JP2001314872A - Method for treating ammonia-containing wastewater discharged from semiconductor manufacturing process - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process, capable of efficiently separating ammonia in ammonia-containing wastewater at a low cost to decomposed the same. SOLUTION: A reverse osmosis membrane treatment process 10, a stripping treatment process 30 and a gas decomposition treatment process 50 are included. At first, ammonia-containing wastewater is subjected to reverse osmosis membrane treatment in the reverse osmosis membrane treatment process 10 to separate concentrated water. In the succeeding stripping treatment process 30, the concentrated water separated in the reverse osmosis membrane treatment process 10 is subjected to stripping treatment to take out ammonia gas. Thereafter, in the gas decomposition treatment process 50, the ammonia gas taken out in the stripping treatment process 30 is decomposed into molecular nitrogen and water using an ammonia decomposition catalyst.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating ammonia-containing waste water containing ammonia as a main component, which is discharged from a semiconductor manufacturing process.

[0002]

2. Description of the Related Art Conventionally, ammonia nitrogen contained in industrial wastewater such as semiconductor washing wastewater causes a problem of eutrophication at a discharge destination, and therefore, its removal has been demanded. As a method for treating ammoniacal nitrogen in an ammonia-containing wastewater containing ammonium as a main component, an activated sludge method using a microorganism, an ammonia stripping method, an ion exchange method, and the like are known.

[0003]

However, in the activated sludge method using microorganisms, ammonia in wastewater is nitrified by a biological reaction of microorganisms to nitrate, and the nitrate is converted into nitrogen gas by a biological reaction to form air. Therefore, it is necessary to maintain and manage microorganisms, and a vast site is required.
In addition, there is a problem that the processing of the excess sludge (dehydration, drying, incineration, etc.) is necessary because excess sludge of the microorganisms that have multiplied is generated.

[0004] In the ammonia stripping method,
Since ammonia is physically moved from water to the gas phase by adjusting the temperature and pH by using the solubility of ammonia, there is a problem that it is necessary to treat and recover ammonia gas after stripping. .

[0005] In the ion exchange method, ammonia is incorporated into a carrier excellent in ammonia adsorption.
The taken-in ammonia can be regenerated with a saline solution or the like, but there is a problem that it is necessary to treat and recover the ammonia in the regenerated water.

SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process capable of efficiently separating and decomposing ammonia in ammonia-containing wastewater at low cost. The purpose is to provide.

[0007]

According to the present invention, there is provided a method of treating ammonia-containing wastewater discharged from a semiconductor manufacturing process.
Reverse osmosis membrane treatment of ammonia-containing wastewater to separate permeated water and concentrated water, and stripping treatment of the concentrated water separated in the reverse osmosis membrane treatment step to take out ammonia gas It is characterized by including a stripping treatment step and a gas decomposition treatment step of decomposing the ammonia gas extracted in the stripping treatment step into molecular nitrogen and water using an ammonia decomposition catalyst.

In the method for treating ammonia-containing waste water discharged from a semiconductor manufacturing process according to the present invention, the ammonia-containing waste water is subjected to a reverse osmosis membrane treatment, and the concentrated water separated is stripped to take out ammonia gas. The ammonia gas can be efficiently separated from the ammonia-containing wastewater by decomposing the ammonia gas into molecular nitrogen and water using an ammonia decomposition catalyst,
The separated ammonia can be efficiently decomposed.
Further, the permeated water separated by the reverse osmosis membrane treatment of the ammonia-containing wastewater can be recovered as service water and reused.

Further, it is preferable that the permeated water separated in the reverse osmosis membrane treatment step is recovered as raw water in a pure water production apparatus. Thus, by collecting the permeated water separated in the reverse osmosis membrane treatment step as raw water of the pure water production apparatus,
Permeated water can be reused.

[0010] The reverse osmosis membrane treatment step comprises a primary reverse osmosis membrane treatment step of subjecting the ammonia-containing wastewater to a reverse osmosis membrane treatment to separate it into a primary permeate and a primary concentrated water. A second reverse osmosis membrane treatment step of subjecting the separated primary permeated water to a reverse osmosis membrane treatment and separating it into a second permeate and a second concentrated water, and the first concentrated water separated in the first reverse osmosis membrane treatment step is brined. A reverse osmosis membrane treatment and a brine reverse osmosis membrane treatment step of separating into a brine permeated water and a brine concentrated water, and wherein the brine concentrated water separated in the brine reverse osmosis membrane treatment step is sent to the stripping treatment step. Preferably, the secondary concentrated water separated in the secondary reverse osmosis membrane treatment step and the brine permeated water separated in the brine reverse osmosis membrane treatment step are sent to a stage preceding the primary reverse osmosis membrane treatment step. Thereby, the concentration rate of ammonia in the concentrated water (brine concentrated water) sent to the stripping treatment step can be efficiently increased.

In the stripping treatment step, the pH of the concentrated water separated in the reverse osmosis membrane treatment step is preferably adjusted to a range of 10.5 to 12, and the stripping treatment is preferably performed. As described above, in the stripping treatment step, the pH of the concentrated water separated in the reverse osmosis membrane treatment step is set to 1
By adjusting the concentration in the range of 0.5 to 12, ammonium ions in the concentrated water can be changed to free ammonia, and the ammonia in the concentrated water can be gasified efficiently.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to the present invention will be described in detail with reference to the drawings.

FIG. 1 is a system diagram showing a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention. FIG. 2 is a system diagram showing a reverse osmosis membrane treatment process. FIG. 3 is a system diagram showing the stripping process, and FIG. 4 is a system diagram showing the gas decomposition process. As shown in FIG. 1, the treatment method of the ammonia-containing wastewater includes a reverse osmosis membrane treatment step 10 for increasing the ammonia concentration, a stripping treatment step 30 for removing the ammonia gas, and decomposing and purifying the ammonia gas. A gas decomposition process step 50 for extracting gas is included.

First, the reverse osmosis membrane treatment step 10 will be described with reference to FIG. Ammonia-containing wastewater discharged from the semiconductor manufacturing process is passed through the activated carbon tower 11 as pretreatment. By passing the ammonia-containing wastewater through the activated carbon tower 11, the hydrogen peroxide solution contained in the ammonia-containing wastewater is decomposed. The ammonia-containing wastewater from which the hydrogen peroxide solution has been decomposed in the activated carbon tower 11 is passed through a filter 12 as a pretreatment, and the filtered ammonia-containing wastewater is sent to a wastewater storage tank 13. In the filter 12, suspended substances contained in the ammonia-containing wastewater are removed.

Next, the ammonia-containing wastewater in the wastewater storage tank 13 that has been subjected to the pretreatment described above is passed through the heat exchanger 14. In the heat exchanger 14, the water passing temperature is maintained at a predetermined temperature (for example, about 15 ° C. or higher in the present embodiment).
The ammonia-containing wastewater at a predetermined temperature in the heat exchanger 14 is passed through a microfilter 15, and the filtered ammonia-containing wastewater is sent to a pH adjusting facility 16. Precision filter 1
5 is a reverse osmosis membrane (RO membrane) 17, 1
8 and 19 are to be protected. pH adjustment equipment 1
Reference numeral 6 denotes a reverse osmosis membrane (RO membrane) 17
It adjusts the pH of the water passing through 8, 19, and adjusts the pH of the ammonia-containing wastewater sent to the reverse osmosis membranes (RO membranes) 17, 18, 19 to about 7.

The ammonia-containing wastewater whose pH has been adjusted by the pH adjusting equipment 16 is supplied to reverse osmosis membranes (RO membranes) 17, 18,
Pass water through 19. Reverse osmosis membrane (RO membrane) 17, 18, 19
Is used to separate ammonia-containing wastewater into permeated water and concentrated water by reverse osmosis membrane treatment.
O membrane 17, a secondary reverse osmosis membrane (secondary RO membrane) 18, and a brine reverse osmosis membrane (brine RO membrane) 19. First, the ammonia-containing wastewater sent from the pH adjusting equipment 16 is passed through the primary reverse osmosis membrane 17 to be separated into primary permeated water and primary concentrated water (primary reverse osmosis membrane treatment step).

Thereafter, the primary concentrated water separated by the primary reverse osmosis membrane 17 is passed through a brine reverse osmosis membrane 19 to be separated into brine permeated water and brine concentrated water (brine reverse osmosis membrane treatment step). Then, the brine-concentrated water is supplied to the stripping process step 30 (concentrated water tank 31), while the brine-permeated water is supplied to the drainage storage tank 13. In addition, primary reverse osmosis membrane 1
The primary permeated water separated in 7 is passed through the secondary reverse osmosis membrane 18 to be separated into secondary permeated water and secondary concentrated water (secondary reverse osmosis membrane treatment step), and the secondary permeated water is separated. The secondary concentrated water is sent to the drainage storage tank 13 while being recovered as raw water of the pure water production apparatus 20.

Next, FIG.
It will be described based on. Concentrated water (brine concentrated water) obtained in reverse osmosis membrane treatment step 10 (brine reverse osmosis membrane treatment step)
First, water is supplied from the concentrated water tank 31 to the pH adjustment tank 32. In the pH adjusting tank 32, the pH of the concentrated water is adjusted to a range of 10.5 to 12 (about 11 in the present embodiment) using caustic soda. Thus, the pH of the concentrated water
Is adjusted to the range of 10.5 to 12, ammonium ions in the concentrated water are changed into free ammonia, and the ammonia in the concentrated water can be efficiently gasified in the subsequent stripping treatment. Also,
In the pH adjusting tank 32, the polymer concentration with respect to the concentrated water is set to 3
A scale dispersant of sodium polyacrylate having a molecular weight of about 5000 is added so as to be 0 mg / l. Thus, by adding the scale dispersant to the concentrated water,
Precipitation of calcium can be suppressed.

After adjusting the pH in the pH adjusting tank 32 and adding the scale dispersant, the concentrated water is removed from the heat exchanger 3.
Pass water through 3. The heat exchanger 33 exchanges heat with treated water (denitrified treated water) after stripping and separation of ammonia, and the concentrated water passing temperature becomes a predetermined temperature (in the present embodiment, (For example, about 85 ° C.). As described above, by raising the temperature of the concentrated water sent to the stripping tower 34 in advance, it is possible to save energy when performing the stripping process.
Further, by using the denitrified treated water as the heat source in the heat exchanger 33, it is not necessary to newly provide a heat source, and the equipment can be downsized.

The concentrated water at a predetermined temperature in the heat exchanger 33 is supplied to an upper part of the stripping tower 34, and steam is supplied to a lower part of the stripping tower 34 to perform a stripping process. A gas mainly composed of water vapor and ammonia gas in the stripping tower 34 is sucked from the top of the stripping tower 34 by a blower or the like, and is sent to a gas decomposition process step 50. The denitrified treated water is supplied to a stripping tower 34.
After the water is taken out from the bottom of the chilled water and sent to the heat exchanger 33 for cooling, the pH of the treated water is adjusted by the pH adjusting equipment 35.

Next, the gas decomposition process 50 will be described with reference to FIG. First, to a gas containing steam and ammonia gas as main components obtained in the stripping process step 30,
The air heated in the heat exchanger 51 is mixed to obtain a mixed gas. Air is an oxygen source for decomposing ammonia into molecular nitrogen and water. Next, after raising the temperature of the mixed gas in the heat exchanger 52, the mixed gas is mixed with the recycle gas from the catalytic reactor 53 to set the temperature of the mixed gas to about 350 ° C., and is sent to the catalytic reactor 53.

The catalytic reactor 53 has an ammonia decomposition catalyst and obtains a purified gas containing molecular nitrogen and water (steam) decomposed by the reaction of ammonia with oxygen. A part of the purified gas is heated in the heating furnace 54 and then mixed with the mixed gas as the above-mentioned recycled gas. The remaining purified gas is used as a heat source for the heat exchangers 52 and 51 by the heat exchanger 5.
After being sent to 2, 51 and cooled, it is released to the atmosphere.

The ammonia decomposition catalyst includes an oxide containing at least one selected from the group consisting of titanium, zirconium, silicon, aluminum, cerium, and iron as a catalyst A component, and platinum as a catalyst B component.
It is preferable to use one containing at least one metal or oxide selected from the group consisting of palladium, rhodium, ruthenium, iridium, vanadium, tungsten, molybdenum, chromium, manganese, and copper.

The method for treating ammonia-containing wastewater according to the present embodiment includes a reverse osmosis membrane treatment step 10, a stripping treatment step 30, and a gas decomposition treatment step 50. The concentrated water is stripped to remove ammonia gas,
By decomposing the extracted ammonia gas into molecular nitrogen and water using an ammonia decomposition catalyst, the ammonia gas can be efficiently separated from the ammonia-containing wastewater, and the separated ammonia is decomposed efficiently. be able to.

Further, the permeated water (secondary permeated water) separated in the reverse osmosis membrane treatment step 10 (secondary reverse osmosis membrane treatment step) is recovered as raw water of the pure water production apparatus 20, so that the permeated water is recovered. Reuse becomes possible.

The reverse osmosis membrane treatment step 10 includes a primary reverse osmosis membrane treatment step (primary reverse osmosis membrane 17), a secondary reverse osmosis membrane treatment step (secondary reverse osmosis membrane 18), and a brine reverse osmosis membrane treatment. (Brine reverse osmosis membrane 19), and while the brine concentrated water separated in the brine reverse osmosis membrane treatment step is sent to the stripping treatment step 30, the secondary water separated in the secondary reverse osmosis membrane treatment step By sending the concentrated water and the brine permeated water separated in the brine reverse osmosis membrane treatment step to the former stage (drainage storage tank 13) of the primary reverse osmosis membrane treatment step, the concentrated water (brine concentrated water) sent to the stripping treatment step 30 ) Can be efficiently increased.

[0027]

The present invention will be described below more specifically with reference to examples.

According to the method shown in FIG. 2 of the embodiment, a wastewater containing ammonia having an ammonia (NH ₄ ) concentration of 311 mg / l was subjected to reverse osmosis membrane treatment.

First, the ammonia-containing waste water is supplied at a flow rate of 67.
Water was supplied at m ³ / h. As shown in FIG. 5, the water quality of the ammonia-containing wastewater had a pH of 8.7 and an electric conductivity of 2150 μS / cm. The TOC concentration was 0.39 mg / l, the Na concentration was 14 mg / l, the Ca concentration was 2 mg / l, the Cl concentration was 55 mg / l, and the SO ₄ concentration was 744.
mg / l, NO ₃ concentration 4.6 mg / l, SiO ₂ concentration 0.
It was 7 mg / l.

Concentration of brine obtained by reverse osmosis membrane treatment
NH of water_FourThe concentration was 3400 m, as shown in FIG.
g / l of ammonia-containing wastewater before reverse osmosis membrane treatment.
NH _FourConcentrated about 10 times compared to the concentration of 311mg / l
ing. In addition, secondary permeated water obtained by reverse osmosis membrane treatment
NH_FourThe concentration was 2 mg / l.

As shown in FIG. 5, the water quality of the secondary permeated water obtained by the reverse osmosis membrane treatment was pH 6.3, electric conductivity 5 μS / cm, TOC concentration 0.06 mg / l, N
a concentration less than 0.1 mg / l, Ca concentration less than 0.1 mg / l, Cl concentration 0.1 mg / l, SO ₄ concentration 0.1 mg / l
less than l, NO ₃ concentration of less than 0.1 mg / l, less than SiO ₂ concentration 0.1 mg / l, the amount of ions is small and was sufficiently reusable water.

Next, according to the method shown in FIG. 3 of the embodiment, the NH ₄ concentration 34 obtained by the above-described reverse osmosis membrane treatment is used.
A stripping treatment of 00 mg / l brine concentrated water was performed.

First, the brine concentrated water was supplied at a flow rate of 6700
Water was sent at kg / h. The quality of this brine concentrate is
As shown in FIG. 6, when the pH is 7 and the Ca concentration is 23
mg / l.

In the pH adjusting tank 32, a 25% aqueous solution of caustic soda was added at a flow rate of 180 kg / h. In the heat exchanger 33, the temperature of the concentrated water before being supplied to the stripping tower 34 was increased from 30 ° C to 85 ° C. The pH of the concentrated water before being supplied to the stripping tower 34 is 11
Met.

The flow rate to the stripping tower 34 is 760 k
g / h of steam was also supplied to perform stripping treatment, and an ammonia-containing gas at a flow rate of 520 kg / h was taken out from the top of the stripping tower. The concentration of the extracted ammonia-containing gas, as shown in FIG. 6, in terms of NH ₃ 44000vol. ppm, and the temperature was 100 ° C. The quality of the treated water taken out of the stripping tower 34 at a flow rate of 7110 kg / h has a pH of 9.6, an NH ₄ concentration of 19 mg / l,
a The concentration was 21 mg / l. The treated water taken out of the stripping tower 34 is supplied to the heat exchanger 33 for 10 times.
Cooled from 0 ° C to 45 ° C.

Next, according to the method shown in FIG. 4 of the embodiment, the NH ₃ concentration obtained by the above-mentioned stripping treatment is 44000 vol. ppm.

First, this ammonia gas was supplied at a flow rate of 650 N
It was supplied at m ³ / h. The temperature of this ammonia gas is 1
The temperature was 00 ° C., and the H ₂ O concentration was 95.6 vol%, as shown in FIG.

[0038] Ammonia gas flow rate 650 nm ³ / h as described above, were mixed air flow 500 Nm ³ / h. The flow rate of the mixed gas before the catalytic reactor (filled with 1.1 m ^{3 of} catalyst) 53 was 3560 Nm ³ / h, and the temperature was 355 ° C.
And the NH ₃ concentration was 8000 vol. ppm.

From the catalyst reactor 53, a flow rate of 2400 Nm
³ / h recycled gas (part of purified gas) and flow rate 1
A purified gas of 150 Nm ³ / h was obtained. As shown in FIG. 7, the NH ₃ concentration of the recycled gas and the purified gas was 0.3 vol. ppm, and ammonia was almost completely decomposed. Further, NO _X concentration of the recycle gas and the purge gas, as shown in FIG. 7, 13 vol.
is ppm, NO _X did not include most of the time.

[0040]

As described in detail above, according to the present invention, ammonia-containing wastewater is subjected to a reverse osmosis membrane treatment, and the concentrated water separated is stripped to take out ammonia gas. By decomposing ammonia gas into molecular nitrogen and water using an ammonia decomposition catalyst, ammonia gas can be efficiently separated from ammonia-containing wastewater, and the separated ammonia is efficiently decomposed and removed. And the processing cost can be reduced.

Further, according to the present invention, the permeated water separated by subjecting the ammonia-containing waste water to reverse osmosis membrane treatment can be recovered as service water and reused.

As a result, according to the present invention, there is provided a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process, capable of efficiently separating and decomposing ammonia in ammonia-containing wastewater at low cost. can do.

[Brief description of the drawings]

FIG. 1 is a system diagram showing a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

FIG. 2 is a system diagram showing a reverse osmosis membrane treatment step included in a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

FIG. 3 is a system diagram showing a stripping process included in a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

FIG. 4 is a system diagram showing a gas decomposition process included in the method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

FIG. 5 is a table showing an example of a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

FIG. 6 is a chart showing an example of a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

FIG. 7 is a chart showing an example of a method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to an embodiment of the present invention.

[Explanation of symbols]

10 reverse osmosis membrane treatment step, 11 activated carbon tower, 12 filter, 13 drainage tank, 14 heat exchanger, 15 microfilter, 16 pH adjustment equipment, 17 primary reverse osmosis membrane, 18
Secondary reverse osmosis membrane, 19: brine reverse osmosis membrane, 20: pure water production apparatus, 30: stripping treatment step, 31: concentrated water tank, 32: pH adjustment tank, 33: heat exchanger, 34: stripping tower, 35: treated water pH adjustment equipment, 50: gas decomposition treatment step, 51: heat exchanger, 52: heat exchanger, 53 ...
Catalytic reactor, 54 ... heating furnace.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) C02F 9/00 502 C02F 9/00 502F 502R 503 503G 504 504B 504D 504E (71) Applicant 000004400 Organo Corporation Tokyo 1-2-8 Shinsuna 1-chome, Koto-ku, Tokyo (72) Inventor Minami Hiro, 2201 Kamioda, Kokita-cho, Kishima-gun, Saga Prefecture Sumitomo Metal Industries Co., Ltd.Sticix Business Headquarters (72) Inventor Takefumi Ikukata, Kishima-gun, Saga Prefecture 2201 Kamikoda, Kokita-machi Sumitomo Metal Industries Co., Ltd., Sitix Business Headquarters (72) Inventor Masafumi Yanaka 2201, Kamikada-cho, Ekita-cho, Kishima-gun, Saga Prefecture Sumitomo Metal Industries Co., Ltd. Sichix Business Headquarters (72) Inventor Hitoshi Kato 5-9-11 Kita Shinagawa, Shinagawa-ku, Tokyo Sumitomo Within Heavy Machinery Co., Ltd. (72) Inventor Fumio Kohama 5-11-11 Kita-Shinagawa, Shinagawa-ku, Tokyo Sumitomo Heavy Industries, Ltd. (72) Inventor Kaoru Matsushima 992 Okihama, Nishioki, Aboshi-ku, Himeji-shi, Hyogo 1 Nippon Shokubai Co., Ltd. (72) Inventor Mitsuaki Ikeda 992, Nishioki, Okihama-shi, Aboshi-ku, Himeji-shi, Hyogo 1 Nippon Shokubai Co., Ltd. (72) Inventor Shigeto Yoshida 1-2-8 Shinsuna, Koto-ku, Tokyo Organo Stock In-house (72) Inventor Yoichi Matsumoto 1-2-8 Shinsuna, Koto-ku, Tokyo Organo Corporation F-term (reference) 4D006 GA03 GA07 KA01 KA12 KA52 KA54 KA55 KA56 KA63 KA72 KB12 KB14 KB17 KD01 KD09 KD19 KE15R MB02 PA02 PB08 PB70 PC01 4D037 AA13 AB12 BA23 BB05 BB06 CA01 CA02 CA03 CA14 4D038 AA08 AB29 BA04 BB01 BB03 BB06 BB09 BB13 BB16 BB17

Claims (4)

[Claims] 1. A reverse osmosis membrane treatment step of treating an ammonia-containing wastewater with a reverse osmosis membrane to separate it into permeated water and concentrated water; and a stripping treatment of the concentrated water separated in the reverse osmosis membrane treatment step. A stripping treatment step of extracting ammonia gas, and a gas decomposition treatment step of decomposing the ammonia gas extracted in the stripping treatment step into molecular nitrogen and water using an ammonia decomposition catalyst. A method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process. 2. The method according to claim 1, wherein the permeated water separated in the reverse osmosis membrane treatment step is recovered as raw water of a pure water production apparatus. Wastewater treatment method. 3. The reverse osmosis membrane treatment step, wherein the ammonia-containing wastewater is subjected to reverse osmosis membrane treatment to separate it into primary permeated water and primary concentrated water, and the primary reverse osmosis membrane treatment step. A secondary reverse osmosis membrane treatment step of subjecting the primary permeated water separated in step 2 to reverse osmosis membrane treatment and separating it into secondary permeate water and secondary concentrated water, and separated in the primary reverse osmosis membrane treatment step A brine reverse osmosis membrane treatment step of treating the primary concentrated water with a brine reverse osmosis membrane to separate it into brine permeated water and brine concentrated water, wherein the brine concentrated water separated in the brine reverse osmosis membrane treatment step To the stripping treatment step, while the secondary concentrated water separated in the secondary reverse osmosis membrane treatment step and the brine permeated water separated in the brine reverse osmosis membrane treatment step are subjected to the primary reverse Osmosis membrane process Method of treating ammonia-containing waste water discharged from a semiconductor manufacturing process according to claim 1 or claim 2, characterized in that sending the stage. 4. The stripping treatment step comprises adjusting the pH of the concentrated water separated in the reverse osmosis membrane treatment step to 1
The method for treating ammonia-containing wastewater discharged from a semiconductor manufacturing process according to any one of claims 1 to 3, wherein the stripping treatment is performed after adjusting to a range of 0.5 to 12. .