JP2001142215A5 - - Google Patents

Download PDF

Info

Publication number
JP2001142215A5
JP2001142215A5 JP1999327091A JP32709199A JP2001142215A5 JP 2001142215 A5 JP2001142215 A5 JP 2001142215A5 JP 1999327091 A JP1999327091 A JP 1999327091A JP 32709199 A JP32709199 A JP 32709199A JP 2001142215 A5 JP2001142215 A5 JP 2001142215A5
Authority
JP
Japan
Prior art keywords
group
substituent
alkyl group
hydrogen atom
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999327091A
Other languages
English (en)
Japanese (ja)
Other versions
JP3936503B2 (ja
JP2001142215A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP32709199A priority Critical patent/JP3936503B2/ja
Priority claimed from JP32709199A external-priority patent/JP3936503B2/ja
Publication of JP2001142215A publication Critical patent/JP2001142215A/ja
Publication of JP2001142215A5 publication Critical patent/JP2001142215A5/ja
Application granted granted Critical
Publication of JP3936503B2 publication Critical patent/JP3936503B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP32709199A 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物 Expired - Lifetime JP3936503B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32709199A JP3936503B2 (ja) 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32709199A JP3936503B2 (ja) 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JP2001142215A JP2001142215A (ja) 2001-05-25
JP2001142215A5 true JP2001142215A5 (cg-RX-API-DMAC7.html) 2005-07-14
JP3936503B2 JP3936503B2 (ja) 2007-06-27

Family

ID=18195201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32709199A Expired - Lifetime JP3936503B2 (ja) 1999-11-17 1999-11-17 ポジ型フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP3936503B2 (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7192681B2 (en) 2001-07-05 2007-03-20 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4831277B2 (ja) * 2001-07-13 2011-12-07 信越化学工業株式会社 高分子化合物、レジスト材料、及びパターン形成方法
KR101035881B1 (ko) 2003-03-14 2011-05-20 후지필름 가부시키가이샤 감광성 조성물
JP4494161B2 (ja) * 2004-10-14 2010-06-30 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP4533756B2 (ja) * 2005-01-07 2010-09-01 富士フイルム株式会社 イオン注入工程用ポジ型レジスト組成物及びそれを用いたイオン注入方法
JP4712077B2 (ja) * 2008-07-31 2011-06-29 富士フイルム株式会社 ポジ型感光性組成物
JP5568354B2 (ja) 2009-03-31 2014-08-06 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法

Similar Documents

Publication Publication Date Title
JP2001330947A5 (cg-RX-API-DMAC7.html)
JP2004004834A5 (cg-RX-API-DMAC7.html)
JP2000267287A5 (cg-RX-API-DMAC7.html)
JPH11327147A5 (cg-RX-API-DMAC7.html)
JP2003114522A5 (cg-RX-API-DMAC7.html)
JP2002341539A5 (cg-RX-API-DMAC7.html)
JPH11218918A5 (cg-RX-API-DMAC7.html)
JP2000098613A5 (cg-RX-API-DMAC7.html)
JP2000231194A5 (cg-RX-API-DMAC7.html)
JP2004101642A5 (cg-RX-API-DMAC7.html)
JP2000010287A5 (cg-RX-API-DMAC7.html)
JP2002323768A5 (cg-RX-API-DMAC7.html)
JP2004053822A5 (cg-RX-API-DMAC7.html)
JPH10239846A5 (cg-RX-API-DMAC7.html)
JP2001117232A5 (cg-RX-API-DMAC7.html)
JP2000187329A5 (cg-RX-API-DMAC7.html)
JP2002236358A5 (cg-RX-API-DMAC7.html)
JP2000347410A5 (cg-RX-API-DMAC7.html)
JP2000352822A5 (cg-RX-API-DMAC7.html)
JP2004078105A5 (cg-RX-API-DMAC7.html)
JP2003192665A5 (cg-RX-API-DMAC7.html)
JP2001100417A5 (cg-RX-API-DMAC7.html)
JP2000321771A5 (cg-RX-API-DMAC7.html)
JP2001133978A5 (cg-RX-API-DMAC7.html)
JP2002202606A5 (cg-RX-API-DMAC7.html)