JP2000243337A5 - - Google Patents

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Publication number
JP2000243337A5
JP2000243337A5 JP1999041510A JP4151099A JP2000243337A5 JP 2000243337 A5 JP2000243337 A5 JP 2000243337A5 JP 1999041510 A JP1999041510 A JP 1999041510A JP 4151099 A JP4151099 A JP 4151099A JP 2000243337 A5 JP2000243337 A5 JP 2000243337A5
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JP
Japan
Prior art keywords
electron optics
charged particle
particle beam
exposure apparatus
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999041510A
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English (en)
Japanese (ja)
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JP4143204B2 (ja
JP2000243337A (ja
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Application filed filed Critical
Priority to JP04151099A priority Critical patent/JP4143204B2/ja
Priority claimed from JP04151099A external-priority patent/JP4143204B2/ja
Publication of JP2000243337A publication Critical patent/JP2000243337A/ja
Publication of JP2000243337A5 publication Critical patent/JP2000243337A5/ja
Application granted granted Critical
Publication of JP4143204B2 publication Critical patent/JP4143204B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP04151099A 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP4143204B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04151099A JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04151099A JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2000243337A JP2000243337A (ja) 2000-09-08
JP2000243337A5 true JP2000243337A5 (enrdf_load_stackoverflow) 2007-03-01
JP4143204B2 JP4143204B2 (ja) 2008-09-03

Family

ID=12610380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04151099A Expired - Fee Related JP4143204B2 (ja) 1999-02-19 1999-02-19 荷電粒子線露光装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4143204B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4017935B2 (ja) 2002-07-30 2007-12-05 株式会社日立ハイテクノロジーズ マルチビーム型電子線描画方法及び装置
JP3803105B2 (ja) * 2004-09-07 2006-08-02 株式会社日立ハイテクノロジーズ 電子ビーム応用装置
JP2008066359A (ja) * 2006-09-05 2008-03-21 Canon Inc 荷電ビームレンズアレイ、露光装置及びデバイス製造方法
JP2010061936A (ja) * 2008-09-03 2010-03-18 Hitachi High-Technologies Corp 荷電粒子ビーム用軌道補正器、および荷電粒子ビーム用軌道補正器の製作方法
DE102020107738B3 (de) * 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

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