JP2001105296A - Abrasive pad - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an abrasive pad capable of shortening the working time while providing the sufficient smoothness of a surface to be polished without conforming to the existence of fine irregular parts of the surface to be polished having a three-dimensional curved surface. SOLUTION: This pad for polishing polishes the surface of an object having a three-dimensional curved surface. The pad is provided with a surface material 10 to be brought in contact with the surface of the object and a backup material 20, to which the surface material 10 is fitted. The backup material 20 having 60 or more of Asker F type hardness is used. The surface material 10 formed of a woven fabric having 2 mm or less of the fiber length (pile length) is used.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an object having a three-dimensional curved surface as an object, and mainly to a polishing pad used for finish polishing of a polished surface of a painted surface of an automobile body or the like.

[0002]

2. Description of the Related Art Conventionally, as a polishing pad for polishing a painted surface of a sheet metal, a polishing pad composed of a surface material in contact with the surface of an object to be polished and a backup material for attaching the surface material has been known. I have. For example, JP-A-8-1
In JP 87668, a base material (backup material) which is a surface material main body and is an elastic core material housed inside
It is made by stretching the fabric of the surface material on the outer surface of
A buff using a base (backup material) having a relatively soft and thick surface material mounting board portion is disclosed.

In Japanese Patent Application Laid-Open No. Hei 10-235564, various structures of fibers used for a surface material have been studied. For example, a multifilament yarn made of rayon fiber having an eccentric cross section is used as a pile yarn. There is disclosed a double raschel net structure in which any one of a cut pile group made of pile yarn or a cut pile group with both sides raised and a loop group is combined.

[0006] However, as shown in FIGS. 6A and 6B, when a relatively soft base (backup material) 20 (about 50 in Asker F type hardness) is used,
At the time of the final polishing, the surface material 10 and the backup material 20 hit the whole of the uneven portions 42 and 44 with respect to the fine uneven portions 42 and 44 of the surface 40 to be polished, which is the painted surface, and the convex portions 42
Not only that, the recess 44 is also polished at the same time,
It is difficult to obtain sufficient smoothness of the polished surface 40,
There was a problem that the working time was also long.

As shown in FIG. 7, when the fiber length of the surface material 10 is made longer (pile length is 2 mm or more), the hardness of the base (backup material) 20 can be fully utilized at the time of finish polishing. 6A and 6B, it is difficult to sufficiently obtain the smoothness of the surface 40 to be polished as in the case of FIGS. 6A and 6B. Has also been problematic.

[0006]

SUMMARY OF THE INVENTION The present invention has been made in view of such a situation, and an object of the present invention is to adapt to a fine uneven portion on a polished surface having a three-dimensional curved surface, An object of the present invention is to provide a polishing pad capable of sufficiently obtaining smoothness of a polished surface and shortening an operation time by applying a surface material on a flat surface connecting protruding portions of the polished surface. .

[0007]

That is, according to the present invention, there is provided a polishing pad for polishing a surface of an object having a three-dimensional curved surface, wherein the surface material is in contact with the surface of the object, A backup material for attaching the surface material, wherein the hardness of the backup material is 60 or more in Asker F type hardness. In the present invention, the surface material is preferably formed of a woven fabric, and the fiber length (pile length) thereof is preferably 2 mm or less.

In the present invention, the hardness of the backup material is preferably in the range of 60 to 75 in Asker F type hardness, and the surface material is made of cotton or wool,
It is preferable that the corduroy has no ridge. Further, in the present invention, the backup material is preferably any of foamed polyurethane, soft rubber, and nonwoven fabric.

[0009]

BEST MODE FOR CARRYING OUT THE INVENTION The polishing pad of the present invention mainly comprises a surface material that comes into contact with the surface of an object to be polished, and a backup material for attaching the surface material. Are those using 60 or more. By using a material having a hardness in the specific range as described above as a backup material, the surface material does not adapt to the fine irregularities on the surface to be polished having a three-dimensional curved surface, and is a surface material that is connected to the convex apexes of the surface to be polished. Therefore, only the protrusions of the surface to be polished can be polished to obtain sufficient smoothness of the surface to be polished, and the operation time can be shortened.

Hereinafter, the present invention will be described in more detail based on embodiments shown in the drawings, but the present invention is not limited to these embodiments. FIG. 1 shows an example of the polishing pad of the present invention, wherein (a) is a schematic perspective view and (b) is a schematic cross-sectional view of (a). The polishing pad of the present invention,
For example, as shown in FIGS. 1A and 1B, a surface material 10 that comes into contact with the surface of an object to be polished, a backup material 20 for attaching the surface material 10, and a polishing device (polisher)
This is mainly constituted by a loop member 30 detachably attached to the driver. The backup material 20 and the surface material 10 do not necessarily have to be permanently bonded, and the backup material 20 and the surface material 10 may be made detachable with a magic fastener (registered trademark) or the like. In addition, the loop material 30
It is preferable to use, for example, Magic Tape (registered trademark). The backup member 20 can be directly attached to the driving body of the polishing apparatus by using a screw or an adhesive instead of using the loop member 30. A known method such as an electric type or an air type is used as a driving body of the polishing apparatus.

Here, a main feature of the polishing pad of the present invention is that the hardness of the backup material is defined as Asker F type hardness of 60 or more. And, preferably,
The fiber length (pile length) of the surface material is set to 2 mm or less.

[0012] In the polishing pad, the hardness of the backup material and the fiber length of the surface material are specified, so that the polishing pad shown in FIG.
(A) As shown in (b), the polished surface 4 which is a painted surface
0, the polished surface 40 having a three-dimensional curved surface
The surface to be polished 4 does not conform to the subtle uneven portions 42 and 44
Since the surface material 10 is applied on a plane connecting the vertices of the convex portions of 0, and only the convex portions 42 can be polished, the smoothness of the polished surface 40 can be sufficiently obtained, and the working time can be reduced. be able to.

First, a backup material used in the present invention will be described. In the present invention, the backup material 20 has an Asker F type hardness of 60 or more, preferably 60 or more.
It is necessary to have a hardness of ~ 75. This is because, when the hardness of the backup material is 10 to 20, it is difficult to obtain sufficient smoothness of the polished surface 40 even when the final polishing is performed, and when the hardness of the backup material is about 52, Although a certain degree of smoothness of the polished surface 40 can be obtained, it takes a long time to work, and the hardness of the backup material is 7
This is because if it exceeds 5, the ability to follow a three-dimensional curved surface will be poor.

The Asker F type hardness is a hardness measured using an Asker F type hardness meter (manufactured by Kobunshi Keiki Co., Ltd.) which is a hardness measuring device for foamed polyurethane. The indenter of the formed shape is pushed into the surface of the sample by the force of the spring to give a deformation, and the depth of the indentation when the resistance force of the sample and the force of the spring are balanced is expressed as hardness ”. The hardness tester is based on the durometer hardness test hardness tester in JIS K7215-1986, and is an improved hardness tester for soft plastic foam and foam rubber.

The material of the backup material is not particularly limited, but it is preferable that any one of foamed polyurethane, soft rubber, and non-woven fabric is appropriately selected and used. The shape of the backup material 20 is usually a disk shape or a donut shape, but as shown in FIG. 1A, the donut shape has a through hole 32 at the center thereof. Therefore, it is easy to align and remove the compound (abrasive) and shavings, so the compound (abrasive)
Suitable when using. The thickness of the backup material 20 is not particularly limited, but is preferably 5 to 30 mm in practice, and the size of the backup material 20 is preferably practically about 50 to 250 mmφ in plane diameter.

Next, regarding the surface material used in the present invention,
This will be described with reference to FIGS. 2 and 3A and 3B. The surface material 10 is composed of a base cloth portion 12 and a pile 11 formed on the base cloth portion 12, and its fiber length, that is, the length of the pile 11 is preferably 3 mm or less, and
mm or less is more preferable. If the fiber length (pile length) of the surface material 10 exceeds 3 mm, the surface material 10 entirely contacts the fine irregularities 42 and 44 of the surface 40 to be polished during the final polishing of the surface Not only that, the recesses 44 are also polished at the same time, and it is difficult to obtain sufficient smoothness of the polished surface 40, and the working time becomes longer (see FIG. 7). The thickness of the fiber of the surface material 10 used in the present invention is, for example, 10-20
It is preferable that the wool yarn count is 15 to 25 count.

The surface material 10 used in the present invention may be formed of any of a woven fabric and a nonwoven fabric, but is particularly formed of a pile woven fabric (a woven fabric having a pile formed on one or both sides of a woven fabric). It is preferred that Surface material 10
Natural fibers are preferred as the material, and specifically, cotton or wool is preferred. The pile woven fabric includes beveled yarn (woven fabric obtained by cutting a weft pile), corduroy (weft pile woven fabric having a ridge in diameter), towel (warp yarn (ground warp) that organizes the ground, and warp yarn (wool). The warp) is separately arranged on the beam longer than the ground warp yarn, and a woven fabric in which a trap is formed on one or both sides of the woven fabric while weaving) can be suitably used. However, in the present invention, it is particularly preferable to use ridgeless corduroy.

Next, each example of the surface material 10 in the present invention will be described. FIG. 2 shows a surface material 10 made of a velvety having a group of soft piled cut piles 2 on a base cloth 3.
An overview is shown. FIG. 3 (a) shows a loop-shaped pile group 4 in which the pile 11 is long and its root is narrowed by thread twisting or the like.
2 shows a surface material 10 made of a knitted sinker loop pile cloth or a woven towel cloth having a base cloth 5. FIG. 3 (b)
Indicates a surface material 10 which is made of a moquette woven cloth having a cut pile group 6 on a base cloth 7 or a cut pile cloth formed by weft knitting (circular knitting), and has a raised portion 8 formed at the tip. The surface material 10 used in the present invention is a pile 11
It is preferable that the thickness of the base cloth portion 12 be about 0.2 to 1.0 mm in order to easily expose the characteristics of the backup material to the pile 11 as it is.

Further, as the surface material 10 used in the present invention, when a compound (abrasive) is used, a corduroy without a ridge or a corduroy having a number of wells (WALES) of 15 or more before a tumbler (shrink-proofing) treatment is used. Is preferred. Thereby, at the time of finish polishing,
The secondary particles generated from the primary particles can prevent the painted surface, which is the finished polished surface, from being damaged. The number of wells is one inch.
Means the number of fabric ridges contained in

Next, the action and behavior of the compound (abrasive grains) on the surface to be polished when performing the final polishing using the polishing pad of the present invention will be described with reference to FIGS. 5 (a) to 5 (f). . The compound 50 trapped in the pile 11 of the polishing pad moves the pile 1 according to the movement of the polishing pad.
While being dragged by 1, the polished surface 40 is polished in the same manner as the fixed abrasive grains (FIG. 5A). Compound 50 is
Since it is trapped in the pile 11 and is not fixed, the compound 50
Is released from the pile 11 to be in a loose abrasive state (FIG. 5).
(B)). Next, the compound 50 which became loose abrasives
Is again trapped in another pile 11 (FIG. 5).
(C)) The surface to be polished 40 is polished in the same manner as the fixed abrasive grains while being dragged by the pile 11 (FIG. 5D). By repeating this, the convex portion of the surface to be polished 40 is polished to a predetermined level.

On the other hand, the fixing and release of the compound 50 as described above do not continue forever, and as the polishing proceeds, the shavings 60 are present around the compound 50 (FIG. 5 (e)). The compound 50 fixed to the pile 11 gradually increases, and when the fixed compound 50 is covered with the shavings 60, the polishing property is significantly reduced (FIG. 5 (f)). When this state is reached, the polishing pad is replaced or the operation of removing the compound 50 and the shavings 60 attached to the pile 11 is performed, and then the polishing is performed again.

[0022]

As described above, according to the polishing pad of the present invention, the flat surface connecting the convex vertices of the polished surface does not adapt to the fine irregularities on the polished surface having the three-dimensional curved surface. In this case, the pile of the surface material can be applied, so that the smoothness of the surface to be polished can be sufficiently obtained and the operation time can be shortened.

[Brief description of the drawings]

FIG. 1 shows an example of a polishing pad of the present invention, wherein (a) is a perspective view and (b) is a schematic sectional view of (a).

FIG. 2 is a schematic partial side view showing an example of a surface material used in the present invention.

FIG. 3 is a schematic partial side view showing another example of a surface material used in the present invention, wherein (a) shows a surface material having a loop-shaped pile group, and (b) shows a surface material having a cut-shaped pile group. .

FIG. 4 is a view for explaining finish polishing when the polishing pad of the present invention is used, and FIG. 4 (a) is an explanatory view showing a contact state between a pile of the polishing pad and a surface to be polished; (b) is an explanatory view showing the smoothness of the surface to be polished before and after the finish polishing and the amount of shaving.

FIG. 5 is an explanatory diagram illustrating the action and behavior of a compound (abrasive grains) on a surface to be polished when performing final polishing using the polishing pad of the present invention.

6A and 6B are diagrams illustrating an example of finish polishing when a conventional polishing pad is used, and FIG. 6A is an explanatory diagram illustrating a contact state between a pile of the polishing pad and a surface to be polished; (B) is an explanatory view showing the smoothness of the surface to be polished before and after the finish polishing and the cutting allowance.

FIG. 7 is an explanatory diagram illustrating another example of finish polishing when a conventional polishing pad is used.

[Explanation of symbols]

2 ... cut pile group, 3 ... base cloth, 4 ... loop pile group, 5 ... base cloth, 6 ... cut pile group, 7 ... base cloth, 8 ...
Raised part, 10 ... surface material, 11 ... pile, 12 ... base cloth part,
Reference numeral 20: backup material, 30: loop material, 32: through hole, 40: polished surface (painted surface), 42: convex portion, 44:
Concave part, 50: compound (abrasive), 60: shavings.

Claims (5)

[Claims] 1. A polishing pad for polishing a surface of an object having a three-dimensional curved surface, comprising: a surface material in contact with the surface of the object; and a backup material for attaching the surface material. A polishing pad, wherein the hardness of the backup material is 60 or more in Asker F type hardness. 2. The polishing pad according to claim 1, wherein the surface material is formed of a woven fabric, and the fiber length (pile length) is 2 mm or less. 3. The polishing pad according to claim 1, wherein the hardness of the backup material is in the range of 60 to 75 in Asker F type hardness. 4. The polishing pad according to claim 1, wherein the surface material is made of cotton or wool and has no ridge corduroy. 5. The backup material is foamed polyurethane,
The polishing pad according to any one of claims 1 to 4, wherein the polishing pad is one of a soft rubber and a nonwoven fabric.