JP2001312986A5 - - Google Patents
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- Publication number
- JP2001312986A5 JP2001312986A5 JP2000131521A JP2000131521A JP2001312986A5 JP 2001312986 A5 JP2001312986 A5 JP 2001312986A5 JP 2000131521 A JP2000131521 A JP 2000131521A JP 2000131521 A JP2000131521 A JP 2000131521A JP 2001312986 A5 JP2001312986 A5 JP 2001312986A5
- Authority
- JP
- Japan
- Prior art keywords
- magnetic pole
- electron gun
- gun according
- magnetic
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims 1
Claims (5)
該電磁レンズは複数の磁極を有し,
該複数の磁極は、少なくとも1つの可動磁極と、該可動磁極に対して相対的に固定された固定磁極とを備えることを特徴とする電子銃。An electron source, and an electrostatic lens and an electromagnetic lens for controlling the electron source,
The electromagnetic lens has a plurality of magnetic poles,
The plurality of magnetic poles include at least one movable magnetic pole and a fixed magnetic pole fixed relative to the movable magnetic pole.
前記可動磁極を可動させるためのモータを備えたことを特徴とする請求項1記載の電子銃。The electron gun according to claim 1,
The electron gun according to claim 1, further comprising a motor for moving the movable magnetic pole.
前記電磁レンズを構成する該可動磁極に高電圧が印加され,該固定磁極が接地電位であることを特徴とする請求項1記載の電子銃。The electron gun according to claim 1,
2. The electron gun according to claim 1, wherein a high voltage is applied to the movable magnetic pole constituting the electromagnetic lens, and the fixed magnetic pole is at a ground potential.
前記第1の磁極と前記第2の磁極との空間に充填された非磁性の金属を備えたことを特徴とする電子銃。The electron gun according to claim 4, wherein
An electron gun comprising a nonmagnetic metal filled in a space between the first magnetic pole and the second magnetic pole.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000131521A JP3900792B2 (en) | 2000-04-26 | 2000-04-26 | Electron gun |
US09/652,606 US6583413B1 (en) | 1999-09-01 | 2000-08-30 | Method of inspecting a circuit pattern and inspecting instrument |
US10/404,451 US7098455B2 (en) | 1999-09-01 | 2003-04-02 | Method of inspecting a circuit pattern and inspecting instrument |
US11/452,989 US7397031B2 (en) | 1999-09-01 | 2006-06-15 | Method of inspecting a circuit pattern and inspecting instrument |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000131521A JP3900792B2 (en) | 2000-04-26 | 2000-04-26 | Electron gun |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005218166A Division JP3901199B2 (en) | 2005-07-28 | 2005-07-28 | SEM circuit pattern inspection system |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001312986A JP2001312986A (en) | 2001-11-09 |
JP2001312986A5 true JP2001312986A5 (en) | 2005-03-03 |
JP3900792B2 JP3900792B2 (en) | 2007-04-04 |
Family
ID=18640403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000131521A Expired - Lifetime JP3900792B2 (en) | 1999-09-01 | 2000-04-26 | Electron gun |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3900792B2 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006324119A (en) * | 2005-05-19 | 2006-11-30 | Hitachi Ltd | Electron gun |
US8159118B2 (en) | 2005-11-02 | 2012-04-17 | United Technologies Corporation | Electron gun |
JP2008175726A (en) * | 2007-01-19 | 2008-07-31 | Tohoku Univ | Electron beam irradiating device |
JP6095338B2 (en) * | 2012-11-28 | 2017-03-15 | 株式会社日立製作所 | Electron gun and charged particle beam device |
JP6218403B2 (en) * | 2013-03-15 | 2017-10-25 | 株式会社マーストーケンソリューション | X-ray tube equipped with a field emission electron gun and X-ray inspection apparatus using the same |
JP6779847B2 (en) | 2017-09-11 | 2020-11-04 | 株式会社ニューフレアテクノロジー | Charged particle device, charged particle drawing device and charged particle beam control method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57151159A (en) * | 1981-03-13 | 1982-09-18 | Internatl Precision Inc | Objective lens of electron beam device |
JPS60127645A (en) * | 1983-12-14 | 1985-07-08 | Hitachi Ltd | Field emission type electron gun |
JPS61131351A (en) * | 1984-11-30 | 1986-06-19 | Internatl Precision Inc | Objective lens of electron beam device |
JP2775071B2 (en) * | 1989-02-22 | 1998-07-09 | 日本電信電話株式会社 | Charged particle beam generator |
JP2835265B2 (en) * | 1992-08-27 | 1998-12-14 | 株式会社東芝 | Magnetic field immersion type electron gun and method of operating magnetic field immersion type electron gun |
JPH06139976A (en) * | 1992-10-21 | 1994-05-20 | Jeol Ltd | Field emission electron gun |
-
2000
- 2000-04-26 JP JP2000131521A patent/JP3900792B2/en not_active Expired - Lifetime
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