JP2001134001A - Method for producing substrate of electrophotographic photoreceptor, substrate of electrophotographic photoreceptor and electrophotographic photoreceptor - Google Patents
Method for producing substrate of electrophotographic photoreceptor, substrate of electrophotographic photoreceptor and electrophotographic photoreceptorInfo
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- JP2001134001A JP2001134001A JP31856099A JP31856099A JP2001134001A JP 2001134001 A JP2001134001 A JP 2001134001A JP 31856099 A JP31856099 A JP 31856099A JP 31856099 A JP31856099 A JP 31856099A JP 2001134001 A JP2001134001 A JP 2001134001A
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- substrate
- aluminum
- electrophotographic photoreceptor
- substrates
- photoreceptor
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、表面にアルミニウ
ム陽極酸化皮膜(以下、単に「皮膜」とも称する)を有
するアルミニウム製の電子写真用感光体基板(以下、単
に「基板」とも称する)の製造方法、電子写真用感光体
基板およびそれを用いた電子写真用感光体(以下、単に
「感光体」とも称する)に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the manufacture of an electrophotographic photosensitive substrate made of aluminum having an aluminum anodic oxide film (hereinafter, also simply referred to as "film") on its surface (hereinafter, also simply referred to as "substrate"). The present invention relates to a method, an electrophotographic photoreceptor substrate, and an electrophotographic photoreceptor using the same (hereinafter, also simply referred to as “photoreceptor”).
【0002】[0002]
【従来の技術】電子写真の技術は従来から複写機の分野
で発展を遂げ、最近ではレーザープリンターなどにも応
用されている。電子写真装置に使用される感光体は、導
電性基板表面に光導電層を設けて形成される。光導電層
の材料としては有機材料を使用したものが主流であり、
層構成としては、基板上に下引き層、電荷発生層、電荷
輸送層を順次積層した機能分離型構造(積層型)が一般
的である。2. Description of the Related Art The technology of electrophotography has been developed in the field of copying machines, and has recently been applied to laser printers and the like. A photoreceptor used in an electrophotographic apparatus is formed by providing a photoconductive layer on a conductive substrate surface. As the material of the photoconductive layer, those using an organic material are mainstream,
As a layer configuration, a function-separated structure (laminated type) in which an undercoat layer, a charge generation layer, and a charge transport layer are sequentially laminated on a substrate is generally used.
【0003】基板表面に設けられる第1層の下引き層
(UCL:Under Cort Layer)としては、ポリアミドや
メラミンに代表される樹脂系材料を用いる場合と、アル
ミニウム基板表面に陽極酸化皮膜を形成させる場合とが
あるが、高温高湿環境下における信頼性では、後者の方
が一般的に有利である。As a first undercoat layer (UCL: Under Cort Layer) provided on a substrate surface, a resin material represented by polyamide or melamine is used, and an anodic oxide film is formed on an aluminum substrate surface. In some cases, the latter is generally advantageous in reliability under a high-temperature and high-humidity environment.
【0004】プリンターに使用される光源は、780n
mを波長とする半導体レーザーが主流であり、この光源
は、単波長であるために過干渉性を有する。一方、アル
ミニウムの陽極酸化皮膜は780nmの波長の光をほと
んど透過してしまう特徴を有している。従って、陽極酸
化皮膜を有するアルミニウム基板を用いた感光体を半導
体レーザーを光源とするプリンターに適用する場合に
は、陽極酸化皮膜とアルミニウムとの境界面における反
射光と、陽極酸化皮膜表面における反射光との干渉作用
が顕著となる。かかる干渉作用は、基板上に形成された
陽極酸化皮膜が均一である場合には、特に問題を引き起
こすものではない。[0004] The light source used in the printer is 780n.
The mainstream is a semiconductor laser having a wavelength of m, and this light source has a single wavelength and therefore has excessive coherence. On the other hand, an anodic oxide film of aluminum has a feature that almost all light having a wavelength of 780 nm is transmitted. Therefore, when a photoreceptor using an aluminum substrate having an anodized film is applied to a printer using a semiconductor laser as a light source, reflected light at the interface between the anodized film and aluminum and reflected light at the surface of the anodized film. And the interference effect between them becomes remarkable. Such interference does not cause any particular problem when the anodic oxide film formed on the substrate is uniform.
【0005】[0005]
【発明が解決しようとする課題】しかしながら、陽極酸
化処理の性質上、皮膜厚を完全に均一に形成することは
困難であり、陽極酸化皮膜を有する基板表面には、通
常、ある程度の膜厚偏差が存在する。皮膜の膜厚に基板
内で所定値以上の偏差が存在すると、両界面での反射光
の干渉状態が基板内で異なるために、干渉により強め合
う箇所と弱め合う箇所が存在することになり、これが印
字時に濃度むら(干渉縞)となって、不具合を生じる。However, due to the nature of the anodic oxidation treatment, it is difficult to form the film thickness completely completely, and the surface of the substrate having the anodic oxide film usually has a certain thickness deviation. Exists. If the film thickness of the film has a deviation greater than or equal to a predetermined value in the substrate, the interference state of the reflected light at both interfaces is different in the substrate, so that there are portions that are strengthened by interference and portions that are weakened by interference, This causes uneven density (interference fringes) at the time of printing, which causes a problem.
【0006】そこで本発明の目的は、表面処理として行
う陽極酸化処理を改良することにより、膜厚偏差の少な
い均一な皮膜を有する電子写真用感光体基板を実現し、
また、これを用いて、良好な印字品質を有する電子写真
用感光体を提供することにある。Accordingly, an object of the present invention is to realize an electrophotographic photoreceptor substrate having a uniform film with a small thickness deviation by improving anodizing treatment performed as a surface treatment.
Another object of the present invention is to provide an electrophotographic photoreceptor having good printing quality using the same.
【0007】[0007]
【課題を解決するための手段】本発明者らは前記課題を
解決すべく鋭意検討した結果、基板表面における前述の
干渉作用を抑制するためには、光学定数および基板の表
面粗さ等から算出して皮膜の膜厚偏差を所定値以下に抑
える必要があり、そのためには、陽極酸化皮膜の膜厚が
電流密度と通電時間とによりほぼ決定されることから、
特定の電解条件下で陽極酸化処理を行うことにより電流
密度を基板全体にわたって均一にすることで、均一な膜
厚を有する皮膜を形成することができることを見出し、
本発明を完成するに至った。Means for Solving the Problems The inventors of the present invention have conducted intensive studies to solve the above-mentioned problems, and as a result, in order to suppress the above-mentioned interference effect on the substrate surface, it is necessary to calculate from the optical constants and the surface roughness of the substrate. It is necessary to suppress the film thickness deviation of the film to a predetermined value or less, for that, since the film thickness of the anodic oxide film is substantially determined by the current density and the conduction time,
By performing anodic oxidation treatment under specific electrolytic conditions to make the current density uniform over the entire substrate, it has been found that a film having a uniform film thickness can be formed,
The present invention has been completed.
【0008】即ち、上記課題を解決するために、本発明
の電子写真用感光体基板の製造方法は、電解槽内に複数
本の円筒状アルミニウム基板を漬浸し、電解による陽極
酸化処理により表面にアルミニウム陽極酸化皮膜を形成
せしめる電子写真用感光体基板の製造方法において、前
記円筒状アルミニウム基板同士の中心間の距離を、該ア
ルミニウム基板半径の4倍以上とすることを特徴とする
ものである。That is, in order to solve the above-mentioned problems, a method of manufacturing a photoreceptor substrate for electrophotography according to the present invention comprises: immersing a plurality of cylindrical aluminum substrates in an electrolytic bath; In the method for manufacturing an electrophotographic photosensitive member substrate on which an aluminum anodic oxide film is formed, a distance between centers of the cylindrical aluminum substrates is set to be four times or more a radius of the aluminum substrate.
【0009】また、本発明の電子写真用感光体基板は、
前記製造方法により製造され、前記アルミニウム陽極酸
化皮膜の膜厚偏差が0.5μm以下であることを特徴と
するものである。Further, the electrophotographic photoreceptor substrate of the present invention comprises:
It is manufactured by the above-mentioned manufacturing method, and the thickness deviation of the aluminum anodic oxide film is 0.5 μm or less.
【0010】さらに、本発明の電子写真用感光体は、前
記電子写真用感光体基板を使用したことを特徴とするも
のである。Furthermore, an electrophotographic photoreceptor of the present invention is characterized in that the electrophotographic photoreceptor substrate is used.
【0011】[0011]
【発明の実施の形態】以下、本発明の電子写真用感光体
基板の製造方法、この製造方法により製造された基板お
よびこの基板を用いた電子写真用感光体について具体的
に説明する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a method for producing a photoreceptor substrate for electrophotography according to the present invention, a substrate produced by this production method, and a photoreceptor for electrophotography using this substrate will be specifically described.
【0012】本発明の電子写真用感光体基板は、電子写
真用感光体の電極としての役目と同時に他の各層の支持
体としての役目を持つアルミニウム製の基板であり、円
筒形状のものである。また、アルミニウム材としては、
JIS6063や3003等の慣用の材料を用いればよ
く、特に限定されるものではない。The electrophotographic photoreceptor substrate of the present invention is an aluminum substrate serving not only as an electrode of the electrophotographic photoreceptor but also as a support for other layers, and has a cylindrical shape. . Also, as aluminum material,
Conventional materials such as JIS6063 and 3003 may be used, and there is no particular limitation.
【0013】本発明においては、かかるアルミニウム製
の基板表面に陽極酸化皮膜を形成するが、陽極酸化処理
を施してアルミニウム陽極酸化皮膜を形成せしめる前の
アルミニウム基板の表面粗さは、好ましくは0.3〜
3.0s、より好ましくは0.3〜1.5sの範囲内で
ある。In the present invention, an anodic oxide film is formed on the surface of such an aluminum substrate. The surface roughness of the aluminum substrate before the anodic oxidation treatment is performed to form the aluminum anodic oxide film is preferably 0.1 mm. 3 ~
3.0 s, more preferably in the range of 0.3 to 1.5 s.
【0014】本発明に係る陽極酸化処理においては、図
1に示すように、通電時における電解槽1内の被処理基
板2同士の中心間の距離aが基板半径rの4倍以上にな
るように各被処理基板2を配置して処理を行う。図2に
示すように、電解槽内の被処理基板2は電極3に載置さ
れるため、電極3を基板間の距離が上述のようになるよ
う設定することができるものであれば既知の電解槽を用
いることができ、特に制限されるべきものではない。例
えば、図3に示すように電解槽1内に15本×2段の被
処理基板2を配し、鉛製等の陰極4を10枚設置して処
理を行うことができる。陰極4としては、例えば、図4
に示すような形状のものを用いる。尚、図5は図4中の
A−A断面を示す。本発明に係る陽極酸化処理について
はそれ以外の処理条件等は特に限定されるものではない
が、好適には、以下のような処理条件で行う。In the anodic oxidation treatment according to the present invention, as shown in FIG. 1, the distance a between the centers of the substrates 2 to be processed in the electrolytic cell 1 during energization is set to be at least four times the substrate radius r. The processing is performed by disposing each substrate 2 to be processed. As shown in FIG. 2, the substrate 2 to be processed in the electrolytic cell is placed on the electrode 3. Therefore, if the electrode 3 can be set so that the distance between the substrates is as described above, a known method is used. An electrolytic cell can be used and is not particularly limited. For example, as shown in FIG. 3, 15 substrates × 2 stages of substrates 2 to be processed are arranged in the electrolytic cell 1 and ten cathodes 4 made of lead or the like are installed to perform the processing. As the cathode 4, for example, FIG.
A shape as shown in FIG. FIG. 5 shows an AA cross section in FIG. The anodic oxidation treatment according to the present invention is not particularly limited as to other treatment conditions, but is preferably performed under the following treatment conditions.
【0015】陽極酸化処理における電解処理に用いる酸
としては慣用のものを用いることができるが、特には、
硫酸を用いることが好ましい。また、電解液の条件は、
夫々遊離硫酸濃度150〜200g/l、アルミニウム
イオン濃度1〜12g/lおよび温度15〜25℃、特
には20±0.5℃の範囲内とすることが好ましい。As the acid used in the electrolytic treatment in the anodic oxidation treatment, a conventional acid can be used.
Preferably, sulfuric acid is used. The condition of the electrolyte is
It is preferable that the concentration of free sulfuric acid is 150 to 200 g / l, the concentration of aluminum ion is 1 to 12 g / l, and the temperature is 15 to 25 ° C, particularly 20 ± 0.5 ° C.
【0016】かかる陽極酸化皮膜の膜厚は、所望に応じ
て適宜設定することができ、特に制限はない。また、上
述のように皮膜の膜厚が電流密度および処理時間により
決定されるため、処理時の電流密度および通電時間は所
望の皮膜厚に応じて適宜設定することができ、特に制限
はないが、好ましくは電流密度0.5〜1.5A/dm
2で、通電時間15〜35分の範囲内である。電極とし
ては、硫酸に侵されない鉛板や炭素板を用いることが好
ましい。The thickness of the anodic oxide film can be appropriately set as desired, and is not particularly limited. Further, since the film thickness of the film is determined by the current density and the processing time as described above, the current density and the energizing time during the processing can be appropriately set according to the desired film thickness, and there is no particular limitation. , Preferably a current density of 0.5 to 1.5 A / dm
2 , the energization time is in the range of 15 to 35 minutes. It is preferable to use a lead plate or a carbon plate which is not affected by sulfuric acid as the electrode.
【0017】本発明の電子写真用感光体基板を得るため
には、皮膜形成後に封孔処理を行う必要があるが、その
条件としては、封孔処理剤として酢酸ニッケルと純水と
のいずれを用いる場合でも、好ましくは60〜95℃、
より好ましくは70〜90℃の温度で、好ましくは10
〜30分の範囲内とする。封孔処理に用いる界面活性剤
としては、リン酸エステル、ナフタレンスルホン酸のホ
ルムアルデヒド縮合物、ビスフェノールAのナフタレン
スルホン酸のホルムアルデヒド縮合物等を挙げることが
でき、これらの好適濃度は0.5〜20ml/l、より
好ましくは1〜5ml/lである。In order to obtain the electrophotographic photoreceptor substrate of the present invention, it is necessary to perform a sealing treatment after the formation of the film. The condition is that either nickel acetate or pure water is used as a sealing treatment agent. Even when used, preferably at 60 to 95 ° C,
More preferably at a temperature of 70-90 ° C., preferably 10
The range is within 30 minutes. Examples of the surfactant used for the pore-sealing treatment include a phosphoric acid ester, a formaldehyde condensate of naphthalene sulfonic acid, a formaldehyde condensate of naphthalene sulfonic acid of bisphenol A, and a preferable concentration thereof is 0.5 to 20 ml. / L, more preferably 1 to 5 ml / l.
【0018】上述の陽極酸化処理を行った基板のアルミ
ニウム陽極酸化皮膜の膜厚偏差は0.5μm以下とな
り、これにより良好な印字品質を有する感光体を得るこ
とが可能となる。The thickness deviation of the aluminum anodic oxide film on the substrate subjected to the above-described anodic oxidation treatment is 0.5 μm or less, which makes it possible to obtain a photosensitive member having good print quality.
【0019】次に、本発明の感光体の具体的実施の形態
について以下に述べるが、本発明の感光体においては上
記本発明の感光体基板を用いていればよく、感光体構成
等の他の条件は特に限定されるものではない。Next, specific embodiments of the photoreceptor of the present invention will be described below. The photoreceptor of the present invention only needs to use the above-described photoreceptor substrate of the present invention. Is not particularly limited.
【0020】感光体には、一般に負帯電機能分離積層型
感光体、正帯電機能分離積層型感光体および正帯電単層
型感光体があるが、ここでは本発明の好適形態である負
帯電積層型感光体を例にとり具体的に説明する。負帯電
機能分離積層型感光体は、導電性基体上に下引き層を介
して電荷発生層と電荷輸送層とからなる感光層が積層さ
れた構成をとる。The photoreceptor generally includes a negatively-charged function-separated laminated photoreceptor, a positively-charged function-separated laminated-type photoreceptor, and a positively-charged single-layer type photoreceptor. This will be specifically described by taking a mold type photoconductor as an example. The negatively charged function-separated laminated photoreceptor has a configuration in which a photosensitive layer including a charge generation layer and a charge transport layer is laminated on a conductive substrate via an undercoat layer.
【0021】電荷発生層は有機光導電性物質を真空蒸着
するか、または有機光導電性物質の粒子を樹脂バインダ
ーに分散させた材料を塗布して形成され、光を受容して
電荷を発生する。その電荷発生効率が高いことと同時に
発生した電荷の電荷輸送層への注入性が重要であり、電
場依存性が少なく、低電場でも注入の良いことが望まし
い。かかる電荷発生層に用いる電荷発生物質としては、
各種フタロシアニン化合物、アゾ化合物、多環キノン化
合物およびこれらの誘導体等を挙げることができる。The charge generating layer is formed by vacuum-depositing an organic photoconductive substance or applying a material in which particles of the organic photoconductive substance are dispersed in a resin binder, and receiving light to generate a charge. . It is important that the generated charge is injected into the charge transport layer at the same time as the charge generation efficiency is high, the electric field dependence is small, and the injection is good even at a low electric field. Examples of the charge generation material used for such a charge generation layer include:
Examples include various phthalocyanine compounds, azo compounds, polycyclic quinone compounds, and derivatives thereof.
【0022】電荷発生層用のバインダーとしては、ポリ
カーボネート、ポリエステル、ポリアミド、ポリウレタ
ン、エポキシ、ポリビニルブチラール、ポリビニルアセ
タール、フェノキシ樹脂、シリコーン樹脂、アクリル樹
脂、塩化ビニル樹脂、塩化ビニリデン樹脂、酢酸ビニル
樹脂、ホルマール樹脂、セルロース樹脂、またはこれら
の共重合体、およびこれらのハロゲン化物、シアノエチ
ル化合物を用いることができる。Examples of the binder for the charge generation layer include polycarbonate, polyester, polyamide, polyurethane, epoxy, polyvinyl butyral, polyvinyl acetal, phenoxy resin, silicone resin, acrylic resin, vinyl chloride resin, vinylidene chloride resin, vinyl acetate resin, and formal. A resin, a cellulose resin, a copolymer thereof, a halide thereof, and a cyanoethyl compound can be used.
【0023】電荷発生物質の使用量は、樹脂バインダー
10重量部に対し、好ましくは5〜500重量部、より
好ましくは10〜100重量部の範囲内である。また、
電荷発生層の厚さは、好ましくは0.1〜5μm、より
好ましくは1μm以下である。The amount of the charge generating substance to be used is preferably in the range of 5 to 500 parts by weight, more preferably 10 to 100 parts by weight, based on 10 parts by weight of the resin binder. Also,
The thickness of the charge generation layer is preferably from 0.1 to 5 μm, more preferably 1 μm or less.
【0024】電荷輸送層は、樹脂バインダー中に有機電
荷輸送物質を分散させた材料からなる塗膜であり、暗所
では絶縁体層として感光体の電荷を保持し、光受容時に
は電荷発生層から注入される電荷を輸送する機能を有す
る。電荷輸送層における電荷輸送物質としては、各種ヒ
ドラゾン、スチリル、ジアミン、ブタジエン、インドー
ル化合物およびこれらの混合物を用いることができる。The charge transport layer is a coating film made of a material in which an organic charge transport material is dispersed in a resin binder. In a dark place, the charge of the photoreceptor is retained as an insulator layer. It has a function of transporting injected charges. As the charge transporting substance in the charge transporting layer, various hydrazones, styryls, diamines, butadiene, indole compounds, and mixtures thereof can be used.
【0025】電荷輸送層用のバインダーとしては、ポリ
カーボネート、ポリスチレン、ポリフェニレンエーテル
アクリル樹脂等を挙げることができ、膜強度および耐刷
性の面で、ビスフェノールA型、ビスフェノールZ型
等、および各種共重合体のポリカーボネートが好適に用
いられる。また、電荷輸送層の厚さは10〜50μmの
範囲が好ましい。Examples of the binder for the charge transport layer include polycarbonate, polystyrene, and polyphenylene ether acrylic resin. In terms of film strength and printing durability, bisphenol A type, bisphenol Z type, etc. A coalesced polycarbonate is preferably used. Further, the thickness of the charge transport layer is preferably in the range of 10 to 50 μm.
【0026】また、電荷発生層および電荷輸送層には、
感度の向上や残留電位の減少、または耐環境性や有害な
光に対する安定性向上等を目的として、必要に応じて電
子受容性物質や酸化防止剤、光安定剤等を添加すること
ができる。更に、感光層上には、必要に応じて、耐環境
性や機械的強度を向上させる目的で、表面保護層を設け
ることもできる。かかる表面保護層としては、光の透過
を著しく妨げないものが好ましい。The charge generation layer and the charge transport layer include:
An electron-accepting substance, an antioxidant, a light stabilizer and the like can be added as needed for the purpose of improving sensitivity, reducing residual potential, or improving environmental resistance or stability against harmful light. Further, a surface protective layer may be provided on the photosensitive layer, if necessary, for the purpose of improving environmental resistance and mechanical strength. As such a surface protective layer, a layer that does not significantly hinder light transmission is preferable.
【0027】[0027]
【実施例】以下、本発明を、実施例に基づき説明する。実施例1〜4 アルミニウム管(A6063材)を旋盤で所望の寸法
(直径:30mm、全長254mm)に切削加工し、表
面粗さをRmax=1.0μm、Ra=0.1μm程度
に仕上げた(切削油は日本石油(株)製、メタルワーク
EDを使用)。その後、脱脂剤(トップアルクリーン1
01:奥野製薬工業(株)製)で3分間(40g/l、
60℃)脱脂後、純水で濯いだ。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments. Examples 1 to 4 An aluminum tube (A6063 material) was cut to a desired size (diameter: 30 mm, total length: 254 mm) with a lathe, and the surface roughness was finished to about Rmax = 1.0 μm and Ra = 0.1 μm ( The cutting oil used is Metalwork ED manufactured by Nippon Oil Co., Ltd.). Then, a degreasing agent (Top Alclean 1)
01: Okuno Pharmaceutical Co., Ltd.) for 3 minutes (40 g / l,
(60 ° C.) After degreasing, it was rinsed with pure water.
【0028】電解条件は硫酸(遊離硫酸180g/l、
溶存アルミ量2g/l、温度20℃)を電解液として使
用した。通電は図1に示す基板中心間の距離aが夫々6
0、70、80、100mmになるように製作したチタ
ン製の電極を用い、電流密度0.74A/dm2で30
分間処理した。The electrolysis conditions were sulfuric acid (free sulfuric acid 180 g / l,
2 g / l of dissolved aluminum and a temperature of 20 ° C.) were used as the electrolytic solution. The energization is performed when the distance a between the substrate centers shown in FIG.
Using a titanium electrode manufactured to have a thickness of 0, 70, 80, or 100 mm, a current density of 0.74 A / dm 2 was used.
Minutes.
【0029】その後、水洗を十分に行った後、封孔処理
(トップシールE110:奥野製薬工業(株)製)を1
4分間(85℃、5ml/l)行い、水洗した。Thereafter, after sufficient washing with water, a sealing treatment (top seal E110: manufactured by Okuno Pharmaceutical Co., Ltd.) was performed for 1
This was performed for 4 minutes (85 ° C., 5 ml / l) and washed with water.
【0030】得られた基板の陽極酸化皮膜厚偏差は周方
向3点、長さ方向3点(合計9点)の最大値と最小値と
の差で評価した。評価方法は共焦点光学系レーザー顕微
鏡(レーザーテック(株)製)を用いた。The thickness deviation of the anodic oxide film of the obtained substrate was evaluated by the difference between the maximum value and the minimum value at three points in the circumferential direction and three points in the length direction (a total of nine points). The evaluation method used a confocal optical system laser microscope (manufactured by Lasertec Co., Ltd.).
【0031】その後、基板をアルカリ洗剤(カストロー
ル450:カストロール(株)製、濃度2重量%、常
温)にて洗浄して、γ型チタニルフタロシアニンと塩化
ビニル酢酸ビニル共重合体との分散系からなる塗液を塗
布、加熱乾燥して電荷発生層(CGL)を形成し、ヒド
ラゾン系導電剤とポリカーボネート樹脂および酸化防止
剤との混合系からなる塗液を塗布、加熱乾燥して電荷輸
送層(CTL)を形成して感光体を作製し、その印字性
能について、波長780nmのレーザー光を光源とする
印字装置(PCPR2000:NEC製)を用いて評価
を行った。Thereafter, the substrate is washed with an alkali detergent (Castrol 450: manufactured by Castrol Co., Ltd., concentration 2% by weight, normal temperature), and is made of a dispersion of γ-type titanyl phthalocyanine and a vinyl chloride vinyl acetate copolymer. A charge generation layer (CGL) is formed by applying a coating liquid and heating and drying, and a coating liquid composed of a mixture of a hydrazone-based conductive agent, a polycarbonate resin and an antioxidant is applied, and then heated and dried to form a charge transporting layer (CTL). ) To prepare a photoreceptor, and its printing performance was evaluated using a printing apparatus (PCPR2000: manufactured by NEC) using a laser beam having a wavelength of 780 nm as a light source.
【0032】実施例5〜8 アルミニウム製の電極を使用した以外は、実施例1〜4
と同様にして基板を処理して感光体を作製し、膜厚偏差
と印字性能の評価を行った。 Examples 5 to 8 Examples 1 to 4 were repeated except that electrodes made of aluminum were used.
The substrate was processed in the same manner as described above to produce a photoreceptor, and the film thickness deviation and printing performance were evaluated.
【0033】比較例1〜4 基板中心間距離を40、45、50、55mmで電解処
理した以外は、実施例1〜4と同様にして基板を処理し
て感光体を作製し、膜厚偏差と印字性能の評価を行っ
た。 Comparative Examples 1 to 4 Substrates were processed in the same manner as in Examples 1 to 4 to prepare photoconductors, except that the distance between the centers of the substrates was 40, 45, 50 and 55 mm. And the printing performance were evaluated.
【0034】比較例5〜8 アルミニウム製の電極を使用した以外は、比較例1〜4
と同様にして基板を処理して感光体を作製し、膜厚偏差
と印字性能の評価を行った。これらの結果を下記表1に
示す。 Comparative Examples 5 to 8 Comparative Examples 1 to 4 were performed except that electrodes made of aluminum were used.
The substrate was processed in the same manner as described above to produce a photoreceptor, and the film thickness deviation and printing performance were evaluated. The results are shown in Table 1 below.
【0035】[0035]
【表1】 [Table 1]
【0036】上記表1に示すように、基板中心間距離を
基板半径(15mm)の4倍以上として電解処理を行っ
た実施例1〜8においては、膜厚偏差は0.5μm以下
に抑制され、印字品質も良好であった。一方、基板半径
(15mm)の4倍未満として処理した比較例1〜8に
おいては、膜厚偏差は0.5μm以上になり、レーザー
の干渉による印字障害(干渉縞)が見られた。As shown in Table 1, in Examples 1 to 8 in which the distance between the centers of the substrates was set to four times or more the substrate radius (15 mm) and the electrolytic treatment was performed, the thickness deviation was suppressed to 0.5 μm or less. The printing quality was also good. On the other hand, in Comparative Examples 1 to 8 in which the processing was performed at less than four times the substrate radius (15 mm), the film thickness deviation was 0.5 μm or more, and printing trouble (interference fringes) due to laser interference was observed.
【0037】[0037]
【発明の効果】以上、説明してきたように、本発明によ
れば、電子写真用感光体に用いる、陽極酸化皮膜を有す
るアルミニウム基板において、陽極酸化処理における基
板と基板との中心間の距離を基板半径の4倍以上の間隔
となるよう配置することにより、陽極酸化皮膜の膜厚偏
差が0.5μm以下に抑えられた、レーザー光の干渉に
よる印字濃度むらのない良好な感光体基板を作製するこ
とができ、また、これを用いて良好な印字性能を有する
感光体を製造することが可能となった。As described above, according to the present invention, in an aluminum substrate having an anodized film used for an electrophotographic photoreceptor, the distance between the centers of the substrates in the anodizing treatment is reduced. By arranging at intervals of at least four times the substrate radius, a good photoreceptor substrate having a thickness variation of the anodic oxide film suppressed to 0.5 μm or less and having no uneven printing density due to laser light interference. It was possible to manufacture a photoreceptor having good printing performance by using the same.
【図1】本発明に係る陽極酸化処理の際の電子写真用感
光体基板の配置を示す概略図である。FIG. 1 is a schematic view showing an arrangement of a photoconductor substrate for electrophotography at the time of anodizing treatment according to the present invention.
【図2】基板と電極との配置関係を示す概略図である。FIG. 2 is a schematic diagram illustrating an arrangement relationship between a substrate and electrodes.
【図3】電解槽の一例を示す平面図である。FIG. 3 is a plan view showing an example of an electrolytic cell.
【図4】電解槽における陰極の一例を示す概略図であ
る。FIG. 4 is a schematic diagram showing an example of a cathode in an electrolytic cell.
【図5】図4に示す陰極の断面図である。FIG. 5 is a sectional view of the cathode shown in FIG. 4;
1 電解槽 2 被処理基板 3 電極 4 陰極 DESCRIPTION OF SYMBOLS 1 Electrolyzer 2 Substrate to be processed 3 Electrode 4 Cathode
Claims (7)
基板を漬浸し、電解による陽極酸化処理により表面にア
ルミニウム陽極酸化皮膜を形成せしめる電子写真用感光
体基板の製造方法において、 前記円筒状アルミニウム基板同士の中心間の距離を、該
アルミニウム基板半径の4倍以上とすることを特徴とす
る電子写真用感光体基板の製造方法。1. A method of manufacturing an electrophotographic photoreceptor substrate, wherein a plurality of cylindrical aluminum substrates are immersed in an electrolytic cell and an aluminum anodic oxide film is formed on the surface by anodizing treatment by electrolysis. A method of manufacturing a photoreceptor substrate for electrophotography, wherein the distance between the centers of the substrates is at least four times the radius of the aluminum substrate.
1.5A/dm2で、かつ通電時間15〜35分である
請求項1記載の電子写真用感光体基板の製造方法。2. The current density in the electrolysis is 0.5 to
2. The method for producing a photosensitive substrate for electrophotography according to claim 1, wherein the electric current is 1.5 A / dm < 2 > and the energizing time is 15 to 35 minutes.
は2記載の電子写真用感光体基板の製造方法。3. The method according to claim 1, wherein sulfuric acid is used as the electrolytic solution.
で、かつ溶存アルミニウムイオン濃度が1〜12g/l
である請求項3記載の電子写真用感光体基板の製造方
法。4. A free sulfuric acid concentration of 150 to 200 g / l.
And the concentration of dissolved aluminum ions is 1 to 12 g / l
4. The method for producing an electrophotographic photosensitive member substrate according to claim 3, wherein
1〜4のうちいずれか一項記載の電子写真用感光体基板
の製造方法。5. The method for producing a photosensitive substrate for electrophotography according to claim 1, wherein the temperature of the electrolyte is 15 to 25 ° C.
電子写真用感光体基板の製造方法により製造され、前記
アルミニウム陽極酸化皮膜の膜厚偏差が0.5μm以下
であることを特徴とする電子写真用感光体基板。6. A method for manufacturing a photoconductor substrate for electrophotography according to claim 1, wherein the aluminum anodic oxide film has a thickness deviation of 0.5 μm or less. Electrophotographic photosensitive substrate.
使用したことを特徴とする電子写真用感光体。7. A photoconductor for electrophotography, wherein the photoconductor substrate for electrophotography according to claim 6 is used.
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Application Number | Priority Date | Filing Date | Title |
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JP31856099A JP2001134001A (en) | 1999-11-09 | 1999-11-09 | Method for producing substrate of electrophotographic photoreceptor, substrate of electrophotographic photoreceptor and electrophotographic photoreceptor |
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Publication Number | Publication Date |
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JP2001134001A true JP2001134001A (en) | 2001-05-18 |
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1999
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