JP2001201860A5 - - Google Patents
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- Publication number
- JP2001201860A5 JP2001201860A5 JP2000008042A JP2000008042A JP2001201860A5 JP 2001201860 A5 JP2001201860 A5 JP 2001201860A5 JP 2000008042 A JP2000008042 A JP 2000008042A JP 2000008042 A JP2000008042 A JP 2000008042A JP 2001201860 A5 JP2001201860 A5 JP 2001201860A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000008042A JP4105354B2 (ja) | 2000-01-17 | 2000-01-17 | ポジ型フォトレジスト組成物 |
| TW090100838A TW567398B (en) | 2000-01-17 | 2001-01-15 | The positive resist composition |
| KR1020010002584A KR100733855B1 (ko) | 2000-01-17 | 2001-01-17 | 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000008042A JP4105354B2 (ja) | 2000-01-17 | 2000-01-17 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001201860A JP2001201860A (ja) | 2001-07-27 |
| JP2001201860A5 true JP2001201860A5 (xx) | 2005-12-02 |
| JP4105354B2 JP4105354B2 (ja) | 2008-06-25 |
Family
ID=18536379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000008042A Expired - Fee Related JP4105354B2 (ja) | 2000-01-17 | 2000-01-17 | ポジ型フォトレジスト組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4105354B2 (xx) |
| KR (1) | KR100733855B1 (xx) |
| TW (1) | TW567398B (xx) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4911456B2 (ja) * | 2006-11-21 | 2012-04-04 | 富士フイルム株式会社 | ポジ型感光性組成物、該ポジ型感光性組成物に用いられる高分子化合物、該高分子化合物の製造方法及びポジ型感光性組成物を用いたパターン形成方法 |
| JP6883954B2 (ja) * | 2015-06-26 | 2021-06-09 | 住友化学株式会社 | レジスト組成物 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3804138B2 (ja) * | 1996-02-09 | 2006-08-02 | Ｊｓｒ株式会社 | ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物 |
| JP3865919B2 (ja) * | 1998-02-03 | 2007-01-10 | 富士フイルムホールディングス株式会社 | ネガ型フォトレジスト組成物 |
| US6238842B1 (en) * | 1998-03-12 | 2001-05-29 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
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2000
- 2000-01-17 JP JP2000008042A patent/JP4105354B2/ja not_active Expired - Fee Related
-
2001
- 2001-01-15 TW TW090100838A patent/TW567398B/zh not_active IP Right Cessation
- 2001-01-17 KR KR1020010002584A patent/KR100733855B1/ko not_active IP Right Cessation