JP2001273940A - High-frequency connector - Google Patents

High-frequency connector

Info

Publication number
JP2001273940A
JP2001273940A JP2000089650A JP2000089650A JP2001273940A JP 2001273940 A JP2001273940 A JP 2001273940A JP 2000089650 A JP2000089650 A JP 2000089650A JP 2000089650 A JP2000089650 A JP 2000089650A JP 2001273940 A JP2001273940 A JP 2001273940A
Authority
JP
Japan
Prior art keywords
weight
insulator
oxide
outer conductor
frequency connector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000089650A
Other languages
Japanese (ja)
Inventor
Michinobu Iino
道信 飯野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000089650A priority Critical patent/JP2001273940A/en
Publication of JP2001273940A publication Critical patent/JP2001273940A/en
Pending legal-status Critical Current

Links

Landscapes

  • Glass Compositions (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Connections Arranged To Contact A Plurality Of Conductors (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent an insulator from being cracked, and obtain a high-frequency connector with a good airtight encapsulation. SOLUTION: This is the high-frequency connector 4 comprising a cylindrical outer conductor 1, an insulator 2 that is airtightly joined in contact with the inner face of this outer conductor 1 and that has a through hole 2a in nearly parallel with a shaft direction of the outer conductor 1, and a rod-like central conductor 3 that, inserted through the through hole 2a, is airtightly joined with the both ends protruding from the insulator 2. This is characterized by that α2<α3<=α1 and α3-α2<=1 ppm/ deg.C on condition that average linear thermal expansion factors of the outer conductor 1, the insulator 2 and the central conductor 3 at 25-450 deg.C are assumed as α1, α2 and α3 ppm/ deg.C, respectively.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は高周波同軸コネクタ
に関し、特にマイクロ波集積回路用パッケージ内外の電
気配線をパッケージ内の気密封止を保持しつつ電気的に
接続するための高周波コネクタに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency coaxial connector, and more particularly to a high-frequency connector for electrically connecting electric wiring inside and outside a package for a microwave integrated circuit while maintaining hermetic sealing in the package. .

【0002】[0002]

【従来の技術】高周波コネクタでは、中心導体と外部導
体との間に配置される絶縁体を樹脂製のものからセラミ
ック製のものに代えることにより耐圧力性・真空気密性
・耐電圧性の向上とともに、高周波領域での電気特性の
向上が図られている。また最近では、コストの削減や製
造工程の工数削減のために絶縁体にガラスが用いられる
ようになってきている。
2. Description of the Related Art In a high-frequency connector, an insulator disposed between a center conductor and an outer conductor is changed from a resin-made insulator to a ceramic-made insulator, thereby improving pressure resistance, vacuum tightness, and voltage resistance. At the same time, the improvement of the electrical characteristics in the high-frequency region has been achieved. Recently, glass has been used as an insulator in order to reduce costs and man-hours in the manufacturing process.

【0003】このようなガラスとして、誘電率が約4.1
と低く高周波特性が良好なホウ珪酸系のガラスが使用さ
れている。
[0003] Such a glass has a dielectric constant of about 4.1.
Borosilicate glass having a low frequency and good high frequency characteristics is used.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記の
ガラスは誘電率が約4.1と低く良好な高周波特性を示す
もののその熱膨張係数が約3.9ppm/℃であり、外部
導体や中心導体を形成するFe−Ni−Co合金等の金
属材料の熱膨張係数(5.1〜5.3ppm/℃)と大きく相
違することから、外部導体と中心導体とを間にガラスか
ら成る絶縁体を挟み込んで接合させる際、絶縁体と外部
導体および中心導体との間にそれぞれの熱膨張係数の相
違に起因して大きな応力が発生するとともにこの応力が
絶縁体に作用して、絶縁体の中心導体近傍から外周導体
に向かって絶縁体にクラックが入ってしまい、その結
果、高周波コネクタの気密封止が破れ、高周波コネクタ
の真空気密性が低下してしまうという問題点を有してい
た。
However, the above glass has a low dielectric constant of about 4.1 and exhibits good high-frequency characteristics, but has a thermal expansion coefficient of about 3.9 ppm / ° C., and forms an outer conductor and a center conductor. Since the thermal expansion coefficient (5.1 to 5.3 ppm / ° C.) of a metal material such as an Fe—Ni—Co alloy is significantly different, when the outer conductor and the center conductor are joined with an insulator made of glass interposed therebetween, A large stress is generated due to the difference in the coefficient of thermal expansion between the insulator, the outer conductor, and the center conductor, and this stress acts on the insulator to move from near the center conductor of the insulator to the outer conductor. As a result, the insulator is cracked, and as a result, the hermetic sealing of the high-frequency connector is broken, and the vacuum hermeticity of the high-frequency connector is reduced.

【0005】本発明は上記問題点に鑑み案出されたもの
で、その目的は、絶縁体にクラックや割れが発生するこ
とがなく、真空気密性の良好な高周波コネクタをを提供
することにある。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a high-frequency connector having good vacuum tightness without cracking or cracking of an insulator. .

【0006】[0006]

【課題を解決するための手段】本発明の高周波コネクタ
は、筒状の外部導体と、この外部導体の内周面に内接し
て気密に接合され、外部導体の軸方向に略平行な貫通孔
を有する絶縁体と、貫通孔に挿通され、両端を絶縁体か
ら突出させて気密に接合された棒状の中心導体とから成
る高周波コネクタにおいて、外部導体、絶縁体および中
心導体の25〜450℃における平均線熱膨張係数をそれぞ
れα1、α2およびα3ppm/℃としたときに、α2
<α3≦α1、かつα3−α2≦1ppm/℃であるこ
とを特徴とするものである。
A high-frequency connector according to the present invention has a cylindrical outer conductor and a through-hole substantially in parallel with the axial direction of the outer conductor, the inner conductor being inscribed in an airtight manner in contact with the inner peripheral surface of the outer conductor. In a high-frequency connector composed of an insulator having a rod-shaped center conductor that is inserted into a through hole and has both ends protruding from the insulator and joined in an airtight manner, the external conductor, the insulator and the center conductor at 25 to 450 ° C. When the average linear thermal expansion coefficients are respectively α1, α2 and α3 ppm / ° C., α2
<Α3 ≦ α1, and α3-α2 ≦ 1 ppm / ° C.

【0007】また、本発明の高周波コネクタは、絶縁体
が酸化ケイ素55〜65重量%、酸化ホウ素18〜28重量%、
酸化ナトリウム4〜10重量%、酸化アルミニウム2〜8
重量%、酸化カリウム1〜6重量%、酸化リチウム1〜
6重量%および酸化バリウム0.5〜3重量%から成るこ
とを特徴とするものである。
In the high-frequency connector of the present invention, the insulator is 55 to 65% by weight of silicon oxide, 18 to 28% by weight of boron oxide,
Sodium oxide 4-10% by weight, aluminum oxide 2-8
Wt%, potassium oxide 1-6 wt%, lithium oxide 1-
6% by weight and 0.5 to 3% by weight of barium oxide.

【0008】本発明の高周波コネクタによれば、25〜45
0℃における中心導体と絶縁体の平均線熱膨張係数の差
を1ppm/℃以内と小さなものとしたことから、外部
導体と中心導体とを間にガラスから成る絶縁体を挟み込
んで接合させる際、中心導体と絶縁体との間にそれぞれ
の熱膨張係数の相違に起因して大きな応力が発生するこ
とはなく、これによって絶縁体にクラックが入るのが有
効に防止され、その結果、真空気密性の良好な高周波コ
ネクタとすることができる。
According to the high frequency connector of the present invention, 25 to 45
Since the difference in the average linear thermal expansion coefficient between the center conductor and the insulator at 0 ° C. is as small as 1 ppm / ° C. or less, when the outer conductor and the center conductor are joined by sandwiching the insulator made of glass therebetween, There is no large stress between the center conductor and the insulator due to the difference in the coefficient of thermal expansion between them, which effectively prevents cracks in the insulator and, as a result, the vacuum tightness High frequency connector with good

【0009】また、本発明の高周波コネクタによれば、
絶縁体を酸化ケイ素55〜65重量%、酸化ホウ素18〜28重
量%、酸化ナトリウム4〜10重量%、酸化アルミニウム
2〜8重量%、酸化カリウム1〜6重量%、酸化リチウ
ム1〜6重量%および酸化バリウム0.5〜3重量%で形
成したことから、絶縁体の25〜450℃における平均熱膨
張係数を約4.6ppm/℃とし、中心導体を形成するF
e−Ni−Co合金等の金属材料の25〜450℃における
平均熱膨張係数との差を1ppm/℃以内とすることが
できる。
According to the high frequency connector of the present invention,
55-65% by weight of silicon oxide, 18-28% by weight of boron oxide, 4-10% by weight of sodium oxide, 2-8% by weight of aluminum oxide, 1-6% by weight of potassium oxide, 1-6% by weight of lithium oxide And 0.5 to 3% by weight of barium oxide, the average thermal expansion coefficient of the insulator at 25 to 450 ° C. is about 4.6 ppm / ° C.
The difference between the average thermal expansion coefficient of a metal material such as an e-Ni-Co alloy at 25 to 450 ° C can be made within 1 ppm / ° C.

【0010】[0010]

【発明の実施の形態】次に、本発明を添付の図面に基づ
き詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings.

【0011】図1は本発明の高周波コネクタの実施の形
態の一例を示す断面図であり、1は外部導体、2は絶縁
体、3は中心導体であり、主にこれらで本発明の高周波
コネクタ4が構成される。
FIG. 1 is a sectional view showing an embodiment of a high-frequency connector according to the present invention, wherein 1 is an outer conductor, 2 is an insulator, and 3 is a center conductor. 4 are configured.

【0012】外部導体1は、Fe−29Ni−17Co合金
やFe−29Ni−16Co合金等のFe−Ni−Co系の
金属材料から成る筒状であり、高周波コネクタ4をパッ
ケージに取着する際の取付け金具として作用し、例えば
パッケージの壁にこの外部導体1に対応した貫通孔を設
けてその貫通孔内に高周波コネクタ4を挿通させ、外部
導体1とパッケージの壁とを銀ろう等のろう材により接
合することにより高周波コネクタ4がパッケージに取着
される。
The outer conductor 1 has a cylindrical shape made of an Fe-Ni-Co-based metal material such as an Fe-29Ni-17Co alloy or an Fe-29Ni-16Co alloy, and is used for attaching the high-frequency connector 4 to a package. For example, a through hole corresponding to the external conductor 1 is provided in a wall of a package, a high-frequency connector 4 is inserted into the through hole, and a brazing material such as silver brazing is used to connect the external conductor 1 and the wall of the package. The high frequency connector 4 is attached to the package.

【0013】また、外部導体1の内部には、絶縁体2が
その外周面を外部導体1の内周面に気密に内接して接合
されている。
Further, inside the outer conductor 1, an insulator 2 is joined in such a manner that its outer peripheral surface is insulated in an airtight manner with the inner peripheral surface of the outer conductor 1.

【0014】絶縁体2は、酸化ケイ素55〜65重量%、酸
化ホウ素18〜28重量%、酸化ナトリウム4〜10重量%、
酸化アルミニウム2〜8重量%、酸化カリウム1〜6重
量%、酸化リチウム1〜6重量%および酸化バリウム0.
5〜3重量%から成るガラスで形成されており、その中
央部に外部導体1の一方の開口から他方の開口に向けて
貫通する、外部導体1の軸方向に略平行な貫通孔2aが
形成された略円板体である。
The insulator 2 comprises 55 to 65% by weight of silicon oxide, 18 to 28% by weight of boron oxide, 4 to 10% by weight of sodium oxide,
2-8% by weight of aluminum oxide, 1-6% by weight of potassium oxide, 1-6% by weight of lithium oxide and 0.
A through-hole 2a is formed in the center of the glass, which penetrates from one opening of the outer conductor 1 toward the other opening and is substantially parallel to the axial direction of the outer conductor 1. It is a substantially disc body.

【0015】絶縁体2は、外部導体1との電気的絶縁を
保って中心導体3を保持する作用をなし、貫通孔2a内
には中心導体3がその両端を突出させた状態で挿入固定
されされている。
The insulator 2 functions to hold the center conductor 3 while maintaining electrical insulation from the outer conductor 1. The center conductor 3 is inserted and fixed in the through hole 2a with both ends protruding. Have been.

【0016】中心導体3は、Fe−29Ni−17Co合金
やFe−29Ni−16Co合金等のFe−Ni−Co系の
金属材料から成る棒状体であり、パッケージ内外を電気
的に接続するための端子として機能し、そのパッケージ
の内部側と成る一端にはパッケージ内部の半導体素子が
リード線等を介して接続され、他端をパッケージ外部の
電気装置等に接続することによって、パッケージ内部の
半導体素子は外部電気装置と電気的に接続される。
The center conductor 3 is a rod-shaped body made of a Fe-Ni-Co-based metal material such as an Fe-29Ni-17Co alloy or an Fe-29Ni-16Co alloy, and has terminals for electrically connecting the inside and outside of the package. The semiconductor element inside the package is connected to one end on the inner side of the package via a lead wire, and the other end is connected to an electric device or the like outside the package. It is electrically connected to an external electric device.

【0017】本発明の高周波コネクタ4によれば、25〜
450℃における中心導体3と絶縁体2の平均線熱膨張係
数との差を1ppm/℃以内と小さなものとしたことか
ら、外部導体1と中心導体3とを間にガラスから成る絶
縁体2を挟み込んで接合させる際、中心導体3と絶縁体
2との間にそれぞれの熱膨張係数の相違に起因して大き
な応力が発生することはなく、これによって絶縁体2に
クラックが入るのが有効に防止され、その結果、真空気
密性の良好な高周波コネクタ4とすることができる。
According to the high-frequency connector 4 of the present invention, 25 to
Since the difference between the average linear thermal expansion coefficient of the center conductor 3 and the average thermal expansion coefficient of the insulator 2 at 450 ° C. was made as small as 1 ppm / ° C. or less, the insulator 2 made of glass was placed between the outer conductor 1 and the center conductor 3. When sandwiching and joining, no large stress is generated between the center conductor 3 and the insulator 2 due to the difference in the coefficient of thermal expansion between the center conductor 3 and the insulator 2, thereby effectively cracking the insulator 2. As a result, the high-frequency connector 4 having good vacuum tightness can be obtained.

【0018】また、本発明の高周波コネクタによれば、
絶縁体を酸化ケイ素55〜65重量%、酸化ホウ素18〜28重
量%、酸化ナトリウム4〜10重量%、酸化アルミニウム
2〜8重量%、酸化カリウム1〜6重量%、酸化リチウ
ム1〜6重量%および酸化バリウム0.5〜3重量%で形
成したことから、絶縁体2の25〜450℃における平均熱
膨張係数を約4.6ppm/℃とし、中心導体3を形成す
るFe−Ni−Co系合金等の金属材料の25〜450℃に
おける平均熱膨張係数との差を1ppm/℃以内とする
ことができる。
According to the high frequency connector of the present invention,
55-65% by weight of silicon oxide, 18-28% by weight of boron oxide, 4-10% by weight of sodium oxide, 2-8% by weight of aluminum oxide, 1-6% by weight of potassium oxide, 1-6% by weight of lithium oxide And 0.5 to 3% by weight of barium oxide, the average thermal expansion coefficient of the insulator 2 at 25 to 450 ° C. is about 4.6 ppm / ° C., and the center conductor 3 is made of an Fe—Ni—Co alloy or the like. The difference from the average thermal expansion coefficient of the metal material at 25 to 450 ° C. can be made within 1 ppm / ° C.

【0019】このような高周波コネクタ4は、次に述べ
る方法により製作される。まず、酸化ケイ素・酸化ホウ
素・酸化ナトリウム・酸化アルミニウム・酸化カリウム
・酸化リチウム・酸化バリウムから成る原料粉末に適当
な有機溶剤・溶媒・バインダを添加混合して原料粉末を
調整するとともにこの原料粉末をプレス成型により、中
心に中心導体3の直径よりやや大なる径の貫通孔2aを
有するとともに直径が外部導体1の内周の直径よりやや
小なる円板状の成型体を成型し、しかる後、この成型体
を500〜600℃の温度で仮焼した成型品を準備するととも
に、Fe−29Ni−17Co合金やFe−29Ni−16Co
合金等の金属材料からなる筒状や棒状の成型物を所定の
長さに切断して外部導体1と中心導体3を準備する。次
に、外部導体1に絶縁体2となる成型品を挿入載置する
とともに中心導体3を貫通孔2aにその両端が貫通孔2
aから突出するように挿入載置し、その後、絶縁体2と
なる成型品を850〜950℃の温度で溶融することにより外
部導体1と絶縁体2と中心導体3とが気密に接合され
る。
Such a high-frequency connector 4 is manufactured by the following method. First, a raw material powder composed of silicon oxide, boron oxide, sodium oxide, aluminum oxide, potassium oxide, lithium oxide, and barium oxide is mixed with a suitable organic solvent, a solvent, and a binder to prepare the raw material powder and to mix the raw material powder. By press molding, a disk-shaped molded body having a through hole 2a having a diameter slightly larger than the diameter of the central conductor 3 at the center and having a diameter slightly smaller than the diameter of the inner periphery of the outer conductor 1 is formed. A molded product obtained by calcining this molded body at a temperature of 500 to 600 ° C. is prepared, and an Fe-29Ni-17Co alloy or an Fe-29Ni-16Co alloy is prepared.
An outer conductor 1 and a center conductor 3 are prepared by cutting a cylindrical or rod-shaped molded product made of a metal material such as an alloy into a predetermined length. Next, a molded article to be the insulator 2 is inserted and placed in the outer conductor 1 and the center conductor 3 is inserted into the through hole 2a and both ends thereof are inserted into the through hole 2a.
The outer conductor 1, the insulator 2, and the center conductor 3 are hermetically joined by melting the molded article to be the insulator 2 at a temperature of 850 to 950 ° C. .

【0020】なお、外部導体1と中心導体3は、その表
面に酸化皮膜を被着形成させておくことにより絶縁体2
との接合を良好となすことができ、通常、温度500〜600
℃の酸化雰囲気中で10〜20分間酸化処理され、その表面
に1〜5μmの酸化膜が被着形成される。
The outer conductor 1 and the center conductor 3 are formed on the insulator 2 by forming an oxide film on the surface thereof.
Good bonding, usually at a temperature of 500-600
The substrate is oxidized in an oxidizing atmosphere at 10 ° C. for 10 to 20 minutes, and an oxide film having a thickness of 1 to 5 μm is formed on the surface thereof.

【0021】また、外部導体1および中心導体3はその
露出する表面にニッケル、金等の良導電性で耐蝕性およ
びロウ材との濡れ性が良好な金属をめっき法により1〜
20μmの厚みに被着させておくと、外部導体1および中
心導体3の酸化腐蝕を有効に防止することができるとと
もに外部導体1とパッケージとのろう付けや中心導体3
と外部の電子装置との電気的接続を良好となすことがで
きる。従って、外部導体1および中心導体3の酸化腐蝕
を防止し、外部導体1とパッケージとのろう付けや中心
導体3と外部の電子装置との電気的接続を良好となすに
は、外部導体1および中心導体3の露出する表面にニッ
ケル、金等をめっき法により1〜20μmの厚みに被着さ
せておくことが好ましい。
The outer conductor 1 and the center conductor 3 are coated with a metal such as nickel or gold having good conductivity, good corrosion resistance and good wettability with the brazing material by plating.
If the outer conductor 1 and the center conductor 3 are adhered in a thickness of 20 μm, oxidation corrosion of the outer conductor 1 and the center conductor 3 can be effectively prevented.
Good electrical connection between the device and an external electronic device. Therefore, in order to prevent the outer conductor 1 and the center conductor 3 from being oxidized and corroded, and to improve the brazing between the outer conductor 1 and the package and the electrical connection between the center conductor 3 and an external electronic device, the outer conductor 1 and the center conductor 3 are required. It is preferable that nickel, gold, or the like is applied to the exposed surface of the central conductor 3 to a thickness of 1 to 20 μm by plating.

【0022】なお、外部導体1と中心導体3を接合封止
する絶縁体2は、酸化ケイ素の量が55重量%未満である
とガラスの耐薬品性が劣化して、気密封止の信頼性が低
下してしまう傾向があり、他方、65重量%を超えるとガ
ラスの軟化溶融温度が高くなって、高周波コネクタ4の
組立て工程で外部導体1と中心導体3の酸化が進行して
高周波コネクタ4の強度が低下してしまう傾向がある。
したがって、酸化ケイ素の量は55〜65重量%の範囲であ
ることが好ましい。
When the amount of silicon oxide is less than 55% by weight, the insulator 2 for joining and sealing the outer conductor 1 and the center conductor 3 deteriorates the chemical resistance of the glass, and the reliability of hermetic sealing is reduced. On the other hand, if it exceeds 65% by weight, the softening and melting temperature of the glass becomes high, and the oxidation of the outer conductor 1 and the center conductor 3 proceeds in the assembly process of the high-frequency connector 4 so that the high-frequency connector 4 Tends to decrease in strength.
Therefore, the amount of silicon oxide is preferably in the range of 55-65% by weight.

【0023】また、酸化ホウ素の量は18重量%未満であ
るとガラスの軟化溶融温度が高くなって、高周波コネク
タ4の組立て工程で外部導体1と中心導体3の酸化が進
行して高周波コネクタ4の強度が低下してしまう傾向が
あり、他方、28重量%を超えると、ガラスの耐薬品性が
低下し、気密封止の信頼性が大きく低下してしまう傾向
がある。したがって、酸化ホウ素の量は18〜28重量%の
範囲であることが好ましい。
On the other hand, if the amount of boron oxide is less than 18% by weight, the softening and melting temperature of the glass becomes high, and the oxidation of the outer conductor 1 and the center conductor 3 proceeds in the assembly process of the high-frequency connector 4 so that the high-frequency connector 4 When the content exceeds 28% by weight, the chemical resistance of the glass tends to decrease, and the reliability of hermetic sealing tends to decrease significantly. Therefore, the amount of boron oxide is preferably in the range of 18-28% by weight.

【0024】酸化ナトリウムの量が4重量%未満である
とガラスの軟化溶融温度が高くなって、高周波コネクタ
4の組立て工程で外部導体1と中心導体3の酸化が進行
して高周波コネクタ4の強度が低下してしまう傾向があ
り、他方、10重量%を超えるとガラスの耐薬品性が劣化
して、気密封止の信頼性が低下してしまう傾向がある。
したがって、酸化ナトリウムの量は4〜10重量%の範囲
であることが好ましい。
If the amount of sodium oxide is less than 4% by weight, the softening and melting temperature of the glass increases, and the oxidation of the outer conductor 1 and the center conductor 3 progresses in the process of assembling the high-frequency connector 4, thereby increasing the strength of the high-frequency connector 4. On the other hand, if it exceeds 10% by weight, the chemical resistance of the glass tends to deteriorate, and the reliability of hermetic sealing tends to decrease.
Therefore, the amount of sodium oxide is preferably in the range of 4 to 10% by weight.

【0025】酸化アルミニウムの量が2重量%未満であ
るとガラスの耐薬品性が低下して、気密封止の信頼性が
低下してしまう傾向があり、他方、8重量%を超えると
ガラスの軟化溶融温度が高くなって、高周波コネクタ4
の組立て工程で外部導体1と中心導体3の酸化が進行し
て高周波コネクタ4の強度が低下してしまう傾向があ
る。したがって、酸化アルミニウムの量は2〜8重量%
の範囲であることが好ましい。
If the amount of aluminum oxide is less than 2% by weight, the chemical resistance of the glass tends to decrease, and the reliability of hermetic sealing tends to decrease. As the softening and melting temperature increases, the high-frequency connector 4
In the assembling process, the oxidation of the outer conductor 1 and the center conductor 3 proceeds, and the strength of the high-frequency connector 4 tends to decrease. Therefore, the amount of aluminum oxide is 2 to 8% by weight.
Is preferably within the range.

【0026】酸化カリウムの量が1重量%未満であると
ガラスの軟化溶融温度が高くなって、高周波コネクタ4
の組立て工程で外部導体1と中心導体3の酸化が進行し
て高周波コネクタ4の強度が低下してしまう傾向があ
り、他方、6重量%を超えるとガラスの耐薬品性が低下
して、気密封止の信頼性が低下してしまう傾向がある。
したがって、酸化カリウムの量は1〜6重量%の範囲で
あることが好ましい。
If the amount of potassium oxide is less than 1% by weight, the softening and melting temperature of the glass becomes high,
During the assembly process, the outer conductor 1 and the center conductor 3 tend to be oxidized, and the strength of the high-frequency connector 4 tends to decrease. On the other hand, if it exceeds 6% by weight, the chemical resistance of the glass decreases, The reliability of hermetic sealing tends to decrease.
Therefore, the amount of potassium oxide is preferably in the range of 1 to 6% by weight.

【0027】酸化リチウムの量が1重量%未満であると
ガラスの軟化溶融温度が高くなって、高周波コネクタ4
の組立て工程で外部導体1と中心導体3の酸化が進行し
て高周波コネクタ4の強度が低下してしまう傾向があ
り、他方、6重量%を超えるとガラスの耐薬品性が劣化
して、気密封止の信頼性が低下してしまう傾向がある。
したがって、酸化リチウムの量は1〜6重量%の範囲で
あることが好ましい。
If the amount of lithium oxide is less than 1% by weight, the softening and melting temperature of the glass increases, and the high frequency connector 4
In the assembling process, the oxidation of the outer conductor 1 and the center conductor 3 tends to progress, and the strength of the high-frequency connector 4 tends to decrease. On the other hand, if it exceeds 6% by weight, the chemical resistance of the glass deteriorates, The reliability of hermetic sealing tends to decrease.
Therefore, the amount of lithium oxide is preferably in the range of 1 to 6% by weight.

【0028】酸化バリウムの量が 0.5重量%未満である
とガラスの軟化溶融温度が高くなって、高周波コネクタ
4の組立て工程で外部導体1と中心導体3の酸化が進行
して高周波コネクタ4の強度が低下してしまう傾向があ
り、他方、3重量%を超えるとガラスの耐薬品性が劣化
して、気密封止の信頼性が低下してしまう傾向がある。
したがって、酸化バリウムの量は 0.5〜3重量%の範囲
であることが好ましい。
If the amount of barium oxide is less than 0.5% by weight, the softening and melting temperature of the glass increases, and the oxidation of the outer conductor 1 and the center conductor 3 progresses in the assembly process of the high-frequency connector 4 so that the strength of the high-frequency connector 4 is increased. On the other hand, if it exceeds 3% by weight, the chemical resistance of the glass tends to deteriorate, and the reliability of hermetic sealing tends to decrease.
Therefore, the amount of barium oxide is preferably in the range of 0.5 to 3% by weight.

【0029】かくして上述の高周波コネクタ4によれ
ば、外部導体3と中心導体1とを酸化ケイ素55〜65重量
%、酸化ホウ素18〜28重量%、酸化ナトリウム4〜10重
量%、酸化アルミニウム2〜8重量%、酸化カリウム1
〜6重量%、酸化リチウム1〜6重量%および酸化バリ
ウム 0.5〜3重量%から成る絶縁体2で接合封止するこ
とにより、気密封止の良好な高周波コネクタとすること
ができる。
Thus, according to the high-frequency connector 4 described above, the outer conductor 3 and the center conductor 1 are connected with 55 to 65% by weight of silicon oxide, 18 to 28% by weight of boron oxide, 4 to 10% by weight of sodium oxide, and 2 to 10% by weight of aluminum oxide. 8% by weight, potassium oxide 1
By bonding and sealing with an insulator 2 composed of 〜6 wt%, lithium oxide 11〜6 wt%, and barium oxide 0.533 wt%, a high-frequency connector with good hermetic sealing can be obtained.

【0030】なお、本発明は上述の実施の例に限定され
るものではなく、例えば上述の例では外部導体1と中心
導体3の材料としてFe−Ni−Co系合金を例示した
が、Fe−Ni系合金やFe−Co系合金を用いてもよ
い。
The present invention is not limited to the above-described embodiment. For example, in the above-described example, the outer conductor 1 and the center conductor 3 are made of a Fe—Ni—Co alloy as a material. A Ni-based alloy or an Fe-Co-based alloy may be used.

【0031】[0031]

【実施例】本発明の高周波コネクタの特性を評価するた
めに、25〜450℃における平均線熱膨張係数が種々の材
料を用いて外部導体1・絶縁体2・中心導体3を製作
し、高周波コネクタとした。なお、外部導体1・絶縁体
2・中心導体3の大きさは、外部導体1が外周径1.93m
m・内周径1.63mm・長さ1.4mm、絶縁体2が外周径
1.63mm・内周径0.3mm・長さ1.4mm、中心導体3が
直径0.3mm・長さ3.18mmとした。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In order to evaluate the characteristics of the high-frequency connector of the present invention, an outer conductor 1, an insulator 2, and a center conductor 3 were manufactured using materials having various average linear thermal expansion coefficients at 25 to 450 ° C. Connector. The size of the outer conductor 1, the insulator 2, and the center conductor 3 is such that the outer conductor 1 has an outer diameter of 1.93 m.
m, inner diameter 1.63 mm, length 1.4 mm, insulator 2 is outer diameter
1.63 mm, inner diameter 0.3 mm, length 1.4 mm, center conductor 3 was 0.3 mm in diameter and 3.18 mm in length.

【0032】特性評価は、温度サイクル試験後の絶縁体
1のクラックの発生率で評価した。温度サイクル試験
は、温度が−60℃および150℃の恒温槽中に各10分間に
放置しこれを1サイクルとして100サイクルの条件で行
い、試験後の絶縁体1を目視で検査しクラックの有無を
確認した。
In the evaluation of the characteristics, the occurrence rate of cracks in the insulator 1 after the temperature cycle test was evaluated. The temperature cycle test was performed in a constant temperature bath at -60 ° C and 150 ° C for 10 minutes each, and this was performed as one cycle under the condition of 100 cycles. After the test, the insulator 1 was visually inspected for cracks. It was confirmed.

【0033】表1は温度サイクル試験の結果を示したも
のであり、外部導体1・絶縁体2・中心導体3の25〜45
0℃における平均線熱膨張係数の差が1ppm/℃以内
の本発明の高周波コネクタ4では絶縁体2にクラックは
発生せず、良好な気密封止性を有することがわかった。
Table 1 shows the results of the temperature cycle test, in which 25 to 45 of the outer conductor 1, the insulator 2, and the center conductor 3 are shown.
In the high-frequency connector 4 of the present invention in which the difference in the average linear thermal expansion coefficient at 0 ° C. was 1 ppm / ° C. or less, no crack occurred in the insulator 2 and it was found that the high-frequency connector 4 had good hermetic sealing properties.

【0034】[0034]

【表1】 [Table 1]

【0035】[0035]

【発明の効果】本発明の高周波コネクタによれば、25〜
450℃における中心導体と絶縁体の平均線熱膨張係数と
の差を1ppm/℃以内と小さなものとしたことから、
外部導体と中心導体とを間にガラスから成る絶縁体を挟
み込んで接合させる際、中心導体と絶縁体との間にそれ
ぞれの熱膨張係数の相違に起因して大きな応力が発生す
ることはなく、これによって絶縁体にクラックが入るの
が有効に防止され、その結果、真空気密性の良好な高周
波コネクタとすることができる。
According to the high frequency connector of the present invention, 25 to
Because the difference between the average linear thermal expansion coefficient of the center conductor and the insulator at 450 ° C was as small as 1 ppm / ° C or less,
When the outer conductor and the center conductor are joined by sandwiching an insulator made of glass between them, a large stress does not occur due to a difference in their respective thermal expansion coefficients between the center conductor and the insulator. This effectively prevents cracks in the insulator, and as a result, provides a high-frequency connector with good vacuum tightness.

【0036】また、本発明の高周波コネクタによれば、
絶縁体を酸化ケイ素55〜65重量%、酸化ホウ素18〜28重
量%、酸化ナトリウム4〜10重量%、酸化アルミニウム
2〜8重量%、酸化カリウム1〜6重量%、酸化リチウ
ム1〜6重量%および酸化バリウム0.5〜3重量%で形
成したことから、絶縁体の25〜450℃における平均熱膨
張係数を約4.6ppm/℃とし、外部導体や中心導体を
形成するFe−Ni−Co合金等の金属材料の25〜450
℃における平均熱膨張係数との差を1ppm/℃以内と
することができる。
According to the high frequency connector of the present invention,
55-65% by weight of silicon oxide, 18-28% by weight of boron oxide, 4-10% by weight of sodium oxide, 2-8% by weight of aluminum oxide, 1-6% by weight of potassium oxide, 1-6% by weight of lithium oxide And 0.5 to 3% by weight of barium oxide, so that the average thermal expansion coefficient of the insulator at 25 to 450 ° C. is about 4.6 ppm / ° C., and the outer conductor and the central conductor such as Fe—Ni—Co alloy forming the center conductor 25-450 of metal material
The difference from the average thermal expansion coefficient at ° C can be made within 1 ppm / ° C.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の高周波コネクタの実施の形態の一例を
示す断面図である。
FIG. 1 is a sectional view showing an example of an embodiment of a high-frequency connector according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・・・・・外部導体 2・・・・・・・・・絶縁体 3・・・・・・・・・中心導体 4・・・・・・・・・高周波コネクタ 1 outer conductor 2 insulator 3 center conductor 4 high-frequency connector

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4G062 AA08 BB05 CC01 DA06 DB03 DC04 DD01 DE01 DF01 EA03 EB03 EC03 ED01 EE01 EF01 EG02 EG03 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM08 MM27 NN32 5E063 HB02 HB03 XA02 XA03 XA04 5E086 PP02 PP14 PP17 PP19 PP24 QQ02 QQ12  ──────────────────────────────────────────────────続 き Continuing on the front page F term (reference) 4G062 AA08 BB05 CC01 DA06 DB03 DC04 DD01 DE01 DF01 EA03 EB03 EC03 ED01 EE01 EF01 EG02 EG03 FA01 FA10 FB01 FC01 FD01 FE01 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GB01 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM08 MM27 NN32 5E063 HB02 HB03 XA02 XA03 XA04 5E086 PP02 PP14 PP17 Q19PP24 Q17

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 筒状の外部導体と、該外部導体の内周面
に内接して気密に接合され、前記外部導体の軸方向に略
平行な貫通孔を有する絶縁体と、前記貫通孔に挿通さ
れ、両端を前記絶縁体から突出させて気密に接合された
棒状の中心導体とから成る高周波コネクタにおいて、前
記外部導体、前記絶縁体および前記中心導体の25〜4
50℃における平均線熱膨張係数をそれぞれα1、α2
およびα3ppm/℃としたときに、α2<α3≦α
1、かつα3−α2≦1ppm/℃であることを特徴と
する高周波コネクタ。
1. An insulator having a cylindrical outer conductor, a through-hole substantially in parallel to an axial direction of the outer conductor, insulated and insulated from an inner peripheral surface of the outer conductor, A high-frequency connector comprising a rod-shaped center conductor which is inserted and whose both ends protrude from the insulator and are hermetically bonded to each other;
The average linear thermal expansion coefficients at 50 ° C. are α1 and α2, respectively.
And α3 ppm / ° C., α2 <α3 ≦ α
1, and α3-α2 ≦ 1 ppm / ° C.
【請求項2】 前記絶縁体は酸化ケイ素55〜65重量
%、酸化ホウ素18〜28重量%、酸化ナトリウム4〜
10重量%、酸化アルミニウム2〜8重量%、酸化カリ
ウム1〜6重量%、酸化リチウム1〜6重量%および酸
化バリウム0.5〜3重量%から成ることを特徴とする
請求項1記載の高周波コネクタ。
2. The insulator comprises 55 to 65% by weight of silicon oxide, 18 to 28% by weight of boron oxide, and 4 to 50% by weight of sodium oxide.
2. The high-frequency wave according to claim 1, comprising 10% by weight, 2 to 8% by weight of aluminum oxide, 1 to 6% by weight of potassium oxide, 1 to 6% by weight of lithium oxide and 0.5 to 3% by weight of barium oxide. connector.
JP2000089650A 2000-03-28 2000-03-28 High-frequency connector Pending JP2001273940A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000089650A JP2001273940A (en) 2000-03-28 2000-03-28 High-frequency connector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000089650A JP2001273940A (en) 2000-03-28 2000-03-28 High-frequency connector

Publications (1)

Publication Number Publication Date
JP2001273940A true JP2001273940A (en) 2001-10-05

Family

ID=18605381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000089650A Pending JP2001273940A (en) 2000-03-28 2000-03-28 High-frequency connector

Country Status (1)

Country Link
JP (1) JP2001273940A (en)

Similar Documents

Publication Publication Date Title
JPH04246813A (en) Solid electrolytic capacitor containing fuse
JP2001273940A (en) High-frequency connector
CN210403699U (en) Reduce encapsulation shell of lead wire root crackle
JP2750237B2 (en) Electronic component storage package
JPH0736952B2 (en) Surface coating structure of metallized metal layer
JP2003046010A (en) Hermetically-sealed electronic component
JP2003142614A (en) Hermetically sealed electronic component
JP3909281B2 (en) Semiconductor element storage package and semiconductor device
JP2003272780A (en) High frequency connector
JP4051162B2 (en) Manufacturing method of electronic component storage container
JPH0637196A (en) Package for housing semiconductor device
JP3520865B2 (en) Hermetically sealed electronic components
JP4497627B2 (en) Glass ceramic sintered body, method for producing the same, wiring board, and mounting structure thereof
JP2747613B2 (en) Package for storing semiconductor elements
JPH0629330A (en) Semiconductor device
JP3181011B2 (en) Package for storing semiconductor elements
JPH01138710A (en) Manufacture of chip type solid electrolytic capacitor
JPH08148593A (en) Semiconductor element storing package
JPH03167842A (en) Package for semiconductor-element
JPH03167865A (en) Package for semiconductor-element
JPS62241364A (en) Electronic part with lead and manufacture thereof
JPH04119965U (en) airtight terminal
JPH06163733A (en) Production of package for housing semiconductor element
JPH0677272A (en) Semiconductor chip housing package
JP2001267445A (en) Package for containing semiconductor element and semiconductor device using it

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070213

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090206

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090217

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20090619