CN109234699A - Arc source magnetic field device, adjusting method and arc ion plating film device - Google Patents
Arc source magnetic field device, adjusting method and arc ion plating film device Download PDFInfo
- Publication number
- CN109234699A CN109234699A CN201811210482.8A CN201811210482A CN109234699A CN 109234699 A CN109234699 A CN 109234699A CN 201811210482 A CN201811210482 A CN 201811210482A CN 109234699 A CN109234699 A CN 109234699A
- Authority
- CN
- China
- Prior art keywords
- target
- magnetic field
- electromagnetic coil
- arc
- field device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
Abstract
A kind of adjusting method of arc source magnetic field device, arc source magnetic field device includes target, is set to the target side and along the target width direction successively spaced multiple electromagnetic coils, according to the on-off of the electric current of timing control difference electromagnetic coil, the magnetic field for generating the multiple electromagnetic coil is moved back and forth relative to the target width direction；And apply the electric current of periodical positive negative pulse stuffing variation to the electromagnetic coil for being chosen to be on state, there is arc spot perpendicular to the reciprocating motion within the scope of target width.The present invention also provides the arc ion plating film devices of the arc source magnetic field device and application arc source magnetic field device.Target utilization can be improved in the adjusting method of the arc source magnetic field device, the arc ion plating film device and the arc source magnetic field device.
Description
Technical field
The present invention relates to the adjustings of coating preparation field more particularly to a kind of arc source magnetic field device, the arc source magnetic field device
Method and arc ion plating film device.
Background technique
The advantages of arc ion plating (aip) is widely used in the surface coating processing of tool and mould, has has: ionization level height,
Particle deposition energy is high, to obtain high rigidity, the film layer of high-bond and outstanding deposition efficiency.Although advantage is numerous,
But have a yoke to limit its application extension: film layer has bulky grain, rough surface.The technology is existed by heat-Field Electron Emission
Target surface forms arc spot, ejects electronics, ion and liquid atomic group and flies to workpiece surface deposition film forming, wherein the liquid ejected
Atomic group becomes bulky grain insertion coating after depositing to workpiece surface cooling, influences the stability of coating.
Numerous studies prove that accelerating the significant reduction drop of spots moving speed energy generates, the macroscopic motion direction of target surface arc spot
And speed is influenced by the magnetic-field component for being parallel to target surface, i.e. magnetic field cross stream component.The characteristics of motion of arc spot is deferred to: (1) acute angle method
Then: acute angular areas folded by the target surface of the magnetic line of force and target 1 is directed toward in the direction of 6 drift motion of arc spot, as shown in Figure 1；(2) anti-peace
Train power movement: arc spot 6 is moved along the opposite direction of Ampere force, and movement velocity increases with the cross stream component of magnetic field strength and accelerated,
As shown in Figure 2.
According to above-mentioned rule, the magnetic field strength cross stream component at the top of arch magnetic field is maximum, and the corresponding arc spot in magnetic field is in target surface
Movement velocity is most fast, and can drift about from the arc spot that target surface known to acute angle rule generates and converge to the target on opposite at the top of arch magnetic field
Face region.Compared to the arc source that magnetic field is not added, this arc spot speed moved under arch magnetic field will faster, and natural drop is relatively more
It is few, but collect in the arc spot moved at one and also result in the serious ablation of target at the portion, and then ablation degree is light in other regions
Very much, it will lead to target surface over time and V-groove occur, target utilization is low.
Current most common method is to improve magnetic field strength at the top of the arch magnetic field of target material surface, accelerates spots moving speed
Degree reduces drop and generates；Flat as far as possible and wide magnetic field at the top of arch magnetic field is constructed, to widen spots moving region, even if such as
This, the width improvement in spots moving region is still limited, and ablated area is still more concentrated, and target utilization is not high.In addition, square
The magnetic field of shape target straight way part (i.e. within the scope of target length) usually with racetrack portion (in the width range of target both ends) magnetic field
Difference causes arc spot speed different, second is that arch magnetic field top width is different, even if straight way part first is that magnetic field strength is different
Relatively flat width at the top of arch magnetic field, but bend is difficult to accomplish, racetrack portion is caused to be easy to appear zanjon.
Accordingly, it is desirable to provide improving the target utilization of arc source magnetic field device.
Summary of the invention
The present invention provides a kind of adjusting method of arc source magnetic field device, and arc source magnetic field device includes target, is set to
The target side and successively spaced multiple electromagnetic coils, the adjusting method include: along the target width direction
According to the on-off of the electric current of timing control difference electromagnetic coil, the magnetic field that generates the multiple electromagnetic coil relative to
The target width direction moves back and forth；And
The electric current for applying periodical positive negative pulse stuffing variation to the electromagnetic coil for being chosen to be on state, has arc spot vertical
In the reciprocating motion within the scope of target width.
The present invention also provides a kind of arc source magnetic field device, including target, it is set to the target side and along the target
Successively spaced multiple electromagnetic coils and power supply, the power supply are used for according to timing control difference electromagnetic coil width direction
The on-off of electric current, so that the magnetic field that the multiple electromagnetic coil generates is moved back and forth relative to the target width direction, it is described
Power supply is also used to apply the electromagnetic coil for being chosen to be on state the electric current of periodical positive negative pulse stuffing variation, so that arc spot has
Perpendicular to the reciprocating motion within the scope of target width.
The present invention also provides a kind of arc ion plating film devices, including above-mentioned arc source magnetic field device.
The present invention is made by controlling the on-off of the electric current of different electromagnetic coils and adjusting the current direction of each electromagnetic coil
The magnetic direction and position for obtaining target surface are in reciprocating variation, and then arc spot moves in entire target surface in scan-type, improves target
Material utilization rate.
Detailed description of the invention
Fig. 1 is the schematic diagram of the anti-Ampere force movement of arc spot.
Fig. 2 is the schematic diagram that arc spot presses the drift motion of acute angle rule.
Fig. 3 is the floor map of the arc ion plating film device of the embodiment of the present invention.
Fig. 4 is the stereoscopic schematic diagram of each electromagnetic coil of arc source magnetic field device in Fig. 3.
Fig. 5 is the working state schematic representation of arc source magnetic field device in Fig. 3.
When Fig. 6 is electromagnetic coil L1 and electromagnetic coil the L2 conducting of arc source magnetic field device in Fig. 3, the plane of target etching is shown
It is intended to.
Main element symbol description
| Arc ion plating film device | 100 |
| Arc source magnetic field device | 10 |
| Target | 1、11 |
| Electromagnetic coil | 12 |
| Power supply | 13 |
| Iron core | 14 |
| The magnetic line of force | 15 |
| Arc spot | 6、16 |
The present invention that the following detailed description will be further explained with reference to the above drawings.
Specific embodiment
The attached drawing in the embodiment of the present invention will be connected below, technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description.Obviously, the described embodiment is only a part of the embodiment of the present invention, instead of all the embodiments.Based on this
Embodiment in invention, every other reality obtained by those of ordinary skill in the art without making creative efforts
Example is applied, shall fall within the protection scope of the present invention.
It should be noted that it can be to be directly to when a component is considered as " connection " another component
Another component can exist simultaneously the component being centrally located.When a component is considered as " setting exists " another group
Part, it can be to be to be set up directly on another component or can exist simultaneously the component being centrally located.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention
The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool
Body embodiment purpose, it is not intended that in limitation the present invention.Term " and or " used herein includes one or more phases
Any and all combinations of the listed item of pass.
Referring to Fig. 3, Fig. 3 is the floor map of the arc ion plating film device 100 of the embodiment of the present invention.Arc ions
Filming equipment 100 includes arc source magnetic field device 10.Arc source magnetic field device 10 is including power supply 13, target 11 and is set to target 11 1
Side and along 11 width direction D1 of target successively spaced multiple electromagnetic coils 12.Power supply 13 controls each electromagnetic coil 12
The on-off and sense of current of electric current.
In an embodiment, the quantity of electromagnetic coil 12 is more than or equal to 3.Guarantee 11 Surface field intensity 1mT of target with
Under the premise of upper, in 11 width range of target, 12 quantity of electromagnetic coil is more, and 16 motion profile offset of arc spot is smaller, target
11 consumption are more uniform.In the present embodiment, the quantity of electromagnetic coil 12 is 8, is followed successively by L1, L2, L3, L4, R4, R3, R2, R1.
In an embodiment, the distance between adjacent electromagnetic coil 12 and each electromagnetic coil 12 apart from target 11 away from
From identical, to reduce influence of the relative position between electromagnetic coil 12 to the moving distance in arch magnetic field.
In an embodiment, perpendicular to 11 width direction D1 of target, the length of each electromagnetic coil 12 is more than or equal to target
11 length.In the present embodiment, as shown in fig. 6, perpendicular to 11 width direction D1 of target (i.e. along 11 length direction D2 of target), often
The length of one electromagnetic coil 12 is greater than the length of target 11.
In the present embodiment, electromagnetic coil 12 is perpendicular to target surface.That is, magnetic pole is oriented parallel to target after electromagnetic coil 12 is powered
Face.In other embodiments, electromagnetic coil 12 can also form an angle setting with target surface.That is, magnetic pole after the energization of electromagnetic coil 12
Direction form an angle with target surface.
As shown in Figure 3 and Figure 4, each electromagnetic coil 12 is wrapped on an iron core 14, in this way, the magnetic field that can enhance target surface is strong
Degree.
Fig. 5 and Fig. 6 are please referred to, the adjusting method of arc source provided in an embodiment of the present invention magnetic field device 10 includes:
According to the on-off of the electric current of timing control difference electromagnetic coil 12, the magnetic field that generates multiple electromagnetic coils 12 relative to
11 width direction D1 of target is moved back and forth；And
The electric current for applying periodical positive negative pulse stuffing variation to the electromagnetic coil 12 for being chosen to be on state, has arc spot 16
Perpendicular to the reciprocating motion in 11 width range of target.
Wherein, according to the on-off of the electric current of timing control difference electromagnetic coil 12 specifically, at least one is electric in each period
The chosen conducting of magnetic coil 12, remaining electromagnetic coil 12 is off-state, and successively selectes at least one according to scheduled timing
Electromagnetic coil 12 is switched on, and electromagnetic coil 12 switched on generates magnetic field, makes the magnetic field generated with electromagnetic wire switched on
The location of circle 12 changes and moves.
Wherein, to the electromagnetic coil 12 for being chosen to be on state apply the variation of periodical positive negative pulse stuffing electric current specifically,
In each the conducting period for being chosen to be on state, (be chosen to be conducting each time is the electromagnetism to each electromagnetic coil 12
One conducting period of coil 12), which is applied the electric current of periodical positive negative pulse stuffing variation.
In an embodiment, the periodical positive negative pulse stuffing applied to each electromagnetic coil 12 for being chosen to be on state changes
Electric current frequency it is identical with phase.
In an embodiment, the duration of the electric current of periodical positive negative pulse stuffing variation is perpendicular to 11 width model of target
In enclosing, arc spot 16 moves to behind 11 one end of target counter motion to the time of 11 other end of target.
In an embodiment, according to the electric current of timing control difference electromagnetic coil 12 on-off the step of be specially successively reciprocal
Formula controls the on-off of the electric current of each electromagnetic coil 12.
In an embodiment, to make the movement of arc spot 16 cover entire target surface, the logical of the electric current of different electromagnetic coils 12 is controlled
The electromagnetic coil 12 be connected every time in disconnected step is as few as possible, for example, one electromagnetic coil 12 of conducting or every time conducting every time
Two adjacent electromagnetic coils 12, the reciprocating electric current of make-and-break of multiple 12 one pieces of electromagnetic coil.
Please refer to table 1, table 1 is the curent change of each electromagnetic coil 12 in the present embodiment, with step 1, step 2, step 3,
Step 4, step 5, step 6, step 7, step 6, step 5, step 4, step 3, step 2, the mode of step 1 move in circles change
Change.Numerical value in table 1 indicates that electromagnetic coil 12 is applied the size of electric current.In other embodiments, the electricity of each electromagnetic coil 12
Rheology, with step 1, step 2, step 3, step 4, step 5, step 6, step 7, step 1, step 2, step 3, step 4, step
Rapid 5, step 6, the mode of step 7 move in circles variation.
Table 1
In the present embodiment, each step duration is 100ms.Within the time of a step, to by selection conducting
The electric current for the periodical positive negative pulse stuffing variation that each electromagnetic coil 12 applies, the size of number of ampere turns are 600 ampere-turns, the frequency of electric current
Rate is 25Hz, pulse duration 20ms.
As shown in Figure 5 and Figure 6, when electromagnetic coil 12 is powered, the magnetic line of force 15 that electromagnetic coil 12 generates will be in target surface structure
Arch magnetic field is built, is distributed shaped like long straight " tunnel " along 11 length direction D2 of target.The positive and negative arteries and veins of the output certain frequency of power supply 13
Electric current is rushed, magnetic direction changes with current direction, and arc spot 16 can then be moved back and forth in the target surface in " tunnel ", i.e., arc spot 16 is in target
It is moved back and forth in 11 length range of material.
By setting the driver of power supply 13, it is primary periodically to control all 12 current switchings of electromagnetic coil, on-off
The principle of electromagnetic coil 12 is that the motion profile of arc spot 16 is enable to cover entire target surface as far as possible, preferably every thus
12 numbers of electromagnetic coil of secondary conducting electric current are as few as possible, and such as 1 or 2 adjacent, the overall successively reciprocally power on/off of coil
Stream.Such periodicity on-off coil current, moves back and forth magnetic field along the width direction D1 of target 11 in target surface, arc spot 16
Movement is no longer fixed in the magnetic field of an electromagnetic coil 12 generation in target surface, and is distributed across entire 11 width range of target
It is interior.
Due to the presence of two kinds of motion modes of arc spot 16, the movement of arc spot 16 will cover entire target surface, and target 11 consumes
Uniformly, 11 utilization rate of target increases, while target surface heat is not concentrated, and heat dissipation is good, is conducive to reduce drop.
In the present embodiment, the size of current for being applied to each electromagnetic coil 12 can also adjust, make the arch magnetic of different location
Field intensity is consistent, it is ensured that 16 movement velocity of arc spot is identical, and then appearance the phenomenon that avoid speed from slowing down and increase drop.
In addition, the arc source magnetic field device 10,11 surface of target only along the straight way magnetic field of 11 length direction D2 of target distribution,
The bend magnetic field in straight way magnetic field without cohesion is avoided because 11 surface of target is there are bend and two kinds of magnetic fields of straight way, cause bend and
16 speed different problems of arc spot at straight way position, and then avoid bend part and generate more drops, make target 11 in bend
It is consistent with consumption at straight way two.
Embodiment of above is only used to illustrate the technical scheme of the present invention and not to limit it, although referring to better embodiment pair
The present invention is described in detail, those skilled in the art should understand that, technical solution of the present invention can be carried out
Modification or equivalent replacement, without departing from the spirit and scope of the technical solution of the present invention.
Claims (10)
1. a kind of adjusting method of arc source magnetic field device, arc source magnetic field device includes target, is set to the target side
And successively spaced multiple electromagnetic coils, the adjusting method include: along the target width direction
According to the on-off of the electric current of timing control difference electromagnetic coil, the magnetic field for generating the multiple electromagnetic coil is relative to described
Target width direction moves back and forth；And
The electric current for applying periodical positive negative pulse stuffing variation to the electromagnetic coil for being chosen to be on state, has arc spot perpendicular to target
Reciprocating motion in material width range.
2. adjusting method as described in claim 1, which is characterized in that apply to each electromagnetic coil for being chosen to be on state
The periodical positive negative pulse stuffing variation electric current frequency it is identical with phase.
3. adjusting method as described in claim 1, which is characterized in that the electric current of the periodicity positive negative pulse stuffing variation continues
Time be within the scope of perpendicular to target width, after the spots moving to target one end counter motion to the target other end when
Between.
4. adjusting method as described in claim 1, which is characterized in that according to the on-off of the electric current of timing control difference electromagnetic coil
The step of in an electromagnetic coil is connected every time or two adjacent electromagnetic coils is connected every time.
5. a kind of arc source magnetic field device, which is characterized in that including target, be set to the target side and along the target width
Successively spaced multiple electromagnetic coils and power supply, the power supply are used for the electric current according to timing control difference electromagnetic coil in direction
On-off so that the multiple electromagnetic coil generate magnetic field moved back and forth relative to the target width direction, the power supply
It is also used to apply the electromagnetic coil for being chosen to be on state the electric current of periodical positive negative pulse stuffing variation, so that arc spot has vertically
In the reciprocating motion within the scope of target width.
6. arc source as claimed in claim 5 magnetic field device, which is characterized in that the quantity of the electromagnetic coil is more than or equal to 3.
7. arc source as claimed in claim 5 magnetic field device, which is characterized in that the distance between adjacent electromagnetic coil and each
Distance of the electromagnetic coil apart from target is identical.
8. arc source as claimed in claim 5 magnetic field device, which is characterized in that perpendicular to target width direction, each electricity
The length of magnetic coil is more than or equal to the length of the target.
9. arc source as claimed in claim 5 magnetic field device, which is characterized in that the electromagnetic coil perpendicular to the target surface or with
The target surface forms an angle.
10. a kind of arc ion plating film device, which is characterized in that including the arc source as described in any one of claim 5 to 9
Magnetic field device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811210482.8A CN109234699A (en) | 2018-10-17 | 2018-10-17 | Arc source magnetic field device, adjusting method and arc ion plating film device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811210482.8A CN109234699A (en) | 2018-10-17 | 2018-10-17 | Arc source magnetic field device, adjusting method and arc ion plating film device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109234699A true CN109234699A (en) | 2019-01-18 |
Family
ID=65053911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811210482.8A Pending CN109234699A (en) | 2018-10-17 | 2018-10-17 | Arc source magnetic field device, adjusting method and arc ion plating film device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109234699A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114086140A (en) * | 2021-11-29 | 2022-02-25 | 广东鼎泰高科技术股份有限公司 | Variable magnetic track type device, vacuum coating equipment and vacuum coating method |
| CN114481046A (en) * | 2022-01-26 | 2022-05-13 | 纳狮新材料有限公司 | Electric arc evaporation device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060169578A1 (en) * | 2005-02-03 | 2006-08-03 | Applied Materials, Inc. | Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas |
| CN105112871A (en) * | 2015-09-17 | 2015-12-02 | 京东方科技集团股份有限公司 | Target material sputtering device and target material sputtering method thereof |
| CN204939603U (en) * | 2015-09-17 | 2016-01-06 | 京东方科技集团股份有限公司 | A kind of target as sputter device |
-
2018
- 2018-10-17 CN CN201811210482.8A patent/CN109234699A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060169578A1 (en) * | 2005-02-03 | 2006-08-03 | Applied Materials, Inc. | Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas |
| CN105112871A (en) * | 2015-09-17 | 2015-12-02 | 京东方科技集团股份有限公司 | Target material sputtering device and target material sputtering method thereof |
| CN204939603U (en) * | 2015-09-17 | 2016-01-06 | 京东方科技集团股份有限公司 | A kind of target as sputter device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114086140A (en) * | 2021-11-29 | 2022-02-25 | 广东鼎泰高科技术股份有限公司 | Variable magnetic track type device, vacuum coating equipment and vacuum coating method |
| CN114086140B (en) * | 2021-11-29 | 2024-06-04 | 广东鼎泰高科技术股份有限公司 | Variable magnetic track type device, vacuum coating equipment and vacuum coating method |
| CN114481046A (en) * | 2022-01-26 | 2022-05-13 | 纳狮新材料有限公司 | Electric arc evaporation device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH072988B2 (en) | Arc evaporator | |
| CN111172504B (en) | Magnetron sputtering cathode | |
| CN102953035A (en) | Multi-mode atternation coupling magnetic field assisted electrical arc ion plating deposition arc source apparatus | |
| CN109234699A (en) | Arc source magnetic field device, adjusting method and arc ion plating film device | |
| RU2014143206A (en) | PLASMA-IMMERSION ION PROCESSING AND DEPOSITION OF COATINGS FROM STEAM PHASE AT PROMOTING AN ARC DISCHARGE OF LOW PRESSURE | |
| JP2004523658A (en) | Arc deposition apparatus with strong magnetic guide for targets with large surface area | |
| WO2014201292A1 (en) | Anode layer slit ion source | |
| WO2017045335A1 (en) | Target material sputtering device and method for sputtering target material using same | |
| CN101348897A (en) | Magnetic confinement magnetron sputtering method and magnetron sputtering apparatus manufactured by the method | |
| CN109881167A (en) | A kind of high efficiency magnetron sputtering planar cathode | |
| CN109182985B (en) | Arc source device and arc source magnetic field adjusting method | |
| CN102534513B (en) | Rectangular plane cathode arc evaporation source of combination magnetic fields | |
| CN103572240A (en) | Film coating device | |
| US6249200B1 (en) | Combination of magnets for generating a uniform external magnetic field | |
| CN211170860U (en) | Composite scanning arc source magnetic field device | |
| CN109693015B (en) | A kind of method and device of the magnetic field regulation arc erosion based on radio energy-transmitting | |
| CN103966567B (en) | A kind of magnetic field structure of planar targets and using method thereof | |
| KR101435713B1 (en) | Novel multi coil target design | |
| CN109385607B (en) | Arc source device and method for adjusting arc source magnetic field of arc source device | |
| KR102616581B1 (en) | Magnetron sputtering source and coating system device | |
| JPH10102247A (en) | Sputtering device and method | |
| JP3589453B2 (en) | Phase control multi-electrode AC discharge light source | |
| JPH0559542A (en) | Magnetron sputtering electrode | |
| CN212084670U (en) | Atom guiding device | |
| JPH0830275B2 (en) | Rotating magnetic field type magnetron etching device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190118 |