JP2001222112A5 - - Google Patents
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- JP2001222112A5 JP2001222112A5 JP2000164833A JP2000164833A JP2001222112A5 JP 2001222112 A5 JP2001222112 A5 JP 2001222112A5 JP 2000164833 A JP2000164833 A JP 2000164833A JP 2000164833 A JP2000164833 A JP 2000164833A JP 2001222112 A5 JP2001222112 A5 JP 2001222112A5
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- JP
- Japan
- Prior art keywords
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- formula
- repeating unit
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- independently represent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 125000000217 alkyl group Chemical group 0.000 description 12
- 239000002253 acid Substances 0.000 description 8
- 125000005647 linker group Chemical group 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000005561 phenanthryl group Chemical group 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 125000005389 trialkylsiloxy group Chemical group 0.000 description 2
- 125000004665 trialkylsilyl group Chemical group 0.000 description 2
- 125000004953 trihalomethyl group Chemical group 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000164833A JP4166417B2 (ja) | 1999-11-29 | 2000-06-01 | ポジ型レジスト積層物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33830199 | 1999-11-29 | ||
| JP11-338301 | 1999-11-29 | ||
| JP2000164833A JP4166417B2 (ja) | 1999-11-29 | 2000-06-01 | ポジ型レジスト積層物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001222112A JP2001222112A (ja) | 2001-08-17 |
| JP2001222112A5 true JP2001222112A5 (https=) | 2006-01-12 |
| JP4166417B2 JP4166417B2 (ja) | 2008-10-15 |
Family
ID=26576060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000164833A Expired - Fee Related JP4166417B2 (ja) | 1999-11-29 | 2000-06-01 | ポジ型レジスト積層物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4166417B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7244542B2 (en) * | 2002-05-30 | 2007-07-17 | Shipley Company, L.L.C. | Resins and photoresist compositions comprising same |
| US7459263B2 (en) * | 2003-12-19 | 2008-12-02 | Eastman Kodak Company | Optical recording media with triplet-sensitized isomerization |
| JP2011502286A (ja) * | 2007-10-30 | 2011-01-20 | ブルーワー サイエンス アイ エヌ シー． | 光像形成性分岐ポリマー |
| JP6579428B2 (ja) * | 2015-07-16 | 2019-09-25 | 川崎化成工業株式会社 | 置換オキシ−２−ナフチル（メタ）アクリレート化合物、その製造方法及びその用途 |
| JP6902011B2 (ja) * | 2017-12-31 | 2021-07-14 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | フォトレジストトップコート組成物およびフォトレジスト組成物を処理する方法 |
| WO2024143285A1 (ja) * | 2022-12-28 | 2024-07-04 | 日本ゼオン株式会社 | 共重合体ゴム、ゴム組成物、およびゴム架橋物 |
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2000
- 2000-06-01 JP JP2000164833A patent/JP4166417B2/ja not_active Expired - Fee Related