JP2001205557A5 - - Google Patents

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Publication number
JP2001205557A5
JP2001205557A5 JP2000017309A JP2000017309A JP2001205557A5 JP 2001205557 A5 JP2001205557 A5 JP 2001205557A5 JP 2000017309 A JP2000017309 A JP 2000017309A JP 2000017309 A JP2000017309 A JP 2000017309A JP 2001205557 A5 JP2001205557 A5 JP 2001205557A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000017309A
Other languages
Japanese (ja)
Other versions
JP4307674B2 (ja
JP2001205557A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000017309A priority Critical patent/JP4307674B2/ja
Priority claimed from JP2000017309A external-priority patent/JP4307674B2/ja
Publication of JP2001205557A publication Critical patent/JP2001205557A/ja
Publication of JP2001205557A5 publication Critical patent/JP2001205557A5/ja
Application granted granted Critical
Publication of JP4307674B2 publication Critical patent/JP4307674B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000017309A 2000-01-26 2000-01-26 ウェーハの研磨装置 Expired - Fee Related JP4307674B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000017309A JP4307674B2 (ja) 2000-01-26 2000-01-26 ウェーハの研磨装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000017309A JP4307674B2 (ja) 2000-01-26 2000-01-26 ウェーハの研磨装置

Publications (3)

Publication Number Publication Date
JP2001205557A JP2001205557A (ja) 2001-07-31
JP2001205557A5 true JP2001205557A5 (enExample) 2007-03-15
JP4307674B2 JP4307674B2 (ja) 2009-08-05

Family

ID=18544320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000017309A Expired - Fee Related JP4307674B2 (ja) 2000-01-26 2000-01-26 ウェーハの研磨装置

Country Status (1)

Country Link
JP (1) JP4307674B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8192248B2 (en) * 2008-05-30 2012-06-05 Memc Electronic Materials, Inc. Semiconductor wafer polishing apparatus and method of polishing
JP5390807B2 (ja) * 2008-08-21 2014-01-15 株式会社荏原製作所 研磨方法および装置
JP2013173226A (ja) * 2013-04-25 2013-09-05 Nikon Corp 研磨装置
CN110605629B (zh) * 2019-09-19 2022-11-18 西安奕斯伟材料科技有限公司 一种研磨装置
CN114871932A (zh) * 2022-06-13 2022-08-09 江苏科沛达半导体科技有限公司 一种半导体材料用环保型生产设备及其使用方法

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