JP2001079336A - Gas treating device - Google Patents
Gas treating deviceInfo
- Publication number
- JP2001079336A JP2001079336A JP26530099A JP26530099A JP2001079336A JP 2001079336 A JP2001079336 A JP 2001079336A JP 26530099 A JP26530099 A JP 26530099A JP 26530099 A JP26530099 A JP 26530099A JP 2001079336 A JP2001079336 A JP 2001079336A
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- Prior art keywords
- water
- gas
- reaction
- scattering
- stuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Treating Waste Gases (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、ガス処理装置に関
するものである。The present invention relates to a gas processing apparatus.
【０００２】[0002]
【従来の技術】従来例に係るガス処理装置は図３に示す
ように、洗浄塔２３内の酸排気入口２６より上方に排気
処理用充填物２５が設置され、散布管２４から排気処理
用充填物２５に散水が行われるようになっており、洗浄
塔２３の底部に廃水管２７が接続されている。また洗浄
塔２３の清浄空気出口２８から送風ファン２２により清
浄空気が排出されるようになっている。2. Description of the Related Art As shown in FIG. 3, a gas treatment apparatus according to a conventional example is provided with an exhaust treatment filler 25 above an acid exhaust inlet 26 in a washing tower 23, and a discharge pipe 24 is supplied from a scatter pipe 24. Water is sprayed on the object 25, and a waste water pipe 27 is connected to the bottom of the washing tower 23. Further, the clean air is discharged from the clean air outlet 28 of the washing tower 23 by the blower fan 22.
【０００３】また洗浄塔２３内の廃水の一部は、貯留槽
３３に帰還され、また貯留槽３３の補給水入口３２には
補給管３１が接続されている。また貯留槽３３には薬品
注入装置３０が取付け、貯留槽３３から循環ポンプ２９
にて排気処理用充填物２５に散水が行われる。A part of the waste water in the washing tower 23 is returned to the storage tank 33, and a supply pipe 31 is connected to a supply water inlet 32 of the storage tank 33. A chemical injection device 30 is attached to the storage tank 33, and a circulating pump 29 is provided from the storage tank 33.
The water is sprayed on the exhaust treatment filling 25.
【０００４】以上のように従来例に係るガス処理装置は
図３に示すように、処理ガスを無機ハロゲン化ガスとし
て取扱うものであり、例えばＳｉＦ4ガスをガスとして
吸着処理する、或いは空気と混合して排気処理するよう
になっている。As described above, the conventional gas processing apparatus treats a processing gas as an inorganic halogenated gas, as shown in FIG. 3, and for example, adsorbs SiF 4 gas as a gas or mixes it with air. And then exhaust it.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、図３に
示す従来例に係るガス処理装置では、例えばＳｉＦ4ガ
スは、気液接触部分（排気処理用充填物２５及び循環ポ
ンプ２９による散水）で反応しきれなかったＨ2Ｓｉ
Ｆ6，洗浄塔２３の洗浄水によって生成される副生成物
であるＮａＳｉＦ6，（ＮＨ4）2ＳｉＦ6などが後段の送
風ファン２２に析出して、送風ファン２２を停止させる
という問題がある。However, in the gas processing apparatus according to the conventional example shown in FIG. 3, for example, SiF 4 gas reacts at the gas-liquid contact portion (water spraying by the exhaust treatment packing 25 and the circulation pump 29). H 2 Si that could not be removed
There is a problem in that F 6 , NaSiF 6 , (NH 4 ) 2 SiF 6, etc., which are by-products generated by the washing water in the washing tower 23, are deposited on the blower fan 22 at the subsequent stage, and stop the blower fan 22. .
【０００６】本発明の目的は、洗浄塔でのガス処理を効
率的に行い、また洗浄塔への負荷軽減および生成物析出
を防止するガス処理装置を提供することにある。An object of the present invention is to provide a gas treatment apparatus for efficiently performing gas treatment in a washing tower, reducing the load on the washing tower and preventing product deposition.
【０００７】[0007]
【課題を解決するための手段】前記目的を達成するた
め、本発明に係るガス処理装置は、処理対象のガスに散
布管からの散布水を強制的に接触させて加水分解反応を
起こし、その反応生成物を織布で捕獲して水槽の溶液に
溶解させて除去するようにしたものである。Means for Solving the Problems To achieve the above object, a gas treatment apparatus according to the present invention forcibly contacts spray gas from a spray pipe with a gas to be treated to cause a hydrolysis reaction. The reaction product is captured by a woven cloth, dissolved in a solution in a water tank, and removed.
【０００８】[0008]
【発明の実施の形態】以下、本発明の実施の形態を図に
より説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings.
【０００９】（実施形態１）図１は、本発明の実施形態
１に係るガス処理装置を示す構成図である。(Embodiment 1) FIG. 1 is a configuration diagram showing a gas processing apparatus according to Embodiment 1 of the present invention.
【００１０】図１に示す本発明の実施形態１に係るガス
処理装置は、処理対象のガスを流動させる排気ダクト１
５を備えており、排気ダクト１５の下部に水槽１４を取
付けている。A gas processing apparatus according to a first embodiment of the present invention shown in FIG. 1 has an exhaust duct 1 for flowing a gas to be processed.
5 and a water tank 14 is attached to the lower part of the exhaust duct 15.
【００１１】さらに排気ダクト１５の天井側にローラ１
６ａ，１６ａ，１６ａ・・・をガス流に沿って設置し、
かつ水槽１４内にローラ１６ｂ，１６ｂ・・・と方向転
換用ローラ１６ｃ，１６ｄを設置している。Further, a roller 1 is provided on the ceiling side of the exhaust duct 15.
6a, 16a, 16a ... are installed along the gas flow,
Further, rollers 16b, 16b... And direction changing rollers 16c, 16d are provided in the water tank 14.
【００１２】そして、ローラ１６ａ，１６ａ，１６ａ、
１６ｂ，１６ｂ、方向転換用ローラ１６ｃ，１６ｄに無
端状の織布１７を掛渡し、織布１７を水槽１４内の洗浄
水Ｓ内に浸漬し、方向転換用ローラ１６ｃで方向転換さ
れて水槽１４から繰出された織布１７を排気ダクト１５
内と水槽１４内とに交互に移動可能にローラ１６ａ，１
６ｂで誘導して蛇行させ、織布１７を折返して排気ダク
ト１５内に複数段に設置している。And rollers 16a, 16a, 16a,
The endless woven fabric 17 is wrapped around the rollers 16b, 16b and the direction changing rollers 16c, 16d, the woven fabric 17 is immersed in the washing water S in the water tank 14, and the direction is changed by the direction changing roller 16c. The woven fabric 17 fed from the
Roller 16a, 1 so that it can move alternately between the inside and the water tank 14.
The woven cloth 17 is folded back and installed in the exhaust duct 15 in a plurality of stages.
【００１３】また排気ダクト１５の上流側に散水管１１
を設置し、排気ダクト１５の下流側に清浄空気出口１８
を配置している。織布１７は、散布管１１から散布した
水の飛散防止と気液接触触媒を兼ねている。The sprinkler pipe 11 is located upstream of the exhaust duct 15.
And a clean air outlet 18 downstream of the exhaust duct 15.
Has been arranged. The woven fabric 17 also serves as a gas-liquid contact catalyst and for preventing scattering of water sprayed from the spray pipe 11.
【００１４】また水槽１４には余剰水を排出する廃水管
１９が接続され、廃水管１９の廃水出口２０から余剰水
を廃水するようになっている。A waste water pipe 19 for discharging surplus water is connected to the water tank 14, and the surplus water is discharged from a waste water outlet 20 of the waste water pipe 19.
【００１５】次に、本発明の実施形態１に係るガス処理
装置を使用して処理対象のガスを処理する方法について
説明する。本発明の実施形態１に係るガス処理方法で
は、処理対象のガスとしてＳｉＦ4ガスを用いた場合を
例にとって説明する。Next, a method for processing a gas to be processed using the gas processing apparatus according to the first embodiment of the present invention will be described. In the gas processing method according to the first embodiment of the present invention, a case where SiF 4 gas is used as a processing target gas will be described as an example.
【００１６】ＳｉＦ4ガスは、空気と混合すると空気中
の水分と反応して一部は以下のような反応が起こる。 ３ＳｉＦ4＋４Ｈ2Ｏ→２Ｈ2ＳｉＦ6＋Ｓｉ（ＯＨ）4 したがって、排気ガス入口１３から排気ダクト１５内に
導入されるガスの中には、の反応式で混合物とＳｉＦ
4ガスとが混在している。When the SiF 4 gas is mixed with air, it reacts with the moisture in the air, and the following reaction occurs partially. 3SiF 4 + 4H 2 O → 2H 2 SiF 6 + Si (OH) 4 Therefore, the gas introduced into the exhaust duct 15 from the exhaust gas inlet 13 includes the mixture and the SiF
4 gases are mixed.
【００１７】排気ガス入口１３から排気ダクト１５内に
導入されたＳｉＦ4ガスは、まず散布管１１から散布さ
れた水と激しく反応してふっ化水素酸（ＨＦ）とケイ酸
（ＳｉＯ2）を生じる。The SiF 4 gas introduced into the exhaust duct 15 from the exhaust gas inlet 13 violently reacts with water sprayed from the spray pipe 11 to convert hydrofluoric acid (HF) and silicic acid (SiO 2 ). Occurs.
【００１８】の反応式で生成した混合物に、このふっ
化水素酸が作用して多量のＨ2ＳｉＦ6が生成される。ま
た、以下の反応も同時進行する。 ４ＨＦ＋ＳｉＯ2→ＳｉＦ4＋２Ｈ2Ｏ ２ＨＦ＋ＳｉＦ4→Ｈ2ＳｉＦ6 さらに散布管１１からの散布水領域を通過した処理ガス
は排気ダクト１５内に送込まれ、折返して排気ダクト１
５内に複数段に設置された、濡れた織布１７に次々に接
触する。The hydrofluoric acid acts on the mixture formed by the reaction formula to generate a large amount of H 2 SiF 6 . The following reactions also proceed simultaneously. 4HF + SiO 2 → SiF 4 + 2H 2 O 2HF + SiF 4 → H 2 SiF 6 Further, the processing gas that has passed through the spray water area from the spray pipe 11 is sent into the exhaust duct 15, and is turned back to return to the exhaust duct 1.
The wet woven fabric 17 placed in a plurality of stages in the fabric 5 comes into contact with each other one after another.
【００１９】処理ガスと散布管１１からの散布水との反
応、処理ガスと濡れた織布１７との反応は全て発熱反応
であるため、散布水の吸熱反応（蒸発熱）効果及び織布
付着水の吸熱反応（蒸発熱）効果により更に反応は加速
する。Since the reaction between the processing gas and the spray water from the spray pipe 11 and the reaction between the processing gas and the wet woven fabric 17 are all exothermic reactions, the endothermic reaction (heat of evaporation) of the spray water and the adhesion of the woven cloth. The reaction is further accelerated by the endothermic reaction of water (heat of evaporation).
【００２０】これらの反応により生成されたＨ2ＳｉＦ6
は、後段の織布１７に付着し、織布１７はローラ１６
ａ，１６ｂによって水槽１４内に導かれ、織布１７に付
着したＨ2ＳｉＦ6は、水槽１７内の水に溶解することに
よって除去される。The H 2 SiF 6 produced by these reactions
Adheres to the subsequent woven fabric 17, and the woven fabric 17 is
The H 2 SiF 6 guided into the water tank 14 by the a and 16 b and adhered to the woven fabric 17 is removed by dissolving in the water in the water tank 17.
【００２１】また水槽１４内の水は散布管１１からの散
布水により常に補給されるため、余剰水は廃水出口２０
から排出される。Since the water in the water tank 14 is constantly replenished by the spray water from the spray pipe 11, surplus water is supplied to the waste water outlet 20.
Is discharged from
【００２２】以上のように本発明の実施形態１は、例え
ばＳｉＦ4ガスの排気が行われる洗浄塔の前段（図３参
照）に設置することにより、効率的にＳｉＦ4ガスを処
理し得る。また洗浄塔への負荷軽減及び生成物析出を防
止することにより、安定稼動に寄与することができる。As described above, the first embodiment of the present invention can efficiently treat the SiF 4 gas by being installed, for example, before the washing tower (see FIG. 3) where the exhaust of the SiF 4 gas is performed. In addition, by reducing the load on the washing tower and preventing product precipitation, it is possible to contribute to stable operation.
【００２３】（実施形態２）図２は、本発明の実施形態
２に係るガス処理装置を示す構成図である。(Embodiment 2) FIG. 2 is a configuration diagram showing a gas processing apparatus according to Embodiment 2 of the present invention.
【００２４】図２に示す本発明の実施形態２に係るガス
処理装置は、水槽１４ａ，１４ｂ，１４ｃ，１４ｄ内を
多段に分割し、各水槽１４ａ，１４ｂ，１４ｃ，１４ｄ
内にローラ１６ｃ，１６ｂ1，１６ｂ2，１６ｄを設置
し、織布１７を水槽１４ａ内の方向転換用ローラ１６ｃ
で排気ダクト１５内のローラ１６ａ１に方向転換して掛
渡し、ローラ１６ａ1からの織布１７を水槽１４内のロ
ーラ１６ｂ1に掛渡し、ローラ１６ｂ1からの織布１７を
排気ダクト１５内のローラ１６ａ2に掛渡し、ローラ１
６ａ2からの織布１７を水槽１４内のローラ１６ｂ2に掛
渡し、ローラ１６ｂ2からの織布１７を排気ダクト１５
内のローラ１６ａ3に掛渡し、ローラ１６ａ3からの織布
１７を水槽１４内のローラ１６ｄに掛渡すことにより無
端状に配置している。In the gas processing apparatus according to the second embodiment of the present invention shown in FIG. 2, the water tanks 14a, 14b, 14c, 14d are divided into multiple stages, and the water tanks 14a, 14b, 14c, 14d are divided.
Rollers 16c, 16b1, 16b2, 16d are installed in the inside, and the woven fabric 17 is turned in the water tank 14a.
To wrap around the roller 16a1 in the exhaust duct 15, and wrap the woven fabric 17 from the roller 16a1 over the roller 16b1 in the water tank 14, and transfer the woven fabric 17 from the roller 16b1 to the roller 16a2 in the exhaust duct 15. Rolling over, roller 1
The woven fabric 17 from the roller 16b2 is passed over the rollers 16b2 in the water tank 14, and the woven fabric 17 from the rollers 16b2 is
And the woven fabric 17 from the roller 16a3 is wound on the roller 16d in the water tub 14 to be disposed endlessly.
【００２５】さらに排気ダクト１５内の天井側に設置し
たローラ１６ａ1，１６ａ2，１６ａ3，１６ａ4に隣接し
て散布管１１ａ，１１ｂ，１１ｃ，１１ｄをそれぞれ設
置し、後段の水槽から前段の散布管に水をポンプ２１
ａ，２１ｂにより送水するようにしたものである。Further, spraying pipes 11a, 11b, 11c and 11d are installed adjacent to the rollers 16a1, 16a2, 16a3 and 16a4 installed on the ceiling side in the exhaust duct 15, respectively. The pump 21
a, 21b.
【００２６】図２に示す本発明の実施形態２に係るガス
処理装置によれば、処理ガスと散布管からの散布水との
反応、処理ガスと濡れた織布との反応を複数回繰返して
行うことができ、反応の遅いガスも効率的に除去処理す
ることができるという利点を有する。According to the gas processing apparatus according to the second embodiment of the present invention shown in FIG. 2, the reaction between the processing gas and the spray water from the spray pipe and the reaction between the processing gas and the wet woven cloth are repeated a plurality of times. This method has an advantage that gas having a slow reaction can be efficiently removed.
【００２７】[0027]
【発明の効果】以上のように本発明によれば、処理ガス
と散布水との反応、処理ガスと濡れた織布との反応を組
合せて行うため、これらの反応は全て発熱反応であり、
散布水の吸熱反応（蒸発熱）効果及び織布付着水の吸熱
反応（蒸発熱）効果により更に反応は加速させて行うこ
とができる。As described above, according to the present invention, since the reaction between the processing gas and the spray water and the reaction between the processing gas and the wet woven fabric are performed in combination, these reactions are all exothermic,
The reaction can be further accelerated by the endothermic reaction (heat of evaporation) of the spray water and the endothermic reaction (heat of evaporation) of the water adhering to the woven fabric.
【００２８】したがって図３に示すような洗浄塔の前段
に設置することにより、効率的にガスを処理することが
でき、洗浄塔への負荷軽減及び生成物析出を防止するこ
とにより、安定稼動に寄与することができる。Therefore, the gas can be efficiently treated by being installed at the front stage of the washing tower as shown in FIG. 3, and the load on the washing tower can be reduced, and the product can be prevented from being deposited, whereby stable operation can be achieved. Can contribute.
【図１】本発明の実施形態１に係るガス処理装置を示す
構成図である。FIG. 1 is a configuration diagram illustrating a gas processing apparatus according to a first embodiment of the present invention.
【図２】本発明の実施形態２に係るガス処理装置を示す
構成図である。FIG. 2 is a configuration diagram illustrating a gas processing apparatus according to a second embodiment of the present invention.
【図３】従来例に係るガス処理装置を示す構成図であ
る。FIG. 3 is a configuration diagram showing a gas processing apparatus according to a conventional example.
１１ 散水管 １４ 水槽 １５ 排気ダクト １７ 織布 11 watering pipe 14 water tank 15 exhaust duct 17 woven cloth
Claims (1)
強制的に接触させて加水分解反応を起こし、その反応生
成物を織布で捕獲して水槽の溶液に溶解させて除去する
ようにしたことを特徴とするガス処理装置。1. A method in which a spraying water from a spraying tube is forcibly brought into contact with a gas to be treated to cause a hydrolysis reaction, and the reaction product is captured by a woven fabric, dissolved in a solution in a water tank, and removed. A gas processing apparatus characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26530099A JP3374801B2 (en) | 1999-09-20 | 1999-09-20 | Gas treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26530099A JP3374801B2 (en) | 1999-09-20 | 1999-09-20 | Gas treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001079336A true JP2001079336A (en) | 2001-03-27 |
| JP3374801B2 JP3374801B2 (en) | 2003-02-10 |
Family
ID=17415295
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26530099A Expired - Fee Related JP3374801B2 (en) | 1999-09-20 | 1999-09-20 | Gas treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3374801B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005004635A1 (en) | 2003-07-10 | 2005-01-20 | Takasago International Corporation | Flavor enhancer, food or beverage containing the flavor enhancer, and method of flavor enhancement |
| CN110141925A (en) * | 2019-07-01 | 2019-08-20 | 金发科技股份有限公司 | A kind of adsorption and sedimentation device, the system and method for the exhaust gas containing particulate matter |
-
1999
- 1999-09-20 JP JP26530099A patent/JP3374801B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005004635A1 (en) | 2003-07-10 | 2005-01-20 | Takasago International Corporation | Flavor enhancer, food or beverage containing the flavor enhancer, and method of flavor enhancement |
| CN110141925A (en) * | 2019-07-01 | 2019-08-20 | 金发科技股份有限公司 | A kind of adsorption and sedimentation device, the system and method for the exhaust gas containing particulate matter |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3374801B2 (en) | 2003-02-10 |
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