JP2001345324A5 - - Google Patents

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Publication number
JP2001345324A5
JP2001345324A5 JP2000163046A JP2000163046A JP2001345324A5 JP 2001345324 A5 JP2001345324 A5 JP 2001345324A5 JP 2000163046 A JP2000163046 A JP 2000163046A JP 2000163046 A JP2000163046 A JP 2000163046A JP 2001345324 A5 JP2001345324 A5 JP 2001345324A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2000163046A
Other languages
Japanese (ja)
Other versions
JP2001345324A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000163046A priority Critical patent/JP2001345324A/ja
Priority claimed from JP2000163046A external-priority patent/JP2001345324A/ja
Publication of JP2001345324A publication Critical patent/JP2001345324A/ja
Publication of JP2001345324A5 publication Critical patent/JP2001345324A5/ja
Abandoned legal-status Critical Current

Links

JP2000163046A 2000-05-31 2000-05-31 半導体装置の製造方法 Abandoned JP2001345324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000163046A JP2001345324A (ja) 2000-05-31 2000-05-31 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000163046A JP2001345324A (ja) 2000-05-31 2000-05-31 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2001345324A JP2001345324A (ja) 2001-12-14
JP2001345324A5 true JP2001345324A5 (enExample) 2005-06-16

Family

ID=18666863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000163046A Abandoned JP2001345324A (ja) 2000-05-31 2000-05-31 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JP2001345324A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4757372B2 (ja) * 2000-06-13 2011-08-24 富士通株式会社 埋込配線層の形成方法
KR100720489B1 (ko) * 2005-12-28 2007-05-22 동부일렉트로닉스 주식회사 구리 금속 배선의 평탄화 방법
JP4906417B2 (ja) * 2006-07-11 2012-03-28 ラピスセミコンダクタ株式会社 半導体装置の製造方法
JP4967110B2 (ja) * 2008-04-24 2012-07-04 スパンション エルエルシー 半導体装置の製造方法
WO2012090292A1 (ja) 2010-12-28 2012-07-05 富士通セミコンダクター株式会社 半導体装置の製造方法

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