JP2001028232A - Aligner for band-like metal thin plate and method therefor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an aligner and a method for a band-like metal thin plate, capable of suppressing power consumption, extending service life of a light source, and preventing thermal effects exposed surface and a pattern plate, without reducing production efficiency. SOLUTION: A light source L makes a light irradiated along an optical path LW toward an exposure target surface R, and a shutter 10 blocks the light from the light source L to the exposure surface R midway of the optical path LW. A motor 20 displaces this shutter 10 to an exposure position and a shading position. An electrical controller EC changes a luminous intensity of the light source L, so that the luminous intensity of the light source L when the shutter 10 is positioned at the shading position becomes lower than the luminous intensity of the light source L, when the shutter 10 is positioned at the exposure position.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for irradiating a light-exposed surface of a strip-shaped metal sheet through a pattern plate on which a predetermined image pattern is formed, and applying a predetermined image pattern to the exposed surface. The present invention relates to an exposure apparatus and an exposure method for a strip-shaped metal sheet to be exposed. In particular, the present invention relates to an exposure apparatus and an exposure method for a strip-shaped metal sheet used in a manufacturing process of a shadow mask for a color cathode ray tube or an aperture grill for a trinitron tube (registered trademark of Sony Corporation).

[0002]

2. Description of the Related Art Generally, for example, in a process of producing a shadow mask (hereinafter, referred to as SM) for a color cathode ray tube, a plurality of through-holes (hereinafter, referred to as through-holes) for passing an electron beam are formed in a strip-shaped metal sheet. In the photolithography etching step to be formed, various processes described below are sequentially performed.

[0003] First, a strip-shaped metal sheet manufactured using a predetermined metal material is wound around a shaft to form a roll, and then the roll-shaped strip-shaped metal sheet is unwound in order and conveyed in the longitudinal direction. By performing a predetermined photolithography etching process, a plurality of through-holes are formed within a substantially rectangular range required as a product. That is, in the photolithography etching step, generally, a resist coating process for forming a photosensitive resist film on the surface of the strip-shaped metal sheet, an exposure process for exposing a predetermined through-hole pattern to the resist film, and a development of the resist film Developing process to remove the portion corresponding to the hole pattern of the resist film, etching process to etch the portion where the resist film is removed to form a plurality of holes in the strip-shaped metal sheet, and Processes such as a resist stripping process for removing the remaining resist film are sequentially performed.

Incidentally, in order to perform the above-described exposure processing in the photolithography etching step, an exposure apparatus as shown below is generally used. That is, a pair of pattern plates having a predetermined through-hole pattern corresponding to a plurality of through-holes of the SM are adhered to the exposed surfaces of the photosensitive resist film surfaces formed on both surfaces of the strip-shaped metal thin plate, respectively. The exposure apparatus irradiates a resist film with light from a light source through each pattern plate, and prints a predetermined pattern on both surfaces to be exposed of the strip-shaped metal sheet.

More specifically, such a conventional strip-shaped metal sheet exposure apparatus includes a pair of light sources for irradiating an exposed surface (both sides) of the strip-shaped metal sheet with ultraviolet light at a predetermined luminous intensity; In the optical path from the light source to the surface to be exposed, a pair of flat shutter plates that are opened and closed so as to block light from the light source to the surface to be exposed is provided, and the surfaces of the surface to be exposed (both surfaces) are provided. , A pair of pattern plates are in close contact.

Next, the exposure processing operation of this exposure apparatus will be described. First, from the state where the shutter plate is closed, that is, the state where the shutter plate blocks light from the light source to the surface to be exposed, The shutter plate opens in a predetermined direction, and light from a light source is irradiated on the surface to be exposed. Next, after the surface to be exposed is irradiated with light for a certain period of time, the shutter plate is closed, and the exposure processing operation is completed. Regardless of the opening / closing operation of the shutter plate accompanying the above-described exposure processing operation, the luminous intensity of the light source is always a constant luminous intensity, and even if the exposure processing operation is not performed, that is, the shutter plate is closed. Also, the light source is continuously turned on, and is in this state until the next exposure processing operation.

Here, the reason why the light source is continuously turned on will be described. For example, in the case where the light source is repeatedly turned on / off every time the exposure processing operation is performed, if the light source is turned off once. In the next lighting, it takes several tens of seconds to several minutes for the light intensity of the light source to return to the normal light intensity, so that the interval between the exposure processing operations becomes longer, and the production efficiency of the exposure apparatus is significantly reduced. I will. Also, in this case,
Since turning on and off are repeated, the life of the light source is naturally reduced. For these reasons, in the conventional exposure apparatus, the light source is not repeatedly turned on / off each time the exposure processing operation is performed, but the light source is kept turned on.

[0008]

However, in the above-described conventional exposure apparatus, since the light source is continuously turned on even when the exposure processing operation is not performed, the power consumption of the light source is large, and However, there is a problem that the life of the light source is short. Furthermore, when the atmosphere around the light source is heated by heat rays or the like contained in the light from the light source and the ambient temperature rises, and then the shutter plate is opened, the hot atmosphere is exposed to the strip-shaped metal sheet. There is a case where heat leaks out to the surface or the pattern plate side which is in close contact with the surface, thereby giving a thermal effect. In other words, due to the thermal effects of this thermal atmosphere, the light-irradiated portions of the resist film of the strip-shaped metal sheet are also cured, and are not sufficiently developed in the next development step, or the pattern plate is thermally expanded. And the positional accuracy of the through-hole pattern is reduced.

Accordingly, an object of the present invention is to solve the above-mentioned technical problems, suppress the power consumption of the light source without lowering the production efficiency, prolong the life of the light source, and improve the exposure surface and pattern. An object of the present invention is to provide an exposure apparatus and an exposure method for a strip-shaped metal sheet that can prevent a thermal influence on a sheet.

[0010]

According to a first aspect of the present invention, there is provided a method for solving the above-mentioned technical problems, wherein a predetermined image pattern is formed on a surface to be exposed of a strip-shaped thin metal plate via a pattern plate. A light source that irradiates light with a predetermined luminous intensity along a predetermined optical path onto the surface to be exposed, and a light source that irradiates the surface with the predetermined image pattern on the surface to be exposed; A light-shielding member capable of blocking light from the light source to the surface to be exposed, and a light-shielding member that blocks light from the light source to the surface to be exposed and light from the light source to the surface to be exposed. A strip-shaped metal, comprising: a light-shielding member displacing means for displacing the light source to a position; and a light intensity varying means for changing the light intensity of the light source based on the position of the light-shielding member displaced by the light-shielding member displacing means. Thin plate exposure equipment It is.

According to a second aspect of the present invention, in the apparatus for exposing a strip-shaped metal sheet according to the first aspect, the luminous intensity varying means includes a light-shielding member located at a position where light from a light source irradiates the surface to be exposed. The light intensity of the light source is changed such that the light intensity of the light source when the light shielding member is located at a position where light from the light source to the surface to be exposed is blocked is lower than the light intensity of the light source when the light source is turned on. An exposure apparatus for a strip-shaped metal thin plate, comprising:

The invention according to claim 3 is the invention according to claim 1 or 2
In the strip-shaped thin metal plate exposure apparatus according to the above, the light-shielding member has a light-shielding portion capable of blocking light from the light source to the surface to be exposed, the light-shielding member displacement means, the light-shielding portion on the optical path, After displacing the light-shielding member in a predetermined direction so that the light-shielding portion deviates from the optical path from the state where the light-shielding member is positioned, the light-shielding member is moved so that the light-shielding portion returns to the optical path again. A reciprocating displacement means for displacing in a direction opposite to a predetermined direction, wherein the light intensity varying means is configured such that the light shielding member is less than the light intensity of the light source when the light shielding member is positioned such that the light shielding portion is off the optical path. An exposure apparatus for a strip-shaped metal thin plate, wherein the luminous intensity of a light source is changed so that the luminous intensity of the light source during displacement is lower.

[0013] The invention according to claim 4 is the invention according to claim 1 or 2.
Wherein the light shielding member has a light shielding part capable of blocking light, and a light transmitting part provided at a position sandwiched between the light shielding parts and capable of transmitting light. The light shielding member displacing means is a one-way displacing means for displacing the light shielding member so that the light transmitting portion of the light shielding member passes across the optical path, and is a strip-shaped thin metal plate exposure apparatus.

According to a fifth aspect of the present invention, in the strip-shaped thin metal plate exposure apparatus according to the fourth aspect, the light shielding member is a cylindrical light shielding member provided to surround the light source and having a predetermined cylindrical axis. The light-shielding portion of the light-shielding member is a light-shielding wall formed on a part of the cylindrical surface of the light-shielding member, and the light-transmitting portion of the light-shielding member is a light-transmitting window formed on a part of the cylindrical surface of the light-shielding member. Wherein the one-way displacement means is a one-way rotating means for rotating the light-shielding member about the cylindrical axis so that the light-transmitting window of the light-shielding member passes across the optical path. This is a thin metal plate exposure apparatus.

According to a sixth aspect of the present invention, light from a light source is radiated to a surface to be exposed of a strip-shaped metal sheet through a pattern plate on which a predetermined image pattern is formed, and the surface to be exposed is exposed to a predetermined light. In an exposure method for exposing an image pattern,

This is a method for exposing a strip-shaped metal sheet, wherein the luminous intensity of the light source is changed based on the state of blocking light from the light source to the surface to be exposed.

Here, according to the strip-shaped thin metal sheet exposure apparatus of the present invention, the luminous intensity of the light source can be changed by the luminous intensity varying means based on the position of the light shielding member displaced by the light shielding member displacement means. it can. For example, the light shielding member is located at a position where the light from the light source is irradiated on the surface to be exposed (hereinafter, referred to as an exposure position) by the luminous intensity varying means as in the belt-like metal sheet exposure apparatus according to the second aspect of the present invention. When the light-shielding member is located at a position where the light from the light source to the surface to be exposed is blocked (hereinafter referred to as a light-shielding position), rather than the luminous intensity of the light source at the time of exposure (hereinafter referred to as an exposure). ) Can be lower.

For this reason, even during the light shielding period in which the exposure processing operation is not performed, the light source is not turned off but is turned on at a predetermined luminous intensity lower than the luminous intensity at the time of exposure. Therefore, when performing the next exposure processing operation, it is only necessary to return the luminous intensity of the light source to the luminous intensity at the time of exposure, so that preparation (recovery of the luminous intensity of the light source) requires little time, and the production efficiency can be reduced. Absent.

During light shielding, the light source has a predetermined luminous intensity (for example, 50% luminous intensity) lower than the luminous intensity at the time of exposure (for example, 100% luminous intensity). For this reason,
The power consumption of the light source is reduced, and the life of the light source can be extended. In addition, during the light-shielding time, the rise in the ambient temperature around the light source is suppressed, so that the thermal effect due to this atmosphere is reduced, and the curing of the resist film of the strip-shaped thin metal plate and the thermal expansion of the pattern plate can be suppressed. .

The "light-shielding member" may be any member as long as it can shield light from the light source, and the shape is not limited to a plate-like member. For example, it may be a cylindrical member or a block member. Good. Further, the “surface to be exposed” refers to a portion to be exposed on one surface of the strip-shaped metal sheet (for example, a substantially rectangular portion or the like), and does not refer to the entire surface on one side of the strip-shaped metal sheet. Further, the “luminous intensity varying means” may change the luminous intensity of the light source by, for example, changing the electric power (at least one of voltage and current) supplied to the light source.

The "luminous intensity" is the intensity of the light itself emitted from the light source itself, and has a different meaning from the illuminance indicating the brightness on a predetermined surface. In addition, "light path"
Refers to a path through which light from the light source to the surface to be exposed passes, and may be not only a straight optical path but also a polygonal optical path formed by reflecting light with a reflector or the like. . In practice, an infinite number of optical paths form a light flux (hereinafter, referred to as a light flux), and the light flux is applied to the surface to be exposed. Further, “the position where light from the light source is irradiated on the surface to be exposed” (exposure position) is the position of the light shielding member where the light flux reaches the surface to be exposed, and “the position from the light source to the surface to be exposed” The “light blocking position” (light blocking position) is a position of the light blocking member such that the light flux does not reach the surface to be exposed.

According to the third aspect of the present invention, the light-shielding member has a light-shielding portion. Then, the light-shielding member is reciprocated by the reciprocating displacement means so that the light-shielding portion of the light-shielding member is once off the optical path from the state where the light-shielding portion is on the optical path, and then returns to the state on the optical path again. Is displaced. That is,
The light blocking member is displaced reciprocally between two positions, a light blocking position and an exposure position. While the light shielding member is being displaced, the light source is at a predetermined luminous intensity (for example, 50% luminous intensity) lower than the luminous intensity at the time of exposure (for example, 100% luminous intensity).
It has become.

Here, when the light-shielding member reciprocates, the exposure time varies in the direction of displacement of the light-shielding member in the surface of the surface to be exposed, so that the occurrence of exposure unevenness cannot be completely eliminated. However, in the present invention, since the luminous intensity of the light source is set to the minimum luminous intensity (lower luminous intensity than the luminous intensity at the time of exposure) while the light shielding member is displaced, the above-described exposure in the displacement direction of the light shielding member is performed. Exposure unevenness on the surface can be reduced.

According to the belt-shaped thin metal plate exposure apparatus of the present invention, a light-transmitting portion is formed on the light-shielding member at a position between the light-shielding portions. Then, the light-blocking member is displaced by the one-way displacing means so that the translucent portion passes across the optical path. That is, after the light-shielding portion of the light-shielding member is on the optical path, the light-transmitting portion is on the optical path and the surface to be exposed is exposed, the light-transmitting portion passes across the optical path, and the light-shielding portion is The light blocking member is displaced in one direction so as to be on the optical path.

For this reason, regarding the displacement direction of the light shielding member,
Exposure time is the same in the surface to be exposed, and the integrated exposure amount is almost the same. Therefore, it is possible to eliminate the occurrence of uneven exposure on the surface to be exposed and to perform uniform exposure on the surface to be exposed. Can be. Here, the integrated exposure amount is a product of the illuminance of the surface to be exposed by the light emitted from the light source and the time during which the light from the light source is applied to the surface to be exposed. Then, when the integrated exposure amount becomes non-uniform in the surface to be exposed,
This appears as exposure unevenness.

The "light-shielding portion" may be two light-shielding portions provided so as to be divided by the light-transmitting portion, or one light-shielding portion continuously provided so as to sandwich the light-transmitting portion. It may be a part. The “light-transmitting portion” may be any portion as long as it can transmit light. For example, it may be a simple opening portion or a cutout portion formed in a light-shielding member, and further, a transparent portion such as quartz glass. It may be.

According to the apparatus for exposing a strip-shaped metal sheet according to the fifth aspect of the present invention, further. The light-shielding member is formed of a cylindrical member surrounding the light source. On the cylindrical surface, a light-shielding wall corresponding to a light-shielding portion and a light-transmitting window corresponding to a light-transmitting portion are formed. Then, the one-way rotating unit rotates the light shielding member about the cylindrical axis so that the light transmitting window passes across the optical path. In other words, after the light-shielding wall of the light-shielding member is on the optical path, the light-transmitting window is on the optical path and the surface to be exposed is exposed, the light-transmitting window passes across the optical path, and The light blocking member is rotated in one direction so that the wall is on the optical path.

For this reason, in the direction along the rotation direction of the light shielding member on the surface to be exposed, the exposure time is substantially the same in the surface of the surface to be exposed, and the integrated exposure amount is substantially the same. The occurrence of exposure unevenness can be eliminated, and uniform exposure can be performed on the surface to be exposed.
Furthermore, since the cylindrical light-shielding member surrounding the light source is rotated, the occupied space when the light-shielding member is displaced (rotated) is very small as compared with the case where the light-shielding member moves linearly. Space saving of the exposure apparatus can be improved.

According to the strip-shaped thin metal plate exposure apparatus of the present invention, the luminous intensity of the light source can be changed based on the state of blocking light from the light source to the surface to be exposed. For example, when the light from the light source to the surface to be exposed is blocked (hereinafter, referred to as light-shielding), the light intensity of the light source when the surface to be exposed is irradiated with light from the light source (hereinafter, referred to as exposure). )
Of the light source can be made lower.

In this case, even during the light-shielding period in which the exposure processing operation is not performed, the light source is not turned off but is turned on at a predetermined light intensity lower than the light intensity at the time of exposure. For this reason, when performing the next exposure processing operation, it is only necessary to return the luminous intensity of the light source to the luminous intensity at the time of exposure, so that it takes almost no time to prepare (recover the luminous intensity of the light source) and reduce the production efficiency. There is no.

During light shielding, the light source has a predetermined luminous intensity (for example, 50% luminous intensity) lower than the luminous intensity at the time of exposure (for example, 100% luminous intensity). For this reason,
The power consumption of the light source is reduced, and the life of the light source can be extended. In addition, during the light-shielding time, the rise in the ambient temperature around the light source is suppressed, so that the thermal effect due to this atmosphere is reduced, and the curing of the resist film of the strip-shaped thin metal plate and the thermal expansion of the pattern plate can be suppressed. .

[0032]

Embodiments of the present invention for solving the above-mentioned technical problems will be described below in detail with reference to the accompanying drawings. First, an exposure apparatus for a shadow mask material for a color cathode ray tube according to the first embodiment of the present invention will be described. FIG. 1 is a perspective view schematically showing the configuration of the exposure apparatus according to the first embodiment.
In this exposure apparatus, a pair of pattern plates P on which a predetermined through-hole pattern is formed are brought into close contact with photosensitive resist film surfaces formed on both surfaces of a shadow mask material W for a color cathode-ray tube, respectively. An exposure apparatus that irradiates each of the exposed surfaces R with ultraviolet light of a predetermined luminous intensity from a light source through the plate P, and exposes each of the exposed surfaces R of both surfaces of the shadow mask material W with a predetermined light transmitting pattern. is there.

A pair of rectangular pattern frames each having a rectangular opening slightly smaller than the pattern plate P and having a longer side longer than the width of the shadow mask material W makes the pair of pattern plates P The outer peripheral part is held. An annular seal member (not shown) is provided on the outer peripheral portion of the surface of each of the pair of pattern frames facing the shadow mask material W.
Is provided. Then, the pair of pattern plates P
In a state where the pair of pattern frames holding the pair are in close contact with each other so as to sandwich the shadow mask material W, the space surrounded by the pair of pattern plates P, the pattern frame, and the seal member is By reducing the pressure by a negative pressure source or the like, the pair of pattern plates P is brought into close contact with the surface (both surfaces) of the shadow mask material W.

Further, FIG. 1 shows only an apparatus mechanism (hereinafter, upper surface exposure mechanism U1) for exposing a predetermined light transmission pattern on one surface (upper surface) of the shadow mask material W. Actually, an apparatus mechanism for exposing a predetermined transmissive pattern on the other surface (lower surface) of the shadow mask material W (hereinafter, a lower surface exposure mechanism U2) is provided at a position symmetrical to the upper surface exposure mechanism U1 with respect to the shadow mask material W. Has been
Since the structure is the same, illustration and description of the lower surface exposure mechanism U2 are omitted for simplification of the description.

The transport of the shadow mask material W to the exposure apparatus is appropriately performed by a transport mechanism such as a transport roller (not shown). For example, in the present embodiment, the shadow mask material W is moved by an arrow A in FIG. (Hereinafter, referred to as a transport direction A). FIG.
Shows the state of the exposure apparatus when ultraviolet light from the light source to the surface R to be exposed is shielded (hereinafter referred to as “shielded”).

First, the main structure of this exposure apparatus will be described. The exposure apparatus is arranged long in the horizontal direction perpendicular to the transport direction A of the shadow mask material W, and has a predetermined luminous intensity along the optical path LW. A light source L for irradiating R with ultraviolet light, and a power supply device D for supplying power to the light source L
S, a power controller EC that changes the luminous intensity of the light source L by changing the power supplied from the power supply device DS to the light source L, a cylindrical shutter 10 provided to surround the light source L, and a rotating shaft 11 The motor 20 for rotating the shutter 10 in the rotation direction of the arrow B shown in FIG. 1 (hereinafter referred to as the rotation direction B), the sensor mechanism 30 for detecting the rotation position of the shutter 10, and the shutter 10 A reflecting plate 40 (indicated by a two-dot chain line in FIG. 1) that is provided above the light source L in the enclosed internal space and reflects ultraviolet light emitted upward from the light source L and guides the ultraviolet light toward the surface R to be exposed. ), And so on. The optical path LW of the light emitted from the light source L is
Actually, the light flux is formed by gathering innumerably, and the light flux is applied to the surface R to be exposed.

The respective structures will be described in more detail. First, on the cylindrical surface of the shutter 10, a light-shielding wall 12 capable of blocking ultraviolet light from the light source L,
And a light-transmitting window 13 which is provided at a position interposed therebetween and which can pass ultraviolet light from the light source L. Also, both ends of the cylindrical shutter 10 are in a closed state,
A pair of rotating shafts 11 (shutters 1) extending from both end portions
0) are rotatably supported by a pair of bearings (not shown). Further, the cylindrical surface of the shutter 10 is provided with a rack portion 14 having a number of teeth formed all around its end.

A pinion 22 is attached to the tip of the output shaft 21 of the motor 20.
Are meshed with the above-mentioned rack portion 14.
Therefore, the rotational driving force from the motor 20 is
Are transmitted to the pinion 22 through the arrow C shown in FIG.
In the rotation direction (hereinafter referred to as rotation direction C).
Rotates, the shutter 10 having the rack portion 14
Are rotated in the direction of the rotation direction B. The motor 20
The rotary drive is started / stopped by a drive control signal from the drive controller MC.

The sensor mechanism 30 includes a sensor 30A for detecting that the shutter 10 is located at a rotation position where light from the light source L to the surface R to be exposed is blocked (hereinafter referred to as a light shielding position), and a light source 30A. A sensor 30B for detecting that the shutter 10 is located at a rotation position (hereinafter, referred to as an exposure position) at which light from the L is irradiated onto the surface R to be exposed. The light shielding position is the rotational position of the shutter 10 as shown in FIG. 1, and the position where the shutter 10 is rotated by 180 degrees from the light shielding position is the exposure position.

Then, for example, these sensors 30
A and 30B are optical photomicrosensors that output a detection signal when an object is inserted into the concave portion. A plate-shaped sector 15 is attached to the other end of the cylindrical surface of the shutter 10 that is different from the end where the rack portion 14 is formed. Then, the sector 15 is inserted into the concave portions of the sensors 30A and 30B,
When the sector 15 blocks the optical axis running in the concave portion, the sensor 3
0A and 30B output detection signals.

The detection signals from the sensors 30A and 30B are transmitted to the power controller EC. Then, the power controller EC that has received the detection signals from the sensors 30A and 30B can change the luminous intensity of the light source L based on the output state (output start / output stop) of the detection signals. Note that, to be precise,
The power controller EC changes the luminous intensity of the light source L by changing at least one of the voltage and the current supplied from the power supply device DS to the light source L.

Further, the detection signals of the sensors 30A and 30B are also transmitted to the drive controller MC. The drive controller MC that has received the detection signals from the sensors 30A and 30B sends a drive control signal to the motor 20 based on the output state of the detection signals, and can start / stop the rotation drive of the motor 20. .

The dotted lines extending from the sensors 30A and 30B in FIG. 1 schematically show the flow of transmission of a detection signal from the sensors 30A and 30B to the power controller EC or the drive controller MC. Does not indicate the connection state of the wiring to which the signal is transmitted.

Next, an actual exposure processing operation by the exposure apparatus will be described. FIG. 1 shows a state where the light shielding wall 12 of the shutter 10 is at a position where light from the light source L to the surface R to be exposed is blocked, that is, a state at the time of light shielding.
In this state, the sensor 30A has detected the sector 15, and a detection signal has been output from the sensor 30A. Based on the output of the detection signal from the sensor 30A, the power controller EC supplies the light source L to the light source L such that the light intensity of the light source L is lower than that at the time of exposure, for example, 50% of the light intensity at the time of exposure. The power to adjust.

Then, from the state at the time of light shielding shown in FIG. 1, the exposure processing operation is started, and the drive controller MC
The rotation of the motor 20 is started by the
2 is rotated in the rotation direction C, and the shutter 10 starts rotating in the rotation direction B. At this time, the sector 15 is separated from the sensor 30A, and the output of the detection signal from the sensor 30A is stopped. Based on the stop of the output of the detection signal from the sensor 30A, the power controller EC
Increases the power supplied to the light source L so that the light intensity of the light source L becomes the light intensity at the time of exposure (100% light intensity).

The shutter 10 is rotated in the rotation direction B.
, Light is emitted in order from the side XA on the upstream side to the side XB on the downstream side with respect to the transport direction A of the surface R to be exposed. And shutter 10
Are further rotated and the sensor 30B detects the sector 15, the drive controller MC stops the rotation of the motor 20 based on the output of the detection signal from the sensor 30B, and the rotation of the shutter 10 is stopped.

Thereafter, the rotation of the shutter 10 is kept stopped for a predetermined exposure time, for example, 40 seconds, and the luminous intensity of the light source L also remains at a constant luminous intensity (the luminous intensity at the time of exposure). Maintained in state. Thus, during a predetermined exposure time, the surface R to be exposed of the shadow mask material W is irradiated with ultraviolet light having a constant luminous intensity, and the surface R to be exposed is exposed to the through-hole pattern of the pattern plate P.

Next, after the predetermined exposure time has elapsed,
The rotation of the motor 20 is started by the drive controller MC, the pinion 22 is further rotated in the rotation direction C, and the shutter 10 is further rotated in the rotation direction B. Then, as the shutter 10 is rotated, light is blocked in order from the side XA on the upstream side to the side XB on the downstream side of the surface R to be exposed with respect to the transport direction A.

When the shutter 10 is further rotated and the sensor 30A detects the sector 15, the drive controller MC stops the rotation of the motor 20 based on the output of the detection signal from the sensor 30A, The rotation is stopped. At the same time, based on the output of the detection signal from the sensor 30A, the power controller EC sets the light intensity of the light source L to a light intensity lower than the light intensity at the time of exposure (light intensity of 50% of the light intensity at the time of exposure). Thus, the power supplied to the light source L is reduced. Thereafter, the power controller EC keeps the light intensity of the light source L at this light intensity (light intensity lower than the light intensity at the time of exposure) during the light shielding time until the next exposure processing operation is started.

One exposure process is completed by the above series of operations, and subsequently, the surface R to be exposed next is exposed.
The shadow mask material W is transported in the transport direction A so that 1 is located below the upper surface exposure mechanism U1. Then, by repeating these operations, a through-hole pattern is sequentially exposed on the upper surface of the shadow mask material W.

As described above, not only the upper surface exposing mechanism U1 described above, but actually, a lower surface exposing mechanism U2 is provided at a position symmetrical to the upper surface exposing mechanism U1 with respect to the shadow mask material W. I have. Therefore, in actuality, in one exposure process by the above series of operations, the through-hole pattern is exposed on both surfaces to be exposed of the shadow mask material W, and subsequently, the next pattern on both surfaces of the shadow mask material W is exposed. The exposed surface has an upper surface exposure mechanism U1 and a lower surface exposure mechanism U
The shadow mask material W is transported in the transport direction A so as to be located at a position sandwiched between the two. By repeating these operations, the shadow mask material W
The through-hole pattern is sequentially exposed on both the upper surface and the lower surface.

As described above, in the exposure apparatus of the first embodiment shown in FIG. 1, the light source L irradiates the surface R to be exposed with light at a predetermined luminous intensity along a predetermined optical path LW. The shutter 10 blocks the light from the light source L to the surface R to be exposed in the middle of the optical path LW, and the motor 20 moves the shutter 10 to the exposure position and the light shielding position. Let me. The power controller EC changes the luminous intensity of the light source L based on the rotational position of the shutter 10 displaced by the motor 20. Further, the power controller E
C is a light source L such that the light intensity of the light source L when the shutter 10 is located at the light blocking position is lower than the light intensity of the light source L when the shutter 10 is located at the exposure position.
Is changing the luminosity.

Therefore, with these configurations, even during the light shielding period, the light source L is not turned off but is turned on at a predetermined luminous intensity lower than the luminous intensity at the time of exposure. Therefore,
When performing the next exposure processing operation, it is only necessary to return the luminous intensity of the light source L to the luminous intensity at the time of exposure, so that it takes almost no time to prepare and the production efficiency is not reduced. Further, during the light-shielding time, the light source L has a predetermined luminous intensity (for example, 50% luminous intensity) lower than the luminous intensity at the time of exposure (100% luminous intensity). Life can be extended. In addition, during the light-shielding time, the rise in the ambient temperature around the light source L is suppressed, so that the thermal effect due to this atmosphere is reduced, and the curing of the resist film applied to the exposed surface R of the shadow mask material W is prevented. The thermal expansion of the pattern plate P can be suppressed.

In the exposure apparatus according to the first embodiment, the shutter 10 has a light shielding wall 12 capable of blocking light,
A light-transmitting window 13 provided at a position interposed between the light-shielding walls 12 and capable of transmitting light; and the motor 20 operates the shutter so that the light-transmitting window 13 of the shutter 10 passes across the optical path LW. 10 is displaced (rotated) in one direction (rotation direction B in FIG. 1).

Therefore, with these configurations, the exposure time is the same on the surface R to be exposed in the direction along the rotation direction B of the shutter 10 within the surface R to be exposed, so that the integrated exposure amount is the same. The occurrence of exposure unevenness on the exposed surface R can be eliminated, and uniform exposure can be performed on the exposed surface R.

Here, in order to explain the reduction of the exposure unevenness, FIG. 2 is a graph showing the distribution of the integrated exposure amount on the exposed surface R in the transport direction A of the shadow mask material W. In this graph, the horizontal axis is the position on the exposed surface R in the transport direction A of the shadow mask material W,
The vertical axis indicates the integrated exposure amount of the surface R to be exposed. As can be seen from this graph, uniform exposure can be performed on the exposed surface R in the transport direction A of the shadow mask material W. The transport direction A of the shadow mask material W coincides with the direction along the rotation direction of the shutter 10.

Further, in the exposure apparatus of the first embodiment, the shutter 10 is provided so as to surround the light source L, and has a rotating shaft 11 corresponding to a cylindrical axis of the shutter 10.
The light shielding wall 12 and the light transmitting window 13 of the shutter 10 are formed on a part of the cylindrical surface of the shutter 10. Further, the motor 20 rotates the rotation axis 1 corresponding to the cylindrical axis of the shutter 10 so that the light transmitting window 13 of the shutter 10 passes across the optical path LW.
1, the shutter 10 is rotated.

Therefore, in this exposure apparatus, since the cylindrical shutter 10 surrounding the light source L is rotated, the shutter 10 is displaced (rotated) as compared with the case where the shutter 10 moves linearly. The space occupied by the exposure apparatus is very small, and the space saving of the exposure apparatus can be improved.

Next, a description will be given of an exposure apparatus for a color CRT shadow mask material according to a second embodiment of the present invention, which is a modification of the exposure apparatus according to the first embodiment. FIG. 3 is a perspective view schematically showing the configuration of the exposure apparatus according to the second embodiment. The difference between the first embodiment and the second embodiment is mainly in the shape of the shutter corresponding to the light shielding member. That is, in the above-described first embodiment, the shutter 110 corresponding to the light blocking member is formed of a cylindrical member provided so as to surround the light source L. The shutter 110 corresponding to a member is formed of a rectangular plate-like member provided substantially horizontally between the light source L and the plate R to be exposed.

In the second embodiment shown in FIG. 3, a detailed description of the same parts as those in the first embodiment shown in FIG. 1 substitutes the description of the first embodiment. The description is omitted here. Further, in the second embodiment shown in FIG. 3, the same parts as those in the first embodiment shown in FIG. 1 are denoted by the same reference numerals. Note that, similarly to FIG. 1, in FIG. 3, illustration and description of the lower surface exposure mechanism U <b> 2 are omitted for simplification of the description.

First, a description will be given of a main configuration of the exposure apparatus different from that of the first embodiment. The exposure apparatus is arranged substantially horizontally in the optical path LW from the light source L to the surface R to be exposed. A rectangular plate-shaped shutter 110 provided, a motor 120 for horizontally moving the shutter 110 in a moving direction of an arrow D shown in FIG. 3 (hereinafter, referred to as a moving direction D), and a moving direction D of the shutter 110
A sensor mechanism 130 for detecting the horizontal position of the sensor is provided.

To describe these structures in more detail, first, the shutter 110 is provided with a first light-shielding portion 111 and a second light-shielding portion 112 capable of blocking ultraviolet light from the light source L, The light source L formed at a position sandwiched between the portion 111 and the second light-shielding portion 112
And a light-transmitting window 113 capable of passing ultraviolet light from the light source. The shutter 110 is supported by a guide mechanism (not shown) so as to be horizontally movable in the movement direction D. Further, a rack portion 11 having a number of teeth formed over a predetermined section is provided at an end of the upper surface of the shutter 110.
4 are provided.

A pinion 122 is attached to the tip of the output shaft 121 of the motor 120, and this pinion 122 is designed to be engaged with the rack 114 described above. Therefore, the rotational driving force from the motor 120 is transmitted to the pinion 122 via the output shaft 121,
When the pinion 122 rotates in the rotation direction of the arrow E shown in FIG. 3 (hereinafter, referred to as the rotation direction E), the shutter 110 having the rack portion 114 is horizontally moved in the movement direction D. The motor 120 is connected to the drive controller M
The rotation drive is started by the drive control signal from C /
It is to be stopped.

In the sensor mechanism 130, the shutter 110 is located at a horizontal position where the light from the light source L to the surface R to be exposed is blocked by the first light blocking portion 111 (hereinafter, referred to as a first light blocking position). 13 for detecting
0A and a horizontal position at which light from the light source L passes through the through-hole window 113 and irradiates the exposed surface R (hereinafter, referred to as an exposure position).
And a sensor 130B for detecting that the shutter 110 is located at a horizontal position where light from the light source L to the exposed surface R is blocked by the second light blocking portion 112 (hereinafter, referred to as a second light blocking position). And a sensor 130C for detecting that the shutter 110 has been positioned.

Further, these sensors 130A, 130A
B and 130C are arranged such that the horizontal distance from the sensor 130A to the sensor 130B and the horizontal distance from the sensor 130B to the sensor 130C are substantially the same distance H. And these sensors 1
Each of 30A, 130B, and 130C is an optical photomicrosensor similar to the sensors 30A and 30B described in the first embodiment.

A plate-like sector 115 is attached to the other end of the upper surface of the shutter 110 which is different from the end where the rack 114 is formed. Then, the sector 115 is connected to the sensors 130A, 130B,
When 130C detects, the sensors 130A, 130B, 1
30C outputs a detection signal. Note that the horizontal position of the shutter 110 indicated by a solid line in FIG. 3 is the above-described first light shielding position, and the horizontal position at which the shutter 110 is horizontally moved by a distance H in the moving direction D from the first light shielding position. Is an exposure position (indicated by a dashed line in FIG. 3), and further, a horizontal position (FIG. 3) where the shutter 110 is further horizontally moved by a distance H in the direction of movement D from this exposure position.
Is indicated by a two-dot chain line).

The sensors 130A, 130B, 1
The detection signals of 30C are respectively transmitted to the power controller EC, and the power controller EC receiving these detection signals changes the luminous intensity of the light source L based on the output state of these detection signals. Can be.
Further, the detection signals of the sensors 130A, 130B, 130C are also transmitted to the drive controller MC, respectively, and the drive controller MC receiving these detection signals makes the motor 1 based on these detection signals.
20 can be started / stopped.

Next, an actual exposure processing operation by the exposure apparatus according to the second embodiment will be described. FIG.
This shows a state in which the first light blocking portion 111 of the shutter 110 is at the first light blocking position, that is, a state at the time of the first light blocking. In this state, the sensor 130A detects the sector 115, and based on the output of the detection signal from the sensor 130A, the power controller EC determines that the light intensity of the light source L is lower than the light intensity at the time of exposure, for example, at the time of exposure. The power supplied to the light source L is adjusted so that the luminous intensity becomes 50% of the luminous intensity.

Then, from the state at the time of shading shown in FIG. 3, the exposure processing operation is started, and the drive controller MC
As a result, the rotation of the motor 120 is started, and the pinion 122 is rotated in the rotation direction E, and the shutter 1 is rotated.
10 begins to move horizontally in the direction of movement D. At this time, the output of the detection signal from the sensor 130A is stopped, and based on the stop of the output of the detection signal from the sensor 130A, the power controller EC determines that the light intensity of the light source L is the light intensity at the time of exposure (100% light intensity). The power supplied to the light source L is increased so that

As the shutter 110 is horizontally moved in the direction of movement D, the exposure surface R
The light is sequentially emitted from the side XA on the upstream side to the side XB on the downstream side with respect to the transport direction A. Then, the shutter 110 is further horizontally moved in the direction of movement D, and the shutter 110 is positioned at the exposure position.
0B detects sector 115, this sensor 130B
Drive controller M based on the output of the detection signal from
C stops the rotation of the motor 120, and the shutter 1
The rotation of 10 is stopped.

Thereafter, the shutter 110 is maintained in a state where its horizontal movement is stopped for a predetermined exposure time, for example, 40 seconds, and the luminous intensity of the light source L also remains constant (the luminous intensity at the time of exposure). It is maintained in the state of. Thus, during a predetermined exposure time, the surface R to be exposed of the shadow mask material W is irradiated with ultraviolet light having a constant luminous intensity, and the surface R to be exposed is exposed to the through-hole pattern of the pattern plate P.

Next, after the predetermined exposure time has elapsed,
The rotation of the motor 120 is started by the drive controller MC, the pinion 122 is further rotated in the direction of rotation E, and the shutter 110 is further horizontally moved in the direction of movement D. And this shutter 110
Is horizontally moved, the light is blocked in order from the side XA on the upstream side of the surface R to be exposed to the side XB on the downstream side with respect to the transport direction A.

When the shutter 110 is further horizontally moved, the shutter 110 is located at the second light blocking position, and the sensor 130C detects the sector 115, the drive controller is controlled based on the output of the detection signal from the sensor 130C. MC stops the rotation drive of the motor 120,
The horizontal movement of the shutter 110 is stopped.

At the same time, the sensor 130C
Power controller E based on the output of the detection signal from
C reduces the power supplied to the light source L so that the light intensity of the light source L is lower than the light intensity at the time of exposure (50% of the light intensity at the time of exposure). After that, during the light shielding period until the next exposure processing operation is started, the power controller EC
Keeps the light intensity of the light source L at this light intensity (light intensity lower than the light intensity at the time of exposure).

With the above series of operations, one exposure processing on the exposure surface R is completed, and subsequently, the exposure surface R1 to be exposed next is positioned below the upper surface exposure mechanism U1. The shadow mask material W is transported in the transport direction A.

Here, next, when the exposure processing is performed on the exposed surface R1, the shutter 110 moves in the moving direction D of the shutter 110 when the exposure processing was previously performed on the exposed surface R.
It is moved in the opposite direction. That is, when the exposure process is started from a state where the shutter 110 is in the second light shielding position, the pinion 122 is rotated by the motor 120 in the direction opposite to the rotation direction E, and the shutter 110 is rotated in the direction opposite to the movement direction D. The shutter 110
At the exposure position. After light is irradiated onto the surface R to be exposed for the predetermined exposure time, the shutter 1
10 is further moved in a direction opposite to the moving direction D,
When the shutter 110 is in the first light blocking position, the exposure processing on the exposed surface R1 is completed.

Then, the next exposure processing operation on the exposed surface is performed in the same manner as the above-described exposure processing operation on the exposed surface R. That is, by repeating the exposure processing operation on the exposure target surface R and the exposure processing operation on the exposure target surface R1, the through-hole pattern is sequentially exposed on the upper surface of the shadow mask material W. As described above, the exposure apparatus in FIG. 3 includes not only the upper surface exposure mechanism U1 but also the lower surface exposure mechanism U2. Therefore, actually, the shadow mask W
The through-hole patterns are sequentially exposed on both sides of the substrate.

As described above, in the exposure apparatus of the second embodiment shown in FIG. 3, the light source L irradiates the surface R to be exposed with light at a predetermined luminous intensity along a predetermined optical path LW. The shutter 110 blocks light from the light source L to the surface R to be exposed in the middle of the optical path LW, and the motor 120 sets the shutter 110 to the exposure position and the light blocking position (the first position). (Including the first light-shielding position and the second light-shielding position). In addition, the power controller EC determines the light source L based on the horizontal movement position of the shutter 110 displaced by the motor 120.
Is changing the luminosity. Further, the power controller EC sets the shutter 11 in the light shielding position more than the luminous intensity of the light source L when the shutter 110 is located in the exposure position.
The luminous intensity of the light source L is changed so that the luminous intensity of the light source L when 0 is located is lower.

Therefore, with these configurations, even during the light shielding, the light source L is not turned off but is turned on at a predetermined light intensity lower than the light intensity at the time of exposure. Therefore,
When performing the next exposure processing operation, it is only necessary to return the luminous intensity of the light source L to the luminous intensity at the time of exposure, so that it takes almost no time to prepare and the production efficiency is not reduced. Further, during the light-shielding time, the light source L has a predetermined luminous intensity (for example, 50% luminous intensity) lower than the luminous intensity at the time of exposure (100% luminous intensity). Life can be extended. In addition, during the light-shielding time, the rise in the ambient temperature around the light source L is suppressed, so that the thermal effect due to this atmosphere is reduced, and the curing of the resist film applied to the exposed surface R of the shadow mask material W is prevented. The thermal expansion of the pattern plate P can be suppressed.

Further, in the exposure apparatus of the second embodiment, the shutter 10 is provided at a position between the first light-shielding portion 111 and the second light-shielding portion 112, which can shut off light, and emits light. The motor 20 moves the shutter 110 in one direction (FIG. 3) so that the light-transmitting window 113 of the shutter 10 passes across the optical path LW.
In the movement direction D).

Therefore, with these configurations, the exposure time is the same in the surface R to be exposed in the direction along the moving direction D of the shutter 110 on the surface R to be exposed, and the integrated exposure amount is the same. The occurrence of exposure unevenness on the exposed surface R can be eliminated, and uniform exposure can be performed on the exposed surface R as in the first embodiment shown in FIG. In other words, the graph showing the distribution of the integrated exposure amount of the exposed surface R is the same as that of FIG. 2, but as can be seen from this graph, with respect to the transport direction A of the shadow mask material W,
Uniform exposure can be performed on the surface R to be exposed. The transport direction A of the shadow mask material W is the shutter 1
10 is the same as the moving direction D.

Next, a description will be given of an exposure apparatus for a shadow mask material for a color cathode ray tube according to a third embodiment of the present invention, in which a part of the exposure apparatus according to the second embodiment is further modified. FIG. 4 is a perspective view schematically showing the configuration of the exposure apparatus according to the third embodiment. The difference between the second embodiment and the third embodiment is mainly the shape of the shutter corresponding to the light shielding member,
The luminous intensity during the shutter displacement operation and the shutter displacement operation.

That is, in the above-described second embodiment, the shutter 110 corresponding to the light-shielding member has the light-transmitting window 113 at the portion sandwiched between the first light-shielding portion 111 and the second light-shielding portion 112. Although the shutter 210 corresponding to the light shielding member in the third embodiment is a rectangular plate having only one light shielding portion 211 formed therein.

In the second embodiment described above,
When one exposure processing operation is performed on the surface R to be exposed, the direction in which the shutter 110 is displaced is one direction, but in the third embodiment, the directions in which the shutter 210 is displaced are opposite to each other. In two directions. In other words, the shutter 110 of the second embodiment is displaced in one direction, while the shutter 210 of the third embodiment is displaced reciprocally.

Further, in the above-described second embodiment, the luminous intensity of the light source L while the shutter 110 is displaced is the same as the luminous intensity at the time of exposure (100% luminous intensity). In the third embodiment, the shutter 21
The luminous intensity of the light source L while the 0 is displaced is the same as the luminous intensity at the time of shading (50% luminous intensity).

In the third embodiment shown in FIG. 4, a detailed description of the same parts as those in the first embodiment shown in FIG. 1 and the second embodiment shown in FIG. The description about the first embodiment and the second embodiment is substituted, and the description is omitted here.
In the third embodiment shown in FIG. 4, the same parts as those in the first embodiment shown in FIG. 1 and the second embodiment shown in FIG. 3 are denoted by the same reference numerals. Show.
Note that, similarly to FIGS. 1 and 2, in FIG. 4, the illustration and description of the lower surface exposure mechanism U <b> 2 are omitted for simplification of the description.

First, a description will be given of a main configuration of the exposure apparatus different from that of the second embodiment. The exposure apparatus is provided with a substantially horizontal light path LW extending from a light source L to a surface R to be exposed. A rectangular plate-shaped shutter 210 provided, a motor 220 for horizontally moving the shutter 110 in a moving direction of an arrow F shown in FIG. 4 (hereinafter, referred to as a moving direction F), and a moving direction F of the shutter 210
A sensor mechanism 230 for detecting the horizontal position of the sensor is provided.

To describe these structures in more detail, first, the shutter 210 is a single rectangular plate having a light shielding portion 211 capable of blocking ultraviolet light from the light source L. The shutter 210 is supported by a guide mechanism (not shown) so as to be horizontally movable in the movement direction F. Further, a rack portion 212 having a number of teeth formed over a predetermined section is provided at an end of the upper surface of the shutter 210.

Further, a pinion 222 is attached to the tip of the output shaft 221 of the motor 220, and this pinion 222 is designed to mesh with the above-mentioned rack portion 212. Therefore, the rotational driving force from the motor 220 is transmitted to the pinion 222 via the output shaft 221,
When the pinion 222 rotates in the rotation direction of the arrow G shown in FIG. 4 (hereinafter, referred to as the rotation direction G), the shutter 210 having the rack 212 is horizontally moved in the movement direction F. The motor 220 is connected to the drive controller M
The rotation drive is started by the drive control signal from C /
It has been stopped.

The sensor mechanism 230 is a sensor for detecting that the shutter 210 is located at a horizontal position where the light from the light source L to the surface R to be exposed is blocked by the light blocking portion 211 (hereinafter referred to as a light blocking position). 230A and a shutter 210 at a horizontal position (hereinafter referred to as an exposure position) at which the light-shielding portion 211 deviates from the optical path LW in the direction of movement F.
And a sensor 230B for detecting that the is positioned. In addition, these sensors 230A, 23
OB is an optical photomicrosensor similar to those of the first and second embodiments. Note that the sensor 230A and the sensor 230B are
Are arranged at intervals.

A plate-like sector 213 is attached to the other end of the upper surface of the shutter 210, which is different from the end where the rack 212 is formed. Then, when the sensors 230A and 230B detect the sector 213, the sensors 230A and 230B output detection signals. The horizontal position of the shutter 210 indicated by a solid line in FIG. 4 is a light shielding position, and the horizontal position at which the shutter 210 is horizontally moved from the light shielding position by the distance J in the direction of movement F is the exposure position (FIG. 4). (Shown by a two-dot chain line).

The detection signals of the sensors 230A and 230B are respectively transmitted to the power controller EC, and the power controller EC receiving these detection signals outputs the detection signals based on the output states of these detection signals. Thus, the luminous intensity of the light source L can be changed. Moreover,
The detection signals of the sensors 230A and 230B are also transmitted to the drive controller MC, respectively, and the drive controller MC receiving these detection signals rotates the motor 220 based on the output state of these detection signals. Driving can be started / stopped.

Next, an actual exposure processing operation by the exposure apparatus according to the third embodiment will be described. FIG.
This shows a state in which the light shielding portion 211 of the shutter 210 is at the light shielding position, that is, a state at the time of light shielding. In this state, the sensor 230A detects the sector 213, and based on the output of the detection signal from the sensor 230A, the power controller EC determines that the light intensity of the light source L is lower than that at the time of exposure, for example, at the time of exposure. The power supplied to the light source L is adjusted so that the luminous intensity becomes 50% of the luminous intensity.

Then, from the state at the time of shading shown in FIG. 4, the exposure processing operation is started, and the driving controller MC
As a result, the rotation of the motor 220 is started, and the pinion 222 is rotated in the rotation direction G, and the shutter 2 is rotated.
10 starts to move horizontally in the direction of movement F. At this time, the sector 213 is separated from the sensor 230A, and the output of the detection signal from the sensor 230A is stopped.

Here, the first embodiment and the second embodiment are described.
Unlike the embodiment, even if the output of the detection signal from the sensor 230A is stopped, the power controller E
C does not change the power supplied to the light source L, and the luminous intensity of the light source L remains lower than that at the time of exposure (luminance of 50%).

As the shutter 210 is horizontally moved in the direction of movement F, the exposure surface R
The light is sequentially emitted from the side XA on the upstream side to the side XB on the downstream side with respect to the transport direction A.

When the shutter 210 is further horizontally moved in the direction of movement F, the shutter 210 is located at the exposure position, and the sensor 230B detects the sector 213, based on the output of the detection signal from the sensor 230B. Then, the drive controller MC stops the rotation of the motor 220, and the rotation of the shutter 210 is stopped. At the same time, based on the output of the detection signal from the sensor 230B, the power controller EC
The power supplied to the light source L is increased so that the light intensity of the light source L becomes the light intensity at the time of exposure (100% light intensity).

Thereafter, the shutter 210 is maintained in a state where its horizontal movement is stopped for a predetermined exposure time, for example, 40 seconds, and the luminous intensity of the light source L also remains constant (the luminous intensity at the time of exposure). It is maintained in the state of. Thus, during a predetermined exposure time, the surface R to be exposed of the shadow mask material W is irradiated with ultraviolet light having a constant luminous intensity, and the surface R to be exposed is exposed to the through-hole pattern of the pattern plate P.

Next, after the predetermined exposure time has elapsed,
The rotation of the motor 220 is started by the drive controller MC. In the third embodiment, the pinion 222 is rotated in the direction opposite to the rotation direction G, and the shutter 210 is rotated in the direction opposite to the movement direction F. The horizontal movement starts in the direction, that is, the direction of the arrow -F in FIG. 1 (hereinafter, referred to as a movement direction -F). That is, the shutter 210 starts to return along the path that has been displaced.

Further, in the third embodiment, at this time, the output of the detection signal from the sensor 230B is stopped, and based on the stop of the output of the detection signal from the sensor 230B, the power controller EC sets the light source L So that the luminous intensity is lower than the exposure (50% luminous intensity).
The power supplied to the light source L is reduced.

As the shutter 210 is horizontally moved in the direction of movement -F, the exposure surface R
The light is blocked in order from the downstream side XB side to the upstream side XA side with respect to the transport direction A.

When the shutter 210 is further horizontally moved in the direction of movement -F, the shutter 210 returns to the light shielding position, and the sensor 230A detects the sector 213 again, based on the output of the detection signal from the sensor 230A. Then, the drive controller MC stops the rotation of the motor 220, and the horizontal movement of the shutter 210 is stopped. Thereafter, the power controller EC keeps the light intensity of the light source L at this light intensity (light intensity lower than the light intensity at the time of exposure) during the light shielding time until the next exposure processing operation is started.

By the above series of operations, one exposure processing on the exposed surface R is completed, and subsequently, the exposed surface R1 to be exposed next is positioned below the upper surface exposure mechanism U1. The shadow mask material W is transported in the transport direction A. Then, by repeating these operations, a through-hole pattern is sequentially exposed on the upper surface of the shadow mask material W.

As described above, the exposure apparatus of FIG. 4 is provided with not only the upper surface exposure mechanism U1 but also the lower surface exposure mechanism U2. Therefore, in practice, the through-hole pattern is sequentially exposed on both the upper surface and the lower surface of the shadow mask material W by the above series of operations.

As described above, in the exposure apparatus of the third embodiment shown in FIG. 4, the light source L irradiates the surface R to be exposed with light at a predetermined luminous intensity along a predetermined optical path LW. The shutter 210 blocks light from the light source L to the surface R to be exposed in the middle of the optical path LW, and the motor 220 moves the shutter 210 to the exposure position and the light shielding position. Let me. In addition, the power controller EC determines, based on the horizontal movement position of the shutter 210 displaced by the motor 220,
The light intensity of the light source L is changed. Further, the power controller EC controls the light intensity of the light source L when the shutter 210 is located at the light blocking position to be lower than the light intensity of the light source L when the shutter 210 is located at the exposure position. , The luminous intensity of the light source L is changed.

Therefore, with these configurations, even during the light shielding period, the light source L is not turned off but is turned on at a predetermined luminous intensity lower than the luminous intensity at the time of exposure. Therefore,
When performing the next exposure processing operation, it is only necessary to return the luminous intensity of the light source L to the luminous intensity at the time of exposure, so that it takes almost no time to prepare and the production efficiency is not reduced. Further, during the light-shielding time, the light source L has a predetermined luminous intensity (for example, 50% luminous intensity) lower than the luminous intensity at the time of exposure (100% luminous intensity). Life can be extended. In addition, during the light-shielding time, the rise in the ambient temperature around the light source L is suppressed, so that the thermal effect due to this atmosphere is reduced, and the curing of the resist film applied to the exposed surface R of the shadow mask material W is prevented. The thermal expansion of the pattern plate P can be suppressed.

Further, in the exposure apparatus of the third embodiment, the shutter 210 is provided with the light shielding portion 21 capable of blocking light.
1, and the motor 220 is provided with the light shielding portion 21 on the optical path LW.
After the shutter 210 is displaced in the moving direction F from the state where the shutter 210 is positioned so as to position 1 (the state at the time of light blocking) so that the light blocking portion 211 is displaced from the position on the light path LW, The shutter 210 is displaced in the direction opposite to the moving direction F (moving direction -F) so that the light shielding portion 211 returns again. That is, the motor 22
0 indicates that the shutter 210 is reciprocated between the light shielding position and the exposure position.

Further, the power controller EC changes the light intensity of the light source L so that the light intensity of the light source L when the shutter 210 is displaced is lower than the light intensity of the light source L at the time of exposure.

Therefore, with these configurations, the luminous intensity of the light source L is set to the minimum luminous intensity (50% of the luminous intensity at the time of exposure) while the shutter 210 is being displaced, so that the moving direction of the shutter 210 Exposure surface R for F
Exposure unevenness can be reduced.

Here, in order to explain the reduction of the exposure unevenness, FIG. 5 is a graph showing the distribution of the integrated exposure amount of the exposed surface R in the transport direction A of the shadow mask material W. In this graph, the horizontal axis is the position on the exposed surface R in the transport direction A of the shadow mask material W,
The vertical axis indicates the integrated exposure amount of the surface R to be exposed. Note that the transport direction A of the shadow mask material W matches the moving direction F of the shutter 210.

Further, a straight line L1 shown by a broken line in FIG.
5 is a graph in the case where the luminous intensity of the light source L while the shutter 210 is displaced as in the related art is the luminous intensity at the time of exposure (100% luminous intensity).
FIG. 7 is a graph when the luminous intensity of the light source L is reduced to a lower luminous intensity (50% luminous intensity) than during exposure, while the shutter 210 is displaced as in the present embodiment. As can be seen from this graph, in the present embodiment, the transport direction A of the shadow mask material W (that is,
Regarding the movement direction F) of the shutter 210, the exposed surface R
, Exposure unevenness can be reduced.

Now, this graph will be described in more detail. When the shutter 210 is reciprocated and displaced, the exposure time on the side XB is longer than the exposure time on the side XA of the surface R to be exposed. Therefore, the integrated exposure amount, which is the product of the exposure time and the illuminance on the surface R to be exposed, is naturally larger at a position closer to the side XB than to the side XA of the surface R to be exposed. 5
The straight line L1 rises to the right as shown in FIG.

However, as in the third embodiment,
If the luminous intensity of the light source L is reduced while the shutter 210 is being displaced, the illuminance on the exposed surface R during that time is also reduced, so that the integrated exposure amount on the exposed surface R during that time can be reduced. For this reason, the inclination of the above-mentioned straight line L1 rising to the right can be made gentle to be a straight line L2 rising to the right as shown in FIG. 5, and the integrated exposure amount of the side XA and the side XB of the surface R to be exposed is calculated. The difference can be reduced. Therefore, it is possible to reduce the occurrence of exposure unevenness on the surface R to be exposed.

As described above, several embodiments of the present invention have been described. However, the present invention can be embodied in other forms. For example, in the second embodiment described above, the shutter 110 corresponding to the light blocking member is formed of a rectangular plate-shaped member provided between the light source L and the plate R to be exposed, and is horizontally displaced. However, the shape and the displacement form of the light shielding member are not limited to this. For example, as shown in FIG. 6, a disk-shaped shutter 310 is used instead of the shutter 110 of the second embodiment, and the shutter 310 is rotated around a rotation axis 311 perpendicular to the shutter 310 at the center of the shutter 310. It may be displaced.

The disc-shaped shutter 310 has a fan-shaped light-shielding portion 312 and a light-shielding portion 314 having a central angle of 90 degrees, and is interposed between the light-shielding portion 312 and the light-shielding portion 314. A fan-shaped notch 313 and a notch 315 (corresponding to a light-transmitting portion) having a fan-shaped central angle are formed. Then, by rotating the shutter 310 every 90 degrees in a predetermined rotation direction, the light shielding portion 312 or 314 is displaced on the optical path LW to block light to the surface R to be exposed, or the notch portion 31
3 or 315 can be displaced on the optical path LW to irradiate the exposed surface R with light. When such a shutter is used, the driving mechanism is simpler than in the second embodiment,
There is an advantage that space saving is high.

In the first, second, and third embodiments, the light-transmitting portion of the light-shielding member that transmits light to the surface R to be exposed is a mere opening or notch. For example, a transparent body such as quartz glass provided so as to cover these openings and notches may be used. In this case, even when the light shielding member such as the shutter is at the exposure position, the thermal atmosphere from the light source L does not flow toward the pattern plate P or the strip-shaped metal sheet W, and the strip-shaped metal sheet W
And the thermal expansion of the pattern board P can be further suppressed. Further, when the surface of the quartz glass is coated with a heat ray cut filter layer, since this filter layer absorbs the heat ray component generated from the light source L, the heat quantity applied to the pattern plate P and the strip-shaped metal sheet W is further increased. And hardening of the resist film of the strip-shaped metal sheet W and thermal expansion of the pattern sheet P can be further suppressed.

In the above-described first, second, and third embodiments, the displacement position (rotational position or horizontal position) of the shutter is detected by the sensor, but is not limited to this. Instead, for example, the displacement position of the shutter may be detected based on a pulse signal from a pulse encoder provided in a motor as a light shielding member displacement unit.

In the first, second, and third embodiments, the double-sided exposure apparatus in which both surfaces of the shadow mask W are to be exposed is described as an example. A single-sided exposure apparatus in which only the surface to be exposed is used may be used.

Furthermore, in the above-described first, second, and third embodiments, the shadow mask W and the pattern plate P are all exposed in a horizontal state, but the invention is not limited to this. Instead, for example, the exposure processing may be performed in a state where the shadow mask W and the pattern plate P are all vertical or oblique.

Further, in the above-described first, second and third embodiments, the exposure apparatus of a shadow mask material for a color cathode ray tube is taken as an example, but light is applied to the exposed surface of the strip-shaped metal thin plate. An exposure apparatus may be used as long as it irradiates and performs exposure processing. For example, an exposure apparatus that performs exposure processing by irradiating light to a surface to be exposed of an aperture grill material for a trinitron tube (registered trademark of Sony Corporation) or the like. You may.

In addition, various design changes can be made within the scope of the matters described in the claims.

[0122]

As described above in detail, according to the exposure apparatus of the first aspect, the luminous intensity of the light source is changed by the luminous intensity varying means based on the position of the light shielding member displaced by the light shielding member displacement means. Can be done. For example, as in the exposure apparatus according to the second aspect of the present invention, the light intensity of the light source is changed by the light intensity varying means so that the light shielding member is located at the light shielding position more than the light intensity of the light source when the light shielding member is located at the exposure position. If the luminous intensity of the light source is lower when the light source is located, it takes almost no time to prepare the light source (recover the luminous intensity) when performing the next exposure processing operation. There is an effect that the life of the light source can be extended without reducing the power consumption of the light source. Furthermore, the thermal effect of the atmosphere around the light source is reduced, and the hardening of the resist film on the strip-shaped metal sheet,
There is an effect that thermal expansion of the pattern plate can be suppressed.

According to the exposure apparatus of the third aspect,
Since the luminous intensity of the light source is set to the minimum luminous intensity while the light shielding member is displaced, there is an effect that it is possible to reduce the exposure unevenness of the exposed surface in the displacement direction of the light shielding member.

According to the exposure apparatus of the fourth aspect,
This makes it possible to eliminate the occurrence of exposure unevenness on the surface to be exposed in the displacement direction of the light-shielding member, and to provide an effect that uniform exposure can be performed on the surface to be exposed.

According to the exposure apparatus of the fifth aspect,
It is possible to eliminate the occurrence of uneven exposure on the surface to be exposed in the direction along the rotation direction of the light shielding member, to perform uniform exposure on the surface to be exposed, and to improve the space saving of the exposure apparatus. This has the effect that it can be performed.

According to the exposure method of the invention according to claim 6,
The luminous intensity of the light source can be changed based on the light blocking state of the light from the light source to the surface to be exposed. For example, when the light intensity of the light source is changed so that the light intensity of the light source at the time of light shielding is lower than the light intensity of the light source at the time of exposure, the preparation of the light source (the light intensity Since almost no time is required for (recovery), there is an effect that the life of the light source can be extended while the production efficiency is not reduced and the power consumption of the light source is reduced. In addition, the effect of heat due to the atmosphere around the light source is reduced, and the effect of curing the resist film of the strip-shaped metal thin plate and suppressing the thermal expansion of the pattern plate can be suppressed.

[Brief description of the drawings]

FIG. 1 is a perspective view schematically showing a configuration of an exposure apparatus according to a first embodiment of the present invention.

FIG. 2 is a graph showing a distribution of an integrated exposure amount of a surface R to be exposed in a transport direction A of a shadow mask material W when the exposure apparatuses according to the first embodiment and the second embodiment of the present invention are used. It is.

FIG. 3 is a perspective view schematically showing a configuration of an exposure apparatus according to a second embodiment of the present invention.

FIG. 4 is a perspective view schematically showing a configuration of an exposure apparatus according to a third embodiment of the present invention.

FIG. 5 is a graph showing a distribution of an integrated exposure amount of a surface R to be exposed in a transport direction A of a shadow mask material W when an exposure apparatus according to a third embodiment of the present invention is used.

FIG. 6 is a perspective view showing a modified example of the shutter of the exposure apparatus according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Shutter (cylindrical light-shielding member) 110, 210, 310 Shutter (light-shielding member) 11 Rotation axis 12 Light-shielding wall (light-shielding part) 13 Light-transmitting window (light-transmitting part) 14, 114, 212 Rack 20, 20, 120, 220 Motor (light-shielding member displacement means) 22, 122, 222 Pinion part 30, 130, 230 Sensor mechanism 111 First light-shielding part (light-shielding part) 112 Second light-shielding part (light-shielding part) 113 Light-transmitting window (light-transmitting part) 211 Light-shielding portion 311 Rotation axis 312, 314 Light-shielding portion 313, 315 Notch (translucent portion) L light source LW optical path P pattern plate R, R1 exposed surface U1 upper surface exposure mechanism U2 lower surface exposure mechanism W shadow mask material (band-shaped metal) DS) Power supply EC Power controller (Light intensity variable means) MC Drive controller

Claims (6)

[Claims] An exposure apparatus for irradiating a light-exposed surface of a strip-shaped metal sheet through a pattern plate on which a predetermined image pattern is formed, and exposing the surface to be exposed to a predetermined image pattern, A light source that irradiates the surface to be exposed with light at a predetermined luminous intensity along a predetermined optical path; a light shielding member capable of blocking light from the light source to the surface to be exposed at an intermediate portion of the optical path; Light-shielding member displacing means for displacing a position where light from the light source irradiates the surface to be exposed and a position where light from the light source to the surface to be exposed is blocked; And a luminous intensity varying means capable of changing the luminous intensity of the light source based on the light source. 2. The light intensity varying means blocks light from the light source to the surface to be exposed more than the light intensity of the light source when the light shielding member is located at a position where the light from the light source is irradiated onto the surface to be exposed. 2. The apparatus according to claim 1, wherein the luminous intensity of the light source is changed such that the luminous intensity of the light source is lower when the light shielding member is located at the position where the light shielding member is located. . 3. The light-shielding member has a light-shielding portion capable of blocking light from a light source to a surface to be exposed, and the light-shielding member displacing means includes a light-shielding member such that the light-shielding portion is positioned on the optical path. After the light-shielding member is displaced in a predetermined direction so that the light-shielding portion deviates from the optical path, the light-shielding member is reversed in the predetermined direction so that the light-shielding portion returns to the optical path again. Reciprocating displacement means for displacing in the direction, wherein the light intensity variable means, when the light shielding member is displaced, than the light intensity of the light source when the light shielding member is located such that the light shielding portion is off the optical path 3. The apparatus according to claim 1, wherein the light intensity of the light source is changed so that the light intensity of the light source is lower. 4. The light-shielding member has a light-shielding portion capable of blocking light and a light-transmitting portion provided at a position sandwiched between the light-shielding portions and capable of transmitting light. 3. The apparatus according to claim 1, wherein the displacing means is a one-way displacing means for displacing the light shielding member so that the light transmitting portion of the light shielding member passes across the optical path. 5. The light-blocking member is a cylindrical light-blocking member provided to surround the light source and having a predetermined cylindrical axis, and a light-blocking portion of the light-blocking member is formed on a part of a cylindrical surface of the light-blocking member. The light-transmitting portion of the light-shielding member is a light-transmitting window formed on a part of the cylindrical surface of the light-shielding member. 5. The apparatus according to claim 4, wherein the one-way rotating means rotates the light shielding member about the cylindrical axis so as to pass across the cylindrical axis. 6. An exposure apparatus for irradiating a light-exposed light from a light source onto a surface to be exposed of a strip-shaped thin metal plate through a pattern plate on which a predetermined image pattern is formed, and exposing the surface to be exposed to a predetermined image pattern. A method for exposing a strip-shaped metal sheet, comprising: changing a luminous intensity of a light source based on a light blocking state of light from a light source to a surface to be exposed.