JP2001207034A - Epoxy resin composition for sealing optical semiconductor, and optical semiconductor device - Google Patents

Epoxy resin composition for sealing optical semiconductor, and optical semiconductor device

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Publication number
JP2001207034A
JP2001207034A JP2000016307A JP2000016307A JP2001207034A JP 2001207034 A JP2001207034 A JP 2001207034A JP 2000016307 A JP2000016307 A JP 2000016307A JP 2000016307 A JP2000016307 A JP 2000016307A JP 2001207034 A JP2001207034 A JP 2001207034A
Authority
JP
Japan
Prior art keywords
optical semiconductor
resin composition
substituted
epoxy resin
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000016307A
Other languages
Japanese (ja)
Inventor
Sumiya Miyake
澄也 三宅
Shinji Komori
慎司 小森
Masahito Akiyama
仁人 秋山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP2000016307A priority Critical patent/JP2001207034A/en
Publication of JP2001207034A publication Critical patent/JP2001207034A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an epoxy resin composition used for sealing an optical semiconductor and excellent in clarity and resistance to soldering and to provide an optical semiconductor device sealed with a cured item of the composition. SOLUTION: The epoxy resin composition essentially comprises a reaction product of a phenolic compound having a specified structure and triglycidyl isocyanurate in a specified ratio, an acid anhydride curative, and a cure accelerator. The optical semiconductor device is prepared by sealing with a cured item of the composition.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、透明性及び耐半田
性に優れた光半導体封止用エポキシ樹脂組成物およびそ
の硬化物で封止された光半導体装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for encapsulating an optical semiconductor having excellent transparency and solder resistance, and an optical semiconductor device encapsulated with a cured product thereof.

【0002】[0002]

【従来の技術】オプトエレクトロニクスの分野におい
て、従来多く用いられている光半導体封止用エポキシ樹
脂にビスフェノールA型エポキシ樹脂、トリグリシジル
イソシアヌレートがある。しかしビスフェノールA型エ
ポキシのように比較的低吸水のエポキシ樹脂は、耐熱性
が低く、また耐熱性が高く透明性に優れるトリグリシジ
ルイソシアヌレートのような芳香環を含まない多官能エ
ポキシ樹脂は吸水率が高いという問題点を有している。
そのためこのような従来のエポキシ樹脂を用いた光表面
実装型パッケージを、IRリフロー等で実装した場合、
熱衝撃によるパッケージのクラックや、素子・リードフ
レームと樹脂との間に剥離が生じるという問題があっ
た。
2. Description of the Related Art In the field of optoelectronics, bisphenol A type epoxy resins and triglycidyl isocyanurate are commonly used epoxy resins for optical semiconductor encapsulation. However, epoxy resins having relatively low water absorption, such as bisphenol A type epoxy, have low heat resistance, and polyfunctional epoxy resins containing no aromatic ring, such as triglycidyl isocyanurate, which has high heat resistance and excellent transparency, have a high water absorption. Is high.
Therefore, when such a conventional optical surface mount type package using an epoxy resin is mounted by IR reflow or the like,
There has been a problem that cracks in the package due to thermal shock and separation between the element / lead frame and the resin occur.

【0003】一方、フェノールノボラック樹脂を硬化剤
に用いるエポキシ樹脂組成物においては、吸水性は低減
できるものの、分子構造中のメチレン基が、活性ラジカ
ル種により、酸化されやすく、熱により著しく着色する
という欠点があった。
On the other hand, in an epoxy resin composition using a phenol novolak resin as a curing agent, although the water absorption can be reduced, the methylene group in the molecular structure is easily oxidized by an active radical species and is markedly colored by heat. There were drawbacks.

【0004】[0004]

【発明が解決しようとする課題】本発明は、透明性及び
耐半田性に優れた光半導体封止用エポキシ樹脂組成物お
よびその硬化物で封止された光半導体装置を提供するこ
とを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide an epoxy resin composition for optical semiconductor encapsulation which is excellent in transparency and solder resistance, and an optical semiconductor device encapsulated with a cured product thereof. I do.

【0005】[0005]

【課題を解決するための手段】本発明者らは、透明性、
耐熱性に優れる多官能エポキシであるトリグリシジルイ
ソシアヌレートと、吸水率を低減し耐熱性を向上させか
つ透明性にも優れた特定構造のフェノール化合物とを反
応させた化合物、酸無水物硬化剤、及び硬化促進剤を必
須成分とすることを特徴とする樹脂組成物を用いること
により、上記目的を達成するに至った。
Means for Solving the Problems The present inventors have proposed transparency,
A compound obtained by reacting triglycidyl isocyanurate, a polyfunctional epoxy with excellent heat resistance, with a phenolic compound having a specific structure, which has a reduced water absorption, improves heat resistance, and is also excellent in transparency, an acid anhydride curing agent, By using a resin composition characterized by including a curing accelerator as an essential component, the above object has been achieved.

【0006】即ち、本発明は、1分子内に2個以上のフ
ェノール性水酸基を有し、かつそのフェノール核の炭素
上に置換したアラルキル基に属するメチレン水素をもた
ない化合物(A)と、トリグリシジルイソシアヌレート
(B)とを、前記成分(A)の水酸基のモル数(a)と
成分(B)のエポキシ基のモル数(b)とのモル比、
(a):(b)=1:1〜6の比率で反応させた化合物
(C)と、酸無水物硬化剤、硬化促進剤を必須成分とす
ることを特徴とする光半導体封止用エポキシ樹脂組成物
およびその硬化物で封止された光半導体装置である。
That is, the present invention relates to a compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group substituted on carbon of the phenol nucleus; A molar ratio of the triglycidyl isocyanurate (B) to the molar number (a) of the hydroxyl group of the component (A) and the molar number (b) of the epoxy group of the component (B),
(A): An epoxy for optical semiconductor encapsulation, comprising, as essential components, a compound (C) reacted at a ratio of 1: 1 to 6 and an acid anhydride curing agent and a curing accelerator. An optical semiconductor device sealed with a resin composition and a cured product thereof.

【0007】1分子内に2個以上のフェノール性水酸基
を有し、かつそのフェノール核の炭素上に置換したアラ
ルキル基に属するメチレン水素をもたない化合物(A)
が、好ましくは、アルキル置換または無置換ビスフェノ
ールA、アルキル置換または無置換ビスフェノールS、
アルキル置換または無置換ビフェノール、ビスフェノー
ルフルオレン、2−(4−ヒドロキシフェニル)−2−
[4−[1,1−ビス(4−ヒドロキシフェニル)エチ
ル]フェニル]プロパンの群より選ばれるものである。
Compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group substituted on the carbon of the phenol nucleus
Is preferably an alkyl-substituted or unsubstituted bisphenol A, an alkyl-substituted or unsubstituted bisphenol S,
Alkyl-substituted or unsubstituted biphenol, bisphenolfluorene, 2- (4-hydroxyphenyl) -2-
[4- [1,1-bis (4-hydroxyphenyl) ethyl] phenyl] propane.

【0008】また、前記化合物(C)において、1分子
内に2個以上のフェノール性水酸基を有し、かつそのフ
ェノール核の炭素上に置換したアラルキル基に属するメ
チレン水素をもたない化合物(A)と、トリグリシジル
イソシアヌレート(B)とを、成分(A)の水酸基のモ
ル数(a)と成分(B)のエポキシ基のモル数(b)と
のモル比が、好ましくは、(a):(b)=1:2〜4
の比率で反応させたものである。
In the compound (C), a compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group substituted on the carbon of the phenol nucleus. ) And triglycidyl isocyanurate (B), the molar ratio of the number of moles of hydroxyl groups (a) of component (A) to the number of moles of epoxy groups (b) of component (B) is preferably (a) ): (B) = 1: 2-4
The reaction was carried out at the ratio of

【0009】[0009]

【発明の実施の形態】本発明に用いる1分子内に2個以
上のフェノール性水酸基を有し、かつそのフェノール核
の炭素上に置換したアラルキル基に属するメチレン水素
をもたない化合物(A)の具体的事例は、活性ラジカル
種により酸化されやすい当該メチレン水素をもたないな
らば何ら限定されるものではないが、レゾルシン、カテ
コールなどのジヒドロキシベンゼン類、ビスフェノール
A、ビスフェノールS、ビフェノール、ビフェノールエ
ーテル及びそれらのアルキル置換体、ビスフェノールフ
ルオレン、ジヒドロキシナフタレン、2−(4−ヒドロ
キシフェニル)−2−[4−[1,1−ビス(4−ヒド
ロキシフェニル)エチル]フェニル]プロパンなどが例
示されるが、アルキル置換または無置換ビスフェノール
A、アルキル置換または無置換ビスフェノールS、アル
キル置換または無置換ビフェノール、ビスフェノールフ
ルオレン、2−(4−ヒドロキシフェニル)−2−[4
−[1,1−ビス(4−ヒドロキシフェニル)エチル]
フェニル]プロパンが低吸水性、光透過性、耐熱性の面
で好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION A compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group substituted on the carbon of the phenol nucleus used in the present invention. Specific examples are not limited as long as they do not have the methylene hydrogen which is easily oxidized by an active radical species. And alkyl substituted products thereof, bisphenolfluorene, dihydroxynaphthalene, 2- (4-hydroxyphenyl) -2- [4- [1,1-bis (4-hydroxyphenyl) ethyl] phenyl] propane and the like. , Alkyl-substituted or unsubstituted bisphenol A, alkyl-substituted Other unsubstituted bisphenol S, alkyl-substituted or unsubstituted biphenol, bisphenol fluorene, 2- (4-hydroxyphenyl) -2- [4
-[1,1-bis (4-hydroxyphenyl) ethyl]
[Phenyl] propane is preferred in terms of low water absorption, light transmission and heat resistance.

【0010】次に、1分子内に2個以上のフェノール性
水酸基を有し、かつそのフェノール核に置換した炭素上
にアラルキル基に属するメチレン水素をもたない化合物
(A)と、トリグリシジルイソシアヌレート(B)とを
反応させ化合物(C)を得る際の、成分(A)の水酸基
のモル数(a)と成分(B)のエポキシ基のモル数
(b)とのモル比、(a):(b)に関しては、
(a):(b)=1:1〜6の比率であれば本発明の目
的である、透明性、耐熱性、低吸水性を並立できるが、
(a):(b)=1:2〜4であれば、未反応分を低減
でき、反応の制御が容易なため、さらに好ましい。前述
の範囲をはずれると反応がうまく進行しなかったり、諸
特性が悪化する場合がある。
Next, a compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group on carbon substituted on the phenol nucleus, and triglycidyl isocyanate A molar ratio of the number of moles (a) of the hydroxyl group of the component (A) to the number of moles (b) of the epoxy group of the component (B) when the compound (C) is obtained by reacting the compound with the nurate (B); ): Regarding (b),
If the ratio of (a) :( b) = 1: 1 to 6, transparency, heat resistance, and low water absorption, which are the objects of the present invention, can be achieved at the same time.
If (a) :( b) = 1: 2 to 4, unreacted components can be reduced, and control of the reaction is easy, so that it is more preferable. If the ratio is out of the above range, the reaction may not proceed well or various characteristics may be deteriorated.

【0011】本発明に用いる化合物(C)の透明性、耐
熱性、低吸水性を並立させうる理由の詳細は不明だが、
おそらくトリグリシジルイソシアヌレートの分子間に本
発明の成分(A)1分子内に2個以上のフェノール性水
酸基を有し、かつそのフェノール核に置換した炭素上に
アラルキル基に属するメチレン水素をもたない化合物
が、ある程度規則的に入り込むことで、単にトリグリシ
ジルイソシアヌレートと対応する成分(A)のエポキシ
化物を混合した系とは異なる挙動となるのではないかと
考えられる。
The details of the reason why the transparency, heat resistance and low water absorption of the compound (C) used in the present invention can be made clear are unknown,
The component (A) of the present invention probably has two or more phenolic hydroxyl groups in one molecule between the molecules of triglycidyl isocyanurate and has a methylene hydrogen belonging to an aralkyl group on the carbon substituted on the phenol nucleus. It is conceivable that the presence of a compound that does not exist may behave differently from a system in which triglycidyl isocyanurate is simply mixed with the corresponding epoxidized component (A) when the compound enters into the system to some extent.

【0012】これら化合物(A)とトリグリシジルイソ
シアヌレート(B)との反応としては、通常当業者にお
いて用いられるエポキシ樹脂の鎖延長の方法を用いるこ
とができる。例えば、化合物(A)と(B)とを、3級
アミン、4級アンモニウム塩、有機ホスフィン、4級ホ
スホニウム塩などの中で着色の少ない触媒を用い無溶
媒、あるいは溶媒を用いて加熱反応を行えばよい。この
場合のフェノール性水酸基とエポキシ基の反応率は、特
に限定することはできないが、1分子内に2個以上のフ
ェノール性水酸基を有しかつそのフェノール核の炭素上
に置換したアラルキル基に属するメチレン水素をもたな
い化合物(A)の未反応分が、少なくとも室温に冷却し
た際析出しない状態になる程度まで反応が進行していれ
ばよい。
As the reaction between the compound (A) and the triglycidyl isocyanurate (B), a method for elongating an epoxy resin, which is generally used by those skilled in the art, can be used. For example, the compound (A) and the compound (B) are subjected to a heat reaction using a catalyst with little coloring in a tertiary amine, a quaternary ammonium salt, an organic phosphine, a quaternary phosphonium salt or the like without solvent or using a solvent. Just do it. The reaction rate between the phenolic hydroxyl group and the epoxy group in this case is not particularly limited, but belongs to an aralkyl group having two or more phenolic hydroxyl groups in one molecule and substituted on the carbon of the phenol nucleus. It is sufficient that the reaction has proceeded to such an extent that the unreacted portion of the compound (A) having no methylene hydrogen does not precipitate at least when cooled to room temperature.

【0013】本発明に用いる酸無水物硬化剤は、無水フ
タル酸、無水マレイン酸、無水トリメリット酸、無水ピ
ロメリット酸、ヘキサヒドロ無水フタル酸、3−メチル
−ヘキサヒドロ無水フタル酸と4−メチル−ヘキサヒド
ロ無水フタル酸、無水テトラヒドロ無水フタル酸、無水
ナジック酸、無水メチルナジック酸などが例示される
が、特にこれらに限定されるものではなく、単独もしく
は2種以上用いても差し支えない。
The acid anhydride curing agent used in the present invention includes phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, hexahydrophthalic anhydride, 3-methyl-hexahydrophthalic anhydride and 4-methyl- Examples include hexahydrophthalic anhydride, tetrahydrophthalic anhydride, nadic anhydride, methylnadic anhydride, and the like, but are not particularly limited thereto, and may be used alone or in combination of two or more.

【0014】本発明に用いる硬化促進剤については、通
常エポキシ樹脂のアニオン硬化に用いられるものはすべ
て使用可能であるが、例示するならば、イミダゾール
類、3級アミン、4級アンモニウム塩、ジアザビシクロ
ウンデセンなどの双環式アミジン類とその誘導体、ホス
フィン、ホスホニウム塩などが一般的であるが、硬化性
がよく、着色がないものであれば何ら限定されるもので
はなく、単独でも2種以上用いても差し支えない。
As the curing accelerator used in the present invention, any of those usually used for anionic curing of an epoxy resin can be used, but, for example, imidazoles, tertiary amines, quaternary ammonium salts, diaza, etc. Bicyclic amidines such as bicycloundecene and derivatives thereof, phosphines, phosphonium salts and the like are generally used, but are not limited as long as they have good curability and are not colored. The above may be used.

【0015】本発明の光半導体封止用エポキシ樹脂組成
物に、必要に応じて、他のエポキシ樹脂、酸化防止剤、
離型剤、カップリング剤等当業者にて公知の添加剤、副
資材を組み合わせることは何らさしつかえない。
The epoxy resin composition for encapsulating an optical semiconductor of the present invention may contain, if necessary, another epoxy resin, an antioxidant,
Combination of additives and auxiliary materials known to those skilled in the art, such as a release agent and a coupling agent, can be used at all.

【0016】本発明の光半導体封止用エポキシ樹脂組成
物は、例えば、次のような製造方法により得ることがで
きる。上記の各成分を適宜配合して均一に混合後、混練
機により溶融混合し、得られた溶融混合物を、冷却粉砕
して、得られる。
The epoxy resin composition for encapsulating an optical semiconductor of the present invention can be obtained, for example, by the following production method. The above components are appropriately blended and uniformly mixed, then melt-mixed by a kneader, and the obtained molten mixture is cooled and pulverized to obtain a mixture.

【0017】このようにして得られた光半導体封止用エ
ポキシ樹脂組成物を用いての封止は、一般的な方法でで
きるが、例えば、トランスファー成形法等により、光半
導体素子を封止して、エポキシ樹脂組成物の硬化物で封
止された光半導体装置を得ることができる。
The encapsulation using the thus obtained epoxy resin composition for encapsulating an optical semiconductor can be performed by a general method. For example, the optical semiconductor element is encapsulated by a transfer molding method or the like. Thus, an optical semiconductor device sealed with a cured product of the epoxy resin composition can be obtained.

【0018】[0018]

【実施例】以下に、実施例を示すが、これらに本発明が
限定されるものではない。
The present invention is described below by way of examples, which should not be construed as limiting the present invention.

【0019】[化合物(C)の合成] (合成例1)2LのフラスコにビスフェノールA11
4.2g(水酸基1モル)、トリグリシジルイソシアヌ
レート346.8g(エポキシ基3.5モル)、テトラ
ブチルホスホニウムヒドロキシド0.3gを仕込みオイ
ルバスを140℃に設定し、窒素を流しながら2時間反
応させ生成物1を得た。得られた生成物を室温まで冷却
したが、ビスフェノールAの析出は見られなかった。
[Synthesis of Compound (C)] (Synthesis Example 1) Bisphenol A11 was placed in a 2 L flask.
4.2 g (1 mol of hydroxyl group), 346.8 g of triglycidyl isocyanurate (3.5 mol of epoxy group) and 0.3 g of tetrabutylphosphonium hydroxide were charged, and the oil bath was set at 140 ° C., and 2 hours while flowing nitrogen. The reaction was performed to obtain a product 1. The obtained product was cooled to room temperature, but no precipitation of bisphenol A was observed.

【0020】(合成例2〜10)基本的な操作はすべて
合成例1と同様にして実施し生成物を得た。内容詳細は
表1に示す。
(Synthesis Examples 2 to 10) All the basic operations were carried out in the same manner as in Synthesis Example 1 to obtain a product. Table 1 shows the details.

【0021】[0021]

【表1】 [Table 1]

【0022】(実施例1〜7、比較例1〜3)本発明の
樹脂組成物は、表2に示した配合割合で、加熱混合し、
冷却後粉砕して、樹脂組成物を得た。この樹脂組成物
を、低圧トランスファー成形機を用いて、金型温度17
5℃、注入圧力6.86x106Pa、硬化時間2分、
ポストキュア150℃2時間の条件で、各試験で用いる
テストピースを作製した。評価方法は、以下の通り。結
果は表2にまとめて示す。
(Examples 1 to 7, Comparative Examples 1 to 3) The resin compositions of the present invention were mixed by heating at the mixing ratios shown in Table 2,
After cooling, the mixture was pulverized to obtain a resin composition. The resin composition was cooled to a mold temperature of 17 using a low-pressure transfer molding machine.
5 ° C., injection pressure 6.86 × 10 6 Pa, curing time 2 minutes,
Test pieces used in each test were produced under the conditions of post cure at 150 ° C. for 2 hours. The evaluation method is as follows. The results are summarized in Table 2.

【0023】(光透過率の測定)10×30×1mmの
テストピースを作製し、分光光度計(島津製作所製自記
分光光度計UV−3100)を用いて、1mm厚さで4
00nmの光透過率を測定した。 (吸湿率の測定)直径50mm、厚さ3mmの円板状テ
ストピースを作製し、85℃、湿度85%に設定した高
温高湿槽に放置し、168時間後の重量増加率を吸湿率
として測定した。 (ガラス転移温度の測定)10×5×5mmのテストピ
ースを作製し、TMAを用い、5℃/minの昇温速度
で昇温して測定し、テストピースの伸び率が急激に変化
する温度とした。 (耐半田性の評価)表面実装用パッケージ(12ピン、
4×5mm、厚み1.2mm、チップサイズは1.5m
m×2.0mm、リードフレームは42アロイ製)を、
金型温度175℃、射出圧力6.86x106Pa、硬
化時間2分でトランスファー成形し、150℃、2時間
後硬化させた。得られた光半導体パッケージを、85
℃、相対湿度85%の環境下で、168時間放置し、そ
の後240℃のIRリフロー処理を行った。処理したパ
ッケージを顕微鏡及び超音波探傷装置でクラック、チッ
プと樹脂との剥離の有無を見た。
(Measurement of Light Transmittance) A test piece of 10 × 30 × 1 mm was prepared, and a test piece having a thickness of 1 mm and a thickness of 4 mm was measured using a spectrophotometer (Shimadzu Corporation UV-3100).
The light transmittance at 00 nm was measured. (Measurement of Moisture Absorption Rate) A disk-shaped test piece having a diameter of 50 mm and a thickness of 3 mm was prepared and left in a high-temperature and high-humidity bath set at 85 ° C. and a humidity of 85%. It was measured. (Measurement of glass transition temperature) A test piece of 10 × 5 × 5 mm was prepared and measured by using TMA at a heating rate of 5 ° C./min, and measured. The temperature at which the elongation of the test piece rapidly changed was measured. And (Evaluation of solder resistance) Surface mount package (12 pins,
4 × 5mm, thickness 1.2mm, chip size 1.5m
mx 2.0mm, lead frame made of 42 alloy),
Transfer molding was performed at a mold temperature of 175 ° C., an injection pressure of 6.86 × 10 6 Pa, and a curing time of 2 minutes, and post-curing was performed at 150 ° C. for 2 hours. 85 obtained optical semiconductor package
It was left for 168 hours in an environment of 85 ° C. and a relative humidity of 85%, and then subjected to an IR reflow treatment at 240 ° C. The processed package was examined with a microscope and an ultrasonic flaw detector to check for cracks and separation between the chip and the resin.

【0024】[0024]

【表2】 [Table 2]

【0025】表2の結果をみれば明らかなように、本発
明の樹脂組成物は透明性、耐熱性、低吸水性が並立し、
良好な耐半田性を有していることがわかる。
As is clear from the results shown in Table 2, the resin composition of the present invention has transparency, heat resistance and low water absorption at the same time.
It turns out that it has good soldering resistance.

【0026】[0026]

【発明の効果】本発明の光半導体封止用エポキシ樹脂組
成物およびその硬化物で封止された光半導体装置は、透
明性及び耐半田性に優れており、高い信頼性を有したオ
プトデバイスを提供することができる。
The epoxy resin composition for encapsulating an optical semiconductor of the present invention and the optical semiconductor device encapsulated with the cured product thereof are excellent in transparency and solder resistance and have high reliability. Can be provided.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J002 CD141 CD201 EL136 EL146 EN137 EU117 EU137 EW147 EW177 FD146 FD157 GQ05 4J036 AB17 CA08 DA04 DB15 JA07 4M109 AA01 BA01 CA21 EA02 EB02 EB04 EB06 EB09 EB18 EC05 EC11 GA01  ──────────────────────────────────────────────────続 き Continued from the front page F term (reference) 4J002 CD141 CD201 EL136 EL146 EN137 EU117 EU137 EW147 EW177 FD146 FD157 GQ05 4J036 AB17 CA08 DA04 DB15 JA07 4M109 AA01 BA01 CA21 EA02 EB02 EB04 EB06 EB09 EB18 EC05 EC11 GA01

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 1分子内に2個以上のフェノール性水酸
基を有し、かつそのフェノール核の炭素上に置換したア
ラルキル基に属するメチレン水素をもたない化合物
(A)と、トリグリシジルイソシアヌレート(B)と
を、前記成分(A)の水酸基のモル数(a)と成分
(B)のエポキシ基のモル数(b)とのモル比、
(a):(b)=1:1〜6の比率で反応させた化合物
(C)と、酸無水物硬化剤、硬化促進剤を必須成分とす
ることを特徴とする光半導体封止用エポキシ樹脂組成
物。
1. A compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group substituted on carbon of the phenol nucleus, and triglycidyl isocyanurate (B) a molar ratio of the number of moles of hydroxyl groups (a) of the component (A) to the number of moles (b) of epoxy groups of the component (B);
(A): An epoxy for optical semiconductor encapsulation, comprising, as essential components, a compound (C) reacted at a ratio of 1: 1 to 6 and an acid anhydride curing agent and a curing accelerator. Resin composition.
【請求項2】 1分子内に2個以上のフェノール性水酸
基を有し、かつそのフェノール核の炭素上に置換したア
ラルキル基に属するメチレン水素をもたない化合物
(A)が、アルキル置換または無置換ビスフェノール
A、アルキル置換または無置換ビスフェノールS、アル
キル置換または無置換ビフェノール、ビスフェノールフ
ルオレン、2−(4−ヒドロキシフェニル)−2−[4
−[1,1−ビス(4−ヒドロキシフェニル)エチル]
フェニル]プロパンの群より選ばれる、請求項1記載の
光半導体封止用エポキシ樹脂組成物。
2. A compound (A) having two or more phenolic hydroxyl groups in one molecule and having no methylene hydrogen belonging to an aralkyl group substituted on the carbon of the phenol nucleus is alkyl-substituted or non-alkyl-substituted. Substituted bisphenol A, alkyl-substituted or unsubstituted bisphenol S, alkyl-substituted or unsubstituted biphenol, bisphenolfluorene, 2- (4-hydroxyphenyl) -2- [4
-[1,1-bis (4-hydroxyphenyl) ethyl]
The epoxy resin composition for optical semiconductor encapsulation according to claim 1, which is selected from the group of [phenyl] propane.
【請求項3】 前記化合物(C)において、1分子内に
2個以上のフェノール性水酸基を有し、かつそのフェノ
ール核の炭素上に置換したアラルキル基に属するメチレ
ン水素をもたない化合物(A)と、トリグリシジルイソ
シアヌレート(B)とを、前記成分(A)の水酸基のモ
ル数(a)と成分(B)のエポキシ基のモル数(b)と
のモル比、(a):(b)=1:2〜4の比率で反応さ
せたことを特徴とする、請求項1記載の光半導体封止用
エポキシ樹脂組成物。
3. The compound (A) which has two or more phenolic hydroxyl groups in one molecule and has no methylene hydrogen belonging to an aralkyl group substituted on carbon of the phenol nucleus. ) And triglycidyl isocyanurate (B) in the molar ratio of the number of moles of hydroxyl groups (a) of component (A) to the number of moles of epoxy groups (b) of component (B), (a): ( The epoxy resin composition for optical semiconductor encapsulation according to claim 1, characterized in that b) = 1: 2 to 4 are reacted.
【請求項4】 請求項1〜3のいずれかに記載の光半導
体封止用エポキシ樹脂組成物の硬化物で封止された光半
導体装置。
4. An optical semiconductor device encapsulated with a cured product of the epoxy resin composition for optical semiconductor encapsulation according to claim 1.
JP2000016307A 2000-01-25 2000-01-25 Epoxy resin composition for sealing optical semiconductor, and optical semiconductor device Pending JP2001207034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000016307A JP2001207034A (en) 2000-01-25 2000-01-25 Epoxy resin composition for sealing optical semiconductor, and optical semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000016307A JP2001207034A (en) 2000-01-25 2000-01-25 Epoxy resin composition for sealing optical semiconductor, and optical semiconductor device

Publications (1)

Publication Number Publication Date
JP2001207034A true JP2001207034A (en) 2001-07-31

Family

ID=18543464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000016307A Pending JP2001207034A (en) 2000-01-25 2000-01-25 Epoxy resin composition for sealing optical semiconductor, and optical semiconductor device

Country Status (1)

Country Link
JP (1) JP2001207034A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013203695A (en) * 2012-03-28 2013-10-07 Osaka Gas Chem Kk Novel fluorene epoxy compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013203695A (en) * 2012-03-28 2013-10-07 Osaka Gas Chem Kk Novel fluorene epoxy compound

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