JP2001149915A - Treating apparatus for making soil containing halogenated organic substance harmless - Google Patents

Treating apparatus for making soil containing halogenated organic substance harmless

Info

Publication number
JP2001149915A
JP2001149915A JP33427099A JP33427099A JP2001149915A JP 2001149915 A JP2001149915 A JP 2001149915A JP 33427099 A JP33427099 A JP 33427099A JP 33427099 A JP33427099 A JP 33427099A JP 2001149915 A JP2001149915 A JP 2001149915A
Authority
JP
Japan
Prior art keywords
soil
gas
organic halogenated
pressure low
substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33427099A
Other languages
Japanese (ja)
Inventor
Daisaku Yano
大作 矢野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Organo Corp
Original Assignee
Organo Corp
Japan Organo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Organo Corp, Japan Organo Co Ltd filed Critical Organo Corp
Priority to JP33427099A priority Critical patent/JP2001149915A/en
Publication of JP2001149915A publication Critical patent/JP2001149915A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B09DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
    • B09CRECLAMATION OF CONTAMINATED SOIL
    • B09C1/00Reclamation of contaminated soil
    • B09C1/06Reclamation of contaminated soil thermally

Abstract

PROBLEM TO BE SOLVED: To provide a treating apparatus for making the soil harmless which allows a halogenated organic substance in the soil to be subjected to the harmless treatment economically and efficiently. SOLUTION: This treating apparatus for making the soil harmless is constituted in such a manner that a gas containing the halogenated organic substance is extracted from a vacuum extraction well 1 which is embedded in the soil containing the halogenated organic substance by using a vacuum pump 12, the moisture included in the gas after extraction is separated by a gas-liquid separator 10, the gas including the halogenated organic substance after the moisture is separated is transferred into a normal pressure low temperature plasma device such as a normal pressure low temperature microwave plasma device 20, subjected to a plasma decomposition treatment in the device 20 and made to be harmless, hydrogen halide generated during the decomposition treatment in the device 20 is treated with a means such as an alkali scrubber 40 which brings the gas into contact with alkali liquid and, thereby, the soil including the halogenated organic substance is made harmless.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、有機ハロゲン化物
質を含む土壌の無害化処理装置に関し、特に常圧低温プ
ラズマ装置を利用した装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for detoxifying a soil containing an organic halogenated substance, and more particularly to an apparatus utilizing a normal-pressure low-temperature plasma apparatus.

【0002】[0002]

【従来の技術】機械工業、電子工業、クリーニング業な
ど各種の産業において、脱脂や洗浄を目的として使用さ
れるトリクロロエチレン、1,1,1−トリクロロエタ
ン、テトラクロロエチレン、四塩化炭素、1,1,2−
トリクロロエタン、1,2−ジクロロエタン等の有機ハ
ロゲン化物質を含む工場排液が地下に浸透し、土壌が汚
染され、その有機ハロゲン化物質が地下水位より上部の
不飽和帯を経て、それより下方の飽和帯に染み込んでい
き、地下水を汚染することが問題となっている。
2. Description of the Related Art Trichloroethylene, 1,1,1-trichloroethane, tetrachloroethylene, carbon tetrachloride, 1,1,2-dichloroethylene used for degreasing and cleaning in various industries such as a machine industry, an electronics industry, and a cleaning industry.
Plant effluent containing organic halogenated substances such as trichloroethane and 1,2-dichloroethane penetrates underground, contaminates the soil, and the organic halogenated substances pass through the unsaturated zone above the groundwater level and go below. It is a problem that it permeates the saturated zone and contaminates groundwater.

【0003】このような汚染された土壌を浄化するため
に、従来、汚染された土壌を掘り出して天日で乾燥また
は加熱する等して、含有されている有機ハロゲン化物質
を除去する方法がある。また、土壌中に水または水蒸気
を注入して、土壌中で固−液接触あるいは気−液接触さ
せて有機ハロゲン化物質を脱離させると共に、その脱離
した有機ハロゲン化物質を水や水蒸気などと共に排出さ
せる方法がある。
[0003] In order to purify such contaminated soil, conventionally, there is a method of excavating the contaminated soil and drying or heating it in the sun to remove the organic halide contained therein. . In addition, water or steam is injected into the soil, and solid-liquid contact or gas-liquid contact is performed in the soil to desorb the organic halogenated substance. There is a method of discharging together.

【0004】上述の方法の他に、有機ハロゲン化物質で
汚染された土壌から真空ポンプで有機ハロゲン化物質を
含む汚染ガスを抽気し、その汚染ガスを処理する方法が
知られている。例えば、特開平5−76618号には、
有機ハロゲン化物質による汚染の可能性のある土壌中
に、多数の通気口を分散して形成した多孔管を埋設し、
前記多孔管に真空ポンプを接続して、有機ハロゲン化物
質を含有した汚染ガスを土壌から抽気し、気液分離器で
水分を分離した後の汚染ガスを活性炭材製吸着材を備え
た2塔の活性炭吸着塔からなる溶剤回収装置に供給し、
有機ハロゲン化物質を活性炭材製吸着材に吸着させ、そ
れを熱脱着することにより有機ハロゲン化物質を回収す
る方法が開示されている。
[0004] In addition to the above-described method, there is known a method of extracting contaminated gas containing an organic halogenated substance from soil contaminated with the organic halogenated substance by a vacuum pump and treating the contaminated gas. For example, in Japanese Patent Application Laid-Open No. 5-76618,
In a soil that may be contaminated by organic halogenated substances, a porous tube formed by dispersing a large number of vents is buried,
A vacuum pump is connected to the perforated pipe to extract a contaminated gas containing an organic halogenated substance from soil, and the contaminated gas after water is separated by a gas-liquid separator is provided with an activated carbon-containing adsorbent. To a solvent recovery unit consisting of an activated carbon adsorption tower,
A method of recovering an organic halogenated substance by adsorbing the organic halogenated substance on an adsorbent made of an activated carbon material and thermally desorbing the same is disclosed.

【0005】また、特開平8−963号には、有機ハロ
ゲン化物質で汚染された土壌に真空抽出井を埋設し、こ
の真空抽出井から真空ポンプで土壌中の有機ハロゲン化
物質を含有した汚染ガスを抽気し、汚染ガスを酸素およ
び水蒸気の存在下で触媒を用いて酸化分解する手段が開
示されている。
Japanese Patent Application Laid-Open No. 8-963 discloses a method in which a vacuum extraction well is buried in soil contaminated with an organic halogenated substance, and the contaminated soil containing the organic halogenated substance in the soil is vacuum-pumped from the vacuum extraction well. Means for extracting gas and oxidatively decomposing pollutant gas using a catalyst in the presence of oxygen and water vapor are disclosed.

【0006】[0006]

【発明が解決しようとする課題】しかし、上述の従来法
においては、有機ハロゲン化物質によって汚染された土
壌の浄化に関して、それぞれ次のような問題が存在して
いる。有機ハロゲン化物質を含む土壌を掘り出して天日
乾燥または加熱する方法では、土壌から放出された有機
ハロゲン化物質が大気中に拡散し、大気汚染を引き起こ
すので環境上問題がある。また、土壌中の有機ハロゲン
化物質を水や水蒸気などと共に排出させる方法では、排
出された有機ハロゲン化物質を含む水をさらに処理する
必要があり、さらなる設備および手間を必要とする。
However, the above-mentioned conventional methods have the following problems with respect to the purification of soil contaminated with an organic halide. The method of excavating soil containing an organic halogenated substance and drying or heating it in the sun has an environmental problem because the organic halogenated substance released from the soil diffuses into the air and causes air pollution. Further, in the method of discharging the organic halogenated substance in the soil together with water, water vapor, or the like, it is necessary to further treat the discharged water containing the organic halogenated substance, and further equipment and labor are required.

【0007】さらに、有機ハロゲン化物質を土壌から抽
気して、得られた有機ハロゲン化物質を含む気体を処理
する方法においては、環境上の問題を引き起こすことが
ないものの、以下のような問題を有している。気体中の
有機ハロゲン化物質を活性炭等に吸着させる吸着処理法
は有機ハロゲン化物質を分解するのではなく、単に分離
するだけであり、最終的には活性炭に吸着した有機ハロ
ゲン化物質を熱処理等によって活性炭から脱離させて有
機ハロゲン化物質を回収し、その回収した有機ハロゲン
化物質を別途無害化処理するためにさらなる設備を要す
ることとなる。
Further, in the method of extracting an organic halogenated substance from soil and treating the obtained gas containing the organic halogenated substance, there is no environmental problem, but the following problems are caused. Have. The adsorption treatment method of adsorbing organic halogenated substances in gas onto activated carbon, etc., does not decompose the organic halogenated substances, but simply separates them, and finally heat-treats the organic halogenated substances adsorbed on activated carbon. Thus, the organic halogenated substance is recovered by being desorbed from the activated carbon, and the collected organic halogenated substance requires additional equipment for separate detoxification treatment.

【0008】また、気体中の有機ハロゲン化物質を触媒
によって分解する触媒分解法においては、有機ハロゲン
化物質の低濃度条件下における分解効率が悪く、土壌中
から抽気しただけでは、気体中の有機ハロゲン化物質の
濃度が低いので濃縮手段が必要となる場合がある。ま
た、共存物質によって触媒反応が阻害されるので、反応
前の気体を前処理する手段が必要になる場合もある。さ
らに、触媒反応塔自体も比較的大規模になるため装置全
体の設置面積が大規模になる。
In the catalytic decomposition method in which an organic halogenated substance in a gas is decomposed by a catalyst, the decomposition efficiency of the organic halogenated substance under low concentration conditions is poor. Since the concentration of the halogenated substance is low, a concentration means may be required. In addition, since the catalytic reaction is inhibited by the coexisting substance, a means for pretreating the gas before the reaction may be required in some cases. Further, since the catalytic reaction tower itself is relatively large, the installation area of the entire apparatus becomes large.

【0009】本発明は、このような事情に鑑みてなされ
たものであって、請求項1に係る発明の有機ハロゲン化
物質を含む土壌の無害化処理装置は、土壌中の有機ハロ
ゲン化物質を経済的かつ効率よく無害化処理できるよう
にすることを目的とし、そして、請求項2に係る発明の
有機ハロゲン化物質を含む土壌の無害化処理装置は、土
壌中の有機ハロゲン化物質をより経済的かつ効率良く無
害化処理できるようにすることを目的とし、さらに、請
求項3に係る発明の有機ハロゲン化物質を含む土壌の無
害化処理装置は、請求項1および請求項2に係る発明に
よる目的に加え、処理の際に生じるハロゲン化水素によ
る二次汚染を防止できるようにすることを目的とし、ま
た、請求項4に係る発明の有機ハロゲン化物質を含む土
壌の無害化処理装置は、請求項1、請求項2および請求
項3に係る発明による無害化処理をさらにより経済的か
つ効率よくできるようにすることを目的とする。
The present invention has been made in view of such circumstances, and the apparatus for detoxifying a soil containing an organic halogenated substance according to the first aspect of the present invention removes the organic halogenated substance in the soil. It is an object of the present invention to provide a detoxifying apparatus for soil containing an organic halogenated substance according to the second aspect of the present invention, which can economically and efficiently detoxify the organic halogenated substance in the soil. The present invention also provides a detoxifying apparatus for soil containing an organic halogenated substance according to the third aspect of the present invention. In addition to the object, it is an object of the present invention to prevent secondary contamination caused by hydrogen halide generated during the treatment, and to make the soil harmless treatment apparatus containing an organic halogenated substance according to the invention according to claim 4 an object. It is claim 1, aims to allow better even more economical and efficient detoxification by the invention according to claims 2 and 3.

【0010】[0010]

【課題を解決するための手段】本発明は請求項1とし
て、有機ハロゲン化物質を含有する土壌中に埋設された
真空抽出井と、前記真空抽出井を通して気体を吸引する
真空ポンプと、前記真空ポンプにより吸引した気体に含
まれる有機ハロゲン化物質を分解処理する常圧低温プラ
ズマ装置とを有することを特徴とする有機ハロゲン化物
質を含有する土壌の無害化処理装置を提供する。また、
本発明は請求項2として、請求項1に記載の土壌の無害
化処理装置であって、真空ポンプによって吸引した気体
から水分を分離する気液分離器をさらに有することを特
徴とする有機ハロゲン化物質を含有する土壌の無害化処
理装置を提供する。また、本発明は請求項3として、請
求項1または請求項2に記載の土壌の無害化処理装置で
あって、常圧低温プラズマ装置による処理後の排ガスを
アルカリ液と接触させる手段をさらに有することを特徴
とする有機ハロゲン化物質を含む土壌の無害化処理装置
を提供する。また、本発明は請求項4として、請求項
1、請求項2または請求項3に記載の有機ハロゲン化物
質を含む土壌の無害化処理装置であって、常圧低温プラ
ズマ装置が常圧低温マイクロ波プラズマ装置または常圧
低温放電プラズマ装置である有機ハロゲン化物質を含む
土壌の無害化処理装置を提供する。
According to the present invention, there is provided a vacuum extraction well buried in soil containing an organic halogenated substance, a vacuum pump for sucking a gas through the vacuum extraction well, and the vacuum pump. An atmospheric pressure low-temperature plasma apparatus for decomposing an organic halogenated substance contained in a gas sucked by a pump, and a detoxification apparatus for soil containing an organic halogenated substance. Also,
According to a second aspect of the present invention, there is provided the soil detoxification apparatus according to the first aspect, further comprising a gas-liquid separator for separating moisture from gas sucked by a vacuum pump. Provided is an apparatus for detoxifying soil containing a substance. According to a third aspect of the present invention, there is provided the soil detoxification apparatus according to the first or second aspect, further comprising a unit for bringing the exhaust gas after the treatment with the normal-pressure low-temperature plasma apparatus into contact with an alkali solution. A soil harmless treatment apparatus containing an organic halogenated substance is provided. According to a fourth aspect of the present invention, there is provided an apparatus for detoxifying soil containing an organic halogenated substance according to the first, second, or third aspect, wherein the normal-pressure low-temperature plasma apparatus includes a normal-pressure low-temperature micro apparatus. Provided is a detoxification apparatus for soil containing an organic halogenated substance, which is a microwave plasma apparatus or a normal-pressure low-temperature discharge plasma apparatus.

【0011】[0011]

【発明の実施の形態】本発明の処理対象となる有機ハロ
ゲン化物質としては、例えば、トリクロロエチレン、
1,1,1−トリクロロエタン、テトラクロロエチレ
ン、四塩化炭素、1,1,2−トリクロロエタン、1,
2−ジクロロエタン、フレオン−12(CFC−1
2)、フレオン−113(CFC−113)、臭化メチ
ル等が挙げられるがこれらに限定されない。
BEST MODE FOR CARRYING OUT THE INVENTION As an organic halogenated substance to be treated in the present invention, for example, trichloroethylene,
1,1,1-trichloroethane, tetrachloroethylene, carbon tetrachloride, 1,1,2-trichloroethane, 1,
2-dichloroethane, Freon-12 (CFC-1
2), Freon-113 (CFC-113), methyl bromide and the like, but are not limited thereto.

【0012】次に、本発明の実施の形態である、有機ハ
ロゲン化物質を含む土壌の無害化処理装置のフローシー
トを図1に示し、以下これを説明する。図1において
は、1は真空抽出井を示し、トリクロロエチレンなどの
有機ハロゲン化物質によって汚染された、地下水域の飽
和帯Wよりも上方の不飽和帯である土壌Z中に埋設され
ている。真空抽出井1としては通常、5〜100m程度
のものが用いられ、無害化すべき土壌の汚染の程度およ
び面積などに応じて、必要な本数だけ埋設される。ま
た、例えば土壌Z中での汚染ガスの存在領域に応じ、有
機ハロゲン化物質が存在しない深さの部分に対応する箇
所には、真空抽出井1の周囲をシートで覆って吸引しな
いようにするなどして、所定の領域から有機ハロゲン化
物質を吸引できるようにして使用することができる。
Next, FIG. 1 shows a flow sheet of an apparatus for detoxifying soil containing an organic halogenated substance, which is an embodiment of the present invention, and this will be described below. In FIG. 1, reference numeral 1 denotes a vacuum extraction well, which is buried in soil Z which is an unsaturated zone above a saturated zone W in a groundwater body and is contaminated with an organic halogenated substance such as trichlorethylene. The vacuum extraction well 1 is usually about 5 to 100 m in length, and is buried in a required number according to the degree of contamination and the area of soil to be detoxified. In addition, for example, at a location corresponding to a depth portion where the organic halogenated substance does not exist in the soil Z according to the region where the pollutant gas is present, the periphery of the vacuum extraction well 1 is covered with a sheet so as not to be sucked. For example, an organic halogenated substance can be sucked from a predetermined region and used.

【0013】図1に示した真空抽出井1のそれぞれは、
鋼棒2の周囲にワイヤー3を螺旋状に密接して巻くこと
により構成されており、土壌Z中に埋設した部分におい
て、ワイヤー3の線間の隙間、および鋼棒2とワイヤー
3の隙間を通じて有機ハロゲン化物質および水蒸気を含
んだ気体を吸引するものである。真空抽出井1は真空ポ
ンプ12を用いて土壌から有機ハロゲン化物質を抽気す
ることができるものであれば、図1に記載された態様に
限定されるものではなく、例えば、多数の通気孔を分散
して形成した多孔管などでも良い。真空抽出井1の埋設
は、例えば、直径200mmの掘削孔内に、直径150
mmの真空抽出井1を挿入するといったように、真空抽
出井1の径よりも大きめに掘削した孔内に挿入して行
う。このとき、土壌Zの性状に応じて、土等の侵入を防
止するために、真空抽出井1の周囲に粗砂を詰めたり、
シュロやスクリーンを設けたりすることができる。
Each of the vacuum extraction wells 1 shown in FIG.
It is constituted by spirally winding a wire 3 around the steel rod 2, and in a portion buried in the soil Z, through a gap between the wires 3 and a gap between the steel rod 2 and the wire 3. It sucks a gas containing an organic halogenated substance and water vapor. The vacuum extraction well 1 is not limited to the embodiment shown in FIG. 1 as long as the organic halogenated substance can be extracted from the soil using the vacuum pump 12. A porous tube formed by dispersion may be used. The burial of the vacuum extraction well 1 is carried out, for example, in a borehole having a diameter of 200 mm and a diameter of 150 mm
As in the case of inserting a vacuum extraction well 1 mm in diameter, the vacuum extraction well 1 is inserted into a drilled hole larger than the diameter of the vacuum extraction well 1. At this time, depending on the properties of the soil Z, coarse sand is packed around the vacuum extraction well 1 to prevent intrusion of soil or the like,
Palms and screens can be provided.

【0014】鋼棒2の上端は、溶接等によって鋼管4に
連接され、その鋼管4は配管5を介して気液分離器10
に接続されている。気液分離器10には、ステンレス繊
維等を塊状にした、飛沫を付着除去するデミスター11
が内装されている。気液分離器10は配管13を介して
真空ポンプ12と接続されている。上記構成により、土
壌Z中の有機ハロゲン化物質および水蒸気を含んだ気体
を真空吸引によって抽気すると共に、混入している水分
を真空ポンプ12の吸気側において気液分離器10で分
離できるようになっている。気液分離器10によって分
離された水はドレイン14から排水として排出される
が、排水中の有機ハロゲン物質による二次汚染防止の観
点から、気液分離器10中で空気を吹込み、エアレーシ
ョンによって水中の有機ハロゲン化物質を追い出すか、
あるいは加熱により追い出して、有機ハロゲン化物質を
含まない水として放出することが望ましい。
The upper end of the steel rod 2 is connected to a steel pipe 4 by welding or the like, and the steel pipe 4 is connected via a pipe 5 to a gas-liquid separator 10.
It is connected to the. The gas-liquid separator 10 is provided with a demister 11 that clumps stainless fibers or the like and attaches and removes droplets.
Is decorated. The gas-liquid separator 10 is connected to a vacuum pump 12 via a pipe 13. According to the above configuration, a gas containing an organic halogenated substance and water vapor in the soil Z is extracted by vacuum suction, and mixed water can be separated by the gas-liquid separator 10 on the suction side of the vacuum pump 12. ing. The water separated by the gas-liquid separator 10 is discharged from the drain 14 as wastewater. From the viewpoint of preventing secondary contamination by the organic halogen substance in the wastewater, air is blown into the gas-liquid separator 10 and aerated. Drive out organic halogenated substances in the water,
Alternatively, it is desirable to expel by heating and release as water free of organic halogenated substances.

【0015】前述した真空ポンプ12としては、例え
ば、真空抽出井から有機ハロゲン化物質を抽気できるも
のであれば、スクリュー式の真空ポンプ等の非水封式真
空ポンプ、ナッシュポンプ等の水封式真空ポンプなどの
任意の真空ポンプが使用できる。
As the above-described vacuum pump 12, for example, a non-water-sealed vacuum pump such as a screw vacuum pump and a water-sealed vacuum pump such as a Nash pump, as long as it can extract organic halogenated substances from a vacuum extraction well. Any vacuum pump, such as a vacuum pump, can be used.

【0016】土壌中から吸引した有機ハロゲン化物質を
含む気体は、その吸引時の温度での相対湿度が飽和に近
かったり、水滴を含むことが多いために、図1に示す態
様においては、含有する水分を気液分離器10で除去し
ている。しかし、吸引した気体の相対湿度が低く、水滴
を含まないため、気液分離を必要としない場合には、気
液分離器10を含まない態様とすることもできる。
In the embodiment shown in FIG. 1, the gas containing the organic halide substance sucked from the soil is contained in the embodiment shown in FIG. 1 because the relative humidity at the temperature at the time of suction is close to saturation or contains water droplets in many cases. The formed water is removed by the gas-liquid separator 10. However, since the sucked gas has a low relative humidity and does not include water droplets, the gas-liquid separator 10 may not be included when gas-liquid separation is not required.

【0017】真空ポンプ12の排気側には配管15を介
して常圧低温プラズマ装置が接続されており、気液分離
器10で気液分離された有機ハロゲン化物質を含む気体
が真空ポンプ12によって常圧低温プラズマ装置に移送
される。常圧低温プラズマ装置においては、移送された
気体中の有機ハロゲン化物質がプラズマと反応して分解
され、分解反応後の気体が常圧低温プラズマ装置から排
出される。常圧低温プラズマ装置とは、常圧下におい
て、電子温度のみが極めて高い状態となっているプラズ
マを生じさせるプラズマ装置であって有機ハロゲン化物
質を分解することができるものであれば良く、好ましく
は常圧低温マイクロ波プラズマ装置または常圧低温放電
プラズマ装置が挙げられ、図1では常圧低温マイクロ波
プラズマ装置20を示している。
An atmospheric pressure low-temperature plasma apparatus is connected to the exhaust side of the vacuum pump 12 via a pipe 15, and the gas containing the organic halide separated by the gas-liquid separator 10 is separated by the vacuum pump 12. It is transferred to a normal-pressure low-temperature plasma device. In the normal-pressure low-temperature plasma apparatus, the organic halogenated substance in the transferred gas reacts with the plasma to be decomposed, and the gas after the decomposition reaction is discharged from the normal-pressure low-temperature plasma apparatus. The normal-pressure low-temperature plasma device is a plasma device that generates plasma in which only the electron temperature is extremely high under normal pressure, as long as it can decompose an organic halide substance, and is preferably used. An ordinary-pressure low-temperature microwave plasma apparatus or an ordinary-pressure low-temperature discharge plasma apparatus is mentioned. FIG. 1 shows an ordinary-pressure low-temperature microwave plasma apparatus 20.

【0018】図1の常圧低温マイクロ波プラズマ装置2
0は、マイクロ波源21を有し、これは導波管22によ
ってマイクロ波空洞23に接続されており、マイクロ波
空洞23の中には容器24が設置されている。マイクロ
波源21のスイッチが入るとマイクロ波空洞23内にマ
イクロ波の場が発生し、その中に設置される容器24内
にもマイクロ波の場が発生する。容器24にはガス入口
27が設けられており、真空ポンプ12の排気側に接続
された配管15から移送される有機ハロゲン化物質を含
む気体が前記ガス入口27を通じて容器24内に導入さ
れ、プラズマ26の燃料となる。プラズマ26を発生さ
せるのに通常必要とされるマイクロ波の出力は0.3〜
5kWである。容器24内のプラズマ26が高温になる
ことに鑑みて、容器壁は石英などの耐熱材で造られる。
The normal-pressure low-temperature microwave plasma apparatus 2 shown in FIG.
0 has a microwave source 21 which is connected by a waveguide 22 to a microwave cavity 23 in which a container 24 is placed. When the microwave source 21 is turned on, a microwave field is generated in the microwave cavity 23, and a microwave field is also generated in the container 24 installed therein. The container 24 is provided with a gas inlet 27, and a gas containing an organic halogenated substance transferred from the pipe 15 connected to the exhaust side of the vacuum pump 12 is introduced into the container 24 through the gas inlet 27, and the plasma 26 fuels. The microwave power normally required to generate the plasma 26 is between 0.3 and
5 kW. In view of the high temperature of the plasma 26 in the container 24, the container wall is made of a heat-resistant material such as quartz.

【0019】容器24には点火口28も設けられてお
り、プラズマを生起させる際に、点火口28を通じて電
極29が挿入される。電極29が容器24内に存在する
ことによって、電極29の先端に隣接した部位のマイク
ロ波の場の強さが増大し、この領域のマイクロ波の場の
強さが充分大きくなると放電が始まる。その結果、電極
29の周辺の気体がイオン化し、プラズマ26が形成さ
れて容器24内の上部に浮遊する。容器24内にプラズ
マ26が生起した後、電極29は容器24から引き抜か
れる。電極29は尖った先端を有する細長い部材であ
り、導電材料で造られていればよいが、マイクロ波の場
に影響を与えないという観点から、電極材料としては炭
素繊維が好ましい。容器24内のプラズマ26の大きさ
は、マイクロ波源21の出力レベルを変化させることに
よって調節される。容器24の下部には排気口25が設
けられており、有機ハロゲン化物質がプラズマと反応し
た後のガスが排気口25から排気される。
The container 24 is also provided with an ignition port 28, and an electrode 29 is inserted through the ignition port 28 when generating plasma. The presence of the electrode 29 in the container 24 increases the intensity of the microwave field at a portion adjacent to the tip of the electrode 29, and discharge starts when the intensity of the microwave field in this region becomes sufficiently large. As a result, the gas around the electrode 29 is ionized, and the plasma 26 is formed and floats on the upper part in the container 24. After the plasma 26 is generated in the container 24, the electrode 29 is pulled out of the container 24. The electrode 29 is an elongated member having a pointed tip, and may be made of a conductive material. From the viewpoint of not affecting the microwave field, the electrode material is preferably carbon fiber. The size of the plasma 26 in the container 24 is adjusted by changing the output level of the microwave source 21. An exhaust port 25 is provided at a lower portion of the container 24, and a gas after the organic halide reacts with the plasma is exhausted from the exhaust port 25.

【0020】図2は、本発明の土壌の無害化処理装置に
使用することができる常圧低温プラズマ装置の別の態様
である、常圧低温放電プラズマ装置の縦断面図である。
図2の円筒形の常圧低温放電プラズマ装置はパックドベ
ッド式放電のものであり、内部電極31および外部電極
32を有しており、プラズマ処理室39内であって、両
電極の間に粒状多孔質吸着剤33と粒状強誘電体物質3
4が物理混合されて充填されている。内部電極31と外
部電極32の間には、電源35によって高電圧が印加さ
れる。プラズマ処理室39の両端にはテフロン製キャッ
プ36および押え板37が設けられている。また、該装
置はガス入口38を有しており、有機ハロゲン化物質を
含む気体が前記ガス入口38から導入される。導入され
た有機ハロゲン化物質を含む気体は、矢印aの流路で一
端側のテフロン製押さえ板37の透孔を通って多孔質吸
着剤33を強誘電体物質34に混合して充填したプラズ
マ処理室39に導入され、有機ハロゲン化物質がプラズ
マにより分解処理された後、処理後の気体は他端側の押
さえ板37の透孔から矢印bで示す流れとして、排気口
40から排出される。
FIG. 2 is a vertical sectional view of a normal-pressure low-temperature discharge plasma apparatus which is another embodiment of the normal-pressure low-temperature plasma apparatus which can be used in the soil detoxification apparatus of the present invention.
The cylindrical normal-pressure low-temperature discharge plasma apparatus shown in FIG. 2 is of a packed-bed discharge type and has an internal electrode 31 and an external electrode 32. Porous adsorbent 33 and granular ferroelectric substance 3
4 are physically mixed and filled. A high voltage is applied between the internal electrode 31 and the external electrode 32 by the power supply 35. At both ends of the plasma processing chamber 39, a Teflon cap 36 and a holding plate 37 are provided. The apparatus also has a gas inlet 38 through which a gas containing an organic halogenated substance is introduced. The introduced gas containing the organic halogenated substance is mixed with the porous adsorbent 33 into the ferroelectric substance 34 through the through hole of the Teflon-made pressing plate 37 at one end in the flow path indicated by the arrow a to fill the plasma. After being introduced into the processing chamber 39 and the organic halogenated substance is decomposed by the plasma, the processed gas is discharged from the exhaust port 40 as a flow indicated by an arrow b through the through hole of the holding plate 37 at the other end. .

【0021】多孔質吸着剤33としてはプラズマを発生
させるという観点から、非導電性物質が用いられ、無機
多孔質物質が好ましく、例えば、Al、Si
、ゼオライト(A型、X型、Y型など)、TiO
等が挙げられる。強誘電体物質34および多孔質吸着剤
33は、充填層中に気体の通路を形成し得るようにする
ため粒状であることが好ましい。粒剤のサイズは、円柱
体の底面、楕円ないしは球状体の直径が1〜3mm、よ
り好ましくは1〜2mmである。電源35によって内部
電極31と外部電極32の間に印加する電圧は、処理す
る気体中の有機ハロゲン化物質の濃度等により変化する
が、通常1〜10kV/cm、好ましくは1〜5kV/
cmである。
As the porous adsorbent 33, a non-conductive substance is used from the viewpoint of generating plasma, and an inorganic porous substance is preferable. For example, Al 2 O 3 , Si
O 2 , zeolite (A type, X type, Y type, etc.), TiO 2
And the like. The ferroelectric substance 34 and the porous adsorbent 33 are preferably in a granular form so that a gas passage can be formed in the packed bed. As for the size of the granule, the diameter of the bottom surface of the cylindrical body, the ellipse or the spherical body is 1 to 3 mm, and more preferably 1 to 2 mm. The voltage applied between the internal electrode 31 and the external electrode 32 by the power supply 35 varies depending on the concentration of the organic halogenated substance in the gas to be treated and the like, but is usually 1 to 10 kV / cm, preferably 1 to 5 kV / cm.
cm.

【0022】常圧低温放電プラズマ装置としては、図2
に示したものの他に、例えば、沿面放電、バリア放電、
パルス放電またはキャピラリチューブ式放電などの放電
方法を用いるプラズマ装置が挙げられるが、これらに限
定されるものではない。
FIG. 2 shows an ordinary-pressure low-temperature discharge plasma apparatus.
In addition to those shown in, for example, surface discharge, barrier discharge,
Examples include, but are not limited to, a plasma device using a discharge method such as pulse discharge or capillary tube discharge.

【0023】常圧低温プラズマ装置による処理後の排ガ
スはそのまま放出することができるが、前記排ガスをさ
らにアルカリ液と接触させる手段によって中和処理した
後に放出することもできる。図1に示される態様におい
ては、常圧低温プラズマ装置の後に常圧低温プラズマ装
置による処理後の排ガスをアルカリ液と接触させる手段
が接続されている。この構成により、常圧低温プラズマ
装置において有機ハロゲン化物質が分解処理される場合
に副生する塩化水素のようなハロゲン化水素類の酸性ガ
スをアルカリ液中に吸収させ、処理後の排ガス中に含ま
れる有害な酸性ガスによる二次的汚染を防止することが
可能となる。排ガスをアルカリ液と接触させる手段とし
ては、上述のように常圧低温プラズマ装置において副生
するハロゲン化水素ガスをアルカリ液と接触させ、排ガ
スを中和することができるものであれば任意の手段が可
能であり、例えば、ハロゲン化水素類を含む処理後の排
ガスにアルカリ水溶液を散液供給して気液接触させる手
段を有するアルカリスクラバー、または空気通過孔の極
く細かい特殊多孔質板にハロゲン化水素を含む処理後の
排ガスを通し、微細な気泡を作り多孔質板上のアルカリ
液に接触させる手段を有する充填塔等が挙げられる。排
ガスをアルカリ液と接触させるための手段としては、経
済性、効率性という観点から図1に示されるようなアル
カリスクラバー40であることが好ましい。
The exhaust gas after the treatment by the normal-pressure low-temperature plasma apparatus can be released as it is, but can also be released after the exhaust gas is further subjected to a neutralization treatment by means of contacting with an alkaline solution. In the embodiment shown in FIG. 1, a means for contacting the exhaust gas treated by the normal-pressure low-temperature plasma device with the alkali liquid is connected after the normal-pressure low-temperature plasma device. With this configuration, when an organic halogenated substance is decomposed in a normal-pressure low-temperature plasma apparatus, an acid gas of hydrogen halides such as hydrogen chloride produced as a by-product is absorbed in the alkaline liquid, and the gas is treated in the exhaust gas after the treatment. It is possible to prevent secondary contamination due to the contained harmful acidic gas. As a means for bringing the exhaust gas into contact with the alkaline liquid, any means can be used as long as the hydrogen halide gas by-produced in the normal-pressure low-temperature plasma apparatus can be brought into contact with the alkaline liquid to neutralize the exhaust gas. For example, an alkali scrubber having a means for spraying and supplying an aqueous alkali solution to a treated exhaust gas containing hydrogen halides to make gas-liquid contact, or a special porous plate having an extremely fine air passage hole may be used. A packed tower or the like having a means for passing the treated exhaust gas containing hydrogen hydride to form fine bubbles and contact the alkaline solution on the porous plate is exemplified. The means for bringing the exhaust gas into contact with the alkaline liquid is preferably an alkaline scrubber 40 as shown in FIG. 1 from the viewpoint of economy and efficiency.

【0024】アルカリスクラバー40はラシヒリングや
テラレットパッキンなどの接触材42を充填した充填塔
43の下部水槽44と、接触材42の上方に設けた散液
ノズル45とを循環ポンプ46を介装した循環用配管を
介して接続し、下部水槽44は比較的濃度の高いアルカ
リ液の貯留タンク48と、補給ポンプ47を介した補給
管49で接続されて構成されている。循環用配管にはア
ルカリ水溶液のpHを測定するpH計が付設され、この
pH計で測定されるアルカリ水溶液のpHが一定の値に
維持されるように補給ポンプ47をオン−オフ制御する
ように構成することができる。また、充填塔43の下部
には常圧低温プラズマ装置から排気されるハロゲン化水
素を含む気体を塔内に導入するためのガス入口41が設
けられており、充填塔43の上部には処理後の気体を排
出するための排気口50が設けられている。この構成に
より、常圧低温プラズマ装置における有機ハロゲン化物
質の分解により生じたハロゲン化水素類の酸性ガスは、
ガス入口41から充填塔43内へ供給され、充填塔43
の散液ノズル45から散液流下されたアルカリ水溶液と
接触する。この結果、酸性ガス成分はアルカリ水溶液中
に吸収除去され、処理後の気体が排気口50から排気さ
れる。
The alkaline scrubber 40 has a lower water tank 44 of a packed tower 43 filled with a contact material 42 such as Raschig ring or teralet packing, and a spray nozzle 45 provided above the contact material 42 with a circulation pump 46 interposed therebetween. The lower water tank 44 is connected through a circulation pipe, and is connected to a storage tank 48 of a relatively high concentration alkaline solution by a supply pipe 49 via a supply pump 47. A pH meter for measuring the pH of the alkaline aqueous solution is attached to the circulation pipe, and the supply pump 47 is controlled to be on and off so that the pH of the alkaline aqueous solution measured by the pH meter is maintained at a constant value. Can be configured. Further, a gas inlet 41 for introducing a gas containing hydrogen halide exhausted from the normal-pressure low-temperature plasma apparatus into the tower is provided at a lower part of the packed tower 43, and a gas inlet 41 is provided at an upper part of the packed tower 43 after treatment. An exhaust port 50 for discharging the gas is provided. With this configuration, the acidic gas of hydrogen halides generated by the decomposition of the organic halogenated substance in the normal-pressure low-temperature plasma device is:
The gas is supplied from the gas inlet 41 into the packed tower 43,
From the spray nozzle 45 of the spray solution. As a result, the acidic gas component is absorbed and removed in the aqueous alkaline solution, and the treated gas is exhausted from the exhaust port 50.

【0025】排ガスをアルカリ水溶液と接触させる手段
で用いられるアルカリ液としては、ハロゲン化水素類を
中和できるものであれば任意のものを用いることができ
るが、経済性および取り扱いの容易性という観点から、
水酸化ナトリウム水溶液または炭酸ナトリウム水溶液が
好ましい。また、アルカリ液はアルカリ性であればいか
なるpHの液も使用可能であるが、装置の耐久性、中和
効率および取り扱いの容易性等を考慮してpHが8.0
〜12.0の範囲が好ましい。
As the alkaline liquid used in the means for bringing the exhaust gas into contact with the aqueous alkaline solution, any alkaline liquid can be used as long as it can neutralize hydrogen halides, but from the viewpoint of economy and easy handling. From
An aqueous sodium hydroxide solution or an aqueous sodium carbonate solution is preferred. As the alkaline solution, any pH solution can be used as long as it is alkaline. However, the pH is 8.0 in consideration of the durability of the apparatus, the neutralization efficiency, the ease of handling, and the like.
The range of ~ 12.0 is preferred.

【0026】[0026]

【発明の効果】以上説明したように、請求項1に係る発
明の有機ハロゲン化物質を含む土壌の無害化処理装置に
よれば、土壌中に含まれる有機ハロゲン化物質を土壌中
から抽気して常圧低温プラズマ装置で分解処理するの
で、有機ハロゲン化物質が大気中に拡散されるような環
境上の問題を引き起こすようなことがない。また、土壌
中に存在する有機ハロゲン化物質を単離するだけでなく
直接分解することが可能となるため、吸着処理法におけ
る脱離後の無害化処理が不要になる。また、抽気した気
体中に含まれる有機ハロゲン化物質が低濃度であって
も、触媒処理法における濃縮等の操作が不要なため低コ
ストで効率的に分解することができる。さらに、従来の
手段による有機ハロゲン化物質の処理に比べ設備面およ
びスペース面で有利である。
As described above, according to the apparatus for detoxifying a soil containing an organic halogenated substance according to the first aspect of the present invention, the organic halogenated substance contained in the soil is extracted from the soil. Since the decomposition treatment is performed by the normal-pressure low-temperature plasma apparatus, an environmental problem such as the diffusion of the organic halogenated substance into the air is not caused. Further, since the organic halogenated substance present in the soil can be directly decomposed as well as isolated, the detoxification treatment after desorption in the adsorption treatment method becomes unnecessary. Further, even if the concentration of the organic halogenated substance contained in the extracted gas is low, it can be efficiently decomposed at low cost because an operation such as concentration in the catalyst treatment method is unnecessary. Further, it is advantageous in terms of equipment and space as compared with the treatment of organic halogenated substances by conventional means.

【0027】また、請求項2に係る発明の有機ハロゲン
化物質を含む土壌の無害化処理装置によれば、土壌中に
含まれる有機ハロゲン化物質を土壌中から抽気した後
に、気液分離装置によって水分を分離できるので、請求
項1に係る発明の効果に加え、水分を含み、相対湿度が
飽和に近い様な土壌であっても、有機ハロゲン化物質を
効率的に無害化処理することができる。
According to the detoxification apparatus for soil containing an organic halogenated substance according to the second aspect of the present invention, after the organic halogenated substance contained in the soil is extracted from the soil, the gas-liquid separation apparatus is used. Since water can be separated, in addition to the effect of the invention according to claim 1, even in soil containing water and the relative humidity is close to saturation, the organic halogenated substance can be efficiently detoxified. .

【0028】また、請求項3に係る発明の有機ハロゲン
化物質を含む土壌の無害化処理装置によれば、有機ハロ
ゲン化物質を含む土壌から、有機ハロゲン化物質を含む
気体を抽気し、気体中の有機ハロゲン化物質を常圧低温
プラズマ装置で分解処理し、さらに前記分解処理によっ
て生じるハロゲン化水素を中和して除去する手段を有す
ることから、請求項1および2に係る発明の装置による
効果に加え、酸性物質であるハロゲン化水素による二次
汚染を防止でき、全体として有機ハロゲン化物質を経済
的かつ効率よく無害化処理できることとなる。
According to the detoxification apparatus for soil containing an organic halogenated substance according to the third aspect of the present invention, a gas containing an organic halogenated substance is extracted from soil containing an organic halogenated substance, and the gas is extracted from the soil. 3. The apparatus according to claim 1, wherein the organic halogenated substance is decomposed by a low-temperature plasma apparatus under normal pressure and means for neutralizing and removing hydrogen halide generated by the decomposition processing is provided. In addition, secondary contamination by hydrogen halide, which is an acidic substance, can be prevented, and the organic halogenated substance can be economically and efficiently detoxified as a whole.

【0029】また、請求項4に係る発明の有機ハロゲン
化物質を含む土壌の無害化処理装置によれば、請求項
1、請求項2および請求項3に係る発明の装置による効
果をより優れたものにすることができる。
According to the detoxifying apparatus for soil containing an organic halogenated substance according to the fourth aspect of the present invention, the effects of the apparatuses according to the first, second and third aspects are more excellent. Can be something.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 図1は本発明に係る土壌の無害化処理装置の
一態様を示すフローシートである。
FIG. 1 is a flow sheet showing one embodiment of an apparatus for detoxifying soil according to the present invention.

【図2】 図2は本発明に係る土壌の無害化処理装置に
用いることができる常圧低温放電プラズマ処理装置の一
態様である。
FIG. 2 is an embodiment of a normal-pressure low-temperature discharge plasma processing apparatus that can be used in the soil detoxification processing apparatus according to the present invention.

【符号の説明】[Explanation of symbols]

1 真空抽出井 10 気液分離器 12 真空ポンプ 20 常圧低温マイクロ波プラズマ装置 40 アルカリスクラバー DESCRIPTION OF SYMBOLS 1 Vacuum extraction well 10 Gas-liquid separator 12 Vacuum pump 20 Normal-pressure low-temperature microwave plasma apparatus 40 Alkaline scrubber

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 有機ハロゲン化物質を含有する土壌中に
埋設された真空抽出井と、前記真空抽出井を通して気体
を吸引する真空ポンプと、前記真空ポンプにより吸引し
た気体に含まれる有機ハロゲン化物質を分解処理する常
圧低温プラズマ装置とを有することを特徴とする有機ハ
ロゲン化物質を含有する土壌の無害化処理装置。
1. A vacuum extraction well buried in soil containing an organic halogenated substance, a vacuum pump for sucking a gas through the vacuum extraction well, and an organic halogenated substance contained in the gas sucked by the vacuum pump. And a normal-pressure low-temperature plasma device for decomposing the soil, the detoxification device for soil containing an organic halogenated substance.
【請求項2】 請求項1に記載の土壌の無害化処理装置
であって、真空ポンプによって吸引した気体から水分を
分離する気液分離器をさらに有することを特徴とする有
機ハロゲン化物質を含有する土壌の無害化処理装置。
2. The apparatus for detoxifying soil according to claim 1, further comprising a gas-liquid separator for separating water from gas sucked by a vacuum pump, wherein the organic halogenated substance is contained. Of detoxifying soil.
【請求項3】 請求項1または請求項2に記載の土壌の
無害化処理装置であって、常圧低温プラズマ装置による
処理後の排ガスをアルカリ液と接触させる手段をさらに
有することを特徴とする有機ハロゲン化物質を含む土壌
の無害化処理装置。
3. The detoxifying apparatus for soil according to claim 1, further comprising a means for bringing the exhaust gas after the treatment with the normal-pressure low-temperature plasma apparatus into contact with an alkali solution. Detoxification equipment for soil containing organic halogenated substances.
【請求項4】 請求項1、請求項2または請求項3に記
載の有機ハロゲン化物質を含む土壌の無害化処理装置で
あって、常圧低温プラズマ装置が常圧低温マイクロ波プ
ラズマ装置または常圧低温放電プラズマ装置である有機
ハロゲン化物質を含む土壌の無害化処理装置。
4. An apparatus for detoxifying a soil containing an organic halogenated substance according to claim 1, 2 or 3, wherein the normal-pressure low-temperature plasma apparatus is a normal-pressure low-temperature microwave plasma apparatus or a normal-pressure low-temperature microwave plasma apparatus. Detoxification equipment for soil containing organic halogenated substances, which is a high-pressure low-temperature discharge plasma apparatus.
JP33427099A 1999-11-25 1999-11-25 Treating apparatus for making soil containing halogenated organic substance harmless Pending JP2001149915A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33427099A JP2001149915A (en) 1999-11-25 1999-11-25 Treating apparatus for making soil containing halogenated organic substance harmless

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Publication Number Publication Date
JP2001149915A true JP2001149915A (en) 2001-06-05

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CN105457969A (en) * 2015-11-20 2016-04-06 同济大学 Harmless treatment method for building waste polluted by organic pollutants
US20190134686A1 (en) * 2017-02-20 2019-05-09 Korea Railroad Research Institute Thermal desorption system for oil-contaminated soil and gravel, using microwave indirect irradiation method and including microwave leakage prevention device and preheating device using waste heat, and thermal desorption method for oil-contaminated soil and gravel, using same
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