JP2001089899A - Fully automatic compact surface treating device - Google Patents

Fully automatic compact surface treating device

Info

Publication number
JP2001089899A
JP2001089899A JP26660899A JP26660899A JP2001089899A JP 2001089899 A JP2001089899 A JP 2001089899A JP 26660899 A JP26660899 A JP 26660899A JP 26660899 A JP26660899 A JP 26660899A JP 2001089899 A JP2001089899 A JP 2001089899A
Authority
JP
Japan
Prior art keywords
surface treatment
tank
fully automatic
pitch
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26660899A
Other languages
Japanese (ja)
Inventor
Akira Kuga
彰 久我
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujisash Co Ltd
Original Assignee
Fujisash Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujisash Co Ltd filed Critical Fujisash Co Ltd
Priority to JP26660899A priority Critical patent/JP2001089899A/en
Publication of JP2001089899A publication Critical patent/JP2001089899A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an inexpensively producible fully automatic compact surface treating device with a simple constitution capable of automatically satisfactorily subjecting compact parts to surface treatment. SOLUTION: As to this fully automatic compact surface treating device, a surface treating device base is provided with a machine casing with permitted vertical movement, moreover, this machine casing is provided with a running member intermittently running by a prescribed pitch, the running member is fitted with a supporting member supporting the upper part of a jig supporting an object to be treated, and also, the surface of the base is provided with a surface treating tank in the lower position of the running member corresponding to the above pitch.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、全長2〜5m程度
の全自動小型表面処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fully automatic small surface treatment apparatus having a total length of about 2 to 5 m.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来よ
り、種々の全自動めっき装置等の全自動表面処理装置が
提案されている。しかし、これらの全自動表面処理装置
は、いずれも大型の装置である。
2. Description of the Prior Art Conventionally, various automatic surface treatment apparatuses such as various automatic plating apparatuses have been proposed. However, all of these fully automatic surface treatment apparatuses are large-sized apparatuses.

【0003】ところで、最近において、めっき等の表面
処理専業工場ではなく、スチールピース金具等の小物部
品を製作する工場現場において、比較的小量を直ちに表
面処理して製作に使用することが要望され、このため、
かかる工場現場で容易にめっき等の表面処理を行うこと
ができる小型の、例えば全長2〜5m程度の全自動装置
が要求されるようになった。
In recent years, it has been demanded that a relatively small amount be immediately surface-treated and used for production at a factory site for producing small parts such as steel piece fittings, not at a factory dedicated to surface treatment such as plating. ,For this reason,
A small, fully automatic apparatus having a total length of about 2 to 5 m, for example, capable of easily performing surface treatment such as plating at the factory site has been required.

【0004】この場合、上記大型の全自動表面処理装置
の構成は、このような小型自動装置にそのまま適用し難
い。
In this case, it is difficult to apply the configuration of the large-sized fully automatic surface treatment apparatus as it is to such a small-sized automatic apparatus.

【0005】本発明は、上記事情に鑑みなされたもの
で、構成が簡単で安価に製作し得、小型部品を良好にか
つ自動的にしかも連続的に表面処理することができる全
自動小型表面処理装置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has a simple structure, can be manufactured at low cost, and can automatically and continuously treat small parts in a fully automatic small surface treatment. It is intended to provide a device.

【0006】[0006]

【課題を解決するための手段】本発明は、上記目的を達
成するため、下記の全自動小型表面処理装置を提供す
る。 請求項1:表面処理装置基台に機枠を上下動可能に設け
ると共に、この機枠に所定ピッチずつ間欠的に走行する
走行部材を設け、この走行部材に被処理物が支持される
治具の上部を支持する支持部材を取り付け、かつ上記基
台上に上記ピッチに相応した上記走行部材下方位置にお
いて表面処理槽を配設したことを特徴とする全自動小型
表面処理装置。 請求項2:上記機枠に上記ピッチ分に相当する長さで往
復動する押圧部材を設け、この押圧部材により上記支持
部材を押圧して上記ピッチ分前進させると共に、これと
一体に上記走行部材を上記ピッチ分走行させるようにし
た請求項1記載の全自動小型表面処理装置。 請求項3:表面処理装置が通電による表面処理を行う処
理槽を含み、この処理槽の上方に被処理物が少なくとも
この処理槽で処理されている間において、上記治具の上
部を挟持して治具を通電すると共に、上記支持部材が上
記ピッチ分移動する間は少なくとも治具の挟持が解消さ
れて互いに離間する一対のブスバー部材を上記機枠に設
けた請求項1又は2記載の全自動小型表面処理装置。 請求項4:表面処理装置が他の処理槽による処理時間よ
り短い処理を行う処理槽を含み、この処理槽を常時は上
記他の処理槽より下方位置に配置すると共に、所定時間
後にこの処理槽を上記他の処理槽と同じ高さまで上昇さ
せるよう構成した請求項1,2又は3記載の全自動小型
表面処理装置。 請求項5:表面処理装置が電気亜鉛めっき槽、クロメー
ト槽及び乾燥室を含む電気亜鉛めっき装置である請求項
1乃至4のいずれか1項記載の全自動小型表面処理装
置。 請求項6:表面処理装置が電着塗装、浸漬塗装、スプレ
ー塗装等の塗装用表面処理槽及び乾燥室を含む塗装装置
である請求項1乃至5のいずれか1項記載の全自動小型
表面処理装置。 請求項7:全長が2〜5mである請求項1乃至6のいず
れか1項記載の全自動小型表面処理装置。
SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides the following fully automatic small surface treatment apparatus. Claim 1: A machine frame is provided on a surface treatment device base so as to be vertically movable, and a traveling member that intermittently travels at a predetermined pitch is provided on the machine frame, and a jig that supports the workpiece is supported by the traveling member. A supporting member for supporting an upper portion of the base member, and a surface treatment tank disposed below the traveling member corresponding to the pitch on the base. Claim 2: The machine frame is provided with a pressing member that reciprocates at a length corresponding to the pitch, and the pressing member presses the support member to advance the supporting member by the pitch, and integrally with the traveling member. 2. The fully automatic small-sized surface treatment device according to claim 1, wherein the device is driven for the pitch. In another aspect, the surface treatment apparatus includes a treatment tank for performing a surface treatment by energization, and an upper part of the jig is held above the treatment tank while at least the object to be treated is being treated in the treatment tank. 3. A fully automatic apparatus according to claim 1 or 2, wherein a pair of busbar members are provided on the machine frame while the jig is energized and at least the jig is released and separated from each other while the support member moves by the pitch. Small surface treatment equipment. In another aspect, the surface treatment apparatus includes a processing tank that performs processing that is shorter than the processing time of the other processing tank, and the processing tank is always disposed at a position lower than the other processing tank, and the processing tank is provided after a predetermined time. 4. The fully automatic small-sized surface treatment apparatus according to claim 1, wherein the apparatus is configured to rise to the same height as the other treatment tank. In another preferred embodiment, the surface treatment apparatus is an electrogalvanizing apparatus including an electrogalvanizing bath, a chromate bath, and a drying chamber. In a preferred embodiment, the surface treatment apparatus is a painting apparatus including a surface treatment tank for painting such as electrodeposition coating, dip painting, spray painting, and a drying chamber, and a fully automatic small surface treatment according to any one of claims 1 to 5. apparatus. [7] The fully automatic small-sized surface treatment apparatus according to any one of [1] to [6], wherein the total length is 2 to 5 m.

【0007】本発明の装置は、全長2〜5m程度の全自
動装置として適したもので、被処理物が下降−上昇−上
記ピッチ分の前進−下降……という動作を繰り返しなが
ら搬送されて表面処理を行うようにしたので、搬送動作
が容易であり、このため装置の構成が簡略化されて安価
に製作し得る。
The apparatus of the present invention is suitable as a fully automatic apparatus having a total length of about 2 to 5 m. The object to be processed is conveyed while repeating an operation of descending, ascending, advancing for the above pitch, and descending. Since the processing is performed, the transport operation is easy, and therefore, the configuration of the apparatus is simplified and the apparatus can be manufactured at low cost.

【0008】また、請求項2の構成によれば、走行部
材、典型的にはチェーンの走行機構が簡略化され、モー
ター等の走行部材(チェーン等)の走行手段を必要とし
ないので、この点からも装置を安価に製作し得る。
According to the second aspect of the present invention, the running mechanism of a running member, typically a chain, is simplified and no running means for a running member (such as a chain) such as a motor is required. Therefore, the apparatus can be manufactured at low cost.

【0009】更に、請求項3の構成によれば、陰極ブス
バーを処理槽に架け渡さなくてよいので、ブスバーが処
理液で汚染されることが少ない上、確実な通電が行わ
れ、通電不良が生じ難いので、電気めっき等の通電表面
処理が確実に行われ、良好な処理がなされる。
Further, according to the third aspect of the present invention, since the cathode busbar does not need to be bridged over the processing tank, the busbar is less likely to be contaminated with the processing solution, and the energization is reliably performed. Since it is unlikely to occur, a current-carrying surface treatment such as electroplating is reliably performed, and good treatment is performed.

【0010】請求項4の構成によれば、クロメート処理
等の短時間表面処理に適応して、良好な処理を行うこと
ができる。
According to the structure of the fourth aspect, it is possible to perform a good treatment adapted to a short-time surface treatment such as a chromate treatment.

【0011】本発明の全自動小型表面処理装置は、各種
電気めっき、無電解めっき、電着塗装、浸漬塗装、スプ
レー塗装、陽極酸化処理、化成処理など各種表面処理に
用いられるが、特に被めっき物を上昇させ、次いでワン
ピッチ移動するという動作を含んで複数回のめっき処理
を行い、従って、めっき途中で空気曝露されるという条
件下におかれても、表面酸化が直ちに生じず、しかも通
電が断続しても支障がほとんど生じず、密着性の高い皮
膜を与える電気亜鉛めっきに適しており、しかも上述し
たように短時間のクロメート処理にも有効に対応できる
ので、電気亜鉛めっき用全自動装置として好適である。
The fully automatic small-sized surface treatment apparatus of the present invention is used for various kinds of surface treatments such as various kinds of electroplating, electroless plating, electrodeposition coating, dip coating, spray coating, anodizing treatment and chemical conversion treatment. Plating is performed a plurality of times, including the operation of raising the object and then moving it one pitch, and therefore, even under the condition of being exposed to air during plating, surface oxidation does not occur immediately, and current is not applied. Fully automatic equipment for electrogalvanizing, as it is suitable for electrogalvanizing that gives a film with high adhesion and hardly causes any trouble even if it is interrupted, and can effectively cope with short-time chromate treatment as described above. It is suitable as.

【0012】[0012]

【発明の実施の形態及び実施例】以下、本発明の一実施
例につき図面を参照して説明する。図1,2は、本発明
装置の一実施例を示す。この装置1は、基台2を備え
る。また、この基台2には、図示していない駆動装置に
より上下動する機枠3が設けられている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. 1 and 2 show an embodiment of the apparatus of the present invention. This device 1 includes a base 2. The base 2 is provided with a machine frame 3 that moves up and down by a driving device (not shown).

【0013】上記基台2上には、処理槽4が載置されて
いる。この処理槽4は、図3に示す態様で設けられてい
る。ここで、図3において、Aはラック付け位置、Bは
アルカリ脱脂槽、Cは水洗槽、Dはアルカリ脱脂槽、E
は水洗槽、Fは亜鉛めっき槽、G,Hは水洗槽、Iは硝
酸活性槽、Jは水洗槽、Kはクロメート処理槽、L,M
は水洗槽、N,Oは風乾槽、Pは乾燥室、Qはラック外
し位置である。
A processing tank 4 is mounted on the base 2. This processing tank 4 is provided in the mode shown in FIG. Here, in FIG. 3, A is a rack mounting position, B is an alkaline degreasing tank, C is a washing tank, D is an alkaline degreasing tank, and E
Is a washing tank, F is a galvanizing tank, G and H are washing tanks, I is a nitric acid activating tank, J is a washing tank, K is a chromate treatment tank, and L and M.
Is a washing tank, N and O are air drying tanks, P is a drying room, and Q is a rack removal position.

【0014】ここで、亜鉛めっき槽F以外の槽は、幅2
00mm×奥行120mm×深さ300mm程度の大き
さに形成されており、亜鉛めっき槽Fは、これら槽が8
個分連接された大きさに形成されている。また、ラック
付け位置Aは、亜鉛めっき槽F以外の槽と同じスペース
を有しており、乾燥室Pは、これらスペースが7個分連
接したスペースを有している。
Here, tanks other than the galvanizing tank F have a width of 2 mm.
It is formed in a size of about 00 mm × depth 120 mm × depth 300 mm.
It is formed in a size that is connected by individual pieces. The rack mounting position A has the same space as the tanks other than the galvanizing tank F, and the drying chamber P has a space in which these spaces are connected by seven.

【0015】そして、この装置1全体の大きさとして
は、約長さ2.6m×幅0.8m×高さ1.7m程度の
大きさに形成されている。
The overall size of the apparatus 1 is about 2.6 m in length × 0.8 m in width × 1.7 m in height.

【0016】なお、本発明は勿論これに制限されるもの
ではなく、めっきの種類、めっき工程などは適宜変更で
き、めっき槽の大きさも要求する膜厚等に応じて変更で
きるが、本発明装置は、全体の大きさとして、長さ2〜
5m×幅0.5〜2m程度、特に長さ2〜4m×幅0.
5〜1.5m程度としたものに好適に用いられる。
The present invention is, of course, not limited to this. The type of plating, the plating step, and the like can be changed as appropriate, and the size of the plating tank can be changed according to the required film thickness. Has a length of 2 to 2
About 5 m × width 0.5 to 2 m, particularly length 2 to 4 m × width 0.
It is suitably used for those having a thickness of about 5 to 1.5 m.

【0017】上記図示の装置において、被めっき物を支
持する治具10は、図4に示したように、スチール線、
銅線等の金属線により形成され、上部に被挟持部11が
形成され、下部に被めっき物を吊持する被めっき物支持
部12が形成されたもので、この場合、被挟持部11、
被めっき物支持部12以外の部分は、プラスチゾル等に
よる絶縁コート膜13が施され、被挟持部11、被めっ
き物支持部12のみが導通可能に形成されている。な
お、この治具10は、被めっき物を4個吊下可能に形成
されているが、これに限定されるものではなく、また、
被めっき物の支持態様も吊下する態様に限られず、被め
っき物の形状等に応じて適宜選定し得る。
In the above-described apparatus, the jig 10 for supporting the object to be plated is, as shown in FIG.
It is formed of a metal wire such as a copper wire, and has a clamped portion 11 formed at an upper portion, and a plated object support portion 12 for suspending a plated object is formed at a lower portion. In this case, the clamped portion 11,
An insulating coat film 13 made of plastisol or the like is applied to portions other than the plating object support portion 12, and only the sandwiched portion 11 and the plating object support portion 12 are formed to be conductive. The jig 10 is formed so as to be able to suspend four objects to be plated, but is not limited to this.
The mode of supporting the object to be plated is not limited to the mode of suspension, and may be appropriately selected according to the shape of the object to be plated.

【0018】図示の装置において、上記治具10は、図
5に示す挟持部材(支持部材)20により着脱可能に挟
持される。この挟持部材20は、一対の挟持板21,2
2がバネ23を介して連結されていると共に、このバネ
23の付勢力により、常時は上記両挟持板21,22の
下端部が強く当接していると共に、上端部が離間してお
り、上記バネ23の付勢力に抗して挟持板21,22の
上端部を互いに近接するように押圧すると、両挟持板2
1,22の下端部が離間するように構成されており、こ
の挟持部材20の両挟持板21,22下端部間に上記治
具10の被挟持部11がしっかりと挟持されるようにな
っている。
In the illustrated apparatus, the jig 10 is detachably held by a holding member (support member) 20 shown in FIG. The holding member 20 includes a pair of holding plates 21 and
2 are connected via a spring 23, and the lower ends of the holding plates 21 and 22 are always in strong contact with each other by the urging force of the spring 23, and the upper ends are separated from each other. When the upper ends of the holding plates 21 and 22 are pressed so as to approach each other against the urging force of the spring 23, the holding plates 2
The lower end portions of the jig 10 are firmly held between the lower ends of the holding plates 21 and 22 of the holding member 20. I have.

【0019】上記装置1には、上記処理槽4上方に存し
て機枠3に対し走行可能に支持されたエンドレスチェー
ン(走行部材)30が機枠3の周方向に沿って巻装され
ており、上記挟持部材20の一方の挟持板21はこのチ
ェーン30に固着されており、従って、挟持部材20
は、チェーン30の走行と一体に走行するようになって
いる。なお、図中31はスプロケットである。
In the apparatus 1, an endless chain (running member) 30, which is located above the processing tank 4 and supported so as to be able to travel with respect to the machine frame 3, is wound around the machine frame 3 in the circumferential direction. The holding plate 21 of the holding member 20 is fixed to the chain 30.
Is designed to travel integrally with the travel of the chain 30. In the figure, reference numeral 31 denotes a sprocket.

【0020】ここで、上記機枠3上には、図6に示した
ように、シリンダー40が配設されており、このシリン
ダー40に往復動可能に設けられたピストン41の先端
部に押圧部材42が取り付けられている。なお、ピスト
ン41は、装置1の長さ方向に沿って配設されており、
また押圧部材42は、その下部43が前方(チェーン3
0の進行方向)に向けて折曲可能に形成されている。そ
して、上記機枠3が上昇限位置にある時、上記ピストン
41が前方に向けて所定距離(上記各槽の長さ分、例え
ば最初のアルカリ脱脂槽Bから次の水洗槽Cに至る長
さ)進出すると、上記押圧部材42の下部が上記チェー
ン30に取り付けられた挟持部材20の上部を前方に押
圧し、これによって挟持部材20を1個前方の槽に向け
て移動させることと一体に、チェーン30を間欠的に走
行させるようになっている。
Here, as shown in FIG. 6, a cylinder 40 is disposed on the machine frame 3 and a pressing member is attached to the tip of a piston 41 reciprocally mounted on the cylinder 40. 42 are attached. Note that the piston 41 is provided along the length direction of the device 1,
The lower portion 43 of the pressing member 42 has a front portion (chain 3
(The traveling direction of 0). When the machine frame 3 is at the upper limit position, the piston 41 is moved forward by a predetermined distance (for the length of each tank, for example, the length from the first alkaline degreasing tank B to the next washing tank C). ) When advanced, the lower part of the pressing member 42 presses the upper part of the holding member 20 attached to the chain 30 forward, thereby moving the holding member 20 toward the front tank by one. The chain 30 runs intermittently.

【0021】また、このように押圧部材42が一の挟持
部材20を前方に押圧してワンピッチ(上記各槽の長さ
分、例えば最初のアルカリ脱脂槽Bから次の水洗槽Cに
至る長さ)進行させた後は、ピストン41が後退してシ
リンダー40内に退入するが、この場合、押圧部材42
は、その下部が上記一の挟持部材20の一個後方の他の
挟持部材20に当接し、この際、押圧部材42の下部が
前方に折曲し、この折曲部分が挟持部材20の上端面を
当接しながら後退することにより、上記押圧部材42が
上記他の挟持部材20を後方に押圧することなく、スム
ーズに他の挟持部材20の後方位置まで後退し、ピスト
ン41の前進時にこの他の挟持部材20を前方に押圧し
得るようになっている。
Further, as described above, the pressing member 42 presses the one holding member 20 forward to make one pitch (for the length of each tank, for example, the length from the first alkaline degreasing tank B to the next washing tank C). After the advance, the piston 41 retreats and retreats into the cylinder 40. In this case, the pressing member 42
The lower portion of the pressing member 42 abuts against the other holding member 20 behind the one holding member 20. At this time, the lower portion of the pressing member 42 is bent forward, and the bent portion is the upper end surface of the holding member 20. The pressing member 42 smoothly retracts to the rear position of the other holding member 20 without pressing the other holding member 20 backward, and the other The holding member 20 can be pressed forward.

【0022】従って、本実施例の装置1において、上述
したように、機枠3は上下動し、この機枠3の上下動と
一体に、この機枠3に走行可能に取り付けられたチェー
ン30に固着された挟持部材20及びこの挟持部材20
に挟持された治具10が上下動し、機枠3の上昇限位置
において、治具10がめっき槽F等の槽から引き上げら
れてその上方に位置し、また機枠3の下降限位置におい
て、治具10がめっき槽F等の槽内に位置するようにな
っていると共に、機枠3が上昇限位置にある時に、ピス
トン41及びこれと一体に押出部材42が前方に進出す
ることにより、上述したように、挟持部材20及びこれ
と一体に治具10を上記ワンピッチ分前方に移動させる
ように構成されている。なお、上記機枠3の上下動及び
ピストン41の往復動は、タイマーにより所定時間間隔
ごとに行われるようになっている。
Accordingly, in the apparatus 1 of the present embodiment, as described above, the machine frame 3 moves up and down, and the chain 30 movably attached to the machine frame 3 is integrated with the machine frame 3 up and down movement. Holding member 20 fixed to the member and the holding member 20
The jig 10 held by the jig moves up and down, and the jig 10 is lifted up from a tank such as the plating tank F and positioned above the ascending limit position of the machine frame 3. The jig 10 is located in a tank such as the plating tank F, and when the machine frame 3 is at the ascending limit position, the piston 41 and the pushing member 42 integrally advance with the piston 41 to advance forward. As described above, the holding member 20 and the jig 10 are integrally moved with the holding member 20 by one pitch. The vertical movement of the machine frame 3 and the reciprocation of the piston 41 are performed at predetermined time intervals by a timer.

【0023】従って、挟持部材20及びこれに挟持され
た治具10は、所定時間間隔ごとに、機枠3の下降によ
り下降してめっき槽F等の槽で所定の処理が行われた
後、機枠3の上昇により上昇し、次いでピストン41が
ワンピッチ分進出することにより、ワンピッチ分前方に
移動し、この位置で上記と同様に下降、上昇を行い、次
いでワンピッチ分前方に移動するという動作の繰り返し
により、治具10が搬送されて被めっき物の処理が行わ
れるものであり、この動作は、8個分の槽が連続しため
っき槽Fや乾燥室Pにおいても同様であり、例えばめっ
き槽Fにおいて、治具10に支持された被めっき物は、
この長いめっき槽F内をその一端から他端までめっき液
中に浸漬されたままの状態で移動するのではなく、上記
した動作の通り、ワンピッチごと上下動を繰り返し、め
っき液中に浸漬され、次いでこれから引き上げられ、再
度めっき液中に浸漬されるという動作を繰り返しながら
移動するものである。
Accordingly, the holding member 20 and the jig 10 held by the holding member 20 are lowered by the lowering of the machine frame 3 at predetermined time intervals, and are subjected to predetermined processing in a tank such as the plating tank F. When the machine frame 3 rises, the piston 41 moves forward by one pitch, and then moves forward by one pitch. At this position, it descends and rises in the same manner as described above, and then moves forward by one pitch. The jig 10 is conveyed by repetition to process the object to be plated. This operation is the same in the plating tank F and the drying chamber P in which eight tanks are continuous. In F, the object to be plated supported by the jig 10 is:
Rather than moving in this long plating tank F from one end to the other end while being immersed in the plating solution, as described above, it repeats up and down movement by one pitch, and is immersed in the plating solution, Next, it is lifted up and moved while repeating the operation of being immersed again in the plating solution.

【0024】上記装置1によりめっきを行う場合は、被
めっき物を治具10に支持し、この治具10をラック付
け位置Aにおいて挟持部材20に挟持させるものであ
り、それ以後は、上記機枠3の下降、上昇、挟持部材2
0のワンピッチ分の前方への移動がタイマーにより所定
時間間隔ごとに繰り返されることにより、自動的に処理
が行われるものである。
When plating is performed by the apparatus 1, the object to be plated is supported by a jig 10, and the jig 10 is held by a holding member 20 at a rack mounting position A. Lowering and raising the frame 3, holding member 2
The process is automatically performed by repeating the forward movement of 0 for one pitch by a timer at predetermined time intervals.

【0025】即ち、図3に示したように、アルカリ脱脂
B、水洗C、アルカリ脱脂D、水洗Eが順次行われた
後、亜鉛めっき槽Fに移動し、亜鉛めっき処理が行われ
る。
That is, as shown in FIG. 3, after alkali degreasing B, water washing C, alkali degreasing D, and water washing E are sequentially performed, the wafer is moved to a galvanizing tank F and zinc plating is performed.

【0026】ここで、治具10が亜鉛めっき槽Fの第1
槽部分F1の上方に位置した状態、乃至はこの位置で下
降してその下降限位置において被めっき物がめっき液中
に浸漬された状態において、図7に示したように、亜鉛
めっき槽Fとほぼ同じ長さを有する一対のブスバー部材
50,51により治具10が挟持される。即ち、これら
ブスバー部材50,51は、それぞれ機枠3に取り付け
られているもので、一方のブスバー部材50が機枠3に
固定されていると共に、他方のブスバー部材51が図示
していない駆動機構により一方のブスバー部材50に接
離可能に設けられており、常時は両ブスバー部材50,
51は所定間隔離間しているが、被めっき物が上記上昇
限位置に移動して停止された時、乃至はめっき液に浸漬
された時に、他方のブスバー部材51が一方のブスバー
部材50に近接し、両ブスバー部材50,51により治
具10の上部が挟持されるものである。ここで、両ブス
バー部材50,51の少なくとも一方の内側は、銅等の
金属52にて形成されていると共に、直流電源(図示せ
ず)のマイナス極に接続されており、従って、治具10
の上部が両ブスバー部材50,51によって挟持される
ことにより、治具10を介して被めっき物にマイナスの
電気が与えられ、電気亜鉛めっき槽F内に配設され、上
記直流電源のプラス極に接続された亜鉛板等の陽極との
間に電気が流れ、電気亜鉛めっきが行われるものであ
る。そして、このようなブスバー部材50,51による
治具10の挟持は、少なくとも治具10の上記ワンステ
ップ分の進行時には、他方のブスバー部材51が一方の
ブスバー部材50より離間することにより解消され、こ
れにより治具10、従って挟持部材20の移動が阻害さ
れず、スムーズに行われる。
Here, the jig 10 is the first of the galvanizing tank F.
As shown in FIG. 7, in a state of being located above the tank portion F1 or in a state where the object to be plated is immersed in the plating solution at the descent position at this position and at the descent limit position, as shown in FIG. The jig 10 is held between a pair of busbar members 50 and 51 having substantially the same length. That is, the busbar members 50 and 51 are respectively attached to the machine frame 3. One busbar member 50 is fixed to the machine frame 3, and the other busbar member 51 is connected to a drive mechanism (not shown). The bus bar member 50 is provided so as to be able to contact and separate from one bus bar member 50 at all times.
51 are separated by a predetermined distance, but when the object to be plated is moved to the above-mentioned ascending limit position and stopped, or when immersed in the plating solution, the other bus bar member 51 comes close to the one bus bar member 50. The upper portion of the jig 10 is sandwiched between the bus bar members 50 and 51. Here, the inside of at least one of the busbar members 50 and 51 is formed of a metal 52 such as copper and is connected to the negative pole of a DC power supply (not shown).
Is sandwiched between the busbar members 50 and 51 to apply negative electricity to the object to be plated through the jig 10 and to be disposed in the electrogalvanizing tank F. Electricity flows between an anode such as a zinc plate and the like, and electrogalvanization is performed. The pinching of the jig 10 by the bus bar members 50 and 51 is eliminated by separating the other bus bar member 51 from the one bus bar member 50 at least when the jig 10 advances by one step. Accordingly, the movement of the jig 10 and therefore the holding member 20 is not hindered, and the movement is performed smoothly.

【0027】このように、めっき槽Fの上方にブスバー
部材50,51を設け、これらブスバー部材50,51
により治具10を挟持して通電することにより、通常の
ようにめっき槽上にブスバーを架け渡す方式に比べて、
めっき液による汚れが少なく、清掃の手間が省けると共
に、ロードからアンロードまで常時挟持部材20に治具
10を把持したままで搬送でき、また通電不良のおそれ
もない。
As described above, the bus bar members 50 and 51 are provided above the plating tank F, and the bus bar members 50 and 51 are provided.
By energizing while holding the jig 10, compared to a method in which a bus bar is bridged over a plating tank as usual,
There is little contamination by the plating solution, cleaning work can be omitted, and the loading and unloading can be carried while holding the jig 10 on the holding member 20 at all times, and there is no danger of poor current supply.

【0028】上記亜鉛めっきF後は、2回の水洗G,H
後、コーナー部5を回って硝酸活性槽Iに移動し、硝酸
水溶液にて活性化処理が行われる。なお、上記コーナー
部5は、2ピッチ分のスペースを有するため、ここに水
洗槽を2槽分設け、水洗を行うことができる。
After the above-mentioned galvanizing F, two washings G, H
After that, it is moved to the nitric acid activating tank I around the corner portion 5 and the activation treatment is performed with a nitric acid aqueous solution. Since the corner portion 5 has a space for two pitches, two washing tanks can be provided here to perform washing.

【0029】次いで、硝酸活性化後、水洗槽Jを経て、
クロメート処理槽Kに移動し、亜鉛めっき皮膜に対して
クロメート処理が施される。この場合、このクロメート
処理槽Kの配設位置に相応して上記基台2には切欠き部
が設けられていると共に、その下方にはシリンダー60
が配設されており、このシリンダー60に往復動(上下
動)可能に設けられたピストン61の先端部が上記切欠
き部を貫通して上記クロメート処理槽Kを上下動可能に
支持しており、これによってクロメート処理時間を調節
し得るようになっている。
Next, after activating nitric acid, the solution is passed through a washing tank J,
After moving to the chromate treatment tank K, the zinc plating film is subjected to chromate treatment. In this case, the base 2 is provided with a notch corresponding to the position of the chromate treatment tank K, and a cylinder 60 is provided below the notch.
A tip of a piston 61 reciprocally (up and down) provided in the cylinder 60 penetrates the notch and supports the chromate treatment tank K so as to be able to move up and down. Thus, the chromate treatment time can be adjusted.

【0030】即ち、上述したアルカリ脱脂、水洗等の処
理時間(浸漬時間)は通常1分程度(従って、亜鉛めっ
き総時間は8分程度)とすることができるが、クロメー
ト処理は10〜30秒程度とするのが通常であり、1分
程度では長すぎる。従って、被めっき物がクロメート処
理槽Kの上方に至り、次いで下降した場合、直ちにクロ
メート液への浸漬を避けるため、ピストン61をシリン
ダー60に退入させてクロメート処理槽Kを他の槽の配
置位置より下方に位置させ、所定時間経過後、ピストン
61を上昇させ、これと一体にクロメート処理槽Kを上
昇させて他の槽の配置位置と同じ高さに位置させ、被め
っき物をクロメート液に浸漬させてクロメート処理を行
うものである。そして機枠3の上昇時にピストン61を
下降させて、クロメート処理槽Kを最初の下方位置に戻
すもので、これにより適正なクロメート処理が行われ
る。
That is, the treatment time (immersion time) for the above-described alkali degreasing, water washing and the like can be usually about 1 minute (the total zinc plating time is about 8 minutes), but the chromate treatment is 10 to 30 seconds. Usually, about 1 minute is too long. Therefore, when the object to be plated reaches the upper part of the chromate treatment tank K and then descends, the piston 61 is retracted into the cylinder 60 and the other chromate treatment tank K is arranged in order to avoid immersion in the chromate solution immediately. After a predetermined time, the piston 61 is raised, and the chromate treatment tank K is moved up together with the piston 61 so as to be positioned at the same height as the arrangement position of the other tanks. To perform a chromate treatment. Then, when the machine frame 3 is raised, the piston 61 is lowered to return the chromate treatment tank K to the initial lower position, whereby proper chromate treatment is performed.

【0031】次いで、水洗L,M、風乾N,Oを行う。
ここで、風乾N,O工程では、空の槽を配設してある。
更に、風乾N,O後、乾燥室Pにて乾燥される。この場
合、乾燥室Pは、上端中央部が治具10の上部が通過可
能なスリットが設けられていると共に、入口窓部及び出
口窓部を有する筐体80にて仕切られ、内部が温風等に
より60〜90℃に加熱、乾燥されるようになってい
る。なお、上記入口窓部及び出口窓部にはカーテンが配
設され、治具10及び被めっき物は、これらカーテンを
分けるようにして乾燥室Pに入り、またこれから出るよ
うになっている。
Then, washing L and M and air drying N and O are performed.
Here, in the air-dried N, O step, an empty tank is provided.
Furthermore, after air drying N and O, it is dried in the drying chamber P. In this case, the drying chamber P is provided with a slit at the center of the upper end through which the upper part of the jig 10 can pass, and is separated by a housing 80 having an entrance window and an exit window, and the inside is heated by hot air. For example, it is heated to 60 to 90 ° C. and dried. A curtain is provided at the entrance window and the exit window, and the jig 10 and the object to be plated enter and exit the drying chamber P so as to separate these curtains.

【0032】ラック外し位置Qには、図8に示したよう
に、機枠3に挟持解消部材70が設けられている。この
挟持解消部材70は、シリンダー71に装置1の幅方向
に沿って往復動可能に設けられたピストン72の先端部
押圧体73が取り付けられたもので、治具10がラック
外し位置Qに至ると、ピストン72がシリンダー71に
退入し、これと一体に押圧体73が移動して、押圧体7
3の下部が挟持部材20の他方の挟持板22の上部を一
方の挟持板21方向に押圧してこれに近接させ、これに
より両挟持板21,22の下端部間が離間して治具10
に対する挟持状態が解消され、治具10が挟持部材20
から取り外されるものである。なお、取り外された治具
10は、その落下位置の直下に設けられた、図示してい
ないガイドワイヤに引っ掛けられて、被めっき物取り外
し位置に誘導されるようになっている。
At the rack removal position Q, as shown in FIG. The holding member 70 has a cylinder 71 on which a tip pressing body 73 of a piston 72 provided reciprocally along the width direction of the apparatus 1 is attached, and the jig 10 reaches the rack removal position Q. Then, the piston 72 retreats into the cylinder 71, and the pressing body 73 moves integrally therewith, and the pressing body 7
3 presses the upper portion of the other holding plate 22 of the holding member 20 in the direction of the one holding plate 21 so as to be close to the holding plate 21, whereby the lower ends of the holding plates 21 and 22 are separated and the jig 10 is separated.
Is released, and the jig 10 is moved to the holding member 20.
Is removed from the The detached jig 10 is hooked on a guide wire (not shown) provided immediately below the drop position, and is guided to the object-to-be-plated removal position.

【0033】従って、上記装置によれば、被めっき物を
全自動により電気亜鉛めっき、クロメート処理、乾燥と
いった処理を良好に行うことができる。
Therefore, according to the above-described apparatus, the object to be plated can be satisfactorily subjected to fully automatic electrogalvanizing, chromate treatment, and drying.

【0034】なお、本発明は、電気亜鉛めっきに限られ
ず、他の電気めっき、無電解めっきといっためっき処
理、塗装、陽極酸化、化成処理等の他の表面処理にも適
用することができ、電気めっき処理のほか、浸漬による
塗装処理、電着塗装処理、スプレー塗装処理等に対して
も好適に用いられる。この場合、塗装処理は、脱脂→表
面活性→塗装→乾燥という工程とすることができ、全長
1〜2.5m、幅0.7〜1.5m程度の装置とするこ
とができる。
The present invention is not limited to electrogalvanizing, but can be applied to other surface treatments such as plating, such as other electroplating and electroless plating, painting, anodic oxidation, and chemical conversion. In addition to the plating treatment, it is suitably used for coating treatment by immersion, electrodeposition coating treatment, spray coating treatment and the like. In this case, the coating process can be a process of degreasing → surface activity → coating → drying, and can be an apparatus having a total length of 1 to 2.5 m and a width of about 0.7 to 1.5 m.

【0035】[0035]

【発明の効果】本発明の全自動小型表面処理装置は、構
成が簡単で安価に製作し得、小型部品を自動的に良好に
表面処理することができる。
The fully automatic small-sized surface treatment apparatus of the present invention has a simple structure and can be manufactured at low cost, and can automatically and properly treat small parts.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を示す正面図である。FIG. 1 is a front view showing one embodiment of the present invention.

【図2】同例の右側面図である。FIG. 2 is a right side view of the same example.

【図3】同例の槽配置態様を示す平面図である。FIG. 3 is a plan view showing a tank arrangement of the same example.

【図4】同例で用いる治具の一例を示す斜視図である。FIG. 4 is a perspective view showing an example of a jig used in the example.

【図5】同例で用いる挟持部材(支持部材)の側面図で
ある。
FIG. 5 is a side view of a holding member (supporting member) used in the same example.

【図6】同例で用いる押圧部材の正面図である。FIG. 6 is a front view of a pressing member used in the example.

【図7】同例で用いるブスバー部材の側面図である。FIG. 7 is a side view of a bus bar member used in the same example.

【図8】同例で用いる解消部材の側面図である。FIG. 8 is a side view of a canceling member used in the example.

【符号の説明】[Explanation of symbols]

1 めっき装置 2 基台 3 機枠 4 処理槽 10 治具 20 挟持部材(支持部材) 30 チェーン(走行部材) 42 押圧部材 50,51 ブスバー部材 60 シリンダー 61 ピストン 70 挟持解消部材 DESCRIPTION OF SYMBOLS 1 Plating apparatus 2 Base 3 Machine frame 4 Processing tank 10 Jig 20 Nipping member (supporting member) 30 Chain (running member) 42 Pressing member 50, 51 Bus bar member 60 Cylinder 61 Piston 70 Nipping releasing member

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 表面処理装置基台に機枠を上下動可能に
設けると共に、この機枠に所定ピッチずつ間欠的に走行
する走行部材を設け、この走行部材に被処理物が支持さ
れる治具の上部を支持する支持部材を取り付け、かつ上
記基台上に上記ピッチに相応した上記走行部材下方位置
において表面処理槽を配設したことを特徴とする全自動
小型表面処理装置。
An apparatus frame is provided on a base of a surface treatment apparatus so as to be vertically movable, and a traveling member that intermittently travels at a predetermined pitch is provided on the machine frame, and the traveling member supports a workpiece to be processed. A small-sized automatic surface treatment apparatus, comprising: a support member for supporting an upper portion of a tool; and a surface treatment tank disposed on the base below the traveling member corresponding to the pitch.
【請求項2】 上記機枠に上記ピッチ分に相当する長さ
で往復動する押圧部材を設け、この押圧部材により上記
支持部材を押圧して上記ピッチ分前進させると共に、こ
れと一体に上記走行部材を上記ピッチ分走行させるよう
にした請求項1記載の全自動小型表面処理装置。
2. A pressing member reciprocating at a length corresponding to the pitch is provided on the machine frame, and the supporting member is pressed by the pressing member to advance the supporting member by the pitch, and the traveling is integrally performed with the pressing member. 2. The fully automatic small surface treatment apparatus according to claim 1, wherein the member is caused to travel by the pitch.
【請求項3】 表面処理装置が通電による表面処理を行
う処理槽を含み、この処理槽の上方に被処理物が少なく
ともこの処理槽で処理されている間において、上記治具
の上部を挟持して治具を通電すると共に、上記支持部材
が上記ピッチ分移動する間は少なくとも治具の挟持が解
消されて互いに離間する一対のブスバー部材を上記機枠
に設けた請求項1又は2記載の全自動小型表面処理装
置。
3. A surface treatment apparatus includes a treatment tank for performing a surface treatment by energization, and holds an upper portion of the jig above the treatment tank while at least the object to be treated is being treated in the treatment tank. 3. The apparatus frame according to claim 1, further comprising: a pair of busbar members that are separated from each other while the holding of the jig is canceled while the support member moves by the pitch while the jig is energized. Automatic small surface treatment equipment.
【請求項4】 表面処理装置が他の処理槽による処理時
間より短い処理を行う処理槽を含み、この処理槽を常時
は上記他の処理槽より下方位置に配置すると共に、所定
時間後にこの処理槽を上記他の処理槽と同じ高さまで上
昇させるよう構成した請求項1,2又は3記載の全自動
小型表面処理装置。
4. A surface treatment apparatus includes a treatment tank for performing a treatment shorter than a treatment time by another treatment tank, and the treatment tank is always disposed at a position lower than the other treatment tank, and after a predetermined time, the treatment tank is disposed. 4. The fully automatic small-sized surface treatment apparatus according to claim 1, wherein the tank is raised to the same height as the other processing tanks.
【請求項5】 表面処理装置が電気亜鉛めっき槽、クロ
メート槽及び乾燥室を含む電気亜鉛めっき装置である請
求項1乃至4のいずれか1項記載の全自動小型表面処理
装置。
5. The fully automatic small surface treatment apparatus according to claim 1, wherein the surface treatment apparatus is an electrogalvanizing apparatus including an electrogalvanizing tank, a chromate tank, and a drying chamber.
【請求項6】 表面処理装置が電着塗装、浸漬塗装、ス
プレー塗装等の塗装用表面処理槽及び乾燥室を含む塗装
装置である請求項1乃至5のいずれか1項記載の全自動
小型表面処理装置。
6. The fully automatic small-sized surface according to claim 1, wherein the surface treatment device is a painting device including a surface treatment tank for painting such as electrodeposition coating, dip painting, spray painting and a drying chamber. Processing equipment.
【請求項7】 全長が2〜5mである請求項1乃至6の
いずれか1項記載の全自動小型表面処理装置。
7. The fully automatic small-sized surface treatment apparatus according to claim 1, wherein the total length is 2 to 5 m.
JP26660899A 1999-09-21 1999-09-21 Fully automatic compact surface treating device Pending JP2001089899A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017145481A (en) * 2016-02-19 2017-08-24 株式会社Screenホールディングス Substrate treatment system and substrate treatment method
JP2018141191A (en) * 2017-02-27 2018-09-13 株式会社村田製作所 Energizing method, energizing jig, chemical treatment method, and method of producing solid electrolytic capacitor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017145481A (en) * 2016-02-19 2017-08-24 株式会社Screenホールディングス Substrate treatment system and substrate treatment method
WO2017141495A1 (en) * 2016-02-19 2017-08-24 株式会社Screenホールディングス Substrate treatment system and substrate treatment method
JP2018141191A (en) * 2017-02-27 2018-09-13 株式会社村田製作所 Energizing method, energizing jig, chemical treatment method, and method of producing solid electrolytic capacitor

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