JP2002009510A - High frequency circuit and package - Google Patents

High frequency circuit and package

Info

Publication number
JP2002009510A
JP2002009510A JP2000192784A JP2000192784A JP2002009510A JP 2002009510 A JP2002009510 A JP 2002009510A JP 2000192784 A JP2000192784 A JP 2000192784A JP 2000192784 A JP2000192784 A JP 2000192784A JP 2002009510 A JP2002009510 A JP 2002009510A
Authority
JP
Japan
Prior art keywords
frequency
bonding pad
wire
dielectric substrate
microstrip line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000192784A
Other languages
Japanese (ja)
Inventor
Tsutomu Tamaki
努 田牧
Takuya Suzuki
拓也 鈴木
Koichi Matsuo
浩一 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2000192784A priority Critical patent/JP2002009510A/en
Publication of JP2002009510A publication Critical patent/JP2002009510A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • H01L2224/49176Wire connectors having the same loop shape and height
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01L2924/01004Beryllium [Be]
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01075Rhenium [Re]
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
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    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • H01L2924/30111Impedance matching

Abstract

PROBLEM TO BE SOLVED: To solve the problem of a conventional high frequency circuit that has caused mismatching at a connection part in the case of connecting microstrip lines at an ultrahigh frequency band such as a millimeter band, thereby deteriorating the system performance because the characteristic impedance of connection wires has often been not managed. SOLUTION: A bonding pad whose width is an effective wavelength of a pass frequency of a dielectric board or below is placed to a tip of a microstrip line configured on the dielectric boards and its capacitive component that depends on the size of the pad can reduce the mismatching by the wire at the pass frequency.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】この発明は、高周波、特にミ
リ波帯で動作する高周波回路およびパッケージに関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency circuit and a package operating at a high frequency, particularly, a millimeter wave band.

【0002】[0002]

【従来の技術】図6は、従来の高周波回路の接続部の構
成を示す図である。図において、1は誘電体基板、2は
マイクロストリップ線路、3はワイヤやリボン等の導体
(なおここでは、ワイヤという)である。
2. Description of the Related Art FIG. 6 is a diagram showing a configuration of a connection portion of a conventional high-frequency circuit. In the figure, reference numeral 1 denotes a dielectric substrate, 2 denotes a microstrip line, and 3 denotes a conductor such as a wire or a ribbon (hereinafter, referred to as a wire).

【0003】また、図7は、従来の高周波回路の接続部
の特性を示す図である。図において、曲線aは接続部の
反射特性、曲線bは通過特性である。
FIG. 7 is a diagram showing characteristics of a connection portion of a conventional high-frequency circuit. In the figure, a curve a indicates the reflection characteristic of the connection portion, and a curve b indicates the transmission characteristic.

【0004】次に、従来の高周波回路の接続部の構成及
び特性について説明する。従来の高周波回路の接続部
は、図6に示すように、複数の誘電体基板1上に構成し
たマイクロストリップ線路2の開放端に、1本或いは複
数本のワイヤ3をボンディングすることによって、複数
のマイクロストリップ線路2を接続している。しかし、
このように複数のマイクロストリップ線路2を接続する
多くの場合は、マイクロストリップ線路2の開放端にて
所望の特性インピーダンスを得ており、ワイヤ3の特性
インピーダンスはマイクロストリップ線路2の特性イン
ピーダンスと合致しないことが多い。このため、高周波
回路の接続部における特性は図7のように、低周波では
反射特性(曲線a)、通過特性(曲線b)とも特に問題な
いが、高周波領域、特にミリ波領域では、反射特性、通
過特性ともに劣化する(不整合が発生する)。したがっ
て、接続部による特性劣化による高周波回路の特性劣化
を招き、結果的にシステム性能の劣化を招くという問題
があった。
Next, a description will be given of the configuration and characteristics of a connection portion of a conventional high-frequency circuit. As shown in FIG. 6, one or more wires 3 are bonded to the open end of a microstrip line 2 formed on a plurality of dielectric substrates 1 by bonding one or more wires 3 as shown in FIG. Of microstrip lines 2 are connected. But,
In many cases where a plurality of microstrip lines 2 are connected as described above, a desired characteristic impedance is obtained at the open end of the microstrip line 2, and the characteristic impedance of the wire 3 matches the characteristic impedance of the microstrip line 2. Often not. For this reason, as shown in FIG. 7, the characteristics at the connection portion of the high-frequency circuit are not particularly problematic in the reflection characteristics (curve a) and the transmission characteristics (curve b) at low frequencies, but in the high-frequency region, particularly in the millimeter-wave region. , Pass characteristics deteriorate (mismatch occurs). Therefore, there has been a problem that the characteristics of the high-frequency circuit are deteriorated due to the characteristics deterioration due to the connection portion, and as a result, the system performance is deteriorated.

【0005】このような問題に関し、従来は、例えば特
開2000-165114号公報のように、ワイヤ3が接続される
マイクロストリップ線路2の先端をテーパ状にする等の
対策が取られていた。その内容を以下に示す。
In order to deal with such a problem, conventionally, measures such as tapering the tip of the microstrip line 2 to which the wire 3 is connected have been taken as disclosed in Japanese Patent Application Laid-Open No. 2000-165114, for example. The contents are shown below.

【0006】図8、図9は、特開2000-165114号公報に
示される対策内容である。図において、1は誘電体基
板、2はマイクロストリップ線路、3はワイヤ、曲線c
は接続部の反射特性、曲線dは通過特性である。
FIGS. 8 and 9 show the countermeasures described in Japanese Patent Application Laid-Open No. 2000-165114. In the figure, 1 is a dielectric substrate, 2 is a microstrip line, 3 is a wire, curve c
Represents the reflection characteristic of the connection portion, and curve d represents the transmission characteristic.

【0007】次に、従来の対策による効果を示す。図8
のように、本対策は、ワイヤ3が接続されるマイクロス
トリップ線路2の先端より、誘電体基板1における通過
周波数の3/10*実効波長以上のテーパを設けてい
る。これにより、ワイヤ3とマイクロストリップ線路2
における不整合は図9のとおり、若干の改善を見せる。
しかし、この対策では、ワイヤ3の特性インピーダンス
とマイクロストリップ線路2の接続部付近の特性インピ
ーダンスを近づけることは可能であるが、依然、マイク
ロストリップ線路2の接続部以外の箇所、つまり回路全
体から見れば、不整合が生じたままであり、特に、ミリ
波帯等の高周波帯では、この影響が顕著に見られるた
め、他の対策が必要であった。
Next, the effects of the conventional measures will be described. FIG.
As described above, in this measure, a taper is provided from the tip of the microstrip line 2 to which the wire 3 is connected, at least 3/10 * the effective wavelength of the pass frequency in the dielectric substrate 1. Thereby, the wire 3 and the microstrip line 2
9 shows a slight improvement as shown in FIG.
However, in this measure, it is possible to make the characteristic impedance of the wire 3 close to the characteristic impedance near the connection portion of the microstrip line 2, but it can still be seen from a portion other than the connection portion of the microstrip line 2, that is, from the entire circuit. For example, the mismatch still occurs. In particular, in a high frequency band such as a millimeter wave band, this effect is remarkably observed, so that other measures are required.

【0008】[0008]

【発明が解決しようとする課題】上記のように、従来の
高周波回路では、ワイヤの特性インピーダンスを管理し
ていないことが多く、複数の誘電体基板に構成したマイ
クロストリップ線路を接続した場合、その接続部におい
て不整合が発生し、システム性能の劣化を招くという課
題があった。
As described above, in the conventional high-frequency circuit, the characteristic impedance of the wire is often not managed, and when a microstrip line configured on a plurality of dielectric substrates is connected, the There is a problem that a mismatch occurs at the connection part, which causes deterioration of system performance.

【0009】この発明はかかる課題を解決するためにな
されたものであり、複数の誘電体基板に構成したマイク
ロストリップ線路の先端に、幅が誘電体基板における通
過周波数の実効波長以下でのボンディングパッドを配置
し、そのパッド寸法によって、通過周波数におけるワイ
ヤによる不整合を低減する。
SUMMARY OF THE INVENTION The present invention has been made to solve such a problem, and has a bonding pad having a width equal to or less than an effective wavelength of a pass frequency on a dielectric substrate at a tip of a microstrip line formed on a plurality of dielectric substrates. And its pad size reduces wire mismatch at the pass frequency.

【0010】[0010]

【課題を解決するための手段】第1の発明による高周波
回路は、複数のマイクロストリップ線路を接続するため
のワイヤ等の導体と、このワイヤ等の導体をボンディン
グし、かつ幅が誘電体基板における通過周波数の実効波
長以下のボンディングパッドとを備えたものである。
According to a first aspect of the present invention, there is provided a high-frequency circuit comprising: a conductor such as a wire for connecting a plurality of microstrip lines; And a bonding pad having a wavelength equal to or less than the effective wavelength of the pass frequency.

【0011】また、第2の発明による高周波回路は、上
記ボンディングパッドにおけるインピーダンスにインダ
クタンス成分及び容量成分をもって整合するための整合
回路を上記マイクロストリップ線路の所定位置に設けた
ものである。
In the high-frequency circuit according to the second invention, a matching circuit for matching the impedance at the bonding pad with an inductance component and a capacitance component is provided at a predetermined position of the microstrip line.

【0012】第3の発明による高周波回路は、上記ボン
ディングパッドからの距離が誘電体基板における通過周
波数の実効波長の1/2以下の箇所に、長さが誘電体基
板における通過周波数の実効波長の1/2以下の先端開
放線路あるいは先端短絡線路等の整合回路を設けたもの
である。
The high-frequency circuit according to a third aspect of the present invention is the high-frequency circuit, wherein the distance from the bonding pad is equal to or less than half the effective wavelength of the pass frequency on the dielectric substrate, and the length is the effective wavelength of the pass frequency on the dielectric substrate. A matching circuit such as an open-ended line or a short-circuited line of 1/2 or less is provided.

【0013】また、第4の発明によるパッケージは、誘
電体基板を積層してキャビティを構成し、そのキャビテ
ィに高周波半導体回路を収納し、その高周波半導体回路
とマイクロストリップ線路の接続部に、ワイヤ等の導体
と、このワイヤ等の導体をボンディングし、かつ幅が誘
電体基板における通過周波数の実効波長以下のボンディ
ングパッドとを備えたものである。
In the package according to the fourth aspect of the present invention, a dielectric substrate is laminated to form a cavity, a high-frequency semiconductor circuit is housed in the cavity, and a wire or the like is connected to a connection between the high-frequency semiconductor circuit and the microstrip line. And a bonding pad that bonds the conductor such as a wire and has a width equal to or less than the effective wavelength of the pass frequency in the dielectric substrate.

【0014】[0014]

【発明の実施の形態】実施の形態1.図1は、この発明
の実施の形態1を示す高周波回路の構成図であり、図に
おいて、1は誘電体基板、2はマイクロストリップ線
路、3はワイヤ、4はボンディングパッドである。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 FIG. 1 is a configuration diagram of a high-frequency circuit according to a first embodiment of the present invention. In the figure, 1 is a dielectric substrate, 2 is a microstrip line, 3 is a wire, and 4 is a bonding pad.

【0015】また、図2はこの発明の高周波回路の特性
を示す図である。図において、曲線eは反射特性、曲線f
は通過特性である。
FIG. 2 is a diagram showing characteristics of the high-frequency circuit according to the present invention. In the figure, curve e is the reflection characteristic, curve f
Is the pass characteristic.

【0016】次に、構成について説明する。複数の誘電
体基板1に構成したマイクロストリップ線路2の先端に
ボンディングパッド4を設けており、このボンディング
パッド4上にワイヤ3をボンディングすることにより、
複数の誘電体基板1及びマイクロストリップ線路2を接
続する。このとき、ボンディングパッド4の幅は、マイ
クロストリップ線路2の通過周波数f0における、誘電体
基板1の実効波長以下である。
Next, the configuration will be described. A bonding pad 4 is provided at a tip of a microstrip line 2 formed on a plurality of dielectric substrates 1, and a wire 3 is bonded onto the bonding pad 4 to
A plurality of dielectric substrates 1 and microstrip lines 2 are connected. At this time, the width of the bonding pad 4 is equal to or smaller than the effective wavelength of the dielectric substrate 1 at the pass frequency f0 of the microstrip line 2.

【0017】次に、高周波回路の接続部の特性について
説明する。図2において、曲線eは接続部における反射
特性であり、曲線fは通過特性である。反射特性、通過
特性ともに通過周波数f0において、従来の高周波回路の
特性よりも改善されていることがわかる。これは、ワイ
ヤ3のインダクタンス成分を、ボンディングパッド4の
容量成分によって、通過周波数f0におけるインピーダン
ス整合をとった結果である。この容量成分はボンディン
グパッド4の寸法(幅)によって変えることができ、誘
電体基板の実効波長以下の値で整合をとることが可能で
ある。このように、高周波回路の接続部において、幅寸
法を調整されたボンディングパッドを使用することで、
この接続部の不整合を低減することができ、高周波回路
やシステム性能の劣化を防止できる。
Next, the characteristics of the connection portion of the high-frequency circuit will be described. In FIG. 2, a curve e is a reflection characteristic at the connection portion, and a curve f is a pass characteristic. It can be seen that both the reflection characteristics and the pass characteristics are improved at the pass frequency f0 as compared with the characteristics of the conventional high-frequency circuit. This is the result of impedance matching at the pass frequency f0 of the inductance component of the wire 3 by the capacitance component of the bonding pad 4. This capacitance component can be changed depending on the dimension (width) of the bonding pad 4, and matching can be achieved with a value equal to or less than the effective wavelength of the dielectric substrate. In this way, by using the bonding pad whose width has been adjusted in the connection portion of the high-frequency circuit,
This mismatching of the connection can be reduced, and deterioration of the high-frequency circuit and system performance can be prevented.

【0018】実施の形態2.図3は、この発明の実施の
形態2を示す高周波回路の構成図であり、図において、
1は誘電体基板、2はマイクロストリップ線路、3はワ
イヤ、4はボンディングパッド、5は先端開放線路によ
る整合回路である。
Embodiment 2 FIG. FIG. 3 is a configuration diagram of a high-frequency circuit according to Embodiment 2 of the present invention.
1 is a dielectric substrate, 2 is a microstrip line, 3 is a wire, 4 is a bonding pad, and 5 is a matching circuit using an open-ended line.

【0019】また、図4はこの発明の高周波回路におけ
る、ワイヤ3とボンディングパッド4による接続部の特
性を示す図である。図において、曲線gは反射特性、曲
線hは通過特性である。
FIG. 4 is a graph showing the characteristics of the connection between the wire 3 and the bonding pad 4 in the high-frequency circuit according to the present invention. In the figure, a curve g is a reflection characteristic, and a curve h is a transmission characteristic.

【0020】次に、構成及び特性について説明する。複
数の誘電体基板1に構成したマイクロストリップ線路2
の先端にボンディングパッド4を設け、このボンディン
グパッド3上にワイヤ3をボンディングすることによ
り、複数の誘電体基板1及びマイクロストリップ線路2
を接続する。このとき、ボンディングパッド4の幅は、
マイクロストリップ線路2の通過周波数f0における、誘
電体基板1の実効波長以下である。このように、実施の
形態1と同様に、寸法を調整されたボンディングパッド
4を使用することによって、接続部の不整合を低減でき
る。
Next, the configuration and characteristics will be described. Microstrip line 2 formed on a plurality of dielectric substrates 1
A bonding pad 4 is provided at the tip of the substrate, and a wire 3 is bonded on the bonding pad 3 to form a plurality of dielectric substrates 1 and microstrip lines 2.
Connect. At this time, the width of the bonding pad 4 is
It is equal to or less than the effective wavelength of the dielectric substrate 1 at the pass frequency f0 of the microstrip line 2. Thus, as in the first embodiment, by using the bonding pad 4 whose dimensions are adjusted, it is possible to reduce the mismatch of the connection portion.

【0021】しかし、ワイヤ3が長い場合、ボンディン
グパッド4の寸法を調整しても、図4のように、ワイヤ
3の不整合を大きく低減できない場合がある。これは、
ワイヤ3が長すぎるため、ワイヤ3のインダクタンス成
分を、ボンディングパッド4の容量成分でインピーダン
ス整合がとりきれないためである。このような場合は、
図3のように、ボンディングパッド4からの距離が、マ
イクロストリップ線路2の通過周波数f0における、誘電
体基板1の実効波長*1/2以下の箇所に、長さがマイ
クロストリップ線路2の通過周波数f0における誘電体基
板1の実効波長*1/2以下の、先端開放線路あるいは
先端短絡線路等の整合回路を設けることにより、接続部
の不整合を低減できる。
However, when the wire 3 is long, even if the dimensions of the bonding pad 4 are adjusted, the mismatch of the wire 3 may not be significantly reduced as shown in FIG. this is,
This is because the impedance of the wire 3 cannot be sufficiently matched with the capacitance of the bonding pad 4 because the wire 3 is too long. In such a case,
As shown in FIG. 3, the distance from the bonding pad 4 to the pass wavelength f0 of the microstrip line 2 is equal to or less than the effective wavelength * 1/2 of the dielectric substrate 1 and the length of the pass frequency of the microstrip line 2. By providing a matching circuit such as an open-ended line or a short-circuited line having an effective wavelength of 1 / or less of the dielectric substrate 1 at f0, mismatching of the connection portion can be reduced.

【0022】これは、ボンディングパッド4におけるイ
ンピーダンスにインダクタンス成分及び容量成分をもっ
て再整合するためである。このように、本実施の形態に
よれば、ワイヤ3が長い場合でも、インピーダンス整合
でき、高周波回路及びシステムの特性劣化を防ぐことが
できる。
This is because the impedance at the bonding pad 4 is re-matched with an inductance component and a capacitance component. As described above, according to the present embodiment, even when the wire 3 is long, impedance matching can be performed, and deterioration of characteristics of the high-frequency circuit and the system can be prevented.

【0023】なお、上記整合回路5は、一方の誘電体基
板1に施したマイクロストリップ線路2に設けたが、こ
の整合回路5を他方の誘電体基板1に施したマイクロス
トリップ線路2のみに設けても良いし、また両方のマイ
クロストリップ線路に設けても良い。
Although the matching circuit 5 is provided on the microstrip line 2 provided on one dielectric substrate 1, the matching circuit 5 is provided only on the microstrip line 2 provided on the other dielectric substrate 1. Or may be provided on both microstrip lines.

【0024】実施の形態3.図4は、この発明の実施の
形態3を示すパッケージの構成図であり、図において、
1は誘電体基板、2はマイクロストリップ線路、3はワ
イヤ、4はボンディングパッド、6はベース、7はカバ
ー、8はキャビティ、9は高周波半導体回路である。
Embodiment 3 FIG. FIG. 4 is a configuration diagram of a package showing a third embodiment of the present invention.
1 is a dielectric substrate, 2 is a microstrip line, 3 is a wire, 4 is a bonding pad, 6 is a base, 7 is a cover, 8 is a cavity, and 9 is a high-frequency semiconductor circuit.

【0025】次に、構成及び動作について説明する。本
パッケージは、金属製のベース6の上に複数の誘電体基
板1を積層してキャビティ8を作り、キャビティ8の内
部に高周波半導体回路9を収納し、カバー7にて封止し
ている。このパッケージにおいて、収納された高周波半
導体回路9は、マイクロストリップ線路2とボンディン
グパッド4を介して接続され、動作する。このとき、ボ
ンディングパッド4の幅は、マイクロストリップ線路2
の通過周波数f0における、誘電体基板1の実効波長以下
である。このように、実施の形態1と同様に、寸法を調
整されたボンディングパッド4を使用することによっ
て、接続部の不整合を低減でき、高周波回路を含むパッ
ケージやシステム性能の劣化を防止できる。
Next, the configuration and operation will be described. In this package, a plurality of dielectric substrates 1 are stacked on a metal base 6 to form a cavity 8, a high-frequency semiconductor circuit 9 is housed inside the cavity 8, and sealed with a cover 7. In this package, the housed high-frequency semiconductor circuit 9 is connected to the microstrip line 2 via the bonding pad 4 and operates. At this time, the width of the bonding pad 4 is
Is equal to or less than the effective wavelength of the dielectric substrate 1 at the pass frequency f0. Thus, similarly to the first embodiment, by using the bonding pad 4 whose dimensions are adjusted, it is possible to reduce the mismatch of the connection portion, and to prevent the deterioration of the package including the high-frequency circuit and the system performance.

【0026】[0026]

【発明の効果】第1の発明によれば、複数のマイクロス
トリップ線路を接続するためのワイヤ等の導体と、この
ワイヤ等の導体をボンディングし、かつ幅が誘電体基板
における通過周波数の実効波長以下のボンディングパッ
ドとを備えたことにより、高周波回路やシステム性能の
劣化を防止できる。
According to the first invention, a conductor such as a wire for connecting a plurality of microstrip lines is bonded to the conductor such as a wire, and the effective wavelength of the pass frequency in the dielectric substrate is equal to the width of the conductor. The provision of the following bonding pads can prevent high-frequency circuits and system performance from deteriorating.

【0027】また、第2、第3の発明によれば、整合回
路を備えたことにより、高周波回路やシステム性能の劣
化を防止できる。
According to the second and third aspects of the present invention, since the matching circuit is provided, deterioration of the high-frequency circuit and system performance can be prevented.

【0028】第4の発明によれば、誘電体基板を積層し
てキャビティを構成し、そのキャビティに高周波半導体
回路を収納し、その高周波半導体回路とマイクロストリ
ップ線路の接続部に、ワイヤ等の導体と、このワイヤ等
の導体をボンディングし、かつ幅が誘電体基板における
通過周波数の実効波長以下のボンディングパッドとを備
えたことにより、高周波回路を含むパッケージやシステ
ム性能の劣化を防止できる。
According to the fourth invention, a dielectric substrate is laminated to form a cavity, a high-frequency semiconductor circuit is housed in the cavity, and a conductor such as a wire is connected to a connection between the high-frequency semiconductor circuit and the microstrip line. And a bonding pad for bonding a conductor such as a wire and having a width equal to or less than the effective wavelength of the pass frequency of the dielectric substrate, so that the performance of a package including a high-frequency circuit and system performance can be prevented from deteriorating.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 この発明の実施の形態1を示す高周波回路の
構成図である。
FIG. 1 is a configuration diagram of a high-frequency circuit according to a first embodiment of the present invention.

【図2】 この発明の実施の形態1を示す高周波回路の
接続部の特性図である。
FIG. 2 is a characteristic diagram of a connection portion of the high-frequency circuit according to the first embodiment of the present invention.

【図3】 この発明の実施の形態2を示す高周波回路の
構成図である。
FIG. 3 is a configuration diagram of a high-frequency circuit according to a second embodiment of the present invention.

【図4】 この発明の実施の形態2を示す高周波回路の
接続部の特性図である。
FIG. 4 is a characteristic diagram of a connection portion of the high-frequency circuit according to the second embodiment of the present invention.

【図5】 この発明の実施の形態3を示すパッケージの
構成図である。
FIG. 5 is a configuration diagram of a package according to a third embodiment of the present invention.

【図6】 従来による第1の高周波回路を示す構成図で
ある。
FIG. 6 is a configuration diagram showing a conventional first high-frequency circuit.

【図7】 従来による第1の高周波回路の接続部の特性
を示す図である。
FIG. 7 is a diagram showing characteristics of a connection portion of a conventional first high-frequency circuit.

【図8】 従来による第2の高周波回路を示す構成図で
ある。
FIG. 8 is a configuration diagram showing a second conventional high-frequency circuit.

【図9】 従来による第2の高周波回路の接続部の特性
を示す図である。
FIG. 9 is a diagram illustrating characteristics of a connection portion of a second high-frequency circuit according to the related art.

【符号の説明】[Explanation of symbols]

1 誘電体基板、2 マイクロストリップ線路、3 ワ
イヤ、4 ボンディングパッド、5 整合回路、6 ベ
ース、7 カバー、8 キャビティ、9 高周波半導体
回路。
1 Dielectric substrate, 2 microstrip line, 3 wires, 4 bonding pads, 5 matching circuit, 6 base, 7 cover, 8 cavity, 9 high frequency semiconductor circuit.

─────────────────────────────────────────────────────
────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成13年4月23日(2001.4.2
3)
[Submission date] April 23, 2001 (2001.4.2
3)

【手続補正1】[Procedure amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】請求項1[Correction target item name] Claim 1

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【手続補正2】[Procedure amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】請求項3[Correction target item name] Claim 3

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【手続補正3】[Procedure amendment 3]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0010[Correction target item name] 0010

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0010】[0010]

【課題を解決するための手段】第1の発明による高周波
回路は、複数のマイクロストリップ線路を接続するため
のワイヤ等の導体と、このワイヤ等の導体をボンディン
グし、かつ幅が誘電体基板における通過周波数の実効波
長以下で、かつマイクロストリップ線路幅以上のボンデ
ィングパッドとを備えたものである。
According to a first aspect of the present invention, there is provided a high-frequency circuit comprising: a conductor such as a wire for connecting a plurality of microstrip lines; And a bonding pad having a width equal to or smaller than the effective wavelength of the pass frequency and equal to or larger than the microstrip line width .

【手続補正4】[Procedure amendment 4]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0012[Correction target item name] 0012

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0012】第3の発明による高周波回路は、上記ボン
ディングパッドからの距離が誘電体基板における通過周
波数の実効波長の1/2以下の箇所に、上記マイクロス
トリップ線路幅のいずれか一方の縁からの長さが上記誘
電体基板における通過周波数の実効波長の1/2以下の
先端開放線路あるいは先端短絡線路等の整合回路を設け
たものである。
The high-frequency circuit according to a third aspect of the present invention is the high-frequency circuit, wherein the distance from the bonding pad is less than half the effective wavelength of the pass frequency on the dielectric substrate .
A matching circuit such as an open-end line or a short-circuit line having a length from any one edge of the trip line width equal to or less than 1 / of the effective wavelength of the pass frequency in the dielectric substrate is provided.

【手続補正5】[Procedure amendment 5]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0016[Correction target item name] 0016

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0016】次に、構成について説明する。複数の誘電
体基板1に構成したマイクロストリップ線路2の先端に
ボンディングパッド4を設けており、このボンディング
パッド4上にワイヤ3をボンディングすることにより、
複数の誘電体基板1及びマイクロストリップ線路2を接
続する。このとき、ボンディングパッド4の幅は、マイ
クロストリップ線路2の通過周波数f0における、誘電
体基板1の実効波長以下であり、かつマイクロストリッ
プ線路2の幅以上である。
Next, the configuration will be described. A bonding pad 4 is provided at a tip of a microstrip line 2 formed on a plurality of dielectric substrates 1, and a wire 3 is bonded onto the bonding pad 4 to
A plurality of dielectric substrates 1 and microstrip lines 2 are connected. The width of the bonding pad 4, in the pass frequency f0 of the microstrip line 2 is equal to or less than the effective wavelength of the dielectric substrate 1, and the microstrip
The width of the transmission line 2 .

【手続補正6】[Procedure amendment 6]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0020[Correction target item name] 0020

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0020】次に、構成及び特性について説明する。複
数の誘電体基板1に構成したマイクロストリップ線路2
の先端にボンディングパッド4を設け、このボンディン
グパッド3上にワイヤ3をボンディングすることによ
り、複数の誘電体基板1及びマイクロストリップ線路2
を接続する。このとき、ボンディングパッド4の幅は、
マイクロストリップ線路2の通過周波数f0における、
誘電体基板1の実効波長以下であり、かつマイクロスト
リップ線路2の幅以上である。このように、実施の形態
1と同様に、寸法を調整されたボンディングパッド4を
使用することによって、接続部の不整合を低減できる。
Next, the configuration and characteristics will be described. Microstrip line 2 formed on a plurality of dielectric substrates 1
A bonding pad 4 is provided at the tip of the substrate, and a wire 3 is bonded on the bonding pad 3 to form a plurality of dielectric substrates 1 and microstrip lines 2.
Connect. At this time, the width of the bonding pad 4 is
At the pass frequency f0 of the microstrip line 2,
Less than the effective wavelength of the dielectric substrate 1 and
It is not less than the width of the lip line 2 . Thus, as in the first embodiment, by using the bonding pad 4 whose dimensions are adjusted, it is possible to reduce the mismatch of the connection portion.

【手続補正7】[Procedure amendment 7]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0021[Correction target item name] 0021

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0021】 しかし、ワイヤ3が長い場合、ボンディ
ングパッド4の寸法を調整しても、図4のように、ワイ
ヤ3の不整合を大きく低減できない場合がある。これ
は、ワイヤ3が長すぎるため、ワイヤ3のインダクタン
ス成分を、ボンディングパッド4の容量成分でインピー
ダンス整合がとりきれないためである。このような場合
は、図3のように、ボンディングパッド4からの距離
が、マイクロストリップ線路2の通過周波数f0におけ
る、誘電体基板1の実効波長*1/2以下の箇所に、
イクロストリップ線路2の幅のいずれか一方の縁からの
長さがマイクロストリップ線路2の通過周波数f0におけ
る誘電体基板1の実効波長*1/2以下の、先端開放線
路あるいは先端短絡線路等の整合回路を設けることによ
り、接続部の不整合を低減できる。
However, when the wire 3 is long, even if the dimensions of the bonding pad 4 are adjusted, the mismatch of the wire 3 may not be significantly reduced as shown in FIG. This is because the wire 3 is too long, and the inductance component of the wire 3 cannot be impedance-matched with the capacitance component of the bonding pad 4. In such a case, as shown in FIG. 3, the distance from the bonding pad 4 is set to a value less than the effective wavelength * 1/2 of the dielectric substrate 1 at the pass frequency f0 of the microstrip line 2 .
An open-ended line or a short-circuited line whose width from one edge of the width of the microstrip line 2 is less than or equal to the effective wavelength * 1/2 of the dielectric substrate 1 at the pass frequency f0 of the microstrip line 2. By providing a matching circuit such as a line, it is possible to reduce mismatching of the connection portion.

【手続補正8】[Procedure amendment 8]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0024[Correction target item name] 0024

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0024】実施の形態3.図5は、この発明の実施の
形態3を示すパッケージの構成図であり、図において、
1は誘電体基板、2はマイクロストリップ線路、3はワ
イヤ、4はボンディングパッド、6はベース、7はカバ
ー、8はキャビティ、9は高周波半導体回路である。
Embodiment 3 FIG. FIG. 5 is a configuration diagram of a package showing a third embodiment of the present invention.
1 is a dielectric substrate, 2 is a microstrip line, 3 is a wire, 4 is a bonding pad, 6 is a base, 7 is a cover, 8 is a cavity, and 9 is a high-frequency semiconductor circuit.

【手続補正9】[Procedure amendment 9]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0025[Correction target item name] 0025

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0025】次に、構成及び動作について説明する。本
パッケージは、金属製のベース6の上に複数の誘電体基
板1を積層してキャビティ8を作り、キャビティ8の内
部に高周波半導体回路9を収納し、カバー7にて封止し
ている。このパッケージにおいて、収納された高周波半
導体回路9は、マイクロストリップ線路2とボンディン
グパッド4を介して接続され、動作する。このとき、ボ
ンディングパッド4の幅は、マイクロストリップ線路2
の通過周波数f0における、誘電体基板1の実効波長以下
であり、かつマイクロストリップ線路2の幅以上であ
る。このように、実施の形態1と同様に、寸法を調整さ
れたボンディングパッド4を使用することによって、接
続部の不整合を低減でき、高周波回路を含むパッケージ
やシステム性能の劣化を防止できる。
Next, the configuration and operation will be described. In this package, a plurality of dielectric substrates 1 are stacked on a metal base 6 to form a cavity 8, a high-frequency semiconductor circuit 9 is housed inside the cavity 8, and sealed with a cover 7. In this package, the housed high-frequency semiconductor circuit 9 is connected to the microstrip line 2 via the bonding pad 4 and operates. At this time, the width of the bonding pad 4 is
Below the effective wavelength of the dielectric substrate 1 at the pass frequency f0
And not less than the width of the microstrip line 2 . Thus, similarly to the first embodiment, by using the bonding pad 4 whose dimensions are adjusted, it is possible to reduce the mismatch of the connection portion, and to prevent the deterioration of the package including the high-frequency circuit and the system performance.

【手続補正10】[Procedure amendment 10]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0026[Correction target item name] 0026

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0026】[0026]

【発明の効果】第1の発明によれば、複数のマイクロス
トリップ線路を接続するためのワイヤ等の導体と、この
ワイヤ等の導体をボンディングし、かつ幅が誘電体基板
における通過周波数の実効波長以下であり、かつマイク
ロストリップ線路2の幅以上のボンディングパッドとを
備えたことにより、高周波回路やシステム性能の劣化を
防止できる。
According to the first invention, a conductor such as a wire for connecting a plurality of microstrip lines is bonded to the conductor such as a wire, and the effective wavelength of the pass frequency in the dielectric substrate is equal to the width of the conductor. Less than and microphone
By providing a bonding pad having a width equal to or greater than the width of the lossy strip line 2 , deterioration of high-frequency circuits and system performance can be prevented.

【手続補正11】[Procedure amendment 11]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0028[Correction target item name] 0028

【補正方法】変更[Correction method] Change

【補正内容】[Correction contents]

【0028】第4の発明によれば、誘電体基板を積層し
てキャビティを構成し、そのキャビティに高周波半導体
回路を収納し、その高周波半導体回路とマイクロストリ
ップ線路の接続部に、ワイヤ等の導体と、このワイヤ等
の導体をボンディングし、かつ幅が誘電体基板における
通過周波数の実効波長以下であり、かつマイクロストリ
ップ線路2の幅以上のボンディングパッドとを備えたこ
とにより、高周波回路を含むパッケージやシステム性能
の劣化を防止できる。
According to the fourth invention, a dielectric substrate is laminated to form a cavity, a high-frequency semiconductor circuit is housed in the cavity, and a conductor such as a wire is connected to a connection between the high-frequency semiconductor circuit and the microstrip line. And a conductor such as a wire, the width of which is less than or equal to the effective wavelength of the pass frequency on the dielectric substrate , and
By providing the bonding pad having a width equal to or larger than the width of the gap line 2 , deterioration of a package including a high-frequency circuit and system performance can be prevented.

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01P 1/04 H01P 1/04 (72)発明者 松尾 浩一 東京都千代田区丸の内二丁目2番3号 三 菱電機株式会社内 Fターム(参考) 5F044 EE01 EE02 5J011 DA12 Continued on the front page (51) Int.Cl. 7 Identification FI FI Theme Court II (Reference) H01P 1/04 H01P 1/04 (72) Inventor Koichi Matsuo 2-3-2 Marunouchi, Chiyoda-ku, Tokyo Mitsubishi Electric Co., Ltd. In-house F term (reference) 5F044 EE01 EE02 5J011 DA12

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 複数の誘電体基板に構成したマイクロス
トリップ線路を接続してなる高周波回路において、複数
のマイクロストリップ線路を接続するためのワイヤ等の
導体と、幅が上記誘電体基板における通過周波数の実効
波長以下で上記ワイヤ等の導体をボンディングするため
のボンディングパッドとを具備したことを特徴とする高
周波回路。
1. A high-frequency circuit comprising a plurality of microstrip lines connected to a plurality of dielectric substrates, wherein a conductor such as a wire for connecting the plurality of microstrip lines and a pass frequency of the dielectric substrate are provided. And a bonding pad for bonding a conductor such as the above-mentioned wire at an effective wavelength equal to or less than the effective wavelength.
【請求項2】 上記ボンディングパッドにおけるインピ
ーダンスにインダクタンス成分及び容量成分をもって整
合するための整合回路を上記マイクロストリップ線路の
所定位置に設けたことを特徴とする請求項1記載の高周
波回路。
2. The high-frequency circuit according to claim 1, wherein a matching circuit for matching the impedance at the bonding pad with an inductance component and a capacitance component is provided at a predetermined position of the microstrip line.
【請求項3】 上記ボンディングパッドからの距離が上
記誘電体基板における通過周波数の実効波長の1/2以
下の箇所に、長さが上記誘電体基板における通過周波数
の実効波長の1/2以下の整合回路を具備したことを特
徴とする請求項1又は2記載の高周波回路。
3. A location where the distance from the bonding pad is 1/2 or less of the effective wavelength of the pass frequency on the dielectric substrate, and the length is 1/2 or less of the effective wavelength of the pass frequency on the dielectric substrate. 3. The high-frequency circuit according to claim 1, further comprising a matching circuit.
【請求項4】 誘電体基板を積層してキャビティを構成
し、そのキャビティに高周波半導体回路を収納するパッ
ケージにおいて、複数のマイクロストリップ線路の接続
部に請求項1〜3いずれかに記載の高周波回路を適用し
たことを特徴とするパッケージ。
4. A high-frequency circuit according to claim 1, wherein a cavity is formed by laminating dielectric substrates, and a high-frequency semiconductor circuit is housed in the cavity in a connection portion of a plurality of microstrip lines. A package characterized by applying.
JP2000192784A 2000-06-27 2000-06-27 High frequency circuit and package Pending JP2002009510A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000192784A JP2002009510A (en) 2000-06-27 2000-06-27 High frequency circuit and package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000192784A JP2002009510A (en) 2000-06-27 2000-06-27 High frequency circuit and package

Publications (1)

Publication Number Publication Date
JP2002009510A true JP2002009510A (en) 2002-01-11

Family

ID=18691867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000192784A Pending JP2002009510A (en) 2000-06-27 2000-06-27 High frequency circuit and package

Country Status (1)

Country Link
JP (1) JP2002009510A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004075336A1 (en) * 2003-02-21 2004-09-02 Matsushita Electric Industrial Co., Ltd. High frequency circuit
JP2011172072A (en) * 2010-02-19 2011-09-01 Fujitsu Ltd Transmission line, impedance transformer, integrated circuit mounting device, and communication device module
WO2015062067A1 (en) * 2013-11-01 2015-05-07 Telefonaktiebolaget L M Ericsson (Publ) Method and arrangement for board-to-board interconnection

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004075336A1 (en) * 2003-02-21 2004-09-02 Matsushita Electric Industrial Co., Ltd. High frequency circuit
JP2011172072A (en) * 2010-02-19 2011-09-01 Fujitsu Ltd Transmission line, impedance transformer, integrated circuit mounting device, and communication device module
US8816793B2 (en) 2010-02-19 2014-08-26 Fujitsu Limited Transmission line, impedance transformer, integrated circuit mounted device, and communication device module
WO2015062067A1 (en) * 2013-11-01 2015-05-07 Telefonaktiebolaget L M Ericsson (Publ) Method and arrangement for board-to-board interconnection
US9839118B2 (en) 2013-11-01 2017-12-05 Telefonaktiebolaget Lm Ericsson (Publ) Method and arrangement for board-to-board interconnection

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