JP2001201466A - Ｒｈｅｅｄ−ａｅｓ装置 - Google Patents
Ｒｈｅｅｄ−ａｅｓ装置Info
- Publication number
- JP2001201466A JP2001201466A JP2000050310A JP2000050310A JP2001201466A JP 2001201466 A JP2001201466 A JP 2001201466A JP 2000050310 A JP2000050310 A JP 2000050310A JP 2000050310 A JP2000050310 A JP 2000050310A JP 2001201466 A JP2001201466 A JP 2001201466A
- Authority
- JP
- Japan
- Prior art keywords
- electron
- rheed
- aes
- sample
- detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims abstract description 10
- 238000002128 reflection high energy electron diffraction Methods 0.000 claims abstract description 9
- 238000001941 electron spectroscopy Methods 0.000 claims description 7
- 238000005259 measurement Methods 0.000 abstract description 14
- 238000000034 method Methods 0.000 abstract description 5
- 238000000682 scanning probe acoustic microscopy Methods 0.000 abstract 1
- 239000000523 sample Substances 0.000 description 26
- 239000013078 crystal Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000004611 spectroscopical analysis Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000050310A JP2001201466A (ja) | 2000-01-21 | 2000-01-21 | Ｒｈｅｅｄ−ａｅｓ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000050310A JP2001201466A (ja) | 2000-01-21 | 2000-01-21 | Ｒｈｅｅｄ−ａｅｓ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001201466A true JP2001201466A (ja) | 2001-07-27 |
| JP2001201466A5 JP2001201466A5 (enExample) | 2007-03-01 |
Family
ID=18572107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000050310A Pending JP2001201466A (ja) | 2000-01-21 | 2000-01-21 | Ｒｈｅｅｄ−ａｅｓ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001201466A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113957397A (zh) * | 2021-10-22 | 2022-01-21 | 埃频(上海)仪器科技有限公司 | 一种脉冲激光分子束外延装置 |
-
2000
- 2000-01-21 JP JP2000050310A patent/JP2001201466A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113957397A (zh) * | 2021-10-22 | 2022-01-21 | 埃频(上海)仪器科技有限公司 | 一种脉冲激光分子束外延装置 |
| CN113957397B (zh) * | 2021-10-22 | 2024-05-14 | 埃频(上海)仪器科技有限公司 | 一种脉冲激光分子束外延装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
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