JP2001054320A - Method for culturing plant - Google Patents

Method for culturing plant

Info

Publication number
JP2001054320A
JP2001054320A JP11229147A JP22914799A JP2001054320A JP 2001054320 A JP2001054320 A JP 2001054320A JP 11229147 A JP11229147 A JP 11229147A JP 22914799 A JP22914799 A JP 22914799A JP 2001054320 A JP2001054320 A JP 2001054320A
Authority
JP
Japan
Prior art keywords
plant
cultivation
humidity
light
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11229147A
Other languages
Japanese (ja)
Inventor
Fumihiro Tanaka
史宏 田中
Hiroyuki Watanabe
博之 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP11229147A priority Critical patent/JP2001054320A/en
Publication of JP2001054320A publication Critical patent/JP2001054320A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A40/00Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
    • Y02A40/10Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in agriculture
    • Y02A40/25Greenhouse technology, e.g. cooling systems therefor

Landscapes

  • Cultivation Of Plants (AREA)
  • Greenhouses (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide an improved method for culturing plants with the light of a semiconductor light source in a plant culture device, by which the plants having improved high qualities can be cultured, by controlling the inner humidity of the plant culture device. SOLUTION: This method for culturing plants comprises culturing the plants comprises using a semiconductor light source in a plant culture device and irradiating light having a prescribed wavelength. Therein, the plant culture device is formed in an approximately closed system, and the inner relative humidity of the plant culture device is retained at <=60%. Red light having a peak wavelength of 600 to 700 nm is irradiated as the irradiation light.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、植物栽培方法に関
するものであり、詳しくは、植物工場、野菜工場、育苗
装置などの植物栽培装置内で半導体光源の光によって植
物を栽培する方法であって、植物栽培装置内の湿度を調
整することにより、一層高品質な植物を栽培する植物栽
培方法に関するものである
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cultivating a plant, and more particularly to a method for cultivating a plant in a plant cultivation apparatus such as a plant factory, a vegetable factory, a seedling raising apparatus, etc. The present invention relates to a plant cultivation method for growing higher quality plants by adjusting humidity in a plant cultivation apparatus.

【0002】[0002]

【従来の技術】植物工場、野菜工場、育苗装置などの植
物栽培装置による植物栽培おいては、植物の生育に必要
な特定波長の光を選択的に照射して効率的に栽培するた
め、発光ダイオード、半導体レーザーなどの半導体光源
の利用が種々検討されている。斯かる植物栽培において
は、茎折れ、倒伏などを防止し、十分な生育量を確保す
るため、植物を不必要に徒長させないことが重要でり、
光合成に必要な赤色光と共に一定量の青色光を照射する
必要があると考えられている。しかしながら、例えば、
青色LEDは、赤色LED等の長波長の光源と比較する
と出力が弱く、ランプコスト及び電力コストが高くなる
ため、実用上、植物栽培装置の光源として適用し難いと
言う問題がある。
2. Description of the Related Art In plant cultivation using a plant cultivation apparatus such as a plant factory, a vegetable factory, and a seedling raising apparatus, light is emitted by selectively irradiating light of a specific wavelength necessary for growing the plant to efficiently cultivate the plant. Various uses of semiconductor light sources such as diodes and semiconductor lasers have been studied. In such plant cultivation, stem breakage, to prevent lodging, etc., in order to ensure sufficient growth, it is important not to unnecessarily lengthen the plant,
It is considered that it is necessary to irradiate a certain amount of blue light together with red light necessary for photosynthesis. However, for example,
A blue LED has a problem that it is difficult to be applied as a light source of a plant cultivation apparatus because the output of the blue LED is lower than that of a long-wavelength light source such as a red LED, and the lamp cost and the power cost are high.

【0003】そこで、本発明者等は、植物栽培装置にお
ける半導体光源のコスト及び電力コストを低減すること
を主眼に検討の結果、所定のピーク波長の赤色半導体光
源のみを使用し、栽培日数に応じた特定の関係に基づい
て照射光量を変化させるならば、正常な草型を保ち且つ
十分な生育量を確保できることを見出し、先に、植物栽
培方法として提案している(特開平9−37648参
照)。
[0003] The inventors of the present invention have focused on reducing the cost of a semiconductor light source and the power cost in a plant cultivation apparatus, and as a result, have used only a red semiconductor light source having a predetermined peak wavelength, and according to the number of days of cultivation. It has been found that if the irradiation light amount is changed based on the specific relationship, a normal plant type can be maintained and a sufficient growth amount can be secured, and it has been previously proposed as a plant cultivation method (see Japanese Patent Application Laid-Open No. 9-37648). ).

【0004】[0004]

【発明が解決しようとする課題】ところで、上記の様な
栽培においては、何れの人工的な光源を使用するにせ
よ、例えば、レタスやホウレンソウ等の葉菜類を栽培し
た場合、露地物と比べて茎が伸び気味、すなわち、茎に
徒長傾向が認められる。また、これらの野菜は、葉色が
薄いのに加え、葉が軟弱であるとも言われており、実
際、パリパリ感などの食感に乏しく、しかも、形が崩れ
易いために調理に不向きとされている。
In the above-mentioned cultivation, no matter what artificial light source is used, for example, when cultivating leafy vegetables such as lettuce or spinach, the stalks are higher than those in the open field. Has a tendency to grow, that is, the stem has a tendency to lengthen. In addition, these vegetables are said to have weak leaves and soft leaves, and in fact, have poor texture, such as crispy, and are not suitable for cooking because they are easily deformed. I have.

【0005】本発明は、半導体光源の特定の波長による
栽培において好適な栽培条件を種々検討の結果、見出さ
れたものであり、その目的は、植物工場、野菜工場、育
苗装置などの植物栽培装置内で半導体光源の光によって
植物を栽培する方法であって、植物栽培装置内の湿度を
調整することにより、一層高品質な植物を栽培し得る様
に改良された植物栽培方法を提供することにある。
The present invention has been found as a result of various studies on suitable cultivation conditions in cultivation at a specific wavelength of a semiconductor light source, and its object is to cultivate a plant such as a plant factory, a vegetable factory, and a seedling raising apparatus. A method for cultivating a plant with light from a semiconductor light source in an apparatus, wherein the humidity is adjusted in the plant cultivation apparatus to provide an improved method for cultivating a plant with higher quality. It is in.

【0006】[0006]

【課題を解決するための手段】上記の課題を解決するた
め、本発明の植物栽培方法は、植物栽培装置内で半導体
光源を使用し且つ所定波長の光の照射によって植物を栽
培する植物栽培方法において、前記の植物栽培装置を略
密閉系に構成すると共に、植物栽培装置内の相対湿度を
60%以下に保持することを特徴とする。
In order to solve the above-mentioned problems, a plant cultivation method of the present invention uses a semiconductor light source in a plant cultivation apparatus and irradiates the plant with light of a predetermined wavelength. Wherein the plant cultivation apparatus is configured in a substantially closed system, and the relative humidity in the plant cultivation apparatus is maintained at 60% or less.

【0007】すなわち、本発明の植物栽培方法において
は、植物栽培装置を略密閉系に構成することにより、植
物栽培装置内の湿度の制御を可能にし、植物栽培装置内
の相対湿度を60%以下に保持することにより、植物の
徒長を抑制し、食感などの品質を向上できる。
[0007] That is, in the plant cultivation method of the present invention, the humidity in the plant cultivation device can be controlled by configuring the plant cultivation device in a substantially closed system, and the relative humidity in the plant cultivation device is reduced to 60% or less. By keeping the weight, the length of the plant can be suppressed, and the quality such as texture can be improved.

【0008】[0008]

【発明の実施の形態】本発明に係る植物栽培方法の実施
形態を図面に基づいて説明する。図1は、本発明の植物
栽培方法に好適な植物栽培装置の一構造例を示す斜視図
である。図2は、図1の栽培装置におけるパネル光源の
1パネルユニットを背面側から示す斜視図である。図3
は、レタス栽培における湿度の影響を示すグラフであ
り、図5は、ホウレンソウ栽培における湿度の影響を示
すグラフである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a plant cultivation method according to the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing an example of the structure of a plant cultivation apparatus suitable for the plant cultivation method of the present invention. FIG. 2 is a perspective view showing one panel unit of a panel light source in the cultivation apparatus of FIG. 1 from the back side. FIG.
Is a graph showing the effect of humidity on lettuce cultivation, and FIG. 5 is a graph showing the effect of humidity on spinach cultivation.

【0009】本発明の植物栽培方法は、植物栽培装置内
で半導体光源を使用し且つ所定波長の光を照射すること
により、植物を栽培する方法である。本発明を適用する
植物としては、典型的にはレタスやホウレンソウ等の葉
菜類、トマト等の果菜類、パンジー等の花類が挙げられ
るが、本発明は、苗も含めてその他の植物全般に適応で
きる。
The plant cultivation method of the present invention is a method for cultivating a plant by using a semiconductor light source and irradiating light of a predetermined wavelength in a plant cultivation apparatus. The plants to which the present invention is applied typically include leaf vegetables such as lettuce and spinach, fruit vegetables such as tomato, and flowers such as pansy, but the present invention is applicable to other plants in general including seedlings. it can.

【0010】本発明の植物栽培方法に使用される植物栽
培装置としては、いわゆる植物工場、野菜工場、育苗装
置などの栽培用の各種設備および装置が挙げられる。例
えば、植物栽培装置は、図1に示す様に、扁平な箱状に
形成された植物栽培ボード(1)と、当該植物栽培ボー
ドに対向配置される光源としてのパネル光源(2)によ
って構成される。
The plant cultivation apparatus used in the plant cultivation method of the present invention includes various facilities and apparatuses for cultivation such as a so-called plant factory, vegetable factory, and seedling raising apparatus. For example, as shown in FIG. 1, the plant cultivation apparatus includes a plant cultivation board (1) formed in a flat box shape, and a panel light source (2) as a light source arranged to face the plant cultivation board. You.

【0011】植物栽培ボード(1)としては、湛液式、
NFT式、噴霧水耕式、湛液等量交換式などの養液栽培
方式の栽培ボード挙げられる。また、鉢物や苗などの培
土を使用する植物の栽培においては、上方より灌水する
方式も採用できるが、底面灌水方式が望ましい。栽培養
液としては、窒素、リン酸、カリウム、カルシウム、マ
グネシウム、イオウ等の多量成分に対し、鉄、マンガ
ン、ホウ素などの微量成分を添加した栽培養液が使用さ
れるが、園芸試験場標準や山崎処方などに基づいた肥料
組成で栽培することも出来る。
[0011] As the plant cultivation board (1), a submerged type,
A cultivation board of a hydroponic cultivation system such as an NFT type, a spray hydroponic type, and a submerged equal volume exchange type is exemplified. In cultivation of plants using soil, such as pots and seedlings, a method of watering from above can be adopted, but a bottom watering method is preferable. As a cultivation nutrient solution, a cultivation nutrient solution in which trace components such as iron, manganese, and boron are added to a large amount of components such as nitrogen, phosphoric acid, potassium, calcium, magnesium, and sulfur is used. It can also be cultivated with a fertilizer composition based on Yamazaki prescription.

【0012】パネル光源(2)は、発光ダイオードや半
導体レーザなどの半導体光源によって構成される。具体
的には、パネル光源(2)は、図1に示す様に、複数のパ
ネルユニット(20)を配列して平板状に構成される。
また、各パネルユニット(20)は、図2に示す様に、
扁平な箱状の支持板(21)の表面に板状の発光体(3)
を複数配列して成り、更に、各発光体(3)は、例え
ば、半導体光源としての多数のLEDチップを基板上に
取り付けて構成される。
The panel light source (2) comprises a semiconductor light source such as a light emitting diode or a semiconductor laser. Specifically, as shown in FIG. 1, the panel light source (2) has a plurality of panel units (20) arranged in a plate shape.
Also, each panel unit (20) is, as shown in FIG.
Plate-shaped luminous body (3) on the surface of flat box-shaped support plate (21)
Are arranged in a plurality, and each light-emitting body (3) is configured by, for example, mounting a large number of LED chips as a semiconductor light source on a substrate.

【0013】発光体(3)の基板は、アルミニウムやセ
ラミックなど熱伝導率の高い材質の基板に銅箔または銀
箔(2)が積層された印刷基板である。LEDチップ
は、湿度による劣化を防止するため、基板上においてエ
ポキシ樹脂などの樹脂によりレンズ状に封止される。
The substrate of the luminous body (3) is a printed board in which a copper foil or a silver foil (2) is laminated on a substrate made of a material having high thermal conductivity such as aluminum or ceramic. The LED chip is sealed in a lens shape with a resin such as an epoxy resin on the substrate in order to prevent deterioration due to humidity.

【0014】また、パネルユニット(20)の背面に
は、LEDチップの熱を除去するため、水などの冷媒を
流すための手段、または、放熱用のフィン及び冷風供給
手段もしくは冷却ガス供給手段が設けられていてもよ
い。図2に例示したパネルユニット(20)は、側縁に
設けられた配管(22,22)を通じ、内部に冷却水が
流れる様になされている。そして、植物栽培ボード(1)
と向き合う発光体(3)の表面は、透明な樹脂板やガラス
板で覆うことにより防水防湿処理されるのが好ましい。
On the back of the panel unit (20), means for flowing a coolant such as water, or radiating fins and cooling air supply means or cooling gas supply means for removing heat from the LED chips are provided. It may be provided. The panel unit (20) illustrated in FIG. 2 is configured such that cooling water flows through piping (22, 22) provided on a side edge. And a plant cultivation board (1)
It is preferable that the surface of the luminous body (3) facing the luminous body is covered with a transparent resin plate or a glass plate to be subjected to a waterproof and moisture-proof treatment.

【0015】物栽培ボード(1)に対するパネル光源
(2)の位置は、光の利用効率を高めるため、植物との距
離が短いほど好ましく、例えば、パネル光源(2)と物栽
培ボード(1)の栽培面との距離は、収穫直前のレタス
の場合で20〜40cm程度となる様に設定される。パ
ネル光源(2)は、従来の蛍光灯、メタルハライドラン
プ、高圧ナトリウムランプ等の光源に比べ、照射される
赤外線が極めて少なく、葉焼け等の障害がないため、上
記の様に植物に近接させることが出来、照射した光をよ
り有効に利用できる。なお、植物栽培装置の内部は、出
来る限り白色板等の光を反射する素材で構成されるのが
望ましく、これにより、半導体光源の光をより効率的に
植物に向けて照射できる。
Panel light source for the cultivation board (1)
The position of (2) is preferably as short as possible with the plant in order to increase the light use efficiency. For example, the distance between the panel light source (2) and the cultivation surface of the cultivation board (1) is the lettuce just before harvesting. Is set to be about 20 to 40 cm. The panel light source (2) emits very little infrared light and has no obstruction such as leaf burning as compared with conventional light sources such as fluorescent lamps, metal halide lamps, and high-pressure sodium lamps. And the emitted light can be used more effectively. It is desirable that the inside of the plant cultivation apparatus is made of a material that reflects light as much as possible, such as a white plate, so that the light of the semiconductor light source can be more efficiently applied to the plant.

【0016】パネル光源(2)の電源機構は、栽培する植
物の生育に応じて光出力を制御可能に構成される。そし
て、種々の栽培環境条件によって出力制御するため、マ
ネージメント用のコンピューターによって自動制御され
るのが好ましい。特に、波長が異なる2種類以上の半導
体光源を使用する場合には、各半導体光源ごとに出力を
コントロールされるのが好ましい。
The power supply mechanism of the panel light source (2) is configured so that the light output can be controlled according to the growth of the plant to be cultivated. In order to control the output according to various cultivation environment conditions, it is preferable that the output is automatically controlled by a management computer. In particular, when two or more types of semiconductor light sources having different wavelengths are used, it is preferable that the output is controlled for each semiconductor light source.

【0017】上記の様な半導体光源によって照射する光
としては、例えば、レタス、コマツナ等を栽培する場合
は、ピーク波長が600〜700nmの赤色光を照射す
るのが効果的である。光量は、50〜150μmol/
m2・s程度である。また、ホウレンソウ等を栽培する場
合は、ピーク波長が600〜700nmの赤色光および
ピーク波長が400〜500nmの青色光を併せて照射
することにより、葉柄の伸長を防止できる。青色光の光
量は、照射する全光量の5〜20%程度である。
When cultivating, for example, lettuce or komatsuna, it is effective to irradiate red light having a peak wavelength of 600 to 700 nm as light emitted by the semiconductor light source as described above. The light amount is 50 to 150 μmol /
m 2 · s. When spinach or the like is cultivated, elongation of the petiole can be prevented by irradiating red light having a peak wavelength of 600 to 700 nm and blue light having a peak wavelength of 400 to 500 nm together. The amount of blue light is about 5 to 20% of the total amount of light to be irradiated.

【0018】更に、ピーク波長が600〜700nmの
赤色光およびピーク波長が700〜800nmの遠赤色
光を照射してもよい。赤色光に上記の遠赤色光を併せて
照射した場合には、植物の伸長、ボリュームアップを図
ることが出来、例えば、苗生産においては、発芽直後に
のみ遠赤色光を併用することにより、より徒長を抑える
ことが出来、一層高品質の苗を栽培できる。また、上記
の各ピーク波長の赤色光、青色光および遠赤色光を併せ
て照射してもよい。なお、上記の様な光は、栽培期間を
短縮するために24時間連続照射するのが望ましいが、
ホウレンソウ等の長日植物であって開花を目的としない
植物については、短日条件で栽培するために暗期を設け
る。
Further, red light having a peak wavelength of 600 to 700 nm and far-red light having a peak wavelength of 700 to 800 nm may be irradiated. When irradiating the above-mentioned far-red light together with red light, it is possible to elongate the plant, increase the volume, for example, in seedling production, by using far-red light only immediately after germination, more It is possible to reduce the length of the seedlings and grow higher quality seedlings. Further, red light, blue light and far-red light having the above-mentioned peak wavelengths may be irradiated together. In addition, it is desirable to irradiate such light continuously for 24 hours in order to shorten the cultivation period,
For long-day plants, such as spinach, which do not aim to flower, a dark period is provided for cultivation under short-day conditions.

【0019】本発明においては、上記の様なパネル光源
(2)、すなわち、半導体光源を使用して栽培し、赤外線
による植物の葉焼け等の障害がないため、植物栽培装置
内を低湿度に保持することが出来る。そこで、本発明に
おいては、上記の植物栽培装置を略密閉系に構成すると
共に、植物栽培装置内の相対湿度を60%以下に保持す
る。斯かる湿度調整により、不必要な徒長を抑制し、品
質を一層高めることが出来る。
In the present invention, the panel light source as described above
(2) That is, since the cultivation is performed using the semiconductor light source and there is no obstruction such as burning of the leaves due to infrared rays, the inside of the plant cultivation apparatus can be maintained at a low humidity. Therefore, in the present invention, the above-described plant cultivation apparatus is configured in a substantially closed system, and the relative humidity in the plant cultivation apparatus is maintained at 60% or less. By such humidity adjustment, unnecessary lengthy can be suppressed and quality can be further improved.

【0020】植物栽培装置は、栽培空間が実質的に密閉
系の構造を備えていればよい、換言すれば、図に例示し
た装置においては、栽培ボード(1)上に形成される栽
培空間が外気に直接開放されていない構造とされる。上
記の栽培空間の湿度調整においては、密閉空間で植物を
栽培すると蒸散により湿度が上昇するため、通常は除湿
器を使用して除湿する。また、加湿が必要な場合は、水
の加熱器に送風装置を組み合わせて加湿するか、また
は、超音波式の蒸気発生器を使用して加湿する。なお、
植物栽培装置内の湿度は、パネル光源(2)と共に上記コ
ンピュータによって制御される。
The plant cultivation apparatus may have a cultivation space having a substantially closed structure. In other words, in the apparatus illustrated in the figure, the cultivation space formed on the cultivation board (1) is The structure is not directly open to the outside air. In the above-mentioned humidity adjustment of the cultivation space, when plants are cultivated in a closed space, the humidity rises due to transpiration. Therefore, dehumidification is usually performed using a dehumidifier. When humidification is required, humidification is performed by combining a water heater with a blower, or humidification using an ultrasonic steam generator. In addition,
The humidity in the plant cultivation device is controlled by the computer together with the panel light source (2).

【0021】植物栽培装置内の相対湿度は、60%以下
に調整する必要があるが、上記の様な植物からの蒸散の
影響および除湿負荷の低減を勘案すると、通常、10〜
60%、好ましくは10%以上で且つ50%未満、より
好ましくは40%以上で且つ50%未満に調整される。
特に、植物の生長速度をあまり低下させないためには、
湿度の下限値を10%以上に設定するのが好ましい。
The relative humidity in the plant cultivation apparatus needs to be adjusted to 60% or less. However, in consideration of the above-mentioned effects of transpiration from plants and reduction of dehumidification load, the relative humidity is usually 10 to 10%.
It is adjusted to 60%, preferably 10% or more and less than 50%, more preferably 40% or more and less than 50%.
In particular, in order not to significantly reduce the growth rate of the plant,
It is preferable to set the lower limit of the humidity to 10% or more.

【0022】また、植物栽培装置内の温度、すなわち、
栽培空間の温度は、例えば、レタス、サラダナ類の場合
で15〜30℃、望ましくは20〜25℃に調整する。
更に、ホウレンソウの場合は、10〜25℃、望ましく
は15〜20℃に調整する。コマツナの場合は、10〜
30℃、望ましくは13〜20℃に調整する。チンゲン
サイの場合は、10〜30℃、望ましくは18〜25℃
に調整する。トマト苗やパンジー苗の場合は、15〜3
0℃、望ましくは18〜25℃に調整する。また、栽培
中は、上記の栽培空間に対して生育促進のために100
0〜3000ppm、好ましくは1000〜1500p
pmの濃度に炭酸ガスを施用するのが望ましい。
The temperature in the plant cultivation apparatus, that is,
The temperature of the cultivation space is adjusted to, for example, 15 to 30C, preferably 20 to 25C in the case of lettuce and salads.
Further, in the case of spinach, the temperature is adjusted to 10 to 25 ° C, preferably 15 to 20 ° C. In the case of Komatsuna, 10
The temperature is adjusted to 30 ° C, preferably 13 to 20 ° C. In the case of bok choy, 10-30 ° C, preferably 18-25 ° C
Adjust to 15-3 for tomato seedlings or pansy seedlings
The temperature is adjusted to 0 ° C, preferably 18 to 25 ° C. In addition, during cultivation, 100 to promote the growth in the above cultivation space.
0 to 3000 ppm, preferably 1000 to 1500 p
It is desirable to apply carbon dioxide to a concentration of pm.

【0023】上記の様に、本発明の植物栽培方法によれ
ば、半導体光源を使用し且つ植物栽培装置を略密閉系に
構成することにより、植物栽培装置内の湿度の制御を可
能にし、そして、植物栽培装置内の相対湿度を上記の特
定の値に保持することにより、植物の徒長を抑制でき、
葉菜類では葉色が濃く、パリパリした食感が得られる
等、植物の品質を向上できる。これは、植物栽培装置内
を上記の特定の湿度に保持することにより、気孔の開き
を抑制し、炭酸ガスの吸収速度を制限できるためと考え
られる。更に、本発明の植物栽培方法によれば、上記の
様な低湿度で栽培するため、病害の発生を軽減できる。
As described above, according to the plant cultivation method of the present invention, the humidity in the plant cultivation apparatus can be controlled by using a semiconductor light source and configuring the plant cultivation apparatus in a substantially closed system. By keeping the relative humidity in the plant cultivation device at the above specific value, plant growth can be suppressed,
Leafy vegetables can improve the quality of plants, for example, the leaf color is darker and a crisper texture can be obtained. It is considered that this is because, by maintaining the inside of the plant cultivation apparatus at the above specific humidity, the opening of the pores can be suppressed, and the absorption rate of carbon dioxide gas can be limited. Furthermore, according to the plant cultivation method of the present invention, since the plant is cultivated at low humidity as described above, the occurrence of disease can be reduced.

【0024】[0024]

【実施例】実施例1:図1に示す栽培装置を4台使用
し、異なる湿度条件のもとにレタス(品種:レッドファ
イヤー)の水耕栽培を行った。栽培装置は、湛液式の水
耕栽培装置として構成した。光源としては、図2に示す
パネル光源(2)を使用した。パネル光源(2)は、厚
さ7mmのセラミック基板に30個のLEDチップが配
置された発光体(3)を10枚配列し、LEDチップが
300個配置された20cm×50cmのパネルユニッ
ト(20)を作製し、更に、パネルユニット(20)を
6枚配列して構成した。LEDチップとしては、ピーク
波長が660nmのDDH型超高輝度赤色LEDチップ
を使用した。
EXAMPLE 1 Using four cultivation apparatuses shown in FIG. 1, hydroponic cultivation of lettuce (variety: Red Fire) was performed under different humidity conditions. The cultivation apparatus was configured as a submerged hydroponic cultivation apparatus. As a light source, a panel light source (2) shown in FIG. 2 was used. The panel light source (2) is composed of a 20-cm × 50-cm panel unit (20) in which ten luminous bodies (3) each having 30 LED chips are arranged on a ceramic substrate having a thickness of 7 mm and 300 LED chips are arranged. ), And six panel units (20) were arranged. As the LED chip, a DDH type ultra-high brightness red LED chip having a peak wavelength of 660 nm was used.

【0025】上記の栽培装置において、一辺が2cmの
方形スポンジ上にレタス種子を播種し、20℃、白色蛍
光灯下で5日間置いて発芽させた後、上記の栽培装置に
84株移植して25日間栽培した。栽培中は、ECおよ
びpHを適宜調整し、7日ごとに水耕液を全量交換し
た。また、パネル光源(2)の電源制御により、栽培面
の光量を100±5μmol/m2・sに調節し、24時
間連続点灯した。そして、発芽した後の栽培装置内の温
度は全て22℃に設定し、湿度はそれぞれ80、60、
40、20%に調整した。なお、LEDチップの発熱に
よる温度上昇を防止するため、発光体(3)の裏側に冷
却水を1.2リットル/分の流速で循環させた。
In the above-mentioned cultivation apparatus, lettuce seeds were sown on a square sponge having a side of 2 cm, germinated at 20 ° C. under white fluorescent light for 5 days, and then transplanted into the cultivation apparatus with 84 strains. Cultivated for 25 days. During cultivation, EC and pH were appropriately adjusted, and the total amount of the hydroponic solution was changed every seven days. Further, by controlling the power of the panel light source (2), the light amount on the cultivation surface was adjusted to 100 ± 5 μmol / m 2 · s, and the light was continuously turned on for 24 hours. Then, the temperature inside the cultivation apparatus after germination was set to 22 ° C., and the humidity was set to 80, 60, respectively.
It was adjusted to 40 and 20%. Note that cooling water was circulated at a flow rate of 1.2 liter / minute behind the light-emitting body (3) in order to prevent a rise in temperature due to heat generation of the LED chip.

【0026】栽培したレタスについては、茎長および葉
色値を測定した。葉色値は、最も若い葉から5番目の葉
のSPAD値を葉色度計(ミノルタ社製:SPAD−5
02)によって測定した。その結果は、相対湿度40%
で栽培したものを基準にすると、表1に示す通りであ
り、湿度40%以下で茎長が短く、葉色値が高くなっ
た。また、収穫したレタスの葉部を洗うことなく食した
ところ、湿度60%以下で栽培したレタスは、パリパリ
とした食感があり食味良好であったが、湿度80%で栽
培したレタスは、葉が柔らかく薄いためにパリパリ感は
なく、歯切れの悪い食感を呈した。
The cultivated lettuce was measured for stem length and leaf color value. The leaf color value is obtained by measuring the SPAD value of the fifth leaf from the youngest leaf using a leaf chromaticity meter (Minolta: SPAD-5).
02). The result is a relative humidity of 40%
As shown in Table 1, the stem cultivated at a humidity of 40% or less had a short stem length and a high leaf color value. When the leaves of the harvested lettuce were eaten without washing, the lettuce cultivated at a humidity of 60% or less had a crispy texture and had a good taste. However, since it was soft and thin, it did not have a crispy texture and had a crisp texture.

【0027】[0027]

【表1】 湿度とレタス品質の関係(実施例1) 湿度(%) 地上部生体重(g) 茎長(cm) 葉色(SPAD値) 80 115±10 9.3±1.2 12.9±2.1 60 113±11 9.5±1.1 13.4±1.6 40 107± 5 6.2±0.8 17.2±2.0 20 105± 6 5.7±0.7 18.1±1.5 (全14株の平均値±標準偏差)Table 1 Relationship between humidity and lettuce quality (Example 1) Humidity (%) Aboveground fresh weight (g) Stem length (cm) Leaf color (SPAD value) 80 115 ± 10 9.3 ± 1.2 12.9 ± 2.1 60 113 ± 11 9.5 ± 1.1 13.4 ± 1.6 40 107 ± 5 6.2 ± 0.8 17.2 ± 2.0 20 105 ± 6 5.7 ± 0. 7 18.1 ± 1.5 (mean ± standard deviation of all 14 strains)

【0028】実施例2:温度、湿度を制御した4台の栽
培装置でレタス(品種:レッドファイヤー)の水耕栽培
を行った。栽培装置内の湿度をそれぞれ55、50、4
5、40%とした点以外は実施例1と同様の条件で栽培
した。そして、実施例1と同様に評価した。その結果は
表2に示す通りである。
Example 2: Hydroponic cultivation of lettuce (variety: Red Fire) was carried out with four cultivation apparatuses whose temperature and humidity were controlled. Humidity inside the cultivation equipment is 55, 50, 4 respectively
Cultivation was carried out under the same conditions as in Example 1 except that they were set at 5 and 40%. And it evaluated similarly to Example 1. The results are as shown in Table 2.

【0029】[0029]

【表2】 湿度とレタス品質の関係(実施例2) 湿度(%) 地上部生体重(g) 茎長(cm) 葉色(SPAD値) 55 110±11 7.9±2.2 14.1±1.4 50 107± 8 6.4±1.8 16.3±1.4 45 109± 5 6.5±1.3 17.6±2.3 40 105± 7 6.0±1.0 16.9±1.6 (全14株の平均値±標準偏差)Table 2 Relationship between humidity and lettuce quality (Example 2) Humidity (%) Aboveground fresh weight (g) Stem length (cm) Leaf color (SPAD value) 55 110 ± 11 7.9 ± 2.2 14.1 ± 1.4 50 107 ± 8 6.4 ± 1.8 16.3 ± 1.4 45 109 ± 5 6.5 ± 1.3 17.6 ± 2.3 40 105 ± 7 6.0 ± 1. 0 16.9 ± 1.6 (mean ± standard deviation of all 14 strains)

【0030】実施例1及び2について、それぞれ湿度4
0%での茎長および葉色の値を100%とし、他の湿度
の場合の相対値を算出した場合、湿度に対する茎長およ
び葉色の相対値は図5のグラフに示す通りである。その
結果、特に、湿度50%以下で茎長が短く、葉色値が高
い品質の優れた野菜が栽培できることが解った。
For Examples 1 and 2, a humidity of 4
When the values of the stem length and leaf color at 0% are set to 100%, and the relative values at other humidity are calculated, the relative values of the stem length and leaf color with respect to the humidity are as shown in the graph of FIG. As a result, it was found that particularly high-quality vegetables having a short stem length and a high leaf color value at a humidity of 50% or less can be cultivated.

【0031】実施例3:図1に示す栽培装置を4台使用
し、異なる湿度条件のもとにホウレンソウ(品種:丸粒
トウカイホウレンソウ)の水耕栽培を行った。栽培装置
は、パネル光源(2)の仕様が異なる点を除き、実施例
1におけるのと同様の装置を使用した。すなわち、パネ
ル光源(2)は、ピーク波長が660nmのDDH型超
高輝度赤色LEDチップを300個配列し、更に、ピー
ク波長が450nmの青色LEDチップ150個を配列
し、そして、波長の異なるLEDチップごとに出力を制
御した点が実施例1と相違する。
Example 3 Using four cultivation apparatuses shown in FIG. 1, spinach (variety: round grain spinach) was grown under hydroponics under different humidity conditions. The same cultivation apparatus as that in Example 1 was used except that the specifications of the panel light source (2) were different. That is, the panel light source (2) arranges 300 DDH-type ultra-high-brightness red LED chips having a peak wavelength of 660 nm, further arranges 150 blue LED chips having a peak wavelength of 450 nm, and LEDs having different wavelengths. The difference from the first embodiment is that the output is controlled for each chip.

【0032】上記の栽培装置において、2cm角のスポ
ンジ上に外皮を取り除いたホウレンソウ種子を播種し、
20℃、白色蛍光灯下で3日間置いて発芽させた後、上
記の栽培装置に84株移植し、40日間栽培した。栽培
中は、実施例1と同様に、7日ごとに水耕液を全量交換
した。また、栽培面の光量は、青色光量を10±1μm
ol/m2・sに、全光量を100±5μmol/m2・sに
調節し、1日12時間点灯した。そして、発芽した後の
栽培装置内の温度は全て20℃に設定し、湿度はそれぞ
れ80、60、40、20%に調整した。
In the above cultivation apparatus, spinach seeds whose outer skin has been removed are sown on a 2 cm square sponge,
After germination at 20 ° C. under white fluorescent light for 3 days, 84 strains were transplanted to the above cultivation apparatus and cultivated for 40 days. During the cultivation, as in Example 1, the total amount of the hydroponic solution was changed every seven days. In addition, the amount of light on the cultivation surface was set to 10 ± 1 μm
ol / m 2 · s, the total light amount was adjusted to 100 ± 5 μmol / m 2 · s, and the lamp was turned on for 12 hours a day. The temperature in the cultivation apparatus after germination was all set at 20 ° C., and the humidity was adjusted to 80, 60, 40, and 20%, respectively.

【0033】栽培したホウレンソウについては、実施例
1と同様の方法で茎長および葉色値を測定した。その結
果は、相対湿度40%で栽培したものを基準にすると、
表3に示す通りであり、湿度40%以下で茎長が短く、
葉色値が高くなった。
The cultivated spinach was measured for stem length and leaf color value in the same manner as in Example 1. The results are based on those grown at 40% relative humidity.
As shown in Table 3, the stem length is short at a humidity of 40% or less,
Leaf color value increased.

【0034】[0034]

【表3】 湿度とホウレンソウ品質の関係(実施例3) 湿度(%) 地上部生体重(g) 茎長(cm) 葉色(SPAD値) 80 82±12 5.2±1.7 24.1±5.7 60 80±10 4.8±1.9 23.6±5.9 40 78± 9 2.7±1.4 27.5±4.8 20 75± 9 1.9±1.1 28.4±5.2 (全14株の平均値±標準偏差)Table 3 Relationship between humidity and spinach quality (Example 3) Humidity (%) Aboveground fresh weight (g) Stem length (cm) Leaf color (SPAD value) 80 82 ± 12 5.2 ± 1.7 24.1 ± 5.7 60 80 ± 10 4.8 ± 1.9 23.6 ± 5.9 40 78 ± 9 2.7 ± 1.4 27.5 ± 4.8 20 75 ± 9 1.9 ± 1.9. 1 28.4 ± 5.2 (mean ± standard deviation of all 14 strains)

【0035】また、収穫したホウレンソウの葉部を洗う
ことなく食したところ、湿度60%以下で栽培したホウ
レンソウは、パリパリとした食感があり食味良好であっ
たが、湿度80%で栽培したホウレンソウは、葉が柔ら
かく薄いためにパリパリ感はなく、歯切れの悪い食感を
呈した。味については、従来の露地栽培によるものと比
べ、何れの湿度条件下で栽培したホウレンソウも「苦
味」や「あく」等がなく良好であった。
When the leaves of the harvested spinach were eaten without washing, the spinach cultivated at a humidity of 60% or less had a crispy texture and had a good taste, but the spinach cultivated at a humidity of 80%. Had no crispness due to the soft and thin leaves and had a crisp texture. As for the taste, spinach cultivated under any humidity conditions was good without "bitterness" or "red" compared to the conventional open-field cultivation.

【0036】実施例4:温度、湿度を制御した4台の栽
培装置でホウレンソウ(品種:丸粒トウカイホウレンソ
ウ)の水耕栽培を行った。栽培装置内の湿度をそれぞれ
55、50、45、40%とした点以外は実施例3と同
様の条件で栽培した。そして、実施例3と同様に評価し
た。その結果は表4に示す通りである。
Example 4: Spinach (variety: round grain spinach) was hydroponically cultivated using four cultivation apparatuses with controlled temperature and humidity. Cultivation was performed under the same conditions as in Example 3 except that the humidity in the cultivation apparatus was 55, 50, 45, and 40%, respectively. And it evaluated similarly to Example 3. The results are as shown in Table 4.

【0037】[0037]

【表4】 湿度とホウレンソウ品質の関係(実施例4) 湿度(%) 地上部生体重(g) 茎長(cm) 葉色(SPAD値) 55 87±12 3.5±1.6 23.6±3.6 50 85± 9 2.9±1.8 26.3±3.1 45 80±15 1.8±0.9 27.2±2.9 40 83±12 2.2±1.3 26.9±3.3 (全14株の平均値±標準偏差)Table 4 Relationship between humidity and spinach quality (Example 4) Humidity (%) Aboveground fresh weight (g) Stem length (cm) Leaf color (SPAD value) 55 87 ± 12 3.5 ± 1.6 23.6 ± 3.6 50 85 ± 9 2.9 ± 1.8 26.3 ± 3.1 45 80 ± 15 1.8 ± 0.9 27.2 ± 2.9 40 83 ± 12 2.2 ± 1. 3 26.9 ± 3.3 (mean ± standard deviation of all 14 strains)

【0038】実施例3及び4について、実施例1及び2
におけるのと同様に、湿度40%での茎長および葉色の
値を100%として、他の湿度の場合の相対値を算出し
た場合、各湿度に対する茎長および葉色の相対値は図6
のグラフに示す通りである。その結果、ホウレンソウに
おいても、レタスの場合と略同様に、湿度50%以下で
茎長が短く、葉色が高い品質の優れたものが栽培できる
ことが解った。
With respect to Examples 3 and 4, Examples 1 and 2
Similarly to the above, when the values of the stem length and leaf color at a humidity of 40% are set to 100% and the relative values at other humidity are calculated, the relative values of the stem length and leaf color for each humidity are shown in FIG.
Is as shown in the graph of FIG. As a result, it was found that, similarly to the case of lettuce, spinach can be cultivated at a humidity of 50% or less, with a short stem length, high leaf color and excellent quality.

【0039】[0039]

【発明の効果】本発明の植物栽培方法によれば、半導体
光源によって所定波長の光の照射すると共に、植物栽培
装置内の相対湿度を特定の値に保持することにより、気
孔の開きを抑制し、炭酸ガスの吸収速度を制限できるた
め、植物の徒長を抑制でき、葉菜類では葉色が濃く、パ
リパリした食感が得られる等、品質を向上できる。
According to the plant cultivation method of the present invention, the opening of the pores is suppressed by irradiating the semiconductor light source with light of a predetermined wavelength and maintaining the relative humidity in the plant cultivation device at a specific value. In addition, since the absorption rate of carbon dioxide can be restricted, the length of the plant can be suppressed, and the quality of leafy vegetables can be improved, such as a deep leaf color and a crisp texture.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の植物栽培方法に好適な植物栽培装置の
一構造例を示す斜視図
FIG. 1 is a perspective view showing a structural example of a plant cultivation apparatus suitable for a plant cultivation method of the present invention.

【図2】図1の栽培装置におけるパネル光源の1パネル
ユニットを背面側から示す斜視図
FIG. 2 is a perspective view showing one panel unit of a panel light source in the cultivation apparatus of FIG. 1 viewed from the rear side.

【図3】レタス栽培における湿度の影響を示すグラフFIG. 3 is a graph showing the effect of humidity on lettuce cultivation.

【図4】ホウレンソウ栽培における湿度の影響を示すグ
ラフ
FIG. 4 is a graph showing the influence of humidity on spinach cultivation.

【符号の説明】 1 :栽培ボード 2 :パネル光源 20:パネルユニット 3 :発光体[Description of Signs] 1: Cultivation board 2: Panel light source 20: Panel unit 3: Light emitting body

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 植物栽培装置内で半導体光源を使用し且
つ所定波長の光の照射によって植物を栽培する植物栽培
方法において、前記の植物栽培装置を略密閉系に構成す
ると共に、植物栽培装置内の相対湿度を60%以下に保
持することを特徴とする植物栽培方法。
1. A plant cultivation method for cultivating a plant by using a semiconductor light source and irradiating light of a predetermined wavelength in the plant cultivation device, wherein the plant cultivation device is configured in a substantially closed system, and A method for cultivating a plant, wherein the relative humidity of the plant is maintained at 60% or less.
【請求項2】 ピーク波長が600〜700nmの赤色
光を照射する請求項1記載の植物栽培方法。
2. The method for cultivating a plant according to claim 1, wherein red light having a peak wavelength of 600 to 700 nm is irradiated.
【請求項3】 ピーク波長が600〜700nmの赤色
光およびピーク波長が400〜500nmの青色光を照
射する請求項1記載の植物栽培方法。
3. The plant cultivation method according to claim 1, wherein red light having a peak wavelength of 600 to 700 nm and blue light having a peak wavelength of 400 to 500 nm are irradiated.
【請求項4】 ピーク波長が600〜700nmの赤色
光およびピーク波長が700〜800nmの遠赤色光を
照射する請求項1記載の植物栽培方法。
4. The plant cultivation method according to claim 1, wherein red light having a peak wavelength of 600 to 700 nm and far-red light having a peak wavelength of 700 to 800 nm are irradiated.
【請求項5】 ピーク波長が600〜700nmの赤色
光、ピーク波長が400〜500nmの青色光およびピ
ーク波長が700〜800nmの遠赤色光を照射する請
求項1記載の植物栽培方法。
5. The method according to claim 1, wherein red light having a peak wavelength of 600 to 700 nm, blue light having a peak wavelength of 400 to 500 nm, and far-red light having a peak wavelength of 700 to 800 nm are irradiated.
JP11229147A 1999-08-13 1999-08-13 Method for culturing plant Withdrawn JP2001054320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11229147A JP2001054320A (en) 1999-08-13 1999-08-13 Method for culturing plant

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11229147A JP2001054320A (en) 1999-08-13 1999-08-13 Method for culturing plant

Publications (1)

Publication Number Publication Date
JP2001054320A true JP2001054320A (en) 2001-02-27

Family

ID=16887519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11229147A Withdrawn JP2001054320A (en) 1999-08-13 1999-08-13 Method for culturing plant

Country Status (1)

Country Link
JP (1) JP2001054320A (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002267348A (en) * 2001-03-13 2002-09-18 Matsushita Refrig Co Ltd Refrigerator
JP2005049093A (en) * 2004-10-29 2005-02-24 Matsushita Refrig Co Ltd Refrigerator
JP2006183999A (en) * 2006-02-16 2006-07-13 Matsushita Refrig Co Ltd Refrigerator
JP2008011814A (en) * 2006-07-07 2008-01-24 Unicon Engineering Co Ltd Method for using circulation type regenerated water
US7466023B2 (en) 2002-03-06 2008-12-16 Hamamatsu Photonics K.K. Semiconductor light emitting device and plant cultivating system
JP2009142231A (en) * 2007-12-17 2009-07-02 Universal Consultant Kk Method for using circulating recycled water by remote control of organic waste water treatment
JP2010006776A (en) * 2008-06-30 2010-01-14 Toray Ind Inc Method for producing cycloalkanone oxime and device for photochemical reaction
JP2010048550A (en) * 2009-12-03 2010-03-04 Panasonic Corp Refrigerator
EP2428118A2 (en) 2006-11-13 2012-03-14 Guggenbichler, Joseph Peter Antimicrobial agent
JP2012147765A (en) * 2011-01-20 2012-08-09 Nagao Design Jimusho:Kk Plant cultivation device
JP2013034395A (en) * 2011-08-04 2013-02-21 Graduate School For The Creation Of New Photonics Industries Method for inhibiting harsh taste of bamboo shoot
JP2013198484A (en) * 2012-02-23 2013-10-03 Kobe Univ Cultivation method of plant
JP2014008033A (en) * 2012-06-29 2014-01-20 Sharp Corp Cultivation method and cultivation device for plant
JP2014023473A (en) * 2012-07-26 2014-02-06 Sharp Corp Illumination device, plant cultivation system, and plant cultivation method
JP2014090684A (en) * 2012-11-01 2014-05-19 Sharp Corp Illumination device
JP5639701B1 (en) * 2013-09-12 2014-12-10 パナソニック株式会社 Hydroponics apparatus and hydroponics method
WO2015034042A1 (en) * 2013-09-06 2015-03-12 三菱化学株式会社 Method for producing protein using plant
CN112423580A (en) * 2018-07-13 2021-02-26 三菱化学农业梦想株式会社 Cultivation device and cultivation method for seedlings of solanaceae plants
KR20210062462A (en) * 2019-11-21 2021-05-31 경상국립대학교산학협력단 Growing system for tomato plug seedling during winter season and method for cultivation the same

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002267348A (en) * 2001-03-13 2002-09-18 Matsushita Refrig Co Ltd Refrigerator
JP4501294B2 (en) * 2001-03-13 2010-07-14 パナソニック株式会社 refrigerator
US7466023B2 (en) 2002-03-06 2008-12-16 Hamamatsu Photonics K.K. Semiconductor light emitting device and plant cultivating system
JP2005049093A (en) * 2004-10-29 2005-02-24 Matsushita Refrig Co Ltd Refrigerator
JP2006183999A (en) * 2006-02-16 2006-07-13 Matsushita Refrig Co Ltd Refrigerator
JP2008011814A (en) * 2006-07-07 2008-01-24 Unicon Engineering Co Ltd Method for using circulation type regenerated water
EP2428118A2 (en) 2006-11-13 2012-03-14 Guggenbichler, Joseph Peter Antimicrobial agent
JP2009142231A (en) * 2007-12-17 2009-07-02 Universal Consultant Kk Method for using circulating recycled water by remote control of organic waste water treatment
JP2010006776A (en) * 2008-06-30 2010-01-14 Toray Ind Inc Method for producing cycloalkanone oxime and device for photochemical reaction
JP2010048550A (en) * 2009-12-03 2010-03-04 Panasonic Corp Refrigerator
JP2012147765A (en) * 2011-01-20 2012-08-09 Nagao Design Jimusho:Kk Plant cultivation device
JP2013034395A (en) * 2011-08-04 2013-02-21 Graduate School For The Creation Of New Photonics Industries Method for inhibiting harsh taste of bamboo shoot
JP2013198484A (en) * 2012-02-23 2013-10-03 Kobe Univ Cultivation method of plant
JP2014008033A (en) * 2012-06-29 2014-01-20 Sharp Corp Cultivation method and cultivation device for plant
JP2014023473A (en) * 2012-07-26 2014-02-06 Sharp Corp Illumination device, plant cultivation system, and plant cultivation method
JP2014090684A (en) * 2012-11-01 2014-05-19 Sharp Corp Illumination device
WO2015034042A1 (en) * 2013-09-06 2015-03-12 三菱化学株式会社 Method for producing protein using plant
JPWO2015034042A1 (en) * 2013-09-06 2017-03-02 三菱化学株式会社 Protein production method using plants
US10125370B2 (en) 2013-09-06 2018-11-13 Mitsubishi Chemical Corporation Method for producing protein in plants using lighting with at least 50% red light
JP5639701B1 (en) * 2013-09-12 2014-12-10 パナソニック株式会社 Hydroponics apparatus and hydroponics method
WO2015037163A1 (en) * 2013-09-12 2015-03-19 パナソニックIpマネジメント株式会社 Hydroponic cultivation device and hydroponic cultivation method
CN112423580A (en) * 2018-07-13 2021-02-26 三菱化学农业梦想株式会社 Cultivation device and cultivation method for seedlings of solanaceae plants
CN112423580B (en) * 2018-07-13 2023-05-12 三菱化学水解决方案株式会社 Cultivation device and cultivation method for seedlings of Solanaceae plants
KR20210062462A (en) * 2019-11-21 2021-05-31 경상국립대학교산학협력단 Growing system for tomato plug seedling during winter season and method for cultivation the same
KR102449012B1 (en) 2019-11-21 2022-09-29 경상국립대학교산학협력단 Growing system for tomato plug seedling during winter season and method for cultivation the same

Similar Documents

Publication Publication Date Title
JP2001054320A (en) Method for culturing plant
JP5971623B2 (en) Light irradiation apparatus, strawberry cultivation system and strawberry cultivation method
Yang et al. Effect of end-of-day far-red light from a movable LED fixture on squash rootstock hypocotyl elongation
US5269093A (en) Method and apparatus for controlling plant growth with artificial light
KR101415842B1 (en) Indoor Plants Cultivation Apparatus
US9549507B2 (en) Method for cultivating plant
KR20170139551A (en) Method and apparatus for stimulation of plant growth and development with near infrared and visible lights
KR101481538B1 (en) Growing apparatus of plant with led
CA3071775A1 (en) Dimming method for constant light intensity
JP5102190B2 (en) Plant cultivation method
WO2018143407A1 (en) Method for cultivating plant seedling by artificial light
KR102285707B1 (en) Plant cultivation apparatus and plant cultivation method using light source for plant cultivation
WO2020013011A1 (en) Cultivation device and cultivation method for solanaceous seedlings
EP2761992B1 (en) Method for cultivating plant
KR101414473B1 (en) Plant cultivation system and cultivation method using upper and lower growth lamp
CN106718183A (en) The nursery luminous environment and method for culturing seedlings of a kind of leaf vegetables
JPH08205677A (en) Regulation of nutrient ingredient content of plant body
JP2007075073A (en) Method for cultivating sprouts
JP2011109934A (en) Method for cultivating plant
JP4015251B2 (en) Rice cultivation method
JP7166979B2 (en) Leaf vegetable cultivation method and cultivation system
JP2019041694A (en) Plant cultivation apparatus and plant cultivation method
JP2001258389A (en) Method for cultivating plant
KR20180006992A (en) Cultivation method of spinach by using light quality in closed-type plant factory system
JP4159485B2 (en) Method for inducing flower buds of cruciferous plants

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20061107