JP2002012452A - High water slip substrate and its manufacturing method - Google Patents

High water slip substrate and its manufacturing method

Info

Publication number
JP2002012452A
JP2002012452A JP2000193650A JP2000193650A JP2002012452A JP 2002012452 A JP2002012452 A JP 2002012452A JP 2000193650 A JP2000193650 A JP 2000193650A JP 2000193650 A JP2000193650 A JP 2000193650A JP 2002012452 A JP2002012452 A JP 2002012452A
Authority
JP
Japan
Prior art keywords
water
substrate
slidable
film
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000193650A
Other languages
Japanese (ja)
Other versions
JP3883366B2 (en
Inventor
Yoshinori Akamatsu
佳則 赤松
Shigeo Hamaguchi
滋生 濱口
Hiroaki Arai
宏明 荒井
Soichi Kumon
創一 公文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
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Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP2000193650A priority Critical patent/JP3883366B2/en
Publication of JP2002012452A publication Critical patent/JP2002012452A/en
Application granted granted Critical
Publication of JP3883366B2 publication Critical patent/JP3883366B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a high water slip substrate having both durability in high water repellency, and excellent light resistance and wear resistance, together with excellent water slip property (droplet slidable property). SOLUTION: The water slip coating is formed by applying a copolymer of fluoroalkyltrichlorosilan and silanol-terminated polydimethylsiloxane on a silica coupling layer formed on the surface of the transparent substrate.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する分野】本発明は、特に建築用窓ガラス、
車両用窓ガラス、鏡、その他産業用窓ガラス等に用いる
ことが可能な、極めて優れた滑水性(水滴滑落性)を示
す高滑水性基板およびその製造方法に関する。
FIELD OF THE INVENTION The present invention relates to, in particular, architectural glazings,
The present invention relates to a highly water-slidable substrate which can be used for vehicle window glasses, mirrors, other industrial window glasses, etc., and exhibits extremely excellent water-sliding property (water-dropping property) and a method for producing the same.

【0002】[0002]

【従来の技術】高い撥水耐久性(耐光性や耐摩耗性)を
得るために、フルオロアルキル基含有シラン化合物を基
材表面に処理した撥水性ガラスについて、非常に多くの
発明がなされている。例えば、特開平6-16455号
公報には、ガラス表面に凹凸形状を有するシリカなどの
下地膜を設けることが非常に有効であることが開示され
ている。一方、下地膜のないものとしては、特許第25
00178号公報には、ガラス表面に撥水撥油性の単分
子膜を形成する方法が、特開平10-59745公報に
は、撥水処理するガラス表面をセリア研摩してさらに酸
処理して基材の活性を高める方法や撥水処理液として重
合度を増大または制御したフルオロアルキル基含有シラ
ン化合物を用いる方法が開示されている。さらに、特開
平8-325037号公報には、ガラス基材表面近傍に
アルカリ金属を含まないか、またはアルカリ金属含有量
が少ないアルカリバリアー層を形成後、フルオロアルキ
ル基含有シラン化合物を処理することにより、耐久性の
高い撥水処理ガラスを得る方法が開示されている。さら
にまた、特開平9-48639号公報には、ガラス基材
表面を脱アルカリ層とすることによってナトリウム等の
アルカリ成分量を減じた表面を形成させた後にフルオロ
アルキル基含有シラン化合物を処理することにより、耐
熱性、耐水性および耐候性を高めることが開示されてい
る。
2. Description of the Related Art In order to obtain high water-repellent durability (light resistance and abrasion resistance), a great number of inventions have been made on water-repellent glass obtained by treating a substrate surface with a fluoroalkyl group-containing silane compound. . For example, Japanese Patent Application Laid-Open No. 6-16455 discloses that it is very effective to provide a base film such as silica having an uneven shape on a glass surface. On the other hand, those having no base film are described in US Pat.
Japanese Patent Application Laid-Open No. 00178 discloses a method for forming a water- and oil-repellent monomolecular film on a glass surface. And a method using a fluoroalkyl group-containing silane compound having an increased or controlled degree of polymerization as a water-repellent treatment liquid. Further, JP-A-8-325037 discloses that after forming an alkali barrier layer containing no alkali metal or having a small alkali metal content in the vicinity of a glass substrate surface, a fluoroalkyl group-containing silane compound is treated. A method for obtaining a highly durable water-repellent treated glass is disclosed. Furthermore, Japanese Patent Application Laid-Open No. 9-48639 discloses a method of treating a glass substrate surface with an alkali-free layer to reduce the amount of an alkali component such as sodium and then treating a fluoroalkyl group-containing silane compound. Discloses that the heat resistance, the water resistance and the weather resistance are improved.

【0003】一方、滑水性(水滴滑落性)をより改善す
ることに重点を置いた検討もなされており、高水滴転落
性または高滑水性ガラスが提案されている。例えば、シ
リコーン系ワックス、オルガノポリシロキサン、界面活
性剤などを含む組成物が発明されており、特公昭50-
15473号公報には、アルキルポリシロキサンおよび
酸よりなる組成物、また、特開平5-301742号公
報には、アミノ変性シリコーンオイルと界面活性剤とを
含有する組成物が開示されている。
On the other hand, studies have been made with an emphasis on further improving the water sliding property (water drop sliding property), and a high water drop falling property or high water sliding glass has been proposed. For example, a composition containing a silicone wax, an organopolysiloxane, a surfactant and the like has been invented.
JP-A No. 15473 discloses a composition comprising an alkylpolysiloxane and an acid, and JP-A-5-301742 discloses a composition containing an amino-modified silicone oil and a surfactant.

【0004】さらに、特開平11−116943号公報
では、パーフルオロアルキル基含有シラン化合物のフル
オロアルキル基の少なくとも末端のF原子をH原子で置
換した組成物からなる表面処理剤が開示されており、さ
らにまた、特開2000−26758号公報には、滑水
性被膜を形成可能な被覆組成物として、水酸基含有ビニ
ルポリマー、エポキシ末端シロキサンポリマー、スルホ
ン酸化合物およびブロックされていてもよいポリイソシ
アネート化合物及びメラミン樹脂から選ばれる少なくと
も1種の架橋剤成分および特定のジアルキルスルホコハ
ク酸塩及びアルキレンオキシドシランから選ばれる界面
活性剤を含有する滑水性被膜を形成可能な被覆組成物に
より、水滴量10μlでの転落角が5#以下と非常に優れ
た特性を示すことが開示されている。
Further, Japanese Patent Application Laid-Open No. 11-116943 discloses a surface treating agent comprising a composition in which at least the terminal F atom of the fluoroalkyl group of a perfluoroalkyl group-containing silane compound is substituted with an H atom, Furthermore, JP-A-2000-26758 discloses a coating composition capable of forming a water-slidable film as a hydroxyl-containing vinyl polymer, an epoxy-terminated siloxane polymer, a sulfonic acid compound, a polyisocyanate compound which may be blocked and melamine. With a coating composition capable of forming a water-slidable film containing at least one crosslinking agent component selected from a resin and a surfactant selected from a specific dialkyl sulfosuccinate and an alkylene oxide silane, a falling angle at a water droplet volume of 10 μl. Shows very excellent properties of 5 # or less It has been disclosed.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記の
特開平6-16455号公報、特許第2500178号
公報、特開平10-59745公報、特開平8-3250
37号公報、特開平9-48639号公報記載の、高い
撥水耐久性(耐光性や耐摩耗性)を有するフルオロアル
キル基含有シラン化合物を基材表面に処理した撥水性ガ
ラスでは、水滴滑落性(滑水性)が悪く、例えば、自動
車用ウィンドシールドの取り付け角度である30°傾斜
においては、静止時に少なくとも水滴の体積が約40〜
60μl以上でないと水滴は滑落せずにガラス表面上に
残存してしまうという問題がある。
However, the above-mentioned Japanese Patent Application Laid-Open Nos. 6-16455, 2500178, 10-59745, and 8-3250 disclose the above-mentioned JP-A-6-16455, JP-A-2500178, JP-A-10-59745, and JP-A-8-3250.
No. 37, JP-A-9-48639 describes a water-repellent glass obtained by treating a substrate surface with a fluoroalkyl group-containing silane compound having high water-repellent durability (light resistance and abrasion resistance). Poor (slipperiness), for example, at a 30 ° inclination, which is the mounting angle of a windshield for automobiles, the volume of at least water droplets at rest is about 40 to
If it is not more than 60 μl, there is a problem that water drops do not slide down and remain on the glass surface.

【0006】また、前記特公昭50-15473号公
報、特開平5-301742号公報の方法で得られたも
のは、滑水性(水滴滑落性)は良好であり、中には30
°傾斜で約15μl程度の水滴で滑落するものが得られ
ているが、高い耐久性(耐光性や耐摩耗性)を得るまで
には至っていない。
Further, those obtained by the methods described in Japanese Patent Publication No. 50-15473 and Japanese Patent Application Laid-Open No. 5-301742 have good water-sliding properties (water-dropping properties).
Although a material that slides down with a water drop of about 15 μl at an angle of inclination has been obtained, it has not yet reached high durability (light resistance and abrasion resistance).

【0007】さらに、特開平11−116943号公報
記載で得られた被膜は耐久性が充分とは言い難く、特開
2000−26758号公報記載で得られた滑水性被膜
は、透明性が低く、塗料用材料としての用途に限られて
いる。
Furthermore, the coating obtained in JP-A-11-116943 is not sufficiently durable, and the water-slidable coating obtained in JP-A-2000-26758 has low transparency. It is limited to use as a coating material.

【0008】[0008]

【課題を解決するための手段】本発明は、従来の前記課
題に鑑みてなされたものであって、高い耐久性(耐光性
や耐摩耗性)と優れた滑水性(以下「水滴滑落性」とい
う場合もある)を兼ね備えた透明性の高い高滑水性基板
およびその製造方法を提供するものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned conventional problems, and has high durability (light resistance and abrasion resistance) and excellent water sliding property (hereinafter referred to as "water drop sliding property"). And a method for manufacturing the same with high transparency and high water-slidability.

【0009】すなわち、本発明の高滑水性基板は、透明
基板表面に形成されたシリカカップリング層上に、一般
式[1]で表されるフルオロアルキルトリクロロシラン
と一般式[2]で表されるシラノール末端ポリジメチル
シロキサンの共重合物からなる滑水性被膜が形成されて
なることを特徴とする。
That is, the highly water-slidable substrate of the present invention has a fluoroalkyltrichlorosilane represented by the general formula [1] and a general formula [2] on a silica coupling layer formed on the surface of a transparent substrate. A water-slidable film formed of a copolymer of silanol-terminated polydimethylsiloxane.

【0010】 CF3(CF2)m(CH2)2SiCl3 [1] (式中、m=0〜11の整数) HO-[Si(CH3)2O-]nH [2] (式中、n=1〜50の整数) また、本発明の高滑水性基板は、前記シリカカップリン
グ層がテトラアルコキシシランの加水分解物または、テ
トライソシアネートシランを希釈して得た塗布液を、ガ
ラス基板表面に塗布して形成した、膜厚が少なくとも2
0nm以下のシリカ膜であることを特徴とする。
CF 3 (CF 2 ) m (CH 2 ) 2 SiCl 3 [1] (where m is an integer of 0 to 11) HO- [Si (CH 3 ) 2 O-] n H [2] ( Wherein n is an integer of 1 to 50) Further, the highly water-slidable substrate of the present invention is characterized in that the silica coupling layer comprises a hydrolyzate of tetraalkoxysilane or a coating solution obtained by diluting tetraisocyanatesilane. A film thickness of at least 2 formed by coating on a glass substrate surface
It is characterized by being a silica film of 0 nm or less.

【0011】さらに、本発明の高滑水性基板は、前記滑
水性被膜が前記一般式[1]で表されるフルオロアルキ
ルトリクロロシランと一般式[2]で表されるシラノー
ル末端ポリジメチルシロキサンの混合モル比を1:0.
1〜2として共重合反応を行わせた組成物であることを
特徴とする。
Further, in the highly water-slidable substrate of the present invention, the water-slidable film is a mixture of the fluoroalkyltrichlorosilane represented by the general formula [1] and the silanol-terminated polydimethylsiloxane represented by the general formula [2]. The molar ratio is 1: 0.
It is characterized in that the composition is a composition which has been subjected to a copolymerization reaction as Nos. 1-2.

【0012】また、本発明の高滑水性基板の製造方法
は、下記の工程により高滑水性基板を製造することを特
徴とする。 (1)透明基板表面にテトラアルコキシシランの加水分
解物、またはテトライソシアネートシランを主成分とす
る下地層用の塗布液を塗布する工程、(2)乾燥及び/
又は190℃以下の温度で熱処理を行い下地層としての
シリカカップリング層を形成する工程、(3)一般式
[1]で表されるフルオロアルキルトリクロロシランと
一般式[2]で表されるシラノール末端ポリジメチルシ
ロキサンの共重合物からなる滑水性被膜用塗布液を塗布
する工程、(4)乾燥及び/又は190℃以下の温度で
熱処理を行い滑水性被膜を形成する工程、 CF3(CF2)m(CH2)2SiCl3 [1] (式中、m=0〜11の整数) HO-[Si(CH3)2O-]nH [2] (式中、n=1〜50の整数) さらに、本発明の高滑水性基板の製造方法は、下地層用
の塗布液は、0.1〜5.0wt%濃度のテトラアルコ
キシシランの加水分解物、または0.1〜5.0wt%
濃度のテトライソシアネートシランよりなることを特徴
とする。
Further, a method of manufacturing a highly water-slidable substrate according to the present invention is characterized in that a highly water-slidable substrate is manufactured by the following steps. (1) a step of applying a hydrolyzate of tetraalkoxysilane or a coating solution for an underlayer containing tetraisocyanatesilane as a main component on the surface of the transparent substrate; (2) drying and / or drying
Or a step of performing a heat treatment at a temperature of 190 ° C. or less to form a silica coupling layer as an underlayer; (3) a fluoroalkyltrichlorosilane represented by the general formula [1] and a silanol represented by the general formula [2] A step of applying a coating liquid for a water-slidable film comprising a copolymer of terminal polydimethylsiloxane, (4) a step of drying and / or heat-treating at a temperature of 190 ° C. or lower to form a water-slidable film, CF 3 (CF 2 ) m (CH 2 ) 2 SiCl 3 [1] (where m is an integer from 0 to 11) HO- [Si (CH 3 ) 2 O-] n H [2] (where n = 1 to 50) Further, in the method for producing a highly water-slidable substrate according to the present invention, the coating liquid for the underlayer may be a hydrolyzate of tetraalkoxysilane having a concentration of 0.1 to 5.0 wt% or 0.1 to 5.0 wt%. 0wt%
It is characterized by comprising tetraisocyanate silane at a concentration.

【0013】[0013]

【発明の実施の形態】本発明の高滑水性基板は、代表的
な方法として下記の工程により製造することができる。 (1)透明基板表面にテトラアルコキシシランの加水分
解物、またはテトライソシアネートシランを主成分とす
る下地層用の塗布液を塗布する工程、(2)乾燥及び/
又は190℃以下の温度で熱処理を行い下地層としての
シリカカップリング層を形成する工程、(3)一般式
[1]で表されるフルオロアルキルトリクロロシランと
一般式[2]で表されるシラノール末端ポリジメチルシ
ロキサンの共重合物からなる滑水性被膜用塗布液を塗布
する工程、(4)乾燥及び/又は190℃以下の温度で
熱処理を行い滑水性被膜を形成する工程、 CF3(CF2)m(CH2)2SiCl3 [1] (式中、m=0〜11の整数) HO-[Si(CH3)2O-]nH [2] (式中、n=1〜50の整数) 滑水性被膜が形成される基板表面は、シリカカップリン
グ層よりなる下地層を設ける必要がある。
BEST MODE FOR CARRYING OUT THE INVENTION The highly water-slidable substrate of the present invention can be manufactured by the following steps as a typical method. (1) a step of applying a hydrolyzate of tetraalkoxysilane or a coating solution for an underlayer containing tetraisocyanatesilane as a main component on the surface of the transparent substrate; (2) drying and / or drying
Or a step of performing a heat treatment at a temperature of 190 ° C. or less to form a silica coupling layer as an underlayer; (3) a fluoroalkyltrichlorosilane represented by the general formula [1] and a silanol represented by the general formula [2] A step of applying a coating liquid for a water-slidable film comprising a copolymer of terminal polydimethylsiloxane, (4) a step of drying and / or heat-treating at a temperature of 190 ° C. or lower to form a water-slidable film, CF 3 (CF 2 ) m (CH 2 ) 2 SiCl 3 [1] (where m is an integer from 0 to 11) HO- [Si (CH 3 ) 2 O-] n H [2] (where n = 1 to 50) It is necessary to provide an underlayer comprising a silica coupling layer on the surface of the substrate on which the water-slidable film is formed.

【0014】該シリカカップリング層は、テトラアルコ
キシシランの加水分解物、またはテトライソシアネート
シランを主成分とする塗布液を基板表面に塗布したの
ち、乾燥及び/又は190℃以下の温度で熱処理を行い
形成することができる。なお、該塗布液は、0.1〜
5.0wt%濃度のテトラアルコキシシランの加水分解
物または0.1〜5.0wt%濃度のテトライソシアネ
ートシランよりなることが好ましい。前記テトラアルコ
キシシランの加水分解物としては、テトラメトキシシラ
ン、テトラエトキシシラン等を出発原料として、少量の
水と塩酸、硝酸、酢酸などの酸触媒を添加して調製した
ものを用いることが可能であり、また前記テトライソシ
アネートシランの希釈液を得る場合には、実質的に水を
含まない溶媒、すなわち、酢酸エチル、酢酸n−ブチ
ル、酢酸n−ヘキシル等を用いることができる。
The silica coupling layer is formed by applying a coating solution containing a hydrolyzate of tetraalkoxysilane or tetraisocyanatesilane to the surface of the substrate, followed by drying and / or heat treatment at a temperature of 190 ° C. or less. Can be formed. In addition, the coating liquid is 0.1 to
It is preferable to be composed of a 5.0 wt% concentration of a tetraalkoxysilane hydrolyzate or a 0.1 to 5.0 wt% concentration of tetraisocyanate silane. As the hydrolyzate of the tetraalkoxysilane, those prepared by adding a small amount of water and an acid catalyst such as hydrochloric acid, nitric acid, and acetic acid using tetramethoxysilane, tetraethoxysilane, and the like as a starting material can be used. In addition, when obtaining a dilute solution of the above-mentioned tetraisocyanate silane, a solvent containing substantially no water, that is, ethyl acetate, n-butyl acetate, n-hexyl acetate or the like can be used.

【0015】このようにして得られたカップリング層用
の塗布液を、清浄なガラス基板に手塗りまたはスプレー
法等で均一に塗布後、室温で5分間程度乾燥させて、膜
厚が少なくとも20nm以下のシリカ膜を形成する。この
シリカからなるカップリング層の表面には、高い濃度の
シラノール基(Si-OH)が生成しており、これらが
滑水性組成物を表面に固定化するための反応活性点とな
り、初期滑水性や耐久性を改善するための重要な役割を
果たす。
The coating solution for the coupling layer thus obtained is uniformly applied to a clean glass substrate by hand coating or spraying, and then dried at room temperature for about 5 minutes to obtain a film having a thickness of at least 20 nm. The following silica film is formed. A high concentration of silanol groups (Si-OH) are formed on the surface of the coupling layer made of silica, and these become reaction active sites for immobilizing the water-sliding composition on the surface, and the initial water-sliding properties are obtained. And play an important role in improving durability.

【0016】カップリング層用塗布液を塗布した後の乾
燥は、風乾により自然乾燥させてもよいし、乾燥後また
は乾燥と同時に室温を越え190℃以下の温度で熱処理
を行うことも出来る。なお、熱処理を行う場合には、室
温を越え190℃以下の温度で熱処理を行う必要があ
り、その処理により膜中から溶媒や水分を除去させると
ともに、より多くのシラノール基を生成させることが可
能である。しかし、200℃以上の温度で熱処理すると
生成したシラノール基が脱水縮合反応によりシロキサン
結合が形成し、結果としてシラノール基の濃度が減少す
るので好ましくない。用いる塗布液の種類にもよるが、
室温から100℃程度の温度で膜を十分に乾燥させるこ
とが、機械的強度と滑水性組成物との反応性を高めると
いう点で好ましい。
After the coating solution for the coupling layer is applied, the coating solution may be dried naturally by air drying, or may be subjected to a heat treatment at a temperature exceeding room temperature and 190 ° C. or less after drying or simultaneously with drying. In the case of performing the heat treatment, it is necessary to perform the heat treatment at a temperature higher than room temperature and equal to or lower than 190 ° C., thereby removing the solvent and moisture from the film and generating more silanol groups. It is. However, heat treatment at a temperature of 200 ° C. or more is not preferable because the generated silanol groups form siloxane bonds due to a dehydration condensation reaction, and as a result, the concentration of the silanol groups decreases. Depending on the type of coating solution used,
It is preferable to sufficiently dry the film at a temperature from room temperature to about 100 ° C. from the viewpoint of increasing the mechanical strength and the reactivity with the water-slidable composition.

【0017】また、前記一般式[1]で表されるパーフ
ルオロアルキルトリクロロシランとしては、例えばCF
3(CF211CH2CH2SiCl3、CF3(CF29
2CH2SiCl3、CF3(CF27CH2CH2SiC
3、CF3(CF25CH2CH2SiCl3、CF3CH
2CH2SiCl3等を用いることができる。一般式
[2]で表されるシラノール末端ポリジメチルシロキサ
ンとしては、例えば、HO-[Si(CH3)2O-]10H、H
O-[Si(CH3)2O-]20H等を用いることができる。
The perfluoroalkyltrichlorosilane represented by the general formula [1] includes, for example, CF
3 (CF 2 ) 11 CH 2 CH 2 SiCl 3 , CF 3 (CF 2 ) 9 C
H 2 CH 2 SiCl 3 , CF 3 (CF 2 ) 7 CH 2 CH 2 SiC
l 3 , CF 3 (CF 2 ) 5 CH 2 CH 2 SiCl 3 , CF 3 CH
2 CH 2 SiCl 3 or the like can be used. Examples of the silanol-terminated polydimethylsiloxane represented by the general formula [2] include HO- [Si (CH 3 ) 2 O-] 10 H and H
O- [Si (CH 3 ) 2 O-] 20 H or the like can be used.

【0018】実質的に水を含まない溶媒としては、水の
溶解度が小さい溶媒であり、例えば、酢酸エチル、酢酸
n-ブチル、酢酸n-ヘキシルなどのエステル類、トルエ
ン、キシレンなどの芳香族炭化水素類、n−ブタン、n
−ヘキサンなどの脂肪族炭化水素類等を用いることがで
きる。希釈溶媒としては、イソプロピルアルコ−ル(以
下、「i−PA」と略す)の他に、メタノ−ル、エタノ
−ルなど炭素数が5以下の低級アルコ−ル溶媒であって
もよく、アルコ−ル以外にエ−テル類やケトン類を用い
ることができ、ことにi−PAまたはエタノールを主成
分としてなるアルコール類が好ましい。
The solvent containing substantially no water is a solvent having low solubility in water, for example, esters such as ethyl acetate, n-butyl acetate and n-hexyl acetate, and aromatic hydrocarbons such as toluene and xylene. Hydrogens, n-butane, n
-Aliphatic hydrocarbons such as hexane can be used. As a diluting solvent, in addition to isopropyl alcohol (hereinafter abbreviated as "i-PA"), a lower alcohol solvent having 5 or less carbon atoms such as methanol and ethanol may be used. Ethers and ketones can be used in addition to phenol, and alcohols containing i-PA or ethanol as a main component are preferable.

【0019】なお、前記パーフルオロアルキルトリクロ
ロシランとシラノール末端ポリジメチルシロキサンの混
合モル比は、自在に選択可能であるが、パーフルオロア
ルキルトリクロロシラン:シラノール末端ポリジメチル
シロキサン=1:0.1〜2の条件で共重合反応を行わ
せることが好ましく、パーフルオロアルキルトリクロロ
シラン1に対して、シラノール末端ポリジメチルシロキ
サンが0.1以下の場合には、目的である滑水性の改善
効果は得られなくなり、2以上の場合には、良好な滑水
性は得られるものの耐光性などの耐久性能が大幅に低下
して実用上好ましくない。また、シラノール末端ポリジ
メチルシロキサンの平均重合度については、重合度が大
きくなるにしたがって末端のシラノール基の反応性が低
下するので、室温において短時間に共重合反応を進める
ためには、平均重合度が50以下であることが望まし
い。
The mixing molar ratio of the perfluoroalkyltrichlorosilane and the silanol-terminated polydimethylsiloxane can be freely selected, but perfluoroalkyltrichlorosilane: silanol-terminated polydimethylsiloxane = 1: 0.1 to 2 It is preferable to carry out the copolymerization reaction under the following conditions. If the perfluoroalkyltrichlorosilane 1 has a silanol-terminated polydimethylsiloxane of 0.1 or less, the intended effect of improving the slipperiness cannot be obtained. In the case of 2 or more, although good slipperiness is obtained, durability such as light resistance is significantly reduced, which is not preferable in practical use. As for the average polymerization degree of the silanol-terminated polydimethylsiloxane, the reactivity of the terminal silanol groups decreases as the polymerization degree increases. Is desirably 50 or less.

【0020】なお、前記パーフルオロアルキルトリクロ
ロシランとシラノール末端ポリジメチルシロキサンを実
質的に水を含まない溶媒中で混合して共重合させる反応
時間は2時間を越えて反応させる必要があり、それより
短いと共重合反応が殆ど進んでおらず、塗布液中に、パ
ーフルオロアルキルシランのモノマーが多く残存してポ
リジメチルシロキサン成分が有効に基板表面に固定化さ
れず、高い滑水性が得られないので好ましくない。
The reaction time for mixing and copolymerizing the perfluoroalkyltrichlorosilane and the silanol-terminated polydimethylsiloxane in a solvent substantially free of water needs to be longer than 2 hours. If it is short, the copolymerization reaction has hardly progressed, and a large amount of perfluoroalkylsilane monomer remains in the coating solution, so that the polydimethylsiloxane component is not effectively fixed on the substrate surface, and high water slip cannot be obtained. It is not preferable.

【0021】表面処理剤を塗布した後の乾燥は、表面処
理剤を塗布後に風乾により自然乾燥させてもよいし、乾
燥後または乾燥と同時に室温を越え190℃以下の温度
で熱処理を行うことも出来る。なお、熱処理を行う場合
には、室温を越え190℃以下の温度で熱処理を行う必
要があり、その処理により未反応のフルオロアルキル基
含有シランのOH基を他のOH基と結合させる。しか
し、200℃以上の温度で熱処理すると滑水性を改善す
るためのポリジメチルシロキサン成分が熱分解し易くな
るので、好ましくない。なお、反応効率の点で60〜1
50℃がより好ましい。
For drying after applying the surface treatment agent, the surface treatment agent may be air-dried after application, or may be subjected to a heat treatment at a temperature exceeding room temperature and 190 ° C. or less after drying or simultaneously with drying. I can do it. In the case of performing the heat treatment, it is necessary to perform the heat treatment at a temperature higher than room temperature and equal to or lower than 190 ° C., whereby the OH groups of the unreacted fluoroalkyl group-containing silane are combined with other OH groups. However, heat treatment at a temperature of 200 ° C. or higher is not preferable because the polydimethylsiloxane component for improving the lubricity tends to be thermally decomposed. In addition, 60 to 1 in terms of reaction efficiency.
50 ° C. is more preferred.

【0022】本発明についての滑水性とは、後述の実施
例の評価方法で述べるような方法、例えば、前記表面処
理剤で処理された被膜を有する基板サンプルを30°に
傾斜させた状態で、該サンプル表面上にゆっくりとマイ
クロシリンジで純水を滴下する。このとき、水滴が少な
くとも10秒で2cm以上移動する時点の水滴量(体積)
を滑水性(水滴転落性)とし、「μl」で示すものであ
る。なお、本発明の高滑水性とは、前記の方法により得
られる滑水性が10μl以下のものをいう。本発明で得
られる高滑水性被膜を有する基板は、シリカカップリン
グ層が基板表面に形成されているため、前記滑水性とと
もに、優れた撥水性も兼ね備えている。
The water-sliding property in the present invention is defined as a method described in the evaluation method of the following Examples, for example, in a state where a substrate sample having a film treated with the surface treatment agent is inclined at 30 °. Pure water is slowly dropped on the sample surface with a microsyringe. At this time, the amount (volume) of the water droplet at the time when the water droplet moves at least 2 cm in at least 10 seconds.
Is defined as the slipperiness (water-dropping property), and is indicated by “μl”. The high lubricity of the present invention means that the lubricity obtained by the above method is 10 μl or less. The substrate having a highly water-slidable film obtained by the present invention has excellent water repellency as well as the above-mentioned water-slidability because the silica coupling layer is formed on the substrate surface.

【0023】基板としては、ガラス、プラスチック等特
に限定されるものではないが、例えば、ガラス基板の場
合には、建築用窓ガラスや自動車用窓ガラス等に通常使
用されているフロ−トガラスあるいはロ−ルアウト法で
製造されたガラス等無機質の透明性がある板ガラスが好
ましく、無色または着色、ならびにその種類あるいは色
調、他の機能性膜との組み合わせ、ガラスの形状等に特
に限定されるものではなく、さらに曲げ板ガラスとして
はもちろん各種強化ガラスや強度アップガラスであり、
平板や単板で使用できるとともに、複層ガラスあるいは
合わせガラスとしても使用できる。また、被膜はガラス
基板の両面に成膜しても構わない。
The substrate is not particularly limited, such as glass and plastic. For example, in the case of a glass substrate, float glass or glass commonly used for architectural window glass, automotive window glass, or the like is used. -An inorganic transparent plate glass such as a glass produced by a roll-out method is preferable, and colorless or colored, and its type or color tone, a combination with another functional film, and the shape of the glass are not particularly limited. , As well as various types of tempered glass and strength-up glass as well as bent glass,
It can be used as a flat plate or a single plate, and can also be used as a double glazing or a laminated glass. The coating may be formed on both surfaces of the glass substrate.

【0024】また、基板表面への下地層用塗布液又は滑
水性被膜用塗布液の塗布方法としては、手塗り、ノズル
フロ−コ−ト法、ディッピング法、スプレー法、リバ−
スコ−ト法、フレキソ法、印刷法、フローコート法ある
いはスピンコート法、ならびにそれらの併用等既知の塗
布手段など各種塗布法が適宜採用し得る。また、簡易な
タイプのスプレー式撥水処理剤などとしても使用するこ
とができる。
The method for applying the coating solution for the underlayer or the coating solution for the water-slidable film onto the substrate surface includes hand coating, nozzle flow coating, dipping, spraying, and river coating.
Various coating methods such as a coating method, a flexographic method, a printing method, a flow coating method or a spin coating method, and a known coating method such as a combination thereof can be appropriately employed. It can also be used as a simple type of spray-type water-repellent agent.

【0025】[0025]

【実施例】以下の実施例および比較例に共通な項目であ
る、基板の作製、滑水液の調製、および得られた滑水性
基板の実用耐久性の評価方法については、以下の方法に
より行った。
EXAMPLES The methods for preparing a substrate, preparing a water-repellent liquid, and evaluating the practical durability of the obtained water-repellent substrate, which are items common to the following Examples and Comparative Examples, are as follows. Was.

【0026】〔基板の作製〕 (1)基板A;テトラエトキシシラン〔Si(OC25)
4:以下TEOSと称す〕の加水分解物を用いた処理 200mm×200mm×2mmtサイズのフロートガ
ラスまたは強化ガラスの表面を、研磨液とブラシポリッ
シャーを用いて研磨し、ガラス洗浄機(当社製作品)に
て水洗および乾燥した。なお、ここで用いた研磨液は、
約1%のガラス用研摩剤ミレークA(三井金属工業製)
を水に混合した懸濁液を用いた。次いで、エキネンで1
wt%に希釈したTEOSに0.1N硝酸水溶液を加
え、室温で約2h攪拌したものを塗布液とした。成膜
は、スプレー法で吐出量を3.2g/pcとし、成膜時
の湿度を30%RH以下で成膜後、室温で風乾したもの
を基板Aとした。得られたシリカカップリング層は、膜
厚が20nm以下の透明性の高い均一なシリカ膜であっ
た。
[Preparation of Substrate] (1) Substrate A: tetraethoxysilane [Si (OC 2 H 5 )]
4 : hereinafter referred to as TEOS] treatment using a hydrolyzate 200 mm x 200 mm x 2 mmt size float glass or tempered glass surface is polished with a polishing solution and a brush polisher, and a glass washer (a product of our company) Was washed with water and dried. The polishing liquid used here was
Approximately 1% glass polishing agent MIRAKE A (manufactured by Mitsui Kinzoku Kogyo)
Was mixed with water. Then, use Echinen for 1
A 0.1N nitric acid aqueous solution was added to TEOS diluted to wt%, and the mixture was stirred at room temperature for about 2 hours to obtain a coating solution. The film was formed by a spray method at a discharge rate of 3.2 g / pc, the film was formed at a humidity of 30% RH or less, and then air-dried at room temperature to obtain a substrate A. The obtained silica coupling layer was a highly transparent and uniform silica film having a thickness of 20 nm or less.

【0027】(2)基板B;テトライソシアネートシラ
ン〔Si(NCO)4〕を用いた処理 ガラスの研磨および洗浄は上記1)と同様に行った。次
いで、酢酸エチル、酢酸n−ブチル、酢酸n−ヘキシル
などのエステル系溶媒で2wt%に希釈したテトライソ
シアネートシラン(品名:SI−400/松本製薬製)
を1ml綿布(品名:ベンコット/旭化成製)に染み込
ませて手塗後、風乾または室温〜300℃で10分間熱
処理したものを基板Bとした。得られたシリカカップリ
ング層は、膜厚が20nm以下の透明性の高い均一なシリ
カ膜であった。
(2) Substrate B: Treatment with tetraisocyanate silane [Si (NCO) 4 ] Polishing and washing of the glass were performed in the same manner as in 1) above. Then, tetraisocyanate silane (product name: SI-400 / Matsumoto Pharmaceutical Co., Ltd.) diluted to 2 wt% with an ester solvent such as ethyl acetate, n-butyl acetate, or n-hexyl acetate.
Was impregnated into 1 ml cotton cloth (product name: Bencott / Asahi Kasei), hand-coated, and air-dried or heat-treated at room temperature to 300 ° C. for 10 minutes to obtain a substrate B. The obtained silica coupling layer was a highly transparent and uniform silica film having a thickness of 20 nm or less.

【0028】(3)基板C;下地処理なし ガラスの研磨および洗浄は上記1)と同様に行った。次
いで、35℃の0.1N硫酸水溶液中に1分間浸漬し、
ガラス洗浄機(当所製作品)で水洗・乾燥したものを基板
Cとした。
(3) Substrate C: No base treatment Polishing and cleaning of the glass were performed in the same manner as in 1) above. Then, it was immersed in a 0.1N sulfuric acid aqueous solution at 35 ° C for 1 minute,
What was washed and dried with a glass washer (manufactured by our company) was used as a substrate C.

【0029】(4)基板D;凹凸状の表面形状を有する
シリカ系下地層 ガラスの研磨および洗浄は上記1)と同様に行った。次
いで、凹凸状の表面形状を有するシリカ系下地層を形成
したものを基板Dとした。なお、下地層用のコーティン
グ液は、次の要領で調製した。
(4) Substrate D: Silica-based Underlayer Having Irregular Surface Shape Polishing and cleaning of glass were performed in the same manner as in 1) above. Next, a substrate on which a silica-based base layer having an uneven surface shape was formed was used as a substrate D. In addition, the coating liquid for the underlayer was prepared in the following manner.

【0030】テトラエトキシシラン〔Si(OC
25)4:TEOS〕の重合ゾル(平均分子量Mw:約1
000〜3000)とアセチルアセトンで安定化したテ
トラブトキシチタン〔Ti(O−Bu)4〕との混合ゾル
(アセチルアセトンとで安定化したテトラブトキシチタ
ンの合有量は酸化物換算でSiO2に対してモル比で約
20mol%)を、イソプロピルアルコール(i−PA)溶
媒を加え、固形分濃度として酸化物換算で5wt%にな
るまで希釈したものをゾル溶液Aとした。また、メチル
トリメトキシシラン〔CH3Si(OCH3)3:MTM
S〕の重合ゾル(平均分子量Mw=約1,000)にイソ
プロピルアルコール(i−PA)を加え、固形分濃度とし
て酸化物換算で約20wt%になるまで希釈したものを
ゾル溶液Bとした。
Tetraethoxysilane [Si (OC
2 H 5 ) 4 : TEOS] polymerization sol (average molecular weight Mw: about 1
000-3000) and Goyu amount of the mixed sol (tetrabutoxytitanium stabilized with the acetylacetone with tetrabutoxytitanium stabilized with acetylacetone [Ti (O-Bu) 4] for SiO 2 in terms of the oxide A sol solution A was obtained by adding an isopropyl alcohol (i-PA) solvent and diluting the solution to a solid content concentration of 5% by weight in terms of an oxide. Also, methyltrimethoxysilane [CH 3 Si (OCH 3 ) 3 : MTM
A sol solution B was prepared by adding isopropyl alcohol (i-PA) to the polymerized sol (average molecular weight Mw = about 1,000) of S] and diluting the solid to a concentration of about 20 wt% in terms of oxide as a solid concentration.

【0031】次に、ゾル溶液A;20g、ゾル溶液B;
20g、および、加水分解および脱水縮合反応の速度を
調整するための溶媒としてのブタノール(n-BuOH、
水分量2000ppm);25gとを混合し、約50℃
で約3時間密栓して撹拌した(ゾルC)。さらに、i−
PA(90wt%);324gとn-BuOH(10wt
%);36gの混合系溶媒約360gで先のゾルCを希
釈し、これをスピンコート法で成膜した。次に、該ゲル
膜付きガラス基板を250℃で30分間仮焼成を行い、
さらにガラス温度で610℃〜620℃の本焼成を行
い、表面に微細な凹凸形状を有するSiO2−TiO2
膜を得た。
Next, 20 g of sol solution A; 20 g of sol solution B;
20 g and butanol (n-BuOH, as a solvent for adjusting the rate of hydrolysis and dehydration condensation reaction)
Water content of 2000 ppm);
For about 3 hours and stirred (Sol C). Furthermore, i-
PA (90 wt%); 324 g and n-BuOH (10 wt%)
%); The sol C was diluted with 36 g of a mixed solvent of about 360 g, and formed into a film by spin coating. Next, the glass substrate with the gel film is pre-baked at 250 ° C. for 30 minutes.
Further, main firing at 610 ° C. to 620 ° C. was performed at a glass temperature to obtain a SiO 2 —TiO 2 thin film having fine irregularities on the surface.

【0032】(5)基板E;フラット状の表面形状を有
するシリカ下地層 ガラスの研磨および洗浄は上記1)と同様に行った。次
いで、フラット状の表面形状を有するシリカ下地層を形
成したものを基板Eとした。なお、下地層用のコーティ
ング液は、次の要領で調製した。シリカゾルにCSG−
DI−0600(チッソ製、溶質濃度6wt%)を用
い、エキネンで4wt%に希釈した。次いで、ディップ
法で1mm/sで成膜した。次に、該ゲル膜付きガラス
基板を250℃で30分間仮焼成を行い、さらにガラス
温度で610℃〜620℃の本焼成を行い、表面形状が
平滑(フラット)なシリカ薄膜を得た。得られたシリカ
薄膜の膜厚はSloan tech製Dektak30
30を用いて測定したところ、約40nmであった。
(5) Substrate E; Silica Underlayer Having Flat Surface Shape Polishing and cleaning of the glass were performed in the same manner as in 1) above. Subsequently, a substrate on which a silica base layer having a flat surface shape was formed was used as a substrate E. In addition, the coating liquid for the underlayer was prepared in the following manner. CSG- in silica sol
DI-0600 (manufactured by Chisso, solute concentration: 6 wt%) was diluted to 4 wt% with Echinen. Next, a film was formed at 1 mm / s by a dipping method. Next, the glass substrate with the gel film was calcined at 250 ° C. for 30 minutes, and further calcined at a glass temperature of 610 ° C. to 620 ° C. to obtain a silica thin film having a smooth (flat) surface shape. The thickness of the obtained silica thin film is Dektak30 manufactured by Sloan technology.
30 was about 40 nm.

【0033】〔滑水液の調製〕滑水液は、パーフルオロ
アルキルトリクロロシラン(CF3(CF2)mCH2CH2
iCl3:以下CmFASCと記す)と平均重合度7、1
0および20などのシラノール末端ポリジメチルシロキ
サン(以下、N7SOL、N10SOLおよびN20S
OLなどと記す)を用い、これらの共重合化反応を進め
ることにより調製した。図1に、滑水液の調製手順と各
成分の混合割合(重量比)を示す。なお、FASCの混
合の際には、NnSOLを実質的に水を含まない溶媒で
所定の濃度に希釈後、攪拌しながらゆっくりと滴下して
行った。
[Preparation of water-sliding liquid] The water-sliding liquid is perfluoroalkyltrichlorosilane (CF 3 (CF 2 ) m CH 2 CH 2 S
iCl 3 : hereinafter referred to as CmFASC) and an average degree of polymerization of 7, 1
Silanol terminated polydimethylsiloxanes such as 0 and 20 (hereinafter N7SOL, N10SOL and N20S
OL, etc.) and proceeded with these copolymerization reactions. FIG. 1 shows the preparation procedure of the synovial fluid and the mixing ratio (weight ratio) of each component. In addition, at the time of mixing of FASC, NnSOL was diluted with a solvent containing substantially no water to a predetermined concentration, and then slowly dropped with stirring.

【0034】〔滑水性ガラスの作製〕上記基板A〜Eに
対し、約1〜2mlの上記滑水液を綿布(品名:ベンコ
ット)に染み込ませて手塗した後に風乾または室温〜3
50℃で10分間熱処理した。次いで、余剰の滑水剤成
分を紙タオルで拭き上げて滑水性ガラスを得た。
[Preparation of water-slidable glass] About 1 to 2 ml of the above-mentioned water-slidable liquid was soaked into a cotton cloth (product name: Bencott) on the above-mentioned substrates A to E, and then hand-dried.
Heat treatment was performed at 50 ° C. for 10 minutes. Next, the excess water-slippery component was wiped off with a paper towel to obtain a water-slidable glass.

【0035】〔実用耐久性の評価〕滑水性基板の評価方
法について記す。
[Evaluation of Practical Durability] A method of evaluating a water-slidable substrate will be described.

【0036】(1)初期接触角 純水約2μlを試料に置いたときの水滴と基盤表面との
なす角を接触角計で測定した。なお、接触角計には協和
界面科学製CA−X型を用いて大気中(約25℃)で測
定した。
(1) Initial contact angle The angle between a water droplet and the substrate surface when about 2 μl of pure water was placed on the sample was measured with a contact angle meter. In addition, it measured in air | atmosphere (about 25 degreeC) using Kyowa Interface Science CA-X type as a contact angle meter.

【0037】(2)滑水性(水滴転落性) サンプルを30゜に傾斜させた状態で、サンプル表面上
にゆっくりとマイクロシリンジで純水を滴下し、水滴が
少なくとも10秒で2cm以上移動する時点の水滴量(体
積)を滑水性(水滴転落性:μl)とした。
(2) Water-sliding property (water-dropping property) With a sample inclined at 30 °, pure water is slowly dropped on the sample surface with a microsyringe, and a point at which the water drop moves 2 cm or more in at least 10 seconds. The amount (volume) of water droplets was defined as the slipperiness (water droplet falling property: μl).

【0038】(3)耐摩耗性 トラバース式摺動試験機(当社製作)を用いて、サンプ
ル表面を荷重0.1kg/cm2の摩擦布で3500往復回
で摺動した後の接触角θ(゜)を測定した。なお、摩擦
布は25mm×25mmサイズのキャンバス布(JIS
L3102−1961−1206)を用い、摺動速度は3
0往復/分とした。
(3) Wear Resistance Using a traverse type sliding tester (manufactured by our company), the contact angle θ after sliding the sample surface with a friction cloth having a load of 0.1 kg / cm 2 by 3,500 reciprocations.゜) was measured. The friction cloth is a 25 mm × 25 mm canvas cloth (JIS
L3102-1961-1206) and the sliding speed is 3
0 round trips / minute.

【0039】(4)耐光性 岩崎電気製アイスーパーUVテスターSUV-W11を
用いて次の条件でUV照射し、接触角が70°に低下す
るまでの照射時間を耐光性とした 〔耐光性試験(SUV試験)条件〕 UV照射強度 :76mW/cm2 試料環境 :48℃,20〜30%RH 測定方法 :UV照射200時間毎に試料をi−PA払拭後、接触角を 測定した。 以下、実施例および比較例を用いて本発明の効果を説明
する。
(4) Light Resistance UV irradiation was performed under the following conditions using an I-Super UV tester SUV-W11 manufactured by Iwasaki Electric Co., Ltd., and the irradiation time until the contact angle was reduced to 70 ° was defined as light resistance. (SUV test) Conditions] UV irradiation intensity: 76 mW / cm 2 Sample environment: 48 ° C., 20 to 30% RH Measurement method: Contact angle was measured after wiping the sample with i-PA every 200 hours of UV irradiation. Hereinafter, the effects of the present invention will be described using examples and comparative examples.

【0040】[0040]

【実施例1】出発原料にヘプタデカフルオロデシルトリ
クロロシラン(CF3(CF2)7CH2CH2SiCl3:C
8FASC)と平均重合度10のシラノール末端ポリジ
メチルシロキサン(N10SOL)を用い、混合モル比を
1:1として上記〔滑水液の調製〕に記載した要領(図
1)で滑水液を調製した。これを上記〔ガラス基板の作
製−2)〕に準じて風乾して得た基板Bに上記〔撥水性
ガラスの作製〕に準じて80℃で熱処理して滑水性ガラ
スを得た。上記〔実用耐久性の評価〕に記載した要領で
サンプル性能を評価した。結果、接触角は100゜、滑
水性は9μlと非常に高い撥水・滑水性を示した。さら
に、耐摩耗性と耐光性はそれぞれ、98゜と900hと
高い実用耐久性を示した。
EXAMPLE 1 Heptadecafluorodecyltrichlorosilane (CF 3 (CF 2 ) 7 CH 2 CH 2 SiCl 3 : C was used as a starting material.
8FASC) and a silanol-terminated polydimethylsiloxane (N10SOL) having an average degree of polymerization of 10 and a molar ratio of 1: 1 to prepare a slippery liquid according to the procedure described in the above [Preparation of a slippery liquid] (FIG. 1). . This was air-dried according to the above [Preparation of glass substrate-2) and heat-treated at 80 ° C according to the above [Preparation of water repellent glass] to obtain water-slidable glass. The sample performance was evaluated in the manner described in [Evaluation of practical durability]. As a result, the contact angle was 100 °, and the slipperiness was 9 μl. Further, abrasion resistance and light resistance were 98 ° and 900 h, respectively, indicating high practical durability.

【0041】[0041]

【実施例2】実施例1において、出発原料の混合モル比
をC8FASC:N10SOL=1:2とした以外はす
べて実施例1と同じとした。結果、接触角は98゜、滑
水性は9μlと非常に高い撥水・滑水性を示した。さら
に、耐摩耗性と耐光性はそれぞれ、97゜と900hと
高い実用耐久性を示した。
Example 2 Example 1 was the same as Example 1 except that the mixing molar ratio of the starting materials was changed to C8FASC: N10SOL = 1: 2. As a result, the contact angle was 98 °, and the slipperiness was 9 μl, showing extremely high water repellency and slipperiness. Further, abrasion resistance and light resistance were 97 ° and 900 h, respectively, indicating high practical durability.

【0042】[0042]

【実施例3】実施例1において、ガラス基板を基板Aと
した以外はすべて実施例1と同じとした。結果、接触角
は100゜、滑水性は9μlと非常に高い撥水・滑水性
を示した。さらに、耐摩耗性と耐光性はそれぞれ、98
゜と900hと高い実用耐久性を示した。
Example 3 Example 1 was the same as Example 1 except that the glass substrate was Substrate A. As a result, the contact angle was 100 °, and the slipperiness was 9 μl. Furthermore, the abrasion resistance and light resistance are each 98%.
900 and 900h showed high practical durability.

【0043】[0043]

【実施例4】実施例1において、出発原料にトリフルオ
ロプロピルトリクロロシラン(CF 3CH2CH2SiC
3:C1FASC)とN10SOLを用いた以外はす
べて実施例1と同じとした。結果、接触角は99゜、滑
水性は7μlと非常に高い撥水・滑水性を示した。さら
に、耐摩耗性と耐光性はそれぞれ、97゜と750hと
高い実用耐久性を示した。
Example 4 In Example 1, the starting material was trifluoride.
Lopropyltrichlorosilane (CF ThreeCHTwoCHTwoSiC
lThree: C1FASC) and N10SOL
All were the same as Example 1. As a result, the contact angle was 99 °,
The aqueous solution showed extremely high water repellency and water slippage of 7 μl. Further
The abrasion resistance and light resistance are 97 ゜ and 750h, respectively.
It showed high practical durability.

【0044】[0044]

【実施例5】実施例1において、出発原料にC8FAS
Cと平均重合度7のN7SOLを用いた以外はすべて実
施例1と同じとした。結果、接触角は100゜、滑水性
は8μlと非常に高い撥水・滑水性を示した。さらに、
耐摩耗性と耐光性はそれぞれ、97゜と800hと高い
実用耐久性を示した。
Example 5 In Example 1, the starting material was C8FAS
Except that C and N7SOL having an average degree of polymerization of 7 were used, all were the same as Example 1. As a result, the contact angle was 100 °, and the slipperiness was 8 μl, showing extremely high water repellency and slipperiness. further,
The wear resistance and light resistance were 97 ° and 800 h, respectively, indicating high practical durability.

【0045】[0045]

【実施例6】実施例1において、出発原料にC8FAS
Cと平均重合度7のN7SOLを用い、ガラス基板を基
板Aとした以外はすべて実施例1と同じとした。結果、
接触角は100゜、滑水性は9μlと非常に高い撥水・
滑水性を示した。さらに、耐摩耗性と耐光性はそれぞ
れ、97゜と900hと高い実用耐久性を示した。
Example 6 In Example 1, the starting material was C8FAS
C and N7SOL having an average degree of polymerization of 7 were all the same as in Example 1 except that the glass substrate was Substrate A. result,
Very high water repellency with a contact angle of 100 ° and a water slide of 9 μl.
It showed slipperiness. Further, abrasion resistance and light resistance were 97 ° and 900 h, respectively, indicating high practical durability.

【0046】[0046]

【実施例7】実施例1において、出発原料にC8FAS
Cと平均重合度20のN20SOLを用い、混合モル比
を1:2とした以外はすべて実施例1と同じとした。結
果、接触角は100゜、滑水性は10μlと非常に高い
撥水・滑水性を示した。さらに、耐摩耗性と耐光性はそ
れぞれ、98゜と850hと高い実用耐久性を示した。
Example 7 In Example 1, the starting material was C8FAS
C and N20SOL having an average degree of polymerization of 20 were used, and all were the same as Example 1 except that the mixing molar ratio was 1: 2. As a result, the contact angle was 100 °, and the slipperiness was 10 μl. Further, abrasion resistance and light resistance were 98 ° and 850 h, respectively, indicating high practical durability.

【0047】[0047]

【実施例8】実施例1において、出発原料にヘインコサ
ンフルオロドデシルトリクロロシラン(CF3(CF2)9
2CH2SiCl3:C10FASC)とN20SOLを
用いた以外はすべて実施例1と同じとした。結果、接触
角は101゜、滑水性は10μlと非常に高い撥水・滑
水性を示した。さらに、耐摩耗性と耐光性はそれぞれ、
100゜と900hと高い実用耐久性を示した。
Example 8 In Example 1, heincosan fluorododecyltrichlorosilane (CF 3 (CF 2 ) 9 C was used as a starting material.
H 2 CH 2 SiCl 3: C10FASC ) and except for using N20SOL were all the same as in Example 1. As a result, the contact angle was 101 °, and the slipperiness was 10 μl. Furthermore, wear resistance and light resistance are each
It exhibited high practical durability of 100 ° and 900 hours.

【0048】[0048]

【実施例9】実施例1において、ガラス基板を作製する
際のシリカカップリング層の熱処理温度を80℃にした
以外はすべて実施例1と同じとした。結果、接触角は9
9゜、滑水性は8μlと非常に高い撥水・滑水性を示し
た。さらに、耐摩耗性と耐光性はそれぞれ、96゜と8
50hと高い実用耐久性を示した。
Example 9 Example 9 was the same as Example 1 except that the heat treatment temperature of the silica coupling layer at the time of producing the glass substrate was 80 ° C. As a result, the contact angle is 9
9 °, the water repellency and water repellency and water repellency were as high as 8 μl. Furthermore, the wear resistance and light resistance are respectively 96 ° and 8 °.
It exhibited high practical durability of 50 hours.

【0049】[0049]

【実施例10】実施例1において、ガラス基板を作製す
る際のシリカカップリング層の熱処理温度を150℃に
した以外はすべて実施例1と同じとした。結果、接触角
は97゜、滑水性は10μlと非常に高い撥水・滑水性
を示した。さらに、耐摩耗性と耐光性はそれぞれ、95
゜と850hと高い実用耐久性を示した。
Example 10 Example 1 was the same as Example 1 except that the heat treatment temperature of the silica coupling layer at the time of producing the glass substrate was 150 ° C. As a result, the contact angle was 97 °, and the slipperiness was 10 μl, which was very high. Furthermore, abrasion resistance and light resistance are each 95%.
And 850 h, indicating high practical durability.

【0050】[0050]

【実施例11】実施例1において、滑水処理後の熱処理
を風乾とした以外はすべて実施例1と同じとした。結
果、接触角は96゜、滑水性は8μlと非常に高い撥水
・滑水性を示した。さらに、耐摩耗性と耐光性はそれぞ
れ、99゜と750hと高い実用耐久性を示した。
Example 11 The procedure of Example 1 was the same except that the heat treatment after the water-sliding treatment was air-dried. As a result, the contact angle was 96 °, and the slipperiness was 8 μl, showing extremely high water repellency and slipperiness. Further, the abrasion resistance and the light resistance showed high practical durability of 99 ° and 750 h, respectively.

【0051】[0051]

【実施例12】実施例1において、滑水処理後の熱処理
を150℃とした以外はすべて実施例1と同じとした。
結果、接触角は100゜、滑水性は10μlと非常に高
い撥水・滑水性を示した。さらに、耐摩耗性と耐光性は
それぞれ、98゜と900hと高い実用耐久性を示し
た。
Example 12 Example 1 was the same as Example 1 except that the heat treatment after the water-sliding treatment was changed to 150 ° C.
As a result, the contact angle was 100 °, and the slipperiness was 10 μl. Further, abrasion resistance and light resistance were 98 ° and 900 h, respectively, indicating high practical durability.

【0052】[0052]

【比較例1】実施例1において、ガラス基板を基板Cと
した以外はすべて実施例1と同じとした。結果、接触角
は100゜と高い撥水性を示したが、滑水性は15μl
と改善効果は見られたが、依然低いレベルで不合格であ
った。また、耐摩耗性と耐光性はそれぞれ、98゜と6
00hであり、耐光性のレベルがやや低下した。
COMPARATIVE EXAMPLE 1 The same procedure as in Example 1 was performed except that the glass substrate was changed to the substrate C. As a result, the contact angle showed high water repellency of 100 °, but the slipperiness was 15 μl.
Although the improvement effect was seen, it still failed at a low level. The wear resistance and light resistance were 98 ° and 6 mm, respectively.
00h, and the light resistance level was slightly lowered.

【0053】[0053]

【比較例2】実施例1において、ガラス基板を基板Dと
した以外はすべて実施例1と同じとした。結果、接触角
は100゜と高い撥水性を示したが、滑水性は13μl
と改善効果は見られたが、依然低いレベルで不合格であ
った。なお、耐摩耗性と耐光性はそれぞれ、98゜と9
00hであった。
Comparative Example 2 Example 1 was the same as Example 1 except that the glass substrate was D. As a result, the contact angle was 100 °, indicating high water repellency, but the slipperiness was 13 μl.
Although the improvement effect was seen, it still failed at a low level. The abrasion resistance and light resistance were 98% and 9%, respectively.
00h.

【0054】[0054]

【比較例3】実施例1において、ガラス基板を基板Eと
した以外はすべて実施例1と同じとした。結果、接触角
は98゜と高い撥水性を示したが、滑水性は20μlと
改善効果はやや見られたものの依然低いレベルで不合格
であった。なお、耐摩耗性と耐光性はそれぞれ、96゜
と700hであった。
Comparative Example 3 Example 1 was the same as Example 1 except that the glass substrate was substrate E. As a result, the contact angle was 98 °, indicating high water repellency, but the slipperiness was 20 μl, although the improvement effect was somewhat observed, but the rejection was still at a low level. The wear resistance and light resistance were 96 ° and 700 hours, respectively.

【0055】[0055]

【比較例4】実施例1において、出発原料にトリフルオ
ロプロピルトリメトキシシラン(CF3CH2CH2Si
(OCH3)3:C1FASM)とN10SOLを用いた以
外はすべて実施例1と同じとした。結果、接触角は88
゜と撥水性は低かったが、滑水性は9μlと高かった。
しかし、耐摩耗性と耐光性はそれぞれ、65゜と350
hと耐久性は大幅に低下し好ましいものではなかった。
Comparative Example 4 In Example 1, trifluoropropyltrimethoxysilane (CF 3 CH 2 CH 2 Si
(OCH 3 ) 3 : C1FASM) and N10SOL were all used in the same manner as in Example 1. As a result, the contact angle is 88
゜ and the water repellency were low, but the water slippage was as high as 9 μl.
However, abrasion resistance and light resistance are 65 ° and 350 °, respectively.
h and the durability were greatly reduced, which was not preferable.

【0056】[0056]

【比較例5】実施例1において、出発原料にヘプタデカ
フルオロデシルトリメトキシシラン(CF3(CF2)7
2CH2Si(OCH3)3:C8FASM)とN10SO
Lを用いた以外はすべて実施例1と同じとした。結果、
接触角107゜と撥水性は高かったが、滑水性は25μ
lと低く不合格であった。また、耐摩耗性と耐光性はそ
れぞれ、103゜と600hであった。
Comparative Example 5 In Example 1, heptadecafluorodecyltrimethoxysilane (CF 3 (CF 2 ) 7 C
H 2 CH 2 Si (OCH 3 ) 3 : C8FASM) and N10SO
All were the same as Example 1 except that L was used. result,
Although the contact angle was 107 ° and the water repellency was high, the slipperiness was 25μ.
It was rejected as low as l. The abrasion resistance and light resistance were 103 ° and 600 hours, respectively.

【0057】[0057]

【比較例6】実施例1において、出発原料にヘインコサ
ンフルオロドデシルトリメトキシシラン(CF3(CF2)9
CH2CH2Si(OCH3)3:C10FASM)とN10
SOLを用いた以外はすべて実施例1と同じとした。結
果、接触角108゜と撥水性は高かったが、滑水性は2
5μlと低く不合格であった。また、耐摩耗性と耐光性
はそれぞれ、104゜と600hであった。
Comparative Example 6 In Example 1, heincosan fluorododecyltrimethoxysilane (CF 3 (CF 2 ) 9
CH 2 CH 2 Si (OCH 3 ) 3 : C10FASM) and N10
All were the same as Example 1 except that SOL was used. As a result, the contact angle was 108 ° and the water repellency was high, but the slipperiness was 2
Rejection was as low as 5 μl. The abrasion resistance and light resistance were 104 ° and 600 hours, respectively.

【0058】[0058]

【比較例7】実施例1において、出発原料として、シラ
ノール末端ポリジメチルシロキサンを用いずC8FAS
Cのみを用いた以外はすべて実施例1と同じとした。結
果、接触角111゜と高い撥水性を示したが、滑水性は
50μlと非常に低かった。また、耐摩耗性と耐光性は
それぞれ、108゜と900hと良好であった。
Comparative Example 7 In Example 1, C8FAS was used without using silanol-terminated polydimethylsiloxane as a starting material.
All were the same as Example 1 except that only C was used. As a result, it showed a high water repellency with a contact angle of 111 °, but the slipperiness was extremely low at 50 μl. The abrasion resistance and light resistance were as good as 108 ° and 900 h, respectively.

【0059】[0059]

【比較例8】実施例1において、出発原料にフルオロア
ルキルトリクロロシランを用いずN10SOLのみを用
いた以外はすべて実施例1と同じとした。結果、接触角
90゜で滑水性は10μlと滑水性は良好であったが、
耐摩耗性と耐光性はそれぞれ、73゜と350hと耐久
性は非常に低く好ましいものではなかった。
Comparative Example 8 Example 1 was the same as Example 1 except that only N10SOL was used without using a fluoroalkyltrichlorosilane as a starting material. As a result, at a contact angle of 90 °, the slipperiness was 10 μl and the slipperiness was good,
The abrasion resistance and light resistance were 73 ° and 350 h, respectively, and the durability was extremely low, which was not preferable.

【0060】[0060]

【比較例9】実施例1において、出発原料にC8FAS
Cと平均重合度が56のN56OLを用いた以外はすべ
て実施例1と同じとした。結果、接触角110゜と撥水
性は高かったが、滑水性は35μlと低かった。また、
耐摩耗性と耐光性はそれぞれ、97゜と650hであっ
た。
Comparative Example 9 In Example 1, the starting material was C8FAS
Except that C and N56OL having an average degree of polymerization of 56 were used, all were the same as Example 1. As a result, the contact angle was 110 ° and the water repellency was high, but the water slippage was low at 35 μl. Also,
The abrasion resistance and light resistance were 97 ° and 650 h, respectively.

【0061】[0061]

【比較例10】実施例1において、出発原料にC8FA
SCと平均重合度が243のN243SOLを用いた以
外はすべて実施例1と同じとした。結果、接触角110
゜と撥水性は高かったが、滑水性は35μlと低かっ
た。また、耐摩耗性と耐光性はそれぞれ、97゜と65
0hであった。
Comparative Example 10 In Example 1, the starting material was C8FA
All were the same as Example 1 except that SC and N243SOL having an average degree of polymerization of 243 were used. As a result, the contact angle 110
The water repellency was high, but the slipperiness was low at 35 μl. The abrasion resistance and light resistance were 97 ° and 65 °, respectively.
0h.

【0062】[0062]

【表1】 [Table 1]

【0063】[0063]

【発明の効果】本発明は、耐光性や耐摩耗性に優れた高
い撥水耐久性と優れた滑水性を兼ね備えているので、例
えば車輌用の窓ガラス等に用いた場合には優れた撥水性
とともに優れた滑水性をも有するので雨天時に前方、側
方、後方の視界が見易くなり安全に運転が出来るととも
に長期間にわたり高性能を維持できる等の著効を奏す
る。
As described above, the present invention has both high water repellency and excellent water repellency and excellent light resistance and abrasion resistance. Therefore, when the present invention is used for a window glass for a vehicle, for example, it has excellent repellency. Since it has excellent water-sliding properties as well as water-based properties, it is easy to see the front, side, and rear views in rainy weather, and it is possible to drive safely and maintain high performance for a long period of time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の滑水液の調製工程を示すフロー図であ
FIG. 1 is a flowchart showing a process for preparing a synovial fluid according to the present invention.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C09D 183/06 C09D 183/06 183/08 183/08 (72)発明者 荒井 宏明 三重県松阪市大口町1510 セントラル硝子 株式会社硝子研究所内 (72)発明者 公文 創一 三重県松阪市大口町1510 セントラル硝子 株式会社硝子研究所内 Fターム(参考) 4D075 AE16 AE27 BB24Y BB24Z BB92Y BB92Z BB93Y BB93Z CA02 CA09 CA32 CA36 DA06 DB13 DC01 DC13 DC38 EA07 EB16 EB42 EB43 EB56 EC45 EC54 4G059 AA01 AB01 AC22 FA05 FA11 GA01 GA04 GA11 4J038 DG261 DL021 DL051 GA03 GA15 JC31 JC35 NA04 NA07 NA11 PA14 PB05 PB07 PC03──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C09D 183/06 C09D 183/06 183/08 183/08 (72) Inventor Hiroaki Arai Oguchi-cho, Matsusaka-shi, Mie Prefecture 1510 Central Glass Co., Ltd.Glass Laboratory Co., Ltd. DC01 DC13 DC38 EA07 EB16 EB42 EB43 EB56 EC45 EC54 4G059 AA01 AB01 AC22 FA05 FA11 GA01 GA04 GA11 4J038 DG261 DL021 DL051 GA03 GA15 JC31 JC35 NA04 NA07 NA11 PA14 PB05 PB07 PC03

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】透明基板表面に形成されたシリカカップリ
ング層上に、一般式[1]で表されるフルオロアルキル
トリクロロシランと一般式[2]で表されるシラノール
末端ポリジメチルシロキサンの共重合物からなる滑水性
被膜が形成されてなることを特徴とする高滑水性基板。 CF3(CF2)m(CH2)2SiCl3 [1] (式中、m=0〜11の整数) HO-[Si(CH3)2O-]nH [2] (式中、n=1〜50の整数)
1. A copolymer of a fluoroalkyltrichlorosilane represented by the general formula [1] and a silanol-terminated polydimethylsiloxane represented by the general formula [2] on a silica coupling layer formed on the surface of a transparent substrate. A highly water-slidable substrate comprising a water-slidable film formed of a material. CF 3 (CF 2 ) m (CH 2 ) 2 SiCl 3 [1] (where m is an integer from 0 to 11) HO- [Si (CH 3 ) 2 O-] n H [2] (wherein n = 1 to 50 integer)
【請求項2】前記シリカカップリング層は、テトラアル
コキシシランの加水分解物または、テトライソシアネー
トシランを希釈して得た塗布液を、ガラス基板表面に塗
布して形成した、膜厚が少なくとも20nm以下のシリカ
膜であることを特徴とする請求項1記載の高滑水性基
板。
2. The silica coupling layer is formed by applying a coating solution obtained by diluting a tetraalkoxysilane hydrolyzate or tetraisocyanate silane to the surface of a glass substrate, and has a thickness of at least 20 nm or less. 2. The highly water-slidable substrate according to claim 1, wherein the substrate is a silica film.
【請求項3】前記高滑水性被膜は、前記一般式[1]で
表されるフルオロアルキルトリクロロシランと一般式
[2]で表されるシラノール末端ポリジメチルシロキサ
ンの混合モル比を1:0.1〜2として共重合反応を行
わせた組成物であることを特徴とする請求項1記載の高
滑水性基板。
3. The high water-sliding film has a mixing molar ratio of the fluoroalkyltrichlorosilane represented by the general formula [1] and the silanol-terminated polydimethylsiloxane represented by the general formula [2] of 1: 0. 2. The highly water-slidable substrate according to claim 1, wherein the composition is a composition which has been subjected to a copolymerization reaction.
【請求項4】下記の工程により高滑水性基板を製造する
ことを特徴とする高滑水性基板の製造方法。 (1)透明基板表面にテトラアルコキシシランの加水分
解物、またはテトライソシアネートシランを主成分とす
る下地層用の塗布液を塗布する工程、(2)乾燥及び/
又は190℃以下の温度で熱処理を行い下地層としての
シリカカップリング層を形成する工程、(3)一般式
[1]で表されるフルオロアルキルトリクロロシランと
一般式[2]で表されるシラノール末端ポリジメチルシ
ロキサンの共重合物からなる滑水性被膜用塗布液を塗布
する工程、(4)乾燥及び/又は190℃以下の温度で
熱処理を行い滑水性被膜を形成する工程、 CF3(CF2)m(CH2)2SiCl3 [1] (式中、m=0〜11の整数) HO-[Si(CH3)2O-]nH [2] (式中、n=1〜50の整数)
4. A method for manufacturing a highly water-slidable substrate, comprising manufacturing a highly water-slidable substrate by the following steps. (1) a step of applying a hydrolyzate of tetraalkoxysilane or a coating solution for an underlayer containing tetraisocyanatesilane as a main component on the surface of the transparent substrate; (2) drying and / or drying
Or a step of performing a heat treatment at a temperature of 190 ° C. or less to form a silica coupling layer as an underlayer; (3) a fluoroalkyltrichlorosilane represented by the general formula [1] and a silanol represented by the general formula [2] A step of applying a coating liquid for a water-slidable film comprising a copolymer of terminal polydimethylsiloxane, (4) a step of drying and / or heat-treating at a temperature of 190 ° C. or lower to form a water-slidable film, CF 3 (CF 2 ) m (CH 2 ) 2 SiCl 3 [1] (where m is an integer from 0 to 11) HO- [Si (CH 3 ) 2 O-] n H [2] (where n = 1 to 50) Integer)
【請求項5】下地層用の塗布液は、0.1〜5.0wt
%濃度のテトラアルコキシシランの加水分解物、または
0.1〜5.0wt%濃度のテトライソシアネートシラ
ンよりなることを特徴とする請求項4記載の高滑水性基
板の製造方法。
5. The coating solution for the underlayer is 0.1 to 5.0 wt.
5. The method for producing a highly water-slidable substrate according to claim 4, comprising a hydrolyzate of tetraalkoxysilane having a concentration of 0.1% or tetraisocyanate silane having a concentration of 0.1 to 5.0% by weight.
JP2000193650A 2000-06-28 2000-06-28 Highly slidable substrate and manufacturing method thereof Expired - Fee Related JP3883366B2 (en)

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