JP2001188358A - Edge bead remover - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an edge bead remover having an excellent resist dissolution rate, low toxicity and very high safety, excellent also in environmental preservation giving out little unpleasant odor, having a relatively high boiling point and good operability, forming no residue or deposit and capable of efficiently producing a high-grade substrate for the production of electronic parts. SOLUTION: The edge bead remover contains methyl α-hydroxyisobutyrate and a glycol monoalkyl ether.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel edge bead remover, and to a method for cleaning and removing unnecessary resist from a substrate for electronic parts at the time of application of a resist or after application using the edge bead remover.

[0002]

2. Description of the Related Art Spin coating, roll coating, reverse roll coating, casting coating, etc.
Various methods such as doctor coating, dip coating, and land coating are employed. For example, in the production of integrated circuit elements, a spin coating method is mainly used as a resist coating method. In the spin coating method, a resist solution is dropped on a substrate, and the dropped resist solution is cast in the direction of the outer periphery of the substrate by rotation of the substrate, and excess resist solution is scattered and removed from the outer periphery of the substrate. A resist film having a desired film thickness is formed at the center of the material. At this time,
A part of the resist solution goes to the back of the substrate,
Alternatively, there is a defect that a so-called bead is formed on the outer peripheral edge of the base material where the resist solution remains thicker than other portions.
Such a resist becomes brittle by the heat treatment in the next step, and peels off in the form of small flakes during the transfer of the base material, which may cause dust in the apparatus or adhere to the resist surface on the base material, and This is a major problem in manufacturing quality semiconductor devices. Therefore, it is necessary to remove unnecessary resist from the peripheral portion or the back surface of the base material or to remove beads. In addition, in a coating method other than the spin coating method, the resist may adhere to unnecessary portions as in the case of the spin coating method. The solvent used at this time is "Edge Bead Remover", which is described in the press journal, March 20, 1999, extra edition of monthly FPDintelligence, "LCD Panel Parts and Materials Technology", Chapter 6, "Development Solution and Stripping". Liquid "on page 38.

[0003] As a solvent conventionally used in an edge bead remover, for example, JP-A-63-69563 describes the use of 1-methyl-2-pyrrolidone, acetone and xylene, and as another example, JP-A-7-14656.
In JP-A No. 2 (1994), ethers and ether acetates such as ethylene glycol monoalkyl ether, ethylene glycol monoalkyl ether acetate, propylene glycol monoalkyl acetate, propylene glycol monoalkyl acetate, acetone, methyl ethyl ketone, and methyl isobutyl are used as cleaning solvents for resist removal. Ketones, ketones such as cyclohexanone, esters such as methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl 3-methoxypropionate, methyl 3-ethoxypropionate, and ethyl 3-ethoxypropionate, and alkoxycarboxylic acids The use of acid esters or mixtures thereof is described, including conventional examples.

[0004] However, some conventional cleaning agents do not have sufficient dissolving ability to resist, and are liable to produce residues and precipitates during cleaning. Is required. In addition, those having a low evaporation rate are disadvantageous in use because of poor drying properties, and conversely, most ketones and esters have a high vapor pressure and are poor in workability. In addition, many solvents, such as ethylene glycol, which has high solubility, are more or less toxic and generate an unpleasant odor.Therefore, a cleaning agent that satisfies both excellent solubility and higher safety for the human body at the same time is desired. Was rare. This is not limited to the manufacture of an integrated circuit device, but is also the same in the case of manufacturing a color filter, a liquid crystal display device and the like.

[0005]

DISCLOSURE OF THE INVENTION The present invention has a high solubility that does not have the above-mentioned drawbacks, can be used in a small amount, and can be sufficiently cleaned in a short cleaning time, and has a high solubility to the human body. It is an object of the present invention to provide an edge bead remover which has high safety and excellent operability.

[0006]

Means for Solving the Problems As a result of intensive studies, the present inventors have found that a homogeneous solvent of methyl α-hydroxyisobutyrate and glycol monoalkyl ether is used as an edge bead remover, so that a small amount can be used. Edge beads with high solubility that can be sufficiently washed in a short washing time, high safety to the human body, extremely low unpleasant odor common to organic solvents, and excellent operability The present invention has been made by finding that it becomes a remover.

[0007]

DESCRIPTION OF THE PREFERRED EMBODIMENTS That is, the present invention is an edge bead remover characterized by containing methyl α-hydroxyisobutyrate and a glycol monoalkyl ether represented by the following general formula (I). By using, safety to the human body is high,
In this method, unnecessary resist is removed from an electronic component base material during or after resist application in a short time with a small amount of a solvent, while suppressing the unpleasant odor that is liable to an organic solvent as much as possible.

[0008]

Embedded image (R ¹ is H or a methyl group, R ² is an alkyl group having 1 to 4 carbon atoms, and n represents 1 to ^3. )

In the present invention, the glycol monoalkyl ether represented by the above general formula (I) includes, for example, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol monomethyl ether, triethylene glycol monomethyl ether. Ethyl ether, triethylene glycol monobutyl ether,
Examples thereof include propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, and dipropylene glycol monobutyl ether. Particularly preferred is propylene glycol monomethyl ether. This glycol monoalkyl ether may be used alone or in combination of two or more.

[0010] In the edge bead remover of the present invention, methyl α-hydroxyisobutyrate and glycol monoalkyl ether are mixed in a weight mixing ratio of 9: 1 to 1: 9,
More preferably, it is used in a ratio of 7: 3 to 5: 5.

The edge bead remover of the present invention can be mixed with another solvent if necessary. Examples of the solvent include ethers, esters, ketones, ketoales, ketols, alcohols, alkoxycarboxylic esters, diketones, amides, and aromatic hydrocarbons. These solvents may be used alone or in combination of two or more.

The edge bead remover of the present invention can be applied to any of known positive resists and negative resists. To exemplify typical resists to which the edge bead remover of the present invention can be applied, in a positive type, for example, a quinonediazide-based photosensitive agent and an alkali-soluble resin, a chemically amplified resist, and the like, in a negative type, for example, , Those containing a polymer compound having a photosensitive group such as polyvinyl cinnamate, those containing an aromatic azide compound or those containing an azide compound such as a cyclized rubber and a bisazide compound, and those containing a diazo resin , A photopolymerizable composition containing an addition polymerizable unsaturated compound,
And a chemically amplified negative resist.

Examples of the film-forming substance include novolak resins obtained from phenols, cresols, xylenols and the like and aldehydes, acrylic resins, copolymers of styrene and acrylic acid, polymers of hydroxystyrene, polyvinylhydroxybenzoates. And alkali-soluble resins such as polyvinylhydroxybenzal are effective.

If necessary, other compatible dyes such as coumarin dyes and azo dyes may be added to the resist, and other additives such as additional resins, Plasticizers, stabilizers, or commonly used substances such as colorants and contrast improvers for making the pattern obtained by development more visible can also be added.

The application of the edge bead remover of the present invention will be specifically described. First, a resist solution is pretreated as required by a conventionally known coating method such as a spin coating method. Applied to When the coating is performed by the spin coating method, a bead in which the film thickness in the peripheral portion is larger than the film thickness in the central portion occurs, and the coating material also wraps around the edge and the back surface of the base material. Normal. By spraying the edge bead remover of the present invention on the rotating edge bead, the flow of the bead is promoted, and a resist film having a substantially uniform thickness can be formed on the substrate. Further, the resist that has wrapped around the side surface or the back surface of the substrate can be removed by spraying with an edge bead remover.

Since the edge bead remover of the present invention is extremely excellent in solubility, it can be effectively used for cleaning and removing a resist adhered to a spinner cup or the like, for example, in addition to the above-mentioned usage.

[0017]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples. Examples 1 to 3 and Comparative Examples 1 to 4 A commercially available positive photoresist (TFR-790, manufactured by Tokyo Ohka Co., Ltd.) was applied on a silicon wafer by a spinner so that the dry film thickness became 16000Å, and then the film was placed in a drying oven. Then, prebaking was performed at 120 ° C. for 30 minutes to form a resist film. Next, 100 ml of each solvent having the composition shown in the table was placed in a beaker, the wafer prepared above was immersed in the solvent for 10 seconds, and immediately after being lifted from the solvent, dried by air blow to obtain a film thickness (Å) of each wafer. To a film thickness meter (Nanometric Japan, Nanospec M500)
0) to determine the dissolution rate () / sec.). Table 1 shows the results of Examples and Comparative Examples. Note that Comparative Examples 1 to 3 are solvents actually used as cleaning solvents for resist removal.

Table 1 Composition of edge bead remover Dissolution rate Odor (weight ratio) (Å / sec.) Example 1 HBM: PGME = 5: 5 1482 No unpleasant odor 2 HBM: PGME = 6: 4 1390 No unpleasant odor 3 HBM : PGME = 7: 3 867 No unpleasant odor Comparative Example 1 PGME 1517 Unpleasant odor 2 PGMEA 669 Unpleasant odor 3 Ethyl lactate 701 Unique odor 4 HBM 247 No unpleasant odor HBM: α-Hydroxyisobutyrate PGME: Propylene glycol monomethyl ether PGMEA : Propylene glycol monomethyl ether acetate

[0019]

The edge bead remover of the present invention has an excellent dissolution rate, has extremely low toxicity and is biodegradable, so that it does not accumulate in the natural world and is desirable for environmental protection. Also,
The evaporation rate is an appropriate value, the flash point is relatively high while having a good drying property, and the unpleasant odor is extremely small, so that there is an advantage that the operability and the safety are high.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H01L 21/027 H01L 21/30 577 F term (Reference) 2H096 AA00 AA25 AA27 CA12 CA20 JA02 4D075 AC64 AC64 AC92 BB20Z BB65Z CA47 DA08 DB14 DC22 EA45 EC30 4H003 DA15 DB03 ED29 ED32 FA01 FA03 FA25 5F046 JA15 MA02

Claims (4)

[Claims] 1. An edge bead remover comprising a mixture of methyl α-hydroxyisobutyrate and a glycol monoalkyl ether represented by the following general formula (I). Embedded image (R ¹ is H or a methyl group, R ² is an alkyl group having 1 to 4 carbon atoms, and n represents 1 to ^3. ) 2. The edge bead remover according to claim 1, wherein the glycol monoalkyl ether is propylene glycol monomethyl ether. 3. The weight ratio of methyl α-hydroxyisobutyrate to glycol monoalkyl ether is from 9: 1 to 1: 9.
The edge bead remover according to claim 1, wherein 4. The edge bead remover according to claim 1, wherein after applying the resist-forming coating material to the substrate, unnecessary resist-forming coating material adhered to a peripheral portion, an edge portion, and / or a back surface portion of the substrate. A method of removing using.