JP2001138337A - Mold for deformed semispherical microstructure, micro- concave mirror, and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a mold for a deformed semispherical microstructure such as an oval spherical element suitable as a mirror for coupling lights in horizontal and vertical directions, a micro-concave mirror, and a method for manufacturing the same. SOLUTION: A method for manufacturing a mold for a deformed semispherical microstructure includes a process for preparing a substrate 1 having a conductive part 13 provided in at least a part thereof, a process for forming an insulating mask layer 15 on the substrate, a process for forming aperture parts 17 to the mask layer 15 and a process for forming plating layers 19 on the aperture parts 17 and the mask layer 15 through the aperture parts 17 by electroplating using the conductive part 13 as a cathode. A plating liquid is allowed to flow on the aperture parts 17 relatively with respect to the substrate to form the deformed semispherical plating layers 19.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold for a deformable hemispherical microstructure such as an ellipsoidal sphere, which can be easily formed into an array, a micro concave mirror, and a method of manufacturing the same.

[0002]

2. Description of the Related Art In recent years, in order to realize large-capacity optical communication and optical interconnection, researches on arranging a plurality of laser elements in an array and transmitting optical information in parallel have been advanced. Surface emitting lasers (Vertical Cavity) as light emitting devices suitable for arraying and having a low threshold value
Surface Emitting Laser: V
CSEL) has attracted attention. Light emitting diodes are also widely used because of their low cost. In order to apply such a planar optical device to an optical interconnection that connects between boards or chips with light, it is necessary to optically couple a waveguide for transmitting light and the planar optical device. There is a demand for a structure having a high coupling efficiency.

An optical device (which may be a light emitting element, a light receiving element, or a waveguide such as an optical fiber) which emits / receives light in a vertical direction with respect to a certain substrate and guides light in a direction parallel to the substrate. As means for coupling with the optical waveguide, it is known that a 45 ° mirror is formed on the substrate, and a diffraction grating that couples the horizontal direction and the vertical direction is provided on the substrate.

[0004]

However, such an optical coupling means has the following problems. In the case of, for example, since the light from the light emitting element is divergent light,
When coupled to the optical waveguide via the 45 ° mirror as it is, there is a problem that the coupling efficiency is reduced. Therefore, it is necessary to insert a lens for condensing light between the light emitting element and the 45 ° mirror, but in that case, the structure becomes complicated. Further, in order to improve the coupling efficiency, a type in which a mirror portion is curved to have a cylindrical structure has been proposed (Japanese Patent Laid-Open No. 5-264870). However, since there is no light condensing action in the horizontal direction, a decrease in coupling efficiency cannot be denied.

In the case of (1), the diffraction efficiency of a diffraction grating that converts vertical light into horizontal light is limited.
It is difficult to obtain high coupling efficiency. Further, in order to improve the efficiency of the diffraction grating, it is necessary to increase the area, and there is a limit to miniaturization. In addition, the diffraction grating that converts vertical divergent light into horizontal focused light has a complicated pattern,
The interference exposure method is difficult to manufacture, and requires a special method such as electron beam lithography.

On the other hand, for manufacturing a structure having a curved surface or a mold for the structure, a metal convex structure is formed by electrolytic plating as proposed in Japanese Patent Application Laid-Open No. Hei 6-27302. A method of forming the mirror is known, but this is a method in which a metal is grown isotropically around the cathode portion, and in order to form a mirror that couples the light in the horizontal direction and the vertical direction as described above. It is not suitable for use in the production of the metal mold.

The present invention has been made in view of the above-mentioned problems of the prior art, and has as its object to provide an elliptical sphere or the like suitable as a mirror for coupling light in the horizontal and vertical directions. Molds for deformed hemispherical microstructures,
It is an object of the present invention to provide a micro concave mirror, a method of manufacturing the same, and the like.
(2) suitable for arraying micro concave mirrors, (3) micro concave mirrors can be manufactured at relatively low cost, (4) large curvature of micro concave mirrors and suitable for miniaturizing it,
(5) It has both the function of a 45 ° mirror and the function of a lens,
An object of the present invention is to provide a method for manufacturing a micro concave mirror, which is suitable for coupling a surface optical device and an optical waveguide.

[0008]

Since the optical axis of a concave mirror having both the function of a 45 ° mirror and the function of a lens is broken, attention must be paid to the shape of the reflecting surface. For example, in the case of a perfectly circular reflecting surface, aberration as a lens is large, and the practicality is poor. On the other hand, an elliptical spherical reflecting surface is advantageous for optical coupling because divergent light from one of the two focal points of the elliptical sphere is converted by reflection into focused light toward the other.

Therefore, the present invention features a micro concave mirror having a substantially elliptical spherical reflecting surface. The micro concave mirror of the present invention that achieves the above object has a shape based on a substrate having a deformed hemispherical microstructure manufactured using the method of manufacturing a deformed hemispherical microstructure mold of the present invention. It is produced by transferring.

Hereinafter, a mold for a deformed hemispherical microstructure such as an ellipsoidal sphere according to the present invention, which is suitable as a mirror for coupling light in the horizontal and vertical directions, a micro concave mirror, and a method of manufacturing the same will be described. The basic configuration and a more specific form will be described.

In order to achieve the above object, the method for producing a mold for a deformed hemispherical microstructure according to the present invention comprises: (1) a substrate having a conductive portion at least in part (a conductive substrate, a substrate having an electrode layer); (2) a step of forming an insulating mask layer on the substrate, (3) a step of forming an opening in the mask layer, and (4) electroplating using the conductive portion as a cathode. Forming a plating layer on the opening and the mask layer through the opening. In the step (4), the plating solution is applied to the substrate at a predetermined flow rate in one direction on the opening relative to the substrate. It is characterized by flowing.

More specifically, the following forms are possible. In the step (4), a plating layer can be grown anisotropically by electroplating.

In the step (3), the opening has a circular shape, and typically, a substantially elliptical spherical plating layer can be formed.

In the step (3), a plurality of openings may be formed on the substrate. Thereby, the plating layer can be formed in an array.

In the step (4), the size and shape of the deformed hemisphere can be controlled by controlling the speed and direction of the flow rate of the plating solution, the plating time, and the temperature of the plating solution.

Further, a mold for a deformed hemispherical microstructure of the present invention for achieving the above object has a form such as a part of an elliptical sphere manufactured by the above-described manufacturing method of the present invention. It is a deformable hemispherical microstructure that can be taken.

In order to achieve the above object, a method of manufacturing a micro concave mirror according to the present invention is a method of applying a mirror material such as a resin onto the deformed hemispherical micro structure die of the present invention. It is characterized in that the mirror material is further peeled off and a deformed hemispherical concave portion is formed in the mirror material.

A reflection film may be formed on at least a part of the surface of the deformed hemispherical concave portion.

In order to achieve the above object, the method for producing a micro concave mirror according to the present invention comprises: (1) a step of preparing a substrate having a conductive portion at least in part; (3) forming a mold using the microstructure mold as a master, and (4) peeling the mold from the mold master. (5) a step of forming the deformed hemispherical convex portion by molding the mold.

After the step (5), a step of forming a reflective film on at least a part of the surface of the deformed hemispherical projection may be included.

The step (2) may include a step of forming a sacrificial layer after forming the plating layer.

In the step (4), the step of peeling the mold from the mold master can be performed by removing the sacrificial layer.

In the step (4), the step of peeling the mold from the mold master can be performed by sequentially etching and removing the substrate and the plating layer.

In the step (3), the step of forming a mold can be performed by forming the mold by plating.

In the step (5), the material on which the deformed hemispherical projections are formed may be a resin.

Further, a micro concave mirror of the present invention for achieving the above object is a micro concave mirror which can be formed by the above manufacturing method of the present invention and can have a curved surface such as a part of an elliptical sphere. .

The operation principle of the present invention will be described. According to the method of manufacturing a mold for a deformed hemispherical microstructure of the present invention, a deformed hemisphere is formed by electroplating a minute opening formed in a mask layer provided on an electrode. When plating is performed on the minute opening, plating first deposits in the opening, and when plating is further performed, a plating layer starts to grow on the opening and the mask layer. In the case of normal electroplating, if the size of the opening is sufficiently smaller or smaller than the anode of electroplating, the plating layer grows isotropically around the opening, and the hemispherical plating layer forms the opening and It is formed on a mask layer.

On the other hand, in the plating method according to the present invention, a plating solution is caused to flow in one direction at a predetermined flow rate over the opening during plating. For this reason, distribution occurs in the metal ion density upstream and downstream of the plating solution, and the ion density is higher on the upstream side. As a result, the growth rate is higher on the upstream side (such a state is expressed as anisotropic in this specification). If the shape of the opening is circular, the plating layer
Its vertex is shaped like an elliptical sphere shifted upstream. By controlling the flow rate of the plating solution, it is possible to change the rate at which the peak shifts.

In such a method of manufacturing a microstructure by electroplating, when the current flowing between the anode and the cathode is stopped when a desired shape is obtained, the deposition of plating can be stopped. Good nature.

The micro concave mirror of the present invention is formed by transferring a deformed hemispherical concave portion onto another substrate using a substrate having the deformed hemispherical plating layer as a mold. Alternatively, the micro concave mirror of the present invention forms a mold having a deformed hemispherical concave portion using the substrate having the deformed hemispherical plating layer as a mold master, and further uses this mold to form a mold on another substrate. It is formed by transferring a deformed hemispherical convex portion.

As described above, since the structure formed by electroplating can be used as it is as a mold, it can be manufactured at low cost without requiring expensive equipment, and can be made larger. Further, the size of the plating can be controlled by in-situ observation by the plating time and the plating temperature, and the size can be easily controlled. By forming a plurality of openings in the mask layer, a micro concave mirror array can be formed using a similar method.

The mold may be peeled off mechanically from the mold. However, when the mold is deformed at the time of peeling due to enlargement or the like, it is possible to adopt a method of sequentially etching and removing the substrate, the mask layer, and the plating layer from the back surface.

When the mold is formed after providing the sacrificial layer on the substrate and the plating layer, the mold and the substrate can be separated by removing the sacrificial layer. In this case, the material of the sacrificial layer is selected so that the mold is not corroded by the etchant for etching the sacrificial layer. If the plating layer and the substrate are not corroded by the etchant that etches the sacrificial layer, the substrate on which the plating layer is formed can be used multiple times as a mold master for the mold, and the same when the mold is deteriorated. The mold can be easily manufactured by the method.

As a material of the micro concave mirror having the deformed hemispherical concave portion, any material such as resin, metal, and insulator can be used as long as it can be formed on the substrate on which the plating layer is formed and can be peeled off. it can. Regarding the material of the mold produced using the substrate on which the plating layer is formed as a mold master, any material such as resin, metal, and insulator can be formed on the substrate on which the plating layer is formed and can be peeled off. Can also be used. In this case, the mold is formed by applying a solution in which a resin, metal, or glass is melted or dissolved to a substrate on which a plating layer is formed, curing the substrate, and then peeling the substrate. As another method, a mold is formed by electroplating a mold on a plating layer using the substrate as a cathode. If a sacrificial layer is used, a mold electrode layer is formed on the sacrificial layer,
Electroplating may be performed using this electrode as a cathode.

It is desirable that the material of the micro concave mirror having the deformed hemispherical convex portions is transparent because light passes through the inside.

[0036]

Embodiments of the present invention will be described below with reference to the drawings.

(First Embodiment) A method of manufacturing a mold for a microstructure according to a first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a cross-sectional view showing a process for producing a deformed hemispherical microstructure similar to a hemisphere, and FIG. 2 is a perspective view of an electroplating bath for explaining an electroplating method.

In FIG. 1, a Cr / A
An electrode layer 13 made of u and a mask layer 15 made of a polyimide film are sequentially formed (FIG. 1A). Next, application, patterning, exposure, development of a photoresist (not shown),
An opening 17 is formed in the mask layer 15 by performing etching. Thereafter, the remaining photoresist is removed (FIG. 1).
(B)). The opening 17 is circular and has a diameter of 1
0 μm. A plurality of openings 17 are two-dimensionally arranged at intervals of 200 μm.

Using this substrate as a work, the electrode 13
As a cathode, nickel nitrate, nickel chloride, boric acid,
Electroplating was performed at a temperature of 50 ° C. and a cathode current density of 5 A / dm ² using a Ni plating solution comprising a brightener.
The method of electroplating will be described with reference to FIG.

In FIG. 2, reference numeral 51 denotes an anode-side electrode;
Is a plating solution. At this time, as shown in FIG.
By rotating the stirrer 55 in one direction in the plating solution 53 immersed in the opening 1 to cause a flow in a certain direction, the opening 1
A flow rate above 7 is allowed to form. Then, since the supply of metal ions is higher on the upstream side than on the downstream side, the growth rate of plating is higher. In this embodiment, the rotation speed of the stirrer 55 is set to 500 rpm, and the opening 17 on the substrate 11 is arranged at a position 1 cm outside the center of rotation. The temperature of the plating solution 53 was 50 ° C., and the cathode current density was 5 A / dm ² .

As a result, the state shown in FIG.
As shown in (d), a substantially elliptical spherical convex portion 19 biased to the right (upstream of the plating solution) was formed. The elliptical sphere formed at this time had a height of 15 μm at the apex, and had a height of 30 μm and a width of 40 μm in the outline (almost elliptical) when the substrate was viewed from above. The reason why such an elliptical spherical convex portion is formed by a flowing plating solution is that a hemispherical convex portion is formed by a stationary plating solution (in this case, the size of the electrode 51 on the anode side is larger than that of the opening portion 17). It is considered that the top portion is slightly shifted to the upstream side due to the flow of the plating solution to form a substantially elliptical sphere. The deformed hemispherical projections 19 formed in this manner cannot be said to be strictly elliptical spheres, but, for example, have a shape close to an elliptical sphere to such a degree as to have a sufficient function as an elliptical curved mirror.

The shapes of the projections 19 of the plurality of microstructure molds manufactured in this embodiment are substantially the same.
It was shown that the method of this example was effective for arraying. If the distance between the openings 17 having a diameter of about 10 μm is increased to about 200 μm, the shape thereof becomes substantially the same regardless of the position of the projections 19 with respect to the flow of the plating solution 53.

In the present embodiment, an elliptical spherical convex portion made of Ni was prepared. However, any convex portion can be used as long as electroplating is possible. For example, a single metal such as Au, Pt, Cr, Cu, Ag, Zn, or the like, or Cu-Zn, Sn-Co, Ni-F
e, an alloy such as Zn-Ni may be used. Further, as the substrate, a metal, a semiconductor such as GaAs, or an insulator such as quartz may be used. When a metal is used, the step of forming an electrode can be omitted.

In addition, the mask layer etching process may be simplified by forming the mask layer with photoresist. Further, in the present embodiment, the flow rate over the opening is given by rotating the plating solution with a stirrer, but any method capable of giving a predetermined flow rate to the plating solution may be used. Alternatively, the flow velocity over the opening may be relatively formed by moving the substrate to be plated in the plating solution.

(Second Embodiment) A method of manufacturing a micro concave mirror according to a second embodiment of the present invention will be described with reference to FIG. FIG. 3 is a cross-sectional view showing a method for manufacturing a micro concave mirror.

In this embodiment, the substrate 111 having the substantially elliptical spherical projections 19 shown in the first embodiment is used as a mold, and an elliptical spherical concave portion is formed to manufacture a micro concave mirror. The method of manufacturing the substrate 111 having the elliptical spherical projections 19 is the same as in the first embodiment, and the same portions as those shown in FIG.

In FIG. 3, first, an elliptical spherical convex portion 19 is formed.
An ultraviolet curing resin 113 is applied on a substrate 111 having (FIG. 3A), a glass substrate 115 serving as a support substrate is placed thereon, and then the resin 113 is cured by irradiating ultraviolet rays (FIG. b)). When the glass substrate 115 was lifted after the resin 113 was cured, the resin 113 was separated from the mold 111, and an elliptical spherical concave portion 117 was formed (FIG. 3).
(C)). Next, a reflective film 119 made of Al was formed in the elliptical spherical concave portion 117, and a micro concave mirror array was manufactured (FIG. 3D).

FIG. 4 shows an example in which an optical device and an optical waveguide are connected by using the micro concave mirror of this embodiment. In FIG.
211 is a GaAs substrate, 213 is a surface emitting laser provided on the substrate 211, 215 is a core 215a and a clad 21
5b, 217 is a resin, 219 is a resin 2
17 is a micro concave mirror provided at 17. The light emitting point of the surface emitting laser 213 is positioned near one focal point of the elliptical micro concave mirror 219, and the left end face of the optical waveguide 215 is positioned near the other focal point of the micro concave mirror 219.

In this configuration, the divergent light from the surface emitting laser 213 is reflected by the micro concave mirror 219 and is reflected by the optical waveguide 2.
15 efficiently coupled. Although not shown in FIG. 4, each device may be arrayed in the depth direction with respect to the paper surface. Further, a light emitting element such as a light emitting diode or a light receiving element such as a photodiode may be used in place of the surface emitting laser 213.

In this embodiment, the micro concave mirror 21
As a material of 7, 219, any material such as resin, metal, and insulator may be used as long as it can be formed on the substrate 111 on which the plating layer 19 is formed and can be peeled off. Further, as the reflection film 219, a metal such as Au or S
It may be a multilayer film such as i / SiO ₂ .

(Third Embodiment) A method for manufacturing a micro concave mirror according to a third embodiment of the present invention will be described with reference to FIGS. 5 and 6 are cross-sectional views illustrating a method for manufacturing a micro concave mirror.

In this embodiment, a mold is formed using the substrate 311 having the elliptical spherical projections 19 shown in the first embodiment as a mold master, and an elliptical spherical projection is formed from the mold. A micro concave mirror is manufactured. Elliptical convex part 19
Is the same as that of the first embodiment, and the same portions are denoted by the same reference numerals.

In FIG. 5, first, an elliptical spherical convex portion 19 is formed.
PSG (Phosphosil) on a substrate 311 having
A sacrifice layer 313 made of silicate glass (FIG. 5A) was formed, and a mold plating electrode 315 made of Ti / Au was formed to form a mold master for the mold (FIG. 5A). 5 (b)). Next, using the mold master as a work, the mold plating electrode 315 as a cathode, a temperature of 50 ° C. and a cathode current density of 5 A in a Ni plating bath.
Ni plating is performed at / dm ² to form a mold 317 (FIG. 5C).

Subsequently, the sacrificial layer 313 is removed by etching with a mixed aqueous solution of hydrofluoric acid and ammonium fluoride, and a mold 317 is formed.
Is peeled off (FIG. 5D). At this time, the Ti of the mold plating electrode 315 was simultaneously etched. Finally, Au of the mold plating electrode 315 was removed by etching with a mixed aqueous solution of iodine and potassium iodide to form a mold having an elliptical spherical concave portion 319 (FIG. 5E).

The substrate 311 after peeling has an elliptical spherical convex portion 19 as shown in FIG. 1D. By performing the process of FIG. 5, it becomes possible to form a mold again. Productivity has improved.

Next, as shown in FIG. 6A, an ultraviolet curable resin 321 is applied to a mold 317, a glass substrate 323 serving as a support substrate is placed thereon, and the resin 32 is irradiated with ultraviolet rays.
1 is cured (FIG. 6 (b), which is shown upside down in FIG. 6). When the glass substrate 323 is lifted after curing,
The resin 321 was separated from the mold 317 to form an elliptical spherical convex portion 325 (FIG. 6C). Next, a reflective film 327 made of Al is formed on the elliptical spherical protrusion 325,
A micro concave mirror array was produced (FIG. 6D).

FIG. 7 shows an example in which an optical device and an optical waveguide are connected using the micro concave mirror of this embodiment. In FIG.
411 is a GaAs substrate, 413 is a surface emitting laser provided on the substrate 411, 415 is an optical waveguide, 417 is a resin,
19 is a micro concave mirror provided on the elliptical spherical convex portion of the resin 417. In this embodiment, the surface emitting laser 41
By using the GaAs substrate 411 provided with the substrate 3 as a support substrate, the micro concave mirror 4
19 can be easily arranged. In FIG. 7, the end face of the resin 417 of the micro concave mirror 419 and the optical waveguide 41 are shown.
Although it is drawn apart from the left end face of 7, it is preferable that both are in close contact or filled with a material having a relatively close refractive index in order to prevent undesired reflection on the end face.
Further, it is preferable that both have the same refractive index.

In this configuration, the divergent light from the surface emitting laser 413 was reflected by the micro concave mirror 419 and efficiently coupled to the optical waveguide 415. Also in this embodiment, although not shown in FIG. 7, each device may be arrayed in the depth direction with respect to the paper surface. Further, a light emitting element such as a light emitting diode or a light receiving element such as a photodiode may be used.

As the material of the mold 317, any material such as resin, metal, and insulator can be used as long as it can be formed on the substrate 311 on which the plating layer 19 is formed and can be peeled off. It is desirable that the material of the micro concave mirror 419 having the convex portion 417 having an elliptical sphere be transparent because light passes through the inside. The method of forming the mold 317 is not limited to the method using the electroplating method, but also includes a method in which a molten or dissolved solution of resin, metal, or glass is applied to the plating layer 1.
Alternatively, the substrate 311 may be formed by applying to the substrate 311 on which the substrate 9 is formed and curing the substrate 311. Further, the reflection film may be a metal such as Au or a multilayer film such as Si / SiO ₂ .

[0060]

As described above, according to the present invention,
It is possible to provide a mold for a deformed hemispherical microstructure such as an ellipsoidal sphere suitable as a mirror, a micro concave mirror, and a method of manufacturing the same. In particular, a surface type optical device having both the function of a 45 ° mirror and the function of a lens A micro concave mirror suitable for coupling the optical waveguide and the like, and a method for manufacturing the same.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view showing a manufacturing process of a microstructure mold according to a first embodiment of the present invention.

FIG. 2 is a perspective view of an electroplating tank showing an electroplating step in the production of the microstructure mold according to the present invention.

FIG. 3 is a sectional view showing a manufacturing process of a micro concave mirror according to a second embodiment of the present invention.

FIG. 4 is a diagram showing an example in which an optical device and an optical waveguide are optically coupled using the micro concave mirror of the second embodiment.

FIG. 5 is a sectional view showing a manufacturing process of a mold for a micro concave mirror according to a third embodiment of the present invention.

FIG. 6 is a sectional view showing a step of manufacturing a micro concave mirror using the micro concave mirror mold of FIG. 5;

FIG. 7 is a diagram showing an example of optically coupling an optical device and an optical waveguide using the micro concave mirror of FIG. 6;

[Description of Signs] 11, 111, 211, 311, 411 Substrate 13, 51, 315 Electrode 15 Mask 17 Opening 19, 325 Elliptical Spherical Convex 53 Plating Solution 55 Stirrer 113, 217, 321, 417 Resin 115, 323 Support substrate 117, 319 Elliptical spherical concave portion 119, 327 Reflective film 213, 413 Surface emitting laser 215, 415 Optical waveguide 215a Optical waveguide core 215b Optical waveguide cladding 219, 419 Micro concave mirror 313 Sacrificial layer 317 Mold

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G02B 5/10 G02B 5/10 C 5F076 / 42 6/42 H01L 33/00 H01L 33/00 M H01S 5 / 022 H01S 5/022 // B29L 11:00 B29L 11:00 F term (reference) 2H037 BA03 BA12 CA12 2H042 DA05 DA08 DA11 DB14 DC11 DC12 DD04 DD07 DE07 4F202 AA44 AH73 CA30 CB01 CD02 CD03 CD07 CD22 CD24 4K024 AA03 AB01 BA11 BA15 BB07 BC10 FA07 GA16 5F041 CA12 CA35 EE01 EE23 FF14 FF16 5F073 AB16 AB25 AB26 DA35 FA06 FA30

Claims (21)

[Claims] 1. A method for producing a mold for a deformed hemispherical microstructure, comprising: (1) a step of preparing a substrate having a conductive portion at least in part; and (2) an insulating mask layer on the substrate. (3) forming an opening in the mask layer; and (4) forming a plating layer on the opening and the mask layer through the opening by electroplating using the conductive portion as a cathode. Producing a mold for a deformed hemispherical microstructure, wherein in the step (4), a plating solution is caused to flow relative to the substrate at a predetermined flow rate in one direction over the opening. Method. 2. The method according to claim 1, wherein in the step (4), a plating layer is grown anisotropically by electroplating. 3. The method according to claim 1, wherein, in the step (3), the opening has a circular shape. 4. The method according to claim 1, wherein in the step (3), a plurality of openings are formed on the substrate. 5. The method according to claim 1, wherein in said step (4), the size and shape of the deformed hemisphere are controlled by controlling the speed and direction of the plating solution, the plating time, and the temperature of the plating solution. 5. The method for producing a mold for a deformed hemispherical microstructure according to any one of 5. 6. A mold for a deformed hemispherical microstructure manufactured by the manufacturing method according to claim 1. 7. The mold for a deformed hemispherical microstructure according to claim 6, wherein the plating layer has a shape of a part of an almost elliptical sphere. 8. A microstructure comprising a substrate, a mask layer having an opening of a periodic repetition pattern formed on the substrate, and a plating layer grown in a hemispherical shape around the opening of the mask layer. A mold for a deformed hemispherical microstructure, wherein the plating layer has a shape of an approximately elliptical sphere. 9. A method for manufacturing a micro concave mirror, wherein a mirror material is applied onto the deformed hemispherical microstructure mold according to claim 6, and the mirror material is peeled off from the mold. And forming a deformed hemispherical concave portion in the mirror material. 10. The method of manufacturing a micro concave mirror according to claim 9, further comprising a step of forming a reflective film on at least a part of the surface of the deformed hemispherical concave portion. 11. The method according to claim 9, wherein the mirror material on which the deformed hemispherical concave portion is formed is a resin. 12. A method of manufacturing a micro concave mirror, comprising: (1) a step of preparing a substrate having a conductive portion at least in part; (2) deformation by the manufacturing method according to any one of claims 1 to 6. (3) a step of forming a mold using the mold for a microstructure as a master, (4) a step of peeling the mold from the mold master, 5) forming a deformed hemispherical convex portion by molding the mold; and a method for manufacturing a micro concave mirror. 13. The method of manufacturing a micro concave mirror according to claim 12, further comprising, after the step (5), a step of forming a reflective film on at least a part of the surface of the deformed hemispherical convex portion. 14. The method according to claim 12, further comprising the step of forming a sacrificial layer after forming the plating layer in the step (2). 15. The method of manufacturing a micro concave mirror according to claim 14, wherein in the step (4), the step of separating the mold from the mold master is performed by removing the sacrificial layer. 16. The method according to claim 12, wherein in the step (4), the step of separating the mold from the mold master is performed by sequentially etching and removing the substrate and the plating layer.
3. The method for producing a micro concave mirror according to 1. 17. The method according to claim 1, wherein in the step (3), the step of forming a mold is performed by plating.
17. The method for manufacturing a micro concave mirror according to any one of 2 to 16. 18. The method according to claim 12, wherein in the step (5), the material for forming the deformed hemispherical convex portion is a resin.
The method for producing a micro concave mirror according to any one of the above. 19. A deformed hemispherical concave micromirror manufactured by the manufacturing method according to claim 9. 20. The deformed hemispherical micro-concave mirror according to claim 19, having a curved surface substantially formed in a part of an elliptical sphere. 21. An array according to claim 19, wherein a plurality of curved surfaces substantially having a partial shape of an elliptical sphere exist.
3. The deformed hemispherical micro concave mirror according to claim 1.