JP2001168397A - Chip type semiconductor device - Google Patents

Chip type semiconductor device

Info

Publication number
JP2001168397A
JP2001168397A JP34970099A JP34970099A JP2001168397A JP 2001168397 A JP2001168397 A JP 2001168397A JP 34970099 A JP34970099 A JP 34970099A JP 34970099 A JP34970099 A JP 34970099A JP 2001168397 A JP2001168397 A JP 2001168397A
Authority
JP
Japan
Prior art keywords
conductive pattern
chip
semiconductor element
semiconductor device
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34970099A
Other languages
Japanese (ja)
Inventor
Tadahiro Okazaki
忠宏 岡崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP34970099A priority Critical patent/JP2001168397A/en
Publication of JP2001168397A publication Critical patent/JP2001168397A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83385Shape, e.g. interlocking features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PROBLEM TO BE SOLVED: To strengthen fixing of a semiconductor element to a conductive pattern and to reduce the using amount of a metal material used for the pattern. SOLUTION: A plurality of holes are formed at the fixed part of the semiconductor element of at least the conductive pattern. Here, it is preferred that the opening area per one hole is in a range of 0.8 to 2% of the area of the fixed part of the element from the points of view of continuity and fixing effect with the element, and it is preferred that the overall opening area of the fixed part of the element is in the range of 40 to 60% of the area of the fixed part.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はチップ型半導体装置
に関し、より詳細には半導体素子を強固に接着できると
同時に、導電パターン材料の使用量を削減できるチップ
型半導体装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip type semiconductor device, and more particularly to a chip type semiconductor device capable of firmly bonding a semiconductor element and reducing the amount of a conductive pattern material used.

【0002】[0002]

【従来の技術】近年の電子機器の小型・薄型化傾向に伴
って、回路基板へ表面実装が可能な電子部品、即ちチッ
プ型半導体装置の需要が急速に増加している。チップ型
半導体装置(以下、チップ型装置と記すことがある)は
直方体ブロックに近い形を通常はしており、その底面ま
たは底面に近い側面に端子電極が形成されている。この
端子電極と回路基板上の配線パターンとが接触するよう
にチップ型装置を回路基板上に配設し、クリーム半田な
どの導電性接着剤を用いてチップ型装置を基板上に固着
する。
2. Description of the Related Art With the recent trend toward smaller and thinner electronic devices, the demand for electronic components that can be surface-mounted on circuit boards, that is, chip-type semiconductor devices, is rapidly increasing. A chip-type semiconductor device (hereinafter sometimes referred to as a chip-type device) usually has a shape close to a rectangular parallelepiped block, and a terminal electrode is formed on a bottom surface or a side surface near the bottom surface. A chip-type device is arranged on a circuit board so that the terminal electrode and a wiring pattern on the circuit board are in contact with each other, and the chip-type device is fixed on the substrate using a conductive adhesive such as cream solder.

【0003】従来の代表的なチップ型装置の形態を図4
に示す。平面視長矩形状をしたチップ基板1の上面長手
方向両端部にはそれぞれ端子電極2,2’が形成されて
いる。そして基板1の表面には、端子電極2に導通する
第1の導電パターン9が端子電極2と一体に形成され、
同様に端子電極2’に導通する第2の導電パターン10
が端子電極2’と一体に形成されている。第1の導電パ
ターン9には半導体素子5が銀ペースト(導電性接着
剤)8で固着され、また第2の導電パターン10にはワ
イヤボンディング部(不図示)が形成され、半導体素子
5の上面電極(不図示)とボンディングワイヤ6によっ
て結線されている。そして、半導体素子5およびボンデ
ィングワイヤ6、第1及び第2の導電パターン9,10
は透明または半透明の樹脂で封止されている。
FIG. 4 shows a conventional typical chip type device.
Shown in Terminal electrodes 2 and 2 ′ are formed at both ends in the longitudinal direction of the upper surface of the chip substrate 1 having a rectangular shape in a plan view. Then, on the surface of the substrate 1, a first conductive pattern 9 electrically connected to the terminal electrode 2 is formed integrally with the terminal electrode 2,
Similarly, the second conductive pattern 10 electrically connected to the terminal electrode 2 '
Are formed integrally with the terminal electrode 2 ′. The semiconductor element 5 is fixed to the first conductive pattern 9 with a silver paste (conductive adhesive) 8, and the second conductive pattern 10 is formed with a wire bonding portion (not shown). It is connected to an electrode (not shown) by a bonding wire 6. Then, the semiconductor element 5 and the bonding wire 6, the first and second conductive patterns 9, 10
Is sealed with a transparent or translucent resin.

【0004】[0004]

【発明が解決しようとする課題】ところで、前記の導電
パターンはAu,Ni,Cuなどの金属材料で一般に形
成されている。これら金属材料からなる導電性パターン
の表面は概して滑らかであるため、銀ペーストなどの導
電性接着剤との密着強度が低く、製造工程などにおいて
半導体素子が銀ペーストと共に剥がれ落ちるという不具
合があった。このような不具合を防止するため、例えば
実開平5−90967号公報では、LEDチップの取付
位置領域の導電パターンに内側方向に切り込みを形成す
ることが提案されている。つまりこの提案技術は、導電
パターンに切り込みを形成することにより導電パターン
表面から基板上へ導電性接着剤が流れ落ちるようにして
基板と導電性接着剤との密着性を利用しようとするもの
である。しかし流れ落ちる導電性接着剤量が多くなると
基板上において短絡が生じるおそれがある。
Incidentally, the above-mentioned conductive pattern is generally formed of a metal material such as Au, Ni or Cu. Since the surface of the conductive pattern made of such a metal material is generally smooth, the adhesion strength with a conductive adhesive such as a silver paste is low, and there has been a problem that the semiconductor element peels off together with the silver paste in a manufacturing process or the like. In order to prevent such a problem, for example, Japanese Utility Model Laid-Open No. 5-90967 proposes forming a cut in the conductive pattern in the mounting position area of the LED chip in an inward direction. In other words, this proposed technique aims to utilize the adhesion between the substrate and the conductive adhesive by forming cuts in the conductive pattern so that the conductive adhesive flows down from the surface of the conductive pattern onto the substrate. However, when the amount of the conductive adhesive flowing down increases, a short circuit may occur on the substrate.

【0005】一方前記の金属材料の使用量に関し、この
使用量を削減できれば、チップ型半導体装置の製造費の
削減にもつながり、また近年強く要望されている資源の
有効活用の観点からも望ましいことである。しかし導電
性パターンに用いる金属材料の削減を主目的とした技術
は、本発明者等が調査した限りではこれまで提案されて
いない。
On the other hand, with respect to the above-mentioned amount of the metal material, if this amount can be reduced, it leads to a reduction in the manufacturing cost of the chip-type semiconductor device, and is desirable from the viewpoint of effective use of resources which has been strongly demanded in recent years. It is. However, a technique mainly aimed at reducing the amount of metal material used for the conductive pattern has not been proposed so far as far as the present inventors have investigated.

【0006】本発明はこのような従来の問題に鑑みなさ
れたものであり、その目的は導電パターンへの半導体素
子の固着強化および導電パターンに使用されている金属
材料の使用量削減にある。
The present invention has been made in view of such a conventional problem, and has as its object to reduce the amount of metal material used in a conductive pattern by strengthening the adhesion of a semiconductor element to the conductive pattern.

【0007】[0007]

【課題を解決するための手段】前記課題を解決するため
本発明によれば、チップ基板の表面に形成された導電パ
ターンに半導体素子を導電性接着剤で固着するチップ型
半導体装置において、少なくとも導電パターンにおける
前記半導体素子の固着部分に複数の孔を形成したことを
特徴とするチップ型半導体装置が提供される。
According to the present invention, there is provided a chip type semiconductor device in which a semiconductor element is fixed to a conductive pattern formed on a surface of a chip substrate with a conductive adhesive. A chip-type semiconductor device is provided, wherein a plurality of holes are formed in a portion where the semiconductor element is fixed in the pattern.

【0008】ここで半導体素子との導通性や固着効果の
観点から、前記孔一つ当たりの開口面積は前記半導体素
子の固着部分の面積の0.8〜2%の範囲であるのが好
ましく、また前記半導体素子の固着部分における前記孔
の全開口面積が、固着部分の面積の40〜60%の範囲
であるのが好ましい。
Here, from the viewpoint of the conductivity with the semiconductor element and the effect of fixing, the opening area per hole is preferably in the range of 0.8 to 2% of the area of the fixing part of the semiconductor element. It is preferable that the total opening area of the holes in the fixed portion of the semiconductor element is in the range of 40 to 60% of the area of the fixed portion.

【0009】[0009]

【発明の実施の形態】本発明者等は、導電パターンへの
半導体素子の固着強化と、従来課題として全く認識され
ていなかった、チップ型半導体装置における導電パター
ンに使用される金属材料の削減とを課題として取り上
げ、これらの課題を同時に解決するため鋭意検討を重ね
た結果、導電性パターンにおいて半導体素子の固着部分
に複数の孔を形成すればよいことを見出し本発明をなす
に至った。
BEST MODE FOR CARRYING OUT THE INVENTION The inventors of the present invention have sought to strengthen the fixation of a semiconductor element to a conductive pattern and to reduce the amount of metal material used for the conductive pattern in a chip-type semiconductor device, which was not recognized as a conventional problem. As a result, the present inventors have made intensive studies to solve these problems at the same time. As a result, they have found that a plurality of holes may be formed in the conductive pattern at the fixing portion of the semiconductor element, and have accomplished the present invention.

【0010】以下本発明を図に基づき具体的に説明す
る。なおこれら図において図4と同じ部材および部分は
同一の符号とする。図1は本発明のチップ型半導体装置
の斜視図である。チップ基板1の長手方向両端部には端
子電極2,2’が形成されている。チップ基板1の表面
には、第1の導電パターン3と第2の導電パターン4と
が端子電極2,2’とそれぞれに一体形成されている。
第1の導電パターン3の半導体素子5が固着される部分
周辺には複数の孔31が形成され、ここに導電性接着剤
である銀ペースト8が塗布された後、半導体素子5が装
着・固定される。
Hereinafter, the present invention will be described in detail with reference to the drawings. In these drawings, the same members and portions as those in FIG. 4 are denoted by the same reference numerals. FIG. 1 is a perspective view of a chip-type semiconductor device of the present invention. Terminal electrodes 2 and 2 ′ are formed at both ends in the longitudinal direction of the chip substrate 1. On the surface of the chip substrate 1, a first conductive pattern 3 and a second conductive pattern 4 are formed integrally with the terminal electrodes 2 and 2 ', respectively.
A plurality of holes 31 are formed around a portion of the first conductive pattern 3 to which the semiconductor element 5 is fixed, and a silver paste 8 as a conductive adhesive is applied thereto, and then the semiconductor element 5 is mounted and fixed. Is done.

【0011】図2に、図1のA−A線断面図を示す。第
1の導電パターン3に塗布された銀ペースト8はある程
度の流動性を有しているので、導電パターン3の表面を
流動し、孔31(図3では貫通孔)があればそれを充填
する。銀ペースト8の基板1との接触面積は孔31が形
成された分だけ増加し、加えて孔31が貫通孔である
と、導電パターンよりも表面の粗いチップ基板1とも銀
ペースト8は接触するようになるので、導電パターン3
上に半導体素子5をより強固に固定することができる。
FIG. 2 is a sectional view taken along the line AA of FIG. Since the silver paste 8 applied to the first conductive pattern 3 has a certain degree of fluidity, it flows on the surface of the conductive pattern 3 and fills the holes 31 (through holes in FIG. 3) if any. . The contact area of the silver paste 8 with the substrate 1 increases by the amount of the holes 31 formed. In addition, when the holes 31 are through holes, the silver paste 8 also comes into contact with the chip substrate 1 whose surface is rougher than the conductive pattern. The conductive pattern 3
The semiconductor element 5 can be more firmly fixed thereon.

【0012】またこのような孔31を形成することによ
り導電パターン3の金属材料の使用量が削減できる。
By forming such holes 31, the amount of metal material used for the conductive pattern 3 can be reduced.

【0013】図1において、半導体素子5の上面電極
(不図示)に接続されたボンディングワイヤ6は、第2
の導電パターン4に連結される。そして半導体素子5と
導電パターン3,4、ボンディングワイヤ6は透明又は
半透明の透光性樹脂封止体7で封止される。
In FIG. 1, a bonding wire 6 connected to an upper electrode (not shown) of a semiconductor element 5 is
Are connected to the conductive pattern 4. The semiconductor element 5, the conductive patterns 3 and 4, and the bonding wires 6 are sealed with a transparent or translucent translucent resin sealing body 7.

【0014】前記の導電パターンに形成された孔一つ当
たりの開口面積は、半導体素子の固着面積より小さけれ
ば特に限定はないが、半導体素子と導電パターンとの導
電性や固着強度の点から半導体素子の固着部分の面積の
0.8〜2%の範囲が好ましく、0.9〜1.9%の範
囲がより好ましい。孔一つ当たりの開口面積が0.8%
より小さいと半導体素子が剥離するおそれがあり、他方
開口面積が2%より大きいと導通不良が発生するおそれ
がある。孔の開口面積は同一である必要はなく、異なる
開口面積のものが種々混在していてももちろん構わな
い。
The opening area per hole formed in the conductive pattern is not particularly limited as long as it is smaller than the fixing area of the semiconductor element. The range of 0.8 to 2% of the area of the fixed portion of the element is preferable, and the range of 0.9 to 1.9% is more preferable. 0.8% opening area per hole
If it is smaller, the semiconductor element may be peeled off, and if the opening area is larger than 2%, poor conduction may occur. The opening areas of the holes need not be the same, and various holes having different opening areas may of course be mixed.

【0015】また前記半導体素子の固着部分における前
記孔の全開口面積は、前記固着部分の面積の40〜60
%の範囲であるのが好ましく、45〜55%の範囲がさ
らに好ましい。孔の全開口面積が40%より小さいと、
半導体素子が剥離するおそれがあり、他方60%より大
きいと導通不良が発生するおそれがある。
The total opening area of the hole in the fixed portion of the semiconductor element is 40 to 60 times the area of the fixed portion.
%, More preferably 45 to 55%. If the total open area of the holes is less than 40%,
There is a possibility that the semiconductor element is peeled off. On the other hand, if it is larger than 60%, a poor conduction may occur.

【0016】また形成する孔の開口形状に特に限定はな
く、図3(a)〜(c)に示すような四角形、三角形、
円形などのいずれの形状であってもよく、また2以上の
形状を組み合わせてもよい。
The shape of the opening of the hole to be formed is not particularly limited, and may be a square, a triangle, or the like as shown in FIGS.
Any shape such as a circle may be used, and two or more shapes may be combined.

【0017】孔の配列についても特に限定はなく、固着
する半導体素子の大きさや形状を考慮して決定すればよ
いが、導電パターン材料の削減や導電性接着剤との接触
面積の増加といった点からは、孔の分散密度が高くなる
配列が望ましい。
The arrangement of the holes is not particularly limited, and may be determined in consideration of the size and shape of the semiconductor element to be fixed. However, from the viewpoint of reducing the number of conductive pattern materials and increasing the contact area with the conductive adhesive. It is desirable that the arrangement is such that the dispersion density of the holes is high.

【0018】形成する孔の深さに限定はなく、孔の開口
形状や分散密度などを考慮し適宜決定すればよい。な
お、一般に導電パターンに比べてチップ基板は粗い表面
を有していることから、導電性パターンに形成する孔を
貫通孔とすれば、導電性接着剤の一部がこの孔を通って
表面の粗いチップ基板表面に至りチップ基板と密着し
て、半導体素子の固着強度を上げることができるので望
ましい。それぞれ孔の深さ必ずしも同じにする必要はな
く、必要に応じて適宜調整すればよく、例えば半導体素
子の固着部分域にある孔のみ貫通孔として効率的に半導
体素子の固着強度を上げてもよい。
The depth of the hole to be formed is not limited, and may be appropriately determined in consideration of the opening shape of the hole, the dispersion density, and the like. Since the chip substrate generally has a rough surface compared to the conductive pattern, if the hole formed in the conductive pattern is a through hole, a part of the conductive adhesive passes through the hole and the surface of the chip passes through the hole. This is desirable because it can reach the rough chip substrate surface and come into close contact with the chip substrate to increase the bonding strength of the semiconductor element. The depths of the holes do not necessarily have to be the same, and may be appropriately adjusted as needed. For example, only the holes in the fixing portion area of the semiconductor element may be formed as through holes to efficiently increase the fixing strength of the semiconductor element. .

【0019】図1では半導体素子5が1個のチップ型装
置を示しているが、複数個の半導体素子を備えたものも
もちろん本発明のチップ型半導体装置に含まれる。
FIG. 1 shows a chip-type device having one semiconductor element 5, but a chip-type device having a plurality of semiconductor elements is also included in the chip-type semiconductor device of the present invention.

【0020】また本発明の半導体装置に使用する半導体
素子に特に限定はなく、例えば発光素子や受光素子、複
合素子など従来公知の半導体素子を使用することができ
る。
The semiconductor element used in the semiconductor device of the present invention is not particularly limited, and a conventionally known semiconductor element such as a light emitting element, a light receiving element, and a composite element can be used.

【0021】導電パターンの形状に特に限定はなく、固
着する半導体素子の個数や形状、及びチップ基板の形状
などから適宜決定すればよい。
The shape of the conductive pattern is not particularly limited, and may be appropriately determined based on the number and shape of the semiconductor elements to be fixed, the shape of the chip substrate, and the like.

【0022】導電パターン3,4の形成は、例えば印刷
や蒸着などの方法によって、チップ基板1の表面全体に
Au、Ni、Cuなどの金属導体被膜を形成し、不要部
分をエッチングによって除去することにより行うことが
できる。具体的には、例えばメッキによって基板1表面
に一様にCu薄膜を形成し、孔部分を含めて不要部分を
エッチングにより除去する。つぎに残ったCu薄膜上
に、メッキによりNi薄膜およびAu薄膜を順次形成す
る。このような処理によりCu,Ni,Auの3層構造
の導電パターンを形成でき、同時に孔も形成できる。も
ちろん、導電パターンを形成した後、エッチングなどの
手段により孔を形成してもよい。
The conductive patterns 3 and 4 are formed by forming a metal conductor film of Au, Ni, Cu or the like on the entire surface of the chip substrate 1 by a method such as printing or vapor deposition, and removing unnecessary portions by etching. Can be performed. Specifically, for example, a Cu thin film is uniformly formed on the surface of the substrate 1 by plating, and unnecessary portions including the hole portions are removed by etching. Next, a Ni thin film and an Au thin film are sequentially formed on the remaining Cu thin film by plating. By such a process, a conductive pattern having a three-layer structure of Cu, Ni, and Au can be formed, and holes can be formed at the same time. Of course, after forming the conductive pattern, holes may be formed by means such as etching.

【0023】図1のチップ型半導体装置において、半導
体素子5と電極3,4、ボンディングワイヤ6を封止す
る透明又は半透明の透光性樹脂封止体7としては、例え
ばエポキシ樹脂や不飽和ポリエステル樹脂、シリコーン
樹脂、ユリア・メラミン樹脂などが挙げられ、この中で
も透光性などの点からエポキシ樹脂がより好適に使用で
きる。
In the chip type semiconductor device shown in FIG. 1, the transparent or translucent translucent resin sealing member 7 for sealing the semiconductor element 5, the electrodes 3, 4 and the bonding wires 6 is, for example, epoxy resin or unsaturated resin. Examples thereof include a polyester resin, a silicone resin, and a urea-melamine resin. Among them, an epoxy resin can be more preferably used from the viewpoint of translucency.

【0024】エポキシ樹脂としては、一分子中に2個以
上のエポキシ基を有するものでエポキシ樹脂成形材料と
して使用されるものであれば制限はなく、フェノールノ
ボラック型エポキシ樹脂、オルクレゾールノボラック型
エポキシ樹脂を代表するフェノール類とアルデヒド類の
ノボラック樹脂をエポキシ化したもの、ビスフェノール
A、ビスフェノールF、ビスフェノールS、水添ビスフ
ェノールAなどのジグリシジルエーテル、フタル酸、ダ
イマー酸などの多塩基酸とエピクロルヒドリンの反応に
より得られるジグリシジルエステル型エポキシ樹脂、ジ
アミノジフェニルメタン、イソシアヌル酸などのポリア
ミンとエピクロルヒドリンの反応により得られるグリシ
ジルアミン型エポキシ樹脂、オレフィン結合を過酢酸な
どの過酸により、酸化して得られる綿状脂肪族エポキシ
樹脂、および脂環族エポキシ樹脂などを挙げることがで
き、これらを単独であるいは2以上の混合物として使用
することができる。これらのエポキシ樹脂は十分に精製
されたもので、常温で液状であっても固形であってもよ
いが、液化時の外観ができる限り透明なものを使用する
のが好ましい。
The epoxy resin is not limited as long as it has two or more epoxy groups in one molecule and is used as an epoxy resin molding material. Phenol novolak type epoxy resin, orcresol novolak type epoxy resin Of phenols and aldehydes represented by epoxidized novolak resin, reaction of epichlorohydrin with polybasic acids such as diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, hydrogenated bisphenol A, phthalic acid and dimer acid Diglycidyl ester type epoxy resin obtained by, diaminodiphenylmethane, glycidylamine type epoxy resin obtained by the reaction of epichlorohydrin with polyamine such as isocyanuric acid, olefin bond by peracid such as peracetic acid, Turned into cotton-like aliphatic epoxy resin obtained, and the like can be mentioned alicyclic epoxy resins, and these can be used alone or as a mixture of two or more. These epoxy resins are sufficiently purified, and may be liquid or solid at room temperature, but it is preferable to use a resin which is as transparent as possible when liquefied.

【0025】また図1では透光性樹脂封止体7は側断面
が台形状の形状をしているが、透光性樹脂封止体7の形
状はこれに限定されるものではなく、本発明のチップ型
半導体装置が用いられる器具や部品の形状などから適宜
決定すればよい。封止方法としては例えばトランスファ
成形法などを用いることができる。トランスファ成型法
の場合、成形条件は通常、成形温度140〜160℃、
圧力400〜1,200N/cm2、成形時間1〜5m
inの範囲である。
In FIG. 1, the translucent resin sealing body 7 has a trapezoidal side cross section. However, the shape of the translucent resin sealing body 7 is not limited to this. What is necessary is just to determine suitably from the shape of the apparatus | tool and components which use the chip-type semiconductor device of this invention. As a sealing method, for example, a transfer molding method can be used. In the case of the transfer molding method, the molding conditions are usually a molding temperature of 140 to 160 ° C,
Pressure 400 to 1200 N / cm 2 , Molding time 1 to 5 m
in range.

【0026】本発明のチップ型半導体装置の回路基板へ
の装着は、例えば回路基板上の配線パターンと当該チッ
プ型半導体装置の端子電極とを接触するように回路基板
上に配設した後、クリーム半田などの導電性接着剤を端
子電極および配線パターンに塗布し、リフロー炉で加熱
してクリーム半田を溶融させることにより行われる。
The chip-type semiconductor device of the present invention is mounted on a circuit board by, for example, disposing a wiring pattern on the circuit board and a terminal electrode of the chip-type semiconductor device on a circuit board so as to make contact with each other. This is performed by applying a conductive adhesive such as solder to the terminal electrodes and the wiring patterns, and heating in a reflow furnace to melt the cream solder.

【0027】[0027]

【発明の効果】本発明のチップ型半導体装置では、少な
くとも導電パターンにおける前記半導体素子の固着部分
に複数の孔を形成したので、導電パターンに半導体素子
を強固に固着することができ、また同時に導電パターン
に使用されている金属材料の使用量を削減することがで
きる。
According to the chip type semiconductor device of the present invention, since a plurality of holes are formed at least in the conductive pattern at the fixing portion of the semiconductor element, the semiconductor element can be firmly fixed to the conductive pattern, and at the same time, the conductive pattern can be formed. The amount of metal material used for the pattern can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明のチップ型半導体装置の斜視図であ
る。
FIG. 1 is a perspective view of a chip-type semiconductor device of the present invention.

【図2】 図1のA−A線断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】 孔が形成された導電パターンの平面拡大図で
ある。
FIG. 3 is an enlarged plan view of a conductive pattern in which holes are formed.

【図4】 従来のチップ型半導体装置を示す斜視図であ
る。
FIG. 4 is a perspective view showing a conventional chip-type semiconductor device.

【符号の説明】[Explanation of symbols]

1 チップ基板 2、2’ 端子電極 3 第1の導電パターン 4 第2の導電パターン 5 半導体素子 6 ボンディングワイヤ 7 透光性樹脂封止体 8 銀ペースト(導電性接着剤) 9、10 導電パターン REFERENCE SIGNS LIST 1 chip substrate 2, 2 ′ terminal electrode 3 first conductive pattern 4 second conductive pattern 5 semiconductor element 6 bonding wire 7 translucent resin sealing body 8 silver paste (conductive adhesive) 9, 10 conductive pattern

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 チップ基板の表面に形成された導電パタ
ーンに半導体素子を導電性接着剤で固着するチップ型半
導体装置において、 少なくとも前記導電パターンにおける半導体素子の固着
部分に複数の孔を形成したことを特徴とするチップ型半
導体装置。
1. A chip-type semiconductor device in which a semiconductor element is fixed to a conductive pattern formed on a surface of a chip substrate with a conductive adhesive, wherein a plurality of holes are formed in at least a portion of the conductive pattern where the semiconductor element is fixed. A chip type semiconductor device characterized by the above-mentioned.
【請求項2】 前記孔一つ当たりの開口面積が、前記半
導体素子の固着部分の面積の0.8〜2%の範囲である
請求項1記載のチップ型半導体装置。
2. The chip-type semiconductor device according to claim 1, wherein an opening area per one hole is in a range of 0.8 to 2% of an area of a fixing portion of the semiconductor element.
【請求項3】 前記半導体素子の固着部分における前記
孔の全開口面積が、固着部分の面積の40〜60%の範
囲である請求項1又は2記載のチップ型半導体装置。
3. The chip-type semiconductor device according to claim 1, wherein a total opening area of the holes in the fixed portion of the semiconductor element is in a range of 40 to 60% of an area of the fixed portion.
JP34970099A 1999-12-09 1999-12-09 Chip type semiconductor device Pending JP2001168397A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34970099A JP2001168397A (en) 1999-12-09 1999-12-09 Chip type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34970099A JP2001168397A (en) 1999-12-09 1999-12-09 Chip type semiconductor device

Publications (1)

Publication Number Publication Date
JP2001168397A true JP2001168397A (en) 2001-06-22

Family

ID=18405523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34970099A Pending JP2001168397A (en) 1999-12-09 1999-12-09 Chip type semiconductor device

Country Status (1)

Country Link
JP (1) JP2001168397A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015185661A (en) * 2014-03-24 2015-10-22 スタンレー電気株式会社 semiconductor device
JP2019176134A (en) * 2018-03-29 2019-10-10 Hoya Candeo Optronics株式会社 Light illuminating module and wiring board for led device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015185661A (en) * 2014-03-24 2015-10-22 スタンレー電気株式会社 semiconductor device
JP2019176134A (en) * 2018-03-29 2019-10-10 Hoya Candeo Optronics株式会社 Light illuminating module and wiring board for led device
JP2021108404A (en) * 2018-03-29 2021-07-29 Hoya株式会社 Light illuminating module and wiring board for led device
JP7192029B2 (en) 2018-03-29 2022-12-19 Hoya株式会社 Light irradiation module and wiring board for LED element

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