JP2001332473A5 - - Google Patents

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Publication number
JP2001332473A5
JP2001332473A5 JP2000151356A JP2000151356A JP2001332473A5 JP 2001332473 A5 JP2001332473 A5 JP 2001332473A5 JP 2000151356 A JP2000151356 A JP 2000151356A JP 2000151356 A JP2000151356 A JP 2000151356A JP 2001332473 A5 JP2001332473 A5 JP 2001332473A5
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JP
Japan
Prior art keywords
charged particle
particle beam
electron optical
optical system
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000151356A
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English (en)
Japanese (ja)
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JP2001332473A (ja
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Publication date
Application filed filed Critical
Priority to JP2000151356A priority Critical patent/JP2001332473A/ja
Priority claimed from JP2000151356A external-priority patent/JP2001332473A/ja
Priority to US09/808,175 priority patent/US6566664B2/en
Publication of JP2001332473A publication Critical patent/JP2001332473A/ja
Publication of JP2001332473A5 publication Critical patent/JP2001332473A5/ja
Pending legal-status Critical Current

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JP2000151356A 2000-03-17 2000-05-23 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 Pending JP2001332473A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000151356A JP2001332473A (ja) 2000-05-23 2000-05-23 荷電粒子線露光装置及び該装置を用いたデバイス製造方法
US09/808,175 US6566664B2 (en) 2000-03-17 2001-03-15 Charged-particle beam exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000151356A JP2001332473A (ja) 2000-05-23 2000-05-23 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2001332473A JP2001332473A (ja) 2001-11-30
JP2001332473A5 true JP2001332473A5 (enrdf_load_stackoverflow) 2005-08-04

Family

ID=18656925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000151356A Pending JP2001332473A (ja) 2000-03-17 2000-05-23 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2001332473A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6768125B2 (en) * 2002-01-17 2004-07-27 Ims Nanofabrication, Gmbh Maskless particle-beam system for exposing a pattern on a substrate
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
JP4657740B2 (ja) * 2005-01-26 2011-03-23 キヤノン株式会社 荷電粒子線光学系用収差測定装置、該収差測定装置を具備する荷電粒子線露光装置及び該装置を用いたデバイス製造方法
JP5506560B2 (ja) * 2010-06-18 2014-05-28 キヤノン株式会社 描画装置及びデバイス製造方法
JP5836646B2 (ja) * 2011-05-31 2015-12-24 キヤノン株式会社 描画装置、および、物品の製造方法
US11302511B2 (en) 2016-02-04 2022-04-12 Kla Corporation Field curvature correction for multi-beam inspection systems

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