JP2001294592A - Metal-containing episulfide compound and method for producing the same - Google Patents
Metal-containing episulfide compound and method for producing the sameInfo
- Publication number
- JP2001294592A JP2001294592A JP2000112530A JP2000112530A JP2001294592A JP 2001294592 A JP2001294592 A JP 2001294592A JP 2000112530 A JP2000112530 A JP 2000112530A JP 2000112530 A JP2000112530 A JP 2000112530A JP 2001294592 A JP2001294592 A JP 2001294592A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- epithiopropylthio
- bis
- general formula
- episulfide compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 episulfide compound Chemical class 0.000 title claims abstract description 56
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 56
- 239000002184 metal Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 42
- 229910052718 tin Inorganic materials 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 11
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 10
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 8
- 125000005843 halogen group Chemical group 0.000 claims abstract description 3
- 239000007983 Tris buffer Substances 0.000 claims description 23
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 13
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims description 12
- 239000010936 titanium Chemical group 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910000078 germane Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 abstract description 23
- 239000000463 material Substances 0.000 abstract description 18
- 239000002994 raw material Substances 0.000 abstract description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 6
- 229920002554 vinyl polymer Polymers 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 3
- 229910052976 metal sulfide Inorganic materials 0.000 abstract 1
- 238000006467 substitution reaction Methods 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 27
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 24
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 24
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 20
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 15
- 229920003023 plastic Polymers 0.000 description 14
- 239000004033 plastic Substances 0.000 description 14
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- 239000001294 propane Substances 0.000 description 12
- 239000004593 Epoxy Substances 0.000 description 10
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 238000006116 polymerization reaction Methods 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 150000003553 thiiranes Chemical class 0.000 description 7
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N hydrochloric acid Substances Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 229920006295 polythiol Polymers 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000012046 mixed solvent Substances 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 4
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 4
- WVGOLFWYUXCQDU-UHFFFAOYSA-N 3-methylthiirane-2-thiol Chemical compound CC1SC1S WVGOLFWYUXCQDU-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 239000001273 butane Substances 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 4
- 235000019341 magnesium sulphate Nutrition 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 229920002578 polythiourethane polymer Polymers 0.000 description 4
- 238000010898 silica gel chromatography Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- PMOIAJVKYNVHQE-UHFFFAOYSA-N phosphanium;bromide Chemical compound [PH4+].[Br-] PMOIAJVKYNVHQE-UHFFFAOYSA-N 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 3
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- FZZMTSNZRBFGGU-UHFFFAOYSA-N 2-chloro-7-fluoroquinazolin-4-amine Chemical compound FC1=CC=C2C(N)=NC(Cl)=NC2=C1 FZZMTSNZRBFGGU-UHFFFAOYSA-N 0.000 description 2
- DXNAKHSYGOEAGV-UHFFFAOYSA-N 2-methyl-3-(3-methylthiiran-2-yl)sulfanylthiirane Chemical compound CC1SC1SC1C(C)S1 DXNAKHSYGOEAGV-UHFFFAOYSA-N 0.000 description 2
- JOMNTHCQHJPVAZ-UHFFFAOYSA-N 2-methylpiperazine Chemical compound CC1CNCCN1 JOMNTHCQHJPVAZ-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical class C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- VDKDFKRKAPXHBH-UHFFFAOYSA-N [3-(2-sulfanylpropanoyloxy)-2,2-bis(2-sulfanylpropanoyloxymethyl)propyl] 2-sulfanylpropanoate Chemical compound CC(S)C(=O)OCC(COC(=O)C(C)S)(COC(=O)C(C)S)COC(=O)C(C)S VDKDFKRKAPXHBH-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 2
- SYFOAKAXGNMQAX-UHFFFAOYSA-N bis(prop-2-enyl) carbonate;2-(2-hydroxyethoxy)ethanol Chemical compound OCCOCCO.C=CCOC(=O)OCC=C SYFOAKAXGNMQAX-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- RJGHQTVXGKYATR-UHFFFAOYSA-L dibutyl(dichloro)stannane Chemical compound CCCC[Sn](Cl)(Cl)CCCC RJGHQTVXGKYATR-UHFFFAOYSA-L 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 239000002685 polymerization catalyst Substances 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 150000007944 thiolates Chemical class 0.000 description 2
- 125000004055 thiomethyl group Chemical group [H]SC([H])([H])* 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- XFNJVJPLKCPIBV-UHFFFAOYSA-N trimethylenediamine Chemical compound NCCCN XFNJVJPLKCPIBV-UHFFFAOYSA-N 0.000 description 2
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical compound C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 2
- 238000004383 yellowing Methods 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- JWZZKOKVBUJMES-UHFFFAOYSA-N (+-)-Isoprenaline Chemical compound CC(C)NCC(O)C1=CC=C(O)C(O)=C1 JWZZKOKVBUJMES-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- CXWGKAYMVASWDQ-UHFFFAOYSA-N 1,2-dithiane Chemical group C1CCSSC1 CXWGKAYMVASWDQ-UHFFFAOYSA-N 0.000 description 1
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- WEERVPDNCOGWJF-UHFFFAOYSA-N 1,4-bis(ethenyl)benzene Chemical compound C=CC1=CC=C(C=C)C=C1 WEERVPDNCOGWJF-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- FQUYSHZXSKYCSY-UHFFFAOYSA-N 1,4-diazepane Chemical compound C1CNCCNC1 FQUYSHZXSKYCSY-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- XHAFIUUYXQFJEW-UHFFFAOYSA-N 1-chloroethenylbenzene Chemical compound ClC(=C)C1=CC=CC=C1 XHAFIUUYXQFJEW-UHFFFAOYSA-N 0.000 description 1
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- ZYZXXEKBDWCGED-UHFFFAOYSA-N 1-n,2-n-diethylbutane-1,2-diamine Chemical compound CCNCC(CC)NCC ZYZXXEKBDWCGED-UHFFFAOYSA-N 0.000 description 1
- VECZPMZNUKYYOJ-UHFFFAOYSA-N 1-n,2-n-diethylpropane-1,2-diamine Chemical compound CCNCC(C)NCC VECZPMZNUKYYOJ-UHFFFAOYSA-N 0.000 description 1
- WLZRPMGWZLCLGV-UHFFFAOYSA-N 1-n,2-n-dimethylbutane-1,2-diamine Chemical compound CCC(NC)CNC WLZRPMGWZLCLGV-UHFFFAOYSA-N 0.000 description 1
- XCFLRKJSDRTWON-UHFFFAOYSA-N 1-n,3-n-diethylbutane-1,3-diamine Chemical compound CCNCCC(C)NCC XCFLRKJSDRTWON-UHFFFAOYSA-N 0.000 description 1
- DKZBLXUAJDHZQQ-UHFFFAOYSA-N 1-n,3-n-dimethylbutane-1,3-diamine Chemical compound CNCCC(C)NC DKZBLXUAJDHZQQ-UHFFFAOYSA-N 0.000 description 1
- PIPWSBOFSUJCCO-UHFFFAOYSA-N 2,2-dimethylpiperazine Chemical compound CC1(C)CNCCN1 PIPWSBOFSUJCCO-UHFFFAOYSA-N 0.000 description 1
- KCAMLFCTSSYIFW-UHFFFAOYSA-N 2,4,6-tris(dimethylamino)phenol Chemical compound CN(C)C1=CC(N(C)C)=C(O)C(N(C)C)=C1 KCAMLFCTSSYIFW-UHFFFAOYSA-N 0.000 description 1
- SDMYZIQYGCCLHR-UHFFFAOYSA-N 2,5-bis(thiiran-2-ylmethylsulfanylmethyl)-1,4-dithiane Chemical compound C1SC1CSCC(SC1)CSC1CSCC1CS1 SDMYZIQYGCCLHR-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- IFNWESYYDINUHV-UHFFFAOYSA-N 2,6-dimethylpiperazine Chemical compound CC1CNCC(C)N1 IFNWESYYDINUHV-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- SLQDZZGEPQYECP-UHFFFAOYSA-N 2-[2-(thiiran-2-ylmethylsulfanyl)ethylsulfanylmethyl]thiirane Chemical compound C1SC1CSCCSCC1CS1 SLQDZZGEPQYECP-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- XUXZELZSNNYLRE-UHFFFAOYSA-N 2-[4-(2-aminoethyl)cyclohexyl]ethanamine Chemical compound NCCC1CCC(CCN)CC1 XUXZELZSNNYLRE-UHFFFAOYSA-N 0.000 description 1
- VIYWVRIBDZTTMH-UHFFFAOYSA-N 2-[4-[2-[4-[2-(2-methylprop-2-enoyloxy)ethoxy]phenyl]propan-2-yl]phenoxy]ethyl 2-methylprop-2-enoate Chemical compound C1=CC(OCCOC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCCOC(=O)C(C)=C)C=C1 VIYWVRIBDZTTMH-UHFFFAOYSA-N 0.000 description 1
- WQKFQBSUWRZIAR-UHFFFAOYSA-N 2-[[4-(thiiran-2-ylmethylsulfanylmethyl)cyclohexyl]methylsulfanylmethyl]thiirane Chemical compound C1SC1CSCC(CC1)CCC1CSCC1CS1 WQKFQBSUWRZIAR-UHFFFAOYSA-N 0.000 description 1
- ISRGONDNXBCDBM-UHFFFAOYSA-N 2-chlorostyrene Chemical compound ClC1=CC=CC=C1C=C ISRGONDNXBCDBM-UHFFFAOYSA-N 0.000 description 1
- ODGCZQFTJDEYNI-UHFFFAOYSA-N 2-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1(C)C=CCCC1C(O)=O ODGCZQFTJDEYNI-UHFFFAOYSA-N 0.000 description 1
- WMRCTEPOPAZMMN-UHFFFAOYSA-N 2-undecylpropanedioic acid Chemical compound CCCCCCCCCCCC(C(O)=O)C(O)=O WMRCTEPOPAZMMN-UHFFFAOYSA-N 0.000 description 1
- KRPRVQWGKLEFKN-UHFFFAOYSA-N 3-(3-aminopropoxy)propan-1-amine Chemical compound NCCCOCCCN KRPRVQWGKLEFKN-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- POTQBGGWSWSMCX-UHFFFAOYSA-N 3-[2-(3-aminopropoxy)ethoxy]propan-1-amine Chemical compound NCCCOCCOCCCN POTQBGGWSWSMCX-UHFFFAOYSA-N 0.000 description 1
- JZPGWKJWVYMINX-UHFFFAOYSA-N 3-[4-(3-aminopropyl)cyclohexyl]propan-1-amine Chemical compound NCCCC1CCC(CCCN)CC1 JZPGWKJWVYMINX-UHFFFAOYSA-N 0.000 description 1
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- ZILQRIKYRNQQDE-UHFFFAOYSA-N 4-(2-piperidin-4-ylethyl)piperidine Chemical compound C1CNCCC1CCC1CCNCC1 ZILQRIKYRNQQDE-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- OXEZLYIDQPBCBB-UHFFFAOYSA-N 4-(3-piperidin-4-ylpropyl)piperidine Chemical compound C1CNCCC1CCCC1CCNCC1 OXEZLYIDQPBCBB-UHFFFAOYSA-N 0.000 description 1
- XUTHRJJZMHXMFR-UHFFFAOYSA-N 4-(piperidin-4-ylmethyl)piperidine Chemical compound C1CNCCC1CC1CCNCC1 XUTHRJJZMHXMFR-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- VNGLVZLEUDIDQH-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;2-methyloxirane Chemical compound CC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 VNGLVZLEUDIDQH-UHFFFAOYSA-N 0.000 description 1
- WPSWDCBWMRJJED-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;oxirane Chemical compound C1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WPSWDCBWMRJJED-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- CNPURSDMOWDNOQ-UHFFFAOYSA-N 4-methoxy-7h-pyrrolo[2,3-d]pyrimidin-2-amine Chemical compound COC1=NC(N)=NC2=C1C=CN2 CNPURSDMOWDNOQ-UHFFFAOYSA-N 0.000 description 1
- VNFYMAPAENTMMO-UHFFFAOYSA-N 5-chloro-2-methylquinoline Chemical compound ClC1=CC=CC2=NC(C)=CC=C21 VNFYMAPAENTMMO-UHFFFAOYSA-N 0.000 description 1
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- LHFIAMMRYGQCJH-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OC1CC2OC2CC1 LHFIAMMRYGQCJH-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- XWUNIDGEMNBBAQ-UHFFFAOYSA-N Bisphenol A ethoxylate diacrylate Chemical compound C=1C=C(OCCOC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OCCOC(=O)C=C)C=C1 XWUNIDGEMNBBAQ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- NZDZGEPBMJJUPN-UHFFFAOYSA-N CC1(C=CC(C)=C(CCOC(C=C)=O)C1CCOC(C=C)=O)NC(O)=O Chemical compound CC1(C=CC(C)=C(CCOC(C=C)=O)C1CCOC(C=C)=O)NC(O)=O NZDZGEPBMJJUPN-UHFFFAOYSA-N 0.000 description 1
- ZAFSYVYTBJAZJP-UHFFFAOYSA-N CCCSCCSCC12C(S1)SCCS2 Chemical compound CCCSCCSCC12C(S1)SCCS2 ZAFSYVYTBJAZJP-UHFFFAOYSA-N 0.000 description 1
- 102100028918 Catenin alpha-3 Human genes 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- 101000916179 Homo sapiens Catenin alpha-3 Proteins 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 0 N*CC1SC1 Chemical compound N*CC1SC1 0.000 description 1
- CJKRXEBLWJVYJD-UHFFFAOYSA-N N,N'-diethylethylenediamine Chemical compound CCNCCNCC CJKRXEBLWJVYJD-UHFFFAOYSA-N 0.000 description 1
- VZUNGTLZRAYYDE-UHFFFAOYSA-N N-methyl-N'-nitro-N-nitrosoguanidine Chemical compound O=NN(C)C(=N)N[N+]([O-])=O VZUNGTLZRAYYDE-UHFFFAOYSA-N 0.000 description 1
- JFOKIVJIRJYAEV-UHFFFAOYSA-N NCCSCC1SC1 Chemical compound NCCSCC1SC1 JFOKIVJIRJYAEV-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000005700 Putrescine Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- ULQMPOIOSDXIGC-UHFFFAOYSA-N [2,2-dimethyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)COC(=O)C(C)=C ULQMPOIOSDXIGC-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229940008075 allyl sulfide Drugs 0.000 description 1
- 238000005937 allylation reaction Methods 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- KXCKKUIJCYNZAE-UHFFFAOYSA-N benzene-1,3,5-trithiol Chemical compound SC1=CC(S)=CC(S)=C1 KXCKKUIJCYNZAE-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- NIDNOXCRFUCAKQ-UHFFFAOYSA-N bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound C1C2C=CC1C(C(=O)O)C2C(O)=O NIDNOXCRFUCAKQ-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- IDSLNGDJQFVDPQ-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-yl) hexanedioate Chemical compound C1CC2OC2CC1OC(=O)CCCCC(=O)OC1CC2OC2CC1 IDSLNGDJQFVDPQ-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 235000010338 boric acid Nutrition 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- ULEAQRIQMIQDPJ-UHFFFAOYSA-N butane-1,2-diamine Chemical compound CCC(N)CN ULEAQRIQMIQDPJ-UHFFFAOYSA-N 0.000 description 1
- RGTXVXDNHPWPHH-UHFFFAOYSA-N butane-1,3-diamine Chemical compound CC(N)CCN RGTXVXDNHPWPHH-UHFFFAOYSA-N 0.000 description 1
- KMHIOVLPRIUBGK-UHFFFAOYSA-N butane-1,4-diol;hexane-1,6-diol Chemical compound OCCCCO.OCCCCCCO KMHIOVLPRIUBGK-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- XBZSBBLNHFMTEB-UHFFFAOYSA-N cyclohexane-1,3-dicarboxylic acid Chemical compound OC(=O)C1CCCC(C(O)=O)C1 XBZSBBLNHFMTEB-UHFFFAOYSA-N 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 239000000986 disperse dye Substances 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- AVIYEYCFMVPYST-UHFFFAOYSA-N hexane-1,3-diol Chemical compound CCCC(O)CCO AVIYEYCFMVPYST-UHFFFAOYSA-N 0.000 description 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052500 inorganic mineral Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- DLEDOFVPSDKWEF-UHFFFAOYSA-N lithium butane Chemical compound [Li+].CCC[CH2-] DLEDOFVPSDKWEF-UHFFFAOYSA-N 0.000 description 1
- RMGJCSHZTFKPNO-UHFFFAOYSA-M magnesium;ethene;bromide Chemical compound [Mg+2].[Br-].[CH-]=C RMGJCSHZTFKPNO-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 239000011707 mineral Chemical class 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- WHDUKLPCKZTPFY-UHFFFAOYSA-N n,n'-diethylbutane-1,4-diamine Chemical compound CCNCCCCNCC WHDUKLPCKZTPFY-UHFFFAOYSA-N 0.000 description 1
- LDQWVRMGQLAWMN-UHFFFAOYSA-N n,n'-diethylhexane-1,6-diamine Chemical compound CCNCCCCCCNCC LDQWVRMGQLAWMN-UHFFFAOYSA-N 0.000 description 1
- BEPGHZIEOVULBU-UHFFFAOYSA-N n,n'-diethylpropane-1,3-diamine Chemical compound CCNCCCNCC BEPGHZIEOVULBU-UHFFFAOYSA-N 0.000 description 1
- CZPRYVBLOUZRGD-UHFFFAOYSA-N n,n'-dimethylbutane-1,4-diamine Chemical compound CNCCCCNC CZPRYVBLOUZRGD-UHFFFAOYSA-N 0.000 description 1
- KVKFRMCSXWQSNT-UHFFFAOYSA-N n,n'-dimethylethane-1,2-diamine Chemical compound CNCCNC KVKFRMCSXWQSNT-UHFFFAOYSA-N 0.000 description 1
- LFBJWQBNKOIOMJ-UHFFFAOYSA-N n,n'-dimethylheptane-1,7-diamine Chemical compound CNCCCCCCCNC LFBJWQBNKOIOMJ-UHFFFAOYSA-N 0.000 description 1
- MDKQJOKKKZNQDG-UHFFFAOYSA-N n,n'-dimethylhexane-1,6-diamine Chemical compound CNCCCCCCNC MDKQJOKKKZNQDG-UHFFFAOYSA-N 0.000 description 1
- BESLVGXJZXNIJE-UHFFFAOYSA-N n,n'-dimethylpentane-1,5-diamine Chemical compound CNCCCCCNC BESLVGXJZXNIJE-UHFFFAOYSA-N 0.000 description 1
- UQUPIHHYKUEXQD-UHFFFAOYSA-N n,n′-dimethyl-1,3-propanediamine Chemical compound CNCCCNC UQUPIHHYKUEXQD-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- GOGZBMRXLADNEV-UHFFFAOYSA-N naphthalene-2,6-diamine Chemical compound C1=C(N)C=CC2=CC(N)=CC=C21 GOGZBMRXLADNEV-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 125000005936 piperidyl group Chemical group 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 229920005651 polypropylene glycol dimethacrylate Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- QROGIFZRVHSFLM-UHFFFAOYSA-N prop-1-enylbenzene Chemical compound CC=CC1=CC=CC=C1 QROGIFZRVHSFLM-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- DKGVLWUCRGFFMN-UHFFFAOYSA-N pyridine;trifluoroborane Chemical compound FB(F)F.C1=CC=NC=C1 DKGVLWUCRGFFMN-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000005624 silicic acid group Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 235000012424 soybean oil Nutrition 0.000 description 1
- 239000003549 soybean oil Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- RKHXQBLJXBGEKF-UHFFFAOYSA-M tetrabutylphosphanium;bromide Chemical compound [Br-].CCCC[P+](CCCC)(CCCC)CCCC RKHXQBLJXBGEKF-UHFFFAOYSA-M 0.000 description 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 125000004014 thioethyl group Chemical group [H]SC([H])([H])C([H])([H])* 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、新規な金属含有エ
ピスルフィド化合物及びその製造方法に関し、さらに詳
しくは、屈折率及びアッベ数の高い光学材料の原料とし
て有用な金属含有エピスルフィド化合物、及びそれを効
率よく製造する方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel metal-containing episulfide compound and a method for producing the same, and more particularly, to a metal-containing episulfide compound useful as a raw material for an optical material having a high refractive index and a high Abbe number, and its efficiency. It relates to a method of manufacturing well.
【0002】[0002]
【従来の技術】プラスチックはガラスに比較して軽量で
割れにくく染色が容易であるため、近年、レンズ等の各
種光学用途に多用されている。そして、光学用プラスチ
ック材料としては、ポリ( ジエチレングリコールビスア
リルカーボネート)(CR−39)やポリ( メチルメタ
クリレート) が、一般的に用いられている。しかしなが
ら、これらのプラスチック材料は1.50以下の屈折率を
有するため、これらのプラスチック材料で例えばレンズ
を構成した場合、レンズの度数が強くなるほどレンズが
厚くなり、軽量を長所とするプラスチックレンズの優位
性が損なわれてしまう。特に強度の凹レンズは、レンズ
周辺が肉厚となり、複屈折や色収差が生じることから好
ましくない。さらに眼鏡用途において肉厚のレンズは、
審美性を悪くする傾向にある。肉薄のレンズを得るため
には、レンズを構成する材料の屈折率を高めることが効
果的である。一般的にガラスやプラスチックは、屈折率
の増加に伴いアッベ数が減少し、その結果、それらの色
収差は増加する。従って、高い屈折率とアッベ数を兼ね
備えたプラスチック材料が望まれている。このような性
能を有するプラスチック材料としては、例えば(1) 分子
内に臭素を有するポリオールとポリイソシアネートとの
重付加により得られるポリウレタン(特開昭58−164615
号公報)、(2) ポリチオールとポリイソシアネートとの
重付加により得られるポリチオウレタン(特公平4 −58
489 号公報、特公平5 −148340号公報)が提案されてい
る。そして、特に(2) のポリチオウレタンの原料となる
ポリチオールとして、イオウ原子の含有率を高めた分岐
鎖(ポリチオール特開平2 −270859号公報、特開平5 −
148340号公報)や、イオウ原子を高めるためジチアン構
造を導入したポリチオール(特公平6 −5323号公報、特
開平7 −118390号公報)が提案されている。さらに、
(3) エピサルファイドを重合官能基としたアルキルサル
ファイドの重合体が提案されている(特開平9 −72580
号公報、特開平9 −110979号公報)。2. Description of the Related Art Plastics have been widely used in various optical applications such as lenses in recent years, since plastics are lighter in weight, harder to break and easier to dye than glass. Poly (diethylene glycol bisallyl carbonate) (CR-39) and poly (methyl methacrylate) are generally used as optical plastic materials. However, since these plastic materials have a refractive index of 1.50 or less, for example, when a lens is made of such a plastic material, the lens becomes thicker as the power of the lens increases, and the advantage of a plastic lens having an advantage of light weight is superior. Sex is impaired. In particular, a concave lens having high strength is not preferable because the periphery of the lens becomes thick and birefringence and chromatic aberration occur. Furthermore, in eyeglass applications, thick lenses are
Aesthetics tend to be poor. In order to obtain a thin lens, it is effective to increase the refractive index of the material forming the lens. In general, the Abbe number of glass and plastic decreases as the refractive index increases, and as a result, their chromatic aberration increases. Therefore, a plastic material having both a high refractive index and an Abbe number is desired. Examples of the plastic material having such performance include (1) a polyurethane obtained by polyaddition of a polyol having bromine in the molecule and a polyisocyanate (JP-A-58-164615).
Japanese Patent Application Laid-Open No. 4-58), (2) Polythiourethane obtained by polyaddition of polythiol and polyisocyanate
No. 489, Japanese Patent Publication No. 5-148340). In particular, as a polythiol used as a raw material of the polythiourethane of (2), a branched chain having an increased sulfur atom content (Polythiol JP-A-2-270859, JP-A-5-70859)
No. 148340) and polythiols having a dithiane structure introduced to increase the number of sulfur atoms (JP-B-6-5323, JP-A-7-118390). further,
(3) An alkyl sulfide polymer having episulfide as a polymerization functional group has been proposed (JP-A-9-72580).
JP, JP-A-9-110979).
【0003】しかしながら上記(1) のポリウレタンは、
屈折率がわずかに改良されているものの、アッベ数が低
く、かつ耐光性に劣る上、比重が高く、軽量性が損なわ
れるなどの欠点を有している。また(2) のポリチオウレ
タンのうち、原料のポリチオールして高イオウ含有率の
ポリチオールを用いて得られたポリチオウレタンは、屈
折率が例えば1.60〜1.68程度に高められているが、
同等の屈折率を有する光学用無機ガラスに比べてアッベ
数が低く、さらにアッベ数を高めなければならないとい
う課題を有している。一方、(3) のアルキルサルファイ
ド重合体は、一例としてアッベ数が36において、屈折
率が1.70に高められており、この重合体を用いて得ら
れたレンズは、著しく肉薄化され、かつ軽量化されてい
るが、屈折率とアッベ数を同時に、さらに高めたプラス
チック材料が望まれている。However, the polyurethane of the above (1) is
Although the refractive index is slightly improved, it has disadvantages such as low Abbe number, poor light resistance, high specific gravity, and impaired lightness. Among the polythiourethanes of (2), the polythiourethane obtained by using a polythiol as a raw material and using a polythiol having a high sulfur content has a refractive index increased to, for example, about 1.60 to 1.68. But,
There is a problem that the Abbe number is lower than that of an optical inorganic glass having the same refractive index, and the Abbe number must be further increased. On the other hand, the alkyl sulfide polymer of (3) has, for example, an Abbe number of 36 and a refractive index of 1.70, and the lens obtained by using this polymer is significantly thinned, and Although it is lighter, a plastic material having higher refractive index and Abbe number at the same time is desired.
【0004】[0004]
【発明が解決しようとする課題】本発明は、このような
事情のもとで、屈折率とアッベ数が共に高く、かつ耐熱
性、耐候性、透明性などに優れる光学材料を与えること
のできる新規な化合物及びこのものを効率よく製造する
方法を提供することを目的とするものである。Under such circumstances, the present invention can provide an optical material having both a high refractive index and a high Abbe number and having excellent heat resistance, weather resistance, transparency and the like. An object of the present invention is to provide a novel compound and a method for efficiently producing the compound.
【0005】[0005]
【課題を解決するための手段】本発明者は、上記目的を
達成するために鋭意研究を重ねた結果、シリコン、ゲル
マニウム、スズ、チタンなどの金属原子にエピスルフィ
ドの誘導体が結合してなる金属含有エピスルフィド化合
物が新規な化合物であり、上記の目的に適合しうるこ
と、そして、このものは、特定の方法により、効率よく
得られることを見出し、この知見に基づいて本発明を完
成するに至った。すなわち、本発明は、(1)一般式
(1)Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above object, and as a result, have found that a metal containing a metal atom such as silicon, germanium, tin or titanium to which an episulfide derivative is bonded. The present inventors have found that an episulfide compound is a novel compound, which can be adapted to the above-mentioned purpose, and that this compound can be efficiently obtained by a specific method, and based on this finding, completed the present invention. . That is, the present invention provides (1) the general formula
(1)
【0006】[0006]
【化4】 Embedded image
【0007】(式中、Mはケイ素、ゲルマニウム、スズ
またはチタンを示し、xは1〜4の整数を示し、yは1
または2を示す。)で表される金属含有エピスルフィド
化合物、(2)一般式MZ4 (Mは上記と同じであり、
Zはハロゲン原子を示す)で表される四ハロゲン化金属
と2:3 −エピチオメルカプトプロパンを反応させること
を特徴とする、一般式(1−a)(Wherein, M represents silicon, germanium, tin or titanium, x represents an integer of 1 to 4, and y represents 1
Or 2 is indicated. A) a metal-containing episulfide compound represented by the general formula MZ 4 (where M is the same as described above;
Z represents a halogen atom), and reacting 2: 3-epithiomercaptopropane with a metal tetrahalide represented by the general formula (1-a):
【0008】[0008]
【化5】 Embedded image
【0009】(式中、Mは上記と同じである。)で表さ
れる金属含有エピスルフィド化合物の製造方法、および
(3)上記四ハロゲン化金属のクロロメチル化体または
ビニル置換体と2:3 −エピチオメルカプトプロパンを反
応させることを特徴とする一般式(1)(Wherein M is the same as described above), and (3) a chloromethylated or vinyl-substituted metal tetrahalide and a 2: 3 -General formula (1) characterized by reacting epithiomercaptopropane
【0010】[0010]
【化6】 Embedded image
【0011】(式中、Mは上記と同じであり、xは1〜
3の整数を示し、yは1または2を示す。)で表される
金属含有エピスルフィド化合物の製造方法、を提供する
ものである。(Where M is the same as above, and x is 1 to
3 represents an integer, and y represents 1 or 2. A) a method for producing a metal-containing episulfide compound represented by the formula:
【0012】[0012]
【発明の実施の形態】本発明の金属含有スルフィド化合
物は、一般式 (1)BEST MODE FOR CARRYING OUT THE INVENTION The metal-containing sulfide compound of the present invention has the general formula (1)
【0013】[0013]
【化7】 Embedded image
【0014】(式中、Mはケイ素、ゲルマニウム、スズ
またはチタンを示し、xは1〜4の整数を示し、yは1
または2を示す。)で表される新規化合物であり、上記
一般式(1) から明らかなように、ケイ素、ゲルマニウ
ム、スズおよびチタンから選ばれる金属原子に4つとも
同一の、あるいは異なる二種のエピスルフィド誘導体が
結合していることを特徴とするものである。ある物質の
屈折率は、構成元素の屈折率(原子屈折)の増加および
分子容の減少と共に増加する。この原子屈折は原子番号
と共に増加する。従って、骨格が炭素で構成されたエピ
スルフィド化合物に比べると、ケイ素、ゲルマニウム、
スズ、チタンなどの金属原子を導入した本発明の金属含
有エピスルフィド化合物の屈折率は著しく高まり、この
化合物を原料として得られた重合体の屈折率も増加する
こととなる。本発明の金属含有エピスルフィド化合物は
4官能性であり、その官能基間はできるだけ少ない元素
で構成されているため、架橋密度の増加により分子容の
減少が引き起こされ、その結果、本発明の金属含有エピ
スルフィド化合物を用いて得られた重合体の屈折率は、
増加する。従って、高架橋密度を維持しアッベ数を低下
させることなく屈折率を高めるために、一般式(1) にお
いてyで示されるメチレン鎖数は1または2でなければ
ならない。これら置換基を一種(一般式(1) においてx
=4 )、もしくは二種(一般式(1) においてx=1〜
3)結合させることで、本発明の金属含有エピスルフィ
ド化合物を用いて得られる重合体の光学特性、熱的特性
および機械特性を調整することができる。(Wherein, M represents silicon, germanium, tin or titanium, x represents an integer of 1-4, and y represents 1
Or 2 is indicated. ). As is clear from the above general formula (1), four identical or different two types of episulfide derivatives are bonded to metal atoms selected from silicon, germanium, tin and titanium. It is characterized by doing. The refractive index of a substance increases with increasing refractive index (atomic refraction) and decreasing molecular volume of constituent elements. This atomic refraction increases with the atomic number. Therefore, compared to episulfide compounds whose skeleton is composed of carbon, silicon, germanium,
The refractive index of the metal-containing episulfide compound of the present invention into which a metal atom such as tin or titanium has been introduced is significantly increased, and the refractive index of a polymer obtained using this compound as a raw material is also increased. Since the metal-containing episulfide compound of the present invention is tetrafunctional, and the functional groups are composed of as few elements as possible, a decrease in molecular volume is caused by an increase in crosslink density, and as a result, the metal-containing episulfide compound of the present invention is reduced. The refractive index of the polymer obtained using the episulfide compound,
To increase. Therefore, in order to maintain the high crosslinking density and increase the refractive index without lowering the Abbe number, the number of methylene chains represented by y in the general formula (1) must be 1 or 2. One of these substituents is represented by the general formula (1)
= 4) or two types (x = 1 to x in the general formula (1))
3) By bonding, the optical, thermal, and mechanical properties of the polymer obtained using the metal-containing episulfide compound of the present invention can be adjusted.
【0015】上記一般式(1) で表される金属含有エピス
ルフィド化合物として具体的には、テトラキス(2:3 −
エピチオプロピルチオ)シラン、テトラキス(2:3 −エ
ピチオプロピルチオ)ゲルマン、テトラキス(2:3 −エ
ピチオプロピルチオ)スズ、テトラキス(2:3 −エピチ
オプロピルチオ)チタン、トリス(2:3 −エピチオプロ
ピルチオ)−2 −チア−4:5 −エピチオペンチルシラ
ン、トリス(2:3 −エピチオプロピルチオ)−2 −チア
−4:5 −エピチオペンチルゲルマン、トリス(2:3 −エ
ピチオプロピルチオ)−2 −チア−4:5 −エピチオペン
チルスズ、トリス(2:3 −エピチオプロピルチオ)−2
−チア−4:5 −エピチオペンチルチタン、トリス(2:3
−エピチオプロピルチオ)−3 −チア−5:6 −エピチオ
ヘキシルシラン、トリス(2:3 −エピチオプロピルチ
オ)−3 −チア−5:6 −エピチオヘキシルゲルマン、ト
リス(2:3 −エピチオプロピルチオ)−3 −チア−5:6
−エピチオヘキシルスズ、トリス(2:3 −エピチオプロ
ピルチオ)−3 −チア−5:6 −エピチオヘキシルチタ
ン、トリス(2 −チア−4:5 −エピチオペンチル)−2:
3−エピチオプロピルチオゲルマンなどが挙げられる。
この一般式(1) で表される金属含有エピスルフィド化合
物は、その構造によって、以下に示す本発明の方法によ
り、効率よく製造することができる。 (1)一般式(1) において、x=4 の化合物は、反応式As the metal-containing episulfide compound represented by the general formula (1), specifically, tetrakis (2: 3-
Epithiopropylthio) silane, tetrakis (2: 3-epithiopropylthio) germane, tetrakis (2: 3-epithiopropylthio) tin, tetrakis (2: 3-epithiopropylthio) titanium, tris (2: 3-epithiopropylthio) -2-thia-4: 5-epithiopentylsilane, tris (2: 3-epithiopropylthio) -2-thia-4: 5-epithiopentylgermane, tris (2: 3-Epithiopropylthio) -2-thia-4: 5-epithiopentyltin, tris (2: 3-epithiopropylthio) -2
-Thia-4: 5 -epithiopentyl titanium, tris (2: 3
-Epithiopropylthio) -3-thia-5: 6-epithiohexylsilane, tris (2: 3-epithiopropylthio) -3-thia-5: 6-epithiohexylgermane, tris (2: 3 -Epithiopropylthio) -3-thia-5: 6
-Epithiohexyltin, tris (2: 3-epithiopropylthio) -3-thia-5: 6-epithiohexyltitanium, tris (2-thia-4: 5-epithiopentyl) -2:
3-epithiopropylthiogermane and the like.
The metal-containing episulfide compound represented by the general formula (1) can be efficiently produced by the following method of the present invention depending on its structure. (1) In the general formula (1), the compound of x = 4 is represented by a reaction formula
【0016】[0016]
【化8】 Embedded image
【0017】に従い、2:3 −エピチオメルカプトプロパ
ンと一般式(1) におけるMに相当する金属の四ハロゲン
化物を塩基の存在下、テトラヒドロフラン、ジメチルス
フォキサイド、ジメチルフォルムアミドなどの溶媒中で
反応させることで得られる。四ハロゲン化物としては四
塩化物が好ましい。反応温度は20℃〜−30℃であ
り、塩基としてピリジン、トリエチルアミン、1,8 −ジ
アザビシクロ[5,4,0] −7−ウンデセン等が好ましく用
いられる。なお、原料の一つとして用いられる2:3−エ
ピチオメルカプトプロパンは、公知の方法、例えば「ジ
ャーナル・オブ・ケミカル・ソサエティ(J. Chem. So
c. )」第2665ページ(1960年)に記載の方法に従って
調製することができる。 (2)一般式(1) において、x=1〜3、y=1の化合
物は、反応式Accordingly, 2: 3-epithiomercaptopropane and a tetrahalide of a metal corresponding to M in the general formula (1) are dissolved in a solvent such as tetrahydrofuran, dimethylsulfoxide or dimethylformamide in the presence of a base. It is obtained by reacting with. Tetrachloride is preferred as the tetrahalide. The reaction temperature is from 20 ° C to -30 ° C, and pyridine, triethylamine, 1,8-diazabicyclo [5,4,0] -7-undecene and the like are preferably used as a base. Note that 2: 3-epithiomercaptopropane used as one of the raw materials can be obtained by a known method, for example, the method described in “Journal of Chemical Society (J. Chem. So
c.)), page 2665 (1960). (2) In the general formula (1), the compound of x = 1 to 3 and y = 1 is represented by the reaction formula
【0018】[0018]
【化9】 Embedded image
【0019】に従い得られる。すなわち、一般式(1) に
おけるMに相当する金属の四塩化物をジアゾメタンとジ
クロロメタンやエチルエーテルなどの溶媒中、10〜3
0℃にて反応させ相当する金属のクロロメチル化体を生
成させる。エチルエーテルを溜去し単離されたこの生成
物を、あらかじめ塩基と2:3 −エピチオメルカプトプロ
パンで生成させたチオレートとジクロロメタン、メタノ
ール、エタノール、エチルエーテル、テトラヒドロフラ
ン、ジメチルスフォキサイド、ジメチルフォルムアミド
やそれらの混合溶媒中で反応させる。この塩基として
は、ナトリウムメトキサイド、ナトリウムエトキサイ
ド、水素化ナトリウム、ノルマルブチルリチウムなどが
用いられ、その添加量は金属に直接結合した塩素原子と
当量である。 (3)一般式(1) においてx=1〜3、y=2の化合物
は、反応式[0019] That is, a metal tetrachloride corresponding to M in the general formula (1) is dissolved in diazomethane and a solvent such as dichloromethane or ethyl ether for 10 to 3 times.
The reaction is carried out at 0 ° C. to form a chloromethylated product of the corresponding metal. Ethyl ether was distilled off and the isolated product was treated with a base and thiolate previously formed with 2: 3-epithiomercaptopropane and dichloromethane, methanol, ethanol, ethyl ether, tetrahydrofuran, dimethyl sulfoxide, dimethyl The reaction is carried out in formamide or a mixed solvent thereof. As this base, sodium methoxide, sodium ethoxide, sodium hydride, normal butyllithium and the like are used, and the added amount is equivalent to a chlorine atom directly bonded to the metal. (3) In the general formula (1), the compound of x = 1 to 3 and y = 2 is obtained by the reaction formula
【0020】[0020]
【化10】 Embedded image
【0021】に従い得られる。すなわち、一般式(1) に
おけるMに相当する金属の四ハロゲン化物、すなわち一
般式MZ4 で表される四ハロゲン化金属、好ましくは四
塩化物をビニルマグネシウムブロマイドと0〜30℃で
反応させ得られたビニル置換体を2:3 −エピチオメルカ
プトプロパンと、まず、塩基存在下、ジクロロメタン、
テトラヒドロフラン、エチルエーテル、ジメチルスフォ
キサイド、ジメチルフォルムアミドやそれらの混合溶媒
中、10℃〜−30℃で反応させ、次いで、ラジカル発
生剤の存在下、40〜80℃で反応させる。この塩基と
してピリジン、トリエチルアミン、1,8 −ジアザビシク
ロ[5,4,0] −7−ウンデセン等が、またラジカル発生剤
として過酸化ベンゾイル、アゾビスジメチルブチロニト
リル、アゾビスジメチルバレロニトリルなどが好ましく
用いられる。この塩基の添加量は金属に直接結合した塩
素原子と当量であり、また、ラジカル発生剤のそれはビ
ニル基に対して0.01〜0.0001当量である。このビ
ニル置換体と2:3 −エピチオメルカプトプロパンの反応
において、ラジカル発生剤の存在下で加熱する代わり
に、高圧水銀灯で350nmにおける強度が0.0〜10
0mW/cm2 の紫外線をテトラヒドロフランやノルマ
ルヘキサン中、もしくは無溶媒にて照射することでも同
じ化合物が得られる。[0021] In other words, the general formula (1) tetrahalide of the metal corresponding to M in, i.e. tetrahalide metal represented by the general formula MZ 4, obtained preferably by reacting the tetrachloride with vinyl magnesium bromide and 0 to 30 ° C. The obtained vinyl-substituted product was mixed with 2: 3-epithiomercaptopropane firstly in the presence of a base in dichloromethane,
The reaction is carried out in tetrahydrofuran, ethyl ether, dimethyl sulfoxide, dimethyl formamide or a mixed solvent thereof at 10 ° C to -30 ° C, and then at 40 to 80 ° C in the presence of a radical generator. As the base, pyridine, triethylamine, 1,8-diazabicyclo [5,4,0] -7-undecene and the like are preferable, and as the radical generator, benzoyl peroxide, azobisdimethylbutyronitrile, azobisdimethylvaleronitrile and the like are preferable. Used. The amount of the base added is equivalent to the chlorine atom directly bonded to the metal, and that of the radical generator is 0.01 to 0.0001 equivalent to the vinyl group. In the reaction of this vinyl-substituted product with 2: 3-epithiomercaptopropane, instead of heating in the presence of a radical generator, the intensity at 350 nm with a high-pressure mercury lamp is 0.0 to 10%.
The same compound can be obtained by irradiating ultraviolet rays of 0 mW / cm 2 in tetrahydrofuran or normal hexane, or without solvent.
【0022】次に、本発明の金属含有エピスルフィド化
合物を用いて得られる光学材料について説明する。一般
式(1) で表される金属含有エピスルフィド化合物は必須
成分であり、一種用いてもよいし、二種以上を組み合わ
せて用いてもよい。さらに、この金属含有エピスルフィ
ド化合物と、得られる重合体の物性などを適宜改良する
ための任意成分として、他のエピスルフィド化合物、エ
ポキシ化合物および単独重合可能なビニルモノマーから
選ばれる化合物とを重合させてもよい。上記の適宜用い
られる他のエピスルフィド化合物の例としては、ビス
(β−エピチオプロピルチオ)メタン、1,2−ビス
(β−エピチオプロピルチオ)エタン、1,3−ビス
(β−エピチオプロピルチオ)プロパン、1,2−ビス
(β−エピチオプロピルチオ)プロパン、1−(β−エ
ピチオプロピルチオ)−2−(β−エピチオプロピルチ
オメチル)プロパン、1,4−ビス(β−エピチオプロ
ピルチオ)ブタン、1,3−ビス(β−エピチオプロピ
ルチオ)ブタン、1−(β−エピチオプロピルチオ)−
3−(β−エピチオプロピルチオメチル)ブタン、1,
5−ビス(β−エピチオプロピルチオ)ペンタン、1−
(β−エピチオプロピルチオ)−4−(β−エピチオプ
ロピルチオメチル)ペンタン、1,6−ビス(β−エピ
チオプロピルチオ)ヘキサン、1−(β−エピチオプロ
ピルチオ)−5−(β−エピチオプロピルチオメチル)
ヘキサン、1−(β−エピチオプロピルチオ)−2−
〔(2−β−エピチオプロピルチオエチル)チオ〕エタ
ン、1−(β−エピチオプロピルチオ)−2−[〔2−
(2−β−エピチオプロピルチオエチル)チオエチル〕
チオ]エタン等の鎖状有機化合物等を、また、テトラキ
ス(β−エピチオプロピルチオメチル)メタン、1,
1,1−トリス(β−エピチオプロピルチオメチル)プ
ロパン、1,5−ビス(β−エピチオプロピルチオ)−
2−(β−エピチオプロピルチオメチル)−3−チアペ
ンタン、1,5−ビス(β−エピチオプロピルチオ)−
2,4−ビス(β−エピチオプロピルチオメチル)−3
−チアペンタン、1−(β−エピチオプロピルチオ)−
2,2−ビス(β−エピチオプロピルチオメチル)−4
−チアヘキサン、1,5,6−トリス(β−エピチオプ
ロピルチオ)−4−(β−エピチオプロピルチオメチ
ル)−3−チアヘキサン、1,8−ビス(β−エピチオ
プロピルチオ)−4−(β−エピチオプロピルチオメチ
ル)−3,6−ジチアオクタン、1,8−ビス(β−エ
ピチオプロピルチオ)−4,5ビス(β−エピチオプロ
ピルチオメチル)−3,6−ジチアオクタン、1,8−
ビス(β−エピチオプロピルチオ)−4,4−ビス(β
−エピチオプロピルチオメチル)−3,6−ジチアオク
タン、1,8−ビス(β−エピチオプロピルチオ)−
2,4,5−トリス(β−エピチオプロピルチオメチ
ル)−3,6−ジチアオクタン、1,8−ビス(β−エ
ピチオプロピルチオ)−2,5−ビス(β−エピチオプ
ロピルチオメチル)−3,6−ジチアオクタン、1,9
−ビス(β−エピチオプロピルチオ)−5−(β−エピ
チオプロピルチオメチル)−5−〔(2−β−エピチオ
プロピルチオエチル)チオメチル〕−3,7−ジチアノ
ナン、1,10−ビス(β−エピチオプロピルチオ)−
5,6−ビス〔(2−β−エピチオプロピルチオエチ
ル)チオ〕−3,6,9−トリチアデカン、1,11−
ビス(β−エピチオプロピルチオ)−4,8−ビス(β
−エピチオプロピルチオメチル)−3,6,9−トリチ
アウンデカン、1,11−ビス(β−エピチオプロピル
チオ)−5,7−ビス(β−エピチオプロピルチオメチ
ル)−3,6,9−トリチアウンデカン、1,11−ビ
ス(β−エピチオプロピルチオ)−5,7−〔(2−β
−エピチオプロピルチオエチル)チオメチル〕−3,
6,9−トリチアウンデカン、1,11−ビス(β−エ
ピチオプロピルチオ)−4,7−ビス(β−エピチオプ
ロピルチオメチル)−3,6,9−トリチアウンデカン
等の分岐状有機化合物およびこれらの化合物のエピスル
フィド基の水素の少なくとも1個がメチル基で置換され
た化合物等が、さらには1,3および1,4−ビス(β
−エピチオプロピルチオ)シクロヘキサン、1,3およ
び1,4−ビス(β−エピチオプロピルチオメチル)シ
クロヘキサン、ビス〔4−(β−エピチオプロピルチ
オ)シクロヘキシル〕メタン、2,2−ビス〔4−(β
−エピチオプロピルチオ)シクロヘキシル〕プロパン、
ビス〔4−(β−エピチオプロピルチオ)シクロヘキシ
ル〕スルフィド、2,5−ビス(β−エピチオプロピル
チオメチル)−1,4−ジチアン、2,5−ビス(β−
エピチオプロピルチオエチルチオメチル)−1,4−ジ
チアン等の環状脂肪族有機化合物およびこれらの化合物
のエピスルフィド基の水素の少なくとも1個がメチル基
で置換された化合物、および1,3および1,4−ビス
(β−エピチオプロピルチオ)ベンゼン、1,3および
1,4−ビス(β−エピチオプロピルチオメチル)ベン
ゼン、ビス〔4−(β−エピチオプロピルチオ)フェニ
ル〕メタン、2,2−ビス〔4−(β−エピチオプロピ
ルチオ)フェニル〕プロパン、ビス〔4−(β−エピチ
オプロピルチオ)フェニル〕スルフィド、ビス〔4−
(β−エピチオプロピルチオ)フェニル〕スルフォン、
4,4' −ビス(β−エピチオプロピルチオ)ビフェニ
ル等の芳香族有機化合物およびこれらの化合物のエピス
ルフィド基の水素の少なくとも1個がメチル基で置換さ
れた化合物等が挙げられ、これらは単独もしくは二種以
上を組み合わせて用いてもよい。これらの使用量は、一
般式(1) で表される金属含有エピスルフィド化合物の総
量に対して0.01〜50モル%が好ましい。Next, an optical material obtained by using the metal-containing episulfide compound of the present invention will be described. The metal-containing episulfide compound represented by the general formula (1) is an essential component, and may be used alone or in combination of two or more. Furthermore, the metal-containing episulfide compound may be polymerized with another episulfide compound, an epoxy compound and a compound selected from homopolymerizable vinyl monomers as an optional component for appropriately improving the properties and the like of the obtained polymer. Good. Examples of the other episulfide compounds suitably used above include bis (β-epithiopropylthio) methane, 1,2-bis (β-epithiopropylthio) ethane, and 1,3-bis (β-epithiothio). Propylthio) propane, 1,2-bis (β-epithiopropylthio) propane, 1- (β-epithiopropylthio) -2- (β-epithiopropylthiomethyl) propane, 1,4-bis ( β-epithiopropylthio) butane, 1,3-bis (β-epithiopropylthio) butane, 1- (β-epithiopropylthio)-
3- (β-epithiopropylthiomethyl) butane, 1,
5-bis (β-epithiopropylthio) pentane, 1-
(Β-epithiopropylthio) -4- (β-epithiopropylthiomethyl) pentane, 1,6-bis (β-epithiopropylthio) hexane, 1- (β-epithiopropylthio) -5 (Β-epithiopropylthiomethyl)
Hexane, 1- (β-epithiopropylthio) -2-
[(2-β-epithiopropylthioethyl) thio] ethane, 1- (β-epithiopropylthio) -2-[[2-
(2-β-epithiopropylthioethyl) thioethyl]
A chain organic compound such as [thio] ethane, etc., and tetrakis (β-epithiopropylthiomethyl) methane,
1,1-tris (β-epithiopropylthiomethyl) propane, 1,5-bis (β-epithiopropylthio)-
2- (β-epithiopropylthiomethyl) -3-thiapentane, 1,5-bis (β-epithiopropylthio)-
2,4-bis (β-epithiopropylthiomethyl) -3
-Thiapentane, 1- (β-epithiopropylthio)-
2,2-bis (β-epithiopropylthiomethyl) -4
-Thiahexane, 1,5,6-tris (β-epithiopropylthio) -4- (β-epithiopropylthiomethyl) -3-thiahexane, 1,8-bis (β-epithiopropylthio) -4 -(Β-epithiopropylthiomethyl) -3,6-dithiaoctane, 1,8-bis (β-epithiopropylthio) -4,5bis (β-epithiopropylthiomethyl) -3,6-dithiaoctane , 1,8-
Bis (β-epithiopropylthio) -4,4-bis (β
-Epithiopropylthiomethyl) -3,6-dithiaoctane, 1,8-bis (β-epithiopropylthio)-
2,4,5-tris (β-epithiopropylthiomethyl) -3,6-dithiaoctane, 1,8-bis (β-epithiopropylthio) -2,5-bis (β-epithiopropylthiomethyl ) -3,6-dithiaoctane, 1,9
-Bis (β-epithiopropylthio) -5- (β-epithiopropylthiomethyl) -5-[(2-β-epithiopropylthioethyl) thiomethyl] -3,7-dithianonane, 1,10- Bis (β-epithiopropylthio)-
5,6-bis [(2-β-epithiopropylthioethyl) thio] -3,6,9-trithiadecane, 1,11-
Bis (β-epithiopropylthio) -4,8-bis (β
-Epithiopropylthiomethyl) -3,6,9-trithiaundecane, 1,11-bis (β-epithiopropylthio) -5,7-bis (β-epithiopropylthiomethyl) -3,6 , 9-Trithiaundecane, 1,11-bis (β-epithiopropylthio) -5,7-[(2-β
-Epithiopropylthioethyl) thiomethyl] -3,
Branched such as 6,9-trithiaundecane, 1,11-bis (β-epithiopropylthio) -4,7-bis (β-epithiopropylthiomethyl) -3,6,9-trithiaundecane Organic compounds and compounds in which at least one hydrogen of the episulfide group of these compounds is substituted with a methyl group, and the like, further include 1,3 and 1,4-bis (β
-Epithiopropylthio) cyclohexane, 1,3 and 1,4-bis (β-epithiopropylthiomethyl) cyclohexane, bis [4- (β-epithiopropylthio) cyclohexyl] methane, 2,2-bis [ 4- (β
-Epithiopropylthio) cyclohexyl] propane,
Bis [4- (β-epithiopropylthio) cyclohexyl] sulfide, 2,5-bis (β-epithiopropylthiomethyl) -1,4-dithiane, 2,5-bis (β-
Cycloaliphatic organic compounds such as (epithiopropylthioethylthiomethyl) -1,4-dithiane; compounds in which at least one hydrogen of the episulfide group of these compounds is substituted with a methyl group; 4-bis (β-epithiopropylthio) benzene, 1,3 and 1,4-bis (β-epithiopropylthiomethyl) benzene, bis [4- (β-epithiopropylthio) phenyl] methane, , 2-bis [4- (β-epithiopropylthio) phenyl] propane, bis [4- (β-epithiopropylthio) phenyl] sulfide, bis [4-
(Β-epithiopropylthio) phenyl] sulfone,
Aromatic organic compounds such as 4,4′-bis (β-epithiopropylthio) biphenyl and compounds in which at least one hydrogen of the episulfide group of these compounds is substituted with a methyl group, etc. Alternatively, two or more kinds may be used in combination. These are preferably used in an amount of 0.01 to 50 mol% based on the total amount of the metal-containing episulfide compound represented by the general formula (1).
【0023】上記の適宜用いられるエポキシ化合物の例
としては、ヒドロキノン、カテコール、レゾルシン、ビ
スフェノールA、ビスフェノールF、ビスフェノールス
ルフォン、ビスフェノールエーテル、ビスフェノールス
ルフィド、ビスフェノールスルフィド、ハロゲン化ビス
フェノールA、ノボラック樹脂等の多価フェノール化合
物とエピハロヒドリンの縮合により製造されるフェノー
ル系エポキシ化合物;エチレングリコール、ジエチレン
グリコール、トリエチレングリコール、ポリエチレング
リコール、プロピレングリコール、ジプロピレングリコ
ール、ポリプロピレングリコール、1、3−プロパンジ
オール、1、4−ブタンジオール、1、6−ヘキサンジ
オール、ネオペンチルグリコール、グリセリン、トリメ
チロールプロパントリメタクリレート、ペンタエリスリ
トール、1、3−および1、4−シクロヘキサンジオー
ル、1、3−および1、4−シクロヘキサンジメタノー
ル、水添ビスフェノールA、ビスフェノルA・エチレン
オキサイド付加物、ビスフェノルA・プロピレンオキサ
イド付加物等の多価アルコール化合物とエピハロヒドリ
ンの縮合により製造されるアルコール系エポキシ化合
物;アジピン酸、セバチン酸、ドデカンジカルボン酸、
ダイマー酸、フタル酸、イソ、テレフタル酸、テトラヒ
ドロフタル酸、メチルテトラヒドロフタル酸、ヘキサヒ
ドロフタル酸、ヘキサヒドロイソフタル酸、ヘキサヒド
ロテレフタル酸、ヘット酸、ナジック酸、マレイン酸、
コハク酸、フマール酸、トリメリット酸、ベンゼンテト
ラカルボン酸、ベンゾフェノンテトラカルボン酸、ナフ
タリンジカルボン酸、ジフェニルジカルボン酸等の多価
カルボン酸化合物とエピハロヒドリンの縮合により製造
されるグリシジルエステル系エポキシ化合物;エチレン
ジアミン、1,2−ジアミノプロパン、1,3−ジアミ
ノプロパン、1,2−ジアミノブタン、1,3−ジアミ
ノブタン、1,4−ジアミノブタン、1,5−ジアミノ
ペンタン、1,6−ジアミノヘキサン、1,7−ジアミ
ノヘプタン、1,8−ジアミノオクタン、ビス−(3−
アミノプロピル)エーテル、1,2−ビス−(3−アミ
ノプロポキシ)エタン、1,3−ビス−(3−アミノプ
ロポキシ)−2,2' −ジメチルプロパン、1,2−、
1,3−または1,4−ビスアミノシクロヘキサン、
1,3−または1,4−ビスアミノメチルシクロヘキサ
ン、1,3−または1,4−ビスアミノエチルシクロヘ
キサン、1,3−または1,4−ビスアミノプロピルシ
クロヘキサン、水添4,4' −ジアミノジフェニルメタ
ン、イソホロンジアミン、1,4−ビスアミノプロピル
ピペラジン、m−またはp−フェニレンジアミン、2,
4−または2,6−トリレンジアミン、m−またはp−
キシリレンジアミン、1,5−または2,6−ナフタレ
ンジアミン、4,4' −ジアミノジフェニルメタン、
4,4' −ジアミノジフェニルエーテル、2,2−
(4,4' −ジアミノジフェニル)プロパン等の一級ジ
アミン、N,N' −ジメチルエチレンジアミン、N,
N' −ジメチル−1,2−ジアミノプロパン、N,N'
−ジメチル−1,3−ジアミノプロパン、N,N' −ジ
メチル−1,2−ジアミノブタン、N,N' −ジメチル
−1,3−ジアミノブタン、N,N' −ジメチル−1,
4−ジアミノブタン、N,N' −ジメチル−1,5−ジ
アミノペンタン、N,N' −ジメチル−1,6−ジアミ
ノヘキサン、N,N' −ジメチル−1,7−ジアミノヘ
プタン、N,N' −ジエチルエチレンジアミン、N,
N' −ジエチル−1,2−ジアミノプロパン、N,N'
−ジエチル−1,3−ジアミノプロパン、N,N' −ジ
エチル−1,2−ジアミノブタン、N,N' −ジエチル
−1,3−ジアミノブタン、N,N' −ジエチル−1,
4−ジアミノブタン、N,N' −ジエチル−1,6−ジ
アミノヘキサン、ピペラジン、2−メチルピペラジン、
2,5−または2,6−ジメチルピペラジン、ホモピペ
ラジン、1,1−ジ−(4−ピペリジル)−メタン、
1,2−ジ−(4−ピペリジル)−エタン、1,3−ジ
−(4−ピペリジル)−プロパン、1,4−ジ−(4−
ピペリジル)−ブタン等のニ級ジアミンとエピハロヒド
リンの縮合により製造されるアミン系エポキシ化合物;
3、4−エポキシシクロヘキシル−3、4−エポキシシ
クロヘキサンカルボキシレート、ビニルシクリヘキサン
ジオキサイド、2−(3、4−エポキシシクロヘキシ
ル)−5、5−スピロ−3、4−エポキシシクロヘキサ
ン−メタ−ジオキサン、ビス(3、4−エポキシシクロ
ヘキシル)アジペート等の脂環式エポキシ化合物;シク
ロペンタジエンエポキシド、エポキシ化大豆油、エポキ
シ化ポリブタジエン、ビニルシクロヘキセンエポキシド
等の不飽和化合物のエポキシ化により製造されるエポキ
シ化合物;上述の多価アルコール、フェノール化合物と
ジイソシアネートおよびグリシドール等から製造される
ウレタン系エポキシ化合物等が挙げられ、これらは単独
もしくは二種以上を組み合わせて用いてもよい。これら
の使用量は、一般式(1) で表される金属含有エピスルフ
ィド化合物の総量に対して0.01〜5モル%が好まし
い。Examples of the epoxy compounds suitably used include polyquinones such as hydroquinone, catechol, resorcin, bisphenol A, bisphenol F, bisphenol sulfone, bisphenol ether, bisphenol sulfide, bisphenol sulfide, halogenated bisphenol A, and novolak resin. Phenolic epoxy compound produced by condensation of phenol compound and epihalohydrin; ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, 1,3-propanediol, 1,4-butanediol 1,6-hexanediol, neopentyl glycol, glycerin, trimethylolpropane Remethacrylate, pentaerythritol, 1,3- and 1,4-cyclohexanediol, 1,3- and 1,4-cyclohexanedimethanol, hydrogenated bisphenol A, bisphenol A-ethylene oxide adduct, bisphenol A-propylene oxide addition Epoxy compounds produced by condensation of a polyhydric alcohol compound such as a product with epihalohydrin; adipic acid, sebacic acid, dodecanedicarboxylic acid,
Dimer acid, phthalic acid, iso, terephthalic acid, tetrahydrophthalic acid, methyltetrahydrophthalic acid, hexahydrophthalic acid, hexahydroisophthalic acid, hexahydroterephthalic acid, hetonic acid, nadic acid, maleic acid,
Succinic acid, fumaric acid, trimellitic acid, benzenetetracarboxylic acid, benzophenonetetracarboxylic acid, naphthalenedicarboxylic acid, a glycidyl ester-based epoxy compound produced by condensation of a polycarboxylic acid compound such as diphenyldicarboxylic acid and epihalohydrin; ethylenediamine; 1,2-diaminopropane, 1,3-diaminopropane, 1,2-diaminobutane, 1,3-diaminobutane, 1,4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane, , 7-diaminoheptane, 1,8-diaminooctane, bis- (3-
Aminopropyl) ether, 1,2-bis- (3-aminopropoxy) ethane, 1,3-bis- (3-aminopropoxy) -2,2′-dimethylpropane, 1,2-,
1,3- or 1,4-bisaminocyclohexane,
1,3- or 1,4-bisaminomethylcyclohexane, 1,3- or 1,4-bisaminoethylcyclohexane, 1,3- or 1,4-bisaminopropylcyclohexane, hydrogenated 4,4'-diamino Diphenylmethane, isophoronediamine, 1,4-bisaminopropylpiperazine, m- or p-phenylenediamine, 2,
4- or 2,6-tolylenediamine, m- or p-
Xylylenediamine, 1,5- or 2,6-naphthalenediamine, 4,4′-diaminodiphenylmethane,
4,4'-diaminodiphenyl ether, 2,2-
Primary diamines such as (4,4'-diaminodiphenyl) propane, N, N'-dimethylethylenediamine, N,
N'-dimethyl-1,2-diaminopropane, N, N '
-Dimethyl-1,3-diaminopropane, N, N'-dimethyl-1,2-diaminobutane, N, N'-dimethyl-1,3-diaminobutane, N, N'-dimethyl-1,
4-diaminobutane, N, N'-dimethyl-1,5-diaminopentane, N, N'-dimethyl-1,6-diaminohexane, N, N'-dimethyl-1,7-diaminoheptane, N, N '-Diethylethylenediamine, N,
N'-diethyl-1,2-diaminopropane, N, N '
-Diethyl-1,3-diaminopropane, N, N'-diethyl-1,2-diaminobutane, N, N'-diethyl-1,3-diaminobutane, N, N'-diethyl-1,
4-diaminobutane, N, N'-diethyl-1,6-diaminohexane, piperazine, 2-methylpiperazine,
2,5- or 2,6-dimethylpiperazine, homopiperazine, 1,1-di- (4-piperidyl) -methane,
1,2-di- (4-piperidyl) -ethane, 1,3-di- (4-piperidyl) -propane, 1,4-di- (4-
Amine-based epoxy compounds produced by condensation of a secondary diamine such as piperidyl) -butane and epihalohydrin;
3,4-epoxycyclohexyl-3,4-epoxycyclohexanecarboxylate, vinylcyclohexanedioxide, 2- (3,4-epoxycyclohexyl) -5,5-spiro-3,4-epoxycyclohexane-meta-dioxane, Alicyclic epoxy compounds such as bis (3,4-epoxycyclohexyl) adipate; epoxy compounds produced by epoxidation of unsaturated compounds such as cyclopentadiene epoxide, epoxidized soybean oil, epoxidized polybutadiene and vinylcyclohexene epoxide; And urethane-based epoxy compounds produced from phenol compounds and diisocyanates and glycidol. These may be used alone or in combination of two or more. These are preferably used in an amount of 0.01 to 5 mol% based on the total amount of the metal-containing episulfide compound represented by the general formula (1).
【0024】上記の適宜用いられる単独重合可能なビニ
ルモノマーの例としては、メチルアクリレート、メチル
メタクリレート、エチルアクリレート、エチルメタクリ
レート、エチレングリコールジアクリレート、エチレン
グリコールジメタクリレート、ジエチレングリコールジ
アクリレート、ジエチレングリコールジメタクリレー
ト、トリエチレングリコールジアクリレート、トリエチ
レングリコールジメタクリレート、ポリエチレングリコ
ールジアクリレート、ポリエチレングリコールジメタク
リレート、1,3−ブチレングリコールジアクリレー
ト、1,3−ブチレングリコールジメタクリレート、
1,6−ヘキサンジオールジアクリレート、1,6−ヘ
キサンジオールジメタクリレート、ネオペンチルグリコ
ールジアクリレート、ネオペンチルグリコールジメタク
リレート、ポリプロピレングリコールジアクリレート、
ポリプロピレングリコールジメタクリレート、2,2−
ビス〔4−(アクリロキシエトキシ)フェニル〕プロパ
ン、2,2−ビス〔4−(メタクリロキシエトキシ)フ
ェニル〕プロパン、2,2−ビス〔4−(アクリロキシ
・ジエトキシ)フェニル〕プロパン、2,2−ビス〔4
−(メタクリロキシ・ジエトキシ)フェニル〕プロパ
ン、2,2−ビス〔4−(アクリロキシ・ポリエトキ
シ)フェニル〕プロパン、2,2−ビス〔4−(メタク
リロキシ・ポリエトキシ)フェニル〕プロパン、トリメ
チロールプロパントリアクリレート、トリメチロールプ
ロパントリメタクリレート、ペンタエリスリトールテト
ラアクリレート、ペンタエリスリトールテトラメタクリ
レート、ビス(2,2,2−トリメチロールエチル)エ
ーテルのヘキサアクリレート、ビス(2,2,2−トリ
メチロールエチル)エーテルのヘキサメタクリレート等
の1価以上のアルコールとアクリル酸、メタクリル酸の
エステル構造を有する化合物;アリルスルフィド、ジア
リルフタレート、ジエチレングリコールビスアリルカー
ボネート等のアリル化合物;アクロレイン、アクリロニ
トリル、ビニルスルフィド等のビニル化合物;スチレ
ン、α−メチルスチレン、メチルビニルベンゼン、エチ
ルビニルベンゼン、α−クロロスチレン、クロロビニル
ベンゼン、ビニルベンジルクロライド、パラジビニルベ
ンゼン、メタジビニルベンゼン等の芳香族ビニル化合物
等が挙げられ、これらは単独もしくは二種以上を組み合
わせて用いてもよい。これらの使用量は一般式(1) で表
される金属含有エピスルフィド化合物の総量に対して0.
01〜20モル%が好ましい。Examples of the suitable homopolymerizable vinyl monomers include methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, diethylene glycol dimethacrylate, and triethylene glycol. Ethylene glycol diacrylate, triethylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, 1,3-butylene glycol diacrylate, 1,3-butylene glycol dimethacrylate,
1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, polypropylene glycol diacrylate,
Polypropylene glycol dimethacrylate, 2,2-
Bis [4- (acryloxyethoxy) phenyl] propane, 2,2-bis [4- (methacryloxyethoxy) phenyl] propane, 2,2-bis [4- (acryloxydiethoxy) phenyl] propane, 2,2 -Screw [4
-(Methacryloxy-diethoxy) phenyl] propane, 2,2-bis [4- (acryloxy-polyethoxy) phenyl] propane, 2,2-bis [4- (methacryloxy-polyethoxy) phenyl] propane, trimethylolpropane triacrylate, Trimethylolpropane trimethacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, hexaacrylate of bis (2,2,2-trimethylolethyl) ether, hexamethacrylate of bis (2,2,2-trimethylolethyl) ether, etc. Having an ester structure of acrylic acid or methacrylic acid with a monohydric or higher alcohol and allylation of allyl sulfide, diallyl phthalate, diethylene glycol bisallyl carbonate, etc. Products; vinyl compounds such as acrolein, acrylonitrile and vinyl sulfide; styrene, α-methylstyrene, methylvinylbenzene, ethylvinylbenzene, α-chlorostyrene, chlorovinylbenzene, vinylbenzyl chloride, paradivinylbenzene, metadivinylbenzene, etc. Examples thereof include aromatic vinyl compounds, and these may be used alone or in combination of two or more. The amount of these used is 0.
It is preferably from 01 to 20 mol%.
【0025】上記の重合性組成物には、本発明の目的が
損なわれない範囲で、所望により、耐候性改良のため、
紫外線吸収剤、酸化防止剤、着色防止剤、蛍光染料など
の添加剤を適宜加えてもよい。また、重合反応向上のた
めの触媒を適宜使用してもよく、例えばアミン類、フォ
スフィン類、第4級アンモニウム塩類、第4級ホスホニ
ウム塩類、第3級スルホニウム塩類、第2級ヨードニウ
ム塩類、鉱酸類、ルイス酸類、有機酸類、ケイ酸類、四
フッ化ホウ酸等が効果的である。本発明の金属含有エピ
スルフィド化合物を用いて得られる光学材料は、例えば
以下に示す方法に従って製造することができる。まず、
上記重合性化合物、および必要に応じて用いられる各種
添加剤を含む均一な組成物を調製する。次いで、この組
成物を公知の注型重合法を用いて、ガラス製または金属
製のモールドと樹脂性のガスケットを組み合わせた型の
中に注入し、加熱して硬化させる。この際、成形後の樹
脂の取り出しを容易にするためにあらかじめモールドを
離型処理したり、この組成物に離型剤を混合してもよ
い。重合温度は、使用する化合物により異なるが、一般
には−20〜150℃で、重合時間は0.5〜72時間程
度である。重合後離型された重合体は通常の分散染料を
用い、水もしくは有機溶媒中で容易に染色できる。この
際さらに染色を容易にするために、染料分散液にキャリ
アーを加えてもよく、また加熱してもよい。このように
して得られた光学材料の用途は特に限定されるものでは
ないが、プラスチックレンズ等の光学製品として特に好
ましく用いられる。The above-mentioned polymerizable composition may, if desired, improve the weather resistance as long as the object of the present invention is not impaired.
Additives such as an ultraviolet absorber, an antioxidant, a coloring inhibitor, and a fluorescent dye may be appropriately added. Further, a catalyst for improving the polymerization reaction may be appropriately used, and examples thereof include amines, phosphines, quaternary ammonium salts, quaternary phosphonium salts, tertiary sulfonium salts, secondary iodonium salts, and mineral acids. , Lewis acids, organic acids, silicic acids, and boric acid tetrafluoride are effective. The optical material obtained by using the metal-containing episulfide compound of the present invention can be produced, for example, according to the following method. First,
A uniform composition containing the polymerizable compound and various additives used as needed is prepared. Next, the composition is poured into a mold in which a glass or metal mold and a resin gasket are combined using a known casting polymerization method, and is cured by heating. At this time, in order to facilitate removal of the resin after molding, the mold may be subjected to a releasing treatment in advance, or a releasing agent may be mixed with the composition. The polymerization temperature varies depending on the compound used, but is generally -20 to 150 ° C, and the polymerization time is about 0.5 to 72 hours. The polymer released after the polymerization can be easily dyed in water or an organic solvent using a usual disperse dye. At this time, in order to further facilitate dyeing, a carrier may be added to the dye dispersion, or heating may be performed. The use of the optical material thus obtained is not particularly limited, but it is particularly preferably used as an optical product such as a plastic lens.
【0026】[0026]
【実施例】次に、本発明を実施例により、さらに具体的
に説明するが、本発明は、これらの例によってなんら限
定されるものではない。なお、実施例で得られた金属含
有エピスルフィド化合物の物性、および応用例、比較応
用例で得られた重合体の物性は、以下に示す方法に従っ
て測定した。 <金属含有エピスルフィド化合物の物性> 屈折率(nd ) 、アッベ数(νd ):カルニュー社製精
密屈折率計KPR−200を用いて25℃にて測定し
た。 <重合体の物性> 1) 屈折率(nd ) 、アッベ数(νd ): 上記と同様
にして測定した。 2) 外 観: 肉眼により観察した。 3) 耐候性: サンシャインカーボンアークランプを装
備したウエザーメーターにプラスチックレンズをセット
し、200時間経過したところでプラスチックレンズを
取り出し、試験前のプラスチックレンズと色相を比較し
た。評価基準は変化なし (○) 、わずかに黄変 (△) 、
黄変 (×) とした。 4) 耐熱性: リガク社製TMA装置により0.5mmφ
のピンを用いて98mN(10gf)の荷重でTMA測
定を行ない、10℃/minの昇温で得られたチャートのピ
ーク温度により評価した。 5) 光学歪: シュリーレン法による目視観察を行なっ
た。歪の無いものを○、歪のあるものを×と評価した。EXAMPLES Next, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples. In addition, the physical properties of the metal-containing episulfide compound obtained in the examples, and the physical properties of the polymers obtained in the application examples and the comparative application examples were measured according to the methods described below. Refractive index <Physical Properties of the metal-containing episulfide compounds> (n d), Abbe number (ν d): a Kalnew Co. precision refractometer KPR-200 was measured at 25 ° C. using. 1) Refractive index <Properties of polymer> (n d), Abbe number ([nu d): was measured in the same manner as described above. 2) Appearance: Observed with the naked eye. 3) Weather resistance: The plastic lens was set on a weather meter equipped with a sunshine carbon arc lamp, and after 200 hours, the plastic lens was taken out and the hue was compared with the plastic lens before the test. The evaluation criteria were no change (○), slight yellowing (△),
Yellowing (x). 4) Heat resistance: 0.5mmφ using Rigaku TMA device
TMA measurement was performed with a load of 98 mN (10 gf) using the above pin, and the evaluation was made based on the peak temperature of the chart obtained at a temperature increase of 10 ° C./min. 5) Optical distortion: Visual observation was performed by the Schlieren method. Those without distortion were evaluated as ○, and those with distortion were evaluated as x.
【0027】実施例1テトラキス(2:3 −エピチオプロピルチオ)ゲルマン
(E1)( 一般式 (1)においてM=Ge、x=4)の製
造例 2:3 −エピチオプロピルメルカプタン(10.04g)の
テトラヒドロフラン (94.5mL)溶液に乾燥ピリジン
(10.47g)を−30℃にて加え5分間攪拌した後、
その温度で四塩化ゲルマニウム(5.07g)のテトラヒ
ドロフラン (47.2mL)溶液を2時間かけて滴下し、
−20℃にて4時間攪拌した。この反応混合物に2N−
塩酸(30mL)を加え、生成物をベンゼン(50m
L)で二回抽出し、有機層を2N−塩酸(30mL)お
よび水で洗浄した後、硫酸マグネシウムで乾燥させた。
この抽出物からベンゼンを溜去した残渣を、ベンゼンと
ノルマルヘキサン(混合体積比率=7/3)の混合溶媒
を移動相としたシリカゲルカラムクロマトグラフィーを
用いて精製することによりテトラキス(2:3 −エピチオ
プロピルチオ)ゲルマン(7.06g、収率=60.6%)
を得た。この化合物の屈折率は1.691、アッベ数は2
8.3あった。以下にこの化合物の構造決定のための分析
結果を示す。1 H−NMR(溶媒:CDCl3 、内部標準物質:TM
S);δ2.33 (dd, 1H)、δ2.60 (dt, 1H) 、δ2.84 (d
d, 1H) 、δ3.23〜3.14 (m, 1H)、δ3.31 (dd,1H) 。 IR(液膜);2987、1439、1423、1239、1088、1045、
684 、660 、617 cm-1。Example 1 Tetrakis (2: 3-epithiopropylthio) germane
(E1) (M = Ge, x = 4 in the general formula (1))
Preparation Example 2: To a solution of 3- epithiopropylmercaptan (10.04 g) in tetrahydrofuran (94.5 mL) was added dry pyridine (10.47 g) at -30 ° C, and the mixture was stirred for 5 minutes.
At that temperature, a solution of germanium tetrachloride (5.07 g) in tetrahydrofuran (47.2 mL) was added dropwise over 2 hours.
The mixture was stirred at -20 ° C for 4 hours. 2N-
Hydrochloric acid (30 mL) was added, and the product was treated with benzene (50 m
L), and the organic layer was washed with 2N-hydrochloric acid (30 mL) and water, and dried over magnesium sulfate.
The residue obtained by distilling off benzene from this extract was purified by silica gel column chromatography using a mixed solvent of benzene and normal hexane (mixing volume ratio = 7/3) as a mobile phase to obtain tetrakis (2: 3- Epithiopropylthio) germane (7.06 g, yield = 60.6%)
I got This compound has a refractive index of 1.691 and an Abbe number of 2
8.3. The analysis results for determining the structure of this compound are shown below. 1 H-NMR (solvent: CDCl 3 , internal standard: TM
S); δ2.33 (dd, 1H), δ2.60 (dt, 1H), δ2.84 (d
d, 1H), δ 3.23 to 3.14 (m, 1H), δ 3.31 (dd, 1H). IR (liquid film); 2987, 1439, 1423, 1239, 1088, 1045,
684, 660, 617 cm -1 .
【0028】実施例2テトラキス(2:3 −エピチオプロピルチオ)スズ(E
2)( 一般式 (1)においてM=Sn、x=4)の製造例 2:3 −エピチオプロピルメルカプタン(10.04g)の
ジクロロメタン (94.5mL)溶液に乾燥ピリジン(1
0.47g)を−30℃にて加え5分間攪拌した後、その
温度で1.0M−四塩化スズのジクロロメタン溶液 (23.
6mL)を2時間かけて滴下し、−20℃にて4時間攪
拌した。この反応混合物に2N−塩酸(30mL)を加
え、生成物をベンゼン(50mL)で二回抽出し、有機
層を2N−塩酸(30mL)および水で洗浄した後、硫
酸マグネシウムで乾燥させた。この抽出物からベンゼン
を溜去した残渣を、ノルマルヘキサンを移動相としたシ
リカゲルカラムクロマトグラフィーを用いて精製するこ
とによりテトラキス(2:3−エピチオプロピルチオ)ス
ズ(9.09g、収率=71.4%)を得た。この化合物の
屈折率は1.706、アッベ数は29.2であった。以下に
この化合物の構造決定のための分析結果を示す。1 H−NMR(溶媒:CDCl3 、内部標準物質:TM
S);δ2.31 (dd, 1H)、δ2.58 (dt, 1H) 、δ2.81 (d
d, 1H) 、δ3.22〜3.13 (m, 1H)、δ3.29 (dd,1H) 。 IR(液膜);2978、1428、1418、1245、1080、1039、
688 、611 cm-1。Example 2 Tetrakis (2: 3-epithiopropylthio) tin (E
2) (Production example of (M = Sn, x = 4 in the general formula (1)) 2: Dry pyridine (1) was added to a solution of 3-epithiopropylmercaptan (10.04 g) in dichloromethane (94.5 mL).
0.47 g) at −30 ° C., and the mixture was stirred for 5 minutes. At that temperature, 1.0 M tin tetrachloride in dichloromethane (23.
6 mL) was added dropwise over 2 hours, and the mixture was stirred at -20 ° C for 4 hours. 2N-hydrochloric acid (30 mL) was added to the reaction mixture, and the product was extracted twice with benzene (50 mL). The organic layer was washed with 2N-hydrochloric acid (30 mL) and water, and dried over magnesium sulfate. The residue obtained by distilling off benzene from this extract was purified by silica gel column chromatography using n-hexane as a mobile phase to obtain tetrakis (2: 3-epithiopropylthio) tin (9.09 g, yield = 71.4%). This compound had a refractive index of 1.706 and an Abbe number of 29.2. The analysis results for determining the structure of this compound are shown below. 1 H-NMR (solvent: CDCl 3 , internal standard: TM
S); δ2.31 (dd, 1H), δ2.58 (dt, 1H), δ2.81 (d
d, 1H),? 3.22 to 3.13 (m, 1H),? 3.29 (dd, 1H). IR (liquid film); 2978, 1428, 1418, 1245, 1080, 1039,
688, 611 cm -1 .
【0029】実施例3トリス(4:5 −エピチオ−2 −チアペンチル)−2:3 −
エピチオプロピルチオチタン(E3)( 一般式 (1)にお
いてM=Ti、x=1、y=1)の製造例 1.0M−四塩化チタンのジクロロメタン溶液(25.0m
L)に1 −メチル−3−ニトロ−1 −ニトロソグアニジ
ン(15.76g)から発生させたジアゾメタンのエーテ
ル(150mL)溶液を0℃にて加え、30分間その温
度で攪拌した。この反応混合物に、テトラヒドロフラン
(100mL)中で−10℃にて2:3 −エピチオプロピ
ルメルカプタン(10.62g)とナトリウムエトキサイ
ド(6.80g)から調製したチオレートを1時間かけて
滴下し、その後0℃にて12時間攪拌した。この反応混
合物に2N−塩酸(60mL)を加え、生成物をクロロ
ホルム(70mL)で二回抽出し、有機相を水洗した
後、硫酸マグネシウムで乾燥させた。この抽出物から溶
媒を溜去した残渣を、ノルマルヘキサンと酢酸エチルの
混合溶媒(混合体積比率=4/1)を移動相としたシリ
カゲルカラムクロマトグラフィーを用いて精製すること
によりトリス(4:5 −エピチオ−2 −チアペンチル)−
2:3 −エピチオプロピルチオチタン(7.18g、収率=
56.2g)を得た。この化合物の屈折率は1.677、ア
ッベ数は34.8であった。以下にこの化合物の構造決定
のための分析結果を示す。1 H−NMR(溶媒:CDCl3 、内部標準物質:TM
S);δ2.38 (dd, 2H)、δ2.47 (s, 3H)、δ2.64 (dt,
2H) 、δ2.92 (dd, 2H) 、δ3.41〜3.33 (m, 2H)、δ
3.51 (dd, 2H) 。 IR(液膜);2966、1440、1435、1219、1120、1085、
653 、608 cm-1。Example 3 Tris (4: 5-epithio-2-thiapentyl) -2: 3-
Epithiopropylthiotitanium (E3) (in general formula (1)
Preparation example of M = Ti, x = 1, y = 1) 1.0 M-dichloromethane solution of titanium tetrachloride (25.0 m
To L), a solution of diazomethane in ether (150 mL) generated from 1-methyl-3-nitro-1-nitrosoguanidine (15.76 g) was added at 0 ° C., and the mixture was stirred at that temperature for 30 minutes. To this reaction mixture, thiolate prepared from 2: 3-epithiopropylmercaptan (10.62 g) and sodium ethoxide (6.80 g) was added dropwise at −10 ° C. in tetrahydrofuran (100 mL) over 1 hour. Thereafter, the mixture was stirred at 0 ° C. for 12 hours. 2N-hydrochloric acid (60 mL) was added to the reaction mixture, and the product was extracted twice with chloroform (70 mL). The organic phase was washed with water and dried over magnesium sulfate. The residue obtained by evaporating the solvent from this extract was purified by silica gel column chromatography using a mixed solvent of normal hexane and ethyl acetate (mixed volume ratio = 4/1) as a mobile phase to obtain a tris (4: 5 -Epithio-2-thiapentyl)-
2: 3-Epithiopropylthiotitanium (7.18 g, yield =
56.2 g) were obtained. This compound had a refractive index of 1.677 and an Abbe number of 34.8. The analysis results for determining the structure of this compound are shown below. 1 H-NMR (solvent: CDCl 3 , internal standard: TM
S); δ2.38 (dd, 2H), δ2.47 (s, 3H), δ2.64 (dt,
2H), δ2.92 (dd, 2H), δ3.41 to 3.33 (m, 2H), δ
3.51 (dd, 2H). IR (liquid film); 2966, 1440, 1435, 1219, 1120, 1085,
653, 608 cm -1 .
【0030】実施例4トリス(2:3 −エピチオプロピルチオ)−5:6 −エピチ
オ−3 −チアヘキシルシラン(E4)( 一般式 (1)にお
いてM=Si、x=3、y=2)の製造例 四塩化ケイ素(4.25g)のテトラヒドフラン(25.0
mL)溶液に1.0M−ビニルマグネシウムブロマイドの
テトラヒドフラン溶液(25.0mL)を10℃にて2時
間かけて滴下した。この反応混合物をその温度で2時間
攪拌したのち、−15℃に冷却し、そこへ乾燥ピリジン
(8.31g)を加え、5分攪拌した後、2:3 −エピチオ
プロピルメルカプタン(10.62g)のテトラヒドロフ
ラン(50mL) 溶液を1時間かけて滴下した。この反
応混合物を4時間、0℃にて攪拌した後、そこへアゾビ
スジメチルバレロニトリル(6.3mg)を加え、6時間
還流した。室温まで冷却したこの反応混合物に2N−塩
酸(60mL)を加え、生成物をベンゼン(70mL)
で二回抽出し、有機相を水洗した後、硫酸マグネシウム
で乾燥させた。この抽出物から溶媒を溜去した残渣を、
ノルマルヘキサンと酢酸エチルの混合溶媒(混合体積比
率=9/1)を移動相としたシリカゲルカラムクロマト
グラフィーを用いて精製することによりトリス(2:3 −
エピチオプロピルチオ)−5:6 −エピチオ−3 −チアヘ
キシルシラン(5.76g、収率=48.3%) を得た。こ
の化合物の屈折率は1.634、アッベ数は32.6であっ
た。以下にこの化合物の構造決定のための分析結果を示
す。1 H−NMR(溶媒:CDCl3 、内部標準物質:TM
S);δ0.99 (h, 1H)、δ2.28 (dd, 2H) 、δ2.38 (s,
3H)、δ2.51 (h, 1H)、δ2.59 (dt, 2H) 、δ2.84 (d
d, 2H) 、δ3.22〜3.31 (m, 2H)、δ3.42 (dd, 2H) 。 IR(液膜);2930、1411、1392、1241、1209、1110、
1060、620 、614 cm-1。Example 4 Tris (2: 3-epithiopropylthio) -5: 6-epithi
O-3-Thiahexylsilane (E4) (in the general formula (1)
Preparation Example of M = Si, x = 3, y = 2) Silicon tetrachloride (4.25 g) in tetrahydrofuran (25.0)
1.0M-vinylmagnesium bromide in tetrahydrofuran solution (25.0 mL) was added dropwise to the solution at 10 ° C over 2 hours. After the reaction mixture was stirred at that temperature for 2 hours, it was cooled to -15 ° C, dry pyridine (8.31 g) was added thereto, and the mixture was stirred for 5 minutes and then mixed with 2: 3-epithiopropylmercaptan (10.62 g). ) In tetrahydrofuran (50 mL) was added dropwise over 1 hour. After stirring the reaction mixture for 4 hours at 0 ° C., azobisdimethylvaleronitrile (6.3 mg) was added thereto and the mixture was refluxed for 6 hours. 2N-hydrochloric acid (60 mL) was added to the reaction mixture cooled to room temperature, and the product was treated with benzene (70 mL).
, And the organic phase was washed with water and dried over magnesium sulfate. The residue obtained by distilling off the solvent from this extract is
Purification was performed using silica gel column chromatography using a mixed solvent of normal hexane and ethyl acetate (mixed volume ratio = 9/1) as a mobile phase to obtain tris (2: 3-
(Epithiopropylthio) -5: 6-epithio-3-thiahexylsilane (5.76 g, yield = 48.3%) was obtained. This compound had a refractive index of 1.634 and an Abbe number of 32.6. The analysis results for determining the structure of this compound are shown below. 1 H-NMR (solvent: CDCl 3 , internal standard: TM
S); δ 0.99 (h, 1H), δ 2.28 (dd, 2H), δ 2.38 (s,
3H), δ2.51 (h, 1H), δ2.59 (dt, 2H), δ2.84 (d
d, 2H), δ 3.22 to 3.31 (m, 2H), δ 3.42 (dd, 2H). IR (liquid film); 2930, 1411, 1392, 1241, 1209, 1110,
1060, 620, 614 cm -1 .
【0031】応用例1重合体からなる光学材料の製造 実施例1で得られたテトラキス(2:3 −エピチオプロピ
ルチオ)ゲルマン(E1)0.05モルと重合触媒である
テトラ(ノルマルブチル)フォスフォニウムブロマイド
(CT1)2×10-5モルの混合物を均一に攪拌し、二
枚のレンズ成形用ガラス型に注入し、50℃で10時
間、その後60℃で5時間、さらに120℃で3時間加
熱重合させてレンズ形状の重合体を得た。得られた重合
体の諸物性を表1に示す。表1から、本応用例1で得ら
れた重合体は無色透明であり、屈折率(nd ) は1.75
7と非常に高く、アッベ数(νd )も29.0と高い(低
分散)ものであり、耐候性、耐熱性(117℃)に優
れ、光学歪みのないものであった。従って、得られた重
合体は光学材料として好適であった。 応用例2〜5重合体からなる光学材料の製造 本発明の金属含有エピスルフィド化合物(C1成分)、
それ以外のエピスルフィド化合物、エポキシ化合物およ
び/またはビニルモノマー(C2成分)、および重合触
媒を表1に示すように使用して、重合条件を適宜変更し
た以外は、応用例1と同様の操作を行い、レンズ形状の
重合体を得た。これらの重合体の諸物性を表1に示す。
表1から、本応用例2〜5で得られた重合体も無色透明
であり、屈折率(nd ) は1.712〜1.764と非常に
高く、アッベ数(νd )も28.8〜36.3と高い(低分
散)ものであり、耐候性、耐熱性(111〜138℃)
に優れ、光学歪みのないものであった。Application Example 1 Production of Optical Material Consisting of Polymer 0.05 mol of tetrakis (2: 3-epithiopropylthio) germane (E1) obtained in Example 1 and tetra (normal butyl) as a polymerization catalyst A mixture of 2 × 10 −5 mol of phosphonium bromide (CT1) was uniformly stirred, poured into two glass molds for lens molding, and was heated at 50 ° C. for 10 hours, then at 60 ° C. for 5 hours, and further at 120 ° C. Heat polymerization was performed for 3 hours to obtain a lens-shaped polymer. Table 1 shows the physical properties of the obtained polymer. From Table 1, the polymer obtained in this Application Example 1 was colorless and transparent refractive index (n d) is 1.75
7, which was as high as 7 (abbe number) (v d ) as high as 29.0 (low dispersion), excellent in weather resistance and heat resistance (117 ° C.), and free of optical distortion. Therefore, the obtained polymer was suitable as an optical material. Application Examples 2 to 5 Production of Optical Material Consisting of Polymer The metal-containing episulfide compound of the present invention (component C1),
Other episulfide compounds, epoxy compounds and / or vinyl monomers (C2 component), and polymerization catalysts were used as shown in Table 1, and the same operation as in Application Example 1 was performed except that the polymerization conditions were appropriately changed. Thus, a lens-shaped polymer was obtained. Table 1 shows the physical properties of these polymers.
From Table 1, the polymer obtained in this Application Example 2 to 5 is also colorless and transparent refractive index (n d) is very high as from 1.712 to 1.764, an Abbe number ([nu d) also 28. High (low dispersion) of 8 to 36.3, weather resistance and heat resistance (111 to 138 ° C)
And no optical distortion.
【0032】応用比較例1 表1に示すようにペンタエリスリトールテトラキス(メ
ルカプトプロピオネート)(CE5)0.1モル、m −キ
シリレンジイソシアネート(CE6)0.2モルおよびジ
ブチルスズジクロライド(CT5)1.0×10-4モルの
混合物を均一に撹拌し、二枚のレンズ成形用ガラス型に
注入し、50℃で10時間、その後60℃で5時間、さ
らに120℃で3時間加熱重合させてレンズ形状の重合
体を得た。得られた重合体の諸物性を表1 に示す。表1
から、本応用比較例1の重合体は無色透明で光学歪も観
察されなかったが、nd /νd が1.59/36と屈折率
が低く、耐熱性も86℃と劣っていた。 応用比較例2、3 表1に示した原料組成物を使用した以外は、応用比較例
1と同様の操作を行ない、レンズ形状の重合体を得た。
これらの重合体の諸物性を表1に示す。表1から、本応
用比較例2の重合体はnd /νd が1.67/28といず
れも低く、耐熱性(94℃)は比較的良好であるが、耐
候性に劣り、かつ着色が見られ、光学歪が観察された。
また、本応用比較例3の重合体は、アッベ数(νd )が
36と比較的高く、耐候性に優れており、無色透明で光
学歪は観察されなかったが、耐熱性(90℃)が劣り、
屈折率(nd ) が1.70とそれほど高くなく、また、重
合体は脆弱であった。Application Comparative Example 1 As shown in Table 1, 0.1 mol of pentaerythritol tetrakis (mercaptopropionate) (CE5), 0.2 mol of m-xylylene diisocyanate (CE6) and 1.1 mol of dibutyltin dichloride (CT5). The mixture of 0 × 10 -4 mol was uniformly stirred, poured into two glass molds for lens molding, heated at 50 ° C. for 10 hours, then heated at 60 ° C. for 5 hours, and further heated at 120 ° C. for 3 hours to form a lens. A polymer having a shape was obtained. Table 1 shows properties of the obtained polymer. Table 1
From this, the polymer of Application Comparative Example 1 was colorless and transparent, and no optical distortion was observed. However, n d / v d was 1.59 / 36, the refractive index was low, and the heat resistance was poor at 86 ° C. Application Comparative Examples 2 and 3 The same operation as in Application Comparative Example 1 was performed except that the raw material compositions shown in Table 1 were used, and a lens-shaped polymer was obtained.
Table 1 shows the physical properties of these polymers. As shown in Table 1, the polymer of Comparative Example 2 has a low n d / v d of 1.67 / 28, and has relatively good heat resistance (94 ° C.), but is inferior in weather resistance and colored. Was observed, and optical distortion was observed.
The polymer of Application Comparative Example 3 had a relatively high Abbe number (ν d ) of 36, was excellent in weather resistance, was colorless and transparent, and no optical distortion was observed, but was heat resistant (90 ° C.). Is inferior,
The refractive index (n d ) was not very high at 1.70, and the polymer was brittle.
【0033】[0033]
【表1】 [Table 1]
【0034】(表1における略号) EI: テトラキス(2:3 −エピチオプロピルチオ)ゲ
ルマン E2: テトラキス(2:3 −エピチオプロピルチオ)ス
ズ E3: トリス(4:5 −エピチオ−2 −チアペンチル)
−2:3 −エピチオプロピルチオチタン E4: トリス(2:3 −エピチオプロピルチオ)−5:6
−エピチオ−3 −チアヘキシルシラン E5: トリス(2:3 −エピチオプロピルチオ)−4:5
−エピチオ−2 −チアペンチルゲルマン CE1: 2:3 −エピチオプロピルスルフィド CE2: 2,2 −ビス(4 −(2 −グリシジルオキシ)
エトキシフェニル)プロパン CE3: シクロヘキセンオキサイド CE4: ビス(2 −アクリロキシエチル)−1,4 −キ
シリルカルバメート CE5: ペンタエリスリトールテトラキス( メルカプ
トプロピオネート) CE6: m −キシリレンジイソシアネート CE7: 1,3,5 −トリメルカプトベンゼン CE8: 2 :3 −エピチオプロピルサルファイド CT1: テトラ(ノルマルブチル)フォスフォニウム
ブロマイド CT2: トリエチルアミン CT3: 2,4,6 −トリジメチルアミノフェノール CT4: 三弗化ホウ素−ピリジン錯体 CT5: ジブチルスズジクロライド(Abbreviations in Table 1) EI: Tetrakis (2: 3-epithiopropylthio) germane E2: Tetrakis (2: 3-epithiopropylthio) tin E3: Tris (4: 5-epithio-2-thiapentyl) )
-2: 3-Epithiopropylthiotitanium E4: Tris (2: 3-epithiopropylthio) -5: 6
-Epithio-3-thiahexylsilane E5: Tris (2: 3-epithiopropylthio) -4: 5
-Epithio-2-thiapentylgermane CE1: 2: 3-Epithiopropyl sulfide CE2: 2,2-bis (4- (2-glycidyloxy)
Ethoxyphenyl) propane CE3: Cyclohexene oxide CE4: Bis (2-acryloxyethyl) -1,4-xylylcarbamate CE5: Pentaerythritol tetrakis (mercaptopropionate) CE6: m-Xylylenediisocyanate CE7: 1,3, 5-trimercaptobenzene CE8: 2: 3-epithiopropylsulfide CT1: tetra (normalbutyl) phosphonium bromide CT2: triethylamine CT3: 2,4,6-tridimethylaminophenol CT4: boron trifluoride-pyridine complex CT5: dibutyltin dichloride
【0035】[0035]
【発明の効果】本発明の金属含有エピスルフィド化合物
は、ケイ素、ゲルマニウム、スズ、チタンなどの金属原
子に末端エピスルフィド基含有の反応性置換基が4個結
合している新規化合物であって、光学材料の原料として
好適に用いられる。また、本発明の金属含有エピスルフ
ィド化合物を用いて得られる光学材料は、屈折率、アッ
ベ数が高く、耐熱性、耐候性、透明性に優れているので
眼鏡レンズ、カメラレンズ等のレンズ、プリズム、光フ
ァイバー、光ディスク、磁気ディスク等に用いられる記
録媒体基板、着色フィルター、赤外線吸収フィルター等
の光学製品を作製する材料として好適である。The metal-containing episulfide compound of the present invention is a novel compound in which four reactive substituents having a terminal episulfide group are bonded to metal atoms such as silicon, germanium, tin and titanium, and It is suitably used as a raw material for. Further, the optical material obtained by using the metal-containing episulfide compound of the present invention has a high refractive index, a high Abbe number, and has excellent heat resistance, weather resistance, and transparency. It is suitable as a material for producing optical products such as a recording medium substrate used for an optical fiber, an optical disk, a magnetic disk, and the like, a coloring filter, an infrared absorption filter, and the like.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4H049 VN01 VN02 VN03 VN05 VP01 VQ61 VR21 VR22 VR23 VR61 VR62 VR63 VR64 VS09 VT51 VU20 VW02 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4H049 VN01 VN02 VN03 VN05 VP01 VQ61 VR21 VR22 VR23 VR61 VR62 VR63 VR64 VS09 VT51 VU20 VW02
Claims (6)
を示し、xは1〜4の整数を示し、yは1または2を示
す。)で表される金属含有エピスルフィド化合物。(1) General formula (1) (In the formula, M represents silicon, germanium, tin or titanium, x represents an integer of 1 to 4, and y represents 1 or 2.) A metal-containing episulfide compound represented by the following formula:
ラキス(2:3 −エピチオプロピルチオ)ゲルマン、テト
ラキス(2:3 −エピチオプロピルチオ)スズ、トリス
(4:5 −エピチオ−2 −チアペンチル)−2:3 −エピチ
オプロピルチオチタンまたはトリス(2:3 −エピチオプ
ロピルチオ)−5:6 −エピチオ−3 −チアヘキシルシラ
ンである請求項1記載の金属含有エピスルフィド化合
物。2. The metal-containing episulfide compound is tetrakis (2: 3-epithiopropylthio) germane, tetrakis (2: 3-epithiopropylthio) tin, tris (4: 5-epithio-2-thiapentyl)-. The metal-containing episulfide compound according to claim 1, which is 2: 3-epithiopropylthiotitanium or tris (2: 3-epithiopropylthio) -5: 6-epithio-3-thiahexylsilane.
Zはハロゲン原子を示す)で表される四ハロゲン化金属
と2:3 −エピチオメルカプトプロパンを反応させること
を特徴とする、一般式(1−a) 【化2】 (式中、Mは上記と同じである。)で表される金属含有
エピスルフィド化合物の製造方法。3. The general formula MZ 4 (where M is the same as above,
Z represents a halogen atom), and reacting 2: 3-epithiomercaptopropane with a metal tetrahalide represented by the general formula (1-a): (In the formula, M is the same as described above.) A method for producing a metal-containing episulfide compound represented by the formula:
金属含有エピスルフィド化合物が、テトラキス(2:3 −
エピチオプロピルチオ)ゲルマンまたはテトラキス(2:
3 −エピチオプロピルチオ)スズである請求項3記載の
製造方法。4. The metal tetrahalide is metal tetrachloride,
When the metal-containing episulfide compound is tetrakis (2: 3-
Epithiopropylthio) germane or tetrakis (2:
4. The method according to claim 3, wherein the compound is 3-epithiopropylthio) tin.
である)で表される四ハロゲン化金属のクロロメチル化
体またはビニル置換体と2:3 −エピチオメルカプトプロ
パンを反応させることを特徴とする、一般式(1) 【化3】 (式中、Mは上記と同じであり、xは1〜3の整数を示
し、yは1または2を示す。)で表される金属含有エピ
スルフィド化合物の製造方法。5. A reaction of 2: 3-epithiomercaptopropane with a chloromethylated or vinyl-substituted metal tetrahalide represented by the general formula MZ 4 (M and Z are as defined above). General formula (1) characterized by the following: (In the formula, M is the same as above, x represents an integer of 1 to 3, and y represents 1 or 2.) A method for producing a metal-containing episulfide compound represented by the formula:
金属含有エピスルフィド化合物が、トリス(4:5 −エピ
チオ−2 −チアペンチル)−2:3 −エピチオプロピルチ
オチタンまたはトリス(2:3 −エピチオプロピルチオ)
−5:6 −エピチオ−3 −チアヘキシルシランである請求
項6記載の製造方法。6. The metal tetrahalide is metal tetrachloride,
The metal-containing episulfide compound is tris (4: 5-epithio-2-thiapentyl) -2: 3-epithiopropylthiotitanium or tris (2: 3-epithiopropylthio)
The production method according to claim 6, wherein -5: 6-epithio-3-thiahexylsilane is used.
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JP2006169190A (en) * | 2004-12-17 | 2006-06-29 | Mitsui Chemicals Inc | Polymerizable compound and its application |
WO2013015174A1 (en) * | 2011-07-22 | 2013-01-31 | 旭化成ケミカルズ株式会社 | Composition and polymer |
JPWO2013015174A1 (en) * | 2011-07-22 | 2015-02-23 | 旭化成ケミカルズ株式会社 | Composition and polymer |
KR101538876B1 (en) * | 2011-07-22 | 2015-07-22 | 아사히 가세이 케미칼즈 가부시키가이샤 | Composition and polymer |
US9334371B2 (en) | 2011-07-22 | 2016-05-10 | Asahi Kasei Chemicals Corporation | Composition and polymer |
CN105754099A (en) * | 2011-07-22 | 2016-07-13 | 旭化成株式会社 | Composition and polymer |
US9738757B2 (en) | 2011-07-22 | 2017-08-22 | Asahi Kasei Chemicals Corporation | Composition and polymer |
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