JP2001264796A - Liquid crystal device and electronic equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal device which realizes a small installation space of the region for laying of wiring. SOLUTION: A laid wire 16a on a substrate 11 connected to a transparent electrode 16 consisting of a transparent conductive oxide has two-layer structure of the electrode material layer 16a1 consisting of the same material as the transparent electrode 16, and a low electrical resistance materials layer 16a2 consisting of a material with resistance lower than the transparent electrode 16. It is desirable that the line width of at least a portion of a laid wire 16a is 10 μm or less. It is desirable to set identically the film thickness of an electrode material layer 16a1 of the laid wire 16a and the film thickness of the transparent electrode 16, and to set nearly identically the film thickness of the low electrical resistance materials layer 16a2 and the film thickness of the transparent electrode 17. In an area for laying of wiring 31b (31a), it is still more desirable not to form a transparent electrode 17 on a counter substrate 12. Besides, it is desirable to dispose a spacer 13 at both a display region 30 and the region 31b (31a) for laying of wiring.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal device and an electronic apparatus, and more particularly, to a structure of a wiring for connecting an electrode formed in a display area to a terminal for external connection and a structure of a wiring wiring area. Things.

[0002]

2. Description of the Related Art FIG. 21 is a schematic sectional view of a general liquid crystal (display) device 100 of a simple matrix type, and a schematic structure of the liquid crystal device will be described.

As shown in FIG. 21, a substrate (lower substrate) 1
01 and an opposing substrate (upper substrate) 102 are adhered at predetermined intervals on a peripheral portion of each substrate via a sealant 104, and a liquid crystal layer 105 is interposed between the substrate 101 and the opposing substrate 102.
Is enclosed.

Assuming that the display area of the liquid crystal device 100 is 120, the substrate 101 and the counter substrate 1
02 on the inner surface of the transparent electrode 10
6, 107 are formed. Transparent electrodes 106 and 107
An alignment film for aligning the liquid crystal is formed thereon, but is omitted in the drawing. Substrate 101 or counter substrate 10
2 may be provided with a color filter layer or the like for displaying a color.

[0005] A lead wire 106a, which will be described later, is connected to one end of the transparent electrode 106, but is omitted in the drawing for simplicity. In addition, a lead wire 107a described later is also connected to one end of the transparent electrode 107.

In order to keep the distance (cell thickness) between the substrate 101 and the counter substrate 102 constant, a number of spherical spacers 103 are arranged between the substrate 101 and the counter substrate 102. Although not shown in the drawings, the substrate 101,
A polarizing plate, a retardation plate, and the like are attached to the front and back of the counter substrate 102.

Next, FIGS. 22 and 23 show a substrate 101 and a counter substrate 102 of the liquid crystal device 100, respectively.
A schematic plan view when viewed from the side is shown, and the structure of the liquid crystal device 100 will be described in detail.

As shown in FIGS. 22 and 23, generally, in the liquid crystal device 100, the outer periphery of the substrate 101 and the counter substrate 102 is a non-display area, and the inner side thereof is the display area 12.
It is 0. Outside the display area 120, a sealing material 104 is formed around the periphery of the substrate 101 and the counter substrate 102, but is omitted in the drawing for simplicity.

The transparent electrode 10 formed in the display area 120
6 and 107, one end of each
6a and 107a are connected. Routing wiring 106
a and 107a are both the substrate 101 or the counter substrate 10;
2 is provided outside the display area 120 (non-display area).

[0010] As shown in FIG.
Are formed on the substrate 101 in two regions, a left side and a right side in the drawing, of the display region 120. Routing wiring 1
06a is formed in the wiring region 121a, 1
21b. On the other hand, as shown in FIG.
Is formed in the lower region of FIG. Routing wiring 107
The region where a is formed is referred to as a wiring region 122. The transparent electrodes 106 and 107 are respectively connected to the routing wiring 106
a and 107a are connected to the external connection terminal unit.

Generally, since the process of mounting the liquid crystal device 100 on an electronic device is facilitated, it is desirable that the external connection terminal is provided only on one substrate.

For example, the external connection terminal portion is connected to the counter substrate 10.
23, the external connection terminal 110 for the upper electrode (107) and the external connection terminal 1 for the lower electrode (106) are provided on the counter substrate 102, as shown in FIG.
11 are provided. Terminal 111 for external connection for lower electrode
Corresponds to the routing wiring regions 121a and 121b, and is provided in two places.

The wiring 107a is connected to the external connection terminal 110 for the upper electrode, and the transparent electrode 107 is connected to the external connection terminal 110 via the wiring 107a. On the other hand, the routing wiring 106 a is connected to a conductive member 112 provided between the substrate 101 and the counter substrate 102. The conductive members 112 correspond to the wiring areas 121a and 121b, and are provided at two locations. Conductive member 112
Is a conductive material composed of conductive particles and a binder (thermosetting resin, UV curable resin, etc.) or ACF (anisotropic
The conductive member 112 is made of a conductive film such as a conductive film, and is connected to the lower electrode external connection terminal 111 on the counter substrate 102. Transparent electrode 10
Reference numeral 6 is connected to the external connection terminal 111 via the routing wiring 106a and the conductive member 112.

FIG. 24 shows the transparent electrode 106 and the wiring 1
The schematic plan view which expanded the vicinity of the boundary part with 06a is expanded.
FIG. 24 is an enlarged view of a region indicated by reference numeral 113 in FIG.

As shown in FIG. 24, on a substrate 101, a transparent electrode 106 is formed in a display area 120, and the transparent electrode 106 is connected to a routing wiring 106a provided in a routing wiring area 121b. .

[0016]

The above liquid crystal device 100
In the prior art, the routing wirings 106a and 107a are made of the same material as the transparent electrodes 106 and 107. When the transparent electrodes 106 and 107 are made of a transparent conductive oxide such as ITO (Indium Tin Oxide) having a relatively high resistance value for wiring, the leading wirings 106a and 107
07a cannot be reduced in width, and the lead-out wirings 106a and 107a
Are increased, the leading wiring area 121a,
The space saving of 121b and 122 cannot be achieved,
There is a problem that the frame area around the display area 120 becomes large. In addition, the routing wiring 106a,
When the diameter of the transparent electrode 107a is reduced, the resistance value of the lead wiring increases, and between the adjacent transparent electrodes 106 or between the adjacent transparent electrodes 10a.
There is a problem that crosstalk occurs between the pixels 7 and the display quality of the liquid crystal device 100 deteriorates.

The number of the transparent electrodes 106 and 107 is set in accordance with the number of pixels, and is about several tens to several hundreds. The higher the resolution, the greater the number. Routing wiring 1
Since the number of 06a and 107a is equal to the number of transparent electrodes 106 and 107, the width of the lead wiring areas 121a and 121b increases as the resolution increases.

It is desirable that the widths of the routing wiring areas 121a and 121b be as narrow as possible (about 1.0 mm). Leading wiring areas 121a, 121 even with high resolution
In order to save the space b, it is desirable to set the line width of the lead wiring 106a to 10 μm or less. Also,
It is desirable that the distance between the lead wirings 106a is also set to 10 μm or less.

In particular, the routing wiring areas 121a and 121b
In this case, the problems of space saving and crosstalk are remarkable, but the same is true in the routing wiring region 122. By reducing the distance between the routing wiring 107a and the routing wiring 107a, the It is desirable to save space. Routing wiring area 121
By saving space for a, 121b and 122,
The display area 120 can be widened.

Therefore, the present invention solves the above-mentioned problems, and provides a liquid crystal device which can save the wiring area and prevent crosstalk, has a wide display area, and has excellent display quality. The purpose is to provide. Also,
It is an object to provide an electronic device having excellent display quality by including the liquid crystal device.

[0021]

As a result of the present inventor's investigation to solve the above-mentioned problems, it was found that the lead wiring was made of an electrode material layer made of the same material as the electrode and a low-potential material made of a material having a lower resistance than the electrode. It has been found that by forming a laminated structure of the resistance material layer, the wiring can be reduced in resistance, the line width of the wiring can be reduced to about 2 to 5 μm, and the wiring area can be reduced in space. Invented a liquid crystal device.

Means taken by the present invention to solve the above problem is that a liquid crystal layer is sandwiched between two opposing substrates having at least a number of electrodes formed on an inner surface thereof, and a liquid crystal layer is interposed between the two substrates. Is a liquid crystal device in which a large number of spacers are arranged, wherein the electrodes are formed in a display area on the substrate, and each of the electrodes is connected to a routing wiring formed outside the display area, The routing wiring formed on at least one of the substrates has an electrode material layer made of the same material as the electrode, and a laminated structure of a low-resistance material layer made of a material having a lower resistance than the electrode, In addition, a line width of at least a part of the routing wiring is smaller than a width of the electrode.

It is preferable that at least a part of the leading wiring having the laminated structure has a line width of 10 μm or less.

According to this means, crosstalk is prevented and the line width of the leading wiring is formed by forming the leading wiring formed on at least one of the substrates in a laminated structure of the electrode material layer and the low resistance material layer. Can be made thinner, the wiring area can be reduced in space, and a liquid crystal device having a wide display area and excellent display quality can be provided.

The lead wiring having the above-mentioned laminated structure is
The electrode material layer and the low-resistance material layer, wherein the thickness of the electrode material layer and the thickness of the electrode on the substrate on which the wiring is formed are the same; It is desirable that the thickness of the electrode on the other substrate facing the substrate on which the wiring is formed is substantially the same.

The difference between the thickness of the low-resistance material layer and the thickness of the electrode on the other substrate facing the substrate on which the wiring is formed is 0.05 μm or less. It is desirable.

In addition, it is preferable that the electrode is not formed on the other substrate facing the wiring area where the wiring having the laminated structure is formed.

It is preferable that the spacer is arranged in both the display area and the wiring area.

A lead wiring having a laminated structure is composed of an electrode material layer and a low-resistance material layer. No electrode is formed on a substrate facing a lead wiring region having a laminated structure. The thickness of the layer and the thickness of the electrode on the substrate on which the routing wiring is formed are the same, and the thickness of the low-resistance material layer and the thickness of the electrode on the substrate facing the substrate on which the routing wiring is formed. By making the thickness of the electrodes the same and arranging the spacers in both the display area and the wiring area, the substrate spacing is uniform in the wiring area and the display area where the wiring with the multilayer structure is formed. And a liquid crystal device with excellent display quality can be provided.

The above means is particularly effective when the electrode is made of a transparent conductive oxide such as ITO having a relatively large resistance value.

An external connection terminal portion is provided only on the one substrate, and the electrode formed on the substrate is
The electrode formed on the other substrate is connected to the external connection terminal portion via the wiring connected to the electrode, and the wiring connected to the electrode, When the wiring is connected to the external connection terminal portion via a conductive member disposed between the two substrates, at least the routing wiring connected to the conductive member has the laminated structure. It is desirable that the line width of the routing wiring is smaller than the width of the electrode.

A liquid crystal device having a large display area, a wide display area, and excellent display quality can be obtained by using at least a wiring structure connected at least to the conductive member in a laminated structure, thereby saving the wiring area and preventing crosstalk. Can be provided.

[0033] Further, in a region outside the display region and where the lead-out wiring is not formed, a dummy wiring comprising the laminated structure of the electrode material layer and the low-resistance material layer is provided on the one substrate. It is desirable to arrange.

The dummy wiring comprises the electrode material layer and the low-resistance material layer, and the thickness of the electrode material layer is the same as the thickness of the electrode on the substrate on which the dummy wiring is formed. It is preferable that the film thickness of the low-resistance material layer is substantially the same as the film thickness of the electrode on the other substrate facing the substrate on which the dummy wiring is formed.

It is preferable that the electrodes are not formed on the other substrate facing the dummy wiring region in which the dummy wiring is formed.

Further, it is preferable that the spacer is arranged in the dummy wiring region.

Outside the display area and in a region where the lead-out wiring is not formed, a dummy wiring composed of an electrode material layer and a low-resistance material layer is arranged. By arranging the spacers also in the region, it is possible to make the substrate interval uniform outside the display region and in the region where the routing wiring is not formed, so that a liquid crystal device with excellent display quality can be provided. .

Further, by providing the above liquid crystal device, it is possible to provide an electronic device having excellent display quality.

[0039]

Next, an embodiment according to the present invention will be described in detail.

First Embodiment FIG. 1 is a schematic sectional view of a simple matrix type liquid crystal (display) device 10 according to a first embodiment of the present invention, and the schematic structure of the liquid crystal device will be described.

As shown in FIG. 1, a substrate (lower substrate) 11
And an opposing substrate (upper substrate) 12 are adhered at predetermined intervals at a peripheral portion of each substrate via a sealing material 14,
A liquid crystal layer 15 is sealed between the substrate 11 and the counter substrate 12.

Assuming that the display area of the liquid crystal device 10 is 30,
In the display area 30, the inner surfaces of the substrate 11 and the opposing substrate 12 are formed in stripes on the inner surfaces of the substrate 11 and the counter substrate 12, respectively.
xide), a transparent electrode 16 made of a transparent conductive oxide,
17 are formed. An alignment film for aligning the liquid crystal is formed on the transparent electrodes 16 and 17, but is omitted in the drawing. A color filter layer or the like for performing color display may be provided on the substrate 11 or the counter substrate 12.

A wiring 16a to be described later is connected to one end of the transparent electrode 16, but is omitted in FIG. 1 for simplicity. In addition, a lead wiring 17a described later is also connected to one end of the transparent electrode 17.

In order to keep the distance (cell thickness) between the substrate 11 and the opposing substrate 12 constant, divinylbenzene,
A large number of spherical spacers 13 made of polystyrene, silicon dioxide or the like are arranged between the substrate 11 and the counter substrate 12. These spacers 13 may be formed in a column shape by a photosensitive resin. Although not shown in the drawings, a polarizing plate, a retardation plate, and the like are attached to the front and back of the substrate 11 and the counter substrate 12.

Next, FIG. 2 and FIG.
FIG. 2 is a schematic plan view of the counter substrate 12 as viewed from the liquid crystal layer 15 side, and the structure of the liquid crystal device 10 will be described in detail.

As shown in FIGS. 2 and 3, the outer periphery of the substrate 11 and the counter substrate 12 is a non-display area, and the inside is a display area 30. Outside the display area 30, the sealing material 14 is provided on the periphery of the substrate 11 and the counter substrate 12.
Are formed, but are omitted in the drawings for simplicity.

The transparent electrode 16 formed in the display area 30
One of the ends of the wiring 17 is provided with a wiring 16a, 1
7a is connected. The routing wirings 16a and 17a
It is provided outside the display area 30 on the substrate 11 or the counter substrate 12 (that is, in a non-display area).

As shown in FIG. 2, the lead-out wiring 16a is formed on the substrate 11 in two regions on the left and right sides of the display area 30 in the drawing. The area where the wiring 16a is formed is referred to as wiring areas 31a and 31b.
On the other hand, as shown in FIG. 3, the routing wiring 17 a is formed on the counter substrate 12 in a region below the display region 30 in the drawing. The area where the wiring 17a is formed is referred to as a wiring area 32.

The transparent electrodes 16 and 17 are connected to external connection terminals via the lead wires 16a and 17a, respectively. Since the process of mounting the liquid crystal device 10 on an electronic device is facilitated, it is preferable that the external connection terminal portion is provided only on one substrate.

For example, the terminal portion for external connection is connected to the counter substrate 12.
When provided only on the upper side, as shown in FIG. 3, an external connection terminal portion 20 for the upper electrode (17) is provided at the center of the end of the counter substrate 12, and external connection terminals for the lower electrode (16) are provided on both sides thereof. A terminal portion 21 is provided. Terminal 21 for external connection for lower electrode
Corresponds to the routing wiring areas 31a and 31b,
It is provided in two places.

The wiring 17a is connected to the external electrode terminal 20 for the upper electrode, and the transparent electrode 17 is connected to the wiring 17
is connected to the external connection terminal section 20 through the terminal a. on the other hand,
The routing wiring 16a is connected to a conductive member 22 provided between the substrate 11 and the counter substrate 12. Since the conductive members 22 correspond to the routing wiring regions 31a and 31b, they are provided at two locations. The conductive member 22 is made of a conductive material including conductive particles and a binder (a thermosetting resin, a UV curable resin, or the like) obtained by coating a plastic ball with nickel or the like, or a conductive film such as an ACF (anisotropic conductive film). , The conductive member 22 is a counter substrate
2 is connected to the lower electrode external connection terminal 21 on the upper electrode 2.
The transparent electrode 16 is connected to the external connection terminal 21 via the routing wiring 16 a and the conductive member 22.

FIG. 4 shows the transparent electrode 16 and the routing wiring 16a.
FIG. 3 is a schematic plan view in which the vicinity of a boundary portion with the reference numeral is enlarged. FIG.
3 is an enlarged plan view showing a region indicated by reference numeral 23 in FIG.

FIG. 5A is a schematic cross-sectional view of the liquid crystal device 10 in the vicinity of the boundary between the transparent electrode 16 and the wiring 16a. FIG. 5A illustrates the liquid crystal device 10 as shown in FIG.
It is sectional drawing at the time of cutting along the -A1 'line.

As shown in FIG. 5A, the routing wiring 16a
Denotes an electrode material layer 16a made of the same material as the transparent electrode 16.
1 and a low-resistance material layer 16a2 made of a material having a lower resistance than the transparent electrode 16. In addition, on the transparent electrode layer 16 and the routing wiring 16a having a laminated structure
An electrode material layer made of the same material as that of the transparent electrode 16 may be further laminated thereon. The low resistance material layer 16a2 is made of gold,
It is made of a metal such as tantalum, nickel, chromium, copper, palladium, aluminum, and silver, or an alloy mainly containing one or more metals selected from these metals. The electrode material layer 16a1 and the low-resistance material layer 16a2 are formed by a photolithography method, a plating method, or the like. Although the width of the electrode material layer 16a1 and the width of the low-resistance material layer 16a2 are indicated by the same width in FIG. 5A, the present invention is not limited to this, and the low-resistance material layer 16a2 May be narrower or wider than the width of the electrode material layer 16a1.

In FIG. 5A, the routing wiring 16a
The lower side is the electrode material layer 16a1, and the upper side is the low resistance material layer 1
However, the present invention is not limited to this, and the structure of the lead wiring 16a may be a laminated structure of the electrode material layer 16a1 and the low-resistance material layer 16a2. As shown in FIG. 5 (b), the lower side may be composed of the low resistance material layer 16a2, and the upper side may be composed of the electrode material layer 16a1.

The width of the electrode material layer 16a1 and the low-resistance material layer 1
Although the width of 6a2 is shown by the same width in FIG. 5B, the present invention is not limited to this, and the width of the electrode material layer 16a1 formed thereon is smaller than the width of the low-resistance material layer 16a2. Or it can be wide.

By forming the wiring 16a to have a laminated structure of the electrode material layer 16a1 and the low-resistance material layer 16a2, the resistance value is reduced as compared with the conventional structure in which the wiring 16a is made only of the electrode material. As shown in FIGS. 5A and 5B, the line width of the leading wiring 16a can be made smaller than the width of the transparent electrode 16, and can be reduced to about 2 to 5 μm. Wiring area 31 even with several hundred wires
The widths of a and 31b could be reduced to about 1.0 mm. In order to save the space of the lead wiring regions 31a and 31b and to prevent crosstalk, it is desirable that the line width of the lead wiring 16a is 10 μm or less.

In this embodiment, FIGS. 5A and 5B
As shown in FIG. 3, the electrode material layer 16a1 of the lead wiring 16a
And the thickness of the transparent electrode 16 are desirably set to be the same, and the thickness of the low-resistance material layer 16a2 and the thickness of the transparent electrode 17 are desirably set to be substantially the same. The difference between the thickness of the low-resistance material layer 16a2 and the thickness of the transparent electrode 17 is desirably 0.05 μm or less. In addition, the routing wiring regions 31a, 3
In 1b, it is desirable that the transparent electrode 17 is not formed on the counter substrate 12. Further, it is desirable that the spacers 13 are arranged in both the display region 30 and the routing wiring regions 31a and 31b. These spacers 13 may be formed in a column shape by a photosensitive resin.

The thickness of the electrode material layer 16a1 and the transparent electrode 16
The thickness of the low-resistance material layer 16a2 and the thickness of the transparent electrode 17 are set to be the same, and the transparent electrode 17 is formed on the counter substrate 12 in the routing wiring regions 31a and 31b. Is not formed, and the spacers 13 are arranged in both the display area 30 and the wiring areas 31a and 31b, so that the distance between the substrate 11 and the counter substrate 12 in the wiring areas 31a and 31b can be reduced. Can be made exactly equal to the substrate spacing in the above, so that the cell thickness of the liquid crystal cell can be made uniform.

Next, the structures of the routing wiring 17a and the routing wiring area 32 will be described. FIG. 6 shows the liquid crystal device 10.
3 is a schematic cross-sectional view of the vicinity of the boundary between the transparent electrode 17 and the routing wiring 17a. FIG. 6 is a cross-sectional view when the liquid crystal device 10 is cut along the line B1-B1 ′ in FIG.

As shown in FIG. 6, the wiring 17a is
It is made of an electrode material layer made of the same material as the transparent electrode 17.

In the routing wiring region 32, the thickness of the routing wiring 17a and the thickness of the transparent electrode 17 are set to be the same,
It is desirable to provide a dummy electrode 16A made of the same material as the transparent electrode 16 on the substrate 11. This dummy electrode 1
6A does not contribute to the liquid crystal display at all. Also,
It is desirable to dispose the spacer 13 also in the wiring area 32.

In the routing wiring area 32, the thickness of the routing wiring 17a and the thickness of the transparent electrode 17 are set to be the same,
By providing the dummy electrode 16A on the substrate 11 and arranging the spacer 13 also in the routing wiring region 32, the substrate spacing in the routing wiring region 32 and the substrate spacing in the display region 30 can be exactly equalized. The cell thickness of the liquid crystal cell can be made uniform.

Next, the structure near the conductive member 22 will be described. In the region where the conductive member 22 is formed, the routing wiring 16a may be made of either the electrode material layer 16a1 or the low-resistance material layer 16a2, or may be laminated.

FIG. 7 (a) shows that the wiring 16a is the lower electrode material layer 1 in the wiring wiring regions 31a and 31b.
FIG. 6A is a schematic cross-sectional view when the liquid crystal device 10 is cut along the line C1-C1 ′ in FIG. 2 when the upper side is made of the low-resistance material layer 16a2.

As shown in FIG. 7A, on the substrate 11, the lead wiring 16a is connected to the lead wiring region 31b (31
In (a), the lower side is composed of the electrode material layer 16a1, the upper side is composed of the low resistance material layer 16a2, and the region where the conductive member 22 is formed is composed of the electrode material layer 16a1.

In the wiring area 31b (31a), the transparent electrode 17 is not formed on the counter substrate 12 as described above. In addition, the routing wiring area 31b (3
1a), the spacer 1 is provided on the lead wiring 16a.
3 are arranged.

As described above, the conductive member 22 is made of a conductive material composed of conductive particles formed by coating a plastic ball with nickel or the like and a binder (a thermosetting resin, a UV curable resin, or the like), or a conductive material such as an ACF. In order to make the cell thickness of the liquid crystal cell uniform, as shown in FIG. 7A, the conductive member 22 is made of a conductive ball 22a having a plastic ball coated with nickel or the like and a binder ( It is desirable to be made of a conductive material made of a thermosetting resin, a UV curable resin, or the like.

The conductive particles 22a have an upper part in contact with the lower electrode external connection terminal part 21 formed on the counter substrate 12, and a lower part in the electrode material layer 16a1 formed on the substrate 11.
Is in contact with The conductive member 22 may be formed by enclosing the conductive particles 22 a in at least a part of the seal member 14, or may be formed at a position different from the seal member 14. Although only two conductive particles 22a are shown in the drawing for simplicity, about 20 to 30 particles are actually formed.

In the region where the conductive member 22 is formed, the routing wiring 16a may be composed of only the low-resistance material layer 16a2, and a schematic sectional view in this case is shown in FIG.

The leading wiring 16a is connected to the leading wiring area 31.
In a and 31b, the same applies to the case where the lower side is composed of the low resistance material layer 16a2 and the upper side is composed of the electrode material layer 16a1.

The leading wiring 16a is connected to the leading wiring area 31.
FIGS. 8A and 8B are schematic cross-sectional views of the case where the lower side is composed of the low-resistance material layer 16a2, the upper side is composed of the electrode material layer 16a1, and the region where the conductive member 22 is formed is composed of only the electrode material layer 16a1. See a).

Further, in the wiring lines 31a and 31b, the lower side is the lower resistance material layer 16a.
2. The upper side is composed of the electrode material layer 16a1,
FIG. 8B is a schematic cross-sectional view in the case where only the electrode material layer 16a2 is formed in the region where is formed.

The routing wiring 16a may be laminated in the region where the conductive member 22 is formed. In that case,
By reducing the diameter of the conductive particles 22a, the distance between the substrates in the vicinity of the conductive member 22 can be reduced.
Since the distance between the substrates can be made equal to 31b or the display area 30, the cell thickness of the liquid crystal cell can be made uniform.

Next, in FIG. 2, in the non-display area outside the display area 30, the routing wiring areas 31a, 31
The region excluding b and 32 (upper region in the figure) is set to 33,
The structure of this region 33 will be described. In this region 33, it is desirable to form a dummy wiring having the same structure as the lead wiring 16a on the substrate 11 in order to make the substrate spacing uniform. This region 33 is referred to as a dummy wiring region 33.

FIG. 9 is an enlarged schematic plan view showing the vicinity of the boundary between the dummy wiring region 33 and the display region 30. FIG.
3 is an enlarged plan view showing a region indicated by reference numeral 24 in FIG. In addition, the routing wiring 16a is connected to the routing wiring region 31.
FIGS. 3A and 3B are schematic cross-sectional views of the liquid crystal device 10 near the boundary between the dummy wiring region 33 and the display region 30 in the case where the lower side is composed of the electrode material layer 16a1 and the upper side is composed of the low resistance material layer 16a2. This is shown in FIG. FIG. 10 (a)
10 is a cross-sectional view when the liquid crystal device 10 is cut along the line D1-D1 ′ in FIG.

In the display area 30, the transparent electrodes 16 and 17 are formed on the substrate 11 and the counter substrate 12, while in the dummy wiring area 33, the transparent electrodes 16 and 17 are formed.
7 is not formed.

As shown in FIG. 10A, in the dummy wiring region 33, the substrate 11 has the same structure as the routing wiring 16a. The lower side is an electrode material layer 26a1, and the upper side is a low resistance material layer 26a2. Is formed. Further, it is desirable that the spacers 13 are also arranged in the dummy wiring regions 33.

In the dummy wiring region 33, the dummy wiring 2 having the same structure as the wiring 16a is formed on the substrate 11.
6a are formed, and the spacers 13 are also formed in the dummy wiring regions 33.
Is arranged, the distance between the substrates in the dummy wiring region 33 and the distance between the substrates in the display region 30 can be accurately equalized, so that the cell thickness of the liquid crystal cell can be made uniform.

In the wiring lines 31a and 31b, the lower side of the lower wiring layer 16a is the lower resistance material layer 16a.
2. When the upper side is formed of the electrode material layer 16a1, as shown in FIG. 10B, the dummy wiring region 33 has the same structure as the routing wiring 16a on the substrate 11, and the lower side has a low level. What is necessary is just to form the dummy wiring 26a which consists of the resistance material layer 26a2 and the electrode material layer 26a1 on the upper side.

In FIGS. 10A and 10B, the transparent electrode 16
And the dummy wiring 26a are not in contact with each other, but the present invention is not limited to this, and the transparent electrode 16 and the dummy wiring 26a may or may not be in contact with each other.

As described above, according to the present embodiment, the leading wiring 16a has a laminated structure of the electrode material layer 16a1 and the low resistance material layer 16a2, so that the leading wiring 16a is thinner than the transparent electrode 16. Therefore, the wiring areas 31a and 31b can be space-saving, crosstalk can be prevented, and a liquid crystal device having a wide display area 30 and excellent display quality can be provided.

As described above, according to the present embodiment, it is possible to make the substrate spacing in the routing wiring regions 31a, 31b, 32 and the dummy wiring region 33 exactly equal to the substrate spacing in the display region 30. Therefore, the cell thickness of the liquid crystal cell can be made uniform, and a liquid crystal device having excellent display quality can be provided.

Second Embodiment Next, a schematic structure of a simple matrix type liquid crystal (display) device 40 according to a second embodiment of the present invention will be described.

The schematic cross-sectional view of the liquid crystal device 40 is the same as that shown in FIG. 1 in the first embodiment, and a description thereof will be omitted.

FIGS. 11 and 12 are schematic plan views of the substrate 11 and the counter substrate 12 when viewed from the liquid crystal layer 15 side, respectively, and the structure of the liquid crystal device 40 will be described. In the liquid crystal device 40, the same components as those in the liquid crystal device 10 are denoted by the same reference numerals.

As shown in FIGS. 11 and 12, the display area 3
At one end of the transparent electrodes 16 and 17 formed at 0,
The routing wirings 46a and 47a are connected respectively.
The routing wires 46a and 47a are connected to the substrate 11 or the counter substrate 1.
2 is provided outside the display area 30 (that is, the non-display area).

As shown in FIG. 11, the lead-out wiring 46a is formed on the substrate 11 in two regions on the left and right sides of the display area 30 in the drawing. The area where the routing wiring 46a is formed is referred to as routing wiring areas 51a and 51b.

Also, as shown in FIG.
7 a is formed on the counter substrate 12 in a region below the display region 30 in the drawing. The area where the wiring 47a is formed is referred to as a wiring area 52.

The transparent electrodes 16 and 17 are connected to the external connection terminal via the wirings 46a and 47a, respectively.

As in the first embodiment, the transparent electrode 17 is connected to the upper electrode external connection terminal portion 20 via the wiring 47a.
It is connected to the. Further, the transparent electrode 16 is connected to the routing wiring 4.
6a, is connected to the lower electrode external connection terminal portion 21 via the conductive member 22.

FIG. 13 shows the transparent electrode 16 and the routing wiring 46.
FIG. 2 is a schematic plan view in which the vicinity of a boundary with a is enlarged. FIG.
3 is an enlarged plan view showing an area indicated by reference numeral 43 in FIG.

FIG. 14 (a) shows the state of the liquid crystal device 40.
FIG. 3 is a schematic cross-sectional view near a boundary between a transparent electrode 16 and a routing wiring 46a. FIG. 14A shows the liquid crystal device 40 shown in FIG.
FIG. 4 is a cross-sectional view taken along line A2-A2 ′ of FIG.

As shown in FIG. 14A, the routing wiring 46
a has a two-layer structure of an electrode material layer 46a1 made of the same material as the transparent electrode 16 and a low-resistance material layer 46a2 made of a material having a lower resistance than the transparent electrode 16, as in the first embodiment. The width of the electrode material layer 46a1 and the low resistance material layer 4
Although the width of 6a2 is shown as the same width in FIG. 14A, the present invention is not limited to this, and the width of the low resistance material layer 46a2 formed thereon is smaller than the width of the electrode material layer 46a1. Or it can be wide.

In FIG. 14A, the routing wiring 46a
The lower side is an electrode material layer 46a1 and the upper side is a low resistance material layer 4
However, the present invention is not limited to this, and the structure of the lead wiring 46a may be a laminated structure of the electrode material layer 46a1 and the low resistance material layer 46a2.
As shown in (b), the lower side may be composed of the low resistance material layer 46a2, and the upper side may be composed of the electrode material layer 46a1.

The width of the electrode material layer 46a1 and the low resistance material layer 4
Although the width of 6a2 is shown by the same width in FIG. 14B, the present invention is not limited to this, and the width of the electrode material layer 46a1 formed thereon is smaller than the width of the low resistance material layer 46a2. Or it can be wide.

The lead wiring 46a is connected to the electrode material layer 46a1.
And a low-resistance material layer 46a2 having a laminated structure,
The resistance value is reduced as compared with the related art in which the leading wiring 46a is made of only the electrode material. As shown in FIGS. 13, 14A and 14B, the line width of the leading wiring 46a is , 17
Can be made narrower than the width. Routing wiring area 51
In order to save the space of a and 51b, the wiring
The line width of 6a is desirably 10 μm or less.

Further, in the present embodiment, FIG.
As shown in (b), the electrode material layer 46 of the lead wiring 46a is formed.
It is desirable that the thickness of a1 is set to be the same as the thickness of the transparent electrode 16, and the thickness of the low-resistance material layer 46a2 and the thickness of the transparent electrode 17 are set to be substantially the same. Low resistance material layer 46a2
It is desirable to set the difference between the thickness of the transparent electrode 17 and the thickness of the transparent electrode 17 to 0.05 μm or less. In addition, the routing wiring area 51
a, 51b, the transparent electrode 17
Is not formed.

It is desirable that the spacers 13 are arranged in both the display area 30 and the wiring areas 51a and 51b. These spacers 13 may be formed in a column shape by a photosensitive resin.

Next, the structures of the wiring 47a and the wiring area 52 will be described. FIG. 15A is a schematic cross-sectional view of the liquid crystal device 40 near the boundary between the transparent electrode 17 and the routing wiring 47a. FIG. 15A shows the liquid crystal device 4.
FIG. 13 is a cross-sectional view taken along line B2-B2 ′ of FIG.

As shown in FIG. 15A, in order to save the space of the routing wiring area 52 and to prevent the crosstalk of the routing wiring 47a, the routing wiring 47a is also similar to the routing wiring 46a. It is desirable to have a laminated structure of an electrode material layer 47a1 made of the same material as the transparent electrode 17 and a low resistance material layer 47a2 made of a material having a lower resistance than the transparent electrode 17.

The width of the electrode material layer 47a1 and the low resistance material layer 4
The width of 7a2 may be the same, or the width of the low resistance material layer 47a2 formed thereon may be smaller or larger than the width of the electrode material layer 47a1.

In FIG. 15 (a), the routing wiring 47a
The lower side is an electrode material layer 47a1 and the upper side is a low resistance material layer 4
However, the present invention is not limited to this, and the structure of the routing wiring 47a may be a laminated structure of the electrode material layer 47a1 and the low resistance material layer 47a2.
As shown in (b), the lower side may be composed of the low resistance material layer 47a2, and the upper side may be composed of the electrode material layer 47a1.

In this case, even if the width of the electrode material layer 47a1 and the width of the low resistance material layer 47a2 are the same, or the width of the electrode material layer 47a1 formed thereon is equal to the width of the low resistance material layer 47a2. It may be narrower or wider.

The leading wiring 47a is connected to the electrode material layer 47a1.
And a low-resistance material layer 47a2 having a laminated structure,
The resistance value is reduced as compared with the related art in which the leading wiring 47a is made of only the electrode material. Like the leading wiring 46a, the line width of the leading wiring 47a can be smaller than the width of the transparent electrodes 16 and 17. it can. In order to save space in the routing wiring region 52 and to prevent crosstalk, it is preferable that the line width of the routing wiring 47a be 10 μm or less.

Further, as shown in FIGS. 15A and 15B, the thickness of the electrode material layer 47a1 of the lead-out wiring 47a is changed to the thickness of the transparent electrode 1a.
7 and the thickness of the low-resistance material layer 47a2 and the thickness of the transparent electrode 16 are desirably set to be the same. It is desirable to set the difference between the thickness of the low-resistance material layer 47a2 and the thickness of the transparent electrode 16 to 0.05 μm or less.
Further, it is desirable that the transparent electrode 16 is not formed on the substrate 11 in the routing wiring area 52.

It is desirable that the spacers 13 are arranged in both the display area 30 and the wiring area 52.

By forming the routing wiring regions 51a, 51b, 52 as shown in FIGS. 14 (a), (b), 15 (a), (b), the routing wiring regions 51a, 51b, Since the substrate interval in 52 can be made exactly equal to the substrate interval in the display area 30, the cell thickness of the liquid crystal cell can be made uniform.

Next, the structure near the conductive member 22 will be described. In order to equalize the distance between the substrates in the vicinity of the conductive member 22, as in the first embodiment, the routing wiring 46a
In the region where the conductive member 22 is formed, the layer may be formed of any one of the electrode material layer 46a1 and the low-resistance material layer 46a2, or may be laminated.

FIGS. 7A, 7B, 8A, 8A, and 8B are schematic cross-sectional views of the liquid crystal device 40 taken along the line C2-C2 'in FIG. Since the structure is the same as that shown in b), the description is omitted.

In this embodiment, the external connection terminal 21 may have a laminated structure having the same thickness as the routing wiring 46a outside the conductive member 22.
The external connection terminal portion having a laminated structure is denoted by 41.

As an example, in the lead-out wiring regions 51a and 51b, the lead-out wiring 46a is located under the electrode material layer 46a.
FIG. 16 shows the case where the electrode material layer 46a1 is formed on the upper side of the low resistance material layer 46a2 and the conductive member 22 is formed on the upper side.

As shown in FIG. 16, the external connection terminal 4
Reference numeral 1 denotes an external connection terminal portion lower layer 41A having the same thickness as the transparent electrode 17 in a region where the conductive member 22 is formed.
The external connection terminal portion lower layer 41A and the external connection terminal portion upper layer 41B have a laminated structure. Further, the external connection terminal portion 41 may be stacked in a region where the conductive member 22 is formed.

Next, in FIG. 11, in the non-display area outside the display area 30, the routing wiring areas 51a and 51a
The region excluding b and 52 (upper region in the figure) is 53,
The structure of this region 53 will be described.

In the region 53, the substrate 11 or the opposing substrate 12 is formed in the same manner as in the first embodiment in order to equalize the distance between the substrates.
It is desirable to form a dummy wiring having the same structure as the leading wiring 46a or 47a. This area 53
Are dummy wiring regions 53.

A schematic plan view enlarging an area indicated by reference numeral 44 in FIG. 11 is the same as the structure shown in FIG. 9 in the first embodiment, and therefore will not be described.

In the case where dummy wiring is provided on the substrate 11 in the dummy wiring region 53, the schematic cross-sectional view of the liquid crystal device 40 taken along the line D2-D2 'of FIG. 12 is shown in FIG. Since the structure is the same as that shown in (a) and (b), the description is omitted.

In the dummy electrode region 53, the opposite substrate 1
The case where a dummy wiring is provided on the second will be described.

In FIG. 17 (a), the leading wiring 47a is located on the lower side in the leading wiring region 52 in the electrode material layer 47a.
1 is a schematic cross-sectional view when the liquid crystal device 40 is cut along the line D2-D2 ′ in FIG. 12 when the upper side is made of the low-resistance material layer 47a2.

As shown in FIG. 17A, a dummy wiring 57a having the same structure as the wiring 47a is formed on the counter substrate 12 in the dummy electrode region 53.
That is, the lower side of the dummy wiring 57a is the electrode material layer 57a.
1. The upper side is made of a low-resistance material layer 57a2. In the dummy wiring region 53, the transparent electrode 16
Is not formed. The spacer 13 is also arranged in the dummy wiring region 53.

In the case where the leading wiring 47a is formed of the low resistance material layer 47a2 on the lower side and the electrode material layer 47a1 on the upper side in the leading wiring area 52, FIG.
As shown in (b), a dummy wiring 57a having the same structure as the routing wiring 47a may be formed on the counter substrate 12 in the dummy wiring area 53. That is, the dummy wiring 57a having the lower resistance material layer 57a2 on the lower side and the electrode material layer 57a1 on the upper side may be formed.

In FIGS. 17A and 17B, the transparent electrode 17 is shown.
And the dummy wiring 57a are in contact, but the present invention is not limited to this, and the transparent electrode 17 and the dummy wiring 57a may or may not be in contact.

By making the dummy wiring region 53 have a structure as shown in FIGS. 10A, 10B, 17A and 17B, the substrate spacing in the dummy wiring region 53 can Since the intervals can be made exactly equal, the cell thickness of the liquid crystal cell can be made uniform.

As described above, according to the present embodiment, the lead wirings 46a and 47a are connected to the electrode material layers 46a1 and 46a1.
With the two-layer structure of 47a1 and the low-resistance material layers 46a2, 47a2, the lead wirings 46a, 47a can be made thinner than the transparent electrodes 16, 17, so that the lead wiring regions 51a, 51b, 52 are omitted. It is possible to provide a liquid crystal device which is space-saving, prevents crosstalk between the routing wirings 46a and 47a, has a wide display area 30, and has excellent display quality.

As described above, according to the present embodiment, it is possible to make the substrate spacing in the routing wiring regions 51a, 51b, 52 and the dummy wiring region 53 exactly equal to the substrate spacing in the display region 30. Therefore, the cell thickness of the liquid crystal cell can be made uniform, and a liquid crystal device having excellent display quality can be provided.

Third Embodiment Next, a TFD (Thin Film) according to a third embodiment of the present invention will be described.
A structure of a liquid crystal (display) device 60 using a diode element will be described. In the liquid crystal device 60, the same components as those in the liquid crystal device 10 are denoted by the same reference numerals.

FIG. 18 is a perspective view of a part of the liquid crystal device 60 in the display area 30, and the schematic structure will be described. In the liquid crystal device 60, an element substrate (lower substrate) 61 provided with a TFD element and the like and a color filter substrate (upper substrate) 62 provided with a color filter layer and the like are shown at the periphery of each substrate. A liquid crystal layer 15 is sealed between the element substrate 61 and the color filter substrate 62 at a predetermined interval via a sealing material 14 which is omitted.

On the color filter substrate 62, a color filter layer 66 composed of a color pixel 66a and a light shielding layer (black matrix) 66b is formed. The color pixels 66a are formed by a coloring material method, a dyeing method, a transfer method, a printing method, and the like. For example, R (red), G (green), B
Three colors (blue) are arranged in a predetermined pattern. Also,
The light-shielding layer 66b is formed at a place where the color pixel 66a is not formed, and is made of a metal such as chrome, a color resist in which a black pigment is dispersed, or the like.

On the color filter layer 66, a protective layer (not shown) made of an organic film or the like for protecting the color filter layer 66 is formed. On the protective layer, a transparent conductive material such as ITO is formed in a strip shape. Electrode 6 made of conductive oxide
7 are formed.

On the surface of the element substrate 61, a pixel electrode 63 made of a transparent conductive oxide such as ITO is disposed at a position corresponding to each pixel, and a TFD element 64 for driving the pixel electrode 63 is provided at each position. It is arranged for each pixel electrode 63. A plurality of scanning lines 65 are provided on the surface of the element substrate 61 so as to be orthogonal to the transparent electrodes 67 arranged on the color filter substrate 62.
It is connected to the.

An alignment film for aligning liquid crystal is formed on the pixel electrode 63 and the transparent electrode 67, but is omitted in the drawing. Further, between the element substrate 61 and the color filter substrate 62, a spherical spacer 23 made of silicon dioxide, polystyrene, divinylbenzene, or the like for uniforming the cell thickness of the liquid crystal cell is arranged. Omitted. Further, a retardation plate and a polarizing plate are provided outside the element substrate 61 and the color filter substrate 62, but are omitted in the drawing.

FIG. 19 is a schematic plan view when the liquid crystal device 60 is viewed from above the color filter substrate 62, and the planar structure of the liquid crystal device 60 will be described.

Outside the display area 30, the element substrate 6
1. The sealing material 14 is formed between the peripheral edges of the color filter substrate 62, but is omitted in the drawing for simplicity.

As shown in FIG. 19, leading lines 65a and 67a are connected to one end of the scanning line 65 and the transparent electrode 67 formed in the display area 30, respectively. The routing wirings 65 a and 67 a are provided outside the display area 30 (that is, a non-display area) on the element substrate 61 or the color filter substrate 62.

As shown in FIG. 19, the routing wiring 65a is formed on the element substrate 61 in two regions on the left and right sides of the display region 30 in the drawing. Routing wiring 65
The area where a is formed is referred to as wiring areas 71a and 71b.

Also, as shown in FIG.
Reference numeral 7a is formed on the color filter substrate 62 in an area below the display area 30 in the drawing. Routing wiring 6
The area where 7a is formed is referred to as a wiring area 72.

The scanning line 65 and the transparent electrode 67 are connected to the external connection terminal via the wirings 65a and 67a, respectively.

As in the first embodiment, the transparent electrode 67 is connected to the external connection terminal section 20 through the routing wiring 67a. Further, the scanning line 65 is connected to the external connection terminal 21 via the routing wiring 65 a and the conductive member 22.

Also in the present embodiment, the routing wiring 16a in the first embodiment and the routing wiring 46 in the second embodiment are used.
Similarly to a, the lead wiring 65a has a laminated structure of an electrode material layer and a low resistance material layer. The routing wiring area 71b (7
The structure of 1a) is the same as that of the first and second embodiments shown in FIG.
(a), (b), the routing wiring area 31 shown in FIGS. 14 (a), (b)
Since the structure is the same as the structure of b or 51b, the description is omitted.
In addition, it is desirable that the routing wiring 67a also has a laminated structure of an electrode material layer and a low resistance material layer. In the second embodiment, the structure of the wiring area 72 is the same as the structure of the wiring area 52 shown in FIGS.

In the first and second embodiments, the structure near the conductive member 22 is the same as that shown in FIGS. 7 (a), 7 (b), 8 (a), and 8 (a).
(b) Since the structure is the same as that shown in FIG. 16, the description is omitted.

In FIG. 19, in the non-display area outside the display area 30, the routing wiring areas 71a and 71
Assuming that the region excluding b and 72 (upper region in the drawing) is 73, this region 73 has the same structure as the lead wiring 65a or 67a on one substrate as in the first and second embodiments. It is desirable to provide a dummy wiring having the same. If this region 73 is a dummy wiring region 73, the dummy wiring region 7
In the first and second embodiments, the structure of FIG.
(a), (b), dummy wiring region 3 shown in FIGS. 17 (a), (b)
Since the structure is the same as that of 3 or 53, the description is omitted.

As described above, the present invention can be applied to a liquid crystal device using a TFD element, and the wirings 65a and 67a have a laminated structure of an electrode material layer and a low-resistance material layer. Since the leading wirings 65a and 67a can be made thinner than the scanning lines 65 and the transparent electrodes 67,
It is possible to provide a liquid crystal device having a large display area 30 and excellent display quality, in which the wiring areas 71a, 71b, and 72 can save space and prevent crosstalk.

Also in this embodiment, the substrate spacing in the routing wiring regions 71a, 71b, 72 and the dummy wiring region 73 can be made equal to the substrate spacing in the display region 30, so that the cell thickness of the liquid crystal cell can be made uniform. Can be
A liquid crystal device with excellent display quality can be provided.

In the first to third embodiments, the wirings 16a, 46a, 47a, 65a, and 67a have been described as having a two-layer structure of an electrode material layer and a low-resistance material layer. However, the present invention is not limited to this, and any structure may be used as long as it has a laminated structure of an electrode material layer and a low-resistance material layer. However, since the distance between the substrates can be made uniform, the leading wiring 16
It is desirable that a, 46a, 47a, 65a, and 67a have a two-layer structure of an electrode material layer and a low-resistance material layer.

In the first to third embodiments, the case where the electrodes 16, 17, 63, and 67 are made of a transparent conductive oxide has been described. However, the present invention is not limited to this. The present invention can also be applied to the case where 16 and 63 are reflective electrodes made of aluminum, silver, or the like.
However, when the electrodes 16 and 63 are made of aluminum, silver, or the like, the resistance value of aluminum, silver, or the like is low, and the wirings 16a, 46a, and 65a do not have a laminated structure.
Even when only the electrode material layer is used, the wiring 16
The line widths of a, 46a, and 65a can be reduced. Therefore, the present invention is particularly effective when the electrodes 16, 17, 63, 67 are made of a transparent conductive oxide.

Next, a specific example of an electronic apparatus including any one of the liquid crystal devices 10, 40, and 60 according to the first to third embodiments will be described.

FIG. 20A is a perspective view showing an example of a mobile phone. In FIG. 20A, reference numeral 200 denotes a mobile phone main body, and reference numeral 201 denotes a liquid crystal display unit including any one of the liquid crystal devices 10, 40, and 60.

FIG. 20B is a perspective view showing an example of a portable information processing device such as a word processor or a personal computer. FIG.
In FIG. 0 (b), reference numeral 300 denotes an information processing device, 301 denotes an input unit such as a keyboard, 303 denotes an information processing main body, and 302 denotes a liquid crystal display unit including any of the liquid crystal devices 10, 40, and 60. .

FIG. 20C is a perspective view showing an example of a wristwatch-type electronic device. In FIG. 20C, reference numeral 400 denotes a watch main body, and reference numeral 401 denotes the liquid crystal devices 10, 40, 6 described above.
0 shows a liquid crystal display unit provided with any one of 0.

Each of the electronic devices shown in FIGS. 20 (a) to 20 (c) is provided with any one of the above-described liquid crystal devices 10, 40, and 60, and thus has excellent display quality.

[0151]

As described above, according to the present invention, the leading wiring formed on at least one of the substrates has a laminated structure of the electrode material layer and the low-resistance material layer, whereby the leading wiring can be formed. Since at least a part of the line width can be made smaller than the width of the electrode, a liquid crystal device which has a small wiring area, prevents crosstalk, has a wide display area, and has excellent display quality is provided. be able to.

Further, a lead wiring having a laminated structure has a laminated structure of an electrode material layer and a low-resistance material layer, and is provided on a substrate facing a substrate on which the lead wiring is formed in a lead wiring region. Without forming an electrode, the thickness of the electrode material layer,
The thickness of the electrode on the substrate on which the routing wiring is formed is set to be the same, and the thickness of the low-resistance material layer and the thickness of the electrode on the substrate facing the substrate on which the routing wiring is formed. Is set to be the same, and the spacers are preferably arranged in both the display area and the wiring area.

In addition, outside the display region and in a region where the routing wiring is not formed, a dummy wiring having a laminated structure of an electrode material layer and a low resistance material layer is arranged on one substrate, and the dummy wiring is formed. In the formed dummy wiring region, it is preferable that an electrode is not formed on the substrate, and that a spacer is also provided in the dummy wiring region.

By adopting such a structure, the distance between the substrates can be made uniform, and a liquid crystal device having excellent display quality can be provided.

Further, the provision of the liquid crystal device of the present invention makes it possible to provide an electronic device having excellent display quality.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing the structure of a simple matrix type liquid crystal device according to a first embodiment of the present invention.

FIG. 2 is a schematic plan view of a lower substrate of a simple matrix type liquid crystal device according to a first embodiment of the present invention when viewed from a liquid crystal layer side.

FIG. 3 is a schematic plan view when the upper substrate of the simple matrix type liquid crystal device according to the first embodiment of the present invention is viewed from the liquid crystal layer side.

FIG. 4 is an enlarged schematic plan view showing a region indicated by reference numeral 23 in FIG.

5 (a) and 5 (b) show a simple matrix type liquid crystal device according to the first embodiment of the present invention in A1-A of FIG.
FIG. 3 is a schematic cross-sectional view when cut along the line 1 ′.

FIG. 6 is a schematic cross-sectional view of the simple matrix type liquid crystal device according to the first embodiment of the present invention, taken along the line B1-B1 ′ in FIG.

7 (a) and 7 (b) show a simple matrix type liquid crystal device according to a first embodiment of the present invention in FIG.
FIG. 3 shows a schematic cross-sectional view taken along the line 1 ′.

8 (a) and 8 (b) show a simple matrix type liquid crystal device according to the first embodiment of the present invention.
FIG. 3 shows a schematic cross-sectional view taken along the line 1 ′.

FIG. 9 is a schematic plan view showing an area indicated by reference numeral 24 in FIG. 2 in an enlarged manner.

10 (a) and (b) show a simple matrix type liquid crystal device according to a first embodiment of the present invention in FIG.
FIG. 14 is a schematic cross-sectional view when cut along the line −D1 ′.

FIG. 11 is a schematic plan view when a lower substrate of a simple matrix type liquid crystal device according to a second embodiment of the present invention is viewed from a liquid crystal layer side.

FIG. 12 is a schematic plan view of an upper substrate of a simple matrix type liquid crystal device according to a second embodiment of the present invention when viewed from the liquid crystal layer side.

FIG. 13 is a schematic plan view showing a region indicated by reference numeral 43 in FIG. 11 in an enlarged manner.

FIGS. 14 (a) and (b) show a simple matrix type liquid crystal device according to a second embodiment of the present invention in FIG.
FIG. 4 is a schematic cross-sectional view when cut along the line 2-A2 ′.

FIGS. 15A and 15B show a simple matrix type liquid crystal device according to a second embodiment of the present invention in FIG.
FIG. 4 is a schematic cross-sectional view when cut along the line 2-B2 ′.

FIG. 16 shows a simple matrix type liquid crystal device according to a second embodiment of the present invention.
It is an example of the schematic sectional drawing when it cut | disconnected along the 2 'line.

FIGS. 17A and 17B show a simple matrix type liquid crystal device according to a second embodiment of the present invention in FIG.
It is an example of the schematic sectional drawing when cut | disconnected along 2-D2 'line.

FIG. 18 is a diagram showing T in the third embodiment according to the present invention.
FIG. 3 is a perspective view showing a part of a liquid crystal device using an FD element.

FIG. 19 is a view showing T of the third embodiment according to the present invention;
FIG. 3 is a schematic plan view when a liquid crystal device using an FD element is viewed from above a color filter substrate.

20A is a diagram illustrating an example of a mobile phone including the liquid crystal device according to the embodiment, and FIG. 20B is a diagram illustrating a portable information processing device including the liquid crystal device according to the embodiment. FIG. 20C is a diagram illustrating an example of a wristwatch-type electronic device including the liquid crystal device according to the embodiment.

FIG. 21 is a schematic cross-sectional view showing the structure of a general simple matrix type liquid crystal device.

FIG. 22 is a schematic plan view when a lower substrate of a general simple matrix type liquid crystal device is viewed from a liquid crystal layer side.

FIG. 23 is a schematic plan view of an upper substrate of a general simple matrix type liquid crystal device when viewed from the liquid crystal layer side.

24 is an enlarged schematic plan view showing a region indicated by reference numeral 113 in FIG.

[Explanation of symbols]

10, 40, 60 Liquid crystal (display) device 11 Substrate (lower substrate) 12 Opposite substrate (upper substrate) 61 Element substrate (lower substrate) 62 Color filter substrate (upper substrate) 13 Spacer 14 Sealant 15 Liquid crystal layer 16, 17, 67 Transparent electrode 63 Pixel electrode 64 TFD element 65 Scanning line 66 Color filter layer 66a Color pixel 66b Light shielding layer (black matrix) 16a, 17a, 46a, 47a Leading wiring 65a, 67a Leading wiring 16a1, 46a1, 47a1 Electrode Material layer 16a2, 46a2, 47a2 Low resistance material layer 16A Dummy electrode 20, 21, 41 Terminal part for external connection 22 Conduction member 22a Conduction particle 26a, 57a Dummy wiring 26a1, 57a1 Electrode material layer 26a2, 57a2 Low resistance material layer 30 Regions 31a, 31b 32 lead wirings regions 51a, 51b, 52 lead wirings regions 71a, 71b, 72 lead wirings regions 33,53,73 dummy wiring region

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification code FI Theme coat ゛ (Reference) G09F 9/30 343 G09F 9/30 343Z F term (Reference) 2H089 LA14 LA16 QA11 2H092 GA33 GA34 HA04 HA12 NA25 NA28 PA03 5C094 AA02 AA09 AA60 BA43 CA19 DA07 EA05 EA10 EB02 EC03 ED02 HA03 HA08 5G435 AA00 AA01 BB12 EE47 KK05 KK09 LL07 LL08 LL10

Claims (14)

[Claims] 1. A liquid crystal device comprising: a liquid crystal layer sandwiched between two opposing substrates having at least a plurality of electrodes formed on an inner surface thereof; and a number of spacers disposed between the two substrates. The electrodes are formed in a display area on the substrate, and the electrodes are connected to routing wires formed outside the display area, and are formed on at least one of the two substrates The routing wiring has a laminated structure of an electrode material layer made of the same material as the electrode and a low-resistance material layer made of a material having a lower resistance than the electrode, and the line width of at least a part of the routing wiring is the A liquid crystal device characterized in that the width is smaller than the width of the electrode. 2. The liquid crystal device according to claim 1, wherein a line width of at least a part of the routing wiring having the laminated structure is 10 μm or less. 3. The wiring having the laminated structure includes the electrode material layer and the low-resistance material layer, and the thickness of the electrode material layer and the thickness of the wiring on the substrate on which the wiring is formed. The thickness of the electrode is the same, and the thickness of the low-resistance material layer is substantially the same as the thickness of the electrode on the other substrate facing the substrate on which the wiring is formed. 3. The liquid crystal device according to claim 1, wherein: 4. The difference between the thickness of the low-resistance material layer and the thickness of the electrode on the other substrate facing the substrate on which the lead-out wiring is formed is 0.05 μm or less. The liquid crystal device according to claim 3, wherein: 5. The semiconductor device according to claim 3, wherein the electrode is not provided on the other substrate facing the wiring area where the wiring having the stacked structure is formed. The liquid crystal device according to the above. 6. The liquid crystal device according to claim 5, wherein the spacer is disposed in both the display area and the wiring area. 7. The method according to claim 1, wherein the electrode is made of a transparent conductive oxide.
The liquid crystal device according to the item. 8. An external connection terminal portion is provided only on the one substrate, and the electrode formed on the substrate is connected to the external connection terminal via the leading wiring connected to the electrode. The electrode formed on the other substrate is connected to the external connection via the lead-out wiring connected to the electrode and a conductive member disposed between the two substrates. The liquid crystal device according to claim 1, wherein the liquid crystal device is connected to a terminal unit. 9. The wiring according to claim 1, wherein at least the wiring connected to the conductive member has the laminated structure, and a line width of at least a part of the wiring is smaller than a width of the electrode. 9. The liquid crystal device according to 8. 10. A dummy wiring formed of the laminated structure of the electrode material layer and the low resistance material layer on the one substrate in a region outside the display region and where the routing wiring is not formed. The liquid crystal device according to any one of claims 1 to 9, wherein 11. The dummy wiring comprises the electrode material layer and the low resistance material layer, and the thickness of the electrode material layer is the same as the thickness of the electrode on the substrate on which the dummy wiring is formed. 11. The film thickness of the low-resistance material layer is equal to the film thickness of the electrode on the other substrate facing the substrate on which the dummy wiring is formed. The liquid crystal device according to the above. 12. The liquid crystal device according to claim 11, wherein the electrode is not provided on the other substrate facing the dummy wiring region where the dummy wiring is formed. 13. The liquid crystal device according to claim 12, wherein the spacer is disposed in the dummy wiring region. 14. An electronic apparatus comprising the liquid crystal device according to claim 1. Description: