JP2001345370A - Semiconductor manufacturing and inspecting apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing and inspecting apparatus easy for assembling the apparatus by preventing dissipation of a heat from a ceramic board, preventing warp even when the board is heated to a high temperature, and easily drawing out a conductive wire or the like connected to a metal wire or a resistance heater from a temperature measuring element arranged on the board out of a support container when a cavity is formed in a columnar member. SOLUTION: The semiconductor manufacturing and inspecting apparatus comprises the ceramic board having a conductor layer provided on a surface or therein and fixed to an upper part of the support container having a plate- like member. The columnar member is installed on the plate-like member, and a porous substance is interposed between the columnar member and the board and/or between the board and the container.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing / inspection apparatus provided with a ceramic substrate having a conductor layer on the surface or inside thereof and used for a hot plate (ceramic heater), an electrostatic chuck, a wafer prober, and the like.

[0002]

2. Description of the Related Art Conventionally, in a semiconductor manufacturing / inspection apparatus including an etching apparatus and a chemical vapor deposition apparatus, a heater or a wafer prober using a metal base material such as stainless steel or aluminum alloy is used. I have been.

[0003] However, such a metal heater has the following problems.
There were the following problems. First, because it is made of metal,
The thickness of the heater plate must be as thick as about 15 mm. This is because, in a thin metal plate, warpage, distortion, and the like are generated due to thermal expansion caused by heating, and the silicon wafer placed on the metal plate is damaged or tilted. However, when the thickness of the heater plate is increased, there is a problem that the weight of the heater increases and the heater becomes bulky.

Further, the temperature of a surface (hereinafter, referred to as a heating surface) for heating an object to be heated such as a semiconductor wafer is controlled by changing a voltage or an amount of current applied to the resistance heating element. Because of the thickness, the temperature of the heater plate does not quickly follow changes in the voltage or the amount of current, and there is a problem that it is difficult to control the temperature.

In Japanese Patent Application Laid-Open No. Hei 4-324276, aluminum nitride, which is a non-oxide ceramic having high thermal conductivity and high strength, is used as a substrate. A hot plate has been proposed in which through holes are formed and dichrome wires are brazed as external terminals to these through holes.

In such a hot plate, a ceramic substrate having a high mechanical strength even at a high temperature is used. Therefore, the thickness of the ceramic substrate can be reduced so that the heat capacity can be reduced. The temperature of the ceramic substrate can quickly follow the change in the amount.

Normally, in this type of hot plate, a temperature measuring element is attached to the surface or inside of a ceramic substrate, and this ceramic substrate is attached to a metal supporting container via a resin heat insulating ring or the like, and then a thermocouple is attached. Metal wires and conductive wires from the resistance heating element are respectively drawn out of the support container through a plurality of through holes provided in the bottom plate and connected to a control device or the like, and are measured by the temperature measuring element. A voltage is applied to the resistance heating element based on the temperature to control the temperature of the ceramic substrate.

[0008]

However, recently,
The ceramic substrate has a diameter as large as 300 mm or more, and has a thickness of 5 mm in order to reduce its heat capacity.
mm or less, and as a result, when the ceramic substrate is heated to a high temperature, there has been a problem that the bottom surface becomes warped due to its own weight or the like.

Further, in such a hot plate, as described above, the metal wires constituting the thermocouple, the conductive wires connected to the resistance heating element, and the like are drawn out of the support container through the through holes in the bottom plate. Therefore, it takes time to draw out the wiring, and as a result, it takes time to assemble the hot plate.

[0010]

Means for Solving the Problems Accordingly, the present inventors have:
In order to solve such a problem, a semiconductor manufacturing / inspection apparatus in which a columnar member is provided on a bottom plate of a supporting container has been proposed. In this semiconductor manufacturing / inspection apparatus, since the ceramic substrate is supported by the columnar member, warpage can be prevented, and by storing the wiring in the columnar member, the apparatus can be easily assembled.

However, when the columnar member abuts on the ceramic substrate as it is, heat is dissipated through the columnar member. Therefore, when the ceramic substrate is heated to a high temperature,
It is difficult to keep the temperature of the surface to be heated of the object to be heated such as a silicon wafer (hereinafter, referred to as a heating surface) uniform, and the heating efficiency may be reduced. Therefore, there is room for improvement in these points. .

The inventor of the present invention has conducted intensive studies to improve these points. As a result, a porous body is interposed between the ceramic substrate and the columnar member or the supporting container, so that the supporting container can be separated from the ceramic substrate. It has been found that the heat can be prevented from escaping through the above-described method, and the present invention has been completed.

That is, the present invention relates to a semiconductor manufacturing / inspection apparatus comprising a ceramic substrate provided with a conductor layer on its surface or inside fixed to an upper part of a supporting container having a plate-like body. A pillar is provided on the body, and a porous body is interposed between the pillar and the ceramic substrate and / or between the ceramic substrate and the support container. Semiconductor manufacturing and inspection equipment.

In the present invention, it is desirable that a cavity is formed in the columnar member, and that the cavity communicates with the side and bottom surfaces of the columnar member.
In addition, it is desirable that a cavity is formed in the columnar member, and the wiring from the conductor layer and / or other wiring is accommodated in the cavity. Further, the plate-like body may be a bottom plate of a support container or an intermediate bottom plate.

In the semiconductor manufacturing / inspection apparatus of the present invention, since the porous body is interposed between the ceramic substrate and the columnar member, the heat of the ceramic substrate is prevented from escaping through the columnar member. Thus, the temperature of the heating surface can be kept uniform, and the ceramic substrate can be efficiently heated.

Further, since the ceramic substrate is firmly supported by the columnar member and the porous body, the ceramic substrate can be prevented from warping even when the ceramic substrate is heated to a high temperature. Further, when a hollow portion is formed in the columnar member, the wiring from the conductor layer and the wiring from the temperature measuring element can be accommodated, and these wirings can be easily pulled out of the support container. The semiconductor manufacturing / inspection device can be easily assembled.

[0017]

BEST MODE FOR CARRYING OUT THE INVENTION A semiconductor manufacturing / inspection apparatus according to the present invention is a semiconductor manufacturing / inspection apparatus in which a ceramic substrate provided with a conductor layer on its surface or inside is fixed to an upper part of a supporting container having a plate-like body. An inspection device, wherein the plate-like body includes:
A columnar member is provided, and a porous body is interposed between the columnar member and the ceramic substrate and / or between the ceramic substrate and the support container.

Hereinafter, a semiconductor manufacturing / inspection apparatus of the present invention will be described. Regarding the columnar member, an example will be described in which a cavity communicating with the side surface and the bottom surface is formed therein and a conductor layer and other wiring are accommodated in the cavity.

When the conductor layer formed on the surface or inside of the ceramic substrate constituting the semiconductor manufacturing / inspection apparatus of the present invention is a resistance heating element, the semiconductor manufacturing / inspection apparatus of the present invention functions as a hot plate. I do.

FIG. 1 is a plan view schematically showing a hot plate which is an example of the semiconductor manufacturing / inspection apparatus of the present invention, FIG. 2 is a sectional view thereof, and FIG. 3 is a hot plate shown in FIG. FIG. 4 is a partially enlarged cross-sectional view schematically showing a part of a ceramic substrate constituting a plate.

In this hot plate 10, a disc-shaped ceramic substrate 11 is fitted over a cylindrical support container 62 via a heat insulating ring 61 made of a porous material. It is fixed to an annular substrate receiving portion 62b provided inside the upper portion using a fixing member 130 such as a bolt.

In the supporting container 62, a cylindrical main body 62
The substrate receiving portion 62b described above is provided inside the upper portion of the main body 62a, and an annular bottom plate receiving portion 62c is provided below the main body 62a. 64 is fixed by bolts or the like. The bottom plate 64 may be formed integrally with the support container 62.

On the bottom surface 11b of the ceramic substrate 11, a resistance heating element 1 formed of a concentric circuit as shown in FIG.
The resistance heating elements 12 are connected such that double concentric circles close to each other form a single line as a set of circuits.

Further, as shown in FIG.
In order to prevent oxidation, a metal coating layer 120 is formed to prevent oxidation. An end 12a of the resistance heating element 12 having the metal coating layer 120 is connected to a T-shaped conductive wire 66 via a solder layer 17. On the other hand, a temperature measuring element 28 such as a thermocouple having a metal wire 63 is inserted into the bottomed hole 14 formed in the bottom surface 11b of the resistance heating element 12 and sealed with a heat-resistant resin or the like. ing.

In the vicinity of the center inside the support container 62,
A columnar member 67 is arranged on the bottom plate 64, and a porous body 68 is interposed between the columnar member 67 and the ceramic substrate 11.

The material constituting the porous body 68 is not particularly limited as long as it is a heat-resistant member having pores therein and high heat insulation. Specific examples thereof include alumina, mycarex, and silica. , Porous ceramics made of silica glass or the like, porous heat-resistant resins made of polyimide, polyamide, polyamide imide, silicone resin, fluororesin and the like. It is desirable that the heat insulating ring 61 be made of the same material.

The porous body 68 is required to have heat resistance which does not deteriorate even when left at a temperature of about 200 to 800 ° C. for a long time. When porous alumina, mica, or the like is used as the porous body 68, the porosity is desirably about 0.1 to 50%.

By arranging the porous body 68 between the columnar member 67 and the ceramic substrate 11 as described above, heat can be prevented from escaping through the columnar member 67, and the heating surface can be prevented. Temperature uniformity can be maintained. Preferably, the porous body 68 is configured to be fixed by being fitted on the columnar member 67.

A hollow portion is formed in the columnar member 67, and the metal wire 63 and the resistance heating element 1 constituting the temperature measuring element 28 are formed.
The conductive wire 66 led out from the second end portion 12 is housed in the hollow portion of the columnar member 67, drawn out through a through hole 64a formed in the bottom plate 64, and respectively connected to a power supply and a control device (not shown). It is connected to the. The columnar member 67 also serves to support the ceramic substrate 11 in order to prevent the ceramic substrate 11 from warping downward at a high temperature. The columnar member does not necessarily need to have a cavity formed therein.

Further, the support container 62 may be provided with an intermediate bottom plate between the bottom plate 64 and the ceramic substrate 11, and the wiring may be drawn into the hollow portion of the columnar member 67 after one end of the wiring is laid on the intermediate bottom plate. . By performing such wiring, ordered wiring can be performed, and a short circuit or the like due to entanglement of wiring can be prevented.

A through hole 15 for inserting a lifter pin 16 is provided at a portion near the center of the ceramic substrate 11. Immediately below the through hole 15, the lifter pin 16 can be smoothly inserted. A guide tube 69 communicating with the through hole 15 is provided so as to be able to perform the operation.

The lifter pins 16 can place a silicon wafer 19 on the lifter pin 16 and move it up and down. Wafer 19
And the silicon wafer 19 is placed on the heating surface 11a of the ceramic substrate 11 and heated, or the silicon wafer 19 is moved 50 to 20 from the heating surface 11a.
It can be supported and heated in a state of being separated by 00 μm.

A state in which a through hole or a concave portion is provided in the ceramic substrate 11 and a pin having a spire or a hemispherical tip is inserted into the through hole or the concave portion, and then the support pin is slightly protruded from the ceramic substrate 11. By supporting the silicon wafer 19 with the support pins,
The heating may be performed in a state of being spaced from the heating surface 11a by 50 to 2000 μm.

The bottom plate 64 is provided with a refrigerant introduction pipe 65. The refrigerant is introduced into the refrigerant introduction pipe 65 through a pipe (not shown), so that the ceramic substrate 11
It is possible to control the temperature, cooling rate, etc.

As described above, this hot plate 10
Then, the porous body 6 is provided between the columnar member 67 and the ceramic substrate 11 and between the ceramic substrate 11 and the support container 62.
8 (heat insulating ring 61), the heat of the ceramic substrate can be prevented from escaping through the columnar member 67 and the supporting container 62, and the temperature uniformity of the heating surface can be maintained. Can be. In the hot plate 10, as shown in FIGS. 1 and 2, a porous body may be interposed between the ceramic substrate 11 and the support container 62 and between the ceramic substrate 11 and the columnar member 67. Desirable, but even if the porous body is not necessarily interposed on both,
It is possible to effectively prevent heat from escaping from the ceramic substrate.

Further, since the ceramic substrate 11 is firmly supported by the columnar member 67 and the porous body 68,
Even when the ceramic substrate 11 is heated to a high temperature, the ceramic substrate 11 can be prevented from warping due to its own weight or the like. Can be heated to a uniform temperature.

Further, the columnar member 67 is connected to the temperature measuring element 2.
The metal wire 63 and the conductive wire 66 led out from the end portion 12 of the resistance heating element 12 are accommodated in the hollow portion of the columnar member 67, and easily come out of the through hole 64 a formed in the bottom plate 64. Can be pulled out. Therefore, the semiconductor manufacturing / inspection apparatus can be easily assembled.

The material of the columnar member 67 has an insulating property, and can be deformed even when the ceramic substrate is heated.
It is desirable that the material has heat resistance that does not deteriorate.
As the material of the columnar member 67, alumina, silica,
Examples thereof include oxide ceramics such as mullite and cordierite, nitride ceramics such as aluminum nitride and silicon nitride, carbide ceramics such as silicon carbide, and heat-resistant resins such as polyimide. It is desirable that the guide tube 69 is also made of the same material.

The columnar member 67 is fixed to the bottom plate 64 provided in the support container 64 using an inorganic adhesive such as silica sol or alumina sol or a heat-resistant resin adhesive such as silicone resin or polyimide resin. Is desirable. On the other hand, the porous body 68 does not have to be bonded to the ceramic substrate 11 or the columnar member 67 with an adhesive or the like.

The conductive wire 66 from the resistance heating element 12 and the metal wire 63 forming the temperature measuring element 28 are covered with a heat-resistant insulating member in order to prevent a short circuit with other wiring. It is desirable. Examples of such an insulating member include materials used for the above-described columnar member.

In the hot plate 10 shown in FIGS. 1 and 2, the ceramic substrate 11 is fitted on the upper portion of the support container 62. In other embodiments, the ceramic substrate has a substrate receiving portion at the upper end. It may be placed on the upper surface of the support container and fixed by a fixing member such as a bolt.

The pattern of the resistance heating element 12 is shown in FIG.
In addition to the concentric circles shown in, the spiral, eccentric,
A combination of a concentric shape and a bent line shape can be used.

In the hot plate, the number of circuits composed of the resistance heating elements is not particularly limited as long as it is one or more. However, in order to uniformly heat the heating surface, it is preferable that a plurality of circuits are formed. Preferably, a combination of a plurality of concentric circuits and a bent line circuit is preferred. In the hot plate shown in FIG. 1, the resistance heating element is formed on the bottom surface, but the resistance heating element may be formed inside the ceramic substrate.

When the resistance heating element is formed inside the ceramic substrate, its formation position is not particularly limited.
It is preferable that at least one layer is formed at a position from the bottom surface of the ceramic substrate to 60% of its thickness. This is because heat is diffused while propagating to the heating surface, and the temperature on the heating surface tends to be uniform.

When forming a resistance heating element inside or on the bottom of the ceramic substrate, it is preferable to use a conductor paste made of metal or conductive ceramic. That is, when a resistance heating element is formed inside a ceramic substrate, a conductive paste layer is formed on a green sheet, and then the green sheet is laminated and fired to form a resistance heating element inside. On the other hand, when the resistance heating element is formed on the surface, usually, after firing, a ceramic substrate is manufactured, a conductive paste layer is formed on the surface, and the firing is performed to form the resistance heating element.

The above-mentioned conductor paste is not particularly limited, but preferably contains not only metal particles or conductive ceramics for ensuring conductivity, but also resin, solvent, thickener and the like.

As the metal particles, for example, noble metals (gold, silver, platinum, palladium), lead, tungsten, molybdenum, nickel and the like are preferable. These may be used alone or in combination of two or more. This is because these metals are relatively hard to oxidize and have a resistance value sufficient to generate heat.

As the conductive ceramic, for example,
Tungsten, molybdenum carbide and the like can be mentioned.
These may be used alone or in combination of two or more. The metal particles or conductive ceramic particles preferably have a particle size of 0.1 to 100 μm. If it is too fine, less than 0.1 μm, it is liable to be oxidized, while if it exceeds 100 μm, sintering becomes difficult and the resistance value becomes large.

Although the shape of the metal particles is spherical,
It may be scaly. When these metal particles are used, they may be a mixture of the above-mentioned spheres and the above-mentioned flakes. When the metal particles are scaly or a mixture of spherical and scaly, the metal oxide between the metal particles is easily retained, and the adhesion between the resistance heating element and the ceramic substrate is ensured. And the resistance value can be increased.

As the resin used for the conductor paste,
For example, an epoxy resin, a phenol resin, and the like can be given. Examples of the solvent include isopropyl alcohol. Examples of the thickener include cellulose and the like.

When a conductor paste for a resistance heating element is formed on the surface of a ceramic substrate, a metal oxide is added to the conductor paste in addition to the metal particles, and the metal particles and the metal oxide are sintered. It is preferable that Thus, by sintering the metal oxide together with the metal particles, the ceramic substrate and the metal particles can be brought into close contact.

It is not clear why the mixing of the metal oxide with the ceramic substrate improves the adhesion to the ceramic substrate, but the surface of the metal substrate or the surface of the non-oxide ceramic substrate is slightly oxidized. Thus, an oxide film is formed, and it is considered that the oxide films are sintered and integrated through the metal oxide, and the metal particles and the ceramic adhere to each other. Further, when the ceramic constituting the ceramic substrate is an oxide, the surface is naturally made of an oxide, so that a conductor layer having excellent adhesion is formed.

As the metal oxide, for example, oxidized
Lead, zinc oxide, silica, boron oxide (B _Two O_Three ), Al
Selected from the group consisting of Mina, Yttria and Titania
At least one is preferred. These oxides have resistance
Metal particles and ceramics can be used without increasing the resistance of the heating element.
This is because the adhesion to the substrate can be improved.
You.

The ratio of the above-mentioned lead oxide, zinc oxide, silica, boron oxide (B ₂ O ₃ ), alumina, yttria, and titania is as follows: 1-10, silica 1-30, boron oxide 5-50, zinc oxide 20-70, alumina 1
-10, yttria 1-50, titania 1-50, and the total is preferably adjusted so as not to exceed 100 parts by weight. By adjusting the amounts of these oxides in these ranges, the adhesion to the ceramic substrate can be particularly improved.

The amount of the metal oxide added to the metal particles is preferably 0.1% by weight or more and less than 10% by weight. The area resistivity when the resistance heating element is formed using the conductor paste having such a configuration is preferably 1 to 45 mΩ / □.

If the area resistivity exceeds 45 mΩ / □, the amount of heat generated becomes too large with respect to the applied voltage, and it is difficult to control the amount of heat generated in a ceramic substrate provided with a resistance heating element on the surface. . The amount of metal oxide added is 1
If the content is 0% by weight or more, the sheet resistivity exceeds 50 mΩ / □, the amount of generated heat becomes too large, temperature control becomes difficult, and the uniformity of the temperature distribution decreases.

When the resistance heating element is formed on the surface of the ceramic substrate, it is preferable that a metal coating layer is formed on the surface of the resistance heating element. This is to prevent the internal metal sintered body from being oxidized to change the resistance value.
The thickness of the metal coating layer to be formed is preferably 0.1 to 10 μm.

The metal used for forming the metal coating layer is not particularly limited as long as it is a non-oxidizing metal.
Specifically, for example, gold, silver, palladium, platinum, nickel and the like can be mentioned. These may be used alone or in combination of two or more. Of these, nickel is preferred. When the resistance heating element is formed inside the ceramic substrate, no coating is required because the surface of the resistance heating element is not oxidized. The ceramic substrate of the present invention is desirably used at a temperature of 100 ° C. or higher.
It is more desirable to use at a temperature of 00 ° C. or higher.

When a ceramic substrate provided with a resistance heating element is used as the conductor layer, the semiconductor manufacturing / inspection apparatus of the present invention functions as a hot plate.

The material of the ceramic substrate constituting the semiconductor manufacturing / inspection apparatus is not particularly limited, and examples thereof include a nitride ceramic, a carbide ceramic, and an oxide ceramic.

Examples of the nitride ceramic include metal nitride ceramics, for example, aluminum nitride, silicon nitride, boron nitride, titanium nitride and the like. Further, as the carbide ceramic, metal carbide ceramic,
For example, silicon carbide, zirconium carbide, titanium carbide,
Examples include tantalum carbide and tungsten carbide.

Examples of the oxide ceramic include metal oxide ceramics, for example, alumina, zirconia, cordierite, mullite and the like. These ceramics may be used alone or in combination of two or more.

Among these ceramics, nitride ceramics and carbide ceramics are more preferable than oxide ceramics. This is because the thermal conductivity is high. Further, among nitride ceramics, aluminum nitride is most preferable. This is because the thermal conductivity is the highest at 180 W / m · K.

Further, the ceramic material may contain a sintering aid. As the sintering aid, for example,
Examples thereof include alkali metal oxides, alkaline earth metal oxides, and rare earth oxides. Among these sintering aids,
_{CaO, Y 2 O 3, Na} 2 O, Li 2 O, Rb 2 O are preferred. Their content is 0.1 to 20% by weight.
Is preferred. Further, it may contain alumina.

The above ceramic substrate has a brightness of JIS Z
It is desirable that the value based on the rule of 8721 is N4 or less. This is because a material having such brightness is excellent in radiant heat and concealing property. Further, such a ceramic substrate can accurately measure the surface temperature by using a thermoviewer.

Here, the lightness N is defined as 0 for the ideal black lightness and 10 for the ideal white lightness, and the brightness of the color between these black lightness and white lightness. Each color is divided into ten so that the perception of the color is equal, and displayed by symbols N0 to N10. And the actual measurement is N0-N
The comparison is made with the color chart corresponding to No. 10. In this case, the first decimal place is 0 or 5.

The ceramic substrate having such characteristics has a carbon content of 100 to 5000 p in the ceramic substrate.
pm. There are two types of carbon, amorphous and crystalline.Amorphous carbon can suppress a decrease in volume resistivity of a ceramic substrate at a high temperature. Since the decrease in thermal conductivity at high temperatures can be suppressed, the type of carbon can be appropriately selected according to the purpose of the substrate to be manufactured.

The amorphous carbon is, for example, C, H, O
Hydrocarbons, preferably saccharides, can be obtained by calcining in air, and graphite powder can be used as the crystalline carbon.
In addition, carbon can be obtained by thermally decomposing the acrylic resin under an inert atmosphere and then heating and pressurizing. However, by changing the acid value of the acrylic resin, it is possible to obtain a crystalline (non-crystalline) material. Can be adjusted.

The shape of the ceramic substrate is preferably a disk shape, and the diameter is preferably 200 mm or more.
mm or more is optimal. Disc-shaped ceramic substrates
This is because temperature uniformity is required, but the larger the diameter of the substrate, the more likely the temperature becomes non-uniform. The thickness of the ceramic substrate is preferably 50 mm or less, more preferably 20 mm or less. Further, 1 to 5 mm is optimal. If the thickness is too thin, warpage tends to occur when heating at high temperature,
On the other hand, if the thickness is too large, the heat capacity becomes too large, and the temperature raising / lowering characteristics deteriorate.

The porosity of the ceramic substrate is preferably 0 or 5% or less. The porosity is measured by the Archimedes method. This is because a decrease in the thermal conductivity at a high temperature and the occurrence of warpage can be suppressed.

In the present invention, a thermocouple can be embedded in a ceramic substrate as required. This is because the temperature of the resistance heating element can be measured with a thermocouple, and the temperature can be controlled by changing the voltage and current based on the data.

The size of the joining part of the metal wires of the above-mentioned thermocouple is preferably equal to or larger than the wire diameter of each metal wire and 0.5 mm or less. With such a configuration, the heat capacity of the junction is reduced, and the temperature is accurately and quickly converted to a current value. For this reason, the temperature controllability is improved and the temperature distribution on the heated surface of the wafer is reduced. Examples of the thermocouple include J
As listed in IS-C-1602 (1980),
K-type, R-type, B-type, E-type, J-type, and T-type thermocouples are exemplified.

The semiconductor manufacturing / inspection apparatus of the present invention is an apparatus used for manufacturing a semiconductor or inspecting a semiconductor, and specifically includes, for example, an electrostatic chuck, a wafer prober, a susceptor, and a hot plate (ceramic). Heater).

The above-mentioned hot plate is a device in which only a resistance heating element is provided on the surface or inside of a ceramic substrate, whereby an object to be heated such as a semiconductor wafer can be heated to a predetermined temperature.

When an electrostatic electrode is provided inside a ceramic substrate constituting a semiconductor manufacturing / inspection apparatus of the present invention, it functions as an electrostatic chuck. FIG. 4A is a vertical sectional view schematically showing a ceramic substrate constituting the electrostatic chuck, and FIG. 4B is a cross-sectional view of the ceramic substrate shown in FIG.
FIG. 3 is a sectional view taken along line A.

The chuck positive and negative electrode layers 22 and 23 are embedded in a ceramic substrate 21 constituting the electrostatic chuck, and a ceramic dielectric film 25 is formed on the electrodes. A resistance heating element 24 is provided inside the ceramic substrate 21 so that the silicon wafer 19 can be heated. Note that an RF electrode may be embedded in the ceramic substrate 21 as necessary.

As shown in (b), the ceramic substrate 21 is usually formed in a circular shape in a plan view, and the semi-circular portion 22 shown in FIG.
a positive electrode electrostatic layer 22 composed of a and comb teeth 22b
And the chuck negative electrode electrostatic layer 23, which also includes a semicircular arc portion 23 a and a comb tooth portion 23 b,
3b so as to cross each other.

In the electrostatic chuck of the present invention, the ceramic substrate 21 having the above-described chuck positive / negative electrode layers 22 and 23 is provided.
Is a supporting container 62 having a bottom plate having a configuration as shown in FIG.
And the resistance heating element 24 is connected to a power source as in the case of the hot plate shown in FIGS.
Are connected to the + and-sides of the DC power supply, respectively.

When operating this electrostatic chuck,
A voltage is applied to each of the resistance heating element 24 and the electrostatic electrode. As a result, the semiconductor wafer mounted on the electrostatic chuck is heated to a predetermined temperature and is electrostatically attracted to the ceramic substrate 21. This electrostatic chuck does not necessarily need to include the resistance heating element 24.

FIGS. 5 and 6 are horizontal sectional views schematically showing the electrostatic electrodes formed on the ceramic substrate of another electrostatic chuck. In the electrostatic chuck shown in FIG. Inside semicircular chuck positive electrode electrostatic layer 7
2 and a chuck negative electrode electrostatic layer 73 are formed. In the electrostatic chuck shown in FIG. 6, chuck positive electrode electrostatic layers 82 a and 82 b each having a shape obtained by dividing a circle into four inside a ceramic substrate 81.
And chuck negative electrode electrostatic layers 83a and 83b are formed. The two chucking positive electrode electrostatic layers 82a and 82b and the two chucking negative electrode electrostatic layers 83a and 83b are formed to cross each other. In the case of forming an electrode in which a circular electrode or the like is divided, the number of divisions is not particularly limited, and may be five or more, and the shape is not limited to a sector.

A chuck top conductor layer is provided on the surface of the ceramic substrate constituting the semiconductor manufacturing / inspection apparatus of the present invention,
When a guard electrode or a ground electrode is provided inside, it functions as a wafer prober. FIG. 7 is a cross-sectional view schematically showing an example of a ceramic substrate constituting a wafer prober, FIG. 8 is a plan view thereof, and FIG. 9 is a line AA in the ceramic substrate shown in FIG. It is sectional drawing.

In the circular shape of the ceramic substrate 3 constituting the wafer prober, a concentric groove 7 is formed on the surface, and a plurality of suction holes 8 for sucking a silicon wafer are formed in a part of the groove 7. The chuck top conductor layer 2 for connecting to the electrode of the silicon wafer is formed in a circular shape on most of the ceramic substrate 3 including the groove 7.

On the other hand, on the bottom surface of the ceramic substrate 3, there is provided a resistance heating element 41 in which a concentric pattern and a bent line pattern are combined in order to control the temperature of the silicon wafer. External terminals are connected and fixed to terminal portions formed at both ends of 41. Further, a guard electrode 5 and a ground electrode 6 having a lattice shape as shown in FIG. 9 are provided inside the ceramic substrate 3 for removing stray capacitors and noise. The guard electrode 5 has a rectangular electrode non-forming portion 5.
2 is provided to bond the upper and lower ceramic substrates sandwiching the guard electrode 5 to each other.

Also in the case of this wafer prober, the ceramic substrate having the above structure is fitted or fixed to a supporting container having a bottom plate having a structure as shown in FIGS. 2, the wires from the chuck top conductor layer 2, the guard electrode 5, and the ground electrode 6 are each used as a power source. This wafer prober is not always
The resistance heating element 41 may not be provided.

In the wafer prober having such a structure, after a silicon wafer having an integrated circuit formed thereon is mounted thereon, a probe card having tester pins is pressed against the silicon wafer, and a voltage is applied while heating and cooling. hand,
A continuity test for testing whether the circuit operates properly can be performed.

Next, a method of manufacturing a hot plate will be described as an example of a method of manufacturing a semiconductor manufacturing / inspection apparatus of the present invention. First, the resistance heating element 12 is placed on the bottom shown in FIG.
A method for manufacturing a hot plate using a ceramic substrate on which is formed will be described.

(1) Step of Manufacturing Ceramic Substrate A slurry is prepared by blending a sintering aid such as yttria or a binder as necessary with the above-described nitride ceramic such as aluminum nitride, and then spray-drying the slurry. The resulting granules are put into a mold or the like and pressed into a plate or the like to form a green body. At this time, carbon may be contained.

Next, as necessary, a portion serving as a through hole 15 through which a lifter pin 16 for carrying a silicon wafer is inserted, and a bottomed hole 14 for embedding a temperature measuring element such as a thermocouple, are provided in the formed body. Are formed, a through hole for inserting a support pin for supporting the silicon wafer, a portion serving as a concave portion, and the like are formed. After firing, a bottomed hole or a through hole may be formed in the manufactured ceramic substrate using a drill or the like.

Next, the formed body is heated, fired and sintered to produce a ceramic plate. After that, the ceramic substrate 11 is manufactured by processing into a predetermined shape, but may be a shape that can be used as it is after firing. By performing heating and firing while applying pressure, it is possible to manufacture a ceramic substrate 11 having no pores. Heating and firing may be performed at a temperature equal to or higher than the sintering temperature.

(2) Step of Printing Conductive Paste on Ceramic Substrate The conductive paste is generally a high-viscosity fluid composed of metal particles, resin and solvent. The conductor paste is printed on a portion where the resistance heating element is to be provided by screen printing or the like to form a conductor paste layer.
In addition, since the resistance heating element needs to have a uniform temperature over the entire ceramic substrate, it is preferable that the resistance heating element be printed in a pattern in which concentric circles and bent lines are combined. The conductive paste layer is preferably formed such that the cross section of the resistance heating element 12 after firing has a square and flat shape.

(3) Firing of Conductive Paste The conductive paste layer printed on the bottom surface of the ceramic substrate 11 is heated and fired to remove the resin and the solvent, and sinter the metal particles.
The resistance heating element 12 is formed. The temperature of heating and firing is 500
~ 1000 ° C is preferred. If the above-described metal oxide is added to the conductor paste, the metal particles, the ceramic substrate and the metal oxide are sintered and integrated, so that the adhesion between the resistance heating element and the ceramic substrate is improved.

(4) Formation of Metal Coating Layer It is desirable to provide a metal coating layer 120 on the surface of the resistance heating element 12. The metal coating layer 120 can be formed by electrolytic plating, electroless plating, sputtering, or the like. However, considering mass productivity, electroless plating is optimal.

(5) Attachment of Terminals and the Like A conductive wire 66 for connection to a power supply is attached to the end of the pattern of the resistance heating element 12 using solder or the like. Further, a temperature measuring element such as a thermocouple is inserted into the bottomed hole 14 and sealed with a heat-resistant resin such as polyimide or ceramic.

(6) Installation on the Support Container Next, the columnar member 6 is attached to the center of the bottom plate 64 of the support container 62.
7 is bonded using a ceramic such as silica sol, and then a porous body 68 is placed on the columnar member 67. Subsequently, the ceramic substrate 11 is placed in the support container 62, and the metal from the temperature measuring element 28 is removed. The wire 63 and the conductive wire 66 from the resistance heating element 12 are accommodated in the columnar member 67, and these wires are drawn out from the through holes 64 a of the bottom plate 64 and connected to a power source or the like, thereby completing the hot plate manufacturing.

When the hot plate is manufactured, an electrostatic chuck can be manufactured by providing an electrostatic electrode inside the ceramic substrate. Further, a chuck top conductor layer is provided on the heating surface and the inside of the ceramic substrate can be manufactured. A wafer prober can be manufactured by providing a guard electrode and a ground electrode on the substrate.

When the electrodes are provided inside the ceramic substrate, a metal foil or the like may be embedded inside the ceramic substrate. When a conductor layer is formed on the surface of the ceramic substrate, a sputtering method or a plating method can be used, and these may be used in combination.

Next, a method of manufacturing a hot plate having a resistance heating element formed inside a ceramic substrate will be described with reference to FIG. (1) Step of Producing Ceramic Substrate First, a nitride ceramic powder is mixed with a binder, a solvent, and the like to prepare a paste, and a green sheet is produced using the paste. As the above-mentioned ceramic powder, aluminum nitride or the like can be used, and if necessary,
A sintering aid such as yttria may be added.

The binder is preferably at least one selected from an acrylic binder, ethyl cellulose, butyl cellosolve, and polyvinyl alcohol.
Further, as the solvent, at least one selected from α-terpineol and glycol is desirable.

The paste obtained by mixing these is formed into a sheet by a doctor blade method to form a green sheet 5.
0 is produced. The thickness of the green sheet 50 is 0.1 to
5 mm is preferred. Next, the obtained green sheet 50
If necessary, a portion serving as a through hole for inserting a lifter pin for carrying the silicon wafer, a portion serving as a bottomed hole for embedding a temperature measuring element such as a thermocouple, a support pin for supporting the silicon wafer And a portion 380 serving as a through hole for connecting the resistance heating element to an external external terminal are formed. The above-described processing may be performed after forming a green sheet laminate described later, or after forming and firing the laminate.

(2) Step of Printing Conductive Paste on Green Sheet A conductive paste containing a metal paste or a conductive ceramic is printed on the green sheet 50 to form a conductive paste layer 320. These conductive pastes contain metal particles or conductive ceramic particles. The average particle diameter of tungsten particles or molybdenum particles is
0.1-5 μm is preferred. If the average particle size is less than 0.1 μm or more than 5 μm, it is difficult to print the conductive paste.

As such a conductive paste, for example, 85 to 87 parts by weight of metal particles or conductive ceramic particles; 1.5 to 10 parts by weight of at least one kind of binder selected from acrylic, ethyl cellulose, butyl cellosolve, and polyvinyl alcohol And a composition (paste) obtained by mixing 1.5 to 10 parts by weight of at least one solvent selected from α-terpineol and glycol.

(3) Green Sheet Laminating Step The green sheet 50 on which the conductor paste is not printed is
The conductor paste is laminated on the upper and lower sides of the printed green sheet 50 (FIG. 10A). At this time, the number of green sheets 50 stacked on the upper side is made larger than the number of green sheets 50 stacked on the lower side, and the formation position of the resistance heating element is decentered toward the bottom side. Specifically, the number of stacked green sheets 50 on the upper side is preferably 20 to 50, and the number of stacked green sheets 50 on the lower side is preferably 5 to 20.

(4) Firing Step of Green Sheet Laminate The green sheet laminate is heated and pressed to sinter the ceramic particles in the green sheet 50 and the metal in the conductive paste layer 320 inside (FIG. 10 ( b)). The heating temperature is preferably from 1000 to 2000 ° C., and the pressure is preferably from 10 to 20 MPa. Heating is performed in an inert gas atmosphere. As the inert gas, for example, argon, nitrogen, or the like can be used.

As described above, after firing, a through hole 35 for inserting a lifter pin and a bottomed hole (not shown) for inserting a temperature measuring element may be provided. The through-hole 35 and the bottomed hole can be formed by performing blast processing such as drilling or sand blasting after surface polishing. Further, a blind hole 37 is formed to expose a through hole 38 for connecting to the internal resistance heating element 32 (FIG. 10C), and the external terminal 17 is inserted into the blind hole 37 and heated. By reflow, external terminal 1
7 is connected (FIG. 10D). The heating temperature is preferably from 90 to 450 ° C. in the case of soldering, and is preferably from 900 to 1100 ° C. in the case of processing with a brazing material.

Further, a thermocouple or the like as a temperature measuring element is sealed with a heat-resistant resin or the like. Then, similarly to the case of the ceramic substrate having the resistance heating element on the bottom surface described above, the columnar member is fixed to the bottom plate, and the porous body is placed on the columnar member, and the ceramic substrate is fitted or fixed to the support container. Then, by performing wiring and the like, a hot plate is formed.

In this hot plate, a silicon wafer or the like is placed on the hot plate, or after holding the silicon wafer or the like with support pins, various operations are performed while heating or cooling the silicon wafer or the like. be able to.

When the hot plate is manufactured, an electrostatic chuck can be manufactured by providing an electrostatic electrode inside the ceramic substrate. Further, a chuck top conductor layer is provided on the heating surface and the inside of the ceramic substrate can be manufactured. A wafer prober can be manufactured by providing a guard electrode and a ground electrode on the substrate.

When electrodes are provided inside the ceramic substrate, a conductive paste layer may be formed on the surface of the green sheet as in the case of forming the resistance heating element. When a conductor layer is formed on the surface of the ceramic substrate, a sputtering method or a plating method can be used, and these may be used in combination.

Hereinafter, the present invention will be described in more detail.

EXAMPLES (Example 1) Production of hot plate (see FIGS. 1 and 2) (1) 100 parts by weight of aluminum nitride powder (manufactured by Tokuyama Corporation, average particle size 1.1 μm), yttrium oxide (Y ₂ O)
₃ : A composition consisting of 4 parts by weight of yttria, an average particle diameter of 0.4 μm), 12 parts by weight of an acrylic resin binder and alcohol was spray-dried to produce a granular powder.

(2) Next, this granular powder was put into a mold and molded into a flat plate to obtain a formed product (green).

(3) The formed body after the processing is hot-pressed at a temperature of 1800 ° C. and a pressure of 20 MPa.
An aluminum nitride sintered body having a thickness of 3 mm was obtained. next,
A disk having a diameter of 310 mm was cut out from this plate to obtain a ceramic plate (ceramic substrate 11). Next, a drilling is performed on the plate-like body, and a through hole for inserting a lifter pin for transporting a semiconductor wafer and a bottomed hole for embedding a thermocouple (diameter: 1.1 mm, depth: 2 m)
m) was formed. (4) A conductor paste was printed on the bottom surface of the sintered body obtained in (3) by screen printing. The printing pattern is shown in FIG.
The pattern was a combination of the concentric circle shape and the bent line shape as shown in FIG. As the conductor paste, Solvest PS603D manufactured by Tokuri Chemical Laboratory, which is used for forming through holes in a printed wiring board, was used.

This conductor paste is a silver-lead paste, and based on 100 parts by weight of silver, lead oxide (5% by weight), zinc oxide (55% by weight), silica (10% by weight), and boron oxide (25% by weight). % By weight) and 7.5% by weight of a metal oxide composed of alumina (5% by weight). Also,
The silver particles had an average particle size of 4.5 μm and were scaly.

(5) Next, the sintered body on which the conductor paste was printed was heated and fired at 780 ° C. to obtain silver in the conductor paste,
The lead was sintered and baked on the sintered body to form a resistance heating element. The silver-lead resistance heating element 12 had a thickness of 5 μm, a width of 2.4 mm, and a sheet resistivity of 7.7 mΩ / □ near the terminal portion. (6) Next, an electroless nickel plating bath composed of an aqueous solution containing 80 g / l of nickel sulfate, 24 g / l of sodium hypophosphite, 12 g / l of sodium acetate, 8 g / l of boric acid, and 6 g / l of ammonium chloride was used as the above ( The sintered body prepared in 5) is immersed, and a thickness of 1 mm is applied to the surface of the silver-lead resistance heating element 12.
A μm metal coating layer 120 (nickel layer) was deposited.

(7) A silver-lead solder paste (manufactured by Tanaka Kikinzoku Co., Ltd.) was printed by screen printing on a terminal portion for securing connection with a power supply, thereby forming a solder layer. Then
A conductive wire 66 having a T-shaped tip is placed on the solder layer,
After heating and reflow at 420 ° C., the conductive wire 66 was attached to the terminal of the resistance heating element. (8) A thermocouple for temperature control was inserted into the bottomed hole, filled with a polyimide resin, and cured at 190 ° C. for 2 hours to obtain a ceramic substrate 11 having a resistance heating element 12 on a bottom surface 11b.

(9) Thereafter, an alumina columnar member 67 is bonded to the center of the bottom plate 64 using an inorganic adhesive such as silica sol or the like, and then porous alumina (porosity: 2 vol%, A porous body 68 having a thermal conductivity of 5 W / m · k) was placed.

Next, a bottom plate 64 on which a columnar member or the like is installed is attached to the support container 62, the ceramic substrate 11 is fitted into the support container 62, and at the same time, the metal wire 63 from the temperature measuring element 28 and the resistance heating element 12 Is accommodated in the hollow portion of the columnar member 67, and from the through hole 64 a of the bottom plate 64,
These wirings were pulled out and connected to a power supply or the like, thereby completing the production of the hot plate.

Example 2 Production of Electrostatic Chuck (1) 100 parts by weight of aluminum nitride powder (manufactured by Tokuyama Corporation, average particle size: 1.1 μm), yttria (average particle size: 0.1 μm)
4 μm) A composition obtained by mixing 4 parts by weight, 12 parts by weight of an acrylic resin binder, 0.5 parts by weight of a dispersant, and 53 parts by weight of alcohol composed of 1-butanol and ethanol is molded by a doctor blade method. As a result, a green sheet having a thickness of 0.47 mm was obtained. (2) Next, after drying the green sheet at 80 ° C. for 5 hours, punching was performed to provide a through hole for a through hole for connecting a resistance heating element to an external terminal.

(3) 100 parts by weight of tungsten carbide particles having an average particle diameter of 1 μm, acrylic binder 3.0
By weight, 3.5 parts by weight of an α-terpineol solvent and 0.3 parts by weight of a dispersant were mixed to prepare a conductive paste A.
Further, 100 parts by weight of tungsten particles having an average particle diameter of 3 μm, 1.9 parts by weight of an acrylic binder, 3.7 parts by weight of an α-terpineol solvent, and 0.2 parts by weight of a dispersant were mixed to prepare a conductive paste B. .

(4) The conductive paste A was printed on the surface of the green sheet by a screen printing method to form a resistance heating element. The printing pattern was the same as that in Example 1 in which concentric circles and bent lines were combined. Further, a conductor paste layer composed of an electrostatic electrode pattern having the shape shown in FIG. 5 was formed on another green sheet.

Further, the conductive paste B was filled in the through holes for connecting the external terminals. The electrostatic electrode pattern is composed of comb electrodes (22b, 23b), and 22b, 23b are connected to 22a, 23a, respectively (see FIG. 4B). On the green sheet after the above processing, 34 green sheets on which the tungsten paste is not printed are further laminated on the upper side (heating side) and 13 on the lower side (bottom side), and an electrostatic electrode pattern is formed thereon. Laminate green sheets with printed conductor paste layer,
Further, two green sheets on which the tungsten paste is not printed are laminated thereon, and these are stacked at 130 ° C. and 8M.
The laminate was formed by pressure bonding at a pressure of Pa.

(5) Next, the obtained laminate was degreased in a nitrogen gas at 600 ° C. for 5 hours, and then hot-pressed at 1890 ° C. and a pressure of 15 MPa for 3 hours to obtain a thickness of 3 m.
m was obtained. This has a diameter of 230
mm, a resistance heating element 32 having a thickness of 5 μm, a width of 2.4 mm, and a sheet resistivity of 7.7 mΩ / □, a chuck positive electrostatic layer 22 having a thickness of 6 μm, and a chuck negative electrode. A plate made of aluminum nitride having the electrostatic layer 23 was used.

(6) Ceramic substrate 2 obtained in (5) above
1 was polished with a diamond grindstone, a mask was placed on the surface, and blasting treatment with SiC or the like was performed to form a bottomed hole (diameter: 1.2 mm, depth 2.0 m) for a thermocouple on the surface.
m).

(7) Further, the portion where the through-hole is formed is cut out to form a blind hole, and Ni-A
Using a gold solder made of u, heating and reflow were performed at 700 ° C. to connect an external terminal made of Kovar, and then a socket having a conductive wire was attached to the external terminal.

(8) Next, a plurality of thermocouples for temperature control are embedded in the bottomed hole, and the resistance heating element and the electrostatic electrode 2
The manufacture of the ceramic substrate having 2, 23 was completed. (9) After that, a columnar member made of alumina is adhered to the center portion of the bottom plate 64 using ceramics such as silica sol, and then a porous Mycarex (porosity: 5 vol.
%, Thermal conductivity: 5 W / m · k). In addition, the porous body 68 can be fitted and fixed on the columnar member.

Next, the bottom plate 64 on which the columnar members and the like are installed is attached to the support container 62, and the ceramic substrate 11 is fitted into the support container 62, and at the same time, the wiring from the electrostatic electrodes 22, 23 and the resistance heating element 24 To the columnar member 67
Then, these wirings were drawn out from the through holes 64a of the bottom plate 64 and connected to a power supply or the like, thereby completing the manufacture of the electrostatic chuck.

(Example 3) Production of wafer prober (1) 100 parts by weight of aluminum nitride powder (manufactured by Tokuyama Corporation, average particle size: 1.1 μm), yttria (average particle size: 0.1 μm)
4 μm) A composition obtained by mixing 4 parts by weight, 12 parts by weight of an acrylic resin binder, 0.5 parts by weight of a dispersant, and 53 parts by weight of alcohol composed of 1-butanol and ethanol is molded by a doctor blade method. As a result, a green sheet having a thickness of 0.47 mm was obtained. (2) Next, after drying this green sheet at 80 ° C. for 5 hours, punching was performed to provide a through hole for connecting an electrode and an external terminal.

(3) 100 parts by weight of tungsten carbide particles having an average particle diameter of 1 μm, and an acrylic binder 3.0
By weight, 3.5 parts by weight of an α-terpineol solvent and 0.3 parts by weight of a dispersant were mixed to prepare a conductive paste A.
Further, 100 parts by weight of tungsten particles having an average particle diameter of 3 μm, 1.9 parts by weight of an acrylic binder, 3.7 parts by weight of an α-terpineol solvent, and 0.2 parts by weight of a dispersant were mixed to prepare a conductive paste B. .

(4) The conductive paste A was printed on the surface of the green sheet by a screen printing method to form a grid-like printed layer for a guard electrode and a printed layer for a ground electrode (see FIG. 9). Further, the conductive paste B was filled in the through holes for connecting external terminals to form a filling layer for through holes. Then, 50 green sheets on which the conductive paste is printed and green sheets on which the conductive paste is not printed are stacked, and the green sheets are stacked at 130 ° C. and 8M.
They were integrated at a pressure of Pa.

(5) The integrated laminate is heated at 600 ° C. for 5 hours.
After degreasing for 1 hour, hot pressing was performed at 1890 ° C. and a pressure of 15 MPa for 3 hours to obtain a 3 mm-thick aluminum nitride plate. The plate was cut out into a circular shape having a diameter of 230 mm to obtain a ceramic substrate. In addition, the size of the through hole was 0.2 mm in diameter and 0.2 mm in depth. The thickness of the guard electrode 5 and the ground electrode 6 is 10
μm, the formation position of the guard electrode 5 in the sintered body thickness direction is:
1 mm from the chuck surface, while the ground electrode 6
The formation position in the thickness direction of the sintered body is 1.
It was 2 mm.

(6) The ceramic substrate obtained in the above (5) is polished with a diamond grindstone, and then a mask is placed thereon.
By blasting treatment with SiC or the like, a bottomed hole for attaching a thermocouple and a groove 7 for adsorbing a wafer (width 0.5 m
m, depth 0.5 mm).

(7) Further, a conductive paste was printed on the back surface (bottom surface) opposite to the chuck surface on which the groove 7 was formed to form a conductive paste layer for a resistance heating element. As the conductive paste, Solvest PS603D manufactured by Tokuri Chemical Laboratory, which is used for forming through holes in a printed wiring board, was used. That is, this conductive paste is a silver / lead paste, and a metal oxide composed of lead oxide, zinc oxide, silica, boron oxide, and alumina (the weight ratio of each is 5/55/10/25/5). 6. relative to the amount of silver
It contains 5% by weight. The silver in the conductive paste used was scaly with an average particle size of 4.5 μm.

(8) A ceramic substrate (ceramic substrate) on which a circuit is formed by printing a conductive paste on the bottom surface is placed at 78
By heating and baking at 0 ° C., silver and lead in the conductive paste were sintered and baked on a ceramic substrate to form a resistance heating element. The pattern of the resistance heating element was the same as that of Example 1 in which concentric circles and bent lines were combined. Next, this ceramic substrate was treated with nickel sulfate 3
0 g / l, boric acid 30 g / l, ammonium chloride 30 g
/ L, an electroless nickel plating bath consisting of an aqueous solution containing 60 g / l of Rochelle's salt, and further having a thickness of 1 µm and a boron content of 1 wt% on the surface of the resistance heating element made of the conductive paste. The following nickel layer was deposited to thicken the resistance heating element, and then heat-treated at 120 ° C. for 3 hours. The resistance heating element 41 including the nickel layer thus obtained had a thickness of 5 μm, a width of 2.4 mm, and a sheet resistivity of 7.7 mΩ / □.

(9) Ti, Mo, and Ni layers were sequentially laminated on the chuck surface where the grooves 7 were formed by sputtering. In this sputtering, SV-4540 manufactured by Japan Vacuum Engineering Co., Ltd. was used as the apparatus, and the pressure was 0.6 Pa, the temperature was 100 ° C., the power was 200 W, and the processing time was 30 seconds to 1 hour.
Minutes, and the sputtering time was adjusted depending on each metal to be sputtered. The obtained film had a Ti of 0.3 μm and a Mo of 2 μm from the image of the X-ray fluorescence spectrometer.
m and Ni were 1 μm.

(10) The ceramic substrate obtained in the above (9) was treated with 30 g / l of nickel sulfate, 30 g / l of boric acid,
Ammonium chloride 30g / l, Rochelle salt 60g / l
Is immersed in an electroless nickel plating bath composed of an aqueous solution containing, and a nickel layer (7 μm in thickness) having a boron content of 1% by weight or less is deposited on the surface of the groove 7 formed on the chuck surface. Heat-treated at 3 ° C. for 3 hours. Further, an electroless gold plating solution comprising 2 g / l of potassium gold cyanide, 75 g / l of ammonium chloride, 50 g / l of sodium citrate, and 10 g / l of sodium hypophosphite was applied to the surface of the ceramic substrate (the chuck surface side) at 93 ° C. Then, a 1-μm-thick gold plating layer was further laminated on the nickel plating layer on the chuck surface side of the ceramic substrate to form the chuck top conductor layer 2.

(11) Next, the air suction hole 8 that escapes from the groove 7 to the back surface was drilled and drilled, and a blind hole for exposing the through holes 46 and 47 was provided. A Ni-Au alloy (81.5 wt% of Au, Ni18.
(4 wt%, impurity 0.1 wt%) was used, and heated and reflowed at 970 ° C. to connect external terminals made of Kovar. Further, external terminals made of Kovar were formed on the resistance heating element 41 via a solder alloy (tin 9 / lead 1).
Thereafter, a socket having a conductive wire was attached to the external terminal.

(12) In order to control the temperature, a plurality of thermocouples are buried in the bottomed holes (not shown), a chuck top conductor layer 2 is provided on the surface, and a guard electrode 5 and a ground electrode 6 are provided inside. The manufacture of the ceramic substrate 3 having the resistance heating element 41 formed on the bottom surface has been completed.

(13) Thereafter, the central portion of the bottom plate 64
A columnar member made of alumina is bonded using a ceramic such as silica sol, and a porous body 68 made of porous Mycarex (porosity: 5 vol%, thermal conductivity: 5 W / m · k) is placed thereon. did.

Next, the bottom plate 64 on which the columnar members and the like are installed is attached to the support container 62, and the ceramic substrate 11 is fitted into the support container 62, and at the same time, the chuck top conductor layer 2,
The wires from the guard electrode 5 and the ground electrode 6 and the conductive wires from the resistance heating element 24 are accommodated in the hollow portion of the columnar member 67, and these wires are drawn out from the through holes 64 a of the bottom plate 64 and connected to a power source or the like. As a result, the manufacture of the wafer prober was completed. In these examples, the plate-like body placed on the columnar member is a porous body, but a porous body may be used for the heat insulating ring 61 shown in FIG.

(Comparative Example 1) An electrostatic chuck was manufactured in the same manner as in Example 1 except that a porous body was not arranged when a ceramic substrate was fitted into a supporting container.

The ceramic substrates according to Examples 1 to 3 and Comparative Example 1 were energized and heated to 300 ° C.
The temperature distribution on the heating surface of the ceramic substrate was measured using a thermoviewer (IR62012-0012, manufactured by Nippon Datum).

As a result, in Example 1, the difference between the maximum temperature and the minimum temperature was 6 ° C., in Example 2, the difference between the maximum temperature and the minimum temperature was 6 ° C., and in Example 3, the difference was The difference between the temperature and the minimum temperature was 6 ° C, and the temperature difference was small,
In the case of Comparative Example 1, the difference between the highest temperature and the lowest temperature was 10
° C was higher than that in the above example.

[0142]

As described above, in the semiconductor manufacturing / inspection apparatus according to the present invention, since the porous body is interposed between the ceramic substrate and the columnar member, the ceramic is interposed between the ceramic member and the columnar member. Dissipation of heat from the substrate can be prevented, and uniformity of the temperature of the heated surface can be maintained.

Further, since the ceramic substrate is supported via the columnar members and the porous body, the ceramic substrate can be prevented from warping even when the ceramic substrate is heated to a high temperature.

Further, when a cavity is formed in the columnar member, a metal wire constituting a temperature measuring element provided on the ceramic substrate, a conductive line connected to a resistance heating element, or the like is connected to the columnar member. It can be easily pulled out of the supporting container through the above, and the assembly of the device is easy.

[Brief description of the drawings]

FIG. 1 is a plan view schematically showing a hot plate which is an example of a semiconductor manufacturing / inspection apparatus of the present invention.

FIG. 2 is a cross-sectional view of the hot plate shown in FIG.

FIG. 3 is a partially enlarged sectional view schematically showing a ceramic substrate constituting the hot plate shown in FIG. 1;

FIG. 4A is a longitudinal sectional view schematically showing a ceramic substrate constituting an electrostatic chuck according to the present invention,
FIG. 2B is a cross-sectional view taken along line AA of the ceramic substrate shown in FIG.

FIG. 5 is a horizontal sectional view schematically showing another example of an electrostatic electrode embedded in a ceramic substrate.

FIG. 6 is a horizontal sectional view schematically showing still another example of an electrostatic electrode embedded in a ceramic substrate.

FIG. 7 is a cross-sectional view schematically showing a ceramic substrate constituting a wafer prober according to the present invention.

FIG. 8 is a plan view of the ceramic substrate shown in FIG. 7;

FIG. 9 is a sectional view taken along line AA of the ceramic substrate shown in FIG. 7;

FIGS. 10A to 10D are cross-sectional views schematically showing an example of a method for manufacturing a ceramic substrate constituting a hot plate according to the present invention.

[Explanation of symbols]

 2 chuck top conductor layer 3, 11, 21, 31, 71, 81 ceramic substrate 5 guard electrode 6 ground electrode 7 groove 8 suction hole 10 hot plate 11a heating surface 11b bottom surface 12, 24, 32, 41 resistance heating element 12a resistance heating Body end 14 Bottom hole 15 Through hole 16 Lifter pin 17 Solder layer 19 Semiconductor wafer (silicon wafer) 22, 72, 82a, 82b Chuck electrostatic electrode layer 23, 73, 83a, 83b Chuck negative electrode electrostatic layer 25 Ceramic dielectric Body membrane 28 Temperature measuring element 33 External terminal 35 Through hole 37 Bag hole 38 Through hole 52 Electrode-free portion 61 Heat insulating ring 62 Support container 62a Main body 62b Substrate receiving portion 62c Bottom plate receiving portion 63 Metal wire 64 Bottom plate 64a Through hole 65 Refrigerant introduction Tube 66 conductive wire 67 columnar member 69 guide tube 120 gold Covering layer 130 fixing member

Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat II (Reference) H01L 21/66 H05B 3/18 5F004 H05B 3/16 3/20 328 5F031 3/18 3/68 5F045 3/20 328 G01R 31/28 H 3/68 H01L 21/302 BF term (reference) 2G003 AA10 AC01 AC03 AD03 AH07 2G032 AA00 AB02 AE00 AF00 AL00 3K034 AA02 AA10 AA20 AA21 AA22 AA34 AA37 BB06 BB14 BC04 BC16 BC17 DA04 FA08 FA05 HA01 HA10 JA02 3K092 PP20 QA05 QB02 QB04 QB17 QB18 QB20 QB31 QB44 QB45 QB74 QB76 QC18 QC38 QC42 QC52 QC58 RF03 RF11 RF17 RF22 RF26 RF27 SS02 SS04 SS05 TT06 TT07 UA05 5A02A01A01V22A01A22V01A01V22A01 HA37 MA28 MA32 MA33 5F045 BB02 EK08 EK09 EM02 EM06 EM09

Claims (4)

[Claims] 1. A semiconductor manufacturing / inspection apparatus in which a ceramic substrate provided with a conductor layer on its surface or inside is fixed on an upper part of a supporting container having a plate-like body, wherein said plate-like body has Wherein a columnar member is provided, and a porous body is interposed between the columnar member and the ceramic substrate and / or between the ceramic substrate and the support container. Manufacturing and inspection equipment. 2. The semiconductor manufacturing / inspection apparatus according to claim 1, wherein a cavity is formed in said columnar member. 3. The semiconductor manufacturing / inspection apparatus according to claim 2, wherein the cavity communicates with a side surface and a bottom surface of the columnar member. 4. The semiconductor manufacturing / inspection apparatus according to claim 2, wherein a wiring from the conductor layer and / or another wiring is accommodated in the cavity.