JP2001274277A - Printed wiring substrate with projection electrode and its manufacturing method - Google Patents
Printed wiring substrate with projection electrode and its manufacturing methodInfo
- Publication number
- JP2001274277A JP2001274277A JP2000086817A JP2000086817A JP2001274277A JP 2001274277 A JP2001274277 A JP 2001274277A JP 2000086817 A JP2000086817 A JP 2000086817A JP 2000086817 A JP2000086817 A JP 2000086817A JP 2001274277 A JP2001274277 A JP 2001274277A
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- resin layer
- printed wiring
- photosensitive resin
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
- H01L2224/1147—Manufacturing methods using a lift-off mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
Landscapes
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、CSP(チップサ
イズパッケージ)やBGA(ボールグリッドアレイ)な
どに好適に用いられるプリント配線基板に関し、特に、
接続信頼性に優れた突起電極を有するプリント配線基板
とその製造技術について提案する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board suitably used for CSP (chip size package), BGA (ball grid array) and the like.
We propose a printed wiring board with protruding electrodes with excellent connection reliability and its manufacturing technology.
【0002】[0002]
【従来の技術】近年、電子機器や電子部品が小型化する
にともない、それらに用いられるICチップのプリント
配線基板との接続形態もワイヤーボンディングからフリ
ップチップ実装に変わりつつある。2. Description of the Related Art In recent years, as electronic devices and electronic components have been miniaturized, the connection form of an IC chip used for them to a printed wiring board has been changing from wire bonding to flip chip mounting.
【0003】このフリップチップ実装では、はんだボー
ルを用いる電極同士の接合方法が広く知られている。こ
のはんだボールを用いる接合は、配線基板またはICチ
ップのいずれか一方の電極上にはんだボールを配置し、
他方の接続電極と位置合わせをしたのちリフローするこ
とにより行われ、さらに、ICチップと配線基板の隙間
に封止樹脂を流し込み硬化させることにより、接続信頼
性を高めている。[0003] In this flip chip mounting, a method of joining electrodes using solder balls is widely known. For joining using this solder ball, the solder ball is arranged on one of the electrodes of the wiring board or the IC chip,
The connection is performed by reflowing after the alignment with the other connection electrode, and the sealing resin is poured into the gap between the IC chip and the wiring board and hardened, thereby improving the connection reliability.
【0004】このようなはんだボールを用いる上記接合
方法によれば、確かにはんだボールの径を調整すること
で、ICチップのプリント配線基板への実装高さを高く
することができる。その結果、周囲の温度変化によるチ
ップと配線基板との熱膨張率差に起因した外部応力の影
響を低減したり、樹脂封止による電気的な接続信頼性の
向上を図ることができる。According to the above-described joining method using solder balls, the height of the IC chip mounted on the printed wiring board can be increased by adjusting the diameter of the solder balls. As a result, it is possible to reduce the influence of external stress caused by a difference in the coefficient of thermal expansion between the chip and the wiring board due to a change in ambient temperature, and to improve electrical connection reliability by resin sealing.
【0005】しかしながら、かかるはんだボールを用い
る接合方法では、ICチップ内の電極間隔が狭くなると
(狭ピッチになると)、そのピッチに合わせて微小なは
んだボールが必要になるためICチップと配線基板の間
隔が狭くなる。その結果、狭ピッチ化したチップ電極の
接続においては、周囲の温度変化による上記外部応力の
低減効果が期待できない。しかも封止樹脂の流し込みが
困難になるために、接続信頼性の面でもICチップと配
線基板の電極間の隙間を広くすることが望まれている。However, in such a bonding method using solder balls, when the electrode spacing in the IC chip becomes narrow (narrow pitch), minute solder balls are required in accordance with the pitch. The interval becomes smaller. As a result, in the connection of the chip electrodes having a reduced pitch, the effect of reducing the external stress due to a change in ambient temperature cannot be expected. In addition, since it is difficult to pour the sealing resin, it is desired to increase the gap between the IC chip and the electrode of the wiring board in terms of connection reliability.
【0006】一方、はんだボールを用いる前記接合方法
に代わる接続技術も種々提案されている。例えば、導
電性接着剤を介して配線基板の電極とICチップのバン
プ(突起電極)を接合し、封止樹脂で封止する方法、
異方性導電フィルムを配線基板の電極とICチップのバ
ンプ間に配置し、位置合わせしたのち、加圧・加熱する
ことにより接合する方法、等が知られている。[0006] On the other hand, various connection techniques have been proposed in place of the above-mentioned joining method using solder balls. For example, a method in which an electrode of a wiring board and a bump (projection electrode) of an IC chip are joined via a conductive adhesive and sealed with a sealing resin,
There is known a method in which an anisotropic conductive film is arranged between an electrode of a wiring board and a bump of an IC chip, aligned, and then bonded by applying pressure and heat.
【0007】これらの接合方法によれば、確かに狭ピッ
チには対応しやすい。しかしながら、導電性接着剤を用
いる接合方法では、チップ側に形成するバンプをめっき
法やスタッドバンプにより形成するために、そのバンプ
高さが制限される。According to these joining methods, it is easy to cope with a narrow pitch. However, in the bonding method using a conductive adhesive, the bump height to be formed on the chip side is limited because the bump is formed by plating or stud bump.
【0008】また、異方性導電フィルムを用いる接合方
法では、加圧・加熱によりフィルム中の導電粒子を介し
て電極間の電気的な接続信頼性を確保しているために、
前記接続信頼性を維持するには前記フィルムの厚み(実
装高さ)に制約がある。In addition, in the bonding method using an anisotropic conductive film, the reliability of the electrical connection between the electrodes is ensured through the conductive particles in the film by applying pressure and heat.
In order to maintain the connection reliability, the thickness (mounting height) of the film is restricted.
【0009】[0009]
【発明が解決しようとする課題】本発明は、上述したよ
うな制約等を解消するためになされたものであり、その
主たる目的は、狭ピッチ化したチップ電極の接続におい
ても、チップと配線基板の間隔を封止樹脂の流し込みが
容易となるような間隔に維持でき、しかも接続信頼性に
優れる、アスペクト比の高い突起電極を有するプリント
配線基板を提供することにある。本発明の他の目的は、
アスペクト比の高い突起電極をプリント配線基板表面に
安定して配設できる配線基板の製造技術を提案すること
にある。SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned restrictions and the like, and its main object is to connect a chip and a wiring board even when connecting chip electrodes having a reduced pitch. An object of the present invention is to provide a printed wiring board having a projection electrode having a high aspect ratio, which is capable of maintaining an interval for facilitating the flow of the sealing resin, and which is excellent in connection reliability. Another object of the present invention is to
An object of the present invention is to propose a technique for manufacturing a wiring board in which protruding electrodes having a high aspect ratio can be stably arranged on the surface of a printed wiring board.
【0010】[0010]
【課題を解決するための手段】発明者らは、上記目的の
実現に向け鋭意研究した結果、以下に示す内容を要旨構
成とする発明に想到した。すなわち、 .本発明の突起電極付きプリント配線基板は、導電性
ペーストからなるバイアホール及び突起電極が一体に形
成されているプリント配線基板において、当該配線基板
表面に突出してなる導電性ペーストからなる突起電極
は、その電極側面が感光性樹脂層からなる保護層で被覆
されていることを特徴とする。ここで、好適な態様とし
て、本発明の突起電極付きプリント配線基板は、突起径
よりも突起高さが大きいアスペクト比(突起高さ/突起
径)が1以上の突起電極を有することが好ましく、また
フリップチップ実装に用いることが好ましい。Means for Solving the Problems The inventors of the present invention have intensively studied for realizing the above-mentioned object, and as a result, have arrived at an invention having the following content as a gist configuration. That is,. The printed wiring board with a protruding electrode of the present invention is a printed wiring board in which via holes and a protruding electrode made of a conductive paste are integrally formed, wherein the protruding electrode made of a conductive paste protruding on the surface of the wiring board is The side surface of the electrode is covered with a protective layer made of a photosensitive resin layer. Here, as a preferred embodiment, the printed wiring board with a projecting electrode of the present invention preferably has a projecting electrode having an aspect ratio (projection height / projection diameter) in which the projection height is larger than the projection diameter, which is 1 or more, It is also preferable to use it for flip chip mounting.
【0011】.本発明にかかる突起電極付きプリント
配線基板の製造方法は、少なくとも下記工程、即ち
(1)配線パターンが設けられたコア基板面に、絶縁樹
脂層と感光性樹脂層を順次に形成する工程、(2)レー
ザー光を用いて前記(1)で形成した樹脂層の厚さ方向
に貫通して前記配線パターンに達する穴を穿孔する工
程、(3)活性エネルギー線を利用して、即ち、ネガ型
感光性樹脂の場合には活性エネルギー線の照射によっ
て、またポジ型感光性樹脂の場合には活性エネルギー線
の照射と加熱による樹脂の熱分解によって、前記感光性
樹脂層に、前記(2)で穿孔した穴の内壁面から一定の
幅を持つ保護層となる露光パターンを形成する工程、
(4)前記穴にバイアホール及び突起電極となる導電性
ペーストを充填して熱硬化し、次いで、穴から突出した
余分なペーストを表面研磨にて除去する工程、(5)前
記(3)でパターン露光した感光性樹脂層を現像するこ
とにより、感光性樹脂層からなる保護層で被覆された構
造の突起電極を形成する工程、を含むことを特徴とす
る。ここで、他の態様として、本発明の製造方法は、前
記(3)の工程において、感光性樹脂層のパターン露光
をレーザー光にて行うことができる。[0011] The method for manufacturing a printed wiring board with bump electrodes according to the present invention includes at least the following steps, that is, (1) a step of sequentially forming an insulating resin layer and a photosensitive resin layer on a core substrate surface provided with a wiring pattern; 2) a step of piercing a hole reaching the wiring pattern through a thickness direction of the resin layer formed in the above (1) using a laser beam, and (3) a step of using an active energy ray, that is, a negative type. In the case of a photosensitive resin, the photosensitive resin layer is irradiated with an active energy ray, and in the case of a positive photosensitive resin, the resin is thermally decomposed by irradiation with an active energy ray and heating, so that the photosensitive resin layer is subjected to the above (2). A step of forming an exposure pattern that becomes a protective layer having a certain width from the inner wall surface of the perforated hole,
(4) a step of filling the hole with a conductive paste to be a via hole and a protruding electrode and thermosetting, and then removing excess paste protruding from the hole by surface polishing; (5) the step of (3). Developing the photosensitive resin layer that has been subjected to the pattern exposure to form a bump electrode having a structure covered with a protective layer made of the photosensitive resin layer. Here, as another aspect, in the manufacturing method of the present invention, in the step (3), the pattern exposure of the photosensitive resin layer can be performed by a laser beam.
【0012】[0012]
【発明の実施の形態】本発明の突起電極付きプリント配
線基板は、絶縁性樹脂基板表面に突出してなる導電性ペ
ーストからなる突起電極を、電気的接続部を除く側面が
感光性樹脂からなる保護層で被覆された構造とした点に
特徴がある。このような構造としたことにより、突起径
よりも突起高さが大きいアスペクト比(突起高さ/突起
径)が1以上の突起電極を配線基板上に形成したもので
あっても、微小突起として外部応力に対して強い構造が
得られる。その結果、この突起電極を介すれば、チップ
と配線基板間の間隔を広く確保しつつ電極同士を信頼性
良く接続することができる。しかも、封止樹脂の流し込
みが容易となり、工程の短縮並びに確実な樹脂封止によ
る電気的な接続信頼性の向上を図ることができる。BEST MODE FOR CARRYING OUT THE INVENTION A printed wiring board with a protruding electrode according to the present invention protects a protruding electrode made of a conductive paste protruding from the surface of an insulating resin substrate by protecting a side surface excluding an electrical connection portion from a photosensitive resin. The feature is that the structure is covered with a layer. With such a structure, even when a projection electrode having a projection height larger than the projection diameter and having an aspect ratio (projection height / projection diameter) of 1 or more is formed on the wiring board, it is regarded as a minute projection. A structure resistant to external stress is obtained. As a result, through the protruding electrodes, the electrodes can be connected to each other with high reliability while ensuring a wide space between the chip and the wiring board. In addition, the flow of the sealing resin is facilitated, so that the process can be shortened and the reliability of electrical connection can be improved by reliable resin sealing.
【0013】以下、本発明を図1に示す突起電極付きプ
リント配線基板の製造工程図に基づいてより具体的に説
明する。 (1)まず、少なくとも一方の面に配線パターンが設け
られたコア基板(図1では多層配線基板1を例示す
る。)面に、絶縁樹脂層2と感光性樹脂層3を順次に形
成する(図1(a)参照)。特に本発明では、この感光
性樹脂層3の厚みにより、形成される突起電極7の高さ
を任意に調整することができる。ここで、本発明におい
て使用できる上記絶縁樹脂層2としては、ビルドアップ
基板の層間材等を構成する絶縁樹脂組成物が挙げられ、
その使用形態は液状でもフィルム状でもよい。また、本
発明において使用できる感光性樹脂層3としては、ネガ
型またはポジ型の現像性を有する感光性樹脂組成物が挙
げられ、その樹脂型はアルカリ現像型でも溶剤現像型で
も水現像型でもよく、その使用形態は液状でもフィルム
状でもよい。ただし、この感光性樹脂組成物は、熱硬化
成分を含まないことが必要である。これらの樹脂層は、
樹脂組成物が液状の場合にはスクリーン印刷、カーテン
コーティング、ロールコーティング、スプレーコーティ
ングなどの方法にて全面に塗布したのち乾燥することに
より、またフィルム状の場合には熱圧着等により、タッ
クフリーの塗膜として形成され、かかる製造段階では絶
縁樹脂層が加熱硬化された状態とすることができる。Hereinafter, the present invention will be described in more detail with reference to a manufacturing process diagram of a printed wiring board with bump electrodes shown in FIG. (1) First, an insulating resin layer 2 and a photosensitive resin layer 3 are sequentially formed on a core substrate (a multilayer wiring substrate 1 is illustrated in FIG. 1) having at least one surface provided with a wiring pattern (FIG. 1). FIG. 1A). In particular, in the present invention, the height of the projection electrode 7 to be formed can be arbitrarily adjusted by the thickness of the photosensitive resin layer 3. Here, as the insulating resin layer 2 that can be used in the present invention, an insulating resin composition constituting an interlayer material or the like of a build-up substrate may be mentioned.
The form of use may be liquid or film. Examples of the photosensitive resin layer 3 that can be used in the present invention include a photosensitive resin composition having a negative or positive developing property, and the resin type may be an alkali developing type, a solvent developing type, or a water developing type. The form of use may be liquid or film. However, it is necessary that this photosensitive resin composition does not contain a thermosetting component. These resin layers are
When the resin composition is in a liquid state, it is applied by a method such as screen printing, curtain coating, roll coating, spray coating and the like, and then dried. It is formed as a coating film, and in such a manufacturing stage, the insulating resin layer can be in a state of being cured by heating.
【0014】(2)次に、レーザー光を用いて前記
(1)で形成した樹脂層の所定位置に厚さ方向に貫通し
て前記配線パターンに達する穴4を穿孔する。ここで、
穴4の穿孔に用いるレーザー光としては、レーザーアブ
レージョン法に用いられるレーザー光であれば特に限定
なく使用することができ、例えば、エキシマレーザー、
YAGレーザー、炭酸ガスレーザー、半導体レーザーな
どが挙げられる。なお、「レーザーアブレージョン法」
とは、物体にレーザー光を照射することによって、物体
のレーザー照射部を所望の深さまで分解または蒸発飛散
させる方法を意味する。(2) Next, a hole 4 is formed in a predetermined position of the resin layer formed in the above (1) in the thickness direction to reach the wiring pattern by using a laser beam. here,
As the laser light used for perforating the hole 4, any laser light used for a laser abrasion method can be used without particular limitation. For example, an excimer laser,
Examples include a YAG laser, a carbon dioxide laser, and a semiconductor laser. "Laser abrasion method"
The term means a method of irradiating a laser beam to an object to decompose or evaporate and scatter the laser irradiation portion of the object to a desired depth.
【0015】(3)次いで、感光性樹脂層3としてネガ
型感光性樹脂を用いる場合にはマスクを介した活性エネ
ルギー線照射による硬化により、また感光性樹脂層3と
してポジ型感光性樹脂を用いる場合にはマスクを介した
活性エネルギー線照射と加熱による樹脂の熱分解によっ
て、前記感光性樹脂層3に、前記(2)で穿孔した穴4
の内壁面から一定の幅を持つ保護層5となる露光パター
ンを形成する(図1(b)参照)。ここで、前記(2)
で行う穴4の穿孔と感光性樹脂層3のパターン露光をレ
ーザー光にて連続的に処理することができる。また、こ
の活性エネルギー線(紫外線、紫外波長域のレーザー光
など)の照射によるパターン露光は、前記(2)に記載
の穴4穿孔前に行っても良いが、ネガ型感光性樹脂を用
いる場合には、穴4穿孔後に露光することで穴4底部に
位置する樹脂層の硬化が効率よく進む点で有利である。(3) Next, when a negative photosensitive resin is used as the photosensitive resin layer 3, it is cured by irradiation with active energy rays through a mask, and a positive photosensitive resin is used as the photosensitive resin layer 3. In this case, the holes 4 formed in (2) above are formed in the photosensitive resin layer 3 by thermal decomposition of the resin by irradiation with active energy rays through a mask and heating.
An exposure pattern to be a protective layer 5 having a constant width is formed from the inner wall surface (see FIG. 1B). Here, the above (2)
And the pattern exposure of the photosensitive resin layer 3 can be continuously processed by laser light. Further, the pattern exposure by irradiation with the active energy ray (ultraviolet light, laser light in the ultraviolet wavelength range, etc.) may be performed before the perforation of the hole 4 described in the above (2), but when a negative photosensitive resin is used. Is advantageous in that the exposure after exposure of the hole 4 allows the resin layer located at the bottom of the hole 4 to be efficiently cured.
【0016】(4)次に、前記穴4にバイアホール及び
突起電極7となる導電性ペースト6を充填して熱硬化し
た後、穴4から突出した余分なペースト6を表面研磨に
て除去する(図1(c)参照)。なお、表面研磨する前
に行う導電性ペースト6の硬化は、仮硬化もしくは本硬
化のいずれであってもよい。また、硬化する際に加圧し
ても良い。ここで、導電性ペースト6としては、ビルド
アップ基板のフィルドビア等に用いられるペースト等が
挙げられ、例えば、Ag粉、Cu粉、金めっきNi粉、
もしくははんだ粉等とエポキシ樹脂などの熱硬化性樹脂
とを混合したペーストを用いることができる。特に本発
明では、感光性樹脂層3に埋設された形態でペースト6
表面を研磨し突起電極7の高さを調整することができる
ので、狭ピッチにおいてもアスペクト比の高い突起電極
群を均一な高さで安定して形成することができる。(4) Next, the hole 4 is filled with the conductive paste 6 to be the via hole and the protruding electrode 7 and thermally cured, and then the excess paste 6 protruding from the hole 4 is removed by surface polishing. (See FIG. 1 (c)). The hardening of the conductive paste 6 performed before the surface polishing may be either temporary hardening or full hardening. Further, pressure may be applied during curing. Here, examples of the conductive paste 6 include pastes used for filled vias and the like of a build-up substrate, such as Ag powder, Cu powder, gold-plated Ni powder, and the like.
Alternatively, a paste in which a solder powder or the like and a thermosetting resin such as an epoxy resin are mixed can be used. In particular, in the present invention, the paste 6 is embedded in the photosensitive resin layer 3.
Since the surface can be polished to adjust the height of the bump electrodes 7, a bump electrode group having a high aspect ratio can be stably formed at a uniform height even at a narrow pitch.
【0017】(5)前記(3)でパターン露光した感光
性樹脂層3を現像することにより、側面が感光性樹脂層
3からなる保護層5で被覆された構造の突起電極7を形
成する(図1(d)参照)。ここで、前記樹脂層の現像
に用いられる現像液としては、既知のものを用いること
ができ、例えば、弱アルカリ水溶液としては、炭酸ナト
リウムや炭酸カリウム、リン酸ナトリウム、ケイ酸ナト
リウム、アンモニア、アミン類などの希アルカリ水溶液
が使用できる。(5) By developing the photosensitive resin layer 3 which has been subjected to the pattern exposure in the above (3), a projecting electrode 7 having a structure in which the side surface is covered with the protective layer 5 made of the photosensitive resin layer 3 is formed. FIG. 1D). Here, a known developer can be used as the developer used for developing the resin layer. For example, as a weak alkaline aqueous solution, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, ammonia, amine Aqueous dilute aqueous alkali solutions such as those described above can be used.
【0018】このようにして製造される突起電極付きプ
リント配線基板は、導電性ペースト6からなるバイアホ
ール及び突起電極7が一体に形成されてなるプリント配
線基板において、当該配線基板表面に突出してなる導電
性ペースト6からなる突起電極7の側面が感光性樹脂層
3からなる保護層5で被覆されていることを特徴とす
る。The printed wiring board with the protruding electrodes manufactured in this way is a printed wiring board in which the via holes made of the conductive paste 6 and the protruding electrodes 7 are integrally formed, and protrudes from the surface of the wiring board. It is characterized in that the side surface of the bump electrode 7 made of the conductive paste 6 is covered with the protective layer 5 made of the photosensitive resin layer 3.
【0019】このような突起電極付きプリント配線基板
は、例えば、以下のようにしてICチップの電極と電気
的に接続される。即ち、 .プリント配線基板の突起電極7表面に、はんだや導
電性接着剤などからなる接続層8を、めっきやスクリー
ン印刷、転写などの方法にて形成する(図2(a)参
照)。 .ICチップ9の電極10と配線基板の突起電極7と
を位置合わせし、加熱または加熱・加圧することによ
り、電極同士の接続を行う。 .さらに、ICチップ9の動作試験を行った後、接続
信頼性を維持するためにICチップ9と配線基板の間に
封止樹脂11を流し込み加熱硬化して封止する(図2
(b)参照)。Such a printed wiring board with protruding electrodes is electrically connected to the electrodes of an IC chip, for example, as follows. That is,. A connection layer 8 made of solder, conductive adhesive, or the like is formed on the surface of the bump electrode 7 of the printed wiring board by plating, screen printing, transfer, or the like (see FIG. 2A). . The electrodes 10 of the IC chip 9 are aligned with the protruding electrodes 7 of the wiring board, and the electrodes are connected by heating or heating / pressing. . Further, after an operation test of the IC chip 9 is performed, a sealing resin 11 is poured between the IC chip 9 and the wiring board in order to maintain the connection reliability, and is sealed by heating and curing (FIG. 2).
(B)).
【0020】[0020]
【実施例】以下に実施例を示して本発明について具体的
に説明するが、本発明が下記実施例に限定されるもので
ないことはもとよりである。 (実施例1) (1)まず、導体回路が形成されたガラスエポキシ基板
上に、エポキシ樹脂を主成分とする熱硬化型の絶縁樹脂
組成物をスクリーン印刷により全面に塗布し、次いで、
150℃×30分で硬化し、厚さ20μmの絶縁樹脂層
を形成した。さらに、この絶縁樹脂層上に、ネガ型感光
性樹脂組成物をスクリーン印刷により全面に塗布し、次
いで80℃×20分で乾燥することにより、厚さ100
μmのネガ型感光性樹脂層を形成した。 (2)次に、炭酸ガスレーザーを用いて、前記(1)で
形成した2種の樹脂層を厚さ方向に貫通し内層回路導体
に達する内径100μmのバイアホール及び突起電極形
成用の穴を穿孔した。 (3)前記(2)で穿孔した内径100μmの穴に、1
50μm径の開口を有するマスクを穴とマスクの開口の
中心が一致するように位置合わせし、紫外線を照射し、
穴の内壁面から約25μmの厚みにネガ型感光性樹脂層
を硬化した。 (4)次に、バイアホール及び突起電極形成用の前記穴
に熱硬化型の銀ペーストを埋め込み、100℃×30分
で仮硬化した。そして、穴から突出した余分なペースト
を、感光性樹脂層の表面が露出するまで研磨して除去し
た。 (5)1.0%炭酸ナトリウム水溶液にて90秒間現像
し、引き続き30秒間水洗して乾燥することにより、未
露光部分の感光性樹脂層を除去した。 (6)その後、150℃×60分で銀ペーストを本硬化
した。EXAMPLES The present invention will be described in detail with reference to the following examples, but it goes without saying that the present invention is not limited to the following examples. (Example 1) (1) First, a thermosetting insulating resin composition containing an epoxy resin as a main component is applied on the entire surface of a glass epoxy substrate on which a conductive circuit is formed by screen printing, and then,
The composition was cured at 150 ° C. for 30 minutes to form an insulating resin layer having a thickness of 20 μm. Further, a negative photosensitive resin composition is applied on the entire surface of the insulating resin layer by screen printing, and then dried at 80 ° C. × 20 minutes to obtain a thickness of 100 μm.
A μm negative photosensitive resin layer was formed. (2) Next, using a carbon dioxide laser, a via hole having an inner diameter of 100 μm and a hole for forming a protruding electrode that penetrates the two resin layers formed in the above (1) in the thickness direction and reaches the inner layer circuit conductor is formed. Perforated. (3) In the hole with an inner diameter of 100 μm drilled in (2),
A mask having an opening having a diameter of 50 μm is aligned so that the center of the hole and the opening of the mask coincide with each other, and is irradiated with ultraviolet light.
The negative photosensitive resin layer was cured to a thickness of about 25 μm from the inner wall surface of the hole. (4) Next, a thermosetting silver paste was buried in the via hole and the hole for forming the protruding electrode, and temporarily cured at 100 ° C. for 30 minutes. Then, excess paste protruding from the holes was removed by polishing until the surface of the photosensitive resin layer was exposed. (5) Developing with a 1.0% aqueous solution of sodium carbonate for 90 seconds, followed by washing with water for 30 seconds and drying to remove the unexposed portion of the photosensitive resin layer. (6) Thereafter, the silver paste was fully cured at 150 ° C. for 60 minutes.
【0021】このようにして製造した突起電極付きプリ
ント配線基板には、外径100μm、高さ約100μm
(アスペクト比=1)の銀ペーストからなる円筒状突起
の側面に約25μm厚さのネガ型感光性樹脂からなる保
護層が被覆された状態で突起電極が形成された。The printed wiring board with the protruding electrodes manufactured as described above has an outer diameter of 100 μm and a height of about 100 μm.
A projection electrode was formed in a state where a side surface of a cylindrical projection made of a silver paste (aspect ratio = 1) was covered with a protective layer made of a negative photosensitive resin having a thickness of about 25 μm.
【0022】(実施例2)前記実施例1の(3)におい
て、マスクを介して紫外線を照射する代わりに、364
nmのエキシマレーザーを用いて穴の内壁面から約25
μmの厚みにネガ型感光性樹脂層を硬化したこと以外
は、実施例1と同様にして突起電極付きプリント配線板
を製造した。(Embodiment 2) In (3) of Embodiment 1, instead of irradiating ultraviolet rays through a mask, 364
Approximately 25 mm from the inner wall of the hole using an excimer laser
A printed wiring board with protruding electrodes was manufactured in the same manner as in Example 1 except that the negative photosensitive resin layer was cured to a thickness of μm.
【0023】以上のようにして製造した上記実施例にか
かる突起電極付きプリント配線基板は、外部応力に対し
て強い構造であり、しかもアスペクト比が大きく高さが
均一な円筒状突起群を有するものであった。また、狭ピ
ッチ化したチップ電極の接続においても、封止樹脂の流
し込みが容易な構造であり、接続部分の信頼性に優れた
フリップチップ実装が容易に実現できる。The printed wiring board with the protruding electrodes according to the above embodiment manufactured as described above has a structure resistant to external stress, and has a group of cylindrical projections having a large aspect ratio and a uniform height. Met. Further, even in connection of the chip electrodes having a reduced pitch, the structure is such that the sealing resin can be easily poured, and flip-chip mounting with excellent reliability of the connection portion can be easily realized.
【0024】[0024]
【発明の効果】以上説明したように本発明によれば、狭
ピッチ化したチップ電極の接続においても、チップと配
線基板の間隔を封止樹脂の流し込みが容易となるような
間隔に維持できる、アスペクト比の高い突起電極を有す
るプリント配線基板を提供することができる。また、本
発明の突起電極付きプリント配線基板は、突起電極が感
光性樹脂からなる保護層にて被覆されているので、外部
応力に強い突起電極が形成される。しかも、感光性樹脂
層の厚みにより突起電極の高さを任意に調整することが
でき、均一な高さの突起電極群が得られる。その結果、
かかる突起電極を介して配線基板の電極とICチップの
電極とを接続すれば、接続部分の信頼性に優れたフリッ
プチップ実装が容易に実現できる。As described above, according to the present invention, even in the connection of the chip electrodes having a reduced pitch, the distance between the chip and the wiring board can be maintained at such a distance that the sealing resin can be easily poured. A printed wiring board having a protruding electrode having a high aspect ratio can be provided. Further, in the printed wiring board with the protruding electrodes of the present invention, the protruding electrodes are covered with the protective layer made of the photosensitive resin, so that the protruding electrodes resistant to external stress are formed. Moreover, the height of the protruding electrodes can be arbitrarily adjusted depending on the thickness of the photosensitive resin layer, and a protruding electrode group having a uniform height can be obtained. as a result,
If the electrodes of the wiring board and the electrodes of the IC chip are connected via such protruding electrodes, flip-chip mounting with excellent reliability of the connection portion can be easily realized.
【図1】本発明の突起電極付きプリント配線基板の製造
工程図である。FIG. 1 is a manufacturing process diagram of a printed wiring board with a protruding electrode according to the present invention.
【図2】本発明の突起電極付きプリント配線基板とIC
チップとの接続例を示す図である。FIG. 2 is a printed wiring board with a protruding electrode and an IC according to the present invention.
It is a figure showing the example of connection with a chip.
1 配線基板 2 絶縁樹脂層 3 感光性樹脂層 4 バイアホール及び突起電極用の穴 5 保護層 6 導電性ペースト 7 突起電極 8 接続層 9 ICチップ 10 ICチップ電極 11 封止樹脂 DESCRIPTION OF SYMBOLS 1 Wiring board 2 Insulating resin layer 3 Photosensitive resin layer 4 Via hole and hole for projection electrode 5 Protective layer 6 Conductive paste 7 Projection electrode 8 Connection layer 9 IC chip 10 IC chip electrode 11 Sealing resin
Claims (5)
び突起電極が一体に形成されているプリント配線基板に
おいて、当該配線基板表面に突出してなる導電性ペース
トからなる突起電極は、その電極側面が感光性樹脂層か
らなる保護層で被覆されていることを特徴とする突起電
極付きプリント配線基板。In a printed wiring board in which a via hole made of a conductive paste and a projecting electrode are integrally formed, a side surface of the projecting electrode made of a conductive paste projecting on the surface of the wiring board is photosensitive. A printed wiring board with protruding electrodes, which is covered with a protective layer made of a resin layer.
ト比(突起高さ/突起径)が1以上の突起電極を有する
ことを特徴とする請求項1に記載の突起電極付きプリン
ト配線基板。2. The printed wiring board with projection electrodes according to claim 1, further comprising projection electrodes having an aspect ratio (projection height / projection diameter) in which the projection height is larger than the projection diameter and is 1 or more.
とする請求項1に記載の突起電極付きプリント配線基
板。3. The printed wiring board according to claim 1, wherein the printed wiring board is used for flip-chip mounting.
ターンが設けられたコア基板面に、絶縁樹脂層と感光性
樹脂層を順次に形成する工程、(2)レーザー光を用い
て前記(1)で形成した樹脂層の厚さ方向に貫通して前
記配線パターンに達する穴を穿孔する工程、(3)活性
エネルギー線を利用して、前記感光性樹脂層に、前記
(2)で穿孔した穴の内壁面から一定の幅を持つ保護層
となる露光パターンを形成する工程、(4)前記穴にバ
イアホール及び突起電極となる導電性ペーストを充填し
て熱硬化し、次いで、穴から突出した余分なペーストを
表面研磨にて除去する工程、(5)前記(3)でパター
ン露光した感光性樹脂層を現像することにより、側面が
感光性樹脂層からなる保護層で被覆された構造の突起電
極を形成する工程、を含むことを特徴とする突起電極付
きプリント配線基板の製造方法。4. At least the following steps: (1) a step of sequentially forming an insulating resin layer and a photosensitive resin layer on the surface of the core substrate on which the wiring pattern is provided; and (2) the step (1) using a laser beam. A) forming a hole through the resin layer formed in the thickness direction to reach the wiring pattern; and (3) forming a hole in the photosensitive resin layer using the active energy ray in the step (2). A step of forming an exposure pattern to be a protective layer having a certain width from the inner wall surface of the hole, (4) filling the hole with a conductive paste to be a via hole and a protruding electrode, thermosetting, and then projecting from the hole (5) removing the excess paste by surface polishing, and (5) developing the photosensitive resin layer subjected to the pattern exposure in (3) to develop a structure in which the side surface is covered with a protective layer made of the photosensitive resin layer. Forming a protruding electrode. A method for manufacturing a printed wiring board with a protruding electrode, the method comprising:
層のパターン露光をレーザー光にて行うことを特徴とす
る請求項4に記載の製造方法。5. The method according to claim 4, wherein in the step (3), the pattern exposure of the photosensitive resin layer is performed by a laser beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000086817A JP2001274277A (en) | 2000-03-27 | 2000-03-27 | Printed wiring substrate with projection electrode and its manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000086817A JP2001274277A (en) | 2000-03-27 | 2000-03-27 | Printed wiring substrate with projection electrode and its manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001274277A true JP2001274277A (en) | 2001-10-05 |
Family
ID=18602924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000086817A Withdrawn JP2001274277A (en) | 2000-03-27 | 2000-03-27 | Printed wiring substrate with projection electrode and its manufacturing method |
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Country | Link |
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JP (1) | JP2001274277A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008305841A (en) * | 2007-06-05 | 2008-12-18 | Fujikura Kasei Co Ltd | Manufacturing method for electronic component, and electronic component manufactured by the manufacturing method |
WO2012111814A1 (en) * | 2011-02-18 | 2012-08-23 | 古河電気工業株式会社 | Wiring substrate, method for manufacturing same, and semiconductor device |
JP2012174791A (en) * | 2011-02-18 | 2012-09-10 | Furukawa Electric Co Ltd:The | Wiring board, manufacturing method of wiring board, and semiconductor device |
-
2000
- 2000-03-27 JP JP2000086817A patent/JP2001274277A/en not_active Withdrawn
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008305841A (en) * | 2007-06-05 | 2008-12-18 | Fujikura Kasei Co Ltd | Manufacturing method for electronic component, and electronic component manufactured by the manufacturing method |
WO2012111814A1 (en) * | 2011-02-18 | 2012-08-23 | 古河電気工業株式会社 | Wiring substrate, method for manufacturing same, and semiconductor device |
JP2012174791A (en) * | 2011-02-18 | 2012-09-10 | Furukawa Electric Co Ltd:The | Wiring board, manufacturing method of wiring board, and semiconductor device |
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