JP2001234324A - Method for passivation treatment of metal surface - Google Patents

Method for passivation treatment of metal surface

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Publication number
JP2001234324A
JP2001234324A JP2000048999A JP2000048999A JP2001234324A JP 2001234324 A JP2001234324 A JP 2001234324A JP 2000048999 A JP2000048999 A JP 2000048999A JP 2000048999 A JP2000048999 A JP 2000048999A JP 2001234324 A JP2001234324 A JP 2001234324A
Authority
JP
Japan
Prior art keywords
metal surface
ozone gas
ozone
concentration
vol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000048999A
Other languages
Japanese (ja)
Other versions
JP4505097B2 (en
Inventor
Kunihiko Koike
国彦 小池
Goichi Inoue
吾一 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Iwatani International Corp
Original Assignee
Iwatani International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Iwatani International Corp filed Critical Iwatani International Corp
Priority to JP2000048999A priority Critical patent/JP4505097B2/en
Publication of JP2001234324A publication Critical patent/JP2001234324A/en
Application granted granted Critical
Publication of JP4505097B2 publication Critical patent/JP4505097B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Treatment Of Metals (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for passivation treatment of a metal surface, having no effect on a corrosion-resistant and non-heat-resistant packing and excellent in workability. SOLUTION: Gaseous ozone of 10-50 vol.% gaseous ozone concentration is allowed to act on a metal surface at 60-150 deg.C to apply passivation treatment to the metal surface.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体製造設備や
バイオ・医薬品原料製造設備等の清浄流体を必要とする
設備で使用される金属表面の表面処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating a metal surface used in a facility requiring a clean fluid, such as a semiconductor production facility or a bio-pharmaceutical raw material production facility.

【0002】[0002]

【従来の技術】近年、半導体製造製造業界では、電子部
品の高集積化、高性能化が進み、最小加工寸法がサブミ
クロンオーダーの超LSIが製造されるようになってい
る。このような現状では、半導体等の電子部品の製造に
使用原料の高純度化は勿論、原料となるガスの供給系を
構成している機器や配管などから混入する微細な粒子
(不純物)や部材表面から放出されるガス状不純物も問題
になる。そこで、この種の設備での配管路や機器類を構
成している金属表面に酸化不動態膜を形成して金属表面
からの不純物の放出を抑制するようにしたものが提案さ
れている。
2. Description of the Related Art In recent years, in the semiconductor manufacturing and manufacturing industry, the integration and performance of electronic components have advanced, and ultra LSIs with a minimum processing dimension of the order of submicrons have been manufactured. Under these circumstances, the raw materials used in the production of electronic components such as semiconductors are not only highly purified, but also fine particles mixed in from the equipment and piping that constitute the gas supply system as raw materials.
(Impurities) and gaseous impurities released from the member surface also pose problems. Therefore, there has been proposed an apparatus in which an oxidation passivation film is formed on a metal surface constituting a piping or equipment in such a facility so as to suppress the release of impurities from the metal surface.

【0003】従来、金属表面に酸化不動態膜を形成する
技術として、例えば特開平5−287496号公報や、
特開平9−195031号に示されたものがある。前者
のものは、オゾン含有量が0.5〜10vol%の乾燥酸素
雰囲気中で150〜300℃の温度条件によりステンレ
ス鋼の表面に酸化不動態膜を形成するようにしており、
後者のものは、オゾンガス濃度が50%以上(残り酸素)
の高濃度オゾンガスを機器や配管内に封入して金属表面
に酸化不動態膜を形成するようにしている。
Conventionally, techniques for forming an oxide passivation film on a metal surface include, for example, Japanese Patent Application Laid-Open No. 5-287496,
There is one disclosed in Japanese Patent Application Laid-Open No. 9-195031. In the former, an oxidation passivation film is formed on the surface of stainless steel under a temperature condition of 150 to 300 ° C. in a dry oxygen atmosphere having an ozone content of 0.5 to 10 vol%,
The latter one has an ozone gas concentration of 50% or more (remaining oxygen)
High-concentration ozone gas is enclosed in equipment and piping to form an oxide passivation film on the metal surface.

【0004】[0004]

【発明が解決しようとする課題】10vol%以下のオゾ
ンガスを使用して不動態膜を形成する前記従来のもので
は、処理温度を150〜300℃という温度に設定して
いるが、この温度領域はシリコンパッキン等の耐食性を
持つ非耐熱材料含む装置には適用できないという問題が
あった。また、150〜300℃という比較的高温に加
熱しなければならないことから、機器や配管等を加熱す
るための加熱炉等の加熱装置が大型化するという問題が
あった。
In the prior art in which a passivation film is formed using ozone gas of 10 vol% or less, the processing temperature is set to a temperature of 150 to 300 ° C., but this temperature range is There is a problem that it cannot be applied to a device including a non-heat resistant material having corrosion resistance such as silicon packing. In addition, since heating must be performed to a relatively high temperature of 150 to 300 ° C., there is a problem that a heating device such as a heating furnace for heating equipment, piping, and the like becomes large.

【0005】一方、50vol%(残り酸素)以上の高濃度
オゾンを使用する後者のものでは、オゾンの特性上高温
で処理することができないことから処理時間をかけなけ
ればならず、作業性の面でやや劣るきらいがあった。
On the other hand, the latter using high concentration ozone of 50 vol% or more (remaining oxygen) cannot be processed at a high temperature due to the characteristics of ozone. There was a little inferior.

【0006】本発明は、このような点に着目して、耐食
性を有するが非耐熱性であるパッキンに影響を与えない
で作業性に優れた配管路やオゾンガス使用設備等や、機
器類の金属表面の不動態化処理方法を提供することを目
的とする。
In view of the above, the present invention focuses on such points as pipes and equipment using ozone gas, which have excellent workability without affecting the corrosion-resistant but non-heat-resistant packing, and the metal of equipment. It is an object of the present invention to provide a method for passivating a surface.

【0007】[0007]

【課題を解決するための手段】上述の目的を達成するた
めに本発明は、オゾンガス濃度が10〜50vol%(残り
酸素)のオゾンガスを60〜150℃の温度範囲で金属
表面に作用させて、金属表面を不動態化処理するように
構成したことを特徴としている。
According to the present invention, an ozone gas having an ozone gas concentration of 10 to 50 vol% (remaining oxygen) is allowed to act on a metal surface in a temperature range of 60 to 150 ° C. The present invention is characterized in that a passivation treatment is performed on a metal surface.

【0008】[0008]

【発明の作用】本発明では、60〜150℃という比較
的低温の加熱状態でオゾンガス濃度が10〜50vol%
(残り酸素)のオゾンガスを作用させるようにしているこ
とから、パッキンに熱影響を与えることがないうえ、加
熱装置も電気ヒータ程度の簡単な装置でよい。また、オ
ゾンガス濃度が10〜50vol%(残り酸素)のオゾンガ
スであれば150℃以下という比較的低温加熱状態で使
用することが可能となり、金属表面との反応性が高ま
り、作業性も向上する。
According to the present invention, the ozone gas concentration is 10 to 50% by volume in a heating state at a relatively low temperature of 60 to 150 ° C.
Since the (remaining oxygen) ozone gas is applied, the packing does not have a thermal effect, and the heating device may be a simple device such as an electric heater. In addition, if the ozone gas concentration is 10 to 50 vol% (remaining oxygen), the ozone gas can be used in a relatively low temperature heating state of 150 ° C. or less, the reactivity with the metal surface is increased, and the workability is improved.

【0009】[0009]

【発明の実施の形態】SUS316L電解研磨管を試料
として、その内面にオゾンガス濃度を変更するととも
に、加熱温度を変化させた状態でオゾンガスを60分間
流通させ、その内面に酸化不動態膜を形成し、酸化不動
態膜を形成した試料を0.3MPa、100%の塩化水素ガ
スに6日間暴露させた後、純水中に浸漬して、溶出金属
量を検出した。その結果を図1に示す。
BEST MODE FOR CARRYING OUT THE INVENTION Using a SUS316L electropolishing tube as a sample, the ozone gas concentration is changed on the inner surface thereof, and the ozone gas is circulated for 60 minutes while the heating temperature is changed to form an oxidation passivation film on the inner surface. The sample on which the oxidation passivation film was formed was exposed to 0.3 MPa, 100% hydrogen chloride gas for 6 days, and then immersed in pure water to detect the amount of eluted metal. The result is shown in FIG.

【0010】図1からわかるように、加熱温度が低いほ
ど溶出金属量が多く、また、同じ温度の場合には、オゾ
ン濃度が低いほど溶出金属量が増加することがわかる。
そして、加熱温度が100℃と150℃の場合にはオゾ
ン濃度が10vol%よりも高い場合には、溶出量がほぼ
一定となる。そして、加熱温度が50℃よりも低い、い
わゆる常温領域では、オゾンが十分反応せず、安定した
金属酸化膜が十分な厚みで形成されていないと判断され
る。ここでオゾン濃度は酸素中のオゾン濃度である。
As can be seen from FIG. 1, the lower the heating temperature, the larger the amount of eluted metal, and at the same temperature, the lower the ozone concentration, the higher the amount of eluted metal.
When the heating temperature is 100 ° C. and 150 ° C., the elution amount is substantially constant when the ozone concentration is higher than 10 vol%. Then, in a so-called normal temperature region where the heating temperature is lower than 50 ° C., ozone does not sufficiently react, and it is determined that a stable metal oxide film is not formed with a sufficient thickness. Here, the ozone concentration is the ozone concentration in oxygen.

【0011】図2は大気圧下でのオゾン濃度と爆発危険
性を示す図であり、オゾン濃度(残りは酸素)を変化させ
たオゾンガスを加熱ステージに300SCCMで照射したと
きに分解爆発が発生するか否かを調べたものである。
FIG. 2 is a diagram showing the ozone concentration under atmospheric pressure and the danger of explosion. When an ozone gas having a changed ozone concentration (the rest is oxygen) is irradiated to a heating stage at 300 SCCM, a decomposition explosion occurs. It is checked whether or not.

【0012】図2からわかるように150℃以下の温度
範囲では、オゾンガス濃度50vol%以下では分解爆発
が発生することはなく安心して作業することができる。
なお、オゾンガス濃度が10vol%よりも低い場合に
は、400℃以下の温度範囲では分解爆発は起こらな
い。
As can be seen from FIG. 2, in a temperature range of 150 ° C. or less, an ozone gas concentration of 50 vol.
When the ozone gas concentration is lower than 10 vol%, no decomposition explosion occurs in a temperature range of 400 ° C. or lower.

【0013】以上の結果、オゾン濃度(残り酸素)10〜
50vol%、望ましくは20から30vol%のオゾンガス
を温度範囲60〜150℃の温度範囲で金属表面に作用
させることにより、安定した酸化不動態膜を形成するこ
とができることがわかる。
As a result, the ozone concentration (remaining oxygen) is 10 to
It can be seen that a stable oxidation passivation film can be formed by applying 50 vol%, desirably 20 to 30 vol% of ozone gas to the metal surface in a temperature range of 60 to 150 ° C.

【0014】上記の実施態様では、非処理材料としてS
US316Lの電解研磨管を使用したが、本発明は表面
粗度や材質を選ぶことなく金属全般に応用することがで
きる。なお、本発明では配管系を、配管路だけなく、オ
ゾンガス貯蔵設備からオゾンガス使用設備までの間の機
器類も包含する概念で使用している。
In the above embodiment, the untreated material is S
Although a US316L electropolishing tube was used, the present invention can be applied to all metals without choosing the surface roughness or material. In the present invention, the piping system is used in a concept that includes not only piping, but also equipment between the ozone gas storage facility and the ozone gas use facility.

【0015】また、本発明はフランジやチャンバーパー
ツ等を単体処理する場合にも使用することができる。
The present invention can also be used for processing flanges, chamber parts and the like as a single unit.

【0016】[0016]

【発明の効果】本発明では、60〜150℃という比較
的低温の加熱状態でオゾンガス濃度10〜50vol%(残
り酸素)のオゾンガスを作用させるようにしていること
から、シリコンパッキン等の非耐熱性パッキンを使用し
た装置であってもパッキン材に熱影響を与えることがな
いうえ、加熱装置も電気ヒータ程度の簡単な装置でよ
い。この結果、小型で安価な装置を使用して、確実な酸
化不動態膜を形成することができる。
According to the present invention, an ozone gas having an ozone gas concentration of 10 to 50 vol% (remaining oxygen) is applied in a heating state at a relatively low temperature of 60 to 150 ° C. Even a device using packing does not affect the packing material thermally, and the heating device may be a simple device such as an electric heater. As a result, a reliable oxidation passivation film can be formed using a small and inexpensive apparatus.

【0017】また、オゾンガス濃度が10〜50vol%
(残り酸素)のオゾンガスであれば150℃以下という比
較的低温加熱状態で使用することが可能となり、金属表
面との反応性が高まり、作業性を向上させることができ
る。
Further, the ozone gas concentration is 10 to 50 vol%
If the ozone gas is (remaining oxygen), it can be used in a relatively low temperature heating state of 150 ° C. or less, the reactivity with the metal surface is increased, and the workability can be improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】オゾン処理温度を変化させた場合でのオゾン濃
度と溶出金属量との関係を示す図である。
FIG. 1 is a graph showing a relationship between an ozone concentration and an amount of eluted metal when an ozone treatment temperature is changed.

【図2】大気圧下でのオゾン濃度と爆発危険性を示す図
である。
FIG. 2 is a diagram showing the ozone concentration under atmospheric pressure and the danger of explosion.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 オゾンガス濃度が10〜50vol%のオ
ゾンガスを60〜150℃の温度範囲で金属に作用させ
て、金属表面の接ガス面を不動態化処理するように構成
した金属表面の不動態化処理方法。
1. A passivation of a metal surface configured so that an ozone gas having an ozone gas concentration of 10 to 50 vol% acts on a metal in a temperature range of 60 to 150 ° C. to passivate a gas contact surface of the metal surface. Processing method.
【請求項2】 オゾンガスの濃度が20〜30vol%で
ある請求項1に記載の金属表面の不動態化処理方法。
2. The method for passivating a metal surface according to claim 1, wherein the concentration of the ozone gas is 20 to 30 vol%.
JP2000048999A 2000-02-25 2000-02-25 Metal surface passivation treatment method Expired - Lifetime JP4505097B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000048999A JP4505097B2 (en) 2000-02-25 2000-02-25 Metal surface passivation treatment method

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Publication Number Publication Date
JP2001234324A true JP2001234324A (en) 2001-08-31
JP4505097B2 JP4505097B2 (en) 2010-07-14

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ID=18570993

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007247011A (en) * 2006-03-17 2007-09-27 Okayama Prefecture Method for hydrophilizing narrow channel
JP2007251071A (en) * 2006-03-20 2007-09-27 Iwatani Internatl Corp Method for forming oxide thin film
JP2009084602A (en) * 2007-09-28 2009-04-23 Iwatani Internatl Corp Method for forming surface oxide film on stainless steel

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283389A (en) * 1992-03-31 1993-10-29 Nec Corp Method of cleaning semiconductor wafer
JPH05287496A (en) * 1992-04-13 1993-11-02 Hitachi Zosen Corp Surface treatment of stainless steel member
JPH06235058A (en) * 1993-02-08 1994-08-23 Hitachi Zosen Corp Method for oxidizing metal surface
JPH09196298A (en) * 1996-01-17 1997-07-29 Iwatani Internatl Corp Ozone supply line to ozone utilization system and method for passivating the same
JPH09195032A (en) * 1996-01-10 1997-07-29 Neos Co Ltd Treatment of metallic surface
JPH10229080A (en) * 1996-12-10 1998-08-25 Sony Corp Processing method of oxide, deposition method of amorphous oxide film and amorphous tantalun oxide film

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283389A (en) * 1992-03-31 1993-10-29 Nec Corp Method of cleaning semiconductor wafer
JPH05287496A (en) * 1992-04-13 1993-11-02 Hitachi Zosen Corp Surface treatment of stainless steel member
JPH06235058A (en) * 1993-02-08 1994-08-23 Hitachi Zosen Corp Method for oxidizing metal surface
JPH09195032A (en) * 1996-01-10 1997-07-29 Neos Co Ltd Treatment of metallic surface
JPH09196298A (en) * 1996-01-17 1997-07-29 Iwatani Internatl Corp Ozone supply line to ozone utilization system and method for passivating the same
JPH10229080A (en) * 1996-12-10 1998-08-25 Sony Corp Processing method of oxide, deposition method of amorphous oxide film and amorphous tantalun oxide film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007247011A (en) * 2006-03-17 2007-09-27 Okayama Prefecture Method for hydrophilizing narrow channel
JP2007251071A (en) * 2006-03-20 2007-09-27 Iwatani Internatl Corp Method for forming oxide thin film
JP4621848B2 (en) * 2006-03-20 2011-01-26 岩谷産業株式会社 Method for making oxide thin film
JP2009084602A (en) * 2007-09-28 2009-04-23 Iwatani Internatl Corp Method for forming surface oxide film on stainless steel

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