, a water-soluble polymer material layer, which is a material for dyeing, is formed on a transparent substrate, and this is patterned into a desired shape by a photolithography process, and the obtained pattern is immersed in a dyeing bath. To obtain a colored pattern. This step is 3
R (red), G (green), B (blue)
A colored layer composed of three colored portions is formed.

[0005] The second method is a pigment dispersion method, which has been most frequently used in recent years. In this method, a photosensitive resin layer in which a pigment is dispersed is first formed on a transparent substrate, and this is patterned to obtain a monochromatic pattern. This step is repeated three times to form a colored layer including three colored portions of R, G, and B.

A third method is an electrodeposition method. In this method, a transparent electrode is first patterned on a transparent substrate, and immersed in an electrodeposition coating solution containing a pigment, a resin, an electrolytic solution, and the like to electrodeposit a first color. This process is repeated three times, and R, G,
A colored layer composed of colored portions of three colors B is formed and finally baked.

As a fourth method, a pigment is dispersed in a thermosetting resin and printing is repeated three times to obtain R, G,
After separately applying B, the resin is thermally cured to form a colored layer. In either method,
Generally, a protective layer is formed on the coloring layer.

[0008] These methods have in common that R,
In order to color the three colors G and B, the same process needs to be repeated three times, which increases the cost. There is also a problem that the yield decreases as the number of steps increases. Further, in the electrodeposition method, the pattern shape that can be formed is limited.
T, that is, an active matrix driving method using a thin film transistor as a switching element) is difficult to be applied to the configuration of a liquid crystal element.

Further, the printing method has poor resolution, and is not suitable for forming a fine pitch pattern.

In order to compensate for the above-mentioned drawbacks, in recent years, a method of manufacturing a color filter using an ink jet system has been actively studied. The method using the inkjet method has an advantage that the manufacturing process is simple and the cost is low.

A method of manufacturing a color filter by an ink jet method is described in, for example, JP-A-59-75205.
JP-A-63-235901, JP-A-1-2173
No. 02, No. 02, etc., the present inventor has previously described a manufacturing method for preventing color mixing of ink, which is the most problematic in the manufacturing method, in Japanese Patent Nos.
No. 823595.

The outline of these proposals is as follows. A black matrix and an ink receiving layer made of a resin that is cured by light irradiation and has a reduced ink absorbency are formed on a transparent substrate. The resin on the matrix is cured, and the cured portion is used as a color mixing preventing wall, and the unexposed portion of the ink receiving layer is colored by applying ink by an ink jet method to form a colored portion.

In this manufacturing method, an ink receiving layer made of a resin is formed, and a portion that absorbs ink and a portion that does not absorb ink (color mixing preventing wall) are formed in the ink receiving layer.
This is a method of forming a colored portion by coloring the ink receiving layer by selectively applying ink to a portion that absorbs ink. The mechanism for preventing color mixing in the manufacturing method can be considered as follows.

(1) Prevention of Color Mixing on the Surface of the Ink-Receiving Layer The color-mixing prevention wall reduces the ink absorbency and, at the same time, the ink wettability on the surface layer, so that the applied ink droplets absorb the ink. It selectively adheres to portions (unexposed portions) and prevents color mixing on the surface of the ink receiving layer.

(2) Prevention of Color Mixing Inside the Ink-Receiving Layer The ink droplets adhering to the ink-absorbing portion are gradually absorbed (permeate) into the ink-receiving layer thereafter. Since a portion where the ink is not absorbed (color mixing preventing wall) is formed in the receiving layer, penetration is inhibited by this, and color mixing inside the ink receiving layer is prevented.

[0016]

In the manufacturing method of forming the color mixing preventing wall and coloring the ink receiving layer, in order for the applied ink droplet to penetrate into the ink receiving layer,
It takes several seconds to several minutes, during which time the ink droplets are held on the surface of the ink receiving layer. Therefore, under the following circumstances, mixing (color mixing) of ink droplets may occur on the surface of the ink receiving layer. [1] Vibration or lateral acceleration or the like is applied when handling a colored substrate to be processed. [2] A case where air flow occurs on the substrate to be processed due to downflow or the like. [3] A case where a large amount of ink is applied and ink droplets reach the color mixing prevention wall.

An object of the present invention is to provide a method for producing a highly reliable color filter at a high yield without causing color mixture even under the above conditions [1] to [3]. It is an object of the present invention to provide a high quality color filter by the manufacturing method, and to provide a liquid crystal element having excellent color display characteristics at a lower cost by using the color filter.

[0018]

A first aspect of the present invention is a method for manufacturing a color filter having a plurality of colored portions on a transparent substrate, wherein the ink absorbability is reduced by light irradiation on the transparent substrate. A step of providing one composition layer, a step of pattern-exposing the first composition layer to form a region having reduced ink absorbency, and, on the first composition layer, Step of forming a second composition layer having a reduced contact angle, and pattern exposure of the second composition layer, to expose a region overlapping at least a part of the unexposed portion of the first composition layer And applying an ink to the exposed portions of the second composition layer by an inkjet method, and coloring the exposed portions of the second composition layer and the unexposed portions of the first composition layer, Curing the first composition layer formed to form a colored portion A method of manufacturing a color filter, comprising a.

In the method for producing a color filter according to the present invention, a light-shielding layer having an opening is formed on the transparent substrate.
Exposing at least a portion of the first composition layer on the light-shielding layer, and exposing from the surface of the second composition layer using a photomask in the pattern exposure step of the second composition layer. In particular, when the first composition layer is 220 to 26,
Having an absorption maximum at 0 nm, wherein absorption at a wavelength exceeding 260 nm is 1/10 or less of the absorption maximum;
Further, the pattern exposure of the second composition layer is performed by 26
As a preferred embodiment, performing using light having a wavelength exceeding 0 nm is included.

In the present invention, the second composition layer is exposed from the back side of the transparent substrate using the light-shielding layer as a photomask. In particular, the first composition layer has an absorption maximum at 220 to 260 nm. , The absorption at a wavelength exceeding 260 nm is 1/10 or less of the absorption maximum, the transmittance of the transparent substrate at a wavelength of 260 nm or less is 5% or less, and the second Composition layer of T
It contains iO ₂ and heat-treats and cures the colored first composition layer as a preferred embodiment.

A second aspect of the present invention is a color filter having a plurality of colored portions on a transparent substrate and manufactured by the method for manufacturing a color filter of the present invention. And a transparent conductive film formed on the surface.

A third aspect of the present invention is a liquid crystal element in which liquid crystal is sandwiched between a pair of substrates, wherein one of the substrates is formed using the color filter of the present invention. It is a liquid crystal element.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a method for manufacturing a color filter of the present invention, a color filter by the manufacturing method, and a liquid crystal device using the color filter will be described in detail with reference to the drawings.

FIG. 1 schematically shows the steps of an embodiment of the method for manufacturing a color filter of the present invention. In the figure, 1 is a transparent substrate, 2 is a black matrix, 3 is a first composition layer,
4 is a photomask, 5 is an exposed portion, 6 is an unexposed portion, 7 is a second composition layer, 8 is a photomask, 9 is an unexposed portion, 10
Denotes an exposure portion, 11 denotes an inkjet head, 12 denotes ink, 13 denotes a colored portion, and 14 denotes a protective layer. 1A to 1F are schematic cross-sectional views corresponding to the following steps (a) to (f), respectively.

Step (a) A black matrix 2 is formed on a transparent substrate 1 as required. As the transparent substrate 1, glass is generally used, but plastics or the like may be used as long as they have necessary characteristics such as strength without impairing the transparency of the color filter.

The black matrix 2 may be a black stripe, and its thickness is usually 0.1 to 2.0 μm.
m, which is obtained by forming a film of a metal such as chromium on the transparent substrate 1 by sputtering or vapor deposition, and patterning the film by a photolithography process. Further, the black matrix 2 may be formed using a black resin or the like other than the metal. Further, the black matrix 2 can be formed after forming the second composition layer 7 or after forming the colored portion 13.

Next, a first composition layer 3 is formed on the entire surface of the transparent substrate 1. The first composition layer 3 is formed of a composition having an ink absorbing property and being cured by light irradiation and having a reduced ink absorbing property. Examples of such a composition include, as a base resin, an acrylic resin having a functional group such as a hydroxyl group, a carboxyl group, an alkoxy group, or an amide group, a silicone resin; or hydroxypropyl cellulose, hydroxyethyl cellulose, methyl cellulose, carboxymethyl cellulose, or the like. Cellulose derivatives or modified products thereof; and vinyl polymers such as polyvinylpyrrolidone, polyvinyl alcohol and polyvinyl acetal. Further, a crosslinking agent and a photoinitiator for curing these base resins by light irradiation or heat treatment can be used. Specifically, melamine derivatives such as methylolated melamine are used as crosslinking agents, and dichromates, bisazide compounds, radical initiators, cationic initiators, anionic initiators, etc. are used as photoinitiators. It is possible. Further, these photoinitiators can be used as a mixture of plural kinds thereof or in combination with other sensitizers.

It is ideal that the first composition layer 3 used in the present invention does not or does not easily react during the pattern exposure of the second composition layer 7 described below. It is preferable to select a material having a wavelength in the Deep-UV region, more specifically, a material having an absorption maximum in a region of 220 to 260 nm and having no absorption in a UV region exceeding 260 nm. Further, in this example, an example is shown in which the first composition layer 3 is reacted only by light irradiation, but there is no problem even if heat treatment is used in combination with light irradiation.

The first composition layer 3 is formed by spin coating, roll coating, bar coating, spray coating,
A coating method such as dip coating is used, but is not particularly limited. Further, the first composition layer 3 is preferably formed to have a thickness of 0.5 to 3.0 μm.

Step (b) Using the photomask 4, the first composition layer 3 is subjected to pattern exposure to reduce the ink absorbency of the exposed portion 5. The exposed portion 5 is formed at a position overlapping the black matrix 2. In particular, the exposed portion 5 is formed to be narrower than the width of the black matrix 2 from the viewpoint of preventing white spots at the boundaries of the openings of the black matrix 2. Is preferred.

Step (c) A second composition layer 7 is formed on the entire surface of the first composition layer 3. The second composition layer 7 is a layer used to prevent color mixing when ink is applied in a later step and to increase the difference in wettability of the ink between the area where the ink is applied and the area where the ink is not applied. Therefore, in the present invention, the second composition layer 7 is formed of a composition whose contact angle with ink is reduced by light irradiation. As such a composition, a composition in which TiO ₂ is dispersed in a film-forming resin solution is preferably used, and the second composition is formed by a coating method such as spin coating, roll coating, bar coating, spray coating, or dip coating. Layer 7 can be formed. The second composition layer 7 is preferably formed to a thickness of 0.01 to 0.5 μm.

As the film-forming resin, a silicone resin is preferably used, and specifically, a hydrolyzate of an organoalkoxysilane having 1 to 3 organic groups in a molecule or a partial condensate thereof. An organopolysiloxane; an organopolysilsesquioxane; an organopolysilane and the like can be used, but from the viewpoint of coating properties, an organopolysilsesquioxane or an organopolysilane is preferably used.

In forming the second composition layer 7, it is preferable to use a solvent that does not dissolve the first composition layer 3, and the first composition layer 3 is soluble in a polar solvent. In this case, it is preferable to use a non-polar solvent, and when the first composition layer 3 is soluble in the non-polar solvent, it is preferable to use a polar solvent.

Step (d) The second composition layer 7 is subjected to pattern exposure, and the first composition layer 3 is exposed.
Is exposed on the unexposed portion 6. In FIG. 1, the photomask 8
Is shown from the front surface side of the second composition layer 7 using the black matrix 2 as shown in FIG. 2. However, as shown in FIG. 2, the light exposure can be performed from the back surface side of the transparent substrate 1 using the black matrix 2 as a photomask.

In the present invention, as described above, it is desirable that the first composition layer 3 does not react in the step, and light in which the absorption wavelength of the first composition layer 3 is cut is used. Therefore, as shown in FIG. 1, when the exposure is performed using the photomask 8 from the surface side of the second composition layer 7,
A material for cutting the absorption wavelength of the first composition layer 3 is used for the photomask 8. Also, as shown in FIG.
When exposing from the back side of the transparent substrate 1, the transparent substrate 1
A material that cuts the absorption wavelength of the first composition layer 3 is used. Specifically, when the first composition layer 3 has an absorption maximum at 220 to 260 nm as described above, the photomask 8 or the transparent substrate 1 hardly transmits light having a wavelength of 260 nm or less. It is desirable to use a glass substrate such as “7059 glass” manufactured by KK.

According to this step, the contact angle of the exposed portion 10 of the second composition layer 7 with the ink 12 is reduced. In the present invention, the contact angle of the second composition layer 7 to the ink after pattern exposure is preferably 30 ° or less in the exposed portion 10,
The material is selected so as to be 50 ° or more in the unexposed portion 9.
In order to uniformly penetrate the ink 12 described below into the unexposed portion 6 of the first composition layer 3, the first composition layer 3 Unexposed area 6
It is preferable that the size be equal to or less than.

Step (e) R, G, and B inks 12 are discharged from the ink jet head 11 to the exposed portion 10 of the second composition layer 7 along a predetermined coloring pattern. The unexposed portion 6 of one composition layer 3 is colored.

In the present invention, since the contact angle of the exposed portion 10 of the second composition layer 7 with the ink 12 is small, the ink 12 quickly spreads on the surface of the exposed portion 10 and spreads on the surface of the first composition layer 3. And penetrates into the unexposed portions 6 of the substrate.
At the same time, at the boundary with the unexposed portion 9, since the contact angle of the unexposed portion 9 with the ink 12 is larger than that of the exposed portion 10, the ink 12 does not spread to the unexposed portion 9, and the space between the adjacent exposed portions 10 Is prevented from being mixed with each other.

As the ink used in the present invention, both dye-based and pigment-based inks can be used. As a medium for the ink, a mixed solvent of water and a water-soluble organic solvent is preferably used. Further, as the water, it is preferable to use ion-exchanged water (deionized water) instead of general water containing various ions.

Examples of the water-soluble organic solvent that can be contained in the ink include those having carbon atoms such as methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, sec-butyl alcohol and tert-butyl alcohol. Amides such as dimethylformamide and dimethylacetamide; ketones or ketoalcohols such as acetone and diacetone alcohol; ethers such as tetrahydrofuran and dioxane; polyalkylene glycols such as polyethylene glycol and polypropylene glycol. Such as ethylene glycol, propylene glycol, butylene glycol, triethylene glycol, thiodiglycol, hexylene glycol, diethylene glycol, etc. Alkylene glycols having a ren group containing 2 to 4 carbons; glycerins; lower alkyl ethers of polyhydric alcohols such as ethylene glycol monomethyl ether, diethylene glycol methyl ether, and triethylene glycol monomethyl ether; N-methyl-2- Pyrrolidone, 2-pyrrolidone and the like. Among these water-soluble organic solvents, polyhydric alcohols such as diethylene glycol, lower alkyl ethers of polyhydric alcohols such as triethylene glycol monomethyl ether, and N-methyl-2-pyrrolidone are preferably used. Further, in addition to the above components, a surfactant, an antifoaming agent, a preservative, and the like may be added as needed in order to obtain an ink having desired physical properties.

As the ink jet system used in the present invention, a bubble jet (registered trademark) type using an electrothermal converter as an energy generating element, a piezo jet type using a piezoelectric element, or the like can be used. , Coloring area and coloring pattern can be set arbitrarily.

Step (f) The colored first composition layer 3 and second composition layer 7 are cured by performing necessary processing such as heat treatment to form a colored portion 13.

Further, if necessary, a protective layer 14 is formed on the colored portion 13 to obtain the color filter of the present invention. As the protective layer 14, a resin composition layer of a photo-curing type, a thermo-setting type, or a combination of heat and light, or an inorganic film formed by vapor deposition, sputtering, or the like can be used. In any case, it has transparency as a color filter,
Any material that can withstand the forming step, the alignment film forming step, and the like can be used.

In some cases, the color filter of the present invention is provided by forming a transparent conductive film such as ITO on the surface as an electrode for driving the liquid crystal when a liquid crystal device is formed. The protective layer 14 may or may not be formed as a lower layer of the film.

Next, FIG. 3 shows a schematic sectional view of one embodiment of the liquid crystal element of the present invention. The present embodiment is an example in which a TFT type color liquid crystal element is configured using the color filter of the present invention obtained by the process of FIG. In the figure, 17 is a common electrode, 18 is an alignment film, 21 is a counter substrate, 22 is a pixel electrode, 23 is an alignment film, and 24 is a liquid crystal, and the same members as those in FIG. I do.

In general, the color liquid crystal element is formed by combining the substrate 1 on the color filter side with the counter substrate 21 and forming the liquid crystal 24.
Is formed by encapsulating. TFTs (not shown) and pixel electrodes 22 are formed in a matrix inside one substrate 21 of the liquid crystal element. Further, inside the substrate 1 on the color filter side, at a position facing the pixel electrode 22,
The colored portion 13 of the color filter is formed so that R, G, and B are arranged, and a transparent common electrode 17 is formed thereon. The black matrix 2 is usually formed on the color filter side, but may be formed on the counter substrate 21 side in a BM-on-array type liquid crystal element. Further, alignment films 18 and 23 are formed in the plane of both substrates, and the liquid crystal molecules are arranged in a certain direction. These substrates are opposed to each other via a spacer (not shown), are adhered by a sealing material (not shown), and a liquid crystal 24
Is filled.

In the case of the transmission type liquid crystal element, the substrate 21 and the pixel electrode 22 are formed of a transparent material, a polarizing plate is bonded to the outside of each substrate, and a fluorescent lamp and a scattering plate are generally combined. The display is performed by using the backlight and using the liquid crystal compound as an optical shutter for changing the transmittance of the backlight. In the case of the reflection type, the substrate 21 or the pixel electrode 22 is formed of a material having a reflection function, or a reflection layer is provided on the substrate 21, and a polarizing plate is provided outside the transparent substrate 1. Display is performed by reflecting light incident from the filter side.

Further, as long as the liquid crystal element of the present invention is constituted by using the color filter of the present invention, it is needless to say that the conventional technology can be used as it is for the other members.

[0049]

(Example 1) An acrylic copolymer having the following composition was placed on a “7059 glass” substrate manufactured by Corning Co. on which a black matrix composed of a chromium film having a thickness of 0.15 μm was formed. Parts and 3 parts by weight of triphenylsulfonium triflate in ethyl cellosolve are spin-coated to a thickness of 2 μm, and prebaked at 90 ° C. for 5 minutes to form a first composition layer. Formed. The absorption spectrum of the first composition layer has an absorption maximum derived from triphenylsulfonium triflate at around 230 nm,
Absorption at a wavelength exceeding 260 nm is 1/1 of the above absorption maximum.
0 or less.

[Composition of acrylic copolymer] Methyl methacrylate 50 parts by weight Hydroxyethyl methacrylate 30 parts by weight N-methylolacrylamide 20 parts by weight

Next, the first composition layer is subjected to pattern exposure in a stripe shape through a quartz glass photomask having a stripe-shaped opening narrower than the width of the black matrix, and further on a hot plate at 120 ° C. At 1
Heat treatment for a minute.

Next, a resin composition having the following composition was spin-coated on the first composition layer so as to have a thickness of 0.1 μm, and prebaked at 90 ° C. for 3 minutes. A second composition layer was formed. The absorption spectrum of the second composition layer had a gentle absorption derived from the light scattering of TiO _{2 in} the ultraviolet region.

[Composition of Second Composition Layer] Polymethylphenylsilsesquioxane 7 parts by weight TiO ₂ 3 parts by weight Methyl isobutyl ketone 90 parts by weight

The second composition layer is applied through a blue plate glass photomask having an opening for exposing the second composition layer on the unexposed portion of the first composition layer. The pattern was exposed.

Next, R, G, and B dye inks having the following compositions are applied to the exposed portions of the second composition layer using an ink jet head to expose the exposed portions of the second composition layer. And coloring the unexposed portion of the first composition layer at 90 ° C.
After drying the ink for 5 minutes at 200 ° C., heat treatment was performed at 200 ° C. for 60 minutes to cure the colored first composition layer.

[R ink] C.I. I. Acid Orange 1486 6 parts by weight C.I. I. Acid Red 289 1 part by weight Diethylene glycol 30 parts by weight Ion exchange water 63 parts by weight

[G ink] C.I. I. Acid Yellow 23 3 parts by weight Zinc phthalocyanine sulfamide 3 parts by weight Diethylene glycol 30 parts by weight Deionized water 64 parts by weight

B ink C.I. I. Direct Blue 996 6 parts by weight Diethylene glycol 30 parts by weight Deionized water 64 parts by weight

The surface of the second composition layer before coloring and the above R,
The initial contact angle of each of the inks G and B was 8 ° in the exposed portion and 58 ° in the unexposed portion.

On the colored second composition layer, a two-pack type thermosetting resin composition (“SS6699” manufactured by JSR)
G ”) is spin-coated so that the film thickness becomes 1 μm.
After pre-baking at 0 ° C for 30 minutes,
After performing a heat treatment for 0 minutes to form a protective layer, an ITO film was further formed to a thickness of 0.15 μm by sputtering to produce a color filter.

When the color filter was inspected for the presence or absence of color mixture, 1,000 defective color filters were found to be three defective.

(Examples 2 to 6) Color filters of Examples 2 to 6 were prepared in the same manner as in Example 1 except that a resin composition having the following composition was used as the second composition. In addition, the absorption spectrum of the second composition layer used in Examples 2 to 6 had a gentle absorption in the ultraviolet region as in Example 1.

[Composition of Second Composition Layer of Example 2] Polymethylphenylsilsesquioxane 6 parts by weight TiO ₂ 4 parts by weight Methyl isobutyl ketone 90 parts by weight

[Composition of Second Composition Layer of Example 3] Polymethylphenylsilsesquioxane 5 parts by weight TiO ₂ 5 parts by weight Methyl isobutyl ketone 90 parts by weight

[Composition of the Second Composition Layer of Example 4] Methylphenylpolysilane 7 parts by weight TiO ₂ 3 parts by weight Toluene 90 parts by weight

[Composition of Second Composition Layer of Example 5] Methylphenylpolysilane 6 parts by weight TiO ₂ 4 parts by weight Toluene 90 parts by weight

[Composition of Second Composition Layer of Example 6] Methylphenylpolysilane 5 parts by weight TiO ₂ 5 parts by weight Toluene 90 parts by weight

(Examples 7 to 12) The same procedure as in Examples 1 to 6 was carried out except that the pattern exposure of the second composition layer was performed from the back surface of the glass substrate using a black matrix as a mask.
The color filters of Examples 7 to 12 were produced.

Comparative Example 1 A color filter was produced in the same manner as in Example 1 except that the second composition layer was not formed. The contact angle was measured on the surface of the first composition layer.

Table 1 shows the results of the above Examples and Comparative Examples.

[0071]

[Table 1]

[0072]

As described above, according to the present invention,
Prevents color mixing in the production of color filters by the inkjet method and enables mass production of highly reliable color filters with high yield. Using these color filters, we provide liquid crystal elements with excellent color display characteristics at lower cost. can do.

[Brief description of the drawings]

FIG. 1 is a process chart of one embodiment of a method for manufacturing a color filter of the present invention.

FIG. 2 is a schematic diagram showing different modes of pattern exposure of a second composition layer according to the present invention.

FIG. 3 is a schematic cross-sectional view of one embodiment of the liquid crystal element of the present invention.

[Explanation of symbols]

 Reference Signs List 1 transparent substrate 2 black matrix 3 first composition layer 4 photomask 5 exposed part 6 unexposed part 7 second composition layer 8 photomask 9 unexposed part 10 exposed part 11 inkjet head 12 ink 13 colored part 14 protection Layer 17 Common electrode 18 Alignment film 21 Counter substrate 22 Pixel electrode 23 Alignment film 24 Liquid crystal

Continued on front page F-term (reference) 2C056 EA24 FA03 FA04 FB01 2H048 BA11 BA43 BA47 BA57 BA64 BB02 BB24 BB44 2H091 FA35Y FB02 FB04 FB08 FC10 FC23 GA02 GA16 LA12 LA17 5C094 AA42 AA44 AA46 BA43 EB10 HA08

Claims (14)

[Claims] 1. A method for producing a color filter having a plurality of colored portions on a transparent substrate, comprising the steps of: providing a first composition layer whose ink absorbability is reduced by light irradiation on the transparent substrate; A step of pattern-exposing the first composition layer to form a region having reduced ink absorbency, and a second composition layer having a contact angle with respect to the ink reduced by light irradiation on the first composition layer Forming, and pattern exposure of the second composition layer, the step of exposing a region overlapping at least a part of the unexposed portion of the first composition layer, and the step of exposing the second composition layer The step of coloring the exposed portion of the second composition layer and the unexposed portion of the first composition layer by applying ink by an inkjet method to the exposed portion, and curing the colored first composition layer Forming a colored portion. -Manufacturing method of filter. 2. The method according to claim 1, wherein a light-shielding layer having an opening is formed on the transparent substrate, and at least a part of the first composition layer on the light-shielding layer is exposed. 3. The method for producing a color filter according to claim 1, wherein in the pattern exposure step of the second composition layer, the second composition layer is exposed from the surface side using a photomask. 4. The method according to claim 1, wherein the first composition layer has a thickness of 220 to 260 n.
4. The method for producing a color filter according to claim 3, wherein m has an absorption maximum, and absorption at a wavelength exceeding 260 nm is 1/10 or less of the absorption maximum. 5. The pattern exposure of the second composition layer,
5. The method for producing a color filter according to claim 4, wherein the method is performed using light having a wavelength exceeding 260 nm. 6. The method for producing a color filter according to claim 2, wherein, in the pattern exposure step of the second composition layer, the second composition layer is exposed from the back side of the transparent substrate using the light shielding layer as a photomask. 7. The method according to claim 1, wherein the first composition layer has a thickness of 220 to 260 n.
7. The method for producing a color filter according to claim 6, wherein m has an absorption maximum, and the absorption at a wavelength exceeding 260 nm is 1/10 or less of the absorption maximum. 8. The method for manufacturing a color filter according to claim 7, wherein the transmittance of the transparent substrate at a wavelength of 260 nm or less is 5% or less. 9. The method for producing a color filter according to claim 1, wherein the second composition layer contains TiO ₂ . 10. The method for producing a color filter according to claim 1, wherein the colored first composition layer is cured by heat treatment. 11. A color filter having a plurality of colored portions on a transparent substrate, and manufactured by the method for manufacturing a color filter according to claim 1. Description: 12. The method according to claim 1, wherein a protective layer is formed on the colored portion.
2. The color filter according to 1. 13. The method according to claim 1, wherein a transparent conductive film is formed on the surface.
13. The color filter according to 1 or 12. 14. A liquid crystal element having a liquid crystal sandwiched between a pair of substrates, wherein one of the substrates is configured using the color filter according to claim 11. Description: Liquid crystal element.