JP2001201466A - Rheed−aes装置 - Google Patents

Rheed−aes装置

Info

Publication number
JP2001201466A
JP2001201466A JP2000050310A JP2000050310A JP2001201466A JP 2001201466 A JP2001201466 A JP 2001201466A JP 2000050310 A JP2000050310 A JP 2000050310A JP 2000050310 A JP2000050310 A JP 2000050310A JP 2001201466 A JP2001201466 A JP 2001201466A
Authority
JP
Japan
Prior art keywords
electron
rheed
aes
detector
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000050310A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001201466A5 (enExample
Inventor
Kazuo Miyamoto
和夫 宮本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Musashino Engineering Co Ltd
Original Assignee
Musashino Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Musashino Engineering Co Ltd filed Critical Musashino Engineering Co Ltd
Priority to JP2000050310A priority Critical patent/JP2001201466A/ja
Publication of JP2001201466A publication Critical patent/JP2001201466A/ja
Publication of JP2001201466A5 publication Critical patent/JP2001201466A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
JP2000050310A 2000-01-21 2000-01-21 Rheed−aes装置 Pending JP2001201466A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000050310A JP2001201466A (ja) 2000-01-21 2000-01-21 Rheed−aes装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000050310A JP2001201466A (ja) 2000-01-21 2000-01-21 Rheed−aes装置

Publications (2)

Publication Number Publication Date
JP2001201466A true JP2001201466A (ja) 2001-07-27
JP2001201466A5 JP2001201466A5 (enExample) 2007-03-01

Family

ID=18572107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000050310A Pending JP2001201466A (ja) 2000-01-21 2000-01-21 Rheed−aes装置

Country Status (1)

Country Link
JP (1) JP2001201466A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113957397A (zh) * 2021-10-22 2022-01-21 埃频(上海)仪器科技有限公司 一种脉冲激光分子束外延装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113957397A (zh) * 2021-10-22 2022-01-21 埃频(上海)仪器科技有限公司 一种脉冲激光分子束外延装置
CN113957397B (zh) * 2021-10-22 2024-05-14 埃频(上海)仪器科技有限公司 一种脉冲激光分子束外延装置

Similar Documents

Publication Publication Date Title
JP3500264B2 (ja) 試料分析装置
US5315113A (en) Scanning and high resolution x-ray photoelectron spectroscopy and imaging
EP0669635B1 (en) Scanning imaging high resolution electron spectroscopy
Schueler et al. A time-of-flight secondary ion microscope
US7078712B2 (en) In-situ monitoring on an ion implanter
JP7105647B2 (ja) 透過型荷電粒子顕微鏡における回折パターン検出
US20030089852A1 (en) Apparatus and method for observing sample using electron beam
US10832901B2 (en) EELS detection technique in an electron microscope
US20130126727A1 (en) Time-of-Flight Electron Energy Analyzer
US10224174B1 (en) Transmission charged particle microscope with imaging beam rotation
US20100213370A1 (en) Electron Beam Apparatus
JP7278983B2 (ja) マルチビーム走査透過荷電粒子顕微鏡
US10699872B2 (en) Discriminative imaging technique in scanning transmission charged particle microscopy
JP2002533903A (ja) 位置感度の高い検出器による透過オペレーションに対するsem
US8481932B2 (en) Charged particle beam analyzer and analysis method
JP3533335B2 (ja) 化学分析用複合放出電子顕微鏡装置
JP2000304712A (ja) 電子線分析・観察装置および電子線マイクロアナライザ
US9024275B2 (en) Specimen holder for charged-particle beam apparatus
JP2525791B2 (ja) 反射電子エネルギ−損失微細構造測定方法
JP2009236622A (ja) 蛍光x線分析機能付き高分解能x線顕微装置
WO2021074260A1 (en) Systems and methods of profiling charged-particle beams
JPH0712763A (ja) 表面分析方法及び表面分析装置
JP2653084B2 (ja) 表面分析装置
JPH07183343A (ja) X線光電子分光分析装置
Kossowsky Analytical Techniques for Electronic Materials-A Comparative Evaluation

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070110

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070110

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20070110

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070226

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20081225

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090925

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100302