JP2001326107A - Chip-type laminated varistor - Google Patents

Chip-type laminated varistor

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Publication number
JP2001326107A
JP2001326107A JP2000146544A JP2000146544A JP2001326107A JP 2001326107 A JP2001326107 A JP 2001326107A JP 2000146544 A JP2000146544 A JP 2000146544A JP 2000146544 A JP2000146544 A JP 2000146544A JP 2001326107 A JP2001326107 A JP 2001326107A
Authority
JP
Japan
Prior art keywords
sintered body
internal electrode
layer
chip
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000146544A
Other languages
Japanese (ja)
Inventor
Mikinori Amisawa
幹典 網沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2000146544A priority Critical patent/JP2001326107A/en
Publication of JP2001326107A publication Critical patent/JP2001326107A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a chip-type laminated varistor which is protected against crackings, when soldered to a circuit board in an equipment, and can be kept stable in electrical properties, and which contains SrTiO3 as a main component. SOLUTION: Ceramic layers 2 and NiO inner electrode layers 3 and 4 are laminated alternately into a laminate, and the laminate is sintered into a sintered body 7. The sintered body 7 is specified of NiO content, and provided that the thickness of the sintered body 7 including the uppermost to lowermost layer of the inner electrode layers 3 and 4 is represented by T1, the thickness of the uppermost ceramic layer 5 and lowermost ceramic layer 6 is represented by T2, the width of the sintered body 7 including its front or rear to the inner electrode layers 3 and 4 is represented by W1, the width of a part where the inner electrode layers 3 and 4 overlap with each other in the direction of the front or the rear is represented by W2, a gap formed between a line extending from the one or the other end of the laminate toward the opposed surface and the opposed surface is represented by L1, and a part where the inner electrode layers 3 and 4 overlap with each other through the intermediary of the ceramic layer 2 is represented by L2. These T1, T2, W1, W2, L1, and L2 are prescribed respectively to provide the constitution of a chip-type laminated varistor.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はコンデンサ機能とバ
リスタ機能の両特性を有するチップ形積層バリスタに関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip type laminated varistor having both characteristics of a capacitor function and a varistor function.

【0002】[0002]

【従来の技術】図4は従来のチップ形積層バリスタ21
の一部を切り欠いた斜視図である。図4において、22
はSrTiO3を主成分とするセラミック層23とNi
Oを主成分とする内部電極層24,25とを交互に積層
し、この最上段と最下段にセラミック層26を重ねて焼
結した焼結体であり、この終結体22の表面に前記内部
電極層24,25とそれぞれ接続した外部電極27,2
8を形成し、この外部電極27,28間にバリスタとコ
ンデンサの両特性を有するチップ形積層バリスタを構成
している。
2. Description of the Prior Art FIG.
It is the perspective view which cut out some of them. In FIG.
Is a ceramic layer 23 containing SrTiO 3 as a main component and Ni
A sintered body obtained by alternately laminating internal electrode layers 24 and 25 containing O as a main component and sintering a ceramic layer 26 on the uppermost and lowermost layers, and sintering the surface of the final body 22 External electrodes 27 and 2 connected to the electrode layers 24 and 25, respectively.
A chip type varistor 8 having both characteristics of a varistor and a capacitor is formed between the external electrodes 27 and 28.

【0003】以上のように構成されたチップ形積層バリ
スタについて、以下にその製造方法を説明する。
[0003] A method of manufacturing the chip-type laminated varistor configured as described above will be described below.

【0004】まず、SrTiO3を主成分とし、半導体
化材としてNb,Ta,V,W,Dy,Nd,Y,L
a,Ge等の酸化物と電圧非直線特性改良材Mn、焼結
助剤のSiとを混合し成形したセラミック層23とNi
Oからなる内部電極層24,25を交互に複数層積層
し、さらに最上段と最下段にセラミック層26を重ねて
積層体とする。次にこの積層体を1000℃付近にて脱
バイ及び仮焼した後に還元雰囲気中の1300℃付近に
て焼成して焼結体22とし、その後この焼結体22を酸
化雰囲気中で再酸化させ、この焼結体22の両端面に外
部電極ペーストを塗布し焼き付けて外部電極27,28
を形成しチップ形積層バリスタ21を得ていた。
First, SrTiO 3 is used as a main component, and Nb, Ta, V, W, Dy, Nd, Y, L
a ceramic layer 23 formed by mixing an oxide such as a, Ge, etc., a voltage non-linear characteristic improving material Mn, and a sintering aid Si,
A plurality of internal electrode layers 24 and 25 made of O are alternately laminated, and a ceramic layer 26 is further laminated on the uppermost and lowermost layers to form a laminate. Next, the laminated body is debubbled and calcined at about 1000 ° C., and then fired at about 1300 ° C. in a reducing atmosphere to obtain a sintered body 22. Thereafter, the sintered body 22 is re-oxidized in an oxidizing atmosphere. External electrode paste is applied to both end surfaces of the sintered body 22 and baked to form external electrodes 27 and 28.
Was formed to obtain a chip-type laminated varistor 21.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前記の
従来の技術では、内部電極層24,25とセラミック層
23の焼成における収縮差があるため、前記還元雰囲気
中の焼成において、内部電極層24,25とセラミック
層23及び最上段、最下段のセラミック層26の境界近
傍に応力が残留し、機器の回路基板に半田付けする際に
クラックが発生し易いという問題点を有していた。
However, in the above-mentioned prior art, since there is a difference in shrinkage in firing the internal electrode layers 24 and 25 and the ceramic layer 23, the internal electrode layers 24 and 25 are not fired in the reducing atmosphere. There is a problem that stress remains near the boundary between the ceramic layer 25, the ceramic layer 23, and the uppermost and lowermost ceramic layers 26, and cracks are likely to occur when soldering to the circuit board of the device.

【0006】本発明は前記問題点を解決するもので、焼
結体の内部電極層とセラミック層との境界近傍の応力の
残留を低減し、機器の回路基板への半田付けの際にクラ
ックの発生を防止できるチップ形積層バリスタを提供す
ることを目的とする。
The present invention solves the above-mentioned problems, and reduces the residual stress near the boundary between the internal electrode layer of the sintered body and the ceramic layer, thereby preventing cracks when soldering to a circuit board of equipment. It is an object of the present invention to provide a chip-type laminated varistor capable of preventing occurrence.

【0007】[0007]

【課題を解決するための手段】前記目的を達成するため
に、以下の構成を有するものである。
Means for Solving the Problems In order to achieve the above object, the present invention has the following arrangement.

【0008】本発明の請求項1に記載の発明は、SrT
iO3を主成分とするセラミック層とNiOを主成分と
する内部電極層とを交互に積層し焼結した焼結体におい
て、この焼結体中のNiO含有量を8wt%以下とし、
前記焼結体中の内部電極層の最上段層から最下段層まで
の厚みをT1、最上段と最下段のセラミック層の厚みを
T2として、前記T1,T2をそれぞれ0.4≧T1/
T2の範囲とし、前記焼結体の前面または背面から内部
電極層まで離れた幅方向寸法をW1、前記積層体の前面
又は背面方向に重なり合う内部電極層の寸法をW2とし
て、W1,W2をそれぞれ0.4≧W1/W2の範囲と
し、前記焼結体の一端又は他端から対向面に向けて延長
して積層体の対向面と離れた長さ方向寸法をL1、セラ
ミック層を介して重なり合う内部電極層の寸法をL2と
して、L1,L2をそれぞれ0.4≧L1/L2の範囲
としたチップ形積層バリスタであり、これにより、内部
電極層とセラミック層との歪みが小さくなり内部電極層
とセラミック層との境界近傍に応力の残留を低減でき
て、このチップ形積層バリスタを機器の回路基板に半田
付けする際にクラックの発生を防止でき、電気特性を損
なうことがなく、信頼性の高いチップ形積層バリスタを
得ることができるという作用、効果が得られる。
[0008] The invention described in claim 1 of the present invention is a method for preparing SrT
In a sintered body obtained by alternately laminating and sintering a ceramic layer mainly composed of iO 3 and an internal electrode layer mainly composed of NiO, the NiO content in the sintered body is set to 8 wt% or less,
Assuming that the thickness from the uppermost layer to the lowermost layer of the internal electrode layers in the sintered body is T1, and the thickness of the uppermost and lowermost ceramic layers is T2, T1 and T2 are 0.4 ≧ T1 /
W1 is the range of T2, and W1 is the width direction dimension separated from the front or back surface of the sintered body to the internal electrode layer, and W2 is the dimension of the internal electrode layer overlapping the front or back direction of the laminate, and W1 and W2 are respectively 0.4 ≧ W1 / W2, and extends from one end or the other end of the sintered body toward the opposing surface to have a length dimension L1 distant from the opposing surface of the laminate and overlaps with the ceramic layer interposed therebetween. This is a chip-type multilayer varistor in which the dimensions of the internal electrode layer are L2 and L1 and L2 are each in the range of 0.4 ≧ L1 / L2, whereby distortion between the internal electrode layer and the ceramic layer is reduced, and the internal electrode layer is reduced. Residual stress can be reduced near the boundary between the chip and the ceramic layer, cracks can be prevented when this chip type varistor is soldered to the circuit board of equipment, and the electrical characteristics are not impaired. Effect that it is possible to obtain a highly sexual Multilayer Varistors, effects can be obtained.

【0009】本発明の請求項2に記載の発明は、セラミ
ック層一層当たりに積層されるNiOからなる内部電極
層の比率を、このセラミック層と内部電極層の重量の和
に対して、10wt%以下とする請求項1に記載のチッ
プ形積層バリスタであり、これにより、内部電極層とセ
ラミック層間にデラミネーションによる隙間が生じず、
半田付け時にクラックの発生を防止できるという作用、
効果が得られる。
According to a second aspect of the present invention, the ratio of the NiO internal electrode layer laminated per ceramic layer is 10 wt% based on the sum of the weight of the ceramic layer and the internal electrode layer. The chip-type laminated varistor according to claim 1, wherein a gap due to delamination does not occur between the internal electrode layer and the ceramic layer,
The effect of preventing the occurrence of cracks during soldering,
The effect is obtained.

【0010】[0010]

【発明の実施の形態】(実施の形態1)以下、実施の形
態1を用いて、本発明の特に請求項1に記載の発明につ
いて説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS (Embodiment 1) Hereinafter, the first embodiment of the present invention will be described with reference to the first embodiment.

【0011】図1は本発明の実施の形態1におけるチッ
プ形積層バリスタの一部を切り欠いた斜視図、図2は前
記図1中のX−X断面図、図3は前記図1中のY−Y断
面図である。図1〜図3において、1はチップ形積層バ
リスタであり、このチップ形積層バリスタ1はSrTi
3を主成分とするセラミック層2とNiOを主成分と
する内部電極層3,4とを交互に積層し最上段、最下段
にセラミック層5,6を積層し焼結して焼結体7を形成
し、この焼結体7の表面に前記内部電極層3,4とそれ
ぞれ接続した外部電極8,9を形成した構成となってい
る。
FIG. 1 is a partially cutaway perspective view of a chip-type laminated varistor according to a first embodiment of the present invention, FIG. 2 is a sectional view taken along line XX in FIG. 1, and FIG. It is YY sectional drawing. 1 to 3, reference numeral 1 denotes a chip-type multilayer varistor.
The ceramic layer 2 mainly composed of O 3 and the internal electrode layers 3 and 4 mainly composed of NiO are alternately laminated, and the ceramic layers 5 and 6 are laminated and sintered on the uppermost and lowermost layers. 7 and external electrodes 8 and 9 connected to the internal electrode layers 3 and 4 respectively are formed on the surface of the sintered body 7.

【0012】そして、前記焼結体7において、前記内部
電極層3,4の最上段層10から最下段層11までの厚
みをT2、最上段と最下段のセラミック層5,6の厚み
をそれぞれT1として、前記T1,T2をそれぞれ0.
4≦T1/T2であり焼結体7の前面12から背面13
方向に延長する内部電極層3,4の幅寸法をW2、前記
焼結体の前面12から内部電極層3,4までの寸法、及
び前記焼結体の背面13から内部電極層3,4までの寸
法をそれぞれW1として、W1,W2をそれぞれ0.4
≦W1/W2の範囲であり、また、焼結体7の一端14
から他端15に向けて延長してこの焼結体7の他端15
との間にL1の隔たりを形成した第1の内部電極層3
と、焼結体の他端15から一端14に向けて延長してこ
の燒結体7の一端14との間にL1の隔たりを形成した
第2の内部電極層4とを形成し、前記第1の内部電極層
3と第2の前記内部電極層4とを重なり合うL2の寸法
を構成しL1,L2をそれぞれ0.4≦L1/L2の範
囲としたチップ形積層バリスタを構成した。
In the sintered body 7, the thickness from the uppermost layer 10 to the lowermost layer 11 of the internal electrode layers 3, 4 is T2, and the thickness of the uppermost and lowermost ceramic layers 5, 6 is T2. As T1, T1 and T2 are each set to 0.
4 ≦ T1 / T2, and the front surface 12 to the rear surface 13 of the sintered body 7
The width dimension of the internal electrode layers 3 and 4 extending in the direction is W2, the dimension from the front surface 12 of the sintered body to the internal electrode layers 3 and 4, and the rear surface 13 of the sintered body to the internal electrode layers 3 and 4. Is W1 and W1 and W2 are each 0.4
≦ W1 / W2, and one end 14 of the sintered body 7
From the other end 15 of the sintered body 7
Internal electrode layer 3 having a distance L1 between the first internal electrode layer 3 and the first internal electrode layer 3
And a second internal electrode layer 4 extending from the other end 15 of the sintered body toward the one end 14 to form a gap of L1 between the one end 14 of the sintered body 7 and the first internal electrode layer 4. The internal electrode layer 3 and the second internal electrode layer 4 have a size of L2 overlapping with each other, and a chip type laminated varistor in which L1 and L2 are each in the range of 0.4 ≦ L1 / L2.

【0013】以上のように構成された積層セラミックバ
リスタ1について、以下にその製造方法を記載する。
The manufacturing method of the multilayer ceramic varistor 1 configured as described above will be described below.

【0014】先ず、主成分SrTiO3に半導体化材と
してNb,Ta,CaをそれぞれNb25,Ta25
CaCO3に換えて、電圧非直線特性改良材としてM
n,AlをそれぞれMnCO3,Al23に換えて、焼
結助剤としてSiをSiO2に換えて(表1)に示す組
成となるようにそれぞれ規定秤量して混合を行った後、
大気雰囲気中の1100℃の温度で仮焼を行った。
First, Nb, Ta, and Ca as semiconductor materials are added to the main component SrTiO 3 as Nb 2 O 5 , Ta 2 O 5 ,
In place of CaCO 3 , M
n, instead Al to each MnCO 3, Al 2 O 3, the Si as a sintering aid in place of the SiO 2 after mixing each prescribed weighed so as to have the composition shown in Table 1,
Calcination was performed at a temperature of 1100 ° C. in an air atmosphere.

【0015】[0015]

【表1】 [Table 1]

【0016】次に、仮焼済み材料の粒径が0.6〜0.
7μmとなるようにボールミルでそれぞれ微粉砕を行
い、得られた材料粉末にバインダー、分散剤、可塑剤等
を加え混練しスラリーを作製した後、公知のドクターブ
レード法を用いそれぞれ厚さ50μmのセラミックグリ
ーンシートを作製した。
Next, the particle size of the calcined material is 0.6 to 0.1.
After finely pulverizing each with a ball mill so as to have a thickness of 7 μm, a binder, a dispersant, a plasticizer and the like are added to the obtained material powder and kneaded to prepare a slurry, and then a 50 μm-thick ceramic is formed using a known doctor blade method. A green sheet was produced.

【0017】次いで、(表2)に示すように、セラミッ
ク層2と内部電極層3,4との寸法W1,W2,L1,
L2の位置に前記内部電極層3を、スクリーン印刷し、
内部電極層3を付設したセラミックグリーンシートを、
内部電極層3の長手方向に一層毎交互にずらしながら積
層し、積層した後、この積層体の最上段と最下段にT1
/T2=0.4になるセラミックグリーンシートを積層
加圧し積層体グリーンブロックを作製した。
Next, as shown in Table 2, the dimensions W1, W2, L1,
Screen printing the internal electrode layer 3 at the position of L2,
The ceramic green sheet provided with the internal electrode layer 3 is
The layers are laminated while being alternately shifted one by one in the longitudinal direction of the internal electrode layer 3, and after laminating, T1 is placed on the uppermost and lowermost layers of the laminate.
Ceramic green sheets satisfying /T2=0.4 were laminated and pressed to produce a laminated green block.

【0018】また、同時にスクリーン印刷する内部電極
層3の厚みを調整して(表2)の焼結体中のNiO含有
量とセラミック層2の一層当たりのNiO含有量を得
た。
At the same time, the thickness of the internal electrode layer 3 to be screen-printed was adjusted to obtain the NiO content in the sintered body (Table 2) and the NiO content per one ceramic layer 2.

【0019】[0019]

【表2】 [Table 2]

【0020】次に、前記積層体グリーンブロックを焼成
後の寸法が縦2mm、横1.25mmの1×2タイプの
形状となるように切断し、内部電極層3,4の一方の端
部がその長手方向の相対向する両端面にセラミック層2
を挟んで一層おき交互に露出した積層体を形成した。
Next, the laminated green block is cut into a 1 × 2 type shape having a size of 2 mm long and 1.25 mm wide after firing, and one end of each of the internal electrode layers 3 and 4 is cut. A ceramic layer 2 is provided on both end surfaces facing each other in the longitudinal direction.
A layered body was formed alternately and exposed every other layer.

【0021】次いで、上記積層体を大気雰囲気中の80
0℃の温度での脱バイした後に還元雰囲気中の1215
℃の温度で焼成を行い焼結体7を作製した。
Next, the above-mentioned laminate is placed in an air atmosphere at 80.degree.
After debubbling at a temperature of 0 ° C, 1215 in a reducing atmosphere
The sintering was performed at a temperature of ° C. to produce a sintered body 7.

【0022】その後、焼結体7の両端面に露出した内部
電極層3,4と電気的に接続するようにAgを主成分と
する電極ペーストを塗布し外部電極8,9を800℃の
大気雰囲気中で焼き付けるとともに、焼結体の再酸化を
同時に行った。
Thereafter, an electrode paste containing Ag as a main component is applied so as to be electrically connected to the internal electrode layers 3 and 4 exposed at both end surfaces of the sintered body 7, and the external electrodes 8 and 9 are exposed to air at 800 ° C. The sintered body was re-oxidized simultaneously with baking in the atmosphere.

【0023】次いで、半田付け性を確保するために前記
外部電極8,9上にニッケルメッキと半田メッキ(図示
せず)を施してチップ形積層バリスタ1を完成させた。
Next, nickel plating and solder plating (not shown) were applied to the external electrodes 8 and 9 to secure solderability, thereby completing the chip-type multilayer varistor 1.

【0024】得られたチップ形積層バリスタ1を、エポ
キシ基板に接着剤で固定し300℃に設定した半田槽に
5秒間浸漬した後、このチップ形積層バリスタ1のクラ
ック発生率とデラミネーション発生率を確認した結果を
(表2)に示した。
After the obtained chip-type laminated varistor 1 is fixed to an epoxy substrate with an adhesive and immersed in a solder bath set at 300 ° C. for 5 seconds, the crack occurrence rate and delamination occurrence rate of the chip-type laminated varistor 1 are determined. (Table 2).

【0025】(表2)に示す通り、焼結体7中のNiO
内部電極の含有量が8wt%を越えるとクラック発生率
が増加する。また、セラミック層2、最上段のセラミッ
ク層5、最下段のセラミック層6と内部電極層3,4の
寸法関係T1/T2、W1/W2,L1/L2がそれぞ
れ0.4を越えるとクラック発生率が増加する。これ
は、焼結体7中の内部電極層3,4とセラミック層2と
の熱膨張係数が異なるためこの積層体の焼成を経て焼結
体7のひずみが大きくなり、また、セラミック層2,
5,6と内部電極層3,4との境界近傍に内部応力を残
留してクラックが発生し易くなったものと思われ、クラ
ックの発生した試料を研磨し金属顕微鏡で内部を観察し
た結果、内部電極層3,4とセラミック層2,5,6間
に隙間が検知された。
As shown in Table 2, NiO in the sintered body 7
When the content of the internal electrode exceeds 8 wt%, the crack generation rate increases. If the dimensional relationships T1 / T2, W1 / W2, and L1 / L2 of the ceramic layer 2, the uppermost ceramic layer 5, the lowermost ceramic layer 6, and the internal electrode layers 3 and 4 each exceed 0.4, cracks occur. The rate increases. This is because the thermal expansion coefficients of the internal electrode layers 3 and 4 and the ceramic layer 2 in the sintered body 7 are different from each other, so that the sintered body 7 is greatly strained through firing of the laminated body.
It is considered that the internal stress remained in the vicinity of the boundary between 5, 6 and the internal electrode layers 3 and 4 and cracks were easily generated. As a result of polishing the cracked sample and observing the inside with a metallographic microscope, Gaps were detected between the internal electrode layers 3, 4 and the ceramic layers 2, 5, 6.

【0026】(実施の形態2)以下、実施の形態2を用
いて、本発明の特に請求項2に記載の発明について説明
する。尚、本実施の形態2のチップ形積層バリスタ1は
基本的に図1で示したチップ形積層バリスタ1と同じ構
成なので詳細な説明は省略する。
(Embodiment 2) Hereinafter, a second embodiment of the present invention will be described with reference to Embodiment 2. Note that the chip-type multilayer varistor 1 according to the second embodiment has basically the same configuration as the chip-type multilayer varistor 1 shown in FIG.

【0027】実施の形態2に示す通り、セラミック層2
の一層当たりに印刷するNiO電極ペーストの厚みを変
化させて(表3)に示すチップ形積層バリスタ1を作製
した。
As shown in the second embodiment, the ceramic layer 2
The chip-type laminated varistor 1 shown in Table 3 was produced by changing the thickness of the NiO electrode paste to be printed per layer.

【0028】[0028]

【表3】 [Table 3]

【0029】得られたチップ形積層バリスタ1を、エポ
キシ基板に接着剤で固定し300℃に設定した半田槽に
5秒間浸漬した後、このチップ形積層バリスタのクラッ
ク発生率とデラミネーション発生率を確認した結果を
(表3)に示した。
After the obtained chip-type laminated varistor 1 was fixed to an epoxy substrate with an adhesive and immersed in a solder bath set at 300 ° C. for 5 seconds, the crack occurrence rate and delamination occurrence rate of the chip-type laminated varistor were measured. The results are shown in Table 3.

【0030】(表3)に示す通り、セラミック層2の一
層当たりに含有するNiO内部電極の含有量を10wt
%以下の条件で、更に一層クラックやデラミネーション
の発生を防止できる。
As shown in (Table 3), the content of the NiO internal electrode contained in one layer of the ceramic layer 2 was 10 wt.
%, The occurrence of cracks and delamination can be further prevented.

【0031】[0031]

【発明の効果】以上のように本発明のチップ形積層バリ
スタは、SrTiO3を主成分とするセラミック層とN
iOを主成分とする内部電極層とを交互に積層し焼結し
た焼結体において、この焼結体中のNiO内部電極の含
有量及び内部電極層の寸法等を規定することにより、セ
ラミック層と内部電極層の境界近傍の内部応力を低減す
ることができて、このチップ形積層バリスタを機器の回
路基板に半田付けする際にクラックの発生やデラミネー
ションの発生を防止でき、電気特性を損なうことがな
く、信頼性の高いチップ形積層バリスタを得ることがで
きる。
As described above, the chip-type multilayer varistor of the present invention has a ceramic layer mainly composed of SrTiO 3 and an N-type laminated varistor.
In a sintered body obtained by alternately laminating and sintering internal electrode layers containing iO as a main component, the content of the NiO internal electrode in the sintered body, the dimensions of the internal electrode layer, and the like are defined, whereby the ceramic layer is formed. Internal stress near the boundary between the chip and the internal electrode layer can be reduced, preventing cracks and delamination from occurring when soldering this chip-type multilayer varistor to the circuit board of equipment, and impairing electrical characteristics Therefore, a highly reliable chip-type laminated varistor can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態1におけるチップ形積層バ
リスタの一部を切り欠いた斜視図
FIG. 1 is a partially cutaway perspective view of a chip-type multilayer varistor according to a first embodiment of the present invention.

【図2】同実施の形態1の図1中におけるX−X断面図FIG. 2 is a sectional view of the first embodiment taken along line XX in FIG. 1;

【図3】同実施の形態1の図1中におけるY−Y断面図FIG. 3 is a sectional view taken along the line YY in FIG. 1 of the first embodiment.

【図4】従来例のチップ形積層バリスタの一部を切り欠
いた斜視図
FIG. 4 is a perspective view of a chip-type laminated varistor of a conventional example with a part cut away.

【符号の説明】[Explanation of symbols]

1 チップ形積層バリスタ 2 セラミック層 3,4 内部電極層 5,6 最上段、最下段のセラミック層 7 焼結体 8,9 外部電極 10 最上段の内部電極層 11 最下段の内部電極層 12 焼結体の前面 13 焼結体の背面 14 焼結体の一端 15 焼結体の他端 DESCRIPTION OF SYMBOLS 1 Chip-type laminated varistor 2 Ceramic layer 3, 4 Internal electrode layer 5, 6 Uppermost and lowermost ceramic layer 7 Sintered body 8, 9 External electrode 10 Uppermost internal electrode layer 11 Lowermost internal electrode layer 12 Firing The front of the sintered body 13 The back of the sintered body 14 One end of the sintered body 15 The other end of the sintered body

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 SrTiO3を主成分とするセラミック
層とNiOを主成分とする内部電極層とを交互に積層し
焼結した焼結体において、この焼結体中のNiO含有量
を8wt%以下とし、前記焼結体中の内部電極層の最上
段層から最下段層までの厚みをT1、最上段と最下段の
セラミック層の厚みをT2として、前記T1,T2をそ
れぞれ0.4≧T1/T2の範囲とし、前記焼結体の前
面または背面から内部電極層まで離れた幅方向寸法をW
1、前記積層体の前面又は背面方向に重なり合う内部電
極層の寸法をW2として、W1,W2をそれぞれ0.4
≧W1/W2の範囲とし、前記焼結体の一端又は他端か
ら対向面に向けて延長して積層体の対向面と離れた長さ
方向寸法をL1、セラミック層を介して重なり合う内部
電極層の寸法をL2として、L1,L2をそれぞれ0.
4≧L1/L2の範囲としたチップ形積層バリスタ。
1. A sintered body obtained by alternately laminating and sintering a ceramic layer containing SrTiO 3 as a main component and an internal electrode layer containing NiO as a main component, wherein the NiO content in the sintered body is 8 wt%. T1 is the thickness from the uppermost layer to the lowermost layer of the internal electrode layers in the sintered body, and T2 is the thickness of the uppermost and lowermost ceramic layers in the sintered body. T1 / T2, and the width dimension away from the front or back surface of the sintered body to the internal electrode layer is W
1. The size of the internal electrode layer overlapping in the front or back direction of the laminate is W2, and W1 and W2 are each 0.4.
≧ W1 / W2, an internal electrode layer extending from one end or the other end of the sintered body toward the opposing surface and having a length dimension L1 apart from the opposing surface of the laminated body and overlapping via the ceramic layer Is L2, L1 and L2 are each set to 0.
A chip-type multilayer varistor having a range of 4 ≧ L1 / L2.
【請求項2】 セラミック層一層当たりに積層されるN
iOからなる内部電極層の比率を、このセラミック層と
内部電極層の重量の和に対して、10wt%以下とする
請求項1に記載のチップ形積層バリスタ。
2. An N layer laminated per ceramic layer
The chip type varistor according to claim 1, wherein the ratio of the internal electrode layer made of iO is 10 wt% or less with respect to the sum of the weights of the ceramic layer and the internal electrode layer.
JP2000146544A 2000-05-18 2000-05-18 Chip-type laminated varistor Pending JP2001326107A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000146544A JP2001326107A (en) 2000-05-18 2000-05-18 Chip-type laminated varistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000146544A JP2001326107A (en) 2000-05-18 2000-05-18 Chip-type laminated varistor

Publications (1)

Publication Number Publication Date
JP2001326107A true JP2001326107A (en) 2001-11-22

Family

ID=18652882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000146544A Pending JP2001326107A (en) 2000-05-18 2000-05-18 Chip-type laminated varistor

Country Status (1)

Country Link
JP (1) JP2001326107A (en)

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