JP2001357780A - Manufacturing method and manufacturing device of plasma display panel - Google Patents

Manufacturing method and manufacturing device of plasma display panel

Info

Publication number
JP2001357780A
JP2001357780A JP2000181086A JP2000181086A JP2001357780A JP 2001357780 A JP2001357780 A JP 2001357780A JP 2000181086 A JP2000181086 A JP 2000181086A JP 2000181086 A JP2000181086 A JP 2000181086A JP 2001357780 A JP2001357780 A JP 2001357780A
Authority
JP
Japan
Prior art keywords
phosphor
liquid
nozzle
substrate
plasma display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000181086A
Other languages
Japanese (ja)
Inventor
Daido Komyoji
大道 光明寺
Masato Mitani
真人 三谷
Naoko Matsuda
直子 松田
Hiroyuki Naka
裕之 中
Nobuyuki Kirihara
信幸 桐原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2000181086A priority Critical patent/JP2001357780A/en
Publication of JP2001357780A publication Critical patent/JP2001357780A/en
Pending legal-status Critical Current

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  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent generation of unevenness in the fluorescent substance or a plasma display panel wherein a fluorescent substance solution is jetted from the nozzles and coated on a substrate panel in a manufacturing method. SOLUTION: Unevenness of a fluorescent substance on a substrate panel is prevented by arranging plural nozzles equipped with adjustable flow passage in a route in which the fluorescent solution is ejectable, by ejecting a gas in a desired direction from surroundings of an ejecting port, and by guiding the fluorescent solution ejected from the nozzle by the discharged gas.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、壁掛けテレビや情
報表示用のディスプレイとして用いられるカラープラズ
マディスプレイやストライプ状のブラックマトリックス
式のカラー受像管の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color plasma display or a striped black matrix type color picture tube used as a wall-mounted television or a display for displaying information.

【0002】[0002]

【従来の技術】AC型プラズマディスプレイの背面板に
は、リブと基板底面に囲まれた細長いストライプ状の凹
部が多数併設されていて、この各凹部に、赤、緑、青の
3色の蛍光体膜を形成することが必要である。蛍光体を
形成する方法として、一般に、スクリーン印刷が用いら
れている。この方法は、背面板凹部全体に、各色に合わ
せたスキージーマスクを通して、蛍光体微粒子が溶剤に
分散されてなる蛍光体液を流しこむ方法である。この方
法では、スキージーの機械的変形により混色がおこるた
め、熟練者をようすること。また、各リブ部に作製され
る蛍光体膜の形状が平面的であることや、凸部の上に蛍
光体が付着すること。さらに、凹部の間隔が細かい高精
細パネルの作製や大型パネルの作製に関して困難である
こと等が課題である。
2. Description of the Related Art On a back plate of an AC type plasma display, a number of elongated strip-shaped recesses surrounded by ribs and a bottom surface of a substrate are provided side by side, and each recess has a fluorescent light of three colors of red, green and blue. It is necessary to form a body membrane. Generally, screen printing is used as a method of forming the phosphor. In this method, a phosphor liquid in which phosphor fine particles are dispersed in a solvent is poured through a squeegee mask adapted to each color into the entire concave portion of the back plate. In this method, the color mixture occurs due to the mechanical deformation of the squeegee, so a skilled worker is required. Also, the shape of the phosphor film formed on each rib portion is planar, and the phosphor adheres on the convex portion. Another problem is that it is difficult to manufacture a high-definition panel or a large-sized panel in which the interval between the concave portions is small.

【0003】別の蛍光体形成方法として、特開平11−
204032号公報に記載の発明が知られている。この
方法では,基板パネル上にノズルが位置し、ノズルから
蛍光体液を吐出させながら、基板パネルの凹部にそっ
て、相対的に、約0.5m/秒から3m/秒の速さで移
動し、その後、垂直方向に、吐出口数に応じて、移動
し、再度、基板パネルの凹部にそって、移動することを
繰り返して、パネル全体の凹部の内部に蛍光体液を満た
す。その後、乾燥、焼成工程により、蛍光体形成が完成
する。塗布ヘッドの吐出口の大きさは、凹部の内部に直
接、蛍光体液を導入するため、これより小さい直径の円
状の口径が必要である。蛍光体液が凹部の100%を満
たすように、吐出量と速度が決定される。この方法を用
いれば、混色なく、熟練者の必要なく、自由形状の蛍光
体膜が作製でき、大型パネル、高精細パネルにも利用で
きる。
As another method of forming a phosphor, Japanese Patent Laid-Open No.
The invention described in Japanese Patent Publication No. 204032 is known. In this method, a nozzle is positioned on a substrate panel, and moves relatively at a speed of about 0.5 m / sec to 3 m / sec along a concave portion of the substrate panel while discharging a phosphor liquid from the nozzle. Thereafter, the liquid crystal is moved in the vertical direction according to the number of discharge ports, and is again moved along the concave portion of the substrate panel, so that the inside of the concave portion of the entire panel is filled with the phosphor liquid. After that, the formation of the phosphor is completed by the drying and baking steps. The size of the discharge port of the coating head requires a circular diameter smaller than this, since the phosphor liquid is introduced directly into the recess. The discharge amount and the speed are determined so that the phosphor liquid fills 100% of the concave portion. By using this method, a free-form phosphor film can be manufactured without color mixing and without the need for a skilled person, and can be used for large-sized panels and high-definition panels.

【0004】[0004]

【発明が解決しようとする課題】しかしながら従来方法
では、複数のノズルを持つ塗布ヘッドの各ノズルの吐出
量が違うため塗布後の凹部内の蛍光体量が異なり、その
結果、完成したプラズマディスプレイ点灯時に各凹部の
輝度に差がでる縦筋状ムラが発生する。これは、塗布ヘ
ッド1に設置したノズルの本数に応じて、この明暗が規
則正しく繰り返しされるためである。また、ノズルから
の蛍光体吐出のまがりにより、凸部へ蛍光体液が乗り上
げたり、凹部内にて、蛍光体がかたよることで、左右の
対象性がわるくなることで、ななめから見た場合の斜め
ムラとなる。
However, in the conventional method, the amount of phosphor in the recess after application is different due to the different discharge amount of each nozzle of the coating head having a plurality of nozzles. As a result, the completed plasma display is turned on. Occasionally, vertical streak-like unevenness occurs in which the luminance of each concave portion is different. This is because the brightness is regularly repeated according to the number of nozzles installed in the coating head 1. In addition, the phosphor discharge from the nozzle causes the phosphor liquid to climb onto the convex part, and the phosphor in the concave part causes the symmetry of the right and left sides to deteriorate, so that the oblique view from the slant It becomes uneven.

【0005】従来のヘッドを図3に示す。塗布ヘッド1
のノズル2は、塗布ヘッド1の下面の金属に放電加工機
にて、ノズル2の穴をあけて作製するか、金属パイプを
塗布ヘッドにあらかじめあけた穴に圧入して作製されて
いる。液が吐出される穴は円形で、直径A=0.016
mmで、直径誤差±0.0005mm内で精度よく同じ
穴径のノズル2を作製してある。しかし、塗布ヘッド1
のノズル2間の吐出量を測定すると、5%の吐出量のば
らつきが存在している。これは、吐出量が、吐出口径の
4乗に比例するため、吐出穴の直径誤差±0.0005
mmでも、5%の吐出量の差が生じてしまう。そのため
吐出穴の直径誤差を±0.0005mm以下にすれば良
いが、現在の最先端のマイクロ放電加工技術をもちいて
も不可能である。穴の大きさが大きい場合は、穴の直径
Aに対する直径誤差割合も小さくなり、吐出量バラツキ
をおさえることができるが、蛍光体液を導入する凹部の
大きさより小さい直径の吐出穴が必要であるため、吐出
量バラツキをおさえることが出来ない。このため、この
塗布ヘッドで、パネルを作製すると、ノズル本数に応じ
て、明暗の縦筋状ムラ(吐出量の差のムラ)が、プラズ
マディスプレイパネル点灯時に発生する。
FIG. 3 shows a conventional head. Coating head 1
The nozzle 2 is manufactured by making a hole of the nozzle 2 in a metal on the lower surface of the coating head 1 by an electric discharge machine or by pressing a metal pipe into a hole previously formed in the coating head. The hole from which the liquid is discharged is circular and has a diameter A = 0.016.
The nozzle 2 having the same hole diameter is manufactured with high accuracy within a diameter error of ± 0.0005 mm in mm. However, the coating head 1
When the discharge amount between the nozzles 2 is measured, there is a variation of 5% in the discharge amount. This is because the discharge amount is proportional to the fourth power of the discharge port diameter, so that the diameter error of the discharge hole ± 0.0005.
mm, a 5% difference in the discharge amount occurs. For this reason, the diameter error of the discharge hole may be set to ± 0.0005 mm or less, but it is impossible even with the latest state-of-the-art micro electric discharge machining technology. When the size of the hole is large, the ratio of the diameter error to the diameter A of the hole is also small, and the variation in the discharge amount can be suppressed. However, since the discharge hole having a diameter smaller than the size of the concave portion for introducing the phosphor liquid is required. In addition, variations in the discharge amount cannot be suppressed. For this reason, when a panel is manufactured with this coating head, bright and dark vertical streak-like unevenness (unevenness of the difference in discharge amount) occurs when the plasma display panel is turned on, according to the number of nozzles.

【0006】[0006]

【課題を解決するための手段】この課題を解決するため
に本発明は、蛍光体液を吐出可能な吐出道内に、調節可
能な流路抵抗体を配置したノズルを複数備えることによ
り、複数のノズルから均一な量の蛍光体液をプラズマデ
ィスプレイパネル基板の凹部に塗布することを特徴とし
ている。
SUMMARY OF THE INVENTION In order to solve this problem, the present invention provides a plurality of nozzles in which a plurality of nozzles each having an adjustable flow path resistor are disposed in a discharge path capable of discharging a phosphor liquid. And applying a uniform amount of the phosphor liquid to the concave portion of the plasma display panel substrate.

【0007】[0007]

【発明の実施の形態】図1〜図2に本発明の実施の形態
を示す。
1 and 2 show an embodiment of the present invention.

【0008】(実施の形態1)図1は、蛍光体塗布ヘッ
ドの断面を示すものである。図1において1は塗布ヘッ
ド、10は調整ネジ、11は吐出道である。以上のよう
に構成した塗布ヘッド1の吐出道6に調整ねじ7を出し
入れすることで、吐出量を調整する。一定の割合で、塗
布ヘッド1から蛍光体液を吐出させながら、各ノズル2
からの吐出量を測定し、各ねじを調整し、吐出量をあわ
せる。
(Embodiment 1) FIG. 1 shows a cross section of a phosphor coating head. In FIG. 1, 1 is a coating head, 10 is an adjusting screw, and 11 is a discharge path. The ejection amount is adjusted by inserting and removing the adjusting screw 7 into and from the ejection path 6 of the coating head 1 configured as described above. While discharging the phosphor liquid from the coating head 1 at a fixed rate, each nozzle 2
Measure the amount of discharge from, adjust each screw, and adjust the discharge amount.

【0009】なお、流路抵抗体は調整ネジ10に限定さ
れるものではなく、吐出道11の流路抵抗を変化させる
ものであればよい。さらに吐出道の形状、内面粗さ、材
質等を変化させて流路抵抗を変化させても良い。また吐
出量の調整を各ノズルに供給する蛍光体液の圧力、温
度、や吐出時間、等を制御して行っても良い。
The flow path resistor is not limited to the adjusting screw 10, but may be any as long as it changes the flow path resistance of the discharge path 11. Furthermore, the flow path resistance may be changed by changing the shape, inner surface roughness, material, and the like of the discharge path. Further, the discharge amount may be adjusted by controlling the pressure, temperature, discharge time, and the like of the phosphor liquid supplied to each nozzle.

【0010】(実施の形態2)図2は蛍光体塗布ヘッド
の断面を示すものである。図2において塗布ヘッド1の
周りに気体案内部22を設けた以外は実施の形態1と同
じである。実施の形態1のノズル2の吐出口の外側から
気体を放出し、蛍光体液の吐出が曲がるのを矯正する。
気体は気体供給管21から、塗布ヘッド1の外側を流
れ、各ノズル2吐出口の近傍に位置する気体放出口20
から放出される。この放出された気体の流れに沿って吐
出後の蛍光体液は基板凹部の中心に吐出される。気体
は、工業用エアー、窒素等でよいが、ゴミ等をのぞくた
め、フィルターをとおすことが必要である。気体の流量
は、吐出液の速度と同一か、少し早い方がよい。実際に
は、吐出液速度が1m/秒〜2m/秒に対し、1m/秒
〜2.5m/秒に設定する。
(Embodiment 2) FIG. 2 shows a cross section of a phosphor coating head. 2 is the same as Embodiment 1 except that a gas guide 22 is provided around the coating head 1 in FIG. The gas is released from the outside of the discharge port of the nozzle 2 of the first embodiment to correct the bending of the discharge of the phosphor liquid.
The gas flows from the gas supply pipe 21 to the outside of the coating head 1, and the gas discharge port 20 located near each nozzle 2 discharge port.
Released from The discharged phosphor liquid is discharged to the center of the concave portion of the substrate along the flow of the discharged gas. The gas may be industrial air, nitrogen or the like, but it is necessary to pass through a filter to remove dust and the like. The flow rate of the gas is preferably equal to or slightly higher than the velocity of the liquid to be discharged. Actually, the discharge liquid speed is set to 1 m / sec to 2.5 m / sec while 1 m / sec to 2 m / sec.

【0011】本発明のノズルにてパネル作製をした条件
を以下にしめす。
The conditions for producing a panel using the nozzle of the present invention are as follows.

【0012】今回用いた蛍光体液は、重量比で樹脂:蛍
光体:溶剤=1:7:2のものを用いた。蛍光体として
は、赤色(Y,Gd)BO3:Eu、緑色BaAl12
19、青色3(Ba,Mg)O・8Al23の3種類を別
々に用いたが、蛍光体の粒子径が約3μm以下のものな
らこれ以外のものでもよい。溶剤はBCA、樹脂はアク
リル樹脂、リブの内幅は、200μm〜300μmのも
のを用いた。溶剤は、高沸点で、樹脂を溶かすものなら
よい。例えば、ジエチレングリコール エチルエーテ
ル,ジプロピレグレコールン モノメチル エーテル,
カルビトールアセテートエチレングレコールアセテート
等がある。樹脂は、アルキル化セルロース等の各種ポリ
マーを用いることができる。ノズルは金属で、穴直径
0.160mm、5穴のものを用いた。凹凸の間隔は3
色分で1.08mmで、ノズル移動ピッチは1.08m
m×5=5.40mmとした。パネルは、厚み約2.8
mmで低融点ガラスからなり、紫外線に対して不透明で
ある。このガラスの片側表面に凸部がライン状に形成さ
れている。凹凸の数は、852本×3(3色)=255
6本で、大きさは、約1000mm×約700mmであ
る。凸部の高さは、約0.120mmである。コントラ
ストのため、凹凸部は黒色にされている。3色(赤、
青、緑)の蛍光体液を塗布後、パネルを100℃で30
分乾燥し、500℃で10分焼成を行ない蛍光体形成が
完成する。
The phosphor liquid used in this case had a weight ratio of resin: phosphor: solvent = 1: 7: 2. As the phosphor, red (Y, Gd) BO 3 : Eu, green BaAl 12 O
19 , three types of blue 3 (Ba, Mg) O.8Al 2 O 3 were used separately, but other types may be used as long as the phosphor has a particle size of about 3 μm or less. The solvent used was BCA, the resin was an acrylic resin, and the inner width of the rib was 200 μm to 300 μm. The solvent may have a high boiling point and can dissolve the resin. For example, diethylene glycol ethyl ether, dipropylene glycol monomethyl ether,
Carbitol acetate ethylene glycol acetate and the like. Various polymers such as alkylated cellulose can be used as the resin. The nozzle used was a metal having a hole diameter of 0.160 mm and 5 holes. The interval between the irregularities is 3
1.08mm in color, nozzle movement pitch 1.08m
m × 5 = 5.40 mm. The panel is about 2.8 thick
mm, made of low melting point glass and opaque to ultraviolet light. A convex portion is formed in a line on one surface of the glass. The number of irregularities is 852 × 3 (3 colors) = 255
The size is about 1000 mm × about 700 mm with six pieces. The height of the projection is about 0.120 mm. For contrast, the concave and convex portions are black. 3 colors (red,
Blue, green), and apply the phosphor solution at 100 ° C for 30 minutes.
After drying for 10 minutes, firing at 500 ° C. for 10 minutes completes the formation of the phosphor.

【0013】[0013]

【発明の効果】以上のように本発明によれば、基板の表
面に有する複数の凹凸の凹内面に、蛍光体微粒子が液媒
体に分散された蛍光体液を、複数のノズルから吐出し、
熱処理で蛍光体膜を形成する方法において、蛍光体液吐
出量が同じノズルを複数有する塗布ヘッドを用いること
で、従来のノズルで発生していた縦筋状ムラをなくすこ
とが可能となる。
As described above, according to the present invention, the phosphor liquid in which the phosphor fine particles are dispersed in the liquid medium is discharged from the plurality of nozzles onto the concave inner surface of the plurality of irregularities on the surface of the substrate,
In the method of forming a phosphor film by heat treatment, by using a coating head having a plurality of nozzles having the same phosphor liquid discharge amount, it becomes possible to eliminate the vertical streak unevenness that has occurred in the conventional nozzle.

【0014】また、長時間の使用や、断続的な使用にお
いて、ノズルからの蛍光体の吐出が曲がることがあっ
た。これは図4に示すように、ノズル2内部の吐出道の
平面部分に液中の凝集物等の大きな粒子3がとどまるこ
とや、静電気により各ノズル2から吐出された蛍光体液
4が互いに引合ったり反発するためである。これにより
図5に示すように、凹部内の蛍光体がかたより左右の対
象性がわるくなり、プラズマディスプレイパネル点灯時
に、矢印方向のななめから見た場合の斜めムラとなる。
この様な場合に、ノズルの吐出口付近から空気を放出す
ることにより吐出された蛍光体液の曲がりが矯正され基
板凹部の中心に蛍光体液が塗布される。このことによ
り、凹部内の蛍光体のかたよりがなくなり、プラズマデ
ィスプレイパネル点灯時に、矢印方向のななめから見た
場合の斜めムラが解消される。
In addition, in long-time use or intermittent use, discharge of the phosphor from the nozzle may bend. This is because, as shown in FIG. 4, large particles 3 such as agglomerates in the liquid stay in the plane portion of the discharge path inside the nozzle 2, or the phosphor liquid 4 discharged from each nozzle 2 attracts each other due to static electricity. Or to repel. As a result, as shown in FIG. 5, the phosphor in the concave portion becomes less symmetrical to the right and left, and when the plasma display panel is turned on, there is oblique unevenness when viewed from the slant in the direction of the arrow.
In such a case, the discharge of the phosphor liquid from the vicinity of the discharge port of the nozzle corrects the curvature of the discharged phosphor liquid, and the phosphor liquid is applied to the center of the substrate concave portion. As a result, there is no deflection of the phosphor in the concave portion, and when the plasma display panel is turned on, oblique unevenness when viewed from a slant in the direction of the arrow is eliminated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態1の蛍光体塗布ヘッドを示
す断面図
FIG. 1 is a sectional view showing a phosphor coating head according to a first embodiment of the present invention.

【図2】本発明の実施の形態2の蛍光体塗布ヘッドを示
す断面図
FIG. 2 is a sectional view showing a phosphor coating head according to a second embodiment of the present invention;

【図3】従来の蛍光体塗布ヘッドを示す断面図FIG. 3 is a sectional view showing a conventional phosphor coating head.

【図4】従来の蛍光体塗布ヘッドにおける粒子の沈殿を
示す断面図
FIG. 4 is a sectional view showing precipitation of particles in a conventional phosphor coating head.

【図5】斜めムラの有る基板の断面概念図FIG. 5 is a conceptual cross-sectional view of a substrate having oblique unevenness.

【符号の説明】[Explanation of symbols]

1 塗布ヘッド 2 ノズル 4 蛍光体液 10 調整ネジ(流路抵抗体) 11 吐出道 21 気体放出口 DESCRIPTION OF SYMBOLS 1 Coating head 2 Nozzle 4 Phosphor liquid 10 Adjustment screw (flow path resistor) 11 Discharge path 21 Gas discharge port

フロントページの続き (72)発明者 松田 直子 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 中 裕之 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 桐原 信幸 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 5C028 FF16 5C040 FA01 FA02 GG09 JA13 MA02 MA23 MA24 Continued on the front page (72) Inventor Naoko Matsuda 1006 Kadoma Kadoma, Osaka Pref.Matsushita Electric Industrial Co., Ltd. Nobuyuki Kirihara 1006 Kazuma Kadoma, Kadoma-shi, Osaka Matsushita Electric Industrial Co., Ltd. F-term (reference) 5C028 FF16 5C040 FA01 FA02 GG09 JA13 MA02 MA23 MA24

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 蛍光体微粒子が液媒体に分散された蛍光
体液を、基板の表面に有する複数の併設された直線状略
凹部に、鉛直上方より、前記基板と塗布ヘッドとを相対
的に移動させて、前記略凹部に蛍光体液を吐出させ、蛍
光体膜を形成する方法であって、 前記塗布ヘッドは複数のノズルを有し、前記ノズルから
吐出される蛍光体液の吐出量が、任意に個別調整可能で
あることを特徴とするプラズマディスプレイパネル製造
方法。
1. A substrate liquid and a coating head are relatively moved from above vertically into a plurality of juxtaposed linear recesses provided on a surface of a substrate, the phosphor liquid having phosphor fine particles dispersed in a liquid medium. And applying a phosphor liquid to the substantially concave portion to form a phosphor film, wherein the coating head has a plurality of nozzles, and a discharge amount of the phosphor liquid discharged from the nozzles is arbitrarily determined. A method for manufacturing a plasma display panel, which is individually adjustable.
【請求項2】 前記ノズルの蛍光体吐出道の流路抵抗を
変化させることで、前記蛍光体吐出量の調整を行うこと
を特徴とする請求項1記載のプラズマディスプレイパネ
ル製造方法。
2. The plasma display panel manufacturing method according to claim 1, wherein the phosphor discharge amount is adjusted by changing a flow path resistance of a phosphor discharge passage of the nozzle.
【請求項3】 蛍光体微粒子が液媒体に分散された蛍光
体液を、基板の表面に有する複数の併設された直線状略
凹部に、鉛直上方より、前記基板と塗布ヘッドとを相対
的に移動させて、前記略凹部に蛍光体液を吐出させ、蛍
光体膜を形成する方法であって、 前記ノズルの吐出口の周辺から、所望の方向に気体を放
出させ、前記ノズルから吐出される蛍光体液を前記気体
にて案内をすることを特徴とするプラズマディスプレイ
パネル製造方法。
3. A substrate liquid and a coating head are relatively moved from above vertically into a plurality of substantially straight concave portions provided on a surface of a substrate, the phosphor liquid having phosphor fine particles dispersed in a liquid medium. Causing the phosphor liquid to be discharged into the substantially concave portion to form a phosphor film, wherein a gas is discharged in a desired direction from around a discharge port of the nozzle, and the phosphor liquid is discharged from the nozzle. By using said gas.
【請求項4】 表面に有する複数の併設された直線状略
凹部を持つ基板と、蛍光体液を吐出可能なノズルを備え
た塗布ヘッドと、前記基板を置載する置載台と、前記置
載台を駆動する置載台駆動部と、前記塗布ヘッドを駆動
するヘッド駆動部からなるプラズマディスプレイパネル
製造装置において、 前記ノズルに形成された吐出道内に、調節可能な流路抵
抗体を配置することを特徴とするプラズマディスプレイ
パネル製造装置。
4. A substrate having a plurality of parallel substantially concave portions provided on a surface thereof, an application head having a nozzle capable of discharging a phosphor liquid, a mounting table for mounting the substrate, and the mounting table. In a plasma display panel manufacturing apparatus including a mounting table driving unit for driving a table and a head driving unit for driving the coating head, an adjustable flow path resistor is arranged in a discharge path formed in the nozzle. A plasma display panel manufacturing apparatus characterized by the following.
【請求項5】 表面に有する複数の併設された直線状略
凹部を持つ基板と、蛍光体液を吐出可能なノズルを備え
た塗布ヘッドと、前記基板を置載する置載台と、前記置
載台を駆動する置載台駆動部と、前記塗布ヘッドを駆動
するヘッド駆動部からなるプラズマディスプレイパネル
製造装置において、 前記ノズルの吐出口の周辺に気体を放出可能な気体放出
口を設けたことを特徴とするプラズマディスプレイパネ
ル製造装置。
5. A substrate having a plurality of side-by-side substantially concave portions provided on a surface thereof, an application head having a nozzle capable of discharging a phosphor liquid, a mounting table for mounting the substrate, and the mounting table. In a plasma display panel manufacturing apparatus including a mounting table driving unit for driving a table and a head driving unit for driving the coating head, a gas discharge port capable of discharging gas is provided around a discharge port of the nozzle. Characteristic plasma display panel manufacturing equipment.
JP2000181086A 2000-06-16 2000-06-16 Manufacturing method and manufacturing device of plasma display panel Pending JP2001357780A (en)

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Application Number Priority Date Filing Date Title
JP2000181086A JP2001357780A (en) 2000-06-16 2000-06-16 Manufacturing method and manufacturing device of plasma display panel

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Publication Number Publication Date
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Country Link
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Cited By (11)

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US20100037820A1 (en) * 2008-08-13 2010-02-18 Synos Technology, Inc. Vapor Deposition Reactor
US8691669B2 (en) 2008-08-13 2014-04-08 Veeco Ald Inc. Vapor deposition reactor for forming thin film
US8758512B2 (en) 2009-06-08 2014-06-24 Veeco Ald Inc. Vapor deposition reactor and method for forming thin film
US8771791B2 (en) 2010-10-18 2014-07-08 Veeco Ald Inc. Deposition of layer using depositing apparatus with reciprocating susceptor
US8770142B2 (en) 2008-09-17 2014-07-08 Veeco Ald Inc. Electrode for generating plasma and plasma generator
US8840958B2 (en) 2011-02-14 2014-09-23 Veeco Ald Inc. Combined injection module for sequentially injecting source precursor and reactant precursor
US8851012B2 (en) 2008-09-17 2014-10-07 Veeco Ald Inc. Vapor deposition reactor using plasma and method for forming thin film using the same
US8871628B2 (en) 2009-01-21 2014-10-28 Veeco Ald Inc. Electrode structure, device comprising the same and method for forming electrode structure
US8877300B2 (en) 2011-02-16 2014-11-04 Veeco Ald Inc. Atomic layer deposition using radicals of gas mixture
US8895108B2 (en) 2009-02-23 2014-11-25 Veeco Ald Inc. Method for forming thin film using radicals generated by plasma
US9163310B2 (en) 2011-02-18 2015-10-20 Veeco Ald Inc. Enhanced deposition of layer on substrate using radicals

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100037820A1 (en) * 2008-08-13 2010-02-18 Synos Technology, Inc. Vapor Deposition Reactor
US8691669B2 (en) 2008-08-13 2014-04-08 Veeco Ald Inc. Vapor deposition reactor for forming thin film
US8770142B2 (en) 2008-09-17 2014-07-08 Veeco Ald Inc. Electrode for generating plasma and plasma generator
US8851012B2 (en) 2008-09-17 2014-10-07 Veeco Ald Inc. Vapor deposition reactor using plasma and method for forming thin film using the same
US8871628B2 (en) 2009-01-21 2014-10-28 Veeco Ald Inc. Electrode structure, device comprising the same and method for forming electrode structure
US8895108B2 (en) 2009-02-23 2014-11-25 Veeco Ald Inc. Method for forming thin film using radicals generated by plasma
US8758512B2 (en) 2009-06-08 2014-06-24 Veeco Ald Inc. Vapor deposition reactor and method for forming thin film
US8771791B2 (en) 2010-10-18 2014-07-08 Veeco Ald Inc. Deposition of layer using depositing apparatus with reciprocating susceptor
US8840958B2 (en) 2011-02-14 2014-09-23 Veeco Ald Inc. Combined injection module for sequentially injecting source precursor and reactant precursor
US8877300B2 (en) 2011-02-16 2014-11-04 Veeco Ald Inc. Atomic layer deposition using radicals of gas mixture
US9163310B2 (en) 2011-02-18 2015-10-20 Veeco Ald Inc. Enhanced deposition of layer on substrate using radicals

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