JP2002014373A - Liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make it possible for an active matrix type liquid crystal display device to correspond to upsizing and high-definition making of a display screen by reducing load capacitance of signal lines without inviting decrease in an opening ratio and display quality due to pass-through of light. SOLUTION: In the neighborhood of a crossing part of an auxiliary capacitance line specifying an opening part of a pixel electrode 24 and a signal line 19, an opening area 16a is formed, where any of the scanning line 14, the auxiliary capacitance line 16, and the pixel electrode 24 does not exist, and also at least two of the coloring layers 22a, 22b, 22c are arranged on this opening area 16a, to form a shielding area 22d.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an active matrix type liquid crystal display device in which switching elements composed of thin film transistors (hereinafter, referred to as TFTs) are arranged for each pixel electrode.

[0002]

2. Description of the Related Art In recent years, while having a high density and a large capacity,
Practical use of liquid crystal display devices capable of obtaining high-performance and high-definition display has been promoted.

There are various types of liquid crystal display devices,
Among them, a plurality of scanning lines and a plurality of scanning lines provided in a direction intersecting with each other are used because crosstalk between adjacent pixels is small, high-contrast display is obtained, transmission-type display is possible, and the area can be easily increased. An active matrix type liquid crystal display device including an array substrate in which pixel electrodes are provided on a matrix using TFTs as switching elements in a plurality of regions defined by the signal lines is widely used.

In an active matrix type liquid crystal display device, the potential of a pixel electrode written in a period in which a scanning line is selected is affected by a parasitic capacitance or a potential fluctuation of an adjacent signal line due to an off-leak current of a TFT in a non-selection period. Causes the occurrence of crosstalk and a decrease in contrast ratio. In order to suppress such deterioration in image quality, a liquid crystal display device of this type generally has a configuration in which an auxiliary capacitor is formed electrically in parallel with a pixel electrode.

[0005] In an active matrix type liquid crystal display device, a black matrix (BM) is provided for the purpose of preventing light leakage between pixels. Conventionally, the BM has been generally disposed together with a color layer for a color filter on a counter substrate which is disposed to face the array substrate via a liquid crystal layer. However, in such a structure, it is necessary to consider the misalignment between the array substrate and the opposing substrate, which causes a reduction in the ratio of the light-transmitting openings (aperture ratio). For this reason, in recent years, an organic insulating film is provided on a wiring of an array substrate, a pixel electrode is provided on an uppermost layer, and an end portion thereof is overlapped with a wiring provided in a matrix, so that a wiring using the wiring as a BM is provided. B
An M structure has been proposed. Further, a structure using a coloring layer of a color filter conventionally formed on a counter substrate instead of the organic insulating film has been proposed. In such a structure, a high aperture ratio can be realized because the aperture ratio does not decrease due to misalignment between the array substrate and the counter substrate.

[0006]

In the above-mentioned system in which the wiring electrode and the pixel electrode are overlapped with the organic insulating film interposed therebetween, since the wiring arranged in a matrix is used as the BM, the pixel electrode is disposed in the display area. It is necessary to arrange a scanning line, an auxiliary capacitance line, or a signal line in a portion without the mark. For this reason, the signal line and the pixel electrode are arranged at a predetermined distance, and the opening is arranged on the counter substrate side.
Compared with the method defined by M, the load capacity of each wiring tends to increase. In particular, in a signal line having a high operation frequency, an increase in the signal line capacity causes insufficient writing or the like, and causes a decrease in display quality. Such a tendency becomes more remarkable as the display screen becomes larger and higher definition.

In general, the load capacitance of a signal line increases substantially in proportion to the size of the area intersecting the scanning line and the auxiliary capacitance line. For this reason, in the method in which the opening is defined by the BM arranged on the counter substrate side, the portion of the scanning line and the auxiliary capacitance line that intersects with the signal line is formed so as to be thinner than other portions, thereby reducing the wiring capacitance. Measures have been taken to prevent the increase.

However, when the area of the intersection of the wirings defining the opening of the pixel electrode is to be reduced as in the above-described method, the contrast ratio is reduced due to the light leakage. It is necessary to extend the pixel electrode to a portion where the light is generated to shield light.

In the wiring BM structure, since the opening is defined by overlapping the peripheral portion of the pixel electrode with the wiring, the signal is compared with a method in which the opening is defined by the BM arranged on the counter substrate side. The parasitic capacitance between the line and the pixel electrode tends to increase. In particular, when the area of the intersection between the wirings defining the opening of the pixel electrode described above is reduced and the pixel electrode is extended, the parasitic capacitance between the signal line and the pixel electrode is further increased. As described above, when the parasitic capacitance between the signal line and the pixel electrode increases, the potential of the pixel electrode is affected by the adjacent signal line, crosstalk occurs, and the display quality deteriorates. To solve this problem, it is conceivable to add a larger auxiliary capacitance as compared with the conventional structure. However, since an increase in the auxiliary capacitance causes a decrease in the aperture ratio, the aperture ratio is improved by adopting the wiring BM structure. Will offset the effect.

As described above, in the conventional wiring BM structure, a method for preventing an increase in the capacitance of the signal line causes a decrease in display quality and a decrease in aperture ratio due to light leakage. There was a problem that it was difficult to cope with miniaturization.

The present invention reduces the load capacity of the signal line without lowering the display quality due to a decrease in the aperture ratio or light leakage, and is capable of responding to an increase in the size of the display screen and higher definition. It is an object to provide a display device.

[0012]

According to a first aspect of the present invention, there is provided a liquid crystal display device comprising: a plurality of signal lines and a plurality of scanning lines arranged on a main surface so as to intersect with each other; A plurality of auxiliary capacitance lines arranged in parallel with the scanning lines of
A switching element disposed at each intersection of the signal line and the scanning line, and the signal line, the scanning line, the auxiliary capacitance line, and red, green disposed so as to cover at least a part of the switching element. A blue colored layer, formed on the colored layer, electrically connected to each of the switching elements via a through hole formed in the colored layer, and any one of the scanning line or the auxiliary capacitance line One of the plurality of pixel electrodes, the opening of which is defined by the signal line, and a storage capacitor electrode that faces the storage capacitor line via an insulating film, and is arranged in parallel with the pixel electrode. An auxiliary capacitance element, and further, near the intersection of the signal line and one of the scanning line or the auxiliary capacitance line defining an opening of the pixel electrode, the scanning line, the auxiliary capacitance line Any fine the pixel electrode forming an opening region that does not exist, and on the opening area, characterized in that it has an array substrate disposed at least two layers of the colored layer.

According to the above structure, since the opening region is formed at the intersection of the auxiliary capacitance line and the signal line, when the wiring such as the scanning line, the auxiliary capacitance line, and the pixel electrode exists on the signal line, In comparison, the load capacity of the signal line is reduced. In addition, since at least two colored layers are arranged above the opening region, they function as a color overlap light shielding region, and a decrease in contrast ratio due to light leakage is prevented.

According to another aspect of the present invention, a plurality of signal lines and a plurality of scanning lines are provided on a main surface of the liquid crystal display device so as to intersect with each other, and a plurality of signal lines and a plurality of scanning lines are provided in parallel with the plurality of scanning lines. An auxiliary capacitance line, a switching element disposed at each intersection of the signal line and the scanning line, the signal line, the scanning line,
The red, green, and blue coloring layers disposed so as to cover at least a part of the auxiliary capacitance line and the switching element, and the coloring layer is formed on the coloring layer through a through hole formed in the coloring layer. A plurality of pixel electrodes electrically connected to each of the switching elements and having an opening defined by one of the scanning line or the auxiliary capacitance line and the signal line, the auxiliary capacitance line and an insulating film. An auxiliary capacitance element that is formed by an auxiliary capacitance electrode opposed to the pixel electrode and includes an auxiliary capacitance element that is electrically arranged in parallel with the pixel electrode, and further includes a scan line or an auxiliary capacitance line that defines an opening of the pixel electrode. An opening area where none of the scanning line, the auxiliary capacitance line and the pixel electrode is present is formed in the vicinity of the intersection of any one of the signal lines, and a light-shielding material is formed on the opening area. Characterized in that it has an array substrate having disposed Ranaru columnar spacers.

According to a third aspect of the present invention, in the liquid crystal display device according to the second aspect, the lower layer of the columnar spacer has a region in which at least one of the red, green, and blue colored layers is arranged, and any of the colored layers is It is characterized by being divided into a non-arranged area.

According to the above configuration, since the opening region is formed at the intersection of the auxiliary capacitance line and the signal line, when the wiring such as the scanning line, the auxiliary capacitance line and the pixel electrode exists on the signal line, In comparison, the load capacity of the signal line is reduced. Further, since a columnar spacer made of a light-shielding material is disposed above the opening region, the columnar spacer functions as a columnar light-shielding region, thereby preventing a decrease in contrast ratio due to light leakage.

According to a fourth aspect of the present invention, in the liquid crystal display device according to the first or second aspect, the auxiliary capacitance electrode is arranged to extend in a part of the opening region.

According to the above configuration, since the extended auxiliary capacitance electrode functions as a light shielding layer, the light shielding property in the opening region can be further improved.

[0019]

Next, an embodiment in which the liquid crystal display device according to the present invention is applied to an active matrix type liquid crystal display device will be described.

In the following embodiments, when there are a plurality of portions having the same structure, only one portion will be described as a representative, and when the same portion is described using a plurality of drawings, one portion will be described. The other drawings are described with reference numerals shown in the drawings. Also, identification characters such as a, b, and c attached to the reference numerals are added as necessary, and are partially omitted. Further, “colored layers 22a, 22b, 22c”
When there are a plurality of identical portions as described above, they are collectively described as "colored layer 22" as necessary.

[Embodiment 1] FIG. 1 is a schematic plan view showing an electrode structure of a liquid crystal display device 10 according to Embodiment 1, and a colored layer is arranged in the order of red (R), green (G), and blue (B). Shows a state where is arranged. FIG. 2 is a schematic sectional view taken along the dashed line AB in FIG.

The liquid crystal display device 10 includes an array substrate 110 having a coloring layer (color filter) to be described later and an opposing substrate 1.
The liquid crystal layer 70 is interposed between the liquid crystal layer 20 and the liquid crystal layer 20. The distance between these two substrates is defined by a columnar spacer 25 made of resin, and the array substrate 110 and the opposing substrate 120 are bonded by a seal member (not shown) arranged so as to surround the outer periphery of the substrate. ing. In the counter substrate 120, a transparent electrode 52 made of ITO and an alignment film 53 are sequentially formed on a transparent substrate 51 (FIG. 2).

On the other hand, the array substrate 110 is
The scanning line 15 is provided thereon, and the auxiliary capacitance line 1 provided in parallel with the scanning line 15
6 and a signal line 19 orthogonal to these via the insulating film 17.
Are arranged (FIG. 1). Further, at the intersection of the scanning line 15 and the signal line 19, an Nch-type L
A TFT element 30 having a DD structure, a source electrode 12a electrically connected to the TFT element 30, and a pixel electrode 24 described later connected to the source electrode 12a are arranged.

The auxiliary capacitance line 16 and the signal line 19 are connected to the wiring BM
, And defines the opening of the pixel electrode 24 in a planar manner. The scanning line 15, the auxiliary capacitance line 16, and the pixel electrode 24 are located at intersections of the auxiliary capacitance line 16 and the signal line 19.
The opening region 16a in which neither of them exists is formed. Further, at the intersection of the auxiliary capacitance line 16 and the signal line 19, there is a light leakage region 16b that does not function as the wiring BM.

Further, the TFT element 30 is provided on the transparent substrate 11.
In addition, a drive circuit (not shown) is formed around the display area. Then, a protective insulating film 20 is formed so as to cover the TFT element 30 and the driving circuit, and a red colored layer (R) 22a as a color filter is further formed thereon.
The green coloring layer (G) 22b and the blue coloring layer (B) 22c are arranged in a stripe shape. Here, above the light passing area 16b, there is provided a color superimposed light shielding area 22d composed of three layers of a red coloring layer (R) 22a, a green coloring layer (G) 22b, and a blue coloring layer (B) 22c. (FIG. 1). The arrangement of the colors stacked in the color superimposition region 22d is arbitrary, and can be appropriately set according to the manufacturing process or the like.

The pixel electrode 24 is disposed on the coloring layer 22 and is connected to the source electrode 12 a via the coloring layer 22 and the protective insulating film contact hole 21 formed in the protective insulating film 20. . The peripheral portion of the pixel electrode 24 is formed so as to overlap with the auxiliary capacitance line 16 functioning as the wiring BM and the signal line 19. An auxiliary capacitance element 130 is electrically connected to the pixel electrode 24 in parallel. The auxiliary capacitance element 130 is formed of the auxiliary capacitance line 16 and the auxiliary capacitance lower electrode 13 opposed to each other via the gate insulating film 14 (FIG. 2). Of these, the storage capacitor lower electrode 13 has an end 13a extending to a part of the opening region 16a.

Further, an alignment film 26 is disposed on the entire surface of the substrate so as to cover the pixel electrode 24 and the coloring layer 22. The end of the pattern of the green coloring layer (G) 22b is covered with a red coloring layer (R) 22a and a blue coloring layer (B) 22c. This is achieved by making the light-shielding mask used when processing each colored layer suitable.

The liquid crystal display device 10 constructed as described above
According to the above, at the intersection of the auxiliary capacitance line 16 and the signal line 19,
Since the opening region 16 a in which none of the scanning line 15, the auxiliary capacitance line 16, and the pixel electrode 24 is present is formed, the load capacitance of the signal line 19 is smaller than when these wirings are present on the signal line 19. Can be reduced.

Further, as for the light leakage region 16b existing at the intersection of the auxiliary capacitance line 16 and the signal line 19, a red coloring layer (R) 22a and a green coloring layer (G) 22
b, since the color-overlapping light-shielding region 22d composed of three layers of the blue colored layer (B) 22c is formed, it is possible to prevent a decrease in contrast ratio due to light leakage. Further, since the end portion 13a of the auxiliary capacitance lower electrode 13 is arranged to extend to a part of the opening region 16a, the extended portion functions as a light shielding layer, and the light shielding property in the light passage region 16b is reduced. Can be further enhanced. By the way, the storage capacitor lower electrode 1
Since the transmittance of No. 3 is about 30%, light leakage can be effectively prevented.

As a result, it is not necessary to extend the pixel electrode in a portion where light leakage occurs as in the related art and to shield light.
An increase in the parasitic capacitance between the signal line 19 and the pixel electrode 24 can be prevented. Therefore, the occurrence of crosstalk in which the potential of the pixel electrode 24 is affected by the adjacent signal line is suppressed,
It is possible to prevent a decrease in display quality. Further, since it is not necessary to add a large auxiliary capacitor to eliminate crosstalk, the aperture ratio does not decrease and the effect of improving the aperture ratio by the wiring BM structure is not impaired.

As described above, the liquid crystal display device 1 of the first embodiment
According to 0, the load capacity of the signal line can be reduced without lowering the aperture ratio or lowering the display quality due to light leakage, so that it is possible to cope with a large display screen and high definition. Becomes

It should be noted that the color overlap light shielding area 2 of the first embodiment
In 2d, three layers of a red coloring layer (R) 22a, a green coloring layer (G) 22b, and a blue coloring layer (B) 22c are stacked and arranged above the light passing area 16b. Light leakage can also be prevented by laminating at least two layers.

Next, a method of manufacturing the above-described liquid crystal display device 10 will be described.

First, an a-Si film is deposited on a transparent substrate (translucent insulating substrate) 11 such as a glass substrate with a high strain point or a quartz substrate by a CVD method or the like. After furnace annealing, X
Irradiation with an eCl excimer laser is performed to polycrystallize a-Si. Thereafter, the polycrystalline Si is patterned by a photo-etching method, so that the TFT element 3 in the pixel portion in the display region is formed.
0 (pixel TFT) and a channel layer of a TFT (circuit TFT) in a drive circuit region (not shown)
Further, a polysilicon film 13 serving as an auxiliary capacitance lower electrode of the auxiliary capacitance element is formed. This polysilicon film 13
It is electrically connected in parallel with the pixel electrode 24c on the coloring layer (R) 22a, the coloring layer (G) 22b, and the coloring layer (B) 22c. In the present embodiment, the pattern of the polysilicon film 13 is formed to extend to a lower portion of the light-exit region 16b existing at the intersection of the auxiliary capacitance line 16 and the signal line 19.

Next, an SiOx film to be the gate insulating film 14 is deposited on the entire surface of the transparent substrate 11 by the CVD method. Subsequently, Ta, Cr, Al, Mo, W,
A single element such as Cu or a laminated film or alloy film thereof is deposited, patterned into a predetermined shape by a photoetching method, and the scanning line 15 and the TFT element 30 extending therefrom are patterned.
The gate electrode 15b, the auxiliary capacitance line 16, the gate electrode of the circuit TFT (not shown), and various wirings in the drive circuit area are formed. Here, the auxiliary capacitance line 16 that is opposed to the auxiliary capacitance lower electrode 13 of the auxiliary capacitance element 130 via the gate insulating film 14, becomes the upper electrode of the auxiliary capacitance element 130, and forms the wiring BM together with the above-described signal line 19. . At this time, an opening region 16 a where none of the scanning line 15, the auxiliary capacitance line 16 and the pixel electrode 24 exists is formed at the intersection of the auxiliary capacitance line 16 and the signal line 19.

Thereafter, impurities are implanted by ion implantation or ion doping using these gate electrodes as a mask, and the source electrode 12a and the drain electrode 12b of the TFT element 30 and the source of an Nch type circuit TFT in a drive circuit region (not shown) are formed. An electrode and a drain electrode are formed.

Next, the TFT element 30 and the N-channel TFT in the drive circuit region (not shown) are coated with a resist so as to prevent impurities from being implanted, and then the scan electrodes of the P-channel TFT in the drive circuit region (not shown) are masked. Then, boron is implanted at a high concentration to form a source electrode and a drain electrode of the Pch type TFT in the drive circuit region. Then, an Nch-type LDD (Lightly Doped
Drain) is implanted, and the substrate is annealed to activate the impurities.

Subsequently, TF is formed by, for example, PECVD.
An interlayer insulating film contact hole 18a reaching the source electrode 112 of the T element 30 and an interlayer insulating film contact hole 18b reaching the drain electrode 12b, and a drive circuit (T
An interlayer insulating film contact hole reaching the source electrode and the drain electrode of (FT) is formed.

Next, Ta, Cr, Al, MO, W, Cu
Such as a simple substance or a laminated film or an alloy film thereof, and patterned into a predetermined shape by a photo etching method,
The connection between the signal line 19, the drain electrode 12b of the TFT element 30 and the signal line 19, the source electrode 12a, and various wirings of a circuit TFT in a drive circuit region (not shown) are performed. At this time, a light leakage area 16b that does not function as the wiring BM is generated at the intersection of the auxiliary capacitance line 16 and the signal line 19.

Further, after a protective insulating film 20 made of SiNx is formed on the entire surface of the insulating substrate by the PECVD method, a protective insulating film contact hole 21 reaching the pixel electrode 24 is formed by a photoetching method.

Next, an ultraviolet curable acrylic green resist solution is applied on the substrate on which the electrodes are formed by spinner coating. Subsequently, this is pre-baked and exposed using a predetermined mask pattern. The photomask pattern used here has a stripe-shaped pattern corresponding to the green colored layer and a through-hole pattern 23 for connecting the pixel electrode 24 and the source electrode 12a. Then, after washing with developing water, by post-baking,
A green colored layer (G) 22b having a through hole 23b is formed.

Subsequently, a blue coloring layer (B) 22c and a red coloring layer (R) 22a are formed in the same steps. On this occasion,
A light-shielding area in which three layers of a green coloring layer (G) 22b, a blue coloring layer (B) 22c, and a red coloring layer (R) 22a overlap on a light passing area 16b generated at the intersection of the auxiliary capacitance line 16 and the signal line 19. 22d is formed. This is, as mentioned above,
This is achieved by making the exposure mask used when processing each colored layer to be compatible.

Next, indium tin oxide (ITO) is deposited on the colored layer 22 by a sputtering method, and the periphery is patterned so as to overlap the auxiliary capacitance line 16 and the signal line 19, thereby forming the pixel electrode 24. Is formed, a columnar spacer 25 is formed.

Thereafter, an alignment film material made of polyimide is applied to the entire surface of the substrate and subjected to an alignment treatment to form an alignment film 26, thereby completing an array substrate 110 having a color filter (colored layer).

Next, ITO is deposited on the transparent substrate 51 by a sputtering method to form a counter electrode 52. Subsequently, an alignment film material made of polyimide is applied to the entire surface of the substrate, and an alignment process is performed to form an alignment film 53. By doing so, the counter substrate 120 is completed.

Subsequently, a sealing material (not shown) is applied to the outer peripheral portion of the counter substrate 120 except for a liquid crystal injection port (not shown). Then, the opposing substrate 120 and the array substrate 110 are attached to each other with a sealing material to complete an empty cell.

Further, the nematic liquid crystal material 70 to which the chiral material is added is vacuum-injected into the cell from an injection port (not shown). After the injection, the injection port is sealed using an ultraviolet curing resin as a sealing material (not shown), and then, a polarizing plate (not shown) is disposed on both sides of the cell, thereby completing the liquid crystal display device 10.

[Second Embodiment] FIG. 3 is a schematic plan view showing an electrode structure of a liquid crystal display device 100 according to a second embodiment, and FIG. 4 is a schematic sectional view taken along a dashed line AB of FIG. It is. 3 and FIG. 4, the same parts as those in FIG. 1 and FIG.

In the liquid crystal display device 100 of the second embodiment, the columnar spacers 25 (a, b) formed of a black resist having a high light-shielding property are arranged on the opening region 16a. The lower layer of these columnar spacers 25 includes a region where any one of the red coloring layer (R) 22a, the green coloring layer (G) 22b, and the blue coloring layer (B) 22c is disposed, and a region where none of the coloring layers is disposed. It is divided into and. Among these, the columnar spacer 25a disposed on the region where the colored layer is disposed functions as a spacer between the array substrate 110 and the counter substrate 120 as well as shielding the opening region 16a. On the other hand, the columnar spacer 25b disposed on the region where none of the coloring layers is disposed does not function as a spacer, and is used only for shielding the opening region 16a. The ratio between the columnar spacer 25a and the columnar spacer 25b can be appropriately set according to the pixel density and the like.

The liquid crystal display device 10 configured as described above
0, an opening region 16 a where none of the scanning line 15, the auxiliary capacitance line 16 and the pixel electrode 24 exists is formed at the intersection of the auxiliary capacitance line 16 and the signal line 19. The load capacity of the signal line 19 can be reduced as compared with the case where the signal line 19 is present.

In the light-exiting region 16b existing at the intersection of the auxiliary capacitance line 16 and the signal line 19, the columnar spacer 25 made of a black resist is formed on the upper portion thereof, so that the contrast due to the light-exiting. The ratio can be prevented from lowering. Further, also in the second embodiment, by arranging the end portion of the auxiliary capacitance lower electrode 13 so as to extend to a part of the opening region 16a, the light passage region 16b
Light-shielding properties can be further improved.

That is, similar to the first embodiment, the signal line 1
9 and the parasitic capacitance of the pixel electrode 24 can be prevented from increasing, so that the occurrence of crosstalk in which the potential of the pixel electrode 24 is affected by the adjacent signal line can be suppressed, and the deterioration of display quality can be prevented. Further, since it is not necessary to add a large auxiliary capacitor to eliminate crosstalk, the aperture ratio does not decrease and the effect of improving the aperture ratio by the wiring BM structure is not impaired.

Therefore, the liquid crystal display device 1 of the second embodiment
Also in 00, since the load capacity of the signal line can be reduced without lowering the display ratio due to a decrease in aperture ratio or light leakage, it is possible to cope with an increase in the size of the display screen and higher definition. Become.

In the second embodiment, the columnar spacer 25
Is formed using a black resist, but any other material may be used as long as it is a light-shielding material.
Further, any color other than black may be used as long as the color can sufficiently function as a light-shielding layer.

In Embodiments 1 and 2 described above,
Although the example in which the opening of the pixel electrode 24 is defined by the auxiliary capacitance line 16 and the signal line 19 is shown, the opening of the pixel electrode 24 may be defined by the auxiliary capacitance line 16 and the scanning line 15.

[0056]

As described above, in the liquid crystal display device according to the present invention, the load capacity of the signal line can be reduced, and the reduction of the contrast ratio due to light leakage can be prevented. As described above, it is not necessary to extend the pixel electrode in a portion where light leakage occurs, and it is possible to prevent a reduction in display quality due to crosstalk. Further, since it is not necessary to add a large auxiliary capacitance to eliminate crosstalk, the aperture ratio does not decrease and the effect of improving the aperture ratio by the wiring BM structure is not impaired.

Therefore, the load capacity of the signal line can be reduced without lowering the display quality due to a decrease in the aperture ratio or light leakage, thereby increasing the size of the display screen.
It becomes possible to correspond to high definition.

[Brief description of the drawings]

FIG. 1 is a schematic plan view illustrating an electrode structure of a liquid crystal display device according to a first embodiment.

FIG. 2 is a schematic cross-sectional view taken along a dashed line AB in FIG.

FIG. 3 is a schematic plan view showing an electrode structure of a liquid crystal display device according to a second embodiment.

FIG. 4 is a schematic sectional view taken along a dashed line AB in FIG. 3;

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 11 ... Transparent substrate, 12 ... TFT channel layer, 13 ... Auxiliary capacitance lower electrode 14 ... Gate insulating film, 15 ... Scanning line, 16 ... Auxiliary capacitance line 16a ... Open area, 16b ... Light-exit area, 17 ... Interlayer insulating film 18 ... contact hole for interlayer insulating film, 19 ... signal line, 2
0: protective insulating film 21: protective insulating film contact hole, 22: colored layer, 2
2d: color overlapping light-shielding area 23: through-hole pattern, 24: pixel electrode, 25:
Columnar spacers 26: Alignment film, 51: Opposite glass substrate, 52: Opposite electrode, 53: Alignment film 110: Array substrate, 120: Opposite substrate, 130: Auxiliary capacitance element

Continued on the front page F term (reference) 2H089 KA15 LA09 LA20 MA04X NA14 NA24 NA25 NA41 PA02 QA11 QA14 QA16 RA05 SA01 TA04 TA09 TA12 TA13 2H092 JA25 JA29 JA38 JA42 JA44 JB13 JB23 JB32 JB33 JB38 JB51 JB57 MA14 KB14 MA08 MA16 MA18 MA19 MA20 MA27 MA30 MA35 MA37 MA41 NA07 NA25 PA03 PA08 PA09 QA07 5C094 AA05 AA06 AA09 AA14 AA51 BA03 CA19 EA04 EA05 EB02 5F110 AA02 BB02 CC02 DD02 DD03 EE02 EE03 EE04 EE02 FF13 GG02 FF14 HL11 HM15 NN02 NN24 NN35 NN45 NN72 NN73 PP03 QQ11

Claims (4)

[Claims] A plurality of signal lines and a plurality of scanning lines arranged crossing each other on a main surface; a plurality of auxiliary capacitance lines arranged in parallel with the plurality of scanning lines; A switching element disposed at each intersection of scanning lines, and a red, green, and blue colored layer disposed so as to cover at least a part of the signal line, the scanning line, the auxiliary capacitance line, and the switching element. And formed on the colored layer,
A plurality of switching elements electrically connected to each of the switching elements through through holes formed in the coloring layer, and an opening defined by one of the scanning line or the auxiliary capacitance line and the signal line; And a storage capacitor element formed of a storage capacitor electrode opposed to the storage capacitor line via an insulating film and electrically arranged in parallel with the pixel electrode. In the vicinity of the intersection of one of the prescribed scanning line or the auxiliary capacitance line and the signal line, an opening region in which none of the scanning line, the auxiliary capacitance line and the pixel electrode exists is formed, and A liquid crystal display device comprising an array substrate on which at least two of the coloring layers are arranged on the opening region. 2. A plurality of signal lines and a plurality of scanning lines arranged crossing each other on a main surface; a plurality of auxiliary capacitance lines arranged in parallel with the plurality of scanning lines; A switching element disposed at each intersection of scanning lines, and a red, green, and blue colored layer disposed so as to cover at least a part of the signal line, the scanning line, the auxiliary capacitance line, and the switching element. And formed on the colored layer,
A plurality of switching elements electrically connected to each of the switching elements through through holes formed in the coloring layer, and an opening defined by one of the scanning line or the auxiliary capacitance line and the signal line; And a storage capacitor element formed of a storage capacitor electrode opposed to the storage capacitor line via an insulating film and electrically arranged in parallel with the pixel electrode. In the vicinity of the intersection of one of the prescribed scanning line or the auxiliary capacitance line and the signal line, an opening region in which none of the scanning line, the auxiliary capacitance line and the pixel electrode exists is formed, and A liquid crystal display device comprising an array substrate on which a columnar spacer made of a light-shielding material is disposed on an opening region. 3. The lower layer of the columnar spacer is divided into a region where at least one of the red, green and blue colored layers is disposed, and a region where no colored layer is disposed. The liquid crystal display device according to claim 2. 4. The storage capacitor electrode according to claim 1, wherein the auxiliary capacitance electrode extends in a part of the opening region.
3. The liquid crystal display device according to 1.