JP2002006495A5 - - Google Patents
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- Publication number
- JP2002006495A5 JP2002006495A5 JP2000189523A JP2000189523A JP2002006495A5 JP 2002006495 A5 JP2002006495 A5 JP 2002006495A5 JP 2000189523 A JP2000189523 A JP 2000189523A JP 2000189523 A JP2000189523 A JP 2000189523A JP 2002006495 A5 JP2002006495 A5 JP 2002006495A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- positive photoresist
- acid
- photoresist composition
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000189523A JP3841392B2 (ja) | 2000-06-23 | 2000-06-23 | ポジ型フォトレジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000189523A JP3841392B2 (ja) | 2000-06-23 | 2000-06-23 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002006495A JP2002006495A (ja) | 2002-01-09 |
| JP2002006495A5 true JP2002006495A5 (no) | 2006-01-12 |
| JP3841392B2 JP3841392B2 (ja) | 2006-11-01 |
Family
ID=18689144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000189523A Expired - Fee Related JP3841392B2 (ja) | 2000-06-23 | 2000-06-23 | ポジ型フォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3841392B2 (no) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7214465B2 (en) | 2002-01-10 | 2007-05-08 | Fujifilm Corporation | Positive photosensitive composition |
| KR100655801B1 (ko) | 2005-01-18 | 2006-12-08 | 삼성전자주식회사 | 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴형성 방법 |
| JP5183903B2 (ja) * | 2006-10-13 | 2013-04-17 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びこれを用いたパターン形成方法 |
| JP5438940B2 (ja) * | 2008-09-12 | 2014-03-12 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| WO2011104127A1 (en) | 2010-02-24 | 2011-09-01 | Basf Se | Latent acids and their use |
| TWI527792B (zh) * | 2012-06-26 | 2016-04-01 | 羅門哈斯電子材料有限公司 | 光酸產生劑、含該光酸產生劑之光阻劑及含該光阻劑之經塗覆物件 |
| JP6595255B2 (ja) * | 2014-08-25 | 2019-10-23 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| CN107207456B (zh) | 2015-02-02 | 2021-05-04 | 巴斯夫欧洲公司 | 潜酸及其用途 |
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2000
- 2000-06-23 JP JP2000189523A patent/JP3841392B2/ja not_active Expired - Fee Related