JP2001506319A - 炭素膜を形成する方法 - Google Patents

炭素膜を形成する方法

Info

Publication number
JP2001506319A
JP2001506319A JP54048298A JP54048298A JP2001506319A JP 2001506319 A JP2001506319 A JP 2001506319A JP 54048298 A JP54048298 A JP 54048298A JP 54048298 A JP54048298 A JP 54048298A JP 2001506319 A JP2001506319 A JP 2001506319A
Authority
JP
Japan
Prior art keywords
arc
pulsing
forming
signal
pulsed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP54048298A
Other languages
English (en)
Japanese (ja)
Inventor
ジョンソン、スコット・ブイ
Original Assignee
モトローラ・インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by モトローラ・インコーポレイテッド filed Critical モトローラ・インコーポレイテッド
Publication of JP2001506319A publication Critical patent/JP2001506319A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H01J37/32064—Circuits specially adapted for controlling the arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP54048298A 1997-03-20 1998-01-26 炭素膜を形成する方法 Pending JP2001506319A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US82137497A 1997-03-20 1997-03-20
US08/821,374 1997-03-20
PCT/US1998/001441 WO1998041666A1 (fr) 1997-03-20 1998-01-26 Procede de formation d'un film de carbone

Publications (1)

Publication Number Publication Date
JP2001506319A true JP2001506319A (ja) 2001-05-15

Family

ID=25233216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54048298A Pending JP2001506319A (ja) 1997-03-20 1998-01-26 炭素膜を形成する方法

Country Status (5)

Country Link
EP (1) EP0918886A1 (fr)
JP (1) JP2001506319A (fr)
KR (1) KR20000015801A (fr)
CN (1) CN1220707A (fr)
WO (1) WO1998041666A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011207736A (ja) * 2010-03-12 2011-10-20 Sekisui Chem Co Ltd グラフェンの形成方法
US8294230B2 (en) 2007-04-05 2012-10-23 Fujitsu Semiconductor Limited Surface profile sensor and method for manufacturing the same

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7175752B2 (en) * 2002-05-24 2007-02-13 Federal-Mogul Worldwide, Inc. Method and apparatus for electrochemical machining
WO2005083144A1 (fr) * 2004-02-27 2005-09-09 Japan Science And Technology Agency Film carboné fin, procédé de production de ce film et élément utilisant le film fin
DE102007021386A1 (de) * 2007-05-04 2008-11-06 Christof-Herbert Diener Kurztaktniederdruckplasmaanlage
ES2717934T3 (es) * 2014-05-13 2019-06-26 Argor Aljba Sa Método para filtrar macropartículas en una deposición física de vapor por arco catódico (PVD), en vacío
CN105603372B (zh) * 2015-12-22 2018-03-27 长春吉大科诺科技有限责任公司 电磁驱动式石墨电弧溅射镶嵌探头
US20210156033A1 (en) * 2017-09-25 2021-05-27 Sumitomo Electric Industries, Ltd. Method for manufacturing hard carbon-based coating, and member provided with coating

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL71530A (en) * 1984-04-12 1987-09-16 Univ Ramot Method and apparatus for surface-treating workpieces
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
JPS63210099A (ja) * 1987-02-26 1988-08-31 Nissin Electric Co Ltd ダイヤモンド膜の作製方法
DE9109503U1 (de) * 1991-07-31 1991-10-17 Magtron Magneto Elektronische Geraete Gmbh, 7583 Ottersweier Schaltungsanordnung für ein Stromversorgungsgerät für Geräte und Anlagen der Plasma- und Oberflächentechnik

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8294230B2 (en) 2007-04-05 2012-10-23 Fujitsu Semiconductor Limited Surface profile sensor and method for manufacturing the same
JP2011207736A (ja) * 2010-03-12 2011-10-20 Sekisui Chem Co Ltd グラフェンの形成方法

Also Published As

Publication number Publication date
CN1220707A (zh) 1999-06-23
KR20000015801A (ko) 2000-03-15
WO1998041666A1 (fr) 1998-09-24
EP0918886A1 (fr) 1999-06-02

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