JP2001089865A - Stainless steel sheet low in contact resistance and its producing method - Google Patents
Stainless steel sheet low in contact resistance and its producing methodInfo
- Publication number
- JP2001089865A JP2001089865A JP26660799A JP26660799A JP2001089865A JP 2001089865 A JP2001089865 A JP 2001089865A JP 26660799 A JP26660799 A JP 26660799A JP 26660799 A JP26660799 A JP 26660799A JP 2001089865 A JP2001089865 A JP 2001089865A
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- stainless steel
- concentration
- contact resistance
- steel sheet
- weight
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Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、低接触抵抗が要求され
る電気部品,電子部品等に使用されるステンレス鋼板及
びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a stainless steel sheet used for electric parts, electronic parts and the like which require a low contact resistance and a method for producing the same.
【0002】[0002]
【従来の技術】SUS430,SUS304に代表され
る従来のステンレス鋼は、表面に形成されている不動態
皮膜により優れた耐食性を呈する。不動態皮膜は、Cr
を主体とし、その他にSi,Mn等を含む酸化物や水酸
化物の皮膜である。不動態皮膜を構成する酸化物や水酸
化物は、比電気抵抗が高く導電性が劣るため、たとえば
電池の缶体,電池等を固定するためのバネ材,電磁リレ
ー等の電気回路接点等の用途には好ましくない。導電性
を重視し、電気回路接点用の材料としてCu合金が使用
されている。しかし、Cu合金は耐食性が十分でなく、
発錆による導電性劣化の問題もある。そこで、ステンレ
ス鋼本来の優れた耐食性を活用するため、Niめっき等
により不動態皮膜に由来する欠点を解消する方法が一部
で採用されている(特開昭63−145793号公
報)。2. Description of the Related Art Conventional stainless steels represented by SUS430 and SUS304 exhibit excellent corrosion resistance due to a passive film formed on the surface. The passive film is made of Cr
And oxide and hydroxide films containing Si, Mn, etc. Oxides and hydroxides constituting the passivation film have a high specific electrical resistance and poor conductivity. For example, battery can bodies, spring materials for fixing batteries, etc., electric circuit contacts such as electromagnetic relays, etc. Not preferred for use. With an emphasis on conductivity, Cu alloys are used as materials for electric circuit contacts. However, Cu alloys have insufficient corrosion resistance,
There is also a problem of conductivity deterioration due to rusting. Therefore, in order to utilize the excellent corrosion resistance inherent in stainless steel, a method of partially eliminating a defect derived from a passive film by Ni plating or the like has been partially adopted (Japanese Patent Application Laid-Open No. 63-145793).
【0003】[0003]
【発明が解決しようとする課題】Niめっきは、電気め
っきや無電解めっきでステンレス鋼板表面に施される
が、何れもコストの高いめっき法である。また、めっき
工程を必要とすることから、工数の増加を招き、廃液処
理の負担も大きくなる。更には、形成されたNiめっき
層のステンレス鋼板表面に対する密着性が不足すると、
成形加工,取扱い等の際に剥離し、Niめっき層の長所
が損われる。本発明は、このような問題を解消すべく案
出されたものであり、ステンレス鋼板の不動態皮膜を含
めた表層を改質することにより、めっき等の工程付加を
必要とせず、ステンレス鋼板自体の接触抵抗を下げるこ
とを目的とする。The Ni plating is applied to the surface of the stainless steel plate by electroplating or electroless plating, and both are expensive plating methods. Further, since a plating step is required, the number of steps is increased, and the burden of waste liquid treatment is also increased. Furthermore, if the adhesion of the formed Ni plating layer to the stainless steel sheet surface is insufficient,
Peeling occurs during molding and handling, and the advantages of the Ni plating layer are lost. The present invention has been devised to solve such a problem. By modifying a surface layer including a passivation film of a stainless steel sheet, it is not necessary to add a process such as plating, and the stainless steel sheet itself is not required. The purpose of the present invention is to reduce the contact resistance.
【0004】[0004]
【課題を解決するための手段】本発明のステンレス鋼板
は、その目的を達成するため、1.0重量%以上のCu
を含み、Cuを主体とする第2相が0.2体積%以上の
割合でマトリックスに分散析出しているステンレス鋼を
基材とし、Cu主体の第2相が析出している表面部を除
く基材表面に不動態皮膜が形成されていることを特徴と
する。 不動態皮膜は、ステンレス鋼板の全面に生成さ
せても良い。この場合、ステンレス鋼板の最表層又は不
動態皮膜に含まれるCuを、Si濃度及びMn濃度に対
するCu濃度の重量比Cu/(Si+Mn)が0.5以
上となるように濃化させることによって接触抵抗を下げ
ることができる。更には、Cuを主体とする第2相(以
下、Cuリッチ相という)の露出と不動態皮膜又は最表
層へのCuの濃化を組み合わせると、接触抵抗が一層低
下する。In order to achieve the object, the stainless steel sheet of the present invention has a Cu content of 1.0% by weight or more.
The base material is a stainless steel in which a second phase mainly composed of Cu is dispersed and precipitated in a matrix at a rate of 0.2% by volume or more, and a surface portion where a second phase mainly composed of Cu is precipitated is excluded. A passive film is formed on the surface of the substrate. The passivation film may be formed on the entire surface of the stainless steel plate. In this case, the contact resistance is increased by enriching the Cu contained in the outermost layer or the passive film of the stainless steel sheet so that the weight ratio of the Cu concentration to the Si concentration and the Mn concentration Cu / (Si + Mn) becomes 0.5 or more. Can be lowered. Furthermore, when the exposure of the second phase mainly composed of Cu (hereinafter, referred to as Cu-rich phase) and the concentration of Cu in the passivation film or the outermost layer are combined, the contact resistance is further reduced.
【0005】ステンレス鋼板としては、1.0重量%以
上のCuを含む限り鋼種に特段の制約を受けることな
く、フェライト系,オーステナイト系,マルテンサイト
系,二相系等、各種ステンレス鋼板が使用される。最終
焼鈍として露点−30℃以下の雰囲気で光輝焼鈍するこ
とにより、ステンレス鋼板の表層にCuが濃化する。或
いは、大気雰囲気で最終焼鈍した後、フッ酸−硝酸,硫
酸−硝酸等の混酸で酸洗することによりCuを濃化させ
ることも可能である。Cuリッチ相が析出したステンレ
ス鋼板を基材に使用する場合、最終焼鈍までの工程でた
とえば800℃前後で1時間以上の時効処理を施すこと
により、ステンレス鋼板表面の接触抵抗を下げるために
必要な析出量が得られる。[0005] As the stainless steel sheet, various stainless steel sheets such as ferritic, austenitic, martensitic, and duplex stainless steels are used without any particular restrictions on the type of steel as long as the steel contains 1.0% by weight or more of Cu. You. By performing bright annealing in an atmosphere having a dew point of −30 ° C. or less as final annealing, Cu is concentrated on the surface layer of the stainless steel sheet. Alternatively, after final annealing in an air atmosphere, Cu can be concentrated by pickling with a mixed acid such as hydrofluoric acid-nitric acid or sulfuric acid-nitric acid. When a stainless steel sheet in which a Cu-rich phase is precipitated is used as a substrate, it is necessary to reduce the contact resistance on the surface of the stainless steel sheet by performing an aging treatment at, for example, about 800 ° C. for 1 hour or more in the process up to final annealing. The amount of precipitation is obtained.
【0006】[0006]
【作用】不動態皮膜は、ステンレス鋼の耐食性を向上さ
せる上では有効なものであるが、比電気抵抗の高い酸化
物等からなるためステンレス鋼板の接触抵抗を大きくす
る原因である。そこで、本発明者等は、導電性のある物
質を不動態皮膜に含ませ、或いはステンレス鋼の表層に
濃化させることによって不動態皮膜を改質し、接触抵抗
を低下させる方法を調査検討した。調査検討の過程で、
Cu含有ステンレス鋼が小さな接触抵抗を示すことを見
出した。なかでも、1.0重量%以上のCuを含み、C
uリッチ相が0.2体積%以上の割合で分散析出してい
るステンレス鋼では接触抵抗の低下が顕著であった。基
材であるステンレス鋼に含まれるCuの含有量は、接触
抵抗の低下に有効な表面Cu濃度及び/又はCuリッチ
相を確保する上から1.0重量%以上とする。Cu含有
量が多くなるほどCuリッチ相の分散析出量も多くなり
不動態皮膜又は表層のCu濃化が進行するが、過剰なC
u添加は熱間加工性の低下を招き、製造性を阻害する虞
れがある。したがって、Cu含有量の上限は、5重量%
とすることが好ましい。The passivation film is effective in improving the corrosion resistance of stainless steel, but it is made of an oxide or the like having a high specific electric resistance, and is a cause of increasing the contact resistance of the stainless steel plate. Therefore, the present inventors have investigated and studied a method of modifying the passivation film by including a conductive substance in the passivation film or concentrating it on the surface layer of stainless steel to reduce the contact resistance. . During the investigation process,
It has been found that Cu-containing stainless steel exhibits low contact resistance. Among them, Cu containing 1.0% by weight or more and C
In stainless steel in which the u-rich phase was dispersed and precipitated at a rate of 0.2% by volume or more, the contact resistance was remarkably reduced. The content of Cu contained in the stainless steel as the base material is set to 1.0% by weight or more from the viewpoint of ensuring a surface Cu concentration and / or a Cu-rich phase effective for reducing the contact resistance. As the Cu content increases, the amount of the Cu-rich phase dispersed and precipitated increases, and the Cu concentration of the passivation film or the surface layer progresses.
The addition of u causes a reduction in hot workability, which may impair the manufacturability. Therefore, the upper limit of the Cu content is 5% by weight.
It is preferable that
【0007】この知見をベースにして基材に含まれるC
uの含有量及び分散析出したCuリッチ相が接触抵抗に
及ぼす影響を調査・研究したところ、図1で模式的に示
すように基材1の表層にCuリッチ相2が析出している
と、その上にCr,Si,Mn等を含む不動態皮膜3が
形成されておらず、不動態皮膜3に開いたピンホール4
を介しCuリッチ相2が雰囲気に露出していることを解
明した。この結果から、露出しているCuリッチ相2が
導通路の一部となり、接触抵抗が低下したものと推察さ
れる。接触抵抗は、基材1に析出しているCuリッチ相
2の割合が0.2体積%以上になったとき顕著に低下す
る。[0007] Based on this finding, C contained in the base material
Investigating and studying the effects of the u-content and the dispersed and precipitated Cu-rich phase on the contact resistance, the Cu-rich phase 2 was deposited on the surface layer of the substrate 1 as schematically shown in FIG. The passivation film 3 containing Cr, Si, Mn, etc. was not formed thereon, and the pinhole 4 opened in the passivation film 3 was not formed.
Revealed that the Cu-rich phase 2 was exposed to the atmosphere. From this result, it is inferred that the exposed Cu-rich phase 2 became a part of the conduction path and the contact resistance decreased. The contact resistance is remarkably reduced when the ratio of the Cu-rich phase 2 precipitated on the substrate 1 becomes 0.2% by volume or more.
【0008】基材の表層にCuリッチ相が析出していな
い場合でも、Si濃度及びMn濃度に対するCu濃度の
重量比Cu/(Si+Mn)が0.5以上となるように
最表層又は不動態皮膜にCuを濃化させるとき、接触抵
抗が低い値を示した。低い接触抵抗は、濃化したCuが
金属Cuや比電気抵抗の低い酸化物として最表層又は不
動態皮膜に分散していることに原因があるものと推察さ
れる。また、Cuリッチ相2の露出に加えて不動態皮膜
3又は最表層にCuが濃化していると、接触抵抗は一層
低い値を示す。Cuリッチ相2を分散析出させるための
熱処理はCu含有量によっても異なるが、一般的には8
00℃前後で1〜24時間の時効処理を施すことにより
微細なCuリッチ相2を分散析出させることができる。[0008] Even when a Cu-rich phase is not precipitated on the surface layer of the base material, the outermost layer or the passivation film is formed so that the weight ratio of the Cu concentration to the Si concentration and the Mn concentration Cu / (Si + Mn) becomes 0.5 or more. When Cu was concentrated, the contact resistance showed a low value. The low contact resistance is presumed to be due to the fact that the concentrated Cu is dispersed in the outermost layer or the passive film as metal Cu or an oxide having a low specific electric resistance. Further, when Cu is concentrated in the passivation film 3 or the outermost layer in addition to the exposure of the Cu-rich phase 2, the contact resistance shows a lower value. The heat treatment for dispersing and precipitating the Cu-rich phase 2 varies depending on the Cu content.
By performing aging treatment at about 00 ° C. for 1 to 24 hours, the fine Cu-rich phase 2 can be dispersed and precipitated.
【0009】基材表面にCuリッチ相2が分散析出した
ステンレス鋼板や不動態皮膜3又は最表層にCuが濃化
したステンレス鋼板は、最終焼鈍として光輝焼鈍を施す
場合、露点が−30℃以下の焼鈍雰囲気で光輝焼鈍する
ことにより製造される。焼鈍雰囲気の露点が低くなる
と、酸化反応が抑制されて比電気抵抗の高い金属酸化物
の増量が抑えられ、結果として金属Cu又はCu酸化物
が不動態皮膜3又は最表層に濃化される。他方、露点が
−30℃を超える焼鈍雰囲気では、Si,Mn等の酸化
進行に応じて母材内部から表層へのSi,Mn等の拡散
が促進され、比電気抵抗の高い金属酸化物を多量に含む
不動態皮膜3又は最表層が形成される。A stainless steel sheet having a Cu-rich phase 2 dispersed and precipitated on the surface of a base material or a passive steel film 3 or a stainless steel sheet having Cu concentrated on the outermost layer has a dew point of -30 ° C. or less when subjected to bright annealing as final annealing. It is manufactured by bright annealing in an annealing atmosphere of When the dew point of the annealing atmosphere is lowered, the oxidation reaction is suppressed, and the increase in the amount of the metal oxide having a high specific electrical resistance is suppressed. As a result, the metal Cu or Cu oxide is concentrated in the passive film 3 or the outermost layer. On the other hand, in an annealing atmosphere having a dew point exceeding −30 ° C., the diffusion of Si, Mn, etc. from the inside of the base material to the surface layer is promoted as the oxidation of Si, Mn, etc. progresses, and a large amount of metal oxide having a high specific electric resistance is produced. , A passivation film 3 or the outermost layer is formed.
【0010】光輝焼鈍に替えて、大気焼鈍及び酸洗によ
っても不動態皮膜3又は最表層にCuを濃化させること
ができる。ステンレス鋼板を大気焼鈍するとCr,F
e,Mn,Si,Cu等の酸化物を含むスケールが鋼板
表面に形成されるが、スケールは酸洗によって除去さ
れ、その後に不動態皮膜3が生成する。このとき、焼鈍
後のステンレス鋼板を電解酸洗すると、スケール剥離後
の鋼板表面に存在するCu又はCuリッチ相が電解反応
で母材よりも優先的に溶出する。そのため、電解酸洗後
の鋼板表面には、Cu濃度の低い不動態皮膜3が形成さ
れる。これに対し、フッ酸−硝酸,硫酸−硝酸等の混酸
を用いた酸洗では、Cu又はCuリッチ相の優先的な溶
出がなく、酸洗後に生成する不動態皮膜3にCu濃度の
低下がない。混酸としては、酸の種類や濃度に特段の制
約を受けるものではないが、一般的に濃度10体積%程
度の硫酸,フッ酸と硝酸との混液が使用される。[0010] Instead of bright annealing, Cu can be concentrated in the passive film 3 or the outermost layer by air annealing and pickling. Cr, F when stainless steel plate is annealed in air
Scales containing oxides such as e, Mn, Si, and Cu are formed on the surface of the steel sheet, but the scales are removed by pickling, and then the passivation film 3 is formed. At this time, when the anodized stainless steel sheet is electrolytically pickled, Cu or a Cu-rich phase present on the steel sheet surface after the scale exfoliation is preferentially eluted from the base material by the electrolytic reaction. Therefore, the passive film 3 having a low Cu concentration is formed on the surface of the steel sheet after the electrolytic pickling. On the other hand, in pickling using a mixed acid such as hydrofluoric acid-nitric acid or sulfuric acid-nitric acid, there is no preferential elution of Cu or a Cu-rich phase, and the passivation film 3 generated after pickling has a reduced Cu concentration. Absent. As the mixed acid, there is no particular restriction on the type and concentration of the acid, but generally a mixed solution of sulfuric acid, hydrofluoric acid and nitric acid having a concentration of about 10% by volume is used.
【0011】[0011]
【実施例】組成を表1に示す各種ステンレス鋼板の一部
を800℃で24時間保持してCuリッチ相を析出させ
た後、光輝焼鈍又は大気焼鈍を施した。光輝焼鈍では、
露点が種々異なる焼鈍雰囲気を使用した。大気焼鈍した
ステンレス鋼板には、5%硝酸を用いた電解酸洗及び6
%硝酸+2%フッ酸の混酸を用いた酸洗を施した。残り
の各種ステンレス鋼板は、Cuリッチ相の析出処理を施
すことなく、同様に光輝焼鈍し、或いは大気焼鈍後に酸
洗した。EXAMPLES Some of the stainless steel sheets having the compositions shown in Table 1 were kept at 800 ° C. for 24 hours to precipitate a Cu-rich phase, and then subjected to bright annealing or atmospheric annealing. In bright annealing,
Annealing atmospheres with different dew points were used. Electrolytic pickling using 5% nitric acid and 6%
Pickling was performed using a mixed acid of% nitric acid + 2% hydrofluoric acid. The remaining various stainless steel sheets were similarly bright annealed without being subjected to a Cu-rich phase precipitation treatment, or pickled after being air-annealed.
【0012】 [0012]
【0013】各ステンレス鋼板の表面を透過型電子顕微
鏡で観察し、マトリックスに析出しているCuリッチ相
の割合を算出した。また、グロー発光分析で分析全元素
量に対するCu,Si及びMnの濃度を求め、不動態皮
膜又は最表層の重量比Cu/(Si+Mn)を算出し
た。更に、純金製の対極及び測定端子を試験片表面に接
触させ、測定端子に100gの荷重を付加した後での接
触抵抗を測定することにより、接触抵抗を求めた。The surface of each stainless steel plate was observed with a transmission electron microscope, and the ratio of the Cu-rich phase precipitated in the matrix was calculated. Further, the concentrations of Cu, Si and Mn with respect to the total amount of the analyzed elements were determined by glow emission analysis, and the weight ratio Cu / (Si + Mn) of the passive film or the outermost layer was calculated. Further, a contact electrode made of pure gold and a measuring terminal were brought into contact with the surface of the test piece, and a contact resistance was measured after a load of 100 g was applied to the measuring terminal to obtain a contact resistance.
【0014】表2の調査結果にみられるように、Cu含
有量が1.0重量%に達しないSUS304(試験番号
1,2),SUS430(試験番号3),SUS430
J1L(試験番号4)では、20Ω以上の高い接触抵抗
を示した。Cuが1.0重量%以上添加されていても、
不動態皮膜又は最表層の重量比Cu/(Si+Mn)が
0.5を下回り、或いはCuリッチ相の析出量が0.2
体積%に達しないステンレス鋼板(試験番号5〜7)で
は、接触抵抗が依然として高い値を示した。これに対
し、Cu含有量が1.0重量%以上のステンレス鋼板を
基材とし、Cuリッチ相の析出量を0.2体積%以上又
は最表層の重量比Cu/(Si+Mn)を0.5以上に
した本発明例のステンレス鋼板(試験番号8〜17)で
は、何れも十分に低い接触抵抗を示した。なかでも、C
uリッチ相0.2体積%以上及びCu/(Si+Mn)
≧0.5の両者を満足するステンレス鋼板(試験番号
(10,13〜15,17)は、一層低い接触抵抗を示
した。As can be seen from the investigation results in Table 2, SUS304 (test numbers 1 and 2), SUS430 (test number 3) and SUS430 in which the Cu content does not reach 1.0% by weight.
J1L (test number 4) showed a high contact resistance of 20Ω or more. Even if Cu is added in an amount of 1.0% by weight or more,
The weight ratio Cu / (Si + Mn) of the passivation film or the outermost layer is less than 0.5, or the precipitation amount of the Cu-rich phase is 0.2
The stainless steel plates (test numbers 5 to 7) that did not reach volume% still showed high values of contact resistance. On the other hand, a stainless steel sheet having a Cu content of 1.0% by weight or more was used as a base material, and the precipitation amount of a Cu-rich phase was 0.2% by volume or more, or the weight ratio Cu / (Si + Mn) of the outermost layer was 0.5%. The stainless steel plates of the present invention described above (test numbers 8 to 17) all exhibited sufficiently low contact resistance. Above all, C
u-rich phase 0.2% by volume or more and Cu / (Si + Mn)
Stainless steel sheets satisfying both of ≧ 0.5 (test numbers (10, 13 to 15, 17)) showed lower contact resistance.
【0015】 [0015]
【0016】[0016]
【発明の効果】以上に説明したように、本発明のステン
レス鋼板は、Cu含有量が1.0重量%以上で0.2体
積%以上のCuリッチ相を分散析出させ、或いはCu/
(Si+Mn)≧0.5を満足するように不動態皮膜又
は最表層にCuを濃化させたステンレス鋼を基材とし、
表面にある不動態皮膜に拘わらず接触抵抗を大幅に低下
させている。そのため、ステンレス鋼本来の耐食性が確
保され、低接触抵抗を活用して各種電気部品,電子部品
等として使用される材料が提供される。As described above, in the stainless steel sheet of the present invention, a Cu-rich phase having a Cu content of 1.0% by weight or more and 0.2% by volume or more is dispersed and precipitated.
(Si + Mn) stainless steel in which the passive film or the outermost layer is Cu-enriched so as to satisfy ≧ 0.5 as a base material,
The contact resistance is greatly reduced irrespective of the passivation film on the surface. For this reason, the corrosion resistance inherent in stainless steel is ensured, and materials used as various electric parts, electronic parts, and the like are provided by utilizing low contact resistance.
【図1】 不動態皮膜のピンホールを介してCuリッチ
相が露出したステンレス鋼板表面の模式図FIG. 1 is a schematic view of a surface of a stainless steel plate in which a Cu-rich phase is exposed through a pinhole of a passive film.
Claims (4)
主体とする第2相が0.2体積%以上の割合でマトリッ
クスに分散析出しているステンレス鋼を基材とし、前記
第2相の析出部を除く前記基材の表面に不動態皮膜が形
成されていることを特徴とする接触抵抗の低いステンレ
ス鋼板。1. A stainless steel containing 1.0% by weight or more of Cu and a second phase mainly composed of Cu dispersed and precipitated in a matrix at a rate of 0.2% by volume or more. A stainless steel sheet having a low contact resistance, wherein a passivation film is formed on the surface of the base material excluding a two-phase precipitation portion.
ス鋼を基材とし、Si濃度及びMn濃度に対するCu濃
度の重量比Cu/(Si+Mn)が0.5以上の不動態
皮膜又は最表層が形成されていることを特徴とする接触
抵抗の低いステンレス鋼板。2. A passive film or outermost layer comprising a stainless steel containing 1.0% by weight or more of Cu as a base material and a weight ratio of Cu concentration to Si concentration and Mn concentration of Cu / (Si + Mn) of 0.5 or more. A stainless steel sheet having a low contact resistance, characterized by having a surface formed thereon.
鋼板を最終焼鈍する際、露点−30℃以下の雰囲気で光
輝焼鈍することにより、Si濃度及びMn濃度に対する
Cu濃度の重量比Cu/(Si+Mn)が0.5以上と
なるように不動態皮膜又は最表層にCuを濃化させるこ
とを特徴とする接触抵抗の低いステンレス鋼板の製造方
法。3. A final annealing of a stainless steel sheet containing at least 1.0% by weight of Cu is performed by bright annealing in an atmosphere having a dew point of −30 ° C. or less, whereby a weight ratio of Cu concentration to Si concentration and Mn concentration is Cu / ( A method for producing a stainless steel sheet having a low contact resistance, wherein Cu is concentrated in a passive film or an outermost layer so that (Si + Mn) becomes 0.5 or more.
鋼板を大気雰囲気で最終焼鈍した後、混酸で酸洗するこ
とにより、Si濃度及びMn濃度に対するCu濃度の重
量比Cu/(Si+Mn)が0.5以上となるように不
動態皮膜又は最表層にCuを濃化させることを特徴とす
る接触抵抗の低いステンレス鋼板の製造方法。4. A stainless steel sheet containing 1.0% by weight or more of Cu is finally annealed in an air atmosphere, and then pickled with a mixed acid to obtain a Cu / (Si + Mn) weight ratio of Cu concentration to Si concentration and Mn concentration. A method for producing a stainless steel sheet having a low contact resistance, comprising enriching Cu in a passivation film or an outermost layer so as to be 0.5 or more.
Priority Applications (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26660799A JP4368985B2 (en) | 1999-09-21 | 1999-09-21 | Stainless steel sheet with low contact resistance and method for producing the same |
DE60024504T DE60024504T2 (en) | 1999-09-21 | 2000-09-14 | Use of a stainless steel sheet with copper-rich grains dispersed in the matrix and / or with a copper-condensed layer |
EP00119431A EP1087027B1 (en) | 1999-09-21 | 2000-09-14 | Use of a stainless steel sheet having Cu-enriched grains dispersed in its matrix and/or a Cu-condensed layer |
ES04017893T ES2251709T3 (en) | 1999-09-21 | 2000-09-14 | USE OF A STAINLESS STEEL SHEET THAT HAS GRAIN ENRICHED IN CU DISPERSED IN ITS MATRIX AND / OR A COPPER CONDENSED COAT. |
ES00119431T ES2238230T3 (en) | 1999-09-21 | 2000-09-14 | USE OF A STAINLESS STEEL SHEET THAT HAS GRAIN ENRICHED IN CU DISPERSED IN ITS MATRIX AND / OR A COPPER CONDENSED COAT. |
DE60019047T DE60019047T2 (en) | 1999-09-21 | 2000-09-14 | Use of a stainless steel sheet with copper-rich grains dispersed in the matrix and / or with a copper-condensed layer |
EP04017893A EP1471161B1 (en) | 1999-09-21 | 2000-09-14 | Use of a stainless steel sheet having Cu-enriched grains dispersed in its matrix and/or a Cu-condensed layer |
TW089118926A TWI224148B (en) | 1999-09-21 | 2000-09-15 | A stainless steel sheet having Cu-enriched grains dispersed in its matrix and/or a Cu-condensed layer |
MYPI20004332A MY120634A (en) | 1999-09-21 | 2000-09-18 | A stainless steel sheet having cu-enriched grains dispersed in its matrix and/or a cu-condensed layer |
KR1020000055188A KR100746285B1 (en) | 1999-09-21 | 2000-09-20 | A stainless steel sheet having cu-enriched grains dispersed in its matrix and/or a cu-condensed layer |
CA2319974A CA2319974C (en) | 1999-09-21 | 2000-09-20 | A stainless steel sheet having cu-enriched grains dispersed in its matrix and/or a cu-condensed layer |
US09/666,662 US6316117B1 (en) | 1999-09-21 | 2000-09-20 | Stainless steel sheet having Cu-enriched grains dispersed in its matrix and/or a Cu-condensed layer |
CNB001248839A CN1143007C (en) | 1999-09-21 | 2000-09-21 | Stainless steel plate with enriched copper crystal and/or copper coagulated layer dispersed in substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26660799A JP4368985B2 (en) | 1999-09-21 | 1999-09-21 | Stainless steel sheet with low contact resistance and method for producing the same |
Publications (2)
Publication Number | Publication Date |
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JP2001089865A true JP2001089865A (en) | 2001-04-03 |
JP4368985B2 JP4368985B2 (en) | 2009-11-18 |
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JP26660799A Expired - Lifetime JP4368985B2 (en) | 1999-09-21 | 1999-09-21 | Stainless steel sheet with low contact resistance and method for producing the same |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003027133A (en) * | 2001-07-19 | 2003-01-29 | Nisshin Steel Co Ltd | Method for producing alloy for sliding member |
KR20220092979A (en) | 2020-04-15 | 2022-07-04 | 닛테츠 스테인레스 가부시키가이샤 | Ferritic stainless steel and its manufacturing method |
-
1999
- 1999-09-21 JP JP26660799A patent/JP4368985B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003027133A (en) * | 2001-07-19 | 2003-01-29 | Nisshin Steel Co Ltd | Method for producing alloy for sliding member |
KR20220092979A (en) | 2020-04-15 | 2022-07-04 | 닛테츠 스테인레스 가부시키가이샤 | Ferritic stainless steel and its manufacturing method |
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